JPH0461851U - - Google Patents

Info

Publication number
JPH0461851U
JPH0461851U JP10422590U JP10422590U JPH0461851U JP H0461851 U JPH0461851 U JP H0461851U JP 10422590 U JP10422590 U JP 10422590U JP 10422590 U JP10422590 U JP 10422590U JP H0461851 U JPH0461851 U JP H0461851U
Authority
JP
Japan
Prior art keywords
ion beam
section
trajectory
detection
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10422590U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10422590U priority Critical patent/JPH0461851U/ja
Publication of JPH0461851U publication Critical patent/JPH0461851U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
JP10422590U 1990-10-03 1990-10-03 Pending JPH0461851U (enExample)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10422590U JPH0461851U (enExample) 1990-10-03 1990-10-03

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10422590U JPH0461851U (enExample) 1990-10-03 1990-10-03

Publications (1)

Publication Number Publication Date
JPH0461851U true JPH0461851U (enExample) 1992-05-27

Family

ID=31849429

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10422590U Pending JPH0461851U (enExample) 1990-10-03 1990-10-03

Country Status (1)

Country Link
JP (1) JPH0461851U (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006041402A (ja) * 2004-07-29 2006-02-09 Sharp Corp イオンビーム発生装置、イオンビーム発生方法および機能素子の製造方法
JP2016501082A (ja) * 2012-12-03 2016-01-18 テトラ・ラヴァル・ホールディングス・アンド・ファイナンス・ソシエテ・アノニムＴｅｔｒａ Ｌａｖａｌ Ｈｏｌｄｉｎｇｓ ＆ Ｆｉｎａｎｃｅ Ｓ．Ａ． 複数の導体を有する電気センサを介して電子ビームを監視するためのデバイス

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006041402A (ja) * 2004-07-29 2006-02-09 Sharp Corp イオンビーム発生装置、イオンビーム発生方法および機能素子の製造方法
JP2016501082A (ja) * 2012-12-03 2016-01-18 テトラ・ラヴァル・ホールディングス・アンド・ファイナンス・ソシエテ・アノニムＴｅｔｒａ Ｌａｖａｌ Ｈｏｌｄｉｎｇｓ ＆ Ｆｉｎａｎｃｅ Ｓ．Ａ． 複数の導体を有する電気センサを介して電子ビームを監視するためのデバイス

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