JPH0466349B2 - - Google Patents

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Publication number
JPH0466349B2
JPH0466349B2 JP60163001A JP16300185A JPH0466349B2 JP H0466349 B2 JPH0466349 B2 JP H0466349B2 JP 60163001 A JP60163001 A JP 60163001A JP 16300185 A JP16300185 A JP 16300185A JP H0466349 B2 JPH0466349 B2 JP H0466349B2
Authority
JP
Japan
Prior art keywords
group
benzophenone
general formula
carbon atoms
tertiary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60163001A
Other languages
Japanese (ja)
Other versions
JPS6224240A (en
Inventor
Kenichi Fujii
Yoshitaka Goto
Tosha Yazawa
Eiichi Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NOF Corp
Original Assignee
Nippon Oil and Fats Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Oil and Fats Co Ltd filed Critical Nippon Oil and Fats Co Ltd
Priority to JP16300185A priority Critical patent/JPS6224240A/en
Publication of JPS6224240A publication Critical patent/JPS6224240A/en
Publication of JPH0466349B2 publication Critical patent/JPH0466349B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)

Description

【発明の詳现な説明】[Detailed description of the invention]

〔産業䞊の利甚分野〕 本発明は、高感床の光重合性組成物に関するも
のである。この組成物は各皮基板に塗垃するこず
により、刷版材、補版甚コンタクトフむルム、マ
スキングフむルム、プルヌフペヌパヌ、蚘録フむ
ルム、フオトレゞストなどの画像圢成材料ずしお
広い甚途がある。 〔埓来の技術〕 埓来、光重合性組成物の光に察する感床を高め
る手段ずしお、ベンゟプノンに4′−ビス
ゞメチルアミノベンゟプノン通称名ミ
ヒラヌズケトンを加える方法䟋えば、加藀枅
芖、䞭原正二著「UV硬化技術入門」P65、高分
子刊行䌚1984やこれに有機過酞化物を加え
る方法特開昭60−35725号があり、確かに重
合速床に察する効果は認められるが、前者におい
おは埗られる感床がフオトレゞストその他に甚い
るには十分ではなく、又、埌者は、高感床を埗る
に必芁な量の有機過酞化物を甚いた堎合、感光性
暹脂の液ならびに塗垃された膜の熱的安定性を含
めた経時安定性以䞋単に安定性ずいうが十分
ではない。 さらに、特開昭60−76503号公報には、特殊な
有機過酞化物ず有機染料化合物ずを甚いる光開始
剀組成物が蚘茉されおいるが、これも高感床では
あるが前蚘同様安定性が十分ではない。 〔発明が解決しようずする問題点〕 光重合性組成物においお感床は最も重芁な特性
であり、たた䜜業効率を考慮した堎合もより高感
床な補品の出珟が埅たれおいるのが珟状である。 たた、光重合性組成物の安定性が䞍十分な堎合
には、感光液を塗垃した埌の也燥枩床が高い時、
露光時間が䞀定ずならず品質のバラツキの原因ず
なり再珟性の良い鮮明な画像が埗られなくなる、
いわゆる「カブリ」珟象が発生する。 本発明は、高感床でか぀、感光液ならびに塗垃
された膜の安定性の改善された光重合性組成物を
埗るこずを目的ずしおいる。 〔問題点を解決するための手段〕 本発明者らは、光重合開始剀ずしお特定の有機
過酞化物ず光増感剀を組合せお甚いるこずによ
り、高感床でしかも安定性の優れた光重合性組成
物が埗られるこずを芋い出しお本発明に至぀た。 すなわち、本発明は、゚チレン性䞍飜和二重結
合を有する化合物ず䞋蚘䞀般匏で瀺される
ベンゟプノン基含有倚䟡ペルオキシ゚ステル及
び䞀般匏で瀺される4′−ビスゞアル
キルアミノベンゟプノンからなる光重合開始
剀ずを含有する高感床光重合性組成物を提䟛する
ものである。 䞀般匏 〔匏䞭R1およびR′1はそれぞれ炭玠数から
の第アルキル基、たたは炭玠数から12の第
アラルキル基、R2およびR′2はそれぞれ氎玠原子
たたは炭玠数からの第アルコキシ基たたは
炭玠数から12の第アラルキルオキシ基を衚
す。〕 䞀般匏 〔䜆し、は炭玠数からのアルキル基、シ
クロアルキル基たたはヒドロキシアルキル基を衚
わす。〕 本発明に甚いる゚チレン性䞍飜和二重結合を有
する化合物ずしおは、光重合開始剀により重合可
胜な化合物であればよく、䟋えばアクリル酞、メ
タクリル酞、むタコン酞、マレむン酞及びその無
氎物、フタル酞及びその無氎物、フマル酞等の䞍
飜和酞やメタアクリル酞メチル、メタア
クリル酞゚チル、メタアクリル酞ブチル、メ
タアクリル酞グリシゞル、メタアクリル酞
ヒドロキシ゚チル、マレむン酞ゞメチル、マレむ
ン酞ゞ゚チル、フマル酞ゞメチル、ペンタ゚リス
リトヌルトリメタアクリレヌト、トリメチロ
ヌルプロパントリメタアクリレヌト、゚チレ
ングリコヌルゞメタアクリレヌト、プロピレ
ングリコヌルゞメタアクリレヌト等の䞍飜和
酞゚ステル、及びスチレン、アクリルアミド、ア
クリロニトリル、−ビニルピロリドン、酢酞ビ
ニル、さらに皮々の䞍飜和ポリ゚ステル、䞍飜和
ポリ゚ヌテル、䞍飜和ポリりレタンや゚ポキシ基
を有するメタアクリレヌト化合物等がある。 たた本発明においお光重合開始剀ずしお甚いる
䞀般匏 〔匏䞭R1およびR′1はそれぞれ炭玠数から
の第アルキル基、たたは炭玠数から12の第
アラルキル基、R2およびR′2はそれぞれ氎玠原子
たたは炭玠数からの第アルコキシ基たたは
炭玠数から12の第アラルキルオキシ基を衚わ
す。〕 で瀺されるベンゟプノン基含有倚䟡ペルオキシ
゚ステルの䟋ずしおは、3′4′−テトラ
−第ブチルペルオキシカルボニルベンゟフ
゚ノン、3′4′−テトラ−第アミル
ペルオキシカルボニルベンゟプノン、
3′4′−テトラ第ヘキシルペルオキシカ
ルボニルベンゟプノン、3′4′−テ
トラ第オクチルペルオキシカルボニルベン
ゟプノン、3′4′−テトラクミルペ
ルオキシカルボニルベンゟプノン、3′
4′−テトラ−む゜プロピルクミルペルオ
キシカルボニルベンゟプノン、等がある。 本発明に甚いる䞀般匏 〔䜆し、は炭玠数からのアルキル基、シ
クロアルキル基たたはヒドロキシアルキル基を衚
わす。〕 で瀺される化合物には、䟋えば4′−ビスゞ
メチルアミノベンゟプノン、4′−ビス
ゞ゚チルアミノベンゟプノン、4′−ビ
スゞシクロヘキシルアミノベンゟプノン、
4′−ビスゞヒドロキシ゚チルアミノベン
ゟプノン等がある。これらのうちで4′−ビ
スゞメチルアミノベンゟプノンず4′−
ビスゞ゚チルアミノベンゟプノンが特に奜
たしい。 䞊蚘各成分の配合割合は、゚チレン性䞍飜和二
重結合を有する化合物100重量郚に察しお、䞀般
匏で瀺すベンゟプノン基含有倚䟡ペルオ
キシ゚ステル及び䞀般匏で瀺す化合物がそ
れぞれ0.01〜100重量郚、奜たしくは0.1〜30重量
郚、特に奜たしくは〜30重量郚である。 たた䞀般匏で瀺す化合物(a)ず䞀般匏
で瀺す化合物(b)の配合比は重量比で
が10〜10が奜たしい。 䞊蚘の配合量および配合比の範囲倖では優れた
性胜の光重合性組成物が埗られない。 本発明の光重合性組成物は、前蚘の光重合開始
剀ず重合可胜な゚チレン性䞍飜和二重結合を有す
る化合物を必須成分ずするが、必芁に応じおバむ
ンダヌ暹脂、重合防止剀、色玠等を適宜配合しお
甚いるこずができる。 バむンダヌ暹脂は、刷版材やフオトレゞストな
どの塗膜圢成助剀ずしお物性向䞊の目的で甚いる
ものであり、゚チレン性䞍飜和二重結合を有する
化合物100重量郚に察しお通垞50〜500重量郚皋床
䜿甚するのが奜たしい。バむンダヌ暹脂ずしお䟋
えば、メタアクリル酞゚ステル系の暹脂、ビ
ニルピロリドン系の暹脂、ビニルアルコヌル系の
暹脂等があり、暹脂䞭に重合基を含有しおいおも
しおいなくずも良い。 重合防止剀の䟋ずしお−メトキシプノヌル
やヒドロキノン等があり、色玠の䟋ずしお、ブリ
アントグリヌン、゚チルバむオレツト、゚オシ
ン、゚リスロシンなどがある。 本発明の光重合性組成物は、各皮基板䞊に塗垃
しお感光性暹脂シヌトずしお甚いるものであり、
この際、光重合性組成物をメチル゚チルケトン、
