JPH0440704B2 - - Google Patents
Info
- Publication number
- JPH0440704B2 JPH0440704B2 JP54017224A JP1722479A JPH0440704B2 JP H0440704 B2 JPH0440704 B2 JP H0440704B2 JP 54017224 A JP54017224 A JP 54017224A JP 1722479 A JP1722479 A JP 1722479A JP H0440704 B2 JPH0440704 B2 JP H0440704B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- photosensitive resin
- screen mesh
- film
- highly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011347 resin Substances 0.000 claims description 50
- 229920005989 resin Polymers 0.000 claims description 50
- 239000000758 substrate Substances 0.000 claims description 43
- 239000007788 liquid Substances 0.000 claims description 33
- 238000000034 method Methods 0.000 claims description 24
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000007650 screen-printing Methods 0.000 description 7
- 238000000576 coating method Methods 0.000 description 4
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000002518 antifoaming agent Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- KWNYRTDLTSGITQ-UHFFFAOYSA-N 2-methylpropyl 2-(dimethylamino)benzoate Chemical compound CC(C)COC(=O)C1=CC=CC=C1N(C)C KWNYRTDLTSGITQ-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- IDCBOTIENDVCBQ-UHFFFAOYSA-N TEPP Chemical compound CCOP(=O)(OCC)OP(=O)(OCC)OCC IDCBOTIENDVCBQ-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- LQBJWKCYZGMFEV-UHFFFAOYSA-N lead tin Chemical compound [Sn].[Pb] LQBJWKCYZGMFEV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1722479A JPS55110251A (en) | 1979-02-19 | 1979-02-19 | Production of resist image |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1722479A JPS55110251A (en) | 1979-02-19 | 1979-02-19 | Production of resist image |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55110251A JPS55110251A (en) | 1980-08-25 |
| JPH0440704B2 true JPH0440704B2 (es) | 1992-07-03 |
Family
ID=11937972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1722479A Granted JPS55110251A (en) | 1979-02-19 | 1979-02-19 | Production of resist image |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55110251A (es) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4988608A (es) * | 1972-12-15 | 1974-08-24 | ||
| JPS5211402B2 (es) * | 1972-02-21 | 1977-03-31 | ||
| JPS53104306A (en) * | 1977-02-23 | 1978-09-11 | Kansai Paint Co Ltd | Photosensitive resin plate for thick film screen print |
| JPS5412908A (en) * | 1977-06-27 | 1979-01-31 | Nippon Electric Co | Screen for printing thick film |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5211402U (es) * | 1975-07-14 | 1977-01-26 |
-
1979
- 1979-02-19 JP JP1722479A patent/JPS55110251A/ja active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5211402B2 (es) * | 1972-02-21 | 1977-03-31 | ||
| JPS4988608A (es) * | 1972-12-15 | 1974-08-24 | ||
| JPS53104306A (en) * | 1977-02-23 | 1978-09-11 | Kansai Paint Co Ltd | Photosensitive resin plate for thick film screen print |
| JPS5412908A (en) * | 1977-06-27 | 1979-01-31 | Nippon Electric Co | Screen for printing thick film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55110251A (en) | 1980-08-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR890001078B1 (ko) | 릴리이프 영상을 제조하는 방법 | |
| US3770438A (en) | Photopolymerizable transfer elements | |
| CA1208811A (en) | Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards | |
| US4424089A (en) | Photoprinting process and apparatus for exposing paste-consistency photopolymers | |
| US4291118A (en) | Relief imaging liquids | |
| US4376815A (en) | Method of applying photoresist by screening in the formation of printed circuits | |
| EP0141868A1 (en) | High resolution phototransparency image forming with photopolymers | |
| US4291116A (en) | Method of image reproduction and materials therefor | |
| JPH0756355A (ja) | 回路板の被覆方法 | |
| US4548884A (en) | Registering and exposing sheet substrates using photosensitive liquid | |
| US4954421A (en) | Photoflashing a liquid polymer layer on a phototool surface exposed to air | |
| EP0096863B1 (en) | Process of registering and exposing sheet substrates using photosensitive liquid | |
| US4888270A (en) | Photoprinting process and apparatus for exposing paste consistency photopolymers | |
| CA1134053A (en) | Producing printed circuits by soldering metal powder images | |
| EP0052806B1 (en) | Dot-enlargement process for photopolymer litho masks | |
| JPH0440704B2 (es) | ||
| US3736138A (en) | Process for transferring images from a surface to a temporary surface and to a final surface | |
| US4657839A (en) | Photoprinting process and apparatus for exposing paste-consistency photopolymers | |
| JPH0357697A (ja) | 印刷用メタルマスクおよびその製造方法 | |
| EP0469973A1 (en) | Method for forming relief patterns | |
| US4560639A (en) | Reusable phototransparency image forming tools for direct contact printing | |
| US4669869A (en) | Photoprinting process and apparatus for exposing paste-consistency photopolymers | |
| US809955A (en) | Photomechanical printing. | |
| JPS584140A (ja) | 液体型感光性樹脂の塗布方法 | |
| JPS61200536A (ja) | 感光性組成物 |