JPH04372675A - Covering resin composition - Google Patents
Covering resin compositionInfo
- Publication number
- JPH04372675A JPH04372675A JP17728991A JP17728991A JPH04372675A JP H04372675 A JPH04372675 A JP H04372675A JP 17728991 A JP17728991 A JP 17728991A JP 17728991 A JP17728991 A JP 17728991A JP H04372675 A JPH04372675 A JP H04372675A
- Authority
- JP
- Japan
- Prior art keywords
- polymerizable unsaturated
- same
- weight
- group
- vinyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims description 16
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 54
- -1 polysiloxane Polymers 0.000 claims abstract description 42
- 150000001875 compounds Chemical class 0.000 claims abstract description 34
- 239000000178 monomer Substances 0.000 claims abstract description 27
- 229920001400 block copolymer Polymers 0.000 claims abstract description 21
- 238000000576 coating method Methods 0.000 claims abstract description 20
- 239000000203 mixture Substances 0.000 claims abstract description 20
- 239000011248 coating agent Substances 0.000 claims abstract description 17
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 15
- 239000003960 organic solvent Substances 0.000 claims abstract description 13
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 3
- 150000002367 halogens Chemical class 0.000 claims abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 3
- 125000000751 azo group Chemical group [*]N=N[*] 0.000 claims description 40
- 239000002253 acid Substances 0.000 claims description 11
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical group CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 230000000379 polymerizing effect Effects 0.000 claims description 5
- 125000002560 nitrile group Chemical group 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 11
- 150000001732 carboxylic acid derivatives Chemical class 0.000 abstract description 10
- 229920002554 vinyl polymer Polymers 0.000 abstract description 10
- 239000000049 pigment Substances 0.000 abstract description 4
- 238000002156 mixing Methods 0.000 abstract description 2
- 239000006185 dispersion Substances 0.000 abstract 1
- 150000002825 nitriles Chemical class 0.000 abstract 1
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 16
- 238000006116 polymerization reaction Methods 0.000 description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 11
- 229920005989 resin Polymers 0.000 description 11
- 239000011347 resin Substances 0.000 description 11
- 239000002904 solvent Substances 0.000 description 10
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 9
- 239000003999 initiator Substances 0.000 description 9
- 238000012360 testing method Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000007423 decrease Effects 0.000 description 7
- 229920000642 polymer Polymers 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 5
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 5
- 239000003973 paint Substances 0.000 description 5
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 5
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 150000001408 amides Chemical class 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- 239000008096 xylene Substances 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 235000019441 ethanol Nutrition 0.000 description 3
- 239000001530 fumaric acid Substances 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 238000000425 proton nuclear magnetic resonance spectrum Methods 0.000 description 3
- 230000035484 reaction time Effects 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 238000000862 absorption spectrum Methods 0.000 description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229940072049 amyl acetate Drugs 0.000 description 2
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 150000004985 diamines Chemical class 0.000 description 2
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- WLJVNTCWHIRURA-UHFFFAOYSA-N pimelic acid Chemical compound OC(=O)CCCCCC(O)=O WLJVNTCWHIRURA-UHFFFAOYSA-N 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 229940090181 propyl acetate Drugs 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 229920006163 vinyl copolymer Polymers 0.000 description 2
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- 125000001340 2-chloroethyl group Chemical group [H]C([H])(Cl)C([H])([H])* 0.000 description 1
- BQBSIHIZDSHADD-UHFFFAOYSA-N 2-ethenyl-4,5-dihydro-1,3-oxazole Chemical compound C=CC1=NCCO1 BQBSIHIZDSHADD-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- DKIDEFUBRARXTE-UHFFFAOYSA-N 3-mercaptopropanoic acid Chemical compound OC(=O)CCS DKIDEFUBRARXTE-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 101100008044 Caenorhabditis elegans cut-1 gene Proteins 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000012615 aggregate Substances 0.000 description 1
- 150000007824 aliphatic compounds Chemical class 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 238000012661 block copolymerization Methods 0.000 description 1
- 125000005997 bromomethyl group Chemical group 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- MLUCVPSAIODCQM-NSCUHMNNSA-N crotonaldehyde Chemical compound C\C=C\C=O MLUCVPSAIODCQM-NSCUHMNNSA-N 0.000 description 1
- MLUCVPSAIODCQM-UHFFFAOYSA-N crotonaldehyde Natural products CC=CC=O MLUCVPSAIODCQM-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002168 ethanoic acid esters Chemical class 0.000 description 1
- UIWXSTHGICQLQT-UHFFFAOYSA-N ethenyl propanoate Chemical compound CCC(=O)OC=C UIWXSTHGICQLQT-UHFFFAOYSA-N 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 1
- PBZROIMXDZTJDF-UHFFFAOYSA-N hepta-1,6-dien-4-one Chemical compound C=CCC(=O)CC=C PBZROIMXDZTJDF-UHFFFAOYSA-N 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000006459 hydrosilylation reaction Methods 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000010551 living anionic polymerization reaction Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 1
- MADOXCFISYCULS-UHFFFAOYSA-N octyl 2-sulfanylacetate Chemical compound CCCCCCCCOC(=O)CS MADOXCFISYCULS-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 230000037048 polymerization activity Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000010454 slate Substances 0.000 description 1
- 229910000104 sodium hydride Inorganic materials 0.000 description 1
- 239000012312 sodium hydride Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- FUSUHKVFWTUUBE-UHFFFAOYSA-N vinyl methyl ketone Natural products CC(=O)C=C FUSUHKVFWTUUBE-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、被覆用樹脂組成物に関
し、さらに詳細には、分子主鎖中に特定の結合を有する
アゾ基含有ポリシロキサン化合物の存在下に、重合性不
飽和単量体混合物を重合させて得られるビニル−シリコ
ーン系ブロック共重合体と有機溶媒とを含む耐候性、撥
水性塗料などの分野に利用できる被覆用樹脂組成物に関
する。[Field of Industrial Application] The present invention relates to a resin composition for coating, and more particularly, the present invention relates to a resin composition for coating, and more particularly, the present invention relates to a coating resin composition in which a polymerizable unsaturated monomer is The present invention relates to a coating resin composition that can be used in fields such as weather-resistant and water-repellent coatings, which contains a vinyl-silicone block copolymer obtained by polymerizing a silicone-based block copolymer and an organic solvent.
【0002】0002
【従来の技術】従来、撥水性、耐候性の良いシリコーン
樹脂を用いてビニル系樹脂を改質しようとした場合、こ
れらの両樹脂は相溶性が全くないところから、ポリマー
ブレンドによって得られる複合体は均一性に乏しく、そ
の皮膜中に含まれるシリコーン樹脂は安定したドメイン
またはマトリックスとして存在し得ず、結果として表面
層に移行したシリコーン樹脂は、摩擦や溶剤により除去
されるため、効率かつ実用的なビニル樹脂の改質剤とは
ならなかった。この欠点を改良するものとしてビニル−
シリコーン系ブロック共重合体が提案された。このビニ
ル−シリコーン系ブロック共重合体の製造方法としては
、リビングアニオン重合法(例えば、M.Morton
ら,J.Appl.Polym.Sci.,8,270
7(1964))、ヒドロシリル化法(例えば、P.C
haumontら,Polymer,22〔5〕,66
3(1981))等が知られているが、共に厳密な重合
条件のコントロールが必要であり、適用できるビニル系
モノマーが限られるなどの欠点があった。[Prior Art] Conventionally, when attempts were made to modify vinyl resins using silicone resins with good water repellency and weather resistance, these two resins were not compatible at all, so composites obtained by polymer blending were used. has poor uniformity, and the silicone resin contained in the film cannot exist as a stable domain or matrix. As a result, the silicone resin that migrates to the surface layer is removed by friction or solvent, making it an efficient and practical solution. It did not become a suitable modifier for vinyl resin. As a solution to this drawback, vinyl
Silicone-based block copolymers have been proposed. As a method for producing this vinyl-silicone block copolymer, a living anionic polymerization method (for example, M. Morton
et al., J. Appl. Polym. Sci. ,8,270
7 (1964)), hydrosilylation methods (e.g. P.C.
haumont et al., Polymer, 22[5], 66
3 (1981)), but both require strict control of polymerization conditions and have drawbacks such as limited applicable vinyl monomers.
