JPH0455752A - Quadrupole mass filter - Google Patents

Quadrupole mass filter

Info

Publication number
JPH0455752A
JPH0455752A JP2166507A JP16650790A JPH0455752A JP H0455752 A JPH0455752 A JP H0455752A JP 2166507 A JP2166507 A JP 2166507A JP 16650790 A JP16650790 A JP 16650790A JP H0455752 A JPH0455752 A JP H0455752A
Authority
JP
Japan
Prior art keywords
mass filter
rods
temperature
quadrupole mass
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2166507A
Other languages
Japanese (ja)
Other versions
JP2956139B2 (en
Inventor
Kazuo Yamanaka
一夫 山中
Kenichi Sakata
健一 阪田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yokogawa Electric Corp
Original Assignee
Yokogawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yokogawa Electric Corp filed Critical Yokogawa Electric Corp
Priority to JP2166507A priority Critical patent/JP2956139B2/en
Publication of JPH0455752A publication Critical patent/JPH0455752A/en
Application granted granted Critical
Publication of JP2956139B2 publication Critical patent/JP2956139B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To prevent the change of the passing characteristic of ions in a mass filter by providing a temperature detecting end in the vicinity of rods, and regulating a voltage which is applied on the rods based on the detected temperature signal from the detecting end. CONSTITUTION:The preset mass-number signal from a CPU 22 is sent into a controller driving circuit 23. The circuit 23 receives the command signal and applies a necessary voltages to rods 16a - 16d of a quadrupole mass filter 16. The temperature of the rods 16a - 16d of the mass filter 16 and the vicinity of the rods is detected with a temperature detecting end 21. The detected temperature signal is sent into a temperature compensating part 24. The temperature correcting value which is obtained by the operation is sent into the circuit 23. As a result, the circuit 23 applies the correcting voltage to the rods 16a - 16d. The regulating operation such as this is repeated. The deviation of the mass number caused by the temperature rising in the rods 16a - 16d of the mass filter 16 is automatically corrected with an electric circuit, i.e. the hardware.

Description

【発明の詳細な説明】 く産業上の利用分野〉 本発明は、高周波誘導コイルに高周波エネルギーを供給
し高周波磁界を形成して高周波誘導結合プラズマを生じ
させ該プラズマを利用して前記試料中の被測定元素を分
析する高周波Xi結合プラズマ分析装画(以下、rlc
P−MSJという)などに装着され前記プラズマで励起
されたイオンなどを通過させる四重極マスフィルタに関
する。
Detailed Description of the Invention Industrial Field of Application The present invention supplies high frequency energy to a high frequency induction coil to form a high frequency magnetic field to generate high frequency inductively coupled plasma, and utilizes the plasma to generate a high frequency inductively coupled plasma in the sample. High-frequency Xi-coupled plasma analysis equipment (rlc
This invention relates to a quadrupole mass filter that is attached to a P-MSJ (P-MSJ) and allows ions excited by the plasma to pass therethrough.

〈従来の技術〉 四重極マスフィルタは特定の質量比を有するイオンを通
過させる機構として多くの機器に組込まれて使用されて
いるが、ここでは、ICP−MSの一部として組み込ま
れて使用されている場合について説明する。
<Prior art> Quadrupole mass filters are incorporated into many devices and used as a mechanism for passing ions having a specific mass ratio, but here, they are incorporated and used as a part of ICP-MS. Let's explain the case where it is.

第2図は、I CP−MS17)−船釣な4111Is
、説明図である。この図において、プラズマトーチ1の
外室1bと最外室1Cにはガス調節器2を介してアルゴ
ンガス供給源3からアルゴンガスが供給され、内室1a
には試料導入装wI4内の固体試料がレーザ光195か
ら照射されたレーザ光によって気化されてのちキャリア
ガスであるアルゴンガスによって搬入されるようになっ
ている。尚、試料が液体の場合は、第2図の試料導入装
置14とレーザ光源5が除去され、導入される液体試料
を霧化してプラズマトーチ1の内W1aに供給するネプ
ライザが装着される。また、試料は固体であることより
も液体であることが多い。
Figure 2 shows I CP-MS17) - boat fishing 4111Is.
, is an explanatory diagram. In this figure, argon gas is supplied from an argon gas supply source 3 to an outer chamber 1b and an outermost chamber 1C of a plasma torch 1 via a gas regulator 2, and an inner chamber 1a
The solid sample in the sample introduction device wI4 is vaporized by the laser beam irradiated from the laser beam 195, and then introduced by argon gas, which is a carrier gas. If the sample is a liquid, the sample introducing device 14 and laser light source 5 shown in FIG. 2 are removed, and a nebulizer is installed to atomize the introduced liquid sample and supply it to W1a of the plasma torch 1. Also, the sample is more likely to be a liquid than a solid.