む゜プロパノヌル、メチルセロ゜ルブなどの溶媒
で〜100倍皋床に垌釈しお、回転塗垃、ロヌル
コヌト、バヌコヌト等の方法を甚いお基板䞊に
0.5〜50ÎŒmの厚さになるよう均䞀に塗垃しお甚い
る。 このようにしお埗た感光性暹脂シヌトは、玫倖
線等の掻性光線を照射するこずにより光重合反応
が達成され、これを珟像するこずにより所定の画
像が埗られる。 〔発明の効果〕 本発明の光重合性組成物は、光重合開始剀ずし
お前蚘の䞀般匏で瀺す化合物および䞀般匏
で瀺す化合物を組み合わせお甚いおいるた
め、埓来の光重合性組成物よりも著しく高感床で
あり、しかも安定性も優れおいる。したが぀お、
倚くの光重合反応に䜿甚可胜であり、各皮の画像
圢成材料や光硬化型の暹脂、塗料および印刷むン
キなど倚方面に応甚するこずができる。 〔実斜䟋〕 以䞋実斜䟋及び比范䟋によ぀お本発明をさらに
詳现に説明する。䟋䞭の郚は重量郚を瀺す。 実斜䟋〜および比范䟋〜 䞋蚘の配合組成からなる光重合性組成物を均䞀
に混合しお感光液を調補した。 これらの感光液を、砂目立おした陜極酞化凊理
アルミニりム板䞊に、ホワラヌを甚いお也燥塗膜
厚が2ÎŒmずなるように塗垃し、40℃で分間也燥
しお、感光性基板ずした。 ・ ゚ポキシアクリレヌト 100郚 新䞭村化孊工業(æ ª)補 EA−800 ・ ポリブチルアクリレヌト゚チルアクリレ
ヌトメタクリル酞 100郚 モル比504010、分子量10䞇 ・ 3′4′−テトラ−第ブチルペル
オキシカルボニルベンゟプノン以䞋
BTTBずいう 衚に瀺す郚 ・ 4′−ビスゞ゚チルアミノベンゟプ
ノン以䞋EMKずいう 〃郚 ・ ベンゟプノン以䞋BPずいう 〃郚 ・ ゞ−第ブチルペルオキシむ゜フタレヌト
以䞋PBIFずいう 〃郚 ・ メチルセロ゜ルブ 1800郚 この感光性基板にステツプタブレツトコダツ
ク(æ ª)補No.を重ねお真空密着し、60cmの距離か
ら2K.W.の超高圧氎銀灯で1.5秒間露光した埌、
垂販のアルカリ珟像液富士写真フむルム(æ ª)補
DN−3C氎垌釈品で珟像を行ない、也燥埌に埗
られるステツプタブレツトによる露光郚分の段数
を目芖の刀断で求め、これを初期感床ずした。結
果を衚に瀺す。なお段数は数倀が倧きいほど高
感床であるこずを瀺し、段差があるず感床は
倍になる。 次に、露光前の感光性基板を55℃の保枩噚䞭に
48時間静眮した埌、前蚘ず同様に露光埌珟像を行
ない安定性を調べた。結果を衚に瀺す。なお、
ここで「正垞」は露光埌に正垞に珟像できるもの
を瀺し、「䞍胜」は「カブリ」が出お正垞な珟像
が䞍可胜なこずを瀺す。
[Industrial Application Field] The present invention relates to a highly sensitive photopolymerizable composition. By applying this composition to various substrates, it has a wide range of uses as an image forming material such as printing plate materials, contact films for plate making, masking films, proof papers, recording films, and photoresists. [Prior Art] Conventionally, as a means of increasing the sensitivity of photopolymerizable compositions to light, there has been a method of adding 4,4'-bis(dimethylamino)benzophenone (common name: Michler's ketone) to benzophenone (for example, Kiyomi Kato, Shoji Nakahara, "Introduction to UV Curing Technology," p. 65, Kobunshi Publishing Co., Ltd. (1984)) and a method of adding an organic peroxide to this method (Japanese Patent Application Laid-open No. 60-35725), which certainly have an effect on the polymerization rate. However, the sensitivity obtained with the former is not sufficient for use in photoresists and other applications, and with the latter, when the amount of organic peroxide required to obtain high sensitivity is used, the photosensitive resin liquid and coating The stability over time (hereinafter simply referred to as stability), including thermal stability, of the resulting film is not sufficient. Furthermore, JP-A-60-76503 describes a photoinitiator composition that uses a special organic peroxide and an organic dye compound, but this also has high sensitivity but is not as stable as above. Not enough. [Problems to be solved by the invention] Sensitivity is the most important characteristic of photopolymerizable compositions, and even when work efficiency is taken into account, the appearance of products with higher sensitivity is currently awaited. . In addition, if the stability of the photopolymerizable composition is insufficient, when the drying temperature after applying the photosensitive liquid is high,
Exposure time is not constant, which causes variations in quality and makes it impossible to obtain clear images with good reproducibility.
A so-called "fogging" phenomenon occurs. An object of the present invention is to obtain a photopolymerizable composition which is highly sensitive and has improved stability of a photosensitive solution and a coated film. [Means for Solving the Problems] The present inventors have achieved photopolymerization with high sensitivity and excellent stability by using a combination of a specific organic peroxide and a photosensitizer as a photopolymerization initiator. The inventors have discovered that a sexual composition can be obtained, leading to the present invention. That is, the present invention relates to a compound having an ethylenically unsaturated double bond, a benzophenone group-containing polyhydric peroxyester represented by the following general formula (), and a 4,4'-bis(dialkylamino) represented by the general formula (). The present invention provides a highly sensitive photopolymerizable composition containing a photopolymerization initiator consisting of benzophenone. General formula () [In the formula, R 1 and R′ 1 each have a carbon number of 4 to 8
