JPH047502A - Optical element and hologram exposing method - Google Patents

Optical element and hologram exposing method

Info

Publication number
JPH047502A
JPH047502A JP10920190A JP10920190A JPH047502A JP H047502 A JPH047502 A JP H047502A JP 10920190 A JP10920190 A JP 10920190A JP 10920190 A JP10920190 A JP 10920190A JP H047502 A JPH047502 A JP H047502A
Authority
JP
Japan
Prior art keywords
light
pinhole
beam splitter
hologram
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10920190A
Other languages
Japanese (ja)
Inventor
Hidefumi Sakata
秀文 坂田
Osamu Yokoyama
修 横山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP10920190A priority Critical patent/JPH047502A/en
Publication of JPH047502A publication Critical patent/JPH047502A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To perform exposure through a hologram lens with small noise by employing a beam splitter which is united with a pinhole. CONSTITUTION:The light emitted by a laser light source 1 is split into two, and one light beam is converged by an objective 4, passed through the pinhole 5, and the diverged light from the pinhole is used as object light 9. The other light beam is made incident on the beam splitter 6, inserted into the optical axis of the object light 9, at right angles to the optical axis and made to interfere with this object light 10. In such a case, the pinhole 5 which is united with the beam splitter 6 is used. Consequently, the pinhole 5 can be positioned at the position where the object light 9 is converged so that the reference light 10 is not cut off. Consequently, diffracted light generated owing to the high-order mode in the laser luminous flux and a dust, etc. on the lens is cut off to enable the interference exposure with small noise.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は光学素子、及びホログラムレンズの露光方法に
関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical element and a method of exposing a hologram lens.

[従来の技術] 従来のホログラムレンズの露光方法としては、電子通信
学会技術研究報告ED80−70のように補助ホログラ
ム等の回折素子を利用して、参照光を物体光の光軸と平
行に導き、参照光と物体光の干渉縞を乾板上に記録する
ものがあった。
[Prior Art] A conventional hologram lens exposure method uses a diffraction element such as an auxiliary hologram to guide the reference light parallel to the optical axis of the object light, as described in the Institute of Electronics and Communication Engineers Technical Research Report ED80-70. , there was one that recorded the interference fringes of the reference beam and object beam on a dry plate.

[発明が解決しようとする課題] しかし、従来の補助ホログラムを用いた露光方法には、
第2図に示すように、対物レンズ4によって物体光13
が収束する点と参照光14が重なっているため、空間フ
ィルターを使用することが困難であるという問題点があ
った。そこで本発明はこうした問題点を解決するための
もので、その目的とするところは、ピンホールと一体に
なったビームスプリッタを採用することによって、雑音
の少ないホログラムレンズの露光方法を提供することに
ある。
[Problems to be solved by the invention] However, the conventional exposure method using an auxiliary hologram has the following problems:
As shown in FIG. 2, the object light 13 is
Since the point where the reference beam 14 converges overlaps with the reference beam 14, there is a problem in that it is difficult to use a spatial filter. Therefore, the present invention is intended to solve these problems, and its purpose is to provide a method of exposing a hologram lens with less noise by employing a beam splitter integrated with a pinhole. be.

[課題を解決するための手段] 本発明の光学素子は、ピンホールとビームスプリッタが
一体化されたことを特徴とする。また、本発明のホログ
ラム露光方法は、干渉露光によってホログラムを記録す
る光学系において、前記光学素子を含むことを特徴とす
る。
[Means for Solving the Problems] The optical element of the present invention is characterized in that a pinhole and a beam splitter are integrated. Further, the hologram exposure method of the present invention is characterized in that an optical system for recording a hologram by interference exposure includes the optical element.

