JPH0460555U - - Google Patents

Info

Publication number
JPH0460555U
JPH0460555U JP10334390U JP10334390U JPH0460555U JP H0460555 U JPH0460555 U JP H0460555U JP 10334390 U JP10334390 U JP 10334390U JP 10334390 U JP10334390 U JP 10334390U JP H0460555 U JPH0460555 U JP H0460555U
Authority
JP
Japan
Prior art keywords
gas supply
supply pipe
processing apparatus
plasma processing
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10334390U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10334390U priority Critical patent/JPH0460555U/ja
Publication of JPH0460555U publication Critical patent/JPH0460555U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
JP10334390U 1990-10-02 1990-10-02 Pending JPH0460555U (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10334390U JPH0460555U (de) 1990-10-02 1990-10-02

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10334390U JPH0460555U (de) 1990-10-02 1990-10-02

Publications (1)

Publication Number Publication Date
JPH0460555U true JPH0460555U (de) 1992-05-25

Family

ID=31848175

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10334390U Pending JPH0460555U (de) 1990-10-02 1990-10-02

Country Status (1)

Country Link
JP (1) JPH0460555U (de)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63124238A (ja) * 1986-11-13 1988-05-27 Matsushita Electric Ind Co Ltd 光デイスク
JPH01111876A (ja) * 1987-10-26 1989-04-28 Hitachi Ltd プラズマ処理による薄膜形成装置
JPH0246857B2 (de) * 1980-04-14 1990-10-17 Kerunfuorushungusuanraage Yuuritsuhi Gmbh

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0246857B2 (de) * 1980-04-14 1990-10-17 Kerunfuorushungusuanraage Yuuritsuhi Gmbh
JPS63124238A (ja) * 1986-11-13 1988-05-27 Matsushita Electric Ind Co Ltd 光デイスク
JPH01111876A (ja) * 1987-10-26 1989-04-28 Hitachi Ltd プラズマ処理による薄膜形成装置

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