【0003】0003
【発明が解決しようとする課題】本発明の目的は、上記
従来のポリマーブレンドによって得られる複合体とか、
従来のビニル−シリコーン系ブロック共重合体の製造方
法の欠点を克服し、耐候性、撥水性等に優れた被覆用樹
脂組成物を提供することにある。OBJECTS OF THE INVENTION The object of the present invention is to provide a composite material obtained by the above-mentioned conventional polymer blend,
The object of the present invention is to overcome the drawbacks of conventional methods for producing vinyl-silicone block copolymers and to provide a resin composition for coating that has excellent weather resistance, water repellency, etc.
【0004】0004
【課題を解決するための手段】本発明によって、上記目
的を達成し得る被覆用樹脂組成物が提供される。Means for Solving the Problems The present invention provides a coating resin composition that can achieve the above objects.
【0005】すなわち、本発明は、一般式(I)That is, the present invention provides general formula (I)
【00
06】00
06]
【化3】
〔式中、各R1 は、同一または異なって、水素原子、
低級アルキル基またはニトリル基を示し、各R2 は、
同一または異なって、水素原子または低級アルキル基を
示し、各R3 は、同一または異なって、水素原子、ハ
ロゲン原子置換若しくは非置換のアルキル基またはフェ
ニル基を示す。pは、同一または異なって、0または1
〜6の整数を示し、mは0または1〜200の整数を示
し、Aは−NHまたは−Oを示し、Bは(CH2 )q
(但し、qは同一または異なって、0または1〜6の整
数を示す。)または−(CH2 )3 OCH2 CH
2 −を示す。〕[In the formula, each R1 is the same or different and is a hydrogen atom,
It represents a lower alkyl group or a nitrile group, and each R2 is
The same or different R3's represent a hydrogen atom or a lower alkyl group, and each R3 is the same or different and represents a hydrogen atom, a halogen atom-substituted or unsubstituted alkyl group, or a phenyl group. p is the same or different, 0 or 1
represents an integer of ~6, m represents 0 or an integer of 1 to 200, A represents -NH or -O, B represents (CH2)q
(However, q is the same or different and represents 0 or an integer from 1 to 6.) or -(CH2)3OCH2CH
2 indicates -. ]
【0007】で表わされる繰り返し単位を有し、1分子
中に少なくとも1個のアゾ結合を有する数平均分子量が
1500〜10万のアゾ基含有ポリシロキサン化合物の
2〜90重量%の存在下に、(メタ)アクリル酸エステ
ルを主成分とし、かつ重合性不飽和カルボン酸を1〜1
0重量%含有する重合性不飽和単量体混合物の10〜9
8重量%を重合させて得られるビニル−シリコーン系ブ
ロック共重合体と有機溶媒を含むことを特徴とする被覆
用樹脂組成物に関する。In the presence of 2 to 90% by weight of an azo group-containing polysiloxane compound having a repeating unit represented by the following and having at least one azo bond in one molecule and a number average molecular weight of 1,500 to 100,000, The main component is (meth)acrylic acid ester, and 1 to 1 polymerizable unsaturated carboxylic acid.
10 to 9 of the polymerizable unsaturated monomer mixture containing 0% by weight
The present invention relates to a coating resin composition comprising a vinyl-silicone block copolymer obtained by polymerizing 8% by weight and an organic solvent.
【0008】また、本発明は、上記一般式(I)で表わ
される繰り返し単位と一般式(II)[0008] The present invention also provides a repeating unit represented by the above general formula (I) and a repeating unit represented by the general formula (II).
【0009】[0009]
【化4】
〔式中、Yは二塩基酸残基を示す。R2 ,R3 ,A
,Bおよびmは前記に同じ。〕embedded image [In the formula, Y represents a dibasic acid residue. R2, R3, A
, B and m are the same as above. ]
【0010】で表わされる繰り返し単位を有し、1分子
中に少なくとも1個のアゾ結合を有する数平均分子量が
1500〜10万のアゾ基含有ポリシロキサン化合物の
2〜90重量%の存在下に、(メタ)アクリル酸エステ
ルを主成分とし、かつ重合性不飽和カルボン酸を1〜1
0重量%含有する重合性不飽和単量体混合物の10〜9
8重量%を重合させて得られるビニル−シリコーン系ブ
ロック共重合体と有機溶媒を含むことを特徴とする被覆
用樹脂組成物に関する。In the presence of 2 to 90% by weight of an azo group-containing polysiloxane compound having a repeating unit represented by: and having at least one azo bond in one molecule and a number average molecular weight of 1,500 to 100,000 The main component is (meth)acrylic acid ester, and 1 to 1 polymerizable unsaturated carboxylic acid.
10 to 9 of the polymerizable unsaturated monomer mixture containing 0% by weight
The present invention relates to a coating resin composition comprising a vinyl-silicone block copolymer obtained by polymerizing 8% by weight and an organic solvent.
【0011】本発明において使用される前記一般式(I
)で表わされる繰り返し単位を有するアゾ基含有ポリシ
ロキサン化合物は、1分子中に少なくとも1個のアゾ結
合を有する、数平均分子量が1500〜10万のもので
あり、高分子アゾ開始剤の1種である。The general formula (I) used in the present invention
The azo group-containing polysiloxane compound having a repeating unit represented by ) has at least one azo bond in one molecule, has a number average molecular weight of 1,500 to 100,000, and is a type of polymeric azo initiator. It is.
【0012】前記一般式(I)および一般式(II)に
おいて、低級アルキル基としては、例えばメチル、エチ
ル、プロピル、イソプロピル、ブチル、tert−ブチ
ル、ペンチル、ヘキシル基等の炭素数1〜6の直鎖また
は分枝状のアルキル基をあげることができる。また、ア
ルキル基としては、上記低級アルキル基に加えてヘプチ
ル、オクチル、ノニル、デシル、ウンデシル、ドデシル
基等の炭素数7〜12の直鎖または分枝状のアルキル基
をあげることができる。さらに、ハロゲン原子置換のア
ルキル基としては、上記アルキル基がハロゲン化された
もの、例えばクロロメチル、ブロモメチル、トリフルオ
ロメチル、2−クロロエチル、3−クロロプロピル、3
−ブロモプロピル、3,3,3,−トリフルオロプロピ
ル、1,1,2,2,−テトラヒドロパーフルオロオク
チル基などをあげることができる。ハロゲン原子として
は、例えばフッ素原子、塩素原子、臭素原子、ヨウ素原
子をあげることができる。In the general formula (I) and general formula (II), the lower alkyl group is a group having 1 to 6 carbon atoms, such as methyl, ethyl, propyl, isopropyl, butyl, tert-butyl, pentyl, hexyl group, etc. Mention may be made of straight-chain or branched alkyl groups. In addition to the above-mentioned lower alkyl groups, examples of the alkyl group include straight-chain or branched alkyl groups having 7 to 12 carbon atoms, such as heptyl, octyl, nonyl, decyl, undecyl, and dodecyl groups. Further, as the alkyl group substituted with a halogen atom, the above-mentioned alkyl group is halogenated, such as chloromethyl, bromomethyl, trifluoromethyl, 2-chloroethyl, 3-chloropropyl, 3
Examples include -bromopropyl, 3,3,3,-trifluoropropyl, and 1,1,2,2,-tetrahydroperfluorooctyl groups. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.