[作用] 本発明の上記の構成によれば、レーザー光源を出た光を
二つに分割し、一方の光を対物レンズで収束し、ピンホ
ールを通過させ、そこから発散する光を物体光として用
いる。
[Function] According to the above configuration of the present invention, the light emitted from the laser light source is split into two, one of the lights is converged by the objective lens, and the light passes through the pinhole, and the light diverging from there is used as the object light. used as

もう一方の光は物体光の光軸上に挿入したビームスプリ
ッタへ光軸と垂直方向から入射させ、上の物体光と干渉
させる。本発明ではビームスプリッタと一体になったピ
ンホールを用いている。このため、参照光を遮らないよ
うに、物体光が収束する位置にピンホールを置くことが
出来る。ピンホールを置くことによって、レーザー光束
中の高次モードや、レンズのごみなどによる回折波を遮
断することができ、雑音の少ない干渉露光が可能となる
The other light enters a beam splitter inserted on the optical axis of the object light from a direction perpendicular to the optical axis, and is caused to interfere with the upper object light. The present invention uses a pinhole integrated with a beam splitter. Therefore, a pinhole can be placed at a position where the object light converges so as not to block the reference light. By placing a pinhole, it is possible to block higher-order modes in the laser beam and diffracted waves due to lens dust, etc., making it possible to perform interference exposure with less noise.

以下、実施例により本発明の詳細を示す。Hereinafter, the details of the present invention will be shown by examples.

[実施例1] 第1図は本発明の実施例の構成を示している。[Example 1] FIG. 1 shows the configuration of an embodiment of the present invention.

ピンホール5は厚さ13mmのステンレス製の板に5μ
mの穴をあけたもので、ビームスプリッタ6の入射面の
一つに張り合わせて作られており、ピンホール5を通過
する際、レーザ光中の高次モードの光や、レンズについ
たごみによる回折光等の不必要な成分を落とすことがで
きる。ビームスプリッタとピンホールを一体化する方法
として、直接ビームスプリッタにA1を蒸着することも
出来る。
Pinhole 5 is 5μ in a 13mm thick stainless steel plate.
It is made by pasting one of the incident surfaces of the beam splitter 6 with a hole of m in diameter, and when passing through the pinhole 5, it is protected against high-order mode light in the laser beam and dust attached to the lens. Unnecessary components such as diffracted light can be removed. As a method of integrating the beam splitter and the pinhole, it is also possible to directly deposit A1 on the beam splitter.

[実施例2] 441.6nmの発振波長を持ツHe −Cdレーザー
1を出た光は、ハーフミラ−2で二つに分割される。一
方の光は、対物レンズ4によってピンホール5上で収束
する。ピンホール5を通過した光は発散光となる。発散
光はピンホール5と一体になったビームスプリッタ6に
入射して反射光と透過光に分かれる。このうち透過して
乾板に入射する光を物体光9として用いる。ハーフミラ
−2で分割されたもう一方の光は側方からビームスプリ
ッタ6に入射する。ビームスプリッタ6で反射光と透過
光に分かれるが、ここでは、反射光のみを参照光10と
して用いる。物体光9と参照光10の干渉縞を、感光材
料7を塗布したガラス基板8を用いて記録する。参照光
10はビームスプリッタ6を用いて物体光9の光軸に導
かれており、インライン型のホログラムレンズの作製が
可能である。°また、参照光10の経路に対物レンズを
挿入して、収束光をビームスプリッタ6に入射させるこ
とによって発散光を収束光に変換するレンズを作製する
こともできる。
[Example 2] Light emitted from a He-Cd laser 1 having an oscillation wavelength of 441.6 nm is split into two by a half mirror 2. One of the lights is converged on the pinhole 5 by the objective lens 4. The light passing through the pinhole 5 becomes diverging light. The diverging light enters a beam splitter 6 integrated with a pinhole 5 and is split into reflected light and transmitted light. Among these, the light that is transmitted and enters the dry plate is used as object light 9. The other beam split by the half mirror 2 enters the beam splitter 6 from the side. Although the beam splitter 6 separates the reflected light and transmitted light, only the reflected light is used as the reference light 10 here. Interference fringes between the object beam 9 and the reference beam 10 are recorded using a glass substrate 8 coated with a photosensitive material 7. The reference beam 10 is guided to the optical axis of the object beam 9 using a beam splitter 6, and an in-line hologram lens can be manufactured. Further, it is also possible to manufacture a lens that converts divergent light into convergent light by inserting an objective lens into the path of reference light 10 and making the convergent light enter the beam splitter 6.