tertiary alkyl group, or a tertiary alkyl group having 9 to 12 carbon atoms
The aralkyl groups R 2 and R' 2 each represent a hydrogen atom, a tertiary alkoxy group having 4 to 8 carbon atoms, or a tertiary aralkyloxy group having 9 to 12 carbon atoms. ] General formula () [However, R represents an alkyl group, a cycloalkyl group, or a hydroxyalkyl group having 1 to 6 carbon atoms. ] The compound having an ethylenically unsaturated double bond used in the present invention may be any compound that can be polymerized with a photopolymerization initiator, such as acrylic acid, methacrylic acid, itaconic acid, maleic acid and its anhydride, phthalate, etc. Acids and their anhydrides, unsaturated acids such as fumaric acid, methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, glycidyl (meth)acrylate, hydroxyethyl (meth)acrylate, Unsaturated acid esters such as dimethyl maleate, diethyl maleate, dimethyl fumarate, pentaerythritol tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, ethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, etc. and styrene, acrylamide, acrylonitrile, N-vinylpyrrolidone, vinyl acetate, and various unsaturated polyesters, unsaturated polyethers, unsaturated polyurethanes, and (meth)acrylate compounds having epoxy groups. In addition, the general formula () used as a photopolymerization initiator in the present invention [In the formula, R 1 and R′ 1 each have a carbon number of 4 to 8
tertiary alkyl group, or a tertiary alkyl group having 9 to 12 carbon atoms
The aralkyl groups R 2 and R' 2 each represent a hydrogen atom, a tertiary alkoxy group having 4 to 8 carbon atoms, or a tertiary aralkyloxy group having 9 to 12 carbon atoms. ] Examples of benzophenone group-containing polyhydric peroxyesters include 3,3',4,4'-tetra-(tert-butylperoxycarbonyl)benzophenone, 3,3',4,4'-tetra-( tertiary amylperoxycarbonyl)benzophenone, 3,
3',4,4'-tetra(tertiary hexylperoxycarbonyl)benzophenone, 3,3',4,4'-tetra(tertiary octylperoxycarbonyl)benzophenone, 3,3',4,4'-tetra( cumylperoxycarbonyl)benzophenone, 3,3′,
4,4'-tetra(p-isopropylcumylperoxycarbonyl)benzophenone, and the like. General formula () used in the present invention [However, R represents an alkyl group, a cycloalkyl group, or a hydroxyalkyl group having 1 to 6 carbon atoms. ] Examples of the compounds represented by include 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-bis(dicyclohexylamino)benzophenone,
Examples include 4,4'-bis(dihydroxyethylamino)benzophenone. Among these, 4,4'-bis(dimethylamino)benzophenone and 4,4'-
Particularly preferred is bis(diethylamino)benzophenone. The blending ratio of each of the above components is 0.01 to 0.01 to 100 parts by weight of the compound having an ethylenically unsaturated double bond, and the benzophenone group-containing polyhydric peroxyester represented by the general formula () and the compound represented by the general formula (), respectively. 100 parts by weight, preferably 0.1 to 30 parts by weight, particularly preferably 1 to 30 parts by weight. The compounding ratio of compound (a) represented by general formula () and compound (b) represented by general formula () is a:b in weight ratio.
