JPH0447692B2 - - Google Patents
Info
- Publication number
- JPH0447692B2 JPH0447692B2 JP14494486A JP14494486A JPH0447692B2 JP H0447692 B2 JPH0447692 B2 JP H0447692B2 JP 14494486 A JP14494486 A JP 14494486A JP 14494486 A JP14494486 A JP 14494486A JP H0447692 B2 JPH0447692 B2 JP H0447692B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- ether
- aromatic
- reaction
- polymerization
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 26
- -1 aromatic tricarboxylic acid Chemical class 0.000 claims description 14
- 125000003118 aryl group Chemical group 0.000 claims description 13
- 239000004962 Polyamide-imide Substances 0.000 claims description 11
- 229920002312 polyamide-imide Polymers 0.000 claims description 11
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 claims description 7
- 150000008065 acid anhydrides Chemical class 0.000 claims description 5
- 235000014113 dietary fatty acids Nutrition 0.000 claims description 5
- 229930195729 fatty acid Natural products 0.000 claims description 5
- 239000000194 fatty acid Substances 0.000 claims description 5
- 150000004665 fatty acids Chemical class 0.000 claims description 5
- 239000004305 biphenyl Substances 0.000 claims description 4
- 235000010290 biphenyl Nutrition 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 2
- 238000009833 condensation Methods 0.000 claims description 2
- 230000005494 condensation Effects 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 125000001424 substituent group Chemical group 0.000 claims description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 20
- 229920000642 polymer Polymers 0.000 description 17
- 238000006116 polymerization reaction Methods 0.000 description 15
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 13
- 150000001875 compounds Chemical class 0.000 description 11
- 239000000243 solution Substances 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 238000000465 moulding Methods 0.000 description 8
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 8
- 150000003384 small molecules Chemical class 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 150000004985 diamines Chemical class 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000004984 aromatic diamines Chemical class 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 150000000000 tetracarboxylic acids Chemical group 0.000 description 3
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000000748 compression moulding Methods 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000003733 fiber-reinforced composite Substances 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- UPGLMYCVFCOYJV-UHFFFAOYSA-N 1-phenoxy-4-(4-phenoxyphenyl)sulfonylbenzene Chemical compound C=1C=C(OC=2C=CC=CC=2)C=CC=1S(=O)(=O)C(C=C1)=CC=C1OC1=CC=CC=C1 UPGLMYCVFCOYJV-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- FGWQCROGAHMWSU-UHFFFAOYSA-N 3-[(4-aminophenyl)methyl]aniline Chemical compound C1=CC(N)=CC=C1CC1=CC=CC(N)=C1 FGWQCROGAHMWSU-UHFFFAOYSA-N 0.000 description 1
- XFDUHJPVQKIXHO-UHFFFAOYSA-N 3-aminobenzoic acid Chemical compound NC1=CC=CC(C(O)=O)=C1 XFDUHJPVQKIXHO-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- UITKHKNFVCYWNG-UHFFFAOYSA-N 4-(3,4-dicarboxybenzoyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 UITKHKNFVCYWNG-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229960004050 aminobenzoic acid Drugs 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- QYQADNCHXSEGJT-UHFFFAOYSA-N cyclohexane-1,1-dicarboxylate;hydron Chemical compound OC(=O)C1(C(O)=O)CCCCC1 QYQADNCHXSEGJT-UHFFFAOYSA-N 0.000 description 1
- YQLZOAVZWJBZSY-UHFFFAOYSA-N decane-1,10-diamine Chemical compound NCCCCCCCCCCN YQLZOAVZWJBZSY-UHFFFAOYSA-N 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 125000001142 dicarboxylic acid group Chemical group 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N tolylenediamine group Chemical group CC1=C(C=C(C=C1)N)N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- CYTQBVOFDCPGCX-UHFFFAOYSA-N trimethyl phosphite Chemical compound COP(OC)OC CYTQBVOFDCPGCX-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
Description
産業上の利用分野
本発明は芳香族ポリアミドイミドエーテルの製
造法に関し、更に詳しくは機械特性、耐熱性、加
工性等に優れた芳香族ポリアミドイミドエーテル
を効率良く製造する方法に関する。
従来の技術
トリメリツト酸無水物またはその官能性誘導体
と芳香族ジアミンまたはその官能性誘導体との反
応によつて、ポリトリメリトアミドイミドが得ら
れることは良く知られている。
特に芳香族ジアミン成分として4,4′−ジアミ
ノジフエニルエーテルを用いたポリトリメリトア
ミドイミドエーテルは、耐熱性高分子の中では耐
熱性、加工性、コスト等のバランスがかなり良く
とれており、ワニス、フイルム、成形用樹脂等の
名種用途で実用化されている。
しかし、このポリトリメリトアミドイミドエー
テルはその製造法に問題を抱えている。この問題
は例えばトリメリツト酸無水物と4,4′−ジアミ
ノジフエニルエーテルとの直接重合法によつて可
撓性被膜を形成し得るポリマーを得ようとする場
合に明確に現われる。すなわち、かかる重合は一
般に熔融重合法で行うのが困難であるため、N−
メチルピロリドンの如き高沸点極性溶媒を反応溶
媒というよりも可塑剤的に使用して高濃度下で熱
重合するが、4,4′−ジアミノジフエニルエーテ
ルを用いる場合には重合途中で重合溶液がにごつ
てきて、やがてはにごつたにかわ状となつてそれ
以上の重合が困難となり、高重合度ポリマーを得
ることができない。また重合溶液がにごつた後
は、溶媒を加えて希釈しても均一な溶液にならな
い。そこで、被膜を得る場合には低重合度ポリマ
ーの重合溶液を一旦希釈してドープとし、塗布し
た後250℃ぐらいの温度で後重合、硬化を行わせ
る方法をとらざるを得なくなる。しかし、この場
合加工性が充分あるとは言い難く、またポリマー
濃度がうすく被膜が溶媒によつて粗れるという新
たな問題が生じる危険がある。
発明の目的
本発明者は、この問題を解消しかつ機械特性、
耐熱性、加工性に優れた芳香族ポリアミドイミド
系ポリマーを得るべく鋭意検討した結果、芳香族
ジアミンとして3,4′−ジアミノジフエニルエー
テルを用いかつ反応を特定の化合物の存在下に行
うと、効率良く、上記ポリマーの得られることを
見出し、本発明に到達した。
従つて、本発明の目的は、機械特性、耐熱性、
加工性等に優れた芳香族ポリアミドイミドエーテ
ルを効率良く製造する方法を提供することにあ
る。
発明の構成・効果
本発明の目的は、本発明によれば、(A)芳香族ト
リカルボン酸及び/又はその酸無水物と(B)3,
4′−ジアミノジフエニルエーテル及び/又はその
低級脂肪酸アミドとを、(C)下記式(1)で表わされる
ジフエニル化合物、
Ar1−X−Ar1 …(1)
(ここで、Xは−O−,−SO2−,−CO−又は
アルキレン基であり、Ar1は置換基を有すること
のあるフエニル基である。)
の存在下で、加熱縮合せしめることを特徴とする
芳香族ポリアミドイミドエーテルの製造法によつ
て達成される。
本発明においてA成分として用いる芳香族トリ
カルボン酸は下記一般式で表わされる化合物で
ある。
(但し、式中Arは2つの結合手の位置が隣接
する、3価の芳香族基である)
上記一般式()におけるAr(3価の芳香族
基)としては、
INDUSTRIAL APPLICATION FIELD The present invention relates to a method for producing aromatic polyamideimide ether, and more specifically to a method for efficiently producing aromatic polyamideimide ether having excellent mechanical properties, heat resistance, processability, etc. BACKGROUND OF THE INVENTION It is well known that polytrimellitamideimides can be obtained by reacting trimellitic anhydride or its functional derivatives with aromatic diamines or their functional derivatives. In particular, polytrimellitamide imide ether, which uses 4,4'-diaminodiphenyl ether as the aromatic diamine component, has a good balance of heat resistance, processability, cost, etc. among heat-resistant polymers. It has been put into practical use for a variety of applications such as varnishes, films, and molding resins. However, this polytrimellitamide imide ether has a problem in its manufacturing method. This problem manifests itself, for example, when trying to obtain a polymer capable of forming a flexible film by direct polymerization of trimellitic anhydride and 4,4'-diaminodiphenyl ether. That is, since such polymerization is generally difficult to perform by melt polymerization, N-
A high-boiling polar solvent such as methylpyrrolidone is used as a plasticizer rather than a reaction solvent, and thermal polymerization is carried out at high concentrations. However, when 4,4'-diaminodiphenyl ether is used, the polymerization solution is removed during the polymerization. It becomes sticky and eventually becomes sticky and glue-like, making further polymerization difficult and making it impossible to obtain a polymer with a high degree of polymerization. Furthermore, once the polymerization solution becomes cloudy, even if a solvent is added to dilute it, it will not become a homogeneous solution. Therefore, in order to obtain a film, it is necessary to first dilute a polymerization solution of a low polymerization degree polymer to form a dope, apply it, and then perform post-polymerization and curing at a temperature of about 250°C. However, in this case, it cannot be said that the processability is sufficient, and there is a risk that a new problem may arise in that the polymer concentration is low and the coating becomes rough due to the solvent. OBJECT OF THE INVENTION The present inventor has solved this problem and has improved mechanical properties.
As a result of intensive studies to obtain an aromatic polyamideimide polymer with excellent heat resistance and processability, we found that when 3,4'-diaminodiphenyl ether is used as the aromatic diamine and the reaction is carried out in the presence of a specific compound, The inventors have discovered that the above polymer can be obtained efficiently and have arrived at the present invention. Therefore, the purpose of the present invention is to improve mechanical properties, heat resistance,
The object of the present invention is to provide a method for efficiently producing aromatic polyamideimide ether having excellent processability. Structure/Effects of the Invention According to the present invention, an object of the present invention is to provide (A) an aromatic tricarboxylic acid and/or its acid anhydride, (B) 3,
4'-diaminodiphenyl ether and/or its lower fatty acid amide, (C) a diphenyl compound represented by the following formula (1), Ar 1 -X-Ar 1 ... (1) (where X is -O -, -SO 2 -, -CO- or an alkylene group, and Ar 1 is a phenyl group that may have a substituent). This is achieved by the manufacturing method. The aromatic tricarboxylic acid used as component A in the present invention is a compound represented by the following general formula. (However, in the formula, Ar is a trivalent aromatic group in which two bond positions are adjacent to each other.) As Ar (trivalent aromatic group) in the above general formula (),
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】【formula】
【式】等が例示できる。こ れらのうち特に[Formula] etc. can be exemplified. child Among these, especially
【式】が好ましい。具体
的化合物としてはトリメリツト酸が特に好まし
い。
更に本発明においてA成分として用いる芳香族
トリカルボン酸の酸無水物は、上記一般式()
で表わされる化合物の酸無水物であり、特にトリ
メリツト酸無水物が好ましい。
本発明においては上記芳香族トリカルボン酸及
び/又はその酸無水の一部をジカルボン酸、テト
ラカルボン酸、テトラカルボン酸無水物等で置換
しても良い。かかる化合物の具体例としては、テ
レフタル酸、イソフタル酸、ナフタレンジカルボ
ン酸、ジフエニルジカルボン酸、コハク酸、アジ
ピン酸、セバチン酸、デカンジカルボン酸、シク
ロヘキサンジカルボン酸、ピロメリツト酸、ピロ
メリツト酸無水物、ジフエニルテトラカルボン
酸、ジフエニルテトラカルボン酸無水物、ベンゾ
フエノンテトラカルボン酸、ベンゾフエノンテト
ラカルボン酸無水物等があげられる。これらは全
酸成分当り、40モル%以下、更には30モル%以
下、特に20モル%以下で用いることが好ましい。
また、本発明においてB成分として用いるジア
ミンは3,4′−ジアミノジフエニルエーテルまた
はその低級脂肪酸アミドであり、これらはその一
部を他種ジアミンまたはその低級脂肪酸アミドで
置換しても良い。このアミドを形成する低級脂肪
酸としては例えば酢酸、プロピオン酸、酪酸等が
挙げられる。特に酢酸が好ましい。また他種ジア
ミンの具体例としてはp−フエニレンジアミン、
m−フエニレンジアミン、トリレンジアミン、
4,4′−ジアミノジフエニルメタン、4,4′−ジ
アミノジフエニルエーテル、3,4′−ジアミノジ
フエニルメタン、4,4′−ジアミノジフエニル、
3,3′−ジメチル−4,4′−ジアミノジフエニ
ル、4,4′−ジアミノベンゾフエノン、4,4′−
ジアミノジフエニルスルホン、エチレンジアミ
ン、テトラメチレンジアミン、ヘキサメチレンジ
アミン、デカメチレンジアミン等があげられる。
これらは全ジアミン成分当り40モル%以下、更に
は30モル%以下、特に20モル%以下で用いること
が好ましい。ジアミンの使用割合は、通常A成分
に対し実質的に当モルである。
本発明においてはA成分及びB成分とともに少
割合のアミノカルボン酸例えばp−アミノ安息香
酸、m−アミノ安息香酸等を併用し、共重合させ
ても良い。このアミノカルボン酸の割合は全繰返
し単位当り30%以下、特に20%以下が好ましい。
本発明においてはA成分とB成分とを、場合に
よつては更にアミノカルボン酸成分を用いて、(C)
沸点が30℃以上で、生成するポリマーと相溶性を
有しかつ該ポリマーと実質的に非反応性である低
分子化合物の存在下で、加熱縮合させるが、この
低分子化合物(C)としては分子量1000以下、更には
800以下のものが好ましい。
本発明では、かかる低分子化合物(C)として、上
記式(1)で表わされるジフエニル化合物が使用され
る。かかる化合物としては、例えばジフエニルス
ルホン、4,4′−ジフエノキシジフエニルスルホ
ン、4,4′−ビス(4−または3−または2−ク
ロロフエノキシ)ジフエニルスルホン、4,4′−
ビス(4−または3−または2−フエニルフエノ
キシ)ジフエニルスルホン、4,4′−ビス(4−
または3−または2−tブチルフエノキシ)ジフ
エニルスルホン、4,4′−ビス(4−または3−
または2−オクチルフエノキシ)ジフエニルスル
ホン、4,4′−ビス(αまたはβ−ナフチルオキ
シ)ジフエニルスルホン等を挙げることができ
る。
これらのうち特にジフエニルスルホンが好まし
い。
本発明においてC成分の低分子化合物は、生成
するポリマーに対し好ましくは5〜200重量%、
より好ましくは10〜100重量%、特に好ましくは
20〜70重量%の割合で用いる。
A成分とB成分との、場合によつては更にアミ
ノカルボン酸成分を用いての、反応は通常200〜
350℃、好ましくは250〜320℃、特に好ましくは
260〜310℃の温度で、反応によつて生成する水を
系外に留去させながら行う。その際反応雰囲気は
常圧、加圧、減圧のいずれでも良い。常圧反応の
場合、窒素ガス、アルゴンガス等の如き不活性ガ
スの雰囲気下で行うのが好ましい。また、反応に
は、触媒、安定剤等を用いるのが好ましい。この
触媒としては各種のリン化合物、ホウ素化合物、
ヘテロポリ酸等が挙げられる。具体的にはトリメ
チルホスフアイト、トリエチルホスフアイト、ト
リフエニルホスフアイト、リン酸、トリフエニル
フオスフイン、ホウ酸等を例示できる。安定剤と
しては例えばヒンダードフエノール系酸化安定剤
が挙げられる。
かくして、所望の重合度、特に高重合度の芳香
族ポリアミドエーテルが低分子化合物との混合状
態で得られる。該芳香族ポリアミドイミドエーテ
ルは低分子化合物との混合物として成形に供する
ことができ、また低分子化合物と分離してから成
形に供することもできる。低分子化合物の分離
は、該低分子化合物のみを溶解する有機溶剤によ
る抽出処理等の処理で行うと良い。この有機溶剤
としては芳香族炭化水素、ハロゲン化脂肪族炭化
水素、脂肪族ケトン、脂肪族エーテル、環状エー
テル等が好ましく例示でき、更に具体的にはトル
エン、キシレン、塩化メチレン、クロロホルム、
アセトン、メチルエチルケトン、メチルアセテー
ト、エチルアセテート、ジオキサン等が好ましく
例示できる。芳香族ポリアミドイミドエーテルに
対する低分子化合物(C)の相溶性は、従来の反応溶
媒に比して、著しく大きいから、本発明において
は反応生成物中の芳香族ポリアミドイミドエーテ
ル濃度を高くすることができる。この場合、ポリ
マーの濃度調整を実施せずに反応生成物をその
まゝ成形に供することができる。
本発明で得られる芳香族ポリアミドイミドエー
テルは、全繰返し単位の60モル%以上が下記式
但し、各()内の式は各々独立に左右逆向きに
なつていてもよい。
で表わされる繰返し単位、特に下記式
但し、各()内の式は各々独立に左右逆向きに
なつていてもよい。
で表わされる繰返し単位よりなるポリマーである
ことが好ましい。
本発明で得られる芳香族ポリアミドイミドエー
テルはワニス、接着剤、フイルム、繊維、繊維強
化複合材用マトリツクス樹脂、圧縮成形用、押出
し成形用、射出成形用等の成形樹脂等の広範な用
途に用いることが出来る。例えばワニス用として
は、一般にN−メチルピロリドンやクレゾールを
主溶剤とする溶液剤とする溶液の形で、電線用エ
ナメルワニス、アルミ什器用等に用いることが出
来る。さらに、粉末化して、粉末焼付けによる金
属表面塗料用に用いることが出来る。
フイルム、繊維には、該芳香族ポリアミドイミ
ドエーテルの溶液から湿式又は乾式成形によつて
成形出来る。ともに、その良好な耐熱性、難燃性
を利用して電気絶縁用途、防護衣料用途等に用い
ることが出来る。
接着剤としては、フイルム状に成形したものを
用いるドライフイルム接着剤、或は溶液を被着物
に塗布、乾燥の後熱融着する溶液接着剤として用
いることが出来る。被着物としては、金属特に
鉄、アルミ、ステンレススチール、銅等が好まし
く挙げられる。
繊維強化複合材料用マトリツクス樹脂として
は、強化繊維表面に溶液又は粉末流動層等の形で
塗布被着させ、ストランド、一方向性プリプレグ
等の形にし、オートクレーブ成形、プレス成形、
フイラメントワイデイング等の手段によつて成形
物を得ることが出来る。成形樹脂としては、各種
添加物ともに成形樹脂用コンパウンドを作成し、
それを用いて圧縮成形、押し出し成形、射出成形
等によつて成形物を得ることが出来る。
以上、述べてきた如き成形物は、前述の如く耐
熱性、機械性、耐薬品性にバランスのとれた性能
を有しており、航空宇宙、自動車、船舶等各種輸
送機器の機能部品、電気、電子、オートメーシヨ
ン機器、スポーツ用品、エネルギー機器等の部材
として先端技術分野に広く用いる事が出来る。
実際の使用にあたつては、各種添加剤、他の重
合体等をブレンドして用いることも出来る。
実施例
以下に実施例をあげて、本発明を詳述する。実
施例は説明のためであつてそれに限定されるもの
ではない。
実施例 1
攪拌機、窒素ガス導入口及び副生物留出口を備
えた反応器に3,4′ジアミノジフエニルエーテル
20.0g、トリメリツト酸無水物19.2g、トリフエ
ニルホスフアイト0.2g及びジフエニルスルホン
15.3gを仕込み、反応器内を良く窒素置換したの
ち、窒素ガス気流中280℃で生成する水を系外に
留去しつつ2時間反応を行つた。
得られた反応生成混合物は透明であつた。次い
で、この混合物を10〜20メツシユに粉砕後アセト
ンに浸漬し、加熱下ジフエニルスルホンを抽出し
た。得られたポリマーの重合度は、NMP(N−
メチルピロリドン)中0.5g/d、30℃で測定
したηinhで0.64であつた。
比較例 1
実施例1において3,4′−ジアミノジフエニル
エーテルの代りに4,4′−ジアミノジフエニルエ
ーテルを用いる以外は同様に行つたところ、反応
開始約30分後反応系が固化し、均一攪拌が不能と
なつた。
実施例 2〜5
実施例1においてジフエニルスルホン15.3gの
代りに第1表に示す低分子化合物を用い、かつ反
応温度及び時間を第1表に示すように変更する以
外は同様に行つた。
得られた反応生成混合物はいずれも透明であつ
た。次いで該混合物を実施例1と同様に抽出処理
し、得られたポリマーのηinhを求めた。その結果
を第1表に示す。[Formula] is preferred. As a specific compound, trimellitic acid is particularly preferred. Furthermore, the acid anhydride of aromatic tricarboxylic acid used as component A in the present invention has the above general formula ()
It is an acid anhydride of a compound represented by, and trimellitic anhydride is particularly preferred. In the present invention, a portion of the aromatic tricarboxylic acid and/or its acid anhydride may be replaced with dicarboxylic acid, tetracarboxylic acid, tetracarboxylic acid anhydride, or the like. Specific examples of such compounds include terephthalic acid, isophthalic acid, naphthalenedicarboxylic acid, diphenyldicarboxylic acid, succinic acid, adipic acid, sebacic acid, decanedicarboxylic acid, cyclohexanedicarboxylic acid, pyromellitic acid, pyromellitic anhydride, diphenyl Examples include tetracarboxylic acid, diphenyltetracarboxylic anhydride, benzophenonetetracarboxylic acid, benzophenonetetracarboxylic anhydride, and the like. It is preferable to use these in an amount of 40 mol % or less, more 30 mol % or less, particularly 20 mol % or less, based on the total acid components. Further, the diamine used as component B in the present invention is 3,4'-diaminodiphenyl ether or its lower fatty acid amide, and a portion thereof may be substituted with other types of diamine or its lower fatty acid amide. Examples of lower fatty acids that form this amide include acetic acid, propionic acid, and butyric acid. Particularly preferred is acetic acid. Specific examples of other diamines include p-phenylenediamine,
m-phenylenediamine, tolylenediamine,
4,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl ether, 3,4'-diaminodiphenylmethane, 4,4'-diaminodiphenyl,
3,3'-dimethyl-4,4'-diaminodiphenyl, 4,4'-diaminobenzophenone, 4,4'-
Examples include diaminodiphenylsulfone, ethylenediamine, tetramethylenediamine, hexamethylenediamine, decamethylenediamine, and the like.
These are preferably used in an amount of 40 mol % or less, more 30 mol % or less, particularly 20 mol % or less based on the total diamine components. The proportion of diamine used is usually substantially equivalent to the amount of component A. In the present invention, a small proportion of an aminocarboxylic acid such as p-aminobenzoic acid, m-aminobenzoic acid, etc. may be used in combination with the A component and the B component for copolymerization. The proportion of this aminocarboxylic acid is preferably 30% or less, particularly 20% or less, based on all repeating units. In the present invention, component A and component B, and optionally an aminocarboxylic acid component, are used to form (C)
Heat condensation is carried out in the presence of a low-molecular compound with a boiling point of 30°C or higher, which is compatible with the polymer to be produced and is substantially non-reactive with the polymer, but this low-molecular compound (C) is Molecular weight less than 1000, even
Preferably, it is 800 or less. In the present invention, a diphenyl compound represented by the above formula (1) is used as the low molecular weight compound (C). Such compounds include, for example, diphenylsulfone, 4,4'-diphenoxydiphenylsulfone, 4,4'-bis(4- or 3- or 2-chlorophenoxy)diphenylsulfone, 4,4'-
Bis(4- or 3- or 2-phenylphenoxy) diphenylsulfone, 4,4'-bis(4-
or 3- or 2-tbutylphenoxy) diphenylsulfone, 4,4'-bis(4- or 3-
or 2-octylphenoxy) diphenyl sulfone, 4,4'-bis(α or β-naphthyloxy) diphenyl sulfone, and the like. Among these, diphenyl sulfone is particularly preferred. In the present invention, the low molecular weight compound as component C is preferably 5 to 200% by weight based on the produced polymer.
More preferably 10 to 100% by weight, particularly preferably
It is used in a proportion of 20 to 70% by weight. The reaction between component A and component B, optionally using an aminocarboxylic acid component, is usually carried out over 200 to
350℃, preferably 250-320℃, particularly preferably
The reaction is carried out at a temperature of 260 to 310°C while water produced by the reaction is distilled out of the system. At this time, the reaction atmosphere may be normal pressure, increased pressure, or reduced pressure. In the case of a normal pressure reaction, it is preferable to carry out the reaction under an atmosphere of an inert gas such as nitrogen gas, argon gas, etc. Further, it is preferable to use a catalyst, a stabilizer, etc. in the reaction. Examples of this catalyst include various phosphorus compounds, boron compounds,
Examples include heteropolyacids. Specific examples include trimethyl phosphite, triethyl phosphite, triphenyl phosphite, phosphoric acid, triphenyl phosphite, and boric acid. Examples of the stabilizer include hindered phenol oxidation stabilizers. In this way, an aromatic polyamide ether having a desired degree of polymerization, particularly a high degree of polymerization, can be obtained in a mixed state with a low molecular weight compound. The aromatic polyamideimide ether can be subjected to molding as a mixture with a low-molecular compound, or can be subjected to molding after being separated from the low-molecular compound. Separation of low molecular weight compounds is preferably carried out by extraction treatment with an organic solvent that dissolves only the low molecular weight compounds. Preferred examples of the organic solvent include aromatic hydrocarbons, halogenated aliphatic hydrocarbons, aliphatic ketones, aliphatic ethers, cyclic ethers, and more specifically toluene, xylene, methylene chloride, chloroform,
Preferred examples include acetone, methyl ethyl ketone, methyl acetate, ethyl acetate, and dioxane. Since the compatibility of the low molecular weight compound (C) with aromatic polyamideimide ether is significantly greater than that with conventional reaction solvents, it is possible to increase the concentration of aromatic polyamideimide ether in the reaction product in the present invention. can. In this case, the reaction product can be directly subjected to molding without adjusting the concentration of the polymer. In the aromatic polyamideimide ether obtained by the present invention, 60 mol% or more of the total repeating units are of the following formula: However, the expressions in parentheses may be independently reversed. The repeating unit represented by, especially the following formula However, the expressions in parentheses may be independently reversed. A polymer consisting of repeating units represented by is preferred. The aromatic polyamide-imide ether obtained in the present invention can be used in a wide range of applications such as varnishes, adhesives, films, fibers, matrix resins for fiber-reinforced composites, and molding resins for compression molding, extrusion molding, injection molding, etc. I can do it. For example, for varnishes, it is generally in the form of a solution containing N-methylpyrrolidone or cresol as the main solvent, and can be used for enamel varnishes for electric wires, aluminum fixtures, etc. Furthermore, it can be powdered and used for metal surface coatings by powder baking. Films and fibers can be formed from a solution of the aromatic polyamideimide ether by wet or dry molding. Both can be used for electrical insulation, protective clothing, etc. by taking advantage of their good heat resistance and flame retardancy. As the adhesive, it is possible to use a dry film adhesive formed into a film, or a solution adhesive in which a solution is applied to an adherend and then heat-sealed after drying. Preferred examples of the adherend include metals, particularly iron, aluminum, stainless steel, copper, and the like. The matrix resin for fiber-reinforced composite materials can be applied to the surface of reinforcing fibers in the form of a solution or powder fluidized bed, formed into a strand, unidirectional prepreg, etc., and then molded in an autoclave, press molded, etc.
A molded article can be obtained by means such as filament widening. For the molding resin, we create a molding resin compound with various additives.
Using it, a molded article can be obtained by compression molding, extrusion molding, injection molding, etc. The molded products described above have well-balanced performance in heat resistance, mechanical properties, and chemical resistance, and are used as functional parts for various transportation equipment such as aerospace, automobiles, and ships, It can be widely used in advanced technology fields as a component for electronics, automation equipment, sporting goods, energy equipment, etc. In actual use, various additives, other polymers, etc. can be blended and used. Examples The present invention will be explained in detail with reference to Examples below. The examples are illustrative and not limiting. Example 1 3,4'diaminodiphenyl ether was added to a reactor equipped with a stirrer, a nitrogen gas inlet, and a by-product distillation outlet.
