JPS59151418A - Reaction oven - Google Patents

Abstract

PURPOSE:To prevent thermal deformation in spite of unitary molding without dividing the heater cover by a method wherein when the annular heater cover covers plural suscepters revolving around the core of the oven, plural cut grooves facing mutually are cut in a radial form on inside and outside edges of the cover and transparent holes which the suscepters fit in are arranged in uniform intervals among said grooves. CONSTITUTION:A heater 15 of ring-shape is arranged around a reaction oven 1 and a vertical supporting shaft 9 comprising a suscepter 10 on its upper part revolves along an annular path arranged in the center of said ring itself and a semiconductor wafer 11 put on the suscepter 10 is covered with a heater cover 13. Then the predetermined reaction treatment is performed. In this constitution, a heater cover 20 shown in the figure which corresponds to the cover 13 is formed to be ring-shape with using one sheet of heat-resistant metal and is provided with plural cut grooves 21 arranged in a radial form on its inside and outside edges while facing mutually. Also plural transparent holes 14 which the suscepters 10 fit in are opened among the grooves 21 and the cover 20 is fixed to the supporting shaft 9 using fitting holes 17.

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to reactors such as chemical vapor deposition (CVD) devices.

For example, there is a reactor for a conventional CVD apparatus as shown in FIG.

This reactor 1 consists of a main body 2 having a cylindrical shape with an open top surface, a bell jar 3 removably covered on the top surface of the main body 2, a support 4 erected at the center of the main body 2 which is a reactor core, and Pillar 4
An intermediate pace 5 supported horizontally on the pace, a buffer 7 detachably supported on the upper end of a stand 6 erected on the pace, and a turn teasel 8 installed to revolve on one surface of the main body 2; Rotate on turntable 8'
A plurality of support shafts 9 are supported at right angles, and a susceptor 10 is fixed to the upper end of each shaft 9 to hold a wafer 11. It is generally composed of a ring-shaped heater cover 13 having a plurality of i-holes 14 that fit so as to surround the heater cover 10 , and a square bead 15 laid in an annular shape below the heater cover 13 .

Each susceptor 0 does not rotate, but revolves around the core between the inner circumferential wall of the beam body 2 and the outer edge of the buffer 7, and due to this rotation, the susceptor 10 starts from the wafer 11 on the susceptor 10. Try to ensure a consistent CVD response. Further, in order to promote the CVD reaction with the susceptor 10, the wafer 11
It is heated from below by a heater 15, and a heater cover 13 surrounds the outside of the septum 10 to ensure effective heating and to prevent the reaction gas from escaping downward.

By the way, the conventional heater cover 13 in the reactor
In order to avoid deformation (warping into a dish shape) due to thermal expansion, the ring is formed by arranging a plurality of arc-shaped pieces 16 in an annular shape, as shown in FIG.

However, in such conventional heater covers, the mounting holes 17 for mounting each piece 16 to the support shaft 12 are set to have a slightly larger diameter to allow for a margin for mounting. Piece 1 is fitted onto the support shaft 12.
6, the adjacent pieces 16 and 16 may approach or separate from each other due to the allowance of the mounting hole 17, resulting in a large gap 18 being formed in the entire ring-shaped heater cover. . When such a gap is created, the heat of the heater escapes upward and the reaction gas escapes downward, impairing a homogeneous CVD reaction. In addition, in order to avoid the formation of such gaps, it is necessary to pay excessive attention to each assembly operation, and since this assembly operation is performed frequently every time the furnace is cleaned, it may reduce productivity. Invite.

SUMMARY OF THE INVENTION An object of the present invention is to eliminate the drawbacks of the prior art and provide a reactor equipped with a heater cover that can prevent thermal deformation without creating large gaps.

Hereinafter, the present invention will be explained according to embodiments shown in the drawings.

FIG. 3 is a plan view of an embodiment of the reactor according to the present invention, with the bell jar 3 removed, showing the case where the reactor according to the present invention is applied to the general CVD apparatus described with reference to FIG.

