JPH0482842U - - Google Patents
Info
- Publication number
- JPH0482842U JPH0482842U JP12435690U JP12435690U JPH0482842U JP H0482842 U JPH0482842 U JP H0482842U JP 12435690 U JP12435690 U JP 12435690U JP 12435690 U JP12435690 U JP 12435690U JP H0482842 U JPH0482842 U JP H0482842U
- Authority
- JP
- Japan
- Prior art keywords
- plasma processing
- processing apparatus
- purging
- ring
- utility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 claims 1
- 239000011261 inert gas Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 238000010926 purge Methods 0.000 claims 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12435690U JPH0482842U (en, 2012) | 1990-11-28 | 1990-11-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12435690U JPH0482842U (en, 2012) | 1990-11-28 | 1990-11-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0482842U true JPH0482842U (en, 2012) | 1992-07-20 |
Family
ID=31872014
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12435690U Pending JPH0482842U (en, 2012) | 1990-11-28 | 1990-11-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0482842U (en, 2012) |
-
1990
- 1990-11-28 JP JP12435690U patent/JPH0482842U/ja active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5338363A (en) | Chemical vapor deposition method, and chemical vapor deposition treatment system and chemical vapor deposition apparatus therefor | |
US5800687A (en) | Device for masking or covering substrates | |
EP0810630A3 (en) | Low volume gas distribution assembly for a chemical downstream etch tool | |
JPH0482842U (en, 2012) | ||
JPH065418Y2 (ja) | 超高真空導入用ランプハウジング | |
JPH0460556U (en, 2012) | ||
JPH0160531U (en, 2012) | ||
JPH0629099U (ja) | プラズマ発生装置 | |
JPS6284926U (en, 2012) | ||
JPH0320858U (en, 2012) | ||
JPH0514507Y2 (en, 2012) | ||
JPH02131257U (en, 2012) | ||
JPS6361120U (en, 2012) | ||
JPH0363573U (en, 2012) | ||
JPS62191868U (en, 2012) | ||
JPS6442583A (en) | Dry etching device | |
JPH0443850U (en, 2012) | ||
JPS61176258U (en, 2012) | ||
JPH0211159U (en, 2012) | ||
JPS6416632U (en, 2012) | ||
JPS63124736U (en, 2012) | ||
JPS61168630U (en, 2012) | ||
JPS61106028U (en, 2012) | ||
JPH0244324U (en, 2012) | ||
JPH01123336U (en, 2012) |