20.0g, trimellitic anhydride 19.2g, triphenyl phosphite 0.2g and diphenyl sulfone
After charging 15.3 g and thoroughly purging the inside of the reactor with nitrogen, the reaction was carried out for 2 hours while water produced at 280° C. was distilled out of the system in a nitrogen gas stream. The resulting reaction product mixture was transparent. Next, this mixture was crushed into 10 to 20 meshes and immersed in acetone to extract diphenyl sulfone under heating. The polymerization degree of the obtained polymer was NMP (N-
ηinh measured at 0.5 g/d in methylpyrrolidone) at 30°C was 0.64. Comparative Example 1 The same procedure as in Example 1 was carried out except that 4,4'-diaminodiphenyl ether was used instead of 3,4'-diaminodiphenyl ether. About 30 minutes after the start of the reaction, the reaction system solidified. Uniform stirring became impossible. Examples 2 to 5 The same procedure as in Example 1 was carried out except that the low molecular weight compound shown in Table 1 was used instead of 15.3 g of diphenylsulfone, and the reaction temperature and time were changed as shown in Table 1. All reaction product mixtures obtained were transparent. Next, the mixture was extracted in the same manner as in Example 1, and the ηinh of the obtained polymer was determined. The results are shown in Table 1.
【表】
比較例
攪拌機、窒素ガス導入口及び副生物留出口を備
えた反応器に3,4′−ジアミノジフエニルエーテ
ル20.0g、トリメリツト酸無水物19.2g、トリフ
エニルホスフアイト0.18g及びN−メチルピロリ
ドン(NMP)33.4gを仕込み、反応器内を良く
窒素置換したのち窒素ガス気流中加熱反応させ
た。反応器から副生の水を含んだN−メチルピロ
リドンが留去されていき、次第に溶液粘度が上が
るとともに反応器の内部温度も上昇した。約28.3
gのNMP(含水)が留去された時点での系内温
度は262℃であつた。
この溶液の一部を取りだし、常法どおりミキサ
ー中、水で沈澱させてポリマー粉末を得た。この
ポリマーの重合度は、NMPで0.5g/dの濃
度、30℃で測定してηinhは0.26であつた。[Table] Comparative Example 20.0 g of 3,4'-diaminodiphenyl ether, 19.2 g of trimellitic anhydride, 0.18 g of triphenyl phosphite, and N- After charging 33.4 g of methylpyrrolidone (NMP) and thoroughly purging the inside of the reactor with nitrogen, the reaction was carried out by heating in a nitrogen gas stream. N-methylpyrrolidone containing by-product water was distilled off from the reactor, and the viscosity of the solution gradually increased, as well as the internal temperature of the reactor. Approximately 28.3
The temperature inside the system was 262°C at the time when g of NMP (water content) was distilled off. A portion of this solution was taken out and precipitated with water in a mixer in a conventional manner to obtain a polymer powder. The degree of polymerization of this polymer was measured by NMP at a concentration of 0.5 g/d at 30°C, and ηinh was 0.26.
Claims (1)
水物と(B)3,4′−ジアミノジフエニルエーテル及
び/又はその低級脂肪酸アミドとを、(C)下記式(1)
で表わされるジフエニル化合物、 Ar1−X−Ar1 (ここで、Xは−O−,−SO2−,−CO−又は
アルキレン基であり、Ar1は置換基を有すること
のあるフエニル基である) の存在下で、加熱縮合せしめることを特徴とする
芳香族ポリアミドイミドエーテルの製造法。[Scope of Claims] 1 (A) aromatic tricarboxylic acid and/or its acid anhydride and (B) 3,4'-diaminodiphenyl ether and/or its lower fatty acid amide, (C) the following formula ( 1)
A diphenyl compound represented by Ar 1 -X-Ar 1 (where X is -O-, -SO 2 -, -CO- or an alkylene group, and Ar 1 is a phenyl group that may have a substituent) A method for producing an aromatic polyamideimide ether, which comprises carrying out thermal condensation in the presence of
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14494486A JPS6310630A (en) | 1986-06-23 | 1986-06-23 | Production of aromatic polyamide-imide ether |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14494486A JPS6310630A (en) | 1986-06-23 | 1986-06-23 | Production of aromatic polyamide-imide ether |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6310630A JPS6310630A (en) | 1988-01-18 |
JPH0447692B2 true JPH0447692B2 (en) | 1992-08-04 |
Family
ID=15373816
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14494486A Granted JPS6310630A (en) | 1986-06-23 | 1986-06-23 | Production of aromatic polyamide-imide ether |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6310630A (en) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3941280A1 (en) * | 1989-12-14 | 1991-06-20 | Basf Ag | POLYMER GRANULES WITH IMPROVED PROCESSABILITY |
WO2012088266A2 (en) | 2010-12-22 | 2012-06-28 | Incyte Corporation | Substituted imidazopyridazines and benzimidazoles as inhibitors of fgfr3 |
PT3495367T (en) | 2012-06-13 | 2020-11-12 | Incyte Holdings Corp | Substituted tricyclic compounds as fgfr inhibitors |
WO2014026125A1 (en) | 2012-08-10 | 2014-02-13 | Incyte Corporation | Pyrazine derivatives as fgfr inhibitors |
TWI715901B (en) | 2013-04-19 | 2021-01-11 | 美商英塞特控股公司 | Bicyclic heterocycles as fgfr inhibitors |
US10851105B2 (en) | 2014-10-22 | 2020-12-01 | Incyte Corporation | Bicyclic heterocycles as FGFR4 inhibitors |
CN113004278B (en) | 2015-02-20 | 2023-07-21 | 因赛特控股公司 | Bicyclic heterocycles as FGFR inhibitors |
WO2016134294A1 (en) | 2015-02-20 | 2016-08-25 | Incyte Corporation | Bicyclic heterocycles as fgfr4 inhibitors |
MA41551A (en) | 2015-02-20 | 2017-12-26 | Incyte Corp | BICYCLIC HETEROCYCLES USED AS FGFR4 INHIBITORS |
AR111960A1 (en) | 2017-05-26 | 2019-09-04 | Incyte Corp | CRYSTALLINE FORMS OF A FGFR INHIBITOR AND PROCESSES FOR ITS PREPARATION |
WO2019213544A2 (en) | 2018-05-04 | 2019-11-07 | Incyte Corporation | Solid forms of an fgfr inhibitor and processes for preparing the same |
CR20200591A (en) | 2018-05-04 | 2021-03-31 | Incyte Corp | Salts of an fgfr inhibitor |
WO2020185532A1 (en) | 2019-03-08 | 2020-09-17 | Incyte Corporation | Methods of treating cancer with an fgfr inhibitor |
TW202128685A (en) | 2019-10-14 | 2021-08-01 | 美商英塞特公司 | Bicyclic heterocycles as fgfr inhibitors |
CA3162010A1 (en) | 2019-12-04 | 2021-06-10 | Incyte Corporation | Derivatives of an fgfr inhibitor |
EP4069696A1 (en) | 2019-12-04 | 2022-10-12 | Incyte Corporation | Tricyclic heterocycles as fgfr inhibitors |
CA3220274A1 (en) | 2021-06-09 | 2022-12-15 | Incyte Corporation | Tricyclic heterocycles as fgfr inhibitors |
-
1986
- 1986-06-23 JP JP14494486A patent/JPS6310630A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6310630A (en) | 1988-01-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0447692B2 (en) | ||
JP3968835B2 (en) | Heat resistant adhesive containing siloxane polyimide | |
US4504632A (en) | Amide ether imide block copolymers | |
US4624888A (en) | Acetylene (ethynyl) terminated polyimide siloxane and process for preparation thereof | |
JPS6250497B2 (en) | ||
EP0393638B1 (en) | Thermosetting resin compostion and thermosetting dry film | |
EP0297756B1 (en) | Processes for producing a silicon-containing polyimide and a precursor therefor | |
EP0621888A1 (en) | Laminate on the basis of a strengthened polyimide film containing organometallic compounds for improving adhesion | |
EP0456515B1 (en) | Polyimides and thermosetting resin compositions containing the same | |
US5068307A (en) | Polyamideimides containing 3,4'-diamino-diphenylether as diamine component and process for preparing the same | |
EP0210851B1 (en) | Mixtures of polyamideimides, containing 3,4'-diaminodiphenylether as diamine component, and of a plasticizer. | |
JPH03185066A (en) | Thermosetting resin composition | |
US4133792A (en) | Resin solutions of acetylene containing polyamide acids | |
JPH02233727A (en) | New polymide-polymide block copolymer | |
US5606013A (en) | Polyamic acids and polyimides | |
JPH0432289A (en) | Board for flexible printed circuit and manufacture thereof | |
CA1050188A (en) | Heat hardenable compounds | |
US3468852A (en) | Polyamide-acid amide-acid and polyimide-imide compositions | |
JPS5952898B2 (en) | Method for producing polyimide precursor | |
JPH0518865B2 (en) | ||
JPS61141734A (en) | Production of heat-resistant resin | |
CA1227590A (en) | Amide ether imide block copolymers | |
JPH0390348A (en) | Manufacture of flexible printed circuit board | |
JPH0391290A (en) | Manufacturing method of flexible printed circuit board | |
JPH01198629A (en) | High quality polyimide precursor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |