JPH0450583B2 - - Google Patents
Info
- Publication number
- JPH0450583B2 JPH0450583B2 JP57053599A JP5359982A JPH0450583B2 JP H0450583 B2 JPH0450583 B2 JP H0450583B2 JP 57053599 A JP57053599 A JP 57053599A JP 5359982 A JP5359982 A JP 5359982A JP H0450583 B2 JPH0450583 B2 JP H0450583B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- photoconductive member
- atoms
- layer
- germanium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical group [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 42
- 238000009826 distribution Methods 0.000 claims description 34
- 125000005843 halogen group Chemical group 0.000 claims description 25
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 4
- 229910052801 chlorine Inorganic materials 0.000 claims description 4
- 239000000460 chlorine Substances 0.000 claims description 4
- 229910052731 fluorine Inorganic materials 0.000 claims description 4
- 239000011737 fluorine Substances 0.000 claims description 4
- 230000001747 exhibiting effect Effects 0.000 claims description 3
- 239000011159 matrix material Substances 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims 1
- 239000007789 gas Substances 0.000 description 85
- 230000015572 biosynthetic process Effects 0.000 description 18
- 238000000034 method Methods 0.000 description 17
- -1 silicon hydride compound Chemical class 0.000 description 16
- 229910052732 germanium Inorganic materials 0.000 description 12
- 239000002994 raw material Substances 0.000 description 12
- 238000004519 manufacturing process Methods 0.000 description 11
- 238000012546 transfer Methods 0.000 description 10
- 229910021417 amorphous silicon Inorganic materials 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000000151 deposition Methods 0.000 description 8
- 230000008021 deposition Effects 0.000 description 8
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 7
- QUZPNFFHZPRKJD-UHFFFAOYSA-N germane Chemical compound [GeH4] QUZPNFFHZPRKJD-UHFFFAOYSA-N 0.000 description 6
- 229910052986 germanium hydride Inorganic materials 0.000 description 6
- 229910052736 halogen Inorganic materials 0.000 description 6
- 238000003384 imaging method Methods 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 150000003377 silicon compounds Chemical class 0.000 description 6
- 238000004544 sputter deposition Methods 0.000 description 6
- 206010034972 Photosensitivity reaction Diseases 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
- 230000003247 decreasing effect Effects 0.000 description 5
- 150000002366 halogen compounds Chemical class 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 230000036211 photosensitivity Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 150000004820 halides Chemical class 0.000 description 4
- 229910052990 silicon hydride Inorganic materials 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 3
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910001120 nichrome Inorganic materials 0.000 description 3
- 229910052758 niobium Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 229910052715 tantalum Inorganic materials 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 2
- 206010047571 Visual impairment Diseases 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229910003691 SiBr Inorganic materials 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910003822 SiHCl3 Inorganic materials 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- KBDJQNUZLNUGDS-UHFFFAOYSA-N dibromosilicon Chemical compound Br[Si]Br KBDJQNUZLNUGDS-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000001590 germanediyl group Chemical group [H][Ge]([H])(*)* 0.000 description 1
- AHVNUGPIPKMDBB-UHFFFAOYSA-N germanium Chemical compound [Ge].[Ge].[Ge] AHVNUGPIPKMDBB-UHFFFAOYSA-N 0.000 description 1
- VGRFVJMYCCLWPQ-UHFFFAOYSA-N germanium Chemical compound [Ge].[Ge] VGRFVJMYCCLWPQ-UHFFFAOYSA-N 0.000 description 1
- 150000002291 germanium compounds Chemical class 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
- G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
- G03G5/08214—Silicon-based
- G03G5/08221—Silicon-based comprising one or two silicon based layers
- G03G5/08228—Silicon-based comprising one or two silicon based layers at least one with varying composition
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Light Receiving Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57053599A JPS58171038A (ja) | 1982-03-31 | 1982-03-31 | レーザー光用の光導電部材 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57053599A JPS58171038A (ja) | 1982-03-31 | 1982-03-31 | レーザー光用の光導電部材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58171038A JPS58171038A (ja) | 1983-10-07 |
| JPH0450583B2 true JPH0450583B2 (zh) | 1992-08-14 |
Family
ID=12947338
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57053599A Granted JPS58171038A (ja) | 1982-03-31 | 1982-03-31 | レーザー光用の光導電部材 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58171038A (zh) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6126054A (ja) * | 1984-07-16 | 1986-02-05 | Minolta Camera Co Ltd | 電子写真感光体 |
| US4749636A (en) * | 1985-09-13 | 1988-06-07 | Minolta Camera Kabushiki Kaisha | Photosensitive member with hydrogen-containing carbon layer |
| US4743522A (en) * | 1985-09-13 | 1988-05-10 | Minolta Camera Kabushiki Kaisha | Photosensitive member with hydrogen-containing carbon layer |
| US4741982A (en) * | 1985-09-13 | 1988-05-03 | Minolta Camera Kabushiki Kaisha | Photosensitive member having undercoat layer of amorphous carbon |
| US5166018A (en) * | 1985-09-13 | 1992-11-24 | Minolta Camera Kabushiki Kaisha | Photosensitive member with hydrogen-containing carbon layer |
| US4738912A (en) * | 1985-09-13 | 1988-04-19 | Minolta Camera Kabushiki Kaisha | Photosensitive member having an amorphous carbon transport layer |
| US5000831A (en) * | 1987-03-09 | 1991-03-19 | Minolta Camera Kabushiki Kaisha | Method of production of amorphous hydrogenated carbon layer |
| JP2722470B2 (ja) * | 1988-01-08 | 1998-03-04 | 富士ゼロックス株式会社 | 電子写真感光体 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56121041A (en) * | 1980-02-27 | 1981-09-22 | Fuji Photo Film Co Ltd | Electrophotographic receptor and its manufacture |
| JPS56150753A (en) * | 1980-04-23 | 1981-11-21 | Canon Inc | Image forming member for electrophotography |
| JPS5723544B2 (zh) * | 1977-10-18 | 1982-05-19 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55121239U (zh) * | 1979-02-21 | 1980-08-28 | ||
| JPS5723544U (zh) * | 1980-07-09 | 1982-02-06 |
-
1982
- 1982-03-31 JP JP57053599A patent/JPS58171038A/ja active Granted
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5723544B2 (zh) * | 1977-10-18 | 1982-05-19 | ||
| JPS56121041A (en) * | 1980-02-27 | 1981-09-22 | Fuji Photo Film Co Ltd | Electrophotographic receptor and its manufacture |
| JPS56150753A (en) * | 1980-04-23 | 1981-11-21 | Canon Inc | Image forming member for electrophotography |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58171038A (ja) | 1983-10-07 |