更に、プラズマトーチ1に巻回された高周波誘導コイル
6には^周波電源10によって高周波電流が流され、該
コイル6の周囲に高周波磁界(図示せず)が形成されて
いる。この状態で上記^周波磁界の近傍でアルゴンガス
中に電子かイオンが植え付番ノられると、a*周wt磁
界の作用によって瞬時に高周波誘導結合プラズマ7が生
ずる。
Further, a high frequency current is passed through a high frequency induction coil 6 wound around the plasma torch 1 by a frequency power source 10, and a high frequency magnetic field (not shown) is formed around the coil 6. In this state, when electrons or ions are implanted in the argon gas in the vicinity of the ^-frequency magnetic field, a high-frequency inductively coupled plasma 7 is instantaneously generated by the action of the a*-frequency wt magnetic field.

また、ノズル8とスキマー9に挟まれたフォアチャンバ
ー本体11内は、真空ポンプ12によって例えばITo
rr、に吸引されている。更に、センターチャンバー1
3内にはイオンレンズ14a、14b7%設Gノられる
と共に、該センターチャンバ−13の内部は第7油拡散
ポンプ15によって例えば10″″’Torr、に吸引
され、マスフィルタ(例えば四重極マスフィルタ)16
を収容しているリアチャンバー17内は第2油拡散ポン
プ18によって例えば10−’Torr、に吸引されて
いる。この状態で高周波lt導結合プラズマ中に上述の
ようにして気化された試料が導入され、イオン化や発光
が行われる。該プラズマ7内のイオンは、ノズル8ヤス
キマ−9を経由してのちイオンレンズ14a、14b(
ダブレット四重極レンズ)の間を通って収束され、四重
極マスフィルタ16に導入される。四重極マスフィルタ
16に入ったイオンのうち目的の質INN荷此のイオン
だけが、四重極マスフィルタを通過し二次電子増倍管1
9に導かれて検出される。この検出信号が信号処理部2
0に送出されて演算・処理されることによって、前記試
料中の被測定元素分析値が求められるようになっている
In addition, the inside of the forechamber body 11 sandwiched between the nozzle 8 and the skimmer 9 is heated by a vacuum pump 12, for example, by ITo.
It is attracted to rr. Furthermore, center chamber 1
Ion lenses 14a and 14b are provided in the center chamber 13, and the inside of the center chamber 13 is sucked to, for example, 10''' Torr by the seventh oil diffusion pump 15, and a mass filter (for example, a quadrupole mass filter) 16
The interior of the rear chamber 17 containing the oil is suctioned to, for example, 10-'Torr by the second oil diffusion pump 18. In this state, the sample vaporized as described above is introduced into the high-frequency LT coupled plasma, and ionization and light emission are performed. The ions in the plasma 7 pass through the nozzle 8 and the skimmer 9, and then enter the ion lenses 14a, 14b (
(double quadrupole lens) and is focused into the quadrupole mass filter 16. Of the ions entering the quadrupole mass filter 16, only ions of the desired quality INN pass through the quadrupole mass filter and enter the secondary electron multiplier 1.
9 to be detected. This detection signal is transmitted to the signal processing section 2.
The analysis value of the element to be measured in the sample can be obtained by sending the data to 0 and calculating and processing it.

〈発明が解決しようとする問題点〉 然るに、四m極マスフィルタを用いて高い質膳のイオン
を測定する場合、四重極マスフィルタ16のロッドに大
きな電圧を発生させるためには大きな電力を供給するこ
とが必要となる。このため、高質量のイオンを長時間測
定すると、四重極マスフィルタ16のロッド温度が上昇
し四本のロッドが彫版するようになる。その結果、四重
極マスフィルタの特性が変化し、実際に四aiNiマス
フィルタを通過するイオンと設定したイオンが異なるよ
うになる。従って、特に畠い質優のイオンを測定する場
合、イオンのピーク位置が変動してイオンの正しい測定
が困難になるという欠点があった。
<Problems to be Solved by the Invention> However, when measuring high quality ions using a quadrupole mass filter, a large amount of power is required to generate a large voltage in the rod of the quadrupole mass filter 16. It is necessary to supply Therefore, when high-mass ions are measured for a long time, the temperature of the rods of the quadrupole mass filter 16 increases and the four rods become engraved. As a result, the characteristics of the quadrupole mass filter change, and the ions that actually pass through the quadrupole mass filter and the set ions become different. Therefore, particularly when measuring ions of Yoshiyuki Hatake, there is a drawback that the peak position of the ions fluctuates, making accurate measurement of the ions difficult.