In this embodiment, the heater cover 20 is integrally molded into a ring shape from a material such as a heat-resistant metal, and the cover 20 has cut grooves 21 radially arranged at appropriate intervals on the inner and outer edges of the ring. each formed. Further, a predetermined number of through holes 14 for fitting the susceptor 10 are arranged in a ring shape at equal intervals between the inner and outer edges of the cover 20, and are arranged at positions that do not interfere with the through holes 14. A suitable number of mounting holes 17 to the support shaft are drilled.

In the reactor equipped with the heater cover 20 according to the above configuration, when the heater cover 20 is heated by the heater,
The temperature is higher on the back side, which is closer to the heat source, and the temperature is lower on the front side (outer area), which is farther from the heat source.

In addition to elongation in the circumferential direction, it attempts to expand from the back side to the front side.

However, since the heater cover 20 of this embodiment has grooves 21 cut in the inner and outer edges in a radial manner, this warping deformation is absorbed by the cut grooves 21, and warping due to thermal deformation does not occur.

According to this example, thermal deformation can be prevented even if the heater cover is integrally molded, so there is no need for the heater cover to have a separate structure, which simplifies production and allows for the installation of one reactor into a single reactor. Assembling work is simplified in terms of alignment, etc., and monitoring of misalignment of the heater cover and heater cover can be omitted, and productivity can be improved. Furthermore, since the structure does not prevent thermal deformation by reducing the coefficient of expansion, it is possible to integrally mold the heater cover 7 from readily available materials such as K and metal without using easily damaged quartz plates. , economically advantageous. Further, since the heater cover is an integrally molded product, large gaps due to assembly error pressure are not generated, and leakage of heat and gas can be prevented from occurring.

In Figure 3, for convenience, the notch 21 is shown to have a relatively large width, but the width of the notch 21 is set as wide as possible within the range that can absorb and prevent thermal deformation. Should be of small size. This is because if it is too large, heat and gas leakage will occur.

Further, the notch is not limited to the cut groove 21 in the above embodiment,
4 and 5 may be garden ditches 22, 23. These grooves 22 and 23 can also sufficiently absorb thermal deformation and prevent reactions.

In addition, in the case of these grooves 22 and 23, there is no gap that communicates the upper and lower spaces, and therefore there is no risk of heat or gas leakage. Incidentally, the groove 22 shown in FIG. 4 has a sloped bottom so that it becomes deeper from the inner edge to the outer edge, and the groove 23 shown in FIG. 5 has a bottom formed at a constant depth.

Note that the present invention is not limited to the reactor of a CVD apparatus.

It can be applied to general reactors such as vacuum evaporation equipment, vacuum deposition equipment, taxial equipment, dry etching equipment, etc.

As explained above, according to the present invention, it is possible to prevent thermal deformation of the heater cover, and also to prevent the generation of gaps in the heater cover.

[Brief explanation of the drawing]

FIG. 1 is a vertical sectional view showing a general CVD apparatus, and FIG. 2 is a plan view showing a conventional heater cover. FIG. 3 is a plan view showing an embodiment of the reactor according to the present invention. FIGS. 4 and 5 are partial perspective views showing modified examples of the notch, respectively. 1... Reactor, 2... Main body, 3... Belljar, 4
... Prop, 5... Intermediate pace, 6... Stand,
7...Buffer, 8...Turntable, 9...
Support shaft, 10... Susceptor, 11... Wafer, 12
...Support shaft %14...Through hole, 15...Heater, 2
0... Heater force/(-, 21... Cut groove, 22.23
...Gutter with eaves. Figure 1

Claims (1)

[Claims] 1. In a reactor in which a plurality of reactant susceptors that revolve around the circumference of the reactor core are arranged in a ring shape in a ring-shaped heater cover and are respectively positioned in a plurality of through holes formed.
A reactor characterized in that the heater cover is integrally molded and a suitable number of notches are formed radially on the outer edge and inner edge of the ring.