[発明の効果] 以上述べたように本発明によれば、゛ ピンホール、ビ
ームスプリッタを一体としたことで、光学系を構成する
素子の数を減らすことが出来、また光軸合わせが簡単に
なるという効果を有する。
[Effects of the Invention] As described above, according to the present invention, by integrating the pinhole and beam splitter, the number of elements constituting the optical system can be reduced, and optical axis alignment can be easily performed. It has the effect of becoming.

また、本発明によればピンホール一体型のビームスプリ
ッタを用いることにより雑音の少ないホログラムレンズ
の露光が可能であるという効果を有する。
Further, according to the present invention, by using a pinhole-integrated beam splitter, exposure of a hologram lens with less noise is possible.

図である。It is a diagram.

1   ・ 2   ・ 3   ・ 4   ・ 5   ・ 6   ・ 7   ・ 8   ・ 9   ・ 10 ・ 11 ・ 12 ・ 13 ・ 14 ・ レーザー ハーフミラ− フルミラー 対物レンズ ピンホール ビームスプリッタ 感光材料 ガラス基板 物体光 参照光 補助ホログラム 乾板 物体光 参照光1 ・ 2 ・ 3・ 4 ・ 5 ・ 6 ・ 7 ・ 8 ・ 9 ・ 10・ 11・ 12・ 13・ 14・ laser half mirror full mirror objective lens Pinhole beam splitter photosensitive material glass substrate object light reference light auxiliary hologram dry plate object light reference light

【図面の簡単な説明】[Brief explanation of the drawing]

Claims (2)

【特許請求の範囲】[Claims] (1)ピンホールとビームスプリッタが一体化されたこ
とを特徴とする光学素子。
(1) An optical element characterized by an integrated pinhole and beam splitter.
(2)干渉露光によってホログラムを記録する光学系に
おいて、前記光学素子を含むことを特徴とするホログラ
ム露光方法。
(2) A hologram exposure method, characterized in that an optical system for recording a hologram by interference exposure includes the optical element.
JP10920190A 1990-04-25 1990-04-25 Optical element and hologram exposing method Pending JPH047502A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10920190A JPH047502A (en) 1990-04-25 1990-04-25 Optical element and hologram exposing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10920190A JPH047502A (en) 1990-04-25 1990-04-25 Optical element and hologram exposing method

Publications (1)

Publication Number Publication Date
JPH047502A true JPH047502A (en) 1992-01-10

Family

ID=14504177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10920190A Pending JPH047502A (en) 1990-04-25 1990-04-25 Optical element and hologram exposing method

Country Status (1)

Country Link
JP (1) JPH047502A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103336369A (en) * 2013-07-15 2013-10-02 上海宏盾防伪材料有限公司 Light path system for shooting coaxial holographic lens and method thereof
CN107894208A (en) * 2016-10-04 2018-04-10 普莱斯泰克光电子有限公司 Spectral Confocal range sensor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103336369A (en) * 2013-07-15 2013-10-02 上海宏盾防伪材料有限公司 Light path system for shooting coaxial holographic lens and method thereof
CN107894208A (en) * 2016-10-04 2018-04-10 普莱斯泰克光电子有限公司 Spectral Confocal range sensor
EP3306263A1 (en) * 2016-10-04 2018-04-11 Precitec Optronik GmbH Chromatically confocal distance sensor
US10260941B2 (en) 2016-10-04 2019-04-16 Precitec Optronik Gmbh Chromatic confocal distance sensor
CN107894208B (en) * 2016-10-04 2021-09-14 普莱斯泰克光电子有限公司 Spectrum confocal distance sensor

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