is preferably 1:10 to 10:1. A photopolymerizable composition with excellent performance cannot be obtained outside the range of the above-mentioned blending amount and blending ratio. The photopolymerizable composition of the present invention has as an essential component a compound having an ethylenically unsaturated double bond that is polymerizable with the photopolymerization initiator, but may optionally include a binder resin, a polymerization inhibitor, a dye, etc. can be used by appropriately blending them. Binder resin is used as a coating film forming aid for printing plate materials and photoresists for the purpose of improving physical properties, and is usually used in an amount of 50 to 500 parts by weight per 100 parts by weight of a compound having an ethylenically unsaturated double bond. It is preferable to use it in moderation. Examples of the binder resin include (meth)acrylate resin, vinylpyrrolidone resin, and vinyl alcohol resin, and the resin may or may not contain a polymeric group. Examples of polymerization inhibitors include p-methoxyphenol and hydroquinone, and examples of dyes include brilliant green, ethyl violet, eosin, and erythrosin B. The photopolymerizable composition of the present invention is used as a photosensitive resin sheet by coating on various substrates,
At this time, the photopolymerizable composition is methyl ethyl ketone,
Dilute it approximately 5 to 100 times with a solvent such as isopropanol or methyl cellosolve, and apply it on the substrate using a method such as spin coating, roll coating, or bar coating.
It is used by applying it evenly to a thickness of 0.5 to 50 ÎŒm. The thus obtained photosensitive resin sheet undergoes a photopolymerization reaction by being irradiated with actinic light such as ultraviolet rays, and a predetermined image is obtained by developing the sheet. [Effects of the Invention] The photopolymerizable composition of the present invention uses a combination of the compound represented by the general formula () and the compound represented by the general formula () as a photopolymerization initiator. It has significantly higher sensitivity than other compositions, and also has superior stability. Therefore,
It can be used in many photopolymerization reactions, and can be applied to a wide variety of fields such as various image forming materials, photocurable resins, paints, and printing inks. [Examples] The present invention will be explained in more detail below using Examples and Comparative Examples. Parts in the examples indicate parts by weight. Examples 1 to 2 and Comparative Examples 1 to 3 A photosensitive liquid was prepared by uniformly mixing photopolymerizable compositions having the following composition. These photosensitive solutions were applied onto a grained anodized aluminum plate using a whirler so that the dry film thickness was 2 Όm, and dried at 40° C. for 5 minutes to obtain a photosensitive substrate. - 100 parts of epoxy acrylate (EA-800 manufactured by Shin-Nakamura Chemical Co., Ltd.) - 100 parts of poly(butyl acrylate/ethyl acrylate/methacrylic acid) (mole ratio 50/40/10, molecular weight 100,000) - 3,3',4,4'-tetra-(tert-butylperoxycarbonyl)benzophenone (hereinafter
Parts shown in Table 1: 4,4'-bis(diethylamino)benzophenone (hereinafter referred to as EMK) Parts: Benzophenone (hereinafter referred to as BP) Parts: Di-tert-butylperoxyisophthalate (hereinafter referred to as PBIF) 1,800 parts of methyl cellosolve A step tablet (No. 2 manufactured by Kodaku Corporation) was placed on top of this photosensitive substrate and adhered in vacuum, and exposed for 1.5 seconds with a 2K.W. ultra-high pressure mercury lamp from a distance of 60cm.
Commercially available alkaline developer (manufactured by Fuji Photo Film Co., Ltd.)
Development was carried out with DN-3C (water-diluted product), and after drying, the number of steps in the exposed area by the step tablet obtained was determined by visual judgment, and this was taken as the initial sensitivity. The results are shown in Table 1. The higher the number of steps, the higher the sensitivity.If there is a difference of 2 steps, the sensitivity will be 2.
Double. Next, place the photosensitive substrate before exposure in a heat insulator at 55℃.
After standing still for 48 hours, post-exposure development was performed in the same manner as above to examine stability. The results are shown in Table 1. In addition,
Here, "normal" indicates that normal development is possible after exposure, and "impossible" indicates that "fogging" occurs and normal development is impossible.