【0013】一般式(I)で表わされる繰り返し単位を
有するアゾ基含有ポリシロキサン化合物としては、一般
式(III)As the azo group-containing polysiloxane compound having a repeating unit represented by general formula (I), general formula (III)
【0014】[0014]
【化5】 〔式中、R1 およびpは前記に同じ。〕[C5] [In the formula, R1 and p are the same as above. ]
【0015】
で表わされる構成成分と一般式(IV)[0015]
Constituent components and general formula (IV) represented by
【0016】[0016]
【化6】
〔式中、R2 ,R3 ,A,Bおよびmは前記に同じ
。〕embedded image [In the formula, R2, R3, A, B and m are the same as above. ]
【0017】で表わされる構成成分とが交互に結合
していることはもちろんのこと、一般式(III)で表
わされる構成成分の一部が一般式(V)It goes without saying that the constituent components represented by the formula (III) are alternately bonded to each other, and some of the constituent components represented by the general formula (III) are bonded to the general formula (V).
【0018】[0018]
【化7】−CO−Y−CO−
(V)〔式中、Yは二塩基酸
残基を示す。〕[Chemical 7]-CO-Y-CO-
(V) [Wherein, Y represents a dibasic acid residue. ]
【0019】で表わされる構成成分で置
き変えられたものをも包含する。一般式(V)で表わさ
れる構成成分で置き換え得る量は、アゾ基含有ポリシロ
キサン化合物のラジカル重合活性が消失しない量を限度
とする。It also includes those substituted with the constituent components represented by the following. The amount that can be replaced with the component represented by the general formula (V) is limited to an amount that does not eliminate the radical polymerization activity of the azo group-containing polysiloxane compound.
【0020】二塩基酸の例としては、マロン酸、コハク
酸、グルタル酸、アジピン酸、ピメリン酸、コルク酸、
アゼライン酸、セバシン酸、フマル酸、イタコン酸、テ
レフタル酸、イソフタル酸、フタル酸等をあげることが
できる。Examples of dibasic acids include malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, corkic acid,
Examples include azelaic acid, sebacic acid, fumaric acid, itaconic acid, terephthalic acid, isophthalic acid, and phthalic acid.
【0021】前記一般式(I)で表わされるアゾ基含有
ポリシロキサン化合物は、例えば一般式(VI)The azo group-containing polysiloxane compound represented by the general formula (I) is, for example, a compound represented by the general formula (VI).
【00
22】00
22]
【化8】
〔式中、Bは(CH2 )q または−(CH2 )3
OCH2 CH2 −、DはNH2 またはOHを示
し、R2 ,R3 ,qおよびmは前記に同じ。〕[In the formula, B is (CH2)q or -(CH2)3
OCH2 CH2 -, D represents NH2 or OH, and R2, R3, q and m are the same as above. ]
【0023】で表わされるポリシロキサン(ジシロキサ
ンも含む)セグメントを含有するジアミンまたはジヒド
ロキシ化合物と、一般式(VII)A diamine or dihydroxy compound containing a polysiloxane (including disiloxane) segment represented by the formula (VII);
【0024】[0024]
【化9】
〔式中、R1 ,pは前記に同じ。Xはハロゲン原子を
示す。〕embedded image [In the formula, R1 and p are the same as above. X represents a halogen atom. ]
【0025】で表わされるアゾ基を含有する二塩基酸ジ
ハライドとを反応させることにより高収率で製造するこ
とができる。また、アゾ基含有ポリシロキサン化合物の
うち、前記一般式(V)で表わされる構成成分を有する
ものを製造する場合は、上記一般式(VII)のアゾ基
を含有する二塩基酸ジハライドの一部を対応する二塩基
酸ジハライドに代えた混合物を用いればよい。It can be produced in high yield by reacting with a dibasic acid dihalide containing an azo group represented by the following formula. In addition, when producing an azo group-containing polysiloxane compound having a component represented by the above general formula (V), a part of the azo group-containing dibasic acid dihalide of the above general formula (VII) is prepared. A mixture in which the dibasic acid dihalide is replaced with the corresponding dibasic acid dihalide may be used.
【0026】アゾ基含有ポリシロキサン化合物の製造は
、塩基触媒の存在下で行なうのが好ましい。塩基触媒と
しては、例えばトリエチルアミン、トリブチルアミン、
N,N−ジメチルアニリン、ピペリジン、ピリジン、1
,5−ジアザビシクロ〔4,3,0〕ノネン−5、1,
8−ジアザビシクロ〔5,4,0〕ウンデセン−7、ト
リ−n−ブチルアミン、ナトリウムハイドライド、n−
ブチルリチウム等をあげることができ、これらから適宜
選択できる。Preferably, the azo group-containing polysiloxane compound is produced in the presence of a basic catalyst. Examples of the base catalyst include triethylamine, tributylamine,
N,N-dimethylaniline, piperidine, pyridine, 1
,5-diazabicyclo[4,3,0]nonene-5,1,
8-diazabicyclo[5,4,0]undecene-7, tri-n-butylamine, sodium hydride, n-
Examples include butyllithium, and can be appropriately selected from these.
【0027】また、アゾ基含有ポリシロキサン化合物の
製造は、通常溶媒中で行なわれる。溶媒としては、例え
ばテトラヒドロフラン、ジエチルエーテル、ジメトキシ
エタン、ジオキサンなどのエーテル類、四塩化炭素、ク
ロロホルム、塩化メチレン、トリクレンなどのハロゲン
化炭化水素類、n−ヘキサン、ベンゼン、キシレンなど
の炭化水素類、アセトニトリル、N,N−ジメチルホル
ムアミド等をあげることができ、これらの一種または二
種以上を用いる。Further, the azo group-containing polysiloxane compound is usually produced in a solvent. Examples of the solvent include ethers such as tetrahydrofuran, diethyl ether, dimethoxyethane, and dioxane; halogenated hydrocarbons such as carbon tetrachloride, chloroform, methylene chloride, and trichlene; hydrocarbons such as n-hexane, benzene, and xylene; Examples include acetonitrile, N,N-dimethylformamide, etc., and one or more of these may be used.
【0028】一般式(VI)で表わされるジアミンまた
はジヒドロキシ化合物と一般式(VII)で表わされる
アゾ基を含有する二塩基酸ジハライドとの使用割合は、
特に限定されず適宜決定されるが、高分子量のものにす
るには、両者をほぼ等モル程度の割合にするのが好まし
い。
塩基触媒を用いる場合、その使用量は、原料化合物(V
II)に対して、0.5〜1.5倍モル程度用いるのが
好ましい。The ratio of the diamine or dihydroxy compound represented by the general formula (VI) to the azo group-containing dibasic acid dihalide represented by the general formula (VII) is as follows:
Although not particularly limited and determined as appropriate, in order to obtain a high molecular weight, it is preferable to use approximately equimolar ratios of both. When a base catalyst is used, the amount used is based on the raw material compound (V
It is preferable to use about 0.5 to 1.5 times the mole of II).
