JPH0465055A - Charge beam radiation apparatus - Google Patents
Charge beam radiation apparatusInfo
- Publication number
- JPH0465055A JPH0465055A JP17717590A JP17717590A JPH0465055A JP H0465055 A JPH0465055 A JP H0465055A JP 17717590 A JP17717590 A JP 17717590A JP 17717590 A JP17717590 A JP 17717590A JP H0465055 A JPH0465055 A JP H0465055A
- Authority
- JP
- Japan
- Prior art keywords
- charged beam
- beam gun
- cooling panel
- section
- high vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005855 radiation Effects 0.000 title 1
- 238000001816 cooling Methods 0.000 claims abstract description 15
- 239000002826 coolant Substances 0.000 claims abstract 3
- 239000007789 gas Substances 0.000 abstract description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 7
- 239000007788 liquid Substances 0.000 abstract description 3
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 3
- 230000000694 effects Effects 0.000 description 4
- 239000003507 refrigerant Substances 0.000 description 4
- 238000000605 extraction Methods 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、半導体の加工、評価９分析等に用いる荷電
ビーム照射装置に関し、特にその荷電ビームの安定化を
図ったものに関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a charged beam irradiation device used for semiconductor processing, evaluation and analysis, etc., and particularly to an apparatus in which the charged beam is stabilized.
第２図は従来の荷電ビーム照射装置を示す断面図であり
、図において、２は荷電ビーム銃部、３ハ荷電ヒ一ム銃
部内に設置された荷電ビーム銃、４は引き出し電極、５
は加速電極、６はガスであり、通常大気あるいは窒素ガ
スである。７は荷電ビーム８が照射される試料である。FIG. 2 is a sectional view showing a conventional charged beam irradiation device. In the figure, 2 is a charged beam gun section, 3 is a charged beam gun installed in the charging beam gun section, 4 is an extraction electrode, and 5 is a charged beam gun section.
is an accelerating electrode, and 6 is a gas, which is usually the atmosphere or nitrogen gas. 7 is a sample to which the charged beam 8 is irradiated.
ガス６は荷電ビーム銃部において、荷電ビーム銃部２に
取付けられた真空排気部１により排気している。The gas 6 is exhausted in the charged beam gun section by a vacuum evacuation section 1 attached to the charged beam gun section 2.
次に動作について説明する。Next, the operation will be explained.
従来の荷電ビーム照射装置は上記のように構成されてお
り、第２図の荷電ビーム銃部２にあるガス６を真空排気
部ｌによって電離、吸着することにより排気し、試料室
では例えばＩＱ’Ｐａ程度の圧力を持つガスを、荷電ビ
ーム銃部２では１×１０’−’Ｐａ程度の超高真空とな
るように減圧するので、荷電ビーム銃３から放出される
荷電ビーム８は安定に放出される。そしてこの荷電ビー
ム８は試料７に照射し、試料７を観察等するのに用いら
れる。The conventional charged beam irradiation apparatus is configured as described above, and the gas 6 in the charged beam gun section 2 shown in FIG. Since the gas having a pressure of about Pa is reduced to an ultra-high vacuum of about 1×10'-'Pa in the charged beam gun section 2, the charged beam 8 emitted from the charged beam gun 3 is stably emitted. be done. The charged beam 8 is then irradiated onto the sample 7 and used for observing the sample 7.
従来の荷電ビーム照射装置は以」−のように構成されて
おり、荷電ビーム銃部２内にある荷電ビ・−ム銃３を安
定稼働させるために、荷電ビーム銃部２内にあるガス６
を効率よく排気して高真空を得る必要があるが、荷電ビ
ーム銃部２の外に真空排気部１が付いているため、荷電
ビーム銃部２と真空排気部１に距離があり、排気効率が
よくないという問題点があった。A conventional charged beam irradiation device is configured as follows. In order to stably operate the charged beam gun 3 in the charged beam gun section 2, a gas 6 in the charged beam gun section 2 is used.
It is necessary to efficiently evacuate the charged beam to obtain a high vacuum, but since the vacuum evacuation section 1 is attached outside the charged beam gun section 2, there is a distance between the charged beam gun section 2 and the vacuum evacuation section 1, which reduces the pumping efficiency. The problem was that it was not good.
本発明は、上記のような問題点を解消するためになされ
たもので、排気効率を上げると同時に超高真空を得て荷
電ビーム銃３の安定稼働を可能にする荷電ビーム照射装
置を得ることを目的とする。The present invention has been made in order to solve the above-mentioned problems, and provides a charged beam irradiation device that improves exhaust efficiency and at the same time obtains an ultra-high vacuum to enable stable operation of the charged beam gun 3. With the goal.
本発明に係る荷電ビーム照射装置は、荷電ビーム銃部２
側壁を冷媒で冷却し、荷電ビーム銃部２のガス６を直接
凝縮、吸着し排気することにより、超高真空を効率よく
得て荷電ビーム銃３を安定稼働するものである。The charged beam irradiation device according to the present invention includes a charged beam gun section 2
By cooling the side wall with a refrigerant and directly condensing, adsorbing and exhausting the gas 6 in the charged beam gun section 2, an ultra-high vacuum can be efficiently obtained and the charged beam gun 3 can be stably operated.