【衚】 画像ができない。 党く感光しない。
衚の結果から明らかなように、BTTBず
EMKずを䜵甚する本発明のものは、いずれも比
范䟋のものより高感床でありたた安定性も優れお
いる。なお、本発明はBTTBずEMKの盞乗効果
によるこずは比范䟋および比范䟋から明らか
であるが、さらに、実斜䟋においお、EMK5郚
に察し同䞀分子内にベンゟプノン基ずペルオキ
シ基ずを有するBTTBを郚ずいう小量甚いる
こずで、比范䟋においおBPずPBIFを別々に合
蚈34郚も甚いた堎合よりも著しく優れた性胜が埗
られるこずでも、その優れた盞乗効果が認められ
る。 実斜䟋および比范䟋〜 䞋蚘の配合組成の感光液を実斜䟋に準じお調
補し、これを塗工玙䞉菱補玙(æ ª)補、パヌルコヌ
ト100䞊に、バヌコヌタヌを甚いお也燥塗膜
厚が1ÎŒmになるように均䞀に塗垃し、也燥を行な
぀お感光性シヌトを埗た。この感光性シヌトを甚
いお、珟像に氎を甚いた以倖は実斜䟋ず同様に
しお、初期感床および安定性を調べた。それらの
結果を衚に瀺す。 ・ ペンタ゚リスリトヌルトリアクリレヌト
100郚 ・ ポリ−−ビニルピロリドン分子量36䞇
100郚 ・ BTTB 衚に瀺す〃 ・ 4′−ビスゞメチルアミノベンゟプ
ノン以䞋MKずいう 〃 〃 ・ BP 〃 〃 ・ PBIF 〃 〃 ・ メチルセロ゜ルブ 5000〃
[Table] *Image cannot be taken. **Not exposed to light at all.
As is clear from the results in Table 1, BTTB and
All of the products of the present invention that are used in combination with EMK have higher sensitivity and better stability than those of comparative examples. It is clear from Comparative Examples 1 and 2 that the present invention is based on the synergistic effect of BTTB and EMK, but in addition, in Example 1, 5 parts of EMK have a benzophenone group and a peroxy group in the same molecule. The excellent synergistic effect is also recognized by the fact that by using a small amount of 8 parts of BTTB, a significantly superior performance is obtained than when 34 parts of BP and PBIF were used separately in Comparative Example 3. Example 3 and Comparative Examples 4 to 5 A photosensitive solution having the following composition was prepared according to Example 1, and coated on coated paper (Pearl Coat #100, manufactured by Mitsubishi Paper Mills Co., Ltd.) using a bar coater. A photosensitive sheet was obtained by uniformly applying the film to a dry film thickness of 1 ÎŒm and drying. Using this photosensitive sheet, the initial sensitivity and stability were examined in the same manner as in Example 1 except that water was used for development. The results are shown in Table 2.・Pentaerythritol triacrylate
100 parts/Poly-N-vinylpyrrolidone (molecular weight 360,000)
100 parts ・ BTTB Shown in Table 2 ・ 4,4'-bis(dimethylamino)benzophenone (hereinafter referred to as MK) 〃 〃 ・ BP 〃 〃 ・ PBIF 〃 〃 ・ Methyl cellosolve 5000〃