【0029】反応温度は、特に限定されないが、アゾ基
の分解を防止し、かつ生成物を高分子量にするには、−
10〜80℃が好ましい。反応時間は、特に限定されな
いが、0.5〜24時間が好ましい。反応温度は、段階
的に低温から室温まで上昇させる方法をとっても良い。The reaction temperature is not particularly limited, but in order to prevent the decomposition of the azo group and make the product have a high molecular weight, -
10-80 degreeC is preferable. The reaction time is not particularly limited, but is preferably 0.5 to 24 hours. The reaction temperature may be raised stepwise from low temperature to room temperature.
【0030】目的物の分取は、用いた原料、塩基触媒、
溶媒等の種類に応じて適宜行なわれる。例えば、粘稠な
反応溶液を溶媒で希釈した後、副生した四級アンモニウ
ム塩を水洗し取り除いた後、乾燥、溶媒除去することに
より行なわれる。[0030] The target product is separated from the raw materials used, the base catalyst,
This is carried out as appropriate depending on the type of solvent and the like. For example, this is carried out by diluting a viscous reaction solution with a solvent, washing the by-produced quaternary ammonium salt with water to remove it, and then drying and removing the solvent.
【0031】かくして得られるアゾ基含有ポリシロキサ
ン化合物は、前記のとおり、構成成分(III)および
(IV)、または構成成分(III),(IV)および
(V)からなるオリゴマーまたはポリマーである。その
性状は、特に分子量やポリシロキサンセグメントの含有
量により種々変動するが、通常、無色または単黄色で粉
末状、粘稠油状またはゴム様の物質である。また、溶媒
に対する溶解性も上記と同様に分子量やポリシロキサン
セグメントの含有量により変動するが、テトラヒドロフ
ラン、ジエチルエーテル、ジメトキシエタン、ジオキサ
ン等の如きエーテル類;四塩化炭素、クロロホルム、塩
化メチレン、トリクレン等の如きハロゲン化炭化水素類
;トルエン、ベンゼン、キシレン等の如き芳香族炭化水
素類;アセトン、メチルエチルケトン、メチルイソブチ
ルケトン、シクロヘキサノン等の如きケトン類;酢酸メ
チル、酢酸エチル、酢酸プロピル、酢酸−n−ブチル、
酢酸アミル等の如き酢酸エステル類などに溶解する。The azo group-containing polysiloxane compound thus obtained is, as described above, components (III) and (IV), or an oligomer or polymer consisting of components (III), (IV) and (V). Its properties vary depending on the molecular weight and content of polysiloxane segments, but it is usually a colorless or yellowish powder, viscous oil, or rubber-like substance. Also, the solubility in solvents varies depending on the molecular weight and content of polysiloxane segments as mentioned above, but ethers such as tetrahydrofuran, diethyl ether, dimethoxyethane, dioxane, etc.; carbon tetrachloride, chloroform, methylene chloride, trichlene, etc. halogenated hydrocarbons such as; aromatic hydrocarbons such as toluene, benzene, xylene, etc.; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc.; methyl acetate, ethyl acetate, propyl acetate, acetic acid-n- butyl,
Dissolves in acetic acid esters such as amyl acetate.
【0032】アゾ基含有ポリシロキサン化合物の数平均
分子量が1500未満では、実質的にアゾ結合を有しな
い分子がかなり存在することになるため、ブロック重合
の効率が低下し、本来の機能を示さなくなるなどの欠点
があり、また数平均分子量が10万を超える場合は、溶
解性が低下し、溶液粘度が高くなるため、低濃度でブロ
ック共重合を行なわなければならず、その結果、用いた
重合性不飽和単量体の重合率が低下するため、長時間の
反応を余儀なくされるなどの欠点がある。If the number average molecular weight of the azo group-containing polysiloxane compound is less than 1500, there will be a large number of molecules that do not substantially have an azo bond, so the efficiency of block polymerization will decrease and the compound will not exhibit its original function. In addition, when the number average molecular weight exceeds 100,000, the solubility decreases and the solution viscosity increases, so block copolymerization must be carried out at a low concentration. Since the polymerization rate of the sexually unsaturated monomer decreases, there are drawbacks such as a long reaction time being forced.
【0033】上記アゾ基含有ポリシロキサン化合物を用
いるビニル−シリコーン系ブロック共重合体の製造は、
アゾ基含有ポリシロキサン化合物の2〜90重量%の存
在下に、(メタ)アクリル酸エステルを主成分とし、か
つ重合性不飽和カルボン酸を1〜10重量%を含有する
重合性不飽和単量体混合物の10〜98重量%を重合さ
せることによって行なわれる。Production of a vinyl-silicone block copolymer using the azo group-containing polysiloxane compound is as follows:
A polymerizable unsaturated monomer containing (meth)acrylic acid ester as a main component and 1 to 10% by weight of a polymerizable unsaturated carboxylic acid in the presence of 2 to 90% by weight of an azo group-containing polysiloxane compound. This is carried out by polymerizing 10 to 98% by weight of the body mixture.
【0034】(メタ)アクリル酸エステルとしては、例
えば(メタ)アクリル酸メチル、(メタ)アクリル酸エ
チル、(メタ)アクリル酸ブチル、(メタ)アクリル酸
シクロヘキシル、(メタ)アクリル酸−2−エチルヘキ
シル、(メタ)アクリル酸ラウリル、(メタ)アクリル
酸ステアリル等があげられる。これらの(メタ)アクリ
ル酸エステルは、重合性不飽和単量体混合物中、少なく
とも50重量%用いられる。Examples of (meth)acrylic esters include methyl (meth)acrylate, ethyl (meth)acrylate, butyl (meth)acrylate, cyclohexyl (meth)acrylate, and 2-ethylhexyl (meth)acrylate. , lauryl (meth)acrylate, stearyl (meth)acrylate, and the like. These (meth)acrylic esters are used in an amount of at least 50% by weight in the polymerizable unsaturated monomer mixture.
【0035】重合性不飽和単量体混合物中の重合性不飽
和カルボン酸は、被覆用樹脂組成物から形成される皮膜
の塗被体に対する接着力を向上させるために用いられる
。重合性不飽和カルボン酸の代表例としては、(メタ)
アクリル酸、クロトン酸、イタコン酸、(無水)マレイ
ン酸、フマル酸等の如き不飽和酸等があげられる。The polymerizable unsaturated carboxylic acid in the polymerizable unsaturated monomer mixture is used to improve the adhesion of the film formed from the coating resin composition to the coated object. A typical example of a polymerizable unsaturated carboxylic acid is (meth)
Examples include unsaturated acids such as acrylic acid, crotonic acid, itaconic acid, maleic acid (anhydride), fumaric acid, and the like.
【0036】重合性不飽和カルボン酸の使用量は、重合
性不飽和単量体混合物中1〜10重量%、好ましくは3
〜6重量%である。重合性不飽和カルボン酸の使用量が
1重量%未満では、被着体に対する接着性が極度に低下
するので好ましくない。また、重合性不飽和カルボン酸
の使用量が10重量%を超えると、耐水性の低下が危惧
されるので好ましくない。The amount of the polymerizable unsaturated carboxylic acid used is 1 to 10% by weight, preferably 3% by weight in the polymerizable unsaturated monomer mixture.
~6% by weight. If the amount of the polymerizable unsaturated carboxylic acid used is less than 1% by weight, the adhesion to the adherend will be extremely reduced, which is not preferable. Moreover, if the amount of the polymerizable unsaturated carboxylic acid used exceeds 10% by weight, there is a fear that the water resistance will decrease, which is not preferable.