本発明における荷電ビーム照射装置の荷電ビーム銃部２
は側壁の冷却部９により荷電ビーム銃部２のガス６が直
接排気されるため、す早く超高真空となり、荷電ビーム
が安定する。Charged beam gun section 2 of charged beam irradiation device in the present invention
Since the gas 6 in the charged beam gun section 2 is directly exhausted by the cooling section 9 on the side wall, an ultra-high vacuum is quickly created, and the charged beam becomes stable.
以下、この発明の実施例を図について説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第１図は本発明の一実施例による荷電ビーム照射装置を
示す断面図であり、図において、第２図と同一符号は従
来装置と全く同一のものである。FIG. 1 is a sectional view showing a charged beam irradiation device according to an embodiment of the present invention, and in the figure, the same reference numerals as in FIG. 2 are the same as those in the conventional device.
９は荷電ビーム銃部２の側壁全周にわたって、取付けら
れた冷却パネルである。Reference numeral 9 denotes a cooling panel attached to the entire circumference of the side wall of the charged beam gun section 2.
次に作用、効果について説明する。以上のように構成さ
れた荷電ビーム照射装置においては、荷電ビーム銃部２
の内壁冷却パネル９に冷媒として例えば液体窒素を循環
させ、冷却パネル９を極低温にするので、ガス６を冷却
パネル９表面に凝縮。Next, the action and effect will be explained. In the charged beam irradiation device configured as described above, the charged beam gun section 2
For example, liquid nitrogen is circulated as a refrigerant through the inner wall cooling panel 9 to bring the cooling panel 9 to an extremely low temperature, so that the gas 6 is condensed on the surface of the cooling panel 9.
吸着でき、真空度の測定が不可能な超高真空を容易に得
ることができる。It can be adsorbed, and ultra-high vacuum, which is impossible to measure the degree of vacuum, can be easily obtained.
なお、上記実施例では冷却パネル９を平板で示したが、
表面積を大きくする形状である程、良いことは言うまで
もない。In addition, although the cooling panel 9 was shown as a flat plate in the above embodiment,
Needless to say, the larger the surface area, the better.
また、冷媒に液体窒素を使用したものを示したが、極低
温を作る冷媒であればよく、上記実施例と同様の効果を
奏する。Furthermore, although liquid nitrogen is used as the refrigerant, any refrigerant that produces an extremely low temperature may be used, and the same effects as in the above embodiments can be achieved.
以上のように、本発明に係る荷電ビーム照射装置によれ
ば、冷却パネルを荷電ビーム銃部の側壁に構成したので
、荷電ビーム銃部で直接排気がてき、超高真空が得られ
荷電ビーム銃が安定する効果がある。As described above, according to the charged beam irradiation device according to the present invention, since the cooling panel is configured on the side wall of the charged beam gun section, the charged beam gun section can directly exhaust air, and an ultra-high vacuum can be obtained. It has a stabilizing effect.
第１図は本発明の一実施例による荷電ビーム照射装置を
示す断面図である。第２図は従来の荷電ビーム照射装置
を示す断面図である。
図において、ｌは真空排気部、２は荷電ビーム銃部、３
は荷電ビーム銃、４は引き出し電極、５は加速電極、６
はガス、７は試料、８は荷電ビーム、９は冷却パネルで
ある。
なお図中同一符号は同−又は相当部分を示す。FIG. 1 is a sectional view showing a charged beam irradiation device according to an embodiment of the present invention. FIG. 2 is a sectional view showing a conventional charged beam irradiation device. In the figure, 1 is a vacuum exhaust part, 2 is a charged beam gun part, and 3 is a vacuum pump part.
is a charged beam gun, 4 is an extraction electrode, 5 is an accelerating electrode, 6
is a gas, 7 is a sample, 8 is a charged beam, and 9 is a cooling panel. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (1)
等を備えた荷電ビーム照射装置において、冷媒により荷
電ビーム銃部の側壁を冷却する冷却パネルを備えたこと
を特徴とする荷電ビーム照射装置。(1) A charged beam irradiation device equipped with a charged beam gun, an accelerating electrode surface, a vacuum evacuation device section, etc., characterized in that it is equipped with a cooling panel that cools the side wall of the charged beam gun section with a coolant. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17717590A JPH0465055A (en) | 1990-07-02 | 1990-07-02 | Charge beam radiation apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17717590A JPH0465055A (en) | 1990-07-02 | 1990-07-02 | Charge beam radiation apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0465055A true JPH0465055A (en) | 1992-03-02 |
Family
ID=16026495
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17717590A Pending JPH0465055A (en) | 1990-07-02 | 1990-07-02 | Charge beam radiation apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0465055A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5019398U (en) * | 1973-06-16 | 1975-03-04 |
-
1990
- 1990-07-02 JP JP17717590A patent/JPH0465055A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5019398U (en) * | 1973-06-16 | 1975-03-04 |
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