また、[!!1ffi極マスフィルタ16のロッドは高
置空中で動作するうえ、これらのロッドを保持するため
接触している部分の容積は小さい。よって、放熱性が思
いうえ温度も上昇し易くなっている。従って、四重極マ
スフィルタ16のロッドaimが上昇すると該ロッド間
の内接半径が大きくなり、四重極マスフィルタ16を透
過するイオンの容量が変化するようになる。このように
イオン透過特性が変化する結果、イオンの正しい測定が
困ガになるという欠点もあった。
Also,[! ! The rods of the 1ffi polar mass filter 16 operate at high altitudes in the air, and the volume of the parts in contact to hold these rods is small. Therefore, the heat dissipation is poor and the temperature is likely to rise. Therefore, when the rod aim of the quadrupole mass filter 16 rises, the inscribed radius between the rods increases, and the capacity of ions passing through the quadrupole mass filter 16 changes. As a result of this change in ion transmission characteristics, there is also the drawback that accurate measurement of ions becomes difficult.

本発明は、かかる状況に鑑みてなされものであり、その
課題は、四重極マスフィルタのイオンの通過特性が変化
しない四重極マスフィルタを提供することにある。
The present invention has been made in view of this situation, and its object is to provide a quadrupole mass filter in which the ion passage characteristics of the quadrupole mass filter do not change.

〈問題点を解決するための手段〉 本発明は、^周波誘導結合プラズマ分析装置などに使用
される四重極マスフィルタにおいて、ロッドの近傍に温
度検出端を設け、該検出端からの温度検出信号に基いて
前記ロッドに印加される電圧を調整することにある。
<Means for Solving the Problems> The present invention provides a quadrupole mass filter used in a frequency inductively coupled plasma analyzer, etc., in which a temperature detection end is provided near the rod, and temperature detection from the detection end is performed. The purpose is to adjust the voltage applied to the rod based on the signal.

〈作用〉 本発明は次のように作用する。<Effect> The invention works as follows.

即ら、CPUの設定質量数信号がマスフィルタのコント
ローラ・ドライブ回路に送られ、該コントローラ・ドラ
イブ回路は必要な電圧を四垂極マスフィルタのロッドに
印加する。また、四重極マスフィルタのロッドや周辺の
温度が一度検出端によって検出され、a!度補償部に送
出されて演算で1度補正値が求められて後、コントロー
ラ・ドライブ回路に送出される。その結果、コントロー
ラ・ドライブ回路は、ロッドに印加する電圧を補正して
四重極マスフィルタのロッドに印加する。このような調
節動作が繰返されて、画電極マスフィルタのロッドのa
i度上昇に起因する責最数のずれがハードウェアで自動
的に補正されるようになる。
That is, the CPU's set mass number signal is sent to the controller/drive circuit of the mass filter, and the controller/drive circuit applies the necessary voltage to the rod of the quadrupole mass filter. Also, once the temperature of the quadrupole mass filter rod and surrounding area is detected by the detection end, a! The correction value is sent to the degree compensator, a correction value is calculated once, and then sent to the controller/drive circuit. As a result, the controller drive circuit corrects the voltage applied to the rod and applies it to the rod of the quadrupole mass filter. This adjustment operation is repeated to adjust the rod a of the picture electrode mass filter.
The deviation in the maximum number of responsibilities due to the i degree increase will be automatically corrected by hardware.

