JP2614133B2 - Surface treatment device for printing plate support - Google Patents
Surface treatment device for printing plate supportInfo
- Publication number
- JP2614133B2 JP2614133B2 JP2103091A JP10309190A JP2614133B2 JP 2614133 B2 JP2614133 B2 JP 2614133B2 JP 2103091 A JP2103091 A JP 2103091A JP 10309190 A JP10309190 A JP 10309190A JP 2614133 B2 JP2614133 B2 JP 2614133B2
- Authority
- JP
- Japan
- Prior art keywords
- support
- printing plate
- steam
- plate support
- surface treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/03—Chemical or electrical pretreatment
Landscapes
- Printing Plates And Materials Therefor (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は印刷版用支持体の表面処理装置に関する、特
にアルミニウム板に陽極酸化皮膜を形成した後の印刷版
用支持体を水蒸気で封孔処理をする、又はアルミニウム
板を染料で染色後の蒸気封孔処理等の表面処理装置の出
入口部に関するものである。Description: FIELD OF THE INVENTION The present invention relates to a surface treatment device for a printing plate support, and more particularly, to sealing a printing plate support after forming an anodized film on an aluminum plate with water vapor. The present invention relates to an entrance / exit portion of a surface treatment apparatus for performing a treatment or a vapor sealing treatment after dyeing an aluminum plate with a dye.
〔従来の技術〕 従来、印刷版用支持体(以後支持体と称する)として
アルミニウム板(アルミニウム合金を含む)を使用する
場合、アルミニウム板に陽極酸化皮膜を形成させるが、
該支持体と感光組成物との密着を最適なものとするため
に陽極酸化皮膜をエッチングしたのち、水蒸気若しくは
熱水で封孔処理をして、経時安定性の良い、現像性の良
好な、非画像部の汚れのない感光性印刷版を与える支持
体の表面処理装置がある(特公昭56−12518号公報参
照)。[Prior art] Conventionally, when an aluminum plate (including an aluminum alloy) is used as a support for a printing plate (hereinafter referred to as a support), an anodic oxide film is formed on the aluminum plate.
After the anodic oxide film is etched to optimize the adhesion between the support and the photosensitive composition, it is sealed with water vapor or hot water, and has good stability over time and good developability. There is a surface treatment apparatus for a support that provides a photosensitive printing plate free of stains on non-image areas (see Japanese Patent Publication No. 56-12518).
この様な装置において、水蒸気を用いて支持体を連続
的に表面処理をする装置においては、支持体を水蒸気処
理をする室の出入口は支持体表面に非接触の蒸気漏れ防
止対策(シール対策)が必要となる。In such an apparatus, in an apparatus for continuously treating the surface of a support using steam, the entrance and exit of a chamber for steam-treating the support are not in contact with the surface of the support to prevent steam leakage (measure for sealing). Is required.
支持体表面に非接触のシール装置としては、支持体裏
面をローラで支え、支持体表面の関隙を出来るだけ狭く
して、支持体表面に対向する面に排気口を設け排気する
装置(特開昭58−131470号公報参照)や、第3図に示す
ように支持体出入口に支持体1の両面に無接触のラビリ
ンス構造11のシール部分を設け、水蒸気の逃げを出来る
だけ少なくする装置等が使用されていた。As a sealing device that does not contact the surface of the support, a device that supports the back surface of the support with a roller, narrows the gap between the surfaces of the support as much as possible, and provides an exhaust port on the surface facing the surface of the support to exhaust air (special) And a device for providing a noncontact labyrinth structure 11 on both sides of the support 1 at the entrance and exit of the support to minimize the escape of water vapor as shown in FIG. Was used.
しかしながら、上記の装置はいづれも (1) 出入口部に精度の高いシール設備を製作する必
要がある。However, any of the above-mentioned devices requires the following: (1) It is necessary to manufacture highly accurate sealing equipment at the entrance and exit.
(2) 支持体のバタツキによる支持体へのキズ付き故
障の発生を防止するためには、隙間のクリアランスに限
界があり、漏れ防止の効果が得られない場合がある。(2) In order to prevent the occurrence of a damage to the support due to the flapping of the support, the clearance of the gap is limited and the effect of preventing leakage may not be obtained.