【0037】重合性不飽和単量体混合物は、(メタ)ア
クリル酸エステルおよび重合性不飽和カルボン酸以外に
、その他の不飽和単量体を包含してもよい。このような
その他の不飽和単量体としては、スチレン、ビニルトル
エン、α−メチルスチレン等の如き芳香族ビニル化合物
;(メタ)アクリロニトリル、酢酸ビニル、プロピオン
酸ビニル、バーサチック酸ビニル等の如き脂肪族ビニル
エステル類などが代表的なものである。また、マレイン
酸またはフマル酸とC1 〜C18なる一価アルコール
類とのジエステル類;あるいは、ヘキサフルオロプロピ
レンまたはテトラフルオロエチレンの如き含フッ素ビニ
ル単量体なども用いることができる。さらに、官能性不
飽和単量体として、N−メチロール(メタ)アクリルア
ミド、N−メトキシメチル(メタ)アクリルアミド、N
−エトキシメチル(メタ)アクリルアミド、N−(イソ
)ブトキシメチル(メタ)アクリルアミド等の如きアル
コキシメチル(メタ)アクリルアミド類;アクロレン、
クロトンアルデヒド、ビニルメチルケトン、ジアセトン
アクリルアミド等の如き活性なカルボニル基含有不飽和
化合物;(メタ)アクリル酸−2−ヒドロキシエチル、
(メタ)アクリル酸ヒドロキシプロピル、(メタ)アク
リル酸ヒドロキシブチル等の如き水酸基含有不飽和化合
物、(メタ)アクリル酸グリシジルの如きエポキシ基含
有不飽和化合物、2−ビニルオキサゾリンなども用いる
ことができる。The polymerizable unsaturated monomer mixture may contain other unsaturated monomers in addition to the (meth)acrylic acid ester and the polymerizable unsaturated carboxylic acid. Such other unsaturated monomers include aromatic vinyl compounds such as styrene, vinyltoluene, α-methylstyrene, etc.; aliphatic compounds such as (meth)acrylonitrile, vinyl acetate, vinyl propionate, vinyl versatate, etc. Typical examples include vinyl esters. Also usable are diesters of maleic acid or fumaric acid and C1 to C18 monohydric alcohols; or fluorine-containing vinyl monomers such as hexafluoropropylene or tetrafluoroethylene. Furthermore, as functional unsaturated monomers, N-methylol (meth)acrylamide, N-methoxymethyl (meth)acrylamide, N
- alkoxymethyl (meth)acrylamides such as ethoxymethyl (meth)acrylamide, N-(iso)butoxymethyl (meth)acrylamide, etc.; acrolene;
Active carbonyl group-containing unsaturated compounds such as crotonaldehyde, vinyl methyl ketone, diacetone acrylamide, etc.; 2-hydroxyethyl (meth)acrylate;
Hydroxyl group-containing unsaturated compounds such as hydroxypropyl (meth)acrylate and hydroxybutyl (meth)acrylate, epoxy group-containing unsaturated compounds such as glycidyl (meth)acrylate, 2-vinyloxazoline, and the like can also be used.
【0038】アゾ基含有ポリシロキサン化合物と重合性
不飽和単量体混合物の使用割合は、アゾ基含有ポリシロ
キサン化合物2〜90重量%に対して重合性不飽和単量
体混合物を10〜98重量%である。アゾ基含有ポリシ
ロキサン化合物の使用割合が2重量%未満では、アゾ基
濃度の低下により重合速度が低下し、未反応の不飽和単
量体が残存するなどの欠点があり、またアゾ基含有ポリ
シロキサン化合物の使用量が90重量%を超える場合は
皮膜強度の低下をきたし、ビニル−シリコーン系ブロッ
ク共重合体の特性を示さなくなるなどの欠点がある。The ratio of the azo group-containing polysiloxane compound and the polymerizable unsaturated monomer mixture is 10 to 98% by weight of the polymerizable unsaturated monomer mixture to 2 to 90% by weight of the azo group-containing polysiloxane compound. %. If the proportion of the azo group-containing polysiloxane compound used is less than 2% by weight, there will be disadvantages such as a decrease in the polymerization rate due to a decrease in the azo group concentration, and unreacted unsaturated monomers will remain. When the amount of the siloxane compound used exceeds 90% by weight, there are disadvantages such as a decrease in film strength and a failure to exhibit the characteristics of a vinyl-silicone block copolymer.
【0039】アゾ基含有ポリシロキサン化合物と重合性
不飽和単量体混合物との重合反応は、通常有機溶媒の存
在下で行なわれる。有機溶媒としては、例えばトルエン
、キシレン、シクロヘキサン、n−ヘキサン、n−オク
タン等の如き炭化水素類;酢酸メチル、酢酸エチル、酢
酸プロピル、酢酸−n−ブチル、酢酸アミル等の如きエ
ステル類;アセトン、メチルエチルケトン、メチルイソ
ブチルケトン、シクロヘキサノン等の如きケトン類;N
−メチルピロリドンの如き含窒素類;メチルアルコール
、エチルアルコール、(イソ)プロピルアルコール、(
t)ブチルアルコール等の如きアルコール類などがあげ
られる。The polymerization reaction between the azo group-containing polysiloxane compound and the polymerizable unsaturated monomer mixture is usually carried out in the presence of an organic solvent. Examples of organic solvents include hydrocarbons such as toluene, xylene, cyclohexane, n-hexane, and n-octane; esters such as methyl acetate, ethyl acetate, propyl acetate, n-butyl acetate, and amyl acetate; acetone; , methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, etc.; N
- Nitrogen-containing substances such as methylpyrrolidone; methyl alcohol, ethyl alcohol, (iso)propyl alcohol, (
t) Alcohols such as butyl alcohol and the like can be mentioned.
【0040】また、重合反応に際しては、必要に応じて
、分子量調節剤として、ラウリルメルカプタン、オクチ
ルメルカプタン、2−メルカプトエチルアルコール、2
−メルカプトプロピオン酸、チオグリコール酸オクチル
等の如き連鎖移動剤を添加することができる。In addition, in the polymerization reaction, lauryl mercaptan, octyl mercaptan, 2-mercaptoethyl alcohol, 2-mercaptoethyl alcohol, 2-mercaptoethyl alcohol,
- Chain transfer agents such as mercaptopropionic acid, octyl thioglycolate, etc. can be added.
【0041】アゾ基含有ポリシロキサン化合物と重合性
不飽和単量体混合物の反応は、通常30〜180℃とす
るのが適当であり、重合の進行に伴って変化させてもよ
い。反応時間は、通常1〜48時間である。[0041] The temperature for the reaction between the azo group-containing polysiloxane compound and the polymerizable unsaturated monomer mixture is usually 30 to 180°C, and the temperature may be changed as the polymerization progresses. The reaction time is usually 1 to 48 hours.
【0042】かくして、アゾ基含有ポリシロキサン化合
物を用いることにより、ビニル−シリコーン系ブロック
共重合体が極めて容易に製造される。得られるビニル−
シリコーン系ブロック共重合体におけるポリシロキサン
セグメントの含有量は、重合性不飽和単量体混合物に対
するアゾ基含有ポリシロキサン化合物の使用割合を変化
させること等により任意に変動させることができるが、
具体的にはビニル−シリコーン系ブロック共重合体中1
.8〜90重量%程度である。Thus, by using an azo group-containing polysiloxane compound, a vinyl-silicone block copolymer can be produced extremely easily. The vinyl obtained
The content of the polysiloxane segment in the silicone block copolymer can be arbitrarily varied by changing the ratio of the azo group-containing polysiloxane compound to the polymerizable unsaturated monomer mixture, etc.
Specifically, vinyl-silicone block copolymer 1
.. It is about 8 to 90% by weight.