〈実施例〉 以下、本発明について図を用いて七細に説明する。第1
図は本発明実施例の要部構成説明図であり、図中、16
a〜16dは四重極マスフィルタのロッド、21は例え
ばサーミスタのような温度検出端、22は例えばマイク
ロコンピュータの中央処理装置でなるCPU、23はC
PU22から設定質量数信号を受1ノで必要な電圧を四
重極マスフィルタ16のロッド16a〜16dに印加す
るマスフィルタのコントローラ・ドライブ回路、24は
温度検出端21の温度検出信号を受けて演粋により温度
補正値を求めてコントローラ・ドライブ回路23に送出
する温度補償部である。尚、CP U 22はシステム
構成に応じてスイッチや電圧電源であったりすることも
ある。
<Example> Hereinafter, the present invention will be described in detail with reference to the drawings. 1st
The figure is an explanatory diagram of the main part configuration of the embodiment of the present invention, and in the figure, 16
a to 16d are rods of quadrupole mass filters, 21 is a temperature detection end such as a thermistor, 22 is a CPU consisting of, for example, a central processing unit of a microcomputer, and 23 is a C
A mass filter controller/drive circuit 24 receives a set mass number signal from the PU 22 and applies a necessary voltage to the rods 16a to 16d of the quadrupole mass filter 16; This is a temperature compensation section that calculates a temperature correction value by calculation and sends it to the controller/drive circuit 23. Note that the CPU 22 may be a switch or a voltage power supply depending on the system configuration.

このような要部構成からなる本発明の実施例において、
CPU22から設定質量数信号がマスフィルタのコント
ローラ・ドライブ回路23に送られ、該コントローラ・
ドライブ回路23はこの司令信号を受けて必要な電圧を
四重極マスフィルタ16のロッド16a〜16dに印加
する。また、四重極マスフィルタ16のロッド16a〜
16dや該ロッド周辺の温度が温度検出端21によって
検出され、該温度検出信号は温度補償部24に送出され
演算で温度補正値が求められて後、コントローラ・ドラ
イブ回路23に送出される。その結果、コントローラ・
ドライブ回路23は、ロッド16a〜16dに印加する
電圧を補正し該補正電圧を四重極マスフィルタ16のロ
ッド16a〜16dに印加する。このような調節動作が
繰返されて、四重極マスフィルタ16のロッド16a〜
16dの温度上昇に起因プる質量数のずれが電気回路(
即ち、ハードウェア)で自動的に補正される。
In an embodiment of the present invention having such a main configuration,
A set mass number signal is sent from the CPU 22 to the controller/drive circuit 23 of the mass filter, and the controller/drive circuit 23 of the mass filter
The drive circuit 23 receives this command signal and applies a necessary voltage to the rods 16a to 16d of the quadrupole mass filter 16. In addition, the rods 16a of the quadrupole mass filter 16
16d and the temperature around the rod is detected by the temperature detection end 21, and the temperature detection signal is sent to the temperature compensator 24, where a temperature correction value is determined by calculation, and then sent to the controller/drive circuit 23. As a result, the controller
The drive circuit 23 corrects the voltages applied to the rods 16a to 16d and applies the corrected voltages to the rods 16a to 16d of the quadrupole mass filter 16. Such adjustment operations are repeated to adjust the rods 16a to 16a of the quadrupole mass filter 16.
The difference in mass number due to the temperature rise of 16d causes the electric circuit (
In other words, it is automatically corrected by hardware).

尚、本発明実施例の他の部分の動作は、第2図を用いて
詳述した前記従来例の場合と同一であるためここでの重
複説明は省略する。また、本発明は上述の実施例に限定
されることなく種々の変形が可能であり、例えば温度補
償部24をコンピュータのソフトウェアで処理しても良
い。
The operations of other parts of the embodiment of the present invention are the same as those of the prior art example described in detail with reference to FIG. 2, and therefore redundant explanation will be omitted here. Furthermore, the present invention is not limited to the above-described embodiments, and can be modified in various ways. For example, the temperature compensator 24 may be processed by computer software.

〈発明の効果〉 以上詳しく説明したように、本発明は、四重極マスフィ
ルタにおいて、四1極マスフィルタのロッド部の温度を
常時監視し、そのyArIIによるアライメント(寸法
)の変化量を補正するように四重極マスフィルタのロッ
ドへの印加電圧をW!lImする構成にした。
<Effects of the Invention> As explained in detail above, the present invention constantly monitors the temperature of the rod portion of the quadrupole mass filter and corrects the amount of change in alignment (dimensions) due to yArII. The voltage applied to the rod of the quadrupole mass filter is W! It was configured to perform lIm.