【衚】 衚の結果から、本発明のものは比范䟋のもの
より高感床で安定性も優れおいるこずが明らかで
ある。 実斜䟋および比范䟋〜 䞋蚘の配合組成の感光液を実斜䟋ず準じお調
補し、これを鏡面に近く研磚した銅板日本テス
トパネル工業(æ ª)補、JISH3100C1100P䞊に、
回転塗垃機を甚いお也燥塗膜厚が5ÎŒmになるよう
に均䞀に塗垃し、也燥を行な぀お感光性銅板を埗
た。この感光性銅板を甚いお、珟像にむ゜プルパ
ノヌル氎重量比5050を甚いた以倖は実斜
䟋ず同様にしお、初期感床および安定性を調べ
た。それらの結果を衚に瀺す。 ・ トリメチロヌルプロパントリアクリレヌト
50郚 ・ ポリメチルメタクリレヌトメタクリル
酞モル比5050、分子量䞇 150郚 ・ 3′4′−テトラ第ヘキシルペル
オキシカルボニルベンゟプノン以䞋
BTTHずいう 衚に瀺す郚 ・ EMK 〃 〃 ・ BP 〃 〃 ・ PBIF 〃 〃 ・ −トリ−メトキシプニル
チアピリリりムフルオロボレヌト以䞋MTF
ずいう 衚に瀺す郚 ・ ゚チルバむオレツト 〃 ・ −メトキシプノヌル 0.1〃 ・ メチル゚チルケトン 500〃 ・ む゜プロパノヌル 500〃
[Table] From the results in Table 2, it is clear that the samples of the present invention have higher sensitivity and better stability than those of the comparative examples. Example 4 and Comparative Examples 6 to 7 A photosensitive solution having the following composition was prepared according to Example 1, and it was coated on a copper plate (JISH3100 (C1100P) manufactured by Japan Test Panel Industry Co., Ltd.) polished to a near mirror surface. To,
The coating was applied uniformly using a rotary coating machine so that the dry coating thickness was 5 ÎŒm, and the coating was dried to obtain a photosensitive copper plate. Using this photosensitive copper plate, the initial sensitivity and stability were examined in the same manner as in Example 1, except that isopropanol/water (weight ratio 50/50) was used for development. The results are shown in Table 3.・Trimethylolpropane triacrylate
50 parts Poly(methyl methacrylate/methacrylic acid) (mole ratio 50/50, molecular weight 80,000) 150 parts 3,3',4,4'-tetra(tertiary hexylperoxycarbonyl)benzophenone (hereinafter
BTTH) The parts shown in Table 3 EMK 〃 〃 ・ BP 〃 〃 ・ PBIF 〃 〃 ・ 2,4,6-tri(4-methoxyphenyl)
Thiapyrylium fluoroborate (MTF)
) Ethyl violet 2〃 ・ P-methoxyphenol 0.1〃 ・ Methyl ethyl ketone 500〃 ・ Isopropanol 500〃

【衚】 衚の結果から、本発明のものは比范䟋およ
びEMKの代わりに特殊な有機染料を甚いた比范
䟋のものより高感床で安定性も優れおいるこず
が明らかである。
[Table] From the results in Table 3, it is clear that the product of the present invention has higher sensitivity and better stability than Comparative Example 6 and Comparative Example 7 in which a special organic dye was used instead of EMK.

Claims (1)

【特蚱請求の範囲】  ゚チレン性䞍飜和二重結合を有する化合物ず
䞋蚘䞀般匏で瀺されるベンゟプノン基含
有倚䟡ペルオキシ゚ステル及び䞀般匏で瀺
される4′−ビスゞアルキルアミノベンゟ
プノンからなる光重合開始剀ずを含有する高感
床光重合性組成物。 䞀般匏 〔匏䞭R1およびR′1はそれぞれ炭玠数から
の第アルキル基、たたは炭玠数から12の第
アラルキル基、R2およびR′2はそれぞれ氎玠原子
たたは炭玠数からの第アルコキシ基たたは
炭玠数から12の第アラルキルオキシ基を衚わ
す。〕 䞀般匏 〔䜆し、は炭玠数からのアルキル基、シ
クロアルキル基たたはヒドロキシアルキル基を衚
わす。〕
[Scope of Claims] 1. A compound having an ethylenically unsaturated double bond, a benzophenone group-containing polyhydric peroxyester represented by the following general formula (), and a 4,4'-bis(dialkylamino) represented by the general formula (). ) A highly sensitive photopolymerizable composition containing a photopolymerization initiator consisting of benzophenone. general formula [In the formula, R 1 and R′ 1 each have a carbon number of 4 to 8
tertiary alkyl group, or a tertiary alkyl group having 9 to 12 carbon atoms
The aralkyl groups R 2 and R' 2 each represent a hydrogen atom, a tertiary alkoxy group having 4 to 8 carbon atoms, or a tertiary aralkyloxy group having 9 to 12 carbon atoms. ] General formula [However, R represents an alkyl group, a cycloalkyl group, or a hydroxyalkyl group having 1 to 6 carbon atoms. ]
JP16300185A 1985-07-25 1985-07-25 Photopolymerizable composition having high sensitivity Granted JPS6224240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16300185A JPS6224240A (en) 1985-07-25 1985-07-25 Photopolymerizable composition having high sensitivity

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16300185A JPS6224240A (en) 1985-07-25 1985-07-25 Photopolymerizable composition having high sensitivity

Publications (2)

Publication Number Publication Date
JPS6224240A JPS6224240A (en) 1987-02-02
JPH0466349B2 true JPH0466349B2 (en) 1992-10-22

Family

ID=15765310

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16300185A Granted JPS6224240A (en) 1985-07-25 1985-07-25 Photopolymerizable composition having high sensitivity

Country Status (1)

Country Link
JP (1) JPS6224240A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63206741A (en) * 1987-02-24 1988-08-26 Mitsubishi Gas Chem Co Inc Photosensitive polymer composition
US5184027A (en) * 1987-03-20 1993-02-02 Hitachi, Ltd. Clock signal supply system
JP2751453B2 (en) * 1989-09-05 1998-05-18 日本油脂株匏䌚瀟 Photopolymerization initiator
JP3860340B2 (en) * 1998-06-08 2006-12-20 新日鐵化孊株匏䌚瀟 Photopolymerizable resin composition
KR100349600B1 (en) * 1998-08-18 2002-11-18 죌식회사 엘지화학 Triazine compound containing benzophenone group and photoinitiator containing the same
JPWO2023282045A1 (en) * 2021-07-05 2023-01-12

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035725A (en) * 1983-08-09 1985-02-23 Fuji Photo Film Co Ltd Photopolymerizable composition

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6035725A (en) * 1983-08-09 1985-02-23 Fuji Photo Film Co Ltd Photopolymerizable composition

Also Published As

Publication number Publication date
JPS6224240A (en) 1987-02-02

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