【0043】本発明の被覆用樹脂組成物は、以上のよう
にして得られたビニル−シリコーン系ブロック共重合体
と有機溶媒を含むものである。本発明の被覆用樹脂組成
物を調整するために用いられる有機溶媒としては、アゾ
基含有ポリシロキサン化合物と重合性不飽和単量体混合
物との反応の際に用いた前記の有機溶媒を使用すること
ができる。有機溶媒は、アゾ基含有ポリシロキサン化合
物と重合性不飽和単量体混合物の反応時または反応後に
配合してもよい。有機溶媒の使用量は適宜選択される。The coating resin composition of the present invention contains the vinyl-silicone block copolymer obtained as described above and an organic solvent. As the organic solvent used to prepare the coating resin composition of the present invention, the above-mentioned organic solvent used in the reaction of the azo group-containing polysiloxane compound and the polymerizable unsaturated monomer mixture is used. be able to. The organic solvent may be blended during or after the reaction of the azo group-containing polysiloxane compound and the polymerizable unsaturated monomer mixture. The amount of organic solvent used is selected appropriately.
【0044】本発明の被覆用樹脂組成物には、必要に応
じて顔料、充填剤、骨材、消泡剤、可塑剤、造膜助剤、
防錆剤およびその他の添加剤等を配合することができる
。The coating resin composition of the present invention may contain pigments, fillers, aggregates, antifoaming agents, plasticizers, film forming aids,
Rust inhibitors and other additives can be added.
【0045】かくして得られる本発明の被覆用樹脂組成
物は、顔料分散性に優れ、伸び、撥水性および耐候性に
優れた皮膜を与えるため、建築内外塗装、金属塗装等と
して有用である。The thus obtained coating resin composition of the present invention has excellent pigment dispersibility and provides a film with excellent elongation, water repellency and weather resistance, and is therefore useful for interior and exterior coatings of buildings, metal coatings, and the like.
【0046】[0046]
【実施例】以下、実施例および比較例をあげて本発明を
さらに詳細に説明する。[Examples] The present invention will be explained in more detail below with reference to Examples and Comparative Examples.
【0047】参考例1
温度計、攪拌機、還流冷却器および塩化カルシウム管の
付いた四つ口フラスコに、分子量が4600のα,ω−
ジアミノプロピルポリジメチルシロキサン(前記一般式
(VI)においてR2 およびR3 がメチル基、Dが
アミノ基、Bが(CH2 )3 、mが平均で58のも
の)100g(21.7mM)、トリエチルアミン4.
38g(43.4mM)およびクロロホルム86.8g
を入れ、充分攪拌した。このフラスコを氷水で冷却しな
がら、4,4′−アゾビス(−4−シアノペンタン酸ク
ロライド)6.88g(21.7mM)とクロロホルム
86.8gからなる溶液を40分かけて滴下した。滴下
終了後、室温で2時間攪拌の後、クロロホルム50gを
追加して希釈し、分液漏斗に移して水を加え振とう洗浄
した。次にクロロホルム層を分離し、硫酸ナトリウムで
乾燥した後、室温減圧下で濃縮乾固して、生成物98.
9gを得た。
この生成物は、 1H−NMRスペクトルおよび赤外吸
収スペクトルより、ポリシロキサンセグメントを有する
アゾ基含有ポリシロキサンアミドであることが確認でき
た。アゾ基含有ポリシロキサンアミドの数平均分子量は
、GPC分析より92,000であった。また、平均ア
ゾ基結合数が23個なるものであった。以下これを高分
子アゾ開始剤(1−1)と略記する。Reference Example 1 In a four-necked flask equipped with a thermometer, stirrer, reflux condenser and calcium chloride tube, α,ω-
100 g (21.7 mM) of diaminopropylpolydimethylsiloxane (of the general formula (VI) in which R2 and R3 are methyl groups, D is an amino group, B is (CH2)3, and m is 58 on average), triethylamine 4.
38g (43.4mM) and 86.8g chloroform
and stirred thoroughly. While cooling the flask with ice water, a solution consisting of 6.88 g (21.7 mM) of 4,4'-azobis(-4-cyanopentanoic acid chloride) and 86.8 g of chloroform was added dropwise over 40 minutes. After completion of the dropwise addition, the mixture was stirred at room temperature for 2 hours, diluted by adding 50 g of chloroform, transferred to a separatory funnel, and washed with water by adding water. The chloroform layer was then separated, dried over sodium sulfate, and concentrated to dryness at room temperature under reduced pressure to yield the product 98.
9g was obtained. It was confirmed from the 1H-NMR spectrum and infrared absorption spectrum that this product was an azo group-containing polysiloxane amide having polysiloxane segments. The number average molecular weight of the azo group-containing polysiloxane amide was found to be 92,000 by GPC analysis. Further, the average number of azo group bonds was 23. Hereinafter, this will be abbreviated as a polymer azo initiator (1-1).
【0048】参考例2
分子量が880のα,ω−ジアミノプロピルポリジメチ
ルシロキサン15g(17.0mM)、トリエチルアミ
ン3.43g(34.0mM)、クロロホルム100g
を仕込み、4,4′−アゾビス(−4−シアノペンタン
酸クロライド)5.39g(17.0mM)とクロロホ
ルム100gからなる溶液を滴下した以外は、参考例1
と同様にして、目的物であるアゾ基含有ポリシロキサン
アミド121.3gを得た。このアゾ基含有ポリシロキ
サンアミドは、数平均分子量が21,000であり、平
均アゾ基結合数が18個なるものであった。以下これを
高分子アゾ開始剤(1−2)と略記する。Reference Example 2 15g (17.0mM) of α,ω-diaminopropylpolydimethylsiloxane having a molecular weight of 880, 3.43g (34.0mM) of triethylamine, and 100g of chloroform.
Reference Example 1 except that a solution consisting of 5.39 g (17.0 mM) of 4,4'-azobis(-4-cyanopentanoic acid chloride) and 100 g of chloroform was added dropwise.
In the same manner as above, 121.3 g of the desired azo group-containing polysiloxane amide was obtained. This azo group-containing polysiloxane amide had a number average molecular weight of 21,000 and an average number of azo group bonds of 18. Hereinafter, this will be abbreviated as a polymer azo initiator (1-2).
【0049】実施例1
温度計、攪拌機および還流冷却器の付いた四つ口フラス
コに、参考例1で得られた高分子アゾ開始剤(1−1)
2.5g、メタアクリル酸メチル22.8g、アクリル
酸−2−エチルヘキシル22.8g、メタアクリル酸1
.9g、メチルイソブチルケトン75gを仕込んで、8
0℃で1時間反応させた。次いで、さらに高分子アゾ開
始剤(1−1)2.5g、メタアクリル酸メチル22.
8g、アクリル酸−2−エチルヘキシル22.8g、メ
タアクリル酸1.9gを2時間かけて滴下し、滴下終了
後も同温度で5時間保持して目的のビニル−シリコーン
系ブロック共重合体の溶液を得た。目的物であることは
、 1H−NMRスペクトルと赤外吸収スペクトルより
確認した。このブロック共重合体の1H−NMRスペク
トルによるポリシロキサンセグメント含有量は5.1重
量%であった。なお、重合率の向上に伴う異常粘度上昇
を防ぐためメチルイソブチルケトン75gを重合末期お
よびまたは重合後に適宜添加した。かくして得られたブ
ロック共重合体溶液は、不揮発分が38.7%で、BM
型粘度計による30℃での粘度が4,700cps で
あった。Example 1 The polymeric azo initiator (1-1) obtained in Reference Example 1 was placed in a four-necked flask equipped with a thermometer, stirrer, and reflux condenser.
2.5g, methyl methacrylate 22.8g, 2-ethylhexyl acrylate 22.8g, methacrylic acid 1
.. 9g and 75g of methyl isobutyl ketone,
The reaction was carried out at 0°C for 1 hour. Next, 2.5 g of polymer azo initiator (1-1) and 22.5 g of methyl methacrylate were added.
8g of acrylic acid, 22.8g of 2-ethylhexyl acrylate, and 1.9g of methacrylic acid were added dropwise over 2 hours, and after the dropwise addition was completed, the same temperature was maintained for 5 hours to obtain a solution of the desired vinyl-silicone block copolymer. I got it. The target product was confirmed by 1H-NMR spectrum and infrared absorption spectrum. The polysiloxane segment content of this block copolymer according to 1H-NMR spectrum was 5.1% by weight. In order to prevent an abnormal increase in viscosity due to an increase in the polymerization rate, 75 g of methyl isobutyl ketone was appropriately added at the end of the polymerization and/or after the polymerization. The block copolymer solution thus obtained had a nonvolatile content of 38.7% and a BM
The viscosity at 30°C measured by a type viscometer was 4,700 cps.
【0050】実施例2〜5
表1に示されるような重合溶媒、高分子アゾ開始剤およ
び重合性不飽和単量体を所定の割合で用いるように変更
した以外は、実施例1と同様にして、目的とするビニル
−シリコーン系ブロック共重合体の溶液を得た。Examples 2 to 5 The procedure was the same as in Example 1, except that the polymerization solvent, polymer azo initiator, and polymerizable unsaturated monomer shown in Table 1 were changed to be used in the predetermined ratios. A solution of the desired vinyl-silicone block copolymer was obtained.
【0051】比較例1
表1に示されるような重合溶媒および重合性不飽和単量
体を用い、かつ高分子アゾ開始剤(1−1)の代わりに
、低分子開始剤のアゾビスイソブチロニトリル(AIB
N)0.1g(0.6mM)を用いるように変更した以
外は、実施例1と同様にして、対照用の樹脂であるビニ
ル共重合樹脂の溶液を得た。Comparative Example 1 The polymerization solvent and polymerizable unsaturated monomer shown in Table 1 were used, and the low molecular weight initiator azobisisobutylene was used instead of the high molecular weight azo initiator (1-1). Lonitrile (AIB
A solution of a vinyl copolymer resin as a control resin was obtained in the same manner as in Example 1 except that 0.1 g (0.6 mM) of N) was used.
【0052】比較例2〜3
表1に示されるような重合溶媒、低分子開始剤および重
合性不飽和単量体を所定の割合で用いるように変更した
以外は、実施例1と同様にして、対照用の樹脂であるビ
ニル共重合樹脂の溶液を得た。Comparative Examples 2 to 3 The same procedure as in Example 1 was carried out except that the polymerization solvent, low-molecular initiator, and polymerizable unsaturated monomer shown in Table 1 were used in the prescribed proportions. A solution of a vinyl copolymer resin as a control resin was obtained.
【0053】[0053]
【表1】[Table 1]
【0054】実施例1〜5および比較例1〜3で得られ
たそれぞれの樹脂溶液を、表2に示されるような配合比
で、「ダイペーク R−820」〔石原産業(株)製
のルチル型酸化チタン〕とメチルイソブチルケトンまた
はキシレンと共に、ホモミキサーで練肉して塗料化せし
めた。次いで、得られたそれぞれの塗料を、3気圧のエ
アスプレーで、磨き鋼板およびスレート板に塗装せしめ
、しかるのちに室温で1日、50℃で2日乾燥せしめて
から室温に1日放置して、これを各種の塗膜性能試験に
供した。The respective resin solutions obtained in Examples 1 to 5 and Comparative Examples 1 to 3 were mixed into "Dipake R-820" (rutile manufactured by Ishihara Sangyo Co., Ltd.) at the compounding ratio shown in Table 2. [type titanium oxide] and methyl isobutyl ketone or xylene were ground together in a homomixer and made into a paint. Next, each of the obtained paints was applied to a polished steel plate and a slate plate using air spray at 3 atm, then dried at room temperature for 1 day, at 50°C for 2 days, and then left at room temperature for 1 day. This was subjected to various coating film performance tests.
【0055】また、伸び、抗張力、抗張積に関しては、
皮膜の厚さが約0.2mmになるように、それぞれの樹
脂溶液を調整し、PEシートをオーバーレイした平滑な
ガラス板上に流し込み、室温で7日間、減圧状態で1日
間乾燥したものを試験に提供した。Regarding elongation, tensile strength, and tensile product,
Each resin solution was adjusted so that the film thickness was approximately 0.2 mm, poured onto a smooth glass plate overlayed with a PE sheet, and dried at room temperature for 7 days and under reduced pressure for 1 day. provided to.
【0056】各塗装板についての試験は次のような要領
で行なったものである。Tests on each coated board were conducted in the following manner.
【0057】伸び…………「島津オートグラフ AG
−2000A」〔(株)島津製作所製〕を用い100m
m/min なるクロスヘッド速度で、温度20℃、6
5%(RH)の条件で測定した。0057] Elongation……“Shimadzu Autograph AG
-2000A” [manufactured by Shimadzu Corporation] for 100 m.
m/min crosshead speed, temperature 20℃, 6
Measurement was performed under the condition of 5% (RH).
【0058】抗張力………同上[0058] Tensile strength... Same as above
【0059】抗張積………同上[0059] Tensile product……Same as above
【0060】鉛筆硬度……JIS K−5400に基
づき、「三菱ユニ」〔三菱鉛筆(株)製〕を用いて塗膜
に傷が付くまでの硬度を以て表示した。Pencil hardness: Based on JIS K-5400, the hardness was expressed as the hardness at which the paint film was scratched using "Mitsubishi Uni" (manufactured by Mitsubishi Pencil Co., Ltd.).
【0061】屈曲性………JIS K−5400に基
づき、屈曲試験器で180度折曲げて試験を行なった。
評価は心棒の太さが2mmのときに折曲げても塗面にク
ラックの全く入らなかったものを「良好」とし、クラッ
クの入ったものを「クラック」と表示し、そのときの心
棒の太さも表示した。[0061] Flexibility: A test was conducted based on JIS K-5400 by bending the film 180 degrees using a bending tester. In the evaluation, when the thickness of the mandrel is 2 mm, if there is no crack at all on the painted surface even when bent, it is marked as "good", and if there is a crack, it is marked as "crack", and the thickness of the mandrel at that time is evaluated. It was also displayed.
【0062】付着性………JIS K−5400に基
づき、試験板上の塗面に碁盤目(10×10)を入れ、
次いでこれをセロファンテープで剥離せしめるという方
法によった。評価方法は次の通りである。10…切傷1
本ごとが、細くて両面が滑らかで、切傷の交点と正方形
の一目一目に剥がれがない。8……切傷の交点にわずか
な剥がれがあって、正方形の一目一目に剥がれがなく、
欠損部の面積は全正方形面積の5%以内。6……切傷の
両側と交点に剥がれがあって、欠損部の面積は全正方形
面積の5%〜15%。4……切傷による剥がれの幅が広
く、欠損部の面積は全正方形面積の15〜35%。2…
…切傷による剥がれの幅は4点よりも広く、欠損部の面
積は全正方形面積の35〜65%。0……剥がれの面積
は、全正方形面積の65%以上。[0062] Adhesion...Based on JIS K-5400, a grid (10 x 10) is placed on the coated surface of the test plate.