(3) 新旧支持体の接合部等、支持体の厚みや支持体
のバタツキの挙動の非定常な部分では、クリアランスを
増加させる設備を付帯させる必要があり、複雑で大掛か
りな設備となる。(3) In an unsteady portion of the thickness of the support or the flapping behavior of the support, such as a joint portion between the old and new supports, it is necessary to add a facility for increasing the clearance, which is a complicated and large-scale facility.
(4) 蒸気使用量が必要以上に大量となる。(4) The amount of steam used becomes larger than necessary.
等の問題点を有していた。And so on.
本発明の目的は上記従来の問題点を解消し、安価な設
備で、支持体の厚みや、バタツキに関係なく、支持体に
傷を付けることなく、蒸気使用量も必要な量で済ますこ
との出来る出入口部を有する印刷版用支持体の表面処理
装置を提供することにある。An object of the present invention is to solve the above-mentioned conventional problems, to provide an inexpensive facility, to use a necessary amount of steam without damaging the support, regardless of the thickness of the support and flapping. It is an object of the present invention to provide a surface treatment apparatus for a printing plate support having a possible entrance and exit.
本発明の上記目的は、 水蒸気を用い印刷版用支持体を連続的に表面処理する
装置において、該印刷版用支持体が該装置外部と出入す
る入口部,出口部の少なくとも一方に、該印刷版用支持
体がローラに支えられて通過する液体の小槽部を設けた
ことを特徴とする印刷版用支持体の表面処理装置、 によって達成される。An object of the present invention is to provide an apparatus for continuously surface-treating a printing plate support using water vapor, wherein the printing plate support is provided at least at one of an inlet portion and an outlet portion where the printing plate support enters and exits the outside of the device. A surface treatment device for a printing plate support, characterized in that the plate support is provided with a small tank portion for the liquid to pass while being supported by the rollers.
本発明は出入口に設けられた液体を有する小槽部の中
をローラに支持させて支持体を通すことにより、小槽部
中の液体によって本発明の装置の出入部はシールされ
る。支持体は液体中を通過するちためにキズ付きの心配
なく、又クリアランスの心配もない。According to the present invention, the roller in the small-vessel portion provided with the liquid at the entrance is passed through the support, and the liquid in the small-vessel portion seals the entrance and exit of the apparatus of the present invention. Since the support passes through the liquid, there is no fear of scratching or clearance.
本発明の実施態様を図を用いて説明する。 An embodiment of the present invention will be described with reference to the drawings.
第1図は本発明の印刷版用支持体の表面処理装置の一
実施例の側面断面図であり、第2図は本発明のその他の
一実施例の側面断面図である。FIG. 1 is a side sectional view of one embodiment of a surface treatment device for a printing plate support of the present invention, and FIG. 2 is a side sectional view of another embodiment of the present invention.
本発明は第1図に示すように、例えば陽極酸化皮膜を
形成した後エッチングを済ました支持体1が蒸気封孔処
理装置3に入って、蒸気供給ノズル2より吹きつけられ
る蒸気によってエッチング表面の蒸気封孔処理をされ、
該装置外部と出入する入口部4,出口部5にそれぞれ支持
体1がローラ8に支えられて通過する液体の小槽部6,7
を設けて装置内外をシールしたものである。In the present invention, as shown in FIG. 1, for example, a support 1 which has been etched after forming an anodic oxide film enters a steam sealing apparatus 3 and the surface of the etching surface is etched by steam blown from a steam supply nozzle 2. Steam-sealed,
The support 1 is supported by a roller 8 at an inlet 4 and an outlet 5 which enter and exit the outside of the apparatus.
Is provided to seal the inside and outside of the apparatus.
第2図は第1図の変形例で、装置の入口部4に装置の
壁面9に沿って水供給口10より水膜を作り、支持体はロ
ーラ8に支えられて通過する液体の小槽部6が設けられ
た状態を示す。この場合は、小槽部6は流れて来た液を
受ける槽となるが、蒸気封孔処理装置3が液体によって
シールされることは第1図と同様である。FIG. 2 shows a modification of FIG. 1, in which a water film is formed at the inlet 4 of the apparatus along a wall 9 of the apparatus from a water supply port 10, and a support is supported by rollers 8 and a small tank of liquid passing therethrough. 5 shows a state in which the unit 6 is provided. In this case, the small tank 6 serves as a tank for receiving the flowing liquid, but the vapor sealing apparatus 3 is sealed with the liquid as in FIG.
本発明に用いられる液体は熱水であることが望ましい
が、常温の水でもかまわない。勿論純水であってもかま
わないが、有機溶媒、アミン化合物、有機酸、ケイ素の
酸素酸及びその塩、リン酸素酸及びその塩、硫黄の酸素
酸及びその塩及び硼素の酸素酸及びその塩から選ばれた
少なくとも1つの化合物を含む熱水溶液又は水溶液を用
いることも出来る。The liquid used in the present invention is desirably hot water, but may be water at room temperature. Of course, pure water may be used, but organic solvents, amine compounds, organic acids, silicon oxyacids and salts thereof, phosphorus oxyacids and salts thereof, sulfur oxyacids and salts thereof, and boron oxyacids and salts thereof A hot aqueous solution or an aqueous solution containing at least one compound selected from the group consisting of:
尚、本発明で用いる印刷版用支持体としては、先ず基
体としてはアルミニウム板で純アルミニウムおよびアル
ミニウム合金板が含まれる。In the support for a printing plate used in the present invention, first, as a substrate, pure aluminum and an aluminum alloy plate as an aluminum plate are included.
アルミニウム合金としては、種々のものが使用でき、
例えば珪素,銅,マンガン,マグネシウム,クロム,亜
鉛,鉛,ビスマス,ニッケルなどの金属とのアルミニウ
ム合金がある。Various aluminum alloys can be used,
For example, there is an aluminum alloy with a metal such as silicon, copper, manganese, magnesium, chromium, zinc, lead, bismuth, and nickel.
このアルミニウム板が先ず油脂,サビ,ゴミなどを洗
浄され、必要に応じて砂目立て処理をされる。The aluminum plate is first washed with grease, rust, dust and the like, and is grained as required.
砂目立て後エッチング処理,陽極酸化皮膜の形成,そ
の後エッチングがおこなわれるが、それらの処理の詳細
については特公昭56−12518号公報記載のとおりであ
る。また、陽極酸化皮膜前及び後のエッチング処理はな
くてもかまわない。上記のように表面処理をされたもの
を本発明の印刷版用支持体と言う。本発明における水蒸
気を使用して連続的に表面処理するということは、水蒸
気処理する場合の温度は約80〜200℃で好ましくは約90
〜120℃である。処理時間は3秒〜30分で、好ましくは
5秒〜10分である。水素イオン濃度は約2〜11が適当
で、好ましくは約3〜10である。加圧水蒸気で処理する
時の圧力は約1〜15kg/cm2(絶対圧)が適当であり、好
ましくは約1〜5kg/cm2が好ましい。After graining, etching, formation of an anodic oxide film, and etching are performed. The details of these processes are as described in JP-B-56-12518. Further, the etching process before and after the anodic oxide film may be omitted. What has been surface-treated as described above is referred to as a printing plate support of the present invention. Continuous surface treatment using steam in the present invention means that the temperature in the case of steam treatment is about 80 to 200 ° C., preferably about 90 ° C.
~ 120 ° C. The processing time is 3 seconds to 30 minutes, preferably 5 seconds to 10 minutes. The hydrogen ion concentration is suitably about 2 to 11, and preferably about 3 to 10. The pressure when treating with pressurized steam is suitably about 1 to 15 kg / cm 2 (absolute pressure), preferably about 1 to 5 kg / cm 2 .
本発明によって得られる印刷版用支持体はその表面が
高い親水性を示し、且つその上に設けられる感光性組成
物との密着性が良好なので、このまま使用することが出
来るが、必要により更に表面処理を施すことができる。
それは下塗処理である。又、その表面に塗布する感光性
組成物等に関しても、特開昭56−12518号公報を参考に
されたい。The printing plate support obtained by the present invention can be used as it is because its surface shows high hydrophilicity and good adhesion to the photosensitive composition provided thereon, but it can be used as it is. Processing can be performed.
It is a priming process. Also, with respect to the photosensitive composition applied to the surface, see JP-A-56-12518.
本発明を1実施例を用いて更に説明する。 The present invention will be further described with reference to an example.
実施例−1 支持体として厚み0.4mm,幅1500mmのアルミニウム板を
陽極酸化皮膜を形成した後エッチングを行い、第1図に
示すような装置を通し、水蒸気による表面封孔処理を行
った。蒸気封孔処理装置3内の条件として圧力20mmAqに
加圧、温度98〜102℃であり、小槽部6,7の条件としては
底面寸法300mm×1800mm,高さ400mmの水槽に70℃の熱水
を入れ、蒸気封孔処理装置出入口部の蒸気漏れを防い
だ。この時の使用蒸気量は150kg/hrであった。Example 1 An aluminum plate having a thickness of 0.4 mm and a width of 1500 mm as a support was etched after forming an anodic oxide film thereon, and passed through a device as shown in FIG. 1 to perform a surface sealing treatment with water vapor. The pressure in the steam sealing apparatus 3 is 20 mmAq and the temperature is 98-102 ° C. The conditions of the small tanks 6 and 7 are as follows. Water was added to prevent steam leakage at the entrance and exit of the steam sealing system. The amount of steam used at this time was 150 kg / hr.
比較例−1 従来の技術として第3図に示すようなラビリンス構造
のシール装置を用いて蒸気封孔処理装置の条件を実施例
−1と同様に保つようにしたところ、支持体にキズを付
けないラビリンス構造の最狭部のクリアランス12は10mm
であった。蒸気の漏れが多く、使用蒸気量は950kg/hrと
なり、実施例−1の約6倍強を要した。Comparative Example-1 As a conventional technique, a labyrinth-type sealing device as shown in FIG. 3 was used to maintain the conditions of the steam sealing treatment device in the same manner as in Example-1. No labyrinth structure, the narrowest clearance 12 is 10mm
Met. There were many leaks of steam, the amount of used steam was 950 kg / hr, and required about 6 times more than that of Example-1.
本発明の印刷版用支持体の表面処理装置により、上記
の説明及び実施例に示すように、 (1) 蒸気の漏れがなくなり、使用蒸気量が著しく減
少し、製造コストが低下した。According to the surface treatment apparatus for a printing plate support of the present invention, as shown in the above description and Examples, (1) no steam leakage, the amount of used steam was significantly reduced, and the production cost was reduced.
(2) 出入口部の装置が簡単なものとなり、設備コス
トの低下がはかられた。(2) The equipment at the entrance and exit has been simplified, and equipment costs have been reduced.
(3) 特に狭いクリアランスの箇所がないため、製造
時の安定性が得られる。(3) Since there is no particularly narrow clearance, stability during manufacturing can be obtained.
更に、シール用の小槽部の液体に浸漬することによ
り、充分な親水化処理を行うことが出来、品質の向上,
安定およびコストダウンに貢献した。Furthermore, by immersing in a liquid in a small tank for sealing, a sufficient hydrophilizing treatment can be performed, thereby improving quality.
It contributed to stability and cost reduction.
第1図は本発明の印刷版用支持体の表面処理装置の一実
施例の側面断面図、第2図は本発明の一変形例の側面断
面図、第3図は従来の技術によるラビリンス構造の出入
口部の一例の側面断面図である。 1……支持体、2……蒸気供給ノズル 3……蒸気封孔処理装置、4……入口部 5……出口部、6,7……小槽部 8……ローラ、9……壁面 10……水供給口 11……ラビリンス構造 12……最狭部のクリアランスFIG. 1 is a side sectional view of one embodiment of a surface treatment device for a printing plate support of the present invention, FIG. 2 is a side sectional view of a modification of the present invention, and FIG. 3 is a labyrinth structure according to the prior art. FIG. 4 is a side sectional view of an example of the entrance / exit portion. DESCRIPTION OF SYMBOLS 1 ... Support body 2, ... Steam supply nozzle 3 ... Steam sealing processing apparatus 4, ... Inlet part 5 ... Outlet part, 6,7 ... Small tank part 8 ... Roller, 9 ... Wall surface 10 ... water supply port 11 ... labyrinth structure 12 ... clearance at the narrowest part
Claims (1)
面処理する装置において、該印刷版用支持体が該装置外
部と出入する入口部,出口部の少なくとも一方に、該印
刷版用支持体がローラに支えられて通過する液体の小槽
部を設けたことを特徴とする印刷版用支持体の表面処理
装置1. An apparatus for continuously surface-treating a printing plate support using water vapor, wherein the printing plate support is provided at least at one of an entrance and an exit where the printing plate support enters and exits outside the apparatus. An apparatus for treating a surface of a printing plate support, wherein the support is provided with a small tank portion for passing the liquid supported by rollers.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2103091A JP2614133B2 (en) | 1990-04-20 | 1990-04-20 | Surface treatment device for printing plate support |
