JPH0448622U - - Google Patents
Info
- Publication number
- JPH0448622U JPH0448622U JP10538490U JP10538490U JPH0448622U JP H0448622 U JPH0448622 U JP H0448622U JP 10538490 U JP10538490 U JP 10538490U JP 10538490 U JP10538490 U JP 10538490U JP H0448622 U JPH0448622 U JP H0448622U
- Authority
- JP
- Japan
- Prior art keywords
- rotor
- chamber
- substrate
- peripheral wall
- centrifugal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 claims description 7
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 230000002209 hydrophobic effect Effects 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 3
- 239000000463 material Substances 0.000 claims 1
Landscapes
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990105384U JP2507468Y2 (ja) | 1990-06-26 | 1990-10-05 | 横軸遠心式基板乾燥装置 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6824990 | 1990-06-26 | ||
| JP2-68249 | 1990-06-26 | ||
| JP1990105384U JP2507468Y2 (ja) | 1990-06-26 | 1990-10-05 | 横軸遠心式基板乾燥装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0448622U true JPH0448622U (fr) | 1992-04-24 |
| JP2507468Y2 JP2507468Y2 (ja) | 1996-08-14 |
Family
ID=31948658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990105384U Expired - Lifetime JP2507468Y2 (ja) | 1990-06-26 | 1990-10-05 | 横軸遠心式基板乾燥装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2507468Y2 (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06112186A (ja) * | 1992-09-25 | 1994-04-22 | Dainippon Screen Mfg Co Ltd | 横軸回転式基板乾燥装置 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59101190U (ja) * | 1982-12-23 | 1984-07-07 | 黒谷 信子 | 水切乾燥装置の上蓋 |
| JPS59185590U (ja) * | 1983-05-14 | 1984-12-10 | 黒谷 巌 | 水切乾燥装置の上蓋 |
| JPH01255227A (ja) * | 1988-04-04 | 1989-10-12 | Dainippon Screen Mfg Co Ltd | 基板の回転式表面処理装置 |
| JPH0239531A (ja) * | 1988-07-29 | 1990-02-08 | Tokyo Electron Ltd | 回転処理装置及び回転処理方法 |
-
1990
- 1990-10-05 JP JP1990105384U patent/JP2507468Y2/ja not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59101190U (ja) * | 1982-12-23 | 1984-07-07 | 黒谷 信子 | 水切乾燥装置の上蓋 |
| JPS59185590U (ja) * | 1983-05-14 | 1984-12-10 | 黒谷 巌 | 水切乾燥装置の上蓋 |
| JPH01255227A (ja) * | 1988-04-04 | 1989-10-12 | Dainippon Screen Mfg Co Ltd | 基板の回転式表面処理装置 |
| JPH0239531A (ja) * | 1988-07-29 | 1990-02-08 | Tokyo Electron Ltd | 回転処理装置及び回転処理方法 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06112186A (ja) * | 1992-09-25 | 1994-04-22 | Dainippon Screen Mfg Co Ltd | 横軸回転式基板乾燥装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2507468Y2 (ja) | 1996-08-14 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |