JPH044194A - Device for treating surface of printing plate substrate - Google Patents
Device for treating surface of printing plate substrateInfo
- Publication number
- JPH044194A JPH044194A JP10309190A JP10309190A JPH044194A JP H044194 A JPH044194 A JP H044194A JP 10309190 A JP10309190 A JP 10309190A JP 10309190 A JP10309190 A JP 10309190A JP H044194 A JPH044194 A JP H044194A
- Authority
- JP
- Japan
- Prior art keywords
- printing plate
- substrate
- support
- vapor
- steam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title abstract description 9
- 239000007788 liquid Substances 0.000 claims abstract description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 238000004381 surface treatment Methods 0.000 claims description 10
- 238000007789 sealing Methods 0.000 abstract description 16
- 238000011282 treatment Methods 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- 239000010407 anodic oxide Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- NACUKFIFISCLOQ-UHFFFAOYSA-N [Mg].[Cr] Chemical compound [Mg].[Cr] NACUKFIFISCLOQ-UHFFFAOYSA-N 0.000 description 1
- 210000001015 abdomen Anatomy 0.000 description 1
- -1 amine compounds Chemical class 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 230000005660 hydrophilic surface Effects 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
Landscapes
- Printing Plates And Materials Therefor (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は印刷版用支持体の表面処理装置に関する、特に
アルミニウム板に陽極酸化皮膜を形成した後の印刷版用
支持体を水蒸気で封孔処理をする、又はアルミニウム板
を染料で染色後の蒸気封孔処理等の表面処理装置の出入
口部に関するものである。 〔従来の
技術〕従来、印刷版用支持体(以後支持体と称する)と
してアルミニウム板(アルミニウム合金を含む)を使用
する場合、アルミニウム板に陽極酸化皮膜を形成させる
が、該支持体と感光組成物との密着を最適なものとする
ために陽極酸化皮膜をエツチングしたのち、水蒸気若し
くは熱水で封孔処理をして、経時安定性の良い、現像性
の良好な、非画像部の汚れのない感光性印刷版を与える
支持体の表面処理装置がある(特公昭56−12518
号公報参照)。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a surface treatment device for a printing plate support, and in particular, a method for sealing a printing plate support with water vapor after forming an anodized film on an aluminum plate. This relates to the entrance/exit part of a surface treatment apparatus for processing or steam sealing after dyeing an aluminum plate with a dye. [Prior Art] Conventionally, when an aluminum plate (including aluminum alloy) is used as a printing plate support (hereinafter referred to as support), an anodized film is formed on the aluminum plate, but the support and photosensitive composition After etching the anodic oxide film for optimal adhesion to objects, the pores are sealed with steam or hot water to create a film that is stable over time, has good developability, and is free from dirt in non-image areas. There is a surface treatment device for a support that provides a photosensitive printing plate (Japanese Patent Publication No. 56-12518).
(see publication).
この様な装置において、水蒸気を用いて支持体を連続的
に表面処理をする装置においては、支持体を水蒸気処理
をする室の出入口は支持体表面に非接触の蒸気漏れ防止
対策(シール対策)が必要となる。In such equipment, where the surface of the support is continuously treated using steam, the entrance and exit of the chamber where the support is treated with steam must be equipped with measures to prevent steam leakage (sealing measures) without contacting the surface of the support. Is required.
支持体表面に非接触のシール装置としては、支持体裏面
をローラで支え、支持体表面の間隙を出来るだけ狭くし
て、支持体表面に対向する面に排気口を設は排気する装
置(特開昭58−131470号公報参照)や、第3図
に示すように支持体出入口に支持体lの両面に無接触の
ラビリンス構造11のシール部分を設け、水蒸気の逃げ
を出来るだけ少なくする装置等が使用されていた。A non-contact sealing device for the support surface is a device that supports the back surface of the support with rollers, narrows the gap between the support surfaces as much as possible, and provides an exhaust port on the surface facing the support surface (specially (Refer to Japanese Patent Publication No. 131470/1982), as shown in Fig. 3, a non-contact labyrinth structure 11 sealing portion is provided on both sides of the support l at the entrance and exit of the support to minimize the escape of water vapor, etc. was used.
〔発明が解決しようとする課題]
しかしながら、上記の装置はいづれも
(1)出入口部に精度の高いソール設備を製作する必要
がある。[Problems to be Solved by the Invention] However, in all of the above devices, (1) it is necessary to manufacture highly accurate sole equipment at the entrance/exit portion.
(2)支持体のハタツキによる支持体へのキズ付き故障
の発生を防止するためには、隙間のクリアランスに限界
があり、漏れ防止の効果が得られない場合がある。(2) In order to prevent failures due to scratches on the support due to flopping of the support, there is a limit to the clearance of the gap, and the effect of preventing leakage may not be obtained.
(3)新旧支持体の接合部等、支持体の厚みや支持体の
ハタツキの挙動の非定常な部分では、クリアランスを増
加させる設備を付帯させる必要があり、複雑で大掛かり
な設備となる。(3) In areas where the thickness of the support or the fluttering behavior of the support is unsteady, such as the joint between the new and old supports, it is necessary to add equipment to increase the clearance, resulting in complex and large-scale equipment.
(4)蒸気使用量が必要以上に大量となる。(4) The amount of steam used becomes larger than necessary.
等の問題点を有していた。It had the following problems.
本発明の目的は上記従来の問題点を解消し、安価な設備
で、支持体の厚みや、ハタツキに関係なく、支持体に傷
を付けることなく、蒸気使用量も必要な量で済ますこと
の出来る出入口部を有する印刷版用支持体の表面処理装
置を提供することにある。The purpose of the present invention is to solve the above-mentioned conventional problems, to use inexpensive equipment, to avoid damaging the support regardless of the thickness of the support and to reduce the amount of steam used. It is an object of the present invention to provide a surface treatment device for a printing plate support having an opening/exit portion that can be opened and opened.
〔課題を解決するための手段及び作用〕本発明の上記目
的は、
水蒸気を用い印刷版用支持体を連続的に表面処理する装
置において、該印刷版用支持体が該装置外部と出入する
入ロ部3出ロ部の少なくとも一方に、該印刷版用支持体
がローラに支えられて通過する液体の小槽部を設けたこ
とを特徴とする印刷版用支持体の表面処理装置、
によって達成される。[Means and effects for solving the problems] The above object of the present invention is to provide an apparatus for continuously surface-treating a printing plate support using water vapor, in which the printing plate support enters and exits from the outside of the apparatus. This is achieved by a surface treatment device for a printing plate support, characterized in that at least one of the outer parts (3) and the outer part (3) is provided with a small tank part for a liquid through which the printing plate support passes while being supported by a roller. be done.
本発明は出入口に設けられた液体を有する小槽部の中を
ローラに支持させて支持体を通すことにより、小槽部中
の液体によって本発明の装置の出入部はシールされる。In the present invention, the entrance and exit of the apparatus of the present invention are sealed by the liquid in the small tank by passing a support body through a small tank having a liquid provided at the entrance and exit, supported by a roller.
支持体は液体中を通過するちためにキズ付きの心配なく
、又クリアランスの心配もない。Since the support passes through the liquid, there is no need to worry about scratches or clearance.
本発明の実施態様を図を用いて説明する。Embodiments of the present invention will be described using figures.
第1図は本発明の印刷版用支持体の表面処理装置の一実
施例の側面断面図であり、第2図は本発明のその他の一
実施例の側面断面図である。FIG. 1 is a side sectional view of one embodiment of the printing plate support surface treatment apparatus of the present invention, and FIG. 2 is a side sectional view of another embodiment of the present invention.
本発明は第1図に示すように、例えば陽極酸化被膜を形
成した後エツチングを済ました支持体1が蒸気封孔処理
装置3に入って、蒸気供給ノズル2より吹きつけられる
蒸気によってエツチング表面の蒸気封孔処理をされ、該
装置外部と出入する入口部4.出口部5にそれぞれ支持
体1がローラ8に支えられて通過する液体の小槽部6.
7を設けて装置内外をシールしたものである。As shown in FIG. 1, in the present invention, for example, a support 1 that has been etched after forming an anodic oxide film enters a steam sealing treatment device 3, and the etched surface is etched by steam sprayed from a steam supply nozzle 2. 4. An inlet section that is subjected to steam sealing treatment and that enters and exits from the outside of the device. Small tank portions 6 for liquid, through which the supports 1 are supported by rollers 8 and pass through the outlet portions 5, respectively;
7 to seal the inside and outside of the device.
第2図は第1図の変形例で、装置の入口部4に装置の壁
面9に沿って水供給口10より水腹を作り、支持体はロ
ーラ8に支えられて通過する液体の小槽部6が設けられ
た状態を示す。この場合は、小槽部6は流れて来た液を
受ける槽となるが、蒸気封孔処理装置3が液体によって
シールされることは第1図と同様である。FIG. 2 shows a modification of FIG. 1, in which a water belly is created at the inlet 4 of the device from a water supply port 10 along the wall surface 9 of the device, and the support is a small tank for the liquid to pass through while being supported by rollers 8. A state in which part 6 is provided is shown. In this case, the small tank portion 6 serves as a tank for receiving the flowing liquid, but the steam sealing device 3 is sealed by the liquid as in FIG. 1.
本発明に用いられる液体は熱水であることが望ましいが
、常温の水でもかまわない。勿論純水であってもかまわ
ないが、有機溶媒、アミン化合物、有機酸、リンの酸素
酸及びその塩、硫黄の酸素酸及びその塩及び硼素の酸素
酸及びその塩から選ばれた少なくとも1つの化合物を含
む熱水溶液又は水溶液を用いることも出来る。The liquid used in the present invention is preferably hot water, but water at room temperature may also be used. Of course, it may be pure water, but at least one selected from organic solvents, amine compounds, organic acids, phosphorus oxyacids and their salts, sulfur oxyacids and their salts, and boron oxyacids and their salts. It is also possible to use hot or aqueous solutions containing the compounds.
尚、本発明で用いる印刷版用支持体としては、先ず基体
としてはアルミニウム板で純アルミニウムおよびアルミ
ニウム合金板が含まれる。In the printing plate support used in the present invention, first, the substrate is an aluminum plate, and pure aluminum and aluminum alloy plates are included.
アルミニウム合金としては、種々のものが使用でき、例
えば珪素、 wj4.マンガン、マグネシウムクロム、
亜鉛、鉛、ビスマス、ニンケルなどの金属とのアルミニ
ウム合金がある。Various aluminum alloys can be used, such as silicon, wj4. manganese, magnesium chromium,
There are aluminum alloys with metals such as zinc, lead, bismuth, and ninkel.
このアルミニウム板が先ず油脂、サビ、ゴミなどを洗浄
され、必要に応して砂目立て処理をされる。The aluminum plate is first cleaned of oil, rust, dirt, etc., and then grained if necessary.
砂目立て後エツチング処理、陽極酸化皮膜の形成2その
後エンチングがおこなわれるが、それらの処理の詳細に
ついては特公昭56−12518号公報記載のとおりで
ある。また、陽極酸化皮膜前及び後のエツチング処理は
なくてもかまはない。After graining, etching treatment, formation of an anodic oxide film, and subsequent etching are performed, and the details of these treatments are as described in Japanese Patent Publication No. 12518/1983. Further, etching treatment before and after the anodic oxidation film may be omitted.
上記のように表面処理をされたものを本発明の印刷版用
支持体と言う、 本発明における水蒸気を使用して連続
的に表面処理するということは、水蒸気処理する場合の
温度は約80〜200°Cで好ましくは約90−120
’Cである。処理時間は3秒〜30分で、好ましくは5
秒〜10分である。The material that has been surface-treated as described above is referred to as the printing plate support of the present invention.The continuous surface treatment using steam in the present invention means that the temperature of the steam treatment is approximately 80 to 80℃. Preferably about 90-120 at 200°C
'C. Processing time is 3 seconds to 30 minutes, preferably 5
It is from seconds to 10 minutes.
