JPH0468522U - - Google Patents
Info
- Publication number
- JPH0468522U JPH0468522U JP11153090U JP11153090U JPH0468522U JP H0468522 U JPH0468522 U JP H0468522U JP 11153090 U JP11153090 U JP 11153090U JP 11153090 U JP11153090 U JP 11153090U JP H0468522 U JPH0468522 U JP H0468522U
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- stage
- high frequency
- electrode plate
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001020 plasma etching Methods 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11153090U JPH0468522U (en, 2012) | 1990-10-24 | 1990-10-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11153090U JPH0468522U (en, 2012) | 1990-10-24 | 1990-10-24 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0468522U true JPH0468522U (en, 2012) | 1992-06-17 |
Family
ID=31858994
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11153090U Pending JPH0468522U (en, 2012) | 1990-10-24 | 1990-10-24 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0468522U (en, 2012) |
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1990
- 1990-10-24 JP JP11153090U patent/JPH0468522U/ja active Pending