このため、^質量数のイオンを長時間測定する場合など
、四重極マスフィルタのロッド部の温度が上昇しても四
重極マスフィルタを透過するイオンの質量数が変化しな
い。従って、本発明によれば、四重極マスフィルタの温
度が変化しても該四重極マスフィルタを通過するイオン
の質量数が変化しない四重極マスフィルタが実現する。
For this reason, even when the temperature of the rod portion of the quadrupole mass filter increases, such as when measuring ions with a mass number of ^^ for a long time, the mass number of ions passing through the quadrupole mass filter does not change. Therefore, according to the present invention, a quadrupole mass filter is realized in which the mass number of ions passing through the quadrupole mass filter does not change even if the temperature of the quadrupole mass filter changes.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明実施例の要部構成説明図、第2図は高周
波誘導プラズマ111分析i!置のに一般装な構成説明
図である。 1・・・・・・プラズマトーチ、2・・・・・・流a 
u+ m部、3・・・・・・アルゴンガス供給源、4・
・・・・・試料セル、6・・・・・・高周波鱈導コイル
、 7・・・・・・高周波誘導結合プラズマ、8・・・・・
・ノズル、9・・・・・・スキマー、16・・・・・・
マスフィルタ、168〜16d・・・四重極マスフィル
タのロッド、17・・・・・・リアチャンバー、20・
・・・・・信号処理部、21・・・温度検出端、22・
・・CPU、23・・・四重極マスフィルタのコントロ
ーラ・ドライブ回路、24・・・温度補償部
FIG. 1 is an explanatory diagram of the main part configuration of an embodiment of the present invention, and FIG. 2 is a high-frequency induced plasma 111 analysis i! FIG. 1...Plasma torch, 2...Flow a
u+ m part, 3...Argon gas supply source, 4.
...Sample cell, 6...High frequency cod conduction coil, 7...High frequency inductively coupled plasma, 8...
・Nozzle, 9... Skimmer, 16...
Mass filter, 168-16d... Quadrupole mass filter rod, 17... Rear chamber, 20.
... Signal processing section, 21 ... Temperature detection end, 22.
...CPU, 23...Quadrupole mass filter controller/drive circuit, 24...Temperature compensation section

Claims (1)

【特許請求の範囲】 高周波誘導結合プラズマ分析装置などに使用される四重
極マスフィルタにおいて、 ロッドの近傍に温度検出端を設け、該検出端からの温度
検出信号に基いて前記ロッドに印加される電圧を調整す
ることを特徴とする四重極マスフィルタ。
[Claims] In a quadrupole mass filter used in a high-frequency inductively coupled plasma analyzer, etc., a temperature detection end is provided near a rod, and a temperature detection signal is applied to the rod based on a temperature detection signal from the detection end. A quadrupole mass filter characterized by adjusting the voltage applied to the quadrupole.
JP2166507A 1990-06-25 1990-06-25 Quadrupole mass filter Expired - Fee Related JP2956139B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2166507A JP2956139B2 (en) 1990-06-25 1990-06-25 Quadrupole mass filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2166507A JP2956139B2 (en) 1990-06-25 1990-06-25 Quadrupole mass filter

Publications (2)

Publication Number Publication Date
JPH0455752A true JPH0455752A (en) 1992-02-24
JP2956139B2 JP2956139B2 (en) 1999-10-04

Family

ID=15832632

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2166507A Expired - Fee Related JP2956139B2 (en) 1990-06-25 1990-06-25 Quadrupole mass filter

Country Status (1)

Country Link
JP (1) JP2956139B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05217548A (en) * 1992-01-31 1993-08-27 Shimadzu Corp Quadrupole type mass spectrometer
JPH10106484A (en) * 1996-09-30 1998-04-24 Shimadzu Corp Quadrupole mass spectrographic device
WO2008146440A1 (en) * 2007-05-30 2008-12-04 Shimadzu Corporation Time-of-flight mass spectrometer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05217548A (en) * 1992-01-31 1993-08-27 Shimadzu Corp Quadrupole type mass spectrometer
JPH10106484A (en) * 1996-09-30 1998-04-24 Shimadzu Corp Quadrupole mass spectrographic device
WO2008146440A1 (en) * 2007-05-30 2008-12-04 Shimadzu Corporation Time-of-flight mass spectrometer
US8013293B2 (en) 2007-05-30 2011-09-06 Shimadzu Corporation Time-of-flight mass spectrometer
JP4816794B2 (en) * 2007-05-30 2011-11-16 株式会社島津製作所 Time-of-flight mass spectrometer

Also Published As

Publication number Publication date
JP2956139B2 (en) 1999-10-04

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