水素イオン濃度は約2〜11が適当で、好ましくは約3
〜10である。加圧水蒸気で処理する時の圧力は約1〜
15kg/cd(絶対圧)が適当であり、好ましくは約
1〜5 kg/cdが好ましい。The appropriate hydrogen ion concentration is about 2 to 11, preferably about 3.
~10. The pressure when processing with pressurized steam is approximately 1~
15 kg/cd (absolute) is suitable, preferably about 1-5 kg/cd.
本発明によって得られる印刷版用支持体はその表面が高
い親水性を示し、且つその上に設けられる感光性組成物
との密着性が良好なので、このまま使用することが出来
るが、必要により更に表面処理を施すことができる。そ
れは下塗処理である。The printing plate support obtained by the present invention has a highly hydrophilic surface and good adhesion to the photosensitive composition provided thereon, so it can be used as is, but if necessary, the surface may be further improved. can be processed. It is a primer process.
又、その表面に塗布する感光性組成物等に関しても、特
公昭56−12518号公報を参考にされたい。Regarding the photosensitive composition etc. applied to the surface, please refer to Japanese Patent Publication No. 56-12518.
本発明を1実施例を用いて更に説明する。 The present invention will be further explained using one example.
実施例−1
支持体として厚み0.4m、幅1500mのアルミニウ
ム板を陽極酸化被膜を形成した後エンチングを行い、第
1図に示すような装置を通し、水蒸気による表面封孔処
理を行った。蒸気封孔処理装置3内の条件として圧力2
0mAqに加圧、温度98〜102°Cであり、小槽部
6.7の条件としては底面寸法300wX 1800閣
、高さ400閣の水槽に70°Cの熱水を入れ、蒸気封
孔処理装置出入口部の蒸気漏れを防いだ。この時の使用
蒸気量は150kg/’hrであった。Example 1 An aluminum plate having a thickness of 0.4 m and a width of 1500 m was coated with an anodic oxide film as a support, then etched, and passed through an apparatus as shown in FIG. 1 to perform a surface sealing treatment with water vapor. The pressure inside the steam sealing device 3 is 2.
The pressure is 0 mAq, the temperature is 98 to 102°C, and the conditions for the small tank part 6.7 are that the bottom dimension is 300w x 1800mm, and the height is 400mm. Hot water at 70°C is poured into the water tank, and steam sealing is performed. Prevented steam leakage at the entrance and exit of the device. The amount of steam used at this time was 150 kg/'hr.
比較例−I
従来の技術として第3図に示すようなラビリンス構造の
シール装置を用いて水気封孔処理装置の条件を実施例−
1と同様に保つようにしたところ、支持体にキズを付け
ないラビリンス構造の最狭部のクリアランス12は10
mであった。蒸気の漏れが多く、使用蒸気量は950k
g/hrとなり、実施例−1の約6倍強を要した。Comparative Example-I An example of the conditions of a moisture sealing device using a labyrinth structure sealing device as shown in Fig. 3 as a conventional technique.
When maintained in the same manner as in 1, the clearance 12 at the narrowest part of the labyrinth structure that does not damage the support is 10
It was m. There are many steam leaks, and the amount of steam used is 950k.
g/hr, which required about 6 times more than Example-1.
〔発明の効果]
本発明の印刷版用支持体の表面処理装置により、上記の
説明及び実施例に示すように、
(1)蒸気の漏れがなくなり、使用蒸気量が著しく減少
し、製造コストが低下した。[Effects of the Invention] As shown in the above description and examples, the surface treatment device for a printing plate support of the present invention has the following effects: (1) Steam leakage is eliminated, the amount of steam used is significantly reduced, and manufacturing costs are reduced. decreased.
(2)出入口部の装置が簡単なものとなり、設備コスト
の低下がはかられた。(2) The equipment at the entrance and exit has become simpler, reducing equipment costs.
(3)特に狭いクリアランスの箇所がないため、製造時
の安定性が得られる。(3) Since there are no particularly narrow clearance points, stability during manufacturing can be achieved.
更に、シール用の小槽部の液体に浸漬することにより、
充分な親水化処理を行うことが出来、品質の向上、安定
およびコストダウンに貢献した。Furthermore, by immersing it in the liquid in the small tank for sealing,
We were able to perform sufficient hydrophilic treatment, contributing to improved quality, stability, and cost reduction.
【図面の簡単な説明】
第1図は本発明の印刷版用支持体の表面処理装置の一実
施例の側面断面図、第2図は本発明の一変形例の側面断
面図、第3図は従来の技術によるラビリンス構造の出入
口部の一例の側面断面図である。
1・・支持体 2・・蒸気供給ノズル3・・蒸
気封孔処理袋W 4・・入口部5・・出口部
6.7・・小槽部8・・ローラ 9・・
壁面
10・・水供給口
11・・ラビリンス構造
12・・最狭部のクリアランス[BRIEF DESCRIPTION OF THE DRAWINGS] FIG. 1 is a side cross-sectional view of an embodiment of the surface treatment apparatus for a printing plate support of the present invention, FIG. 2 is a side cross-sectional view of a modified example of the present invention, and FIG. 1 is a side sectional view of an example of an entrance/exit portion of a labyrinth structure according to the prior art. 1. Support 2. Steam supply nozzle 3. Steam sealing bag W 4. Inlet section 5. Outlet section
6.7...Small tank part 8...Roller 9...
Wall surface 10... Water supply port 11... Labyrinth structure 12... Clearance at the narrowest part
Claims (1)
置において、該印刷版用支持体が該装置外部と出入する
入口部、出口部の少なくとも一方に、該印刷版用支持体
がローラに支えられて通過する液体の小槽部を設けたこ
とを特徴とする印刷版用支持体の表面処理装置In an apparatus for continuously surface-treating a printing plate support using water vapor, the printing plate support is attached to a roller at at least one of an inlet portion and an outlet portion where the printing plate support enters and exits from the outside of the apparatus. A surface treatment device for a printing plate support, characterized by having a small tank portion for a liquid to pass through while being supported.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2103091A JP2614133B2 (en) | 1990-04-20 | 1990-04-20 | Surface treatment device for printing plate support |
EP91106341A EP0452954B1 (en) | 1990-04-20 | 1991-04-19 | Surface treatment apparatus for printing plate support |
DE1991617567 DE69117567T2 (en) | 1990-04-20 | 1991-04-19 | Surface treatment device for printing plates |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2103091A JP2614133B2 (en) | 1990-04-20 | 1990-04-20 | Surface treatment device for printing plate support |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH044194A true JPH044194A (en) | 1992-01-08 |
JP2614133B2 JP2614133B2 (en) | 1997-05-28 |
Family
ID=14344970
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2103091A Expired - Fee Related JP2614133B2 (en) | 1990-04-20 | 1990-04-20 | Surface treatment device for printing plate support |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0452954B1 (en) |
JP (1) | JP2614133B2 (en) |
DE (1) | DE69117567T2 (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05179482A (en) * | 1991-11-05 | 1993-07-20 | Fuji Photo Film Co Ltd | Sealing treatment and device for planographic printing base |
EP1516744A2 (en) | 2003-09-19 | 2005-03-23 | Fuji Photo Film Co., Ltd. | Aluminium alloy blank for lithographic printing plate and support for lithographic printing plate |
EP1712368A1 (en) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Method of manufacturing a support for a lithographic printing plate |
EP2100677A1 (en) | 2008-03-06 | 2009-09-16 | Fujifilm Corporation | Method of manufacturing aluminum alloy plate for lithographic printing plate, aluminum alloy plate for lithographic printing plate obtained thereby and lithographic printing plate support |
WO2010150810A1 (en) | 2009-06-26 | 2010-12-29 | 富士フイルム株式会社 | Light reflecting substrate and process for manufacture thereof |
WO2011037005A1 (en) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | Lithographic printing original plate |
WO2011078010A1 (en) | 2009-12-25 | 2011-06-30 | 富士フイルム株式会社 | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
EP2384100A2 (en) | 2010-04-28 | 2011-11-02 | Fujifilm Corporation | Insulated light-reflective substrate |
EP2420869A2 (en) | 2010-08-16 | 2012-02-22 | Fujifilm Corporation | Radiation reflection plate for LED |
EP2434592A2 (en) | 2010-09-24 | 2012-03-28 | Fujifilm Corporation | Anisotropically conductive member |
WO2012133173A1 (en) | 2011-03-28 | 2012-10-04 | 富士フイルム株式会社 | Reflective substrate for light-emitting element and method for producing same |
WO2013005717A1 (en) | 2011-07-04 | 2013-01-10 | 富士フイルム株式会社 | Insulating reflective substrate and method for producing same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5265181B2 (en) * | 2007-12-06 | 2013-08-14 | 株式会社アルバック | Protective film manufacturing method |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1311850A (en) * | 1969-05-06 | 1973-03-28 | Rubber Plastics Research Ass O | Sealing means |
JPS58131470A (en) * | 1982-01-29 | 1983-08-05 | Fuji Photo Film Co Ltd | Roller system seal device |
-
1990
- 1990-04-20 JP JP2103091A patent/JP2614133B2/en not_active Expired - Fee Related
-
1991
- 1991-04-19 DE DE1991617567 patent/DE69117567T2/en not_active Expired - Fee Related
- 1991-04-19 EP EP91106341A patent/EP0452954B1/en not_active Expired - Lifetime
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05179482A (en) * | 1991-11-05 | 1993-07-20 | Fuji Photo Film Co Ltd | Sealing treatment and device for planographic printing base |
EP1516744A2 (en) | 2003-09-19 | 2005-03-23 | Fuji Photo Film Co., Ltd. | Aluminium alloy blank for lithographic printing plate and support for lithographic printing plate |
EP1712368A1 (en) | 2005-04-13 | 2006-10-18 | Fuji Photo Film Co., Ltd. | Method of manufacturing a support for a lithographic printing plate |
EP2100677A1 (en) | 2008-03-06 | 2009-09-16 | Fujifilm Corporation | Method of manufacturing aluminum alloy plate for lithographic printing plate, aluminum alloy plate for lithographic printing plate obtained thereby and lithographic printing plate support |
WO2010150810A1 (en) | 2009-06-26 | 2010-12-29 | 富士フイルム株式会社 | Light reflecting substrate and process for manufacture thereof |
WO2011037005A1 (en) | 2009-09-24 | 2011-03-31 | 富士フイルム株式会社 | Lithographic printing original plate |
WO2011078010A1 (en) | 2009-12-25 | 2011-06-30 | 富士フイルム株式会社 | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
EP2384100A2 (en) | 2010-04-28 | 2011-11-02 | Fujifilm Corporation | Insulated light-reflective substrate |
EP2420869A2 (en) | 2010-08-16 | 2012-02-22 | Fujifilm Corporation | Radiation reflection plate for LED |
EP2434592A2 (en) | 2010-09-24 | 2012-03-28 | Fujifilm Corporation | Anisotropically conductive member |
WO2012133173A1 (en) | 2011-03-28 | 2012-10-04 | 富士フイルム株式会社 | Reflective substrate for light-emitting element and method for producing same |
WO2013005717A1 (en) | 2011-07-04 | 2013-01-10 | 富士フイルム株式会社 | Insulating reflective substrate and method for producing same |
Also Published As
Publication number | Publication date |
---|---|
EP0452954B1 (en) | 1996-03-06 |
JP2614133B2 (en) | 1997-05-28 |
DE69117567D1 (en) | 1996-04-11 |
DE69117567T2 (en) | 1996-08-29 |
EP0452954A3 (en) | 1992-02-19 |
EP0452954A2 (en) | 1991-10-23 |
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