JPH047007B2 - - Google Patents
Info
- Publication number
- JPH047007B2 JPH047007B2 JP17063385A JP17063385A JPH047007B2 JP H047007 B2 JPH047007 B2 JP H047007B2 JP 17063385 A JP17063385 A JP 17063385A JP 17063385 A JP17063385 A JP 17063385A JP H047007 B2 JPH047007 B2 JP H047007B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- substrate
- film
- magnetic head
- magnetoresistive element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 25
- 229910052582 BN Inorganic materials 0.000 claims description 24
- 239000000758 substrate Substances 0.000 claims description 24
- 239000000696 magnetic material Substances 0.000 claims description 4
- 230000005684 electric field Effects 0.000 claims description 3
- 238000000354 decomposition reaction Methods 0.000 claims description 2
- 238000010790 dilution Methods 0.000 claims description 2
- 239000012895 dilution Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 2
- 239000010408 film Substances 0.000 description 24
- 239000010409 thin film Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 230000001681 protective effect Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】
本発明は、例えは薄膜磁気再生ヘツドや垂直磁
気記録再生ヘツドなどのように基板上に薄膜状の
感磁層を形成した磁気ヘツドに係り、特にそれの
基板に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a magnetic head, such as a thin-film magnetic reproducing head or a perpendicular magnetic recording/reproducing head, in which a thin film-like magnetically sensitive layer is formed on a substrate, and particularly to the substrate thereof.
この種磁気ヘツドは使用の際、磁気テープや磁
気デイスクなどの磁気記録媒体が磁気ヘツドの基
板端面に摺接するため、基板に耐摩耗性が要求さ
れる。この種磁気ヘツドの基板として、従来は合
成樹脂板やガラス板などが用いられていたが耐摩
耗性が十分でなく、基板の摩耗にともなつて感磁
層が損耗する欠点があつた。 When this type of magnetic head is used, a magnetic recording medium such as a magnetic tape or a magnetic disk comes into sliding contact with the end surface of the substrate of the magnetic head, so that the substrate is required to have wear resistance. Conventionally, synthetic resin plates, glass plates, etc. have been used as substrates for this type of magnetic head, but these have had the drawback of insufficient wear resistance and the magnetically sensitive layer being worn away as the substrate wears.
本発明の目的は、このような従来技術の欠点を
解消し、耐用寿命の長い、性能の安定した磁気ヘ
ツドを提供するにある。 It is an object of the present invention to overcome these drawbacks of the prior art and to provide a magnetic head that has a long service life and stable performance.
この目的を達成するため、本発明は、例えば合
成樹脂、ガラスあるいはセラミツクなどからなる
基板の表面に、例えば磁気抵抗効果素子あるいは
軟磁性材料などからなる薄膜状の感磁層を形成し
てなる磁気ヘツドにおいて、前記基板の少なくと
も磁気テープあるいは磁気デイスクなどの磁気記
録媒体が摺接する表面に、ボロンナイトライド
（BN）膜が形成されていることを特徴とするも
のである。 In order to achieve this object, the present invention provides a magnetic material in which a thin film-like magnetically sensitive layer made of, for example, a magnetoresistive element or a soft magnetic material is formed on the surface of a substrate made of, for example, synthetic resin, glass, or ceramic. The head is characterized in that a boron nitride (BN) film is formed on at least the surface of the substrate in sliding contact with a magnetic recording medium such as a magnetic tape or a magnetic disk.
前記BN膜は、水素希釈による低濃度のB2H6、
NH3を使用し、減圧下において高周波電界を加
えてプラズマ分解させて、基板表面に析出させる
ことによつて形成することができる。 The BN film contains a low concentration of B 2 H 6 due to hydrogen dilution,
It can be formed by using NH 3 and causing plasma decomposition by applying a high frequency electric field under reduced pressure and depositing it on the substrate surface.
次に本発明の実施例を図とともに説明する。第
１図ないし第３図は、第１実施例に係る薄膜磁気
再生ヘツドを説明するための図である。薄膜磁気
再生ヘツドは、ホルダ１と磁気抵抗効果素子組立
体２とから主に構成されている。第１図に示すよ
うにホルダ１の磁気テープ３と接触する側には窓
４を有し、それの裏側は開口凹部５となつてい
る。この開口凹部５から窓４の方向に向けて磁気
抵抗効果素子組立体２が挿入され、隙間に充填し
た接着剤６で固着される。 Next, embodiments of the present invention will be described with reference to the drawings. 1 to 3 are diagrams for explaining a thin film magnetic reproducing head according to a first embodiment. The thin film magnetic reproducing head mainly consists of a holder 1 and a magnetoresistive element assembly 2. As shown in FIG. 1, a window 4 is provided on the side of the holder 1 that contacts the magnetic tape 3, and an opening recess 5 is formed on the back side of the window 4. The magnetoresistive element assembly 2 is inserted from this opening recess 5 toward the window 4 and fixed with an adhesive 6 filled in the gap.
磁気抵抗効果素子組立体２は第２図および第３
図に示すように、基板７と、その基板７の表面で
かつ磁気テープ３と接触するように端部に形成さ
れた磁気抵抗効果素子８と、基板７の表面に形成
され一端が磁気抵抗効果素子８の端部にそれぞれ
接続されて他端が基板７の後方まで延びた２つの
リード部９と、前記磁気抵抗効果素子８ならびに
リード部９を覆う保護膜１０（第３図参照）とか
ら構成されている。 The magnetoresistive effect element assembly 2 is shown in FIGS.
As shown in the figure, a substrate 7, a magnetoresistive element 8 formed on the surface of the substrate 7 and at an end so as to be in contact with the magnetic tape 3, and a magnetoresistive element 8 formed on the surface of the substrate 7 and having one end that has a magnetoresistive effect. Two lead parts 9 each connected to an end of the element 8 and whose other end extends to the rear of the substrate 7, and a protective film 10 (see FIG. 3) that covers the magnetoresistive element 8 and the lead part 9. It is configured.
前記基板７は例えば合成樹脂、ガラスあるいは
セラミツクなどからなり、それの磁気テープ３と
接触する側の端面には磁気抵抗効果素子８および
リード部９を形成する前に、BN膜１１が全面に
わたつて形成されている。このBN膜１１は次の
ようにして設けられる。 The substrate 7 is made of, for example, synthetic resin, glass, or ceramic, and a BN film 11 is coated over the entire surface of the end surface thereof that contacts the magnetic tape 3 before forming the magnetoresistive element 8 and the lead portion 9. It is formed as follows. This BN film 11 is provided as follows.
すなわち、誘導結合型のプラズマ分解析出装置
（プラズマCVD装置）内に所定の大きさの基板７
を入れ、H2で0.05％に希釈したB2H6と同じくH2
で0.05％に希釈したNH3とを導入し、周波数
13.56MHz、電力100Wで高周波電界を印加し、
RFグロー放電をさせることにより、基板７の表
面にBN膜１１が形成される。 In other words, a substrate 7 of a predetermined size is placed inside an inductively coupled plasma analysis device (plasma CVD device).
and diluted to 0.05% with H 2 H 2 as well as H 6
Introduce NH3 diluted to 0.05% at the frequency
Applying a high frequency electric field at 13.56MHz and power of 100W,
By causing RF glow discharge, a BN film 11 is formed on the surface of the substrate 7.
BN膜１１の堆積速度は約0.7〜0.9A／minであ
る。またこのBN膜１１の赤外線スペクトルをと
つてみたところ1400cm-1付近にBNの伸縮振動
800cm-1付近にＮ−Ｂ−Ｎの変角振動が見られる。
これはヘキサゴナルBNの特徴を示している。透
過型電子顕微鏡による観察でも電子線回折ではヘ
キサゴナルBNの多結晶であることを確認し、明
視野像でも300〜400〓程度の粒界が見られた。こ
のBN膜１１をマイクロピツカースーカ硬度計を
用いて硬度測定をしたところ、ダイヤモンド圧子
の圧痕は見られず測定不可能であつた。このこと
から析出形成されたBN膜１１は、極めて高硬度
であることが分から。 The deposition rate of the BN film 11 is about 0.7 to 0.9 A/min. Also, when we took the infrared spectrum of this BN film 11, we found that the stretching vibration of BN was found around 1400 cm -1 .
An N-B-N bending vibration is seen around 800 cm -1 .
This shows the characteristics of hexagonal BN. Observation using a transmission electron microscope and electron beam diffraction confirmed that it was polycrystalline hexagonal BN, and a bright field image also showed grain boundaries of about 300 to 400 grains. When the hardness of this BN film 11 was measured using a micro-picker hardness meter, no indentation of the diamond indenter was observed and it was impossible to measure the hardness. From this, it was found that the precipitated BN film 11 had extremely high hardness.
このようにしてBN膜１１を形成したのち、公
知の方法によつて磁気抵抗効果素子８、リード部
９，９ならびに二酸化ケイ素からなる保護膜１０
が順次形成されて磁気抵抗効果素子組立体が得ら
れる。この組立体のリード部９，９に第１図に示
す如くリード部１２，１２が半田付けされ、その
後ホルダ１に組込まれて薄膜磁気再生ヘツドとな
る。この再生ヘツドの使用時には、第２図に示す
ように磁気抵抗効果素子８の端面とBN膜１１と
が走行する磁気テープ３と接触して、信号の読取
りがなされる。 After forming the BN film 11 in this way, the magnetoresistive element 8, the lead parts 9, and the protective film 10 made of silicon dioxide are formed by a known method.
are sequentially formed to obtain a magnetoresistive element assembly. Lead parts 12, 12 are soldered to the lead parts 9, 9 of this assembly as shown in FIG. 1, and then assembled into the holder 1 to form a thin film magnetic reproducing head. When this reproducing head is used, the end face of the magnetoresistive element 8 and the BN film 11 come into contact with the running magnetic tape 3, as shown in FIG. 2, and signals are read.
第４図は、本発明の第２実施例に係る垂直磁気
記録再生ヘツドを説明するための図である。この
ヘツドは、軟磁性材からなる主磁極２１と補助磁
極２２とから主に構成される。主磁極２１は、ガ
ラスやポリイミドなどの基板２３の片面にスパツ
タリングによつて約1μｍ厚に形成される訳であ
るが、この主磁極２１を形成する前に基板２３の
磁気デイスク２４と対向する側の端面にBN膜２
５が形成される。このBN膜２５の形成方法は第
１実施例で説明した方法と同様であるので、ここ
ではその説明を省略する。前記補助磁極２２に
は、励磁コイル２６が所定ターン数巻回される。 FIG. 4 is a diagram for explaining a perpendicular magnetic recording/reproducing head according to a second embodiment of the present invention. This head is mainly composed of a main magnetic pole 21 and an auxiliary magnetic pole 22 made of soft magnetic material. The main magnetic pole 21 is formed to a thickness of about 1 μm by sputtering on one side of a substrate 23 made of glass or polyimide. BN film 2 on the end face of
5 is formed. The method for forming this BN film 25 is the same as the method explained in the first embodiment, so the explanation thereof will be omitted here. An excitation coil 26 is wound around the auxiliary magnetic pole 22 for a predetermined number of turns.
主磁極２１と補助磁極２２との間に配置される
磁気デイスク２４はベースフイルム２７と磁性層
２８とから構成され、この磁性層２７が主磁極２
１の端面ならびにBN膜２５と摺接するようにな
つている。 The magnetic disk 24 disposed between the main magnetic pole 21 and the auxiliary magnetic pole 22 is composed of a base film 27 and a magnetic layer 28, and this magnetic layer 27 is connected to the main magnetic pole 22.
1 and the BN film 25.
前記励磁コイル２６に記録されるべき信号電流
を流して主磁極２１を補助磁極２２側から励磁す
ると、主磁極２１の先端付近に強い垂直磁界が発
生する。これによつて磁性層２８がそれの厚さ方
向に磁化されて、所望の磁気記録がなされる。 When the main magnetic pole 21 is excited from the auxiliary magnetic pole 22 side by passing a signal current to be recorded in the excitation coil 26, a strong vertical magnetic field is generated near the tip of the main magnetic pole 21. As a result, the magnetic layer 28 is magnetized in the direction of its thickness, thereby achieving desired magnetic recording.
前述したBN膜はダイヤモンドとほぼ同等の硬
度、耐摩耗性を有しているから、このBN膜でヘ
ツド基板の少なくとも磁気記録媒体と摺接する表
面を覆つておけば、基板の耐摩耗性が向上し、結
局、磁気ヘツドの長寿命化が図れる。また、BN
膜の形成によつて耐摩耗性が向上するから、基板
の材質は特に限定されず選択範囲が拡張され、コ
ストの低減が図れる。 The aforementioned BN film has almost the same hardness and wear resistance as diamond, so if this BN film covers at least the surface of the head substrate that makes sliding contact with the magnetic recording medium, the wear resistance of the substrate will improve. As a result, the life of the magnetic head can be extended. Also, BN
Since the wear resistance is improved by forming the film, the material of the substrate is not particularly limited, and the range of selection is expanded, and costs can be reduced.
第１図ないし第３図は本発明の第１実施例に係
る薄膜磁気再生ヘツドを説明するための図で、第
１図はその再生ヘツドの縦断面図、第２図はその
ヘツドに用いられる磁気抵抗効果素子組立体の保
護膜形成前の平面図、第３図はその組立体の保護
膜形成後の正面図、第４図は本発明の第２実施例
に係る垂直磁気記録再生ヘツドの使用態様を示す
断面図である。
３……磁気テープ、７……基板、８……磁気抵
抗効果素子、１１……BN膜、２１……主磁極、
２３……基板、２４……磁気デイスク、２５……
BN膜。
1 to 3 are diagrams for explaining a thin-film magnetic reproducing head according to a first embodiment of the present invention, in which FIG. 1 is a longitudinal cross-sectional view of the reproducing head, and FIG. 2 is a view used in the head. FIG. 3 is a plan view of the magnetoresistive element assembly before the protective film is formed, FIG. 3 is a front view of the assembly after the protective film is formed, and FIG. 4 is a perpendicular magnetic recording/reproducing head according to the second embodiment of the present invention. FIG. 3 is a cross-sectional view showing how it is used. 3... Magnetic tape, 7... Substrate, 8... Magnetoresistive element, 11... BN film, 21... Main magnetic pole,
23... Board, 24... Magnetic disk, 25...
BN film.
Claims (1)
ヘツドにおいて、前記基板の少なくとも磁気記録
媒体が摺接する表面にボロンナイトライド膜が形
成されていることを特徴とする磁気ヘツド。 ２ 特許請求の範囲第１項記載において、前記ボ
ロンナイトライド膜が、減圧下において水素希釈
による低濃度のB2H6、NH3に高周波電界を加え
てプラズマ分解させて析出したボロンナイトライ
ド膜であることを特徴とする磁気ヘツド。 ３ 特許請求の範囲第１項記載において、前記ボ
ロンナイトライド膜が基板の端面に形成されてい
ることを特徴とする磁気ヘツド。 ４ 特許請求の範囲第１項記載において、前記感
磁層が磁気抵抗効果素子で構成されていることを
特徴とする磁気ヘツド。 ５ 特許請求の範囲第１項記載において、前記感
磁層が軟磁性材料で構成されていることを特徴と
する磁気ヘツド。[Scope of Claims] 1. A magnetic head comprising a thin magnetically sensitive layer formed on a substrate, characterized in that a boron nitride film is formed on at least the surface of the substrate in sliding contact with a magnetic recording medium. magnetic head. 2. Claim 1, wherein the boron nitride film is deposited by plasma decomposition by applying a high frequency electric field to low concentration B 2 H 6 and NH 3 by hydrogen dilution under reduced pressure. A magnetic head characterized by: 3. A magnetic head according to claim 1, wherein the boron nitride film is formed on an end surface of a substrate. 4. A magnetic head according to claim 1, wherein the magnetically sensitive layer is composed of a magnetoresistive element. 5. A magnetic head according to claim 1, wherein the magnetically sensitive layer is made of a soft magnetic material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17063385A JPS6231010A (en) | 1985-08-01 | 1985-08-01 | Magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17063385A JPS6231010A (en) | 1985-08-01 | 1985-08-01 | Magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6231010A JPS6231010A (en) | 1987-02-10 |
| JPH047007B2 true JPH047007B2 (en) | 1992-02-07 |
Family
ID=15908491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17063385A Granted JPS6231010A (en) | 1985-08-01 | 1985-08-01 | Magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6231010A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4819091A (en) * | 1987-04-30 | 1989-04-04 | International Business Machines Corporation | High speed magnetic disk contact recording system |
| DE69021337T2 (en) * | 1989-11-17 | 1996-01-25 | Nissin Electric Co Ltd | A method of forming a boron layer containing boron nitride, a magnetic head, and a method of producing the same. |
| US5636092A (en) * | 1992-07-31 | 1997-06-03 | Matsushita Electric Industrial Co., Ltd. | Magnetic head having chromium nitride protective film for use in magnetic recording and/or reproducing apparatus and method of manufacturing the same |
| US5475552A (en) * | 1992-07-31 | 1995-12-12 | Matsushita Electric Industrial Co., Ltd. | Magnetic head having a chromium nitride protective film for use in a magnetic recording and/or reproducing apparatus and a method of manufacturing the same |
-
1985
- 1985-08-01 JP JP17063385A patent/JPS6231010A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6231010A (en) | 1987-02-10 |
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