DE1991617567 DE69117567T2 (en) | 1990-04-20 | 1991-04-19 | Surface treatment device for printing plates |
EP91106341A EP0452954B1 (en) | 1990-04-20 | 1991-04-19 | Surface treatment apparatus for printing plate support |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2103091A JP2614133B2 (en) | 1990-04-20 | 1990-04-20 | Surface treatment device for printing plate support |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH044194A JPH044194A (en) | 1992-01-08 |
JP2614133B2 true JP2614133B2 (en) | 1997-05-28 |
Family
ID=14344970
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2103091A Expired - Fee Related JP2614133B2 (en) | 1990-04-20 | 1990-04-20 | Surface treatment device for printing plate support |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0452954B1 (en) |
JP (1) | JP2614133B2 (en) |
DE (1) | DE69117567T2 (en) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2767727B2 (en) * | 1991-11-05 | 1998-06-18 | 富士写真フイルム株式会社 | Method and apparatus for sealing a lithographic printing plate support |
JP4250490B2 (en) | 2003-09-19 | 2009-04-08 | 富士フイルム株式会社 | Aluminum alloy base plate for planographic printing plate and support for planographic printing plate |
EP1712368B1 (en) | 2005-04-13 | 2008-05-14 | FUJIFILM Corporation | Method of manufacturing a support for a lithographic printing plate |
JP5265181B2 (en) * | 2007-12-06 | 2013-08-14 | 株式会社アルバック | Protective film manufacturing method |
JP2009208140A (en) | 2008-03-06 | 2009-09-17 | Fujifilm Corp | Manufacturing method of aluminum alloy sheet for planographic printing plate, aluminum alloy sheet for planographic printing plate and support for planographic printing plate manufactured by the method |
US20120091495A1 (en) | 2009-06-26 | 2012-04-19 | Fujifilm Corporation | Light reflecting substrate and process for manufacture thereof |
US8883401B2 (en) | 2009-09-24 | 2014-11-11 | Fujifilm Corporation | Lithographic printing original plate |
US20120256224A1 (en) | 2009-12-25 | 2012-10-11 | Fujifilm Corporation | Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element |
JP2012033853A (en) | 2010-04-28 | 2012-02-16 | Fujifilm Corp | Insulation light reflection substrate |
KR20120022628A (en) | 2010-08-16 | 2012-03-12 | 후지필름 가부시키가이샤 | Radiation reflection plate for led |
EP2434592A3 (en) | 2010-09-24 | 2014-09-24 | Fujifilm Corporation | Anisotropically conductive member |
CN103477458A (en) | 2011-03-28 | 2013-12-25 | 富士胶片株式会社 | Reflective substrate for light-emitting element and method for producing same |
EP2730684A1 (en) | 2011-07-04 | 2014-05-14 | Fujifilm Corporation | Insulating reflective substrate and method for producing same |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1311850A (en) * | 1969-05-06 | 1973-03-28 | Rubber Plastics Research Ass O | Sealing means |
JPS58131470A (en) * | 1982-01-29 | 1983-08-05 | Fuji Photo Film Co Ltd | Roller system seal device |
-
1990
- 1990-04-20 JP JP2103091A patent/JP2614133B2/en not_active Expired - Fee Related
-
1991
- 1991-04-19 DE DE1991617567 patent/DE69117567T2/en not_active Expired - Fee Related
- 1991-04-19 EP EP91106341A patent/EP0452954B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69117567D1 (en) | 1996-04-11 |
EP0452954B1 (en) | 1996-03-06 |
DE69117567T2 (en) | 1996-08-29 |
JPH044194A (en) | 1992-01-08 |
EP0452954A3 (en) | 1992-02-19 |
EP0452954A2 (en) | 1991-10-23 |
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