This was then peeled off using cellophane tape. The evaluation method is as follows. 10...Cut 1
Each book is thin and smooth on both sides, and there is no peeling at the intersection of the cuts or at the first glance of the square. 8... There is slight peeling at the intersection of the cuts, but there is no peeling at the first glance of the square.
The area of the missing part is within 5% of the total square area. 6... There is peeling on both sides and the intersection of the cut, and the area of the defective part is 5% to 15% of the total square area. 4... The width of the peeling due to the cut is wide, and the area of the defective part is 15 to 35% of the total square area. 2...
...The width of the peeling caused by the cut is wider than the four points, and the area of the defective part is 35 to 65% of the total square area. 0...Peeling area is 65% or more of the total square area.
【0063】光沢…………「デジタル変角光沢計UGV
−5D」〔スガ試験機(株)製〕を用いて、60度鏡面
光沢度を測定した。[0063] Gloss……“Digital variable angle gloss meter UGV
-5D" (manufactured by Suga Test Instruments Co., Ltd.), the 60 degree specular gloss was measured.
【0064】耐候性………「サンシャイン スーパー
ロングライフ ウェザーメーターWEL−SUN−H
C型」〔スガ試験機(株)製〕を用いて800時間の促
進耐候性試験を行ない、試験前後における光沢の保持率
を表示した。[0064] Weather resistance... "Sunshine Super Long Life Weather Meter WEL-SUN-H
An accelerated weathering test was carried out for 800 hours using "Type C" (manufactured by Suga Test Instruments Co., Ltd.), and the gloss retention rate before and after the test was expressed.
【0065】顔料分散性…JIS K−5400に基
づき、つぶゲージを用い、つぶが20μm以下のものを
「良好」とし、20μm以上のものを「凝集」とした。Pigment dispersibility: Based on JIS K-5400, using a grain gauge, those with grains of 20 μm or less were considered "good", and those with grains of 20 μm or more were classified as "agglomerated".
【0066】乾燥性………それぞれの塗料をエアスプレ
ーにより塗装せしめた後、その塗面を指で押さえたとき
に跡が付かなくなるまでの時間を以って表示した。Drying property: After each paint was applied by air spray, the time required for no trace to be left when pressing the painted surface with a finger was expressed as the time required.
【0067】水接触角……ガラス板上に樹脂または塗料
を塗布し、この試験板上に水滴を落としその表面接触角
を測定した。Water contact angle: A resin or paint was applied onto a glass plate, water droplets were dropped on the test plate, and the surface contact angle was measured.
【0068】[0068]
【表2】[Table 2]
【0069】[0069]
【発明の効果】本発明により得られるビニル−シリコー
ン系ブロック共重合体を用いた被覆用組成物は、表2に
示される結果からも明らかなように、従来のビニル樹脂
に比べて高い撥水性、耐候性を示し、これらの性能が要
求される分野において有用である。Effects of the Invention As is clear from the results shown in Table 2, the coating composition using the vinyl-silicone block copolymer obtained by the present invention has higher water repellency than conventional vinyl resins. , exhibits weather resistance, and is useful in fields where these performances are required.
Claims (2)
低級アルキル基またはニトリル基を示し、各R2 は、
同一または異なって、水素原子または低級アルキル基を
示し、各R3 は、同一または異なって、水素原子、ハ
ロゲン原子置換若しくは非置換のアルキル基またはフェ
ニル基を示す。pは、同一または異なって、0または1
〜6の整数を示し、mは0または1〜200の整数を示
し、Aは−NHまたは−Oを示し、Bは(CH2 )q
(但し、qは同一または異なって、0または1〜6の
整数を示す。)または−(CH2 )3 OCH2 C
H2 −を示す。〕で表わされる繰り返し単位を有し、
1分子中に少なくとも1個のアゾ結合を有する数平均分
子量が1500〜10万のアゾ基含有ポリシロキサン化
合物の2〜90重量%の存在下に、(メタ)アクリル酸
エステルを主成分とし、かつ重合性不飽和カルボン酸を
1〜10重量%含有する重合性不飽和単量体混合物の1
0〜98重量%を重合させて得られるビニル−シリコー
ン系ブロック共重合体と有機溶媒を含むことを特徴とす
る被覆用樹脂組成物。[Claim 1] General formula (1) [In the formula, each R1 is the same or different, a hydrogen atom,
It represents a lower alkyl group or a nitrile group, and each R2 is
The same or different R3's represent a hydrogen atom or a lower alkyl group, and each R3 is the same or different and represents a hydrogen atom, a halogen atom-substituted or unsubstituted alkyl group, or a phenyl group. p is the same or different, 0 or 1
represents an integer of ~6, m represents 0 or an integer of 1 to 200, A represents -NH or -O, B represents (CH2)q
(However, q is the same or different and represents 0 or an integer from 1 to 6.) or -(CH2)3OCH2C
Indicates H2-. ] has a repeating unit represented by
In the presence of 2 to 90% by weight of an azo group-containing polysiloxane compound having at least one azo bond in one molecule and having a number average molecular weight of 1,500 to 100,000, the main component is a (meth)acrylic acid ester, and 1 of a polymerizable unsaturated monomer mixture containing 1 to 10% by weight of a polymerizable unsaturated carboxylic acid
A coating resin composition comprising a vinyl-silicone block copolymer obtained by polymerizing 0 to 98% by weight and an organic solvent.
求項1記載の一般式(1)で表わされる繰り返し単位と
一般式(II) 【化2】 〔式中、Yは二塩基酸残基を示す。R2 ,R3 ,A
,Bおよびmは前記に同じ。〕で表わされる繰り返し単
位からなる請求項1記載の被覆用樹脂組成物。Claim 2: The azo group-containing polysiloxane compound comprises a repeating unit represented by the general formula (1) according to claim 1 and the general formula (II) [In the formula, Y represents a dibasic acid residue] . R2, R3, A
, B and m are the same as above. The coating resin composition according to claim 1, which comprises a repeating unit represented by the following.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17728991A JP2673227B2 (en) | 1991-06-21 | 1991-06-21 | Resin composition for coating |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17728991A JP2673227B2 (en) | 1991-06-21 | 1991-06-21 | Resin composition for coating |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04372675A true JPH04372675A (en) | 1992-12-25 |
JP2673227B2 JP2673227B2 (en) | 1997-11-05 |
Family
ID=16028421
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17728991A Expired - Lifetime JP2673227B2 (en) | 1991-06-21 | 1991-06-21 | Resin composition for coating |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2673227B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0779318A1 (en) | 1995-12-14 | 1997-06-18 | Wako Pure Chemical Industries, Ltd. | Silicon-containing block copolymer |
KR100239195B1 (en) * | 1995-10-05 | 2000-02-01 | 다나까 모또아끼 | A base material for hair cosmetics |
JP2004359858A (en) * | 2003-06-05 | 2004-12-24 | Nippon Paint Co Ltd | Michael curing type water repellent coating material composition |
WO2007007443A1 (en) | 2005-07-11 | 2007-01-18 | Wako Pure Chemical Industries, Ltd. | Novel polymer and method of measuring cholesterol therewith |
-
1991
- 1991-06-21 JP JP17728991A patent/JP2673227B2/en not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100239195B1 (en) * | 1995-10-05 | 2000-02-01 | 다나까 모또아끼 | A base material for hair cosmetics |
EP0779318A1 (en) | 1995-12-14 | 1997-06-18 | Wako Pure Chemical Industries, Ltd. | Silicon-containing block copolymer |
US5760136A (en