JPH0474437U - - Google Patents

Info

Publication number
JPH0474437U
JPH0474437U JP11682790U JP11682790U JPH0474437U JP H0474437 U JPH0474437 U JP H0474437U JP 11682790 U JP11682790 U JP 11682790U JP 11682790 U JP11682790 U JP 11682790U JP H0474437 U JPH0474437 U JP H0474437U
Authority
JP
Japan
Prior art keywords
wire
ion beam
ion
stage
contacts
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11682790U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11682790U priority Critical patent/JPH0474437U/ja
Publication of JPH0474437U publication Critical patent/JPH0474437U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP11682790U 1990-11-07 1990-11-07 Pending JPH0474437U (US07321065-20080122-C00160.png)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11682790U JPH0474437U (US07321065-20080122-C00160.png) 1990-11-07 1990-11-07

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11682790U JPH0474437U (US07321065-20080122-C00160.png) 1990-11-07 1990-11-07

Publications (1)

Publication Number Publication Date
JPH0474437U true JPH0474437U (US07321065-20080122-C00160.png) 1992-06-30

Family

ID=31864673

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11682790U Pending JPH0474437U (US07321065-20080122-C00160.png) 1990-11-07 1990-11-07

Country Status (1)

Country Link
JP (1) JPH0474437U (US07321065-20080122-C00160.png)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001063660A1 (fr) * 2000-02-25 2001-08-30 Hitachi, Ltd. Appareil de detection de defauts dans un dispositif et procede de detection de defauts
JP2002174667A (ja) * 2000-09-11 2002-06-21 Hoya Corp 多層配線基板及びその製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001063660A1 (fr) * 2000-02-25 2001-08-30 Hitachi, Ltd. Appareil de detection de defauts dans un dispositif et procede de detection de defauts
JP2002174667A (ja) * 2000-09-11 2002-06-21 Hoya Corp 多層配線基板及びその製造方法
JP4509437B2 (ja) * 2000-09-11 2010-07-21 Ｈｏｙａ株式会社 多層配線基板の製造方法

Similar Documents

Publication Publication Date Title
CA2152740A1 (en) Electron beam apparatus and image forming apparatus
JPH0474437U (US07321065-20080122-C00160.png)
EP0373599A3 (en) Method of determining the position of electron beam irradiation and device used in such method
JP2000100917A (ja) 静電チャック装置
JPH0229151U (US07321065-20080122-C00160.png)
JPS6415604A (en) Measuring apparatus for length by electron beam
JPH01155251U (US07321065-20080122-C00160.png)
JPH0231125U (US07321065-20080122-C00160.png)
JPS58115383A (ja) 反射電子検出器
JPS6318763U (US07321065-20080122-C00160.png)
JPS63146962U (US07321065-20080122-C00160.png)
JPS582856U (ja) 透過走査像観察装置
JPH0275556U (US07321065-20080122-C00160.png)
JPS6419664A (en) Ion beam device
JPS62188145U (US07321065-20080122-C00160.png)
JPH0214358U (US07321065-20080122-C00160.png)
JPS62114439U (US07321065-20080122-C00160.png)
JPS62157968U (US07321065-20080122-C00160.png)
JPH0231056U (US07321065-20080122-C00160.png)
JPS58200144A (ja) Ｘ線光電子分光装置
JPS6119774U (ja) 走査電子顕微鏡を用いた電位測定装置
JPS63131060U (US07321065-20080122-C00160.png)
JPH0468521U (US07321065-20080122-C00160.png)
JPS6339855U (US07321065-20080122-C00160.png)
JPH0458938U (US07321065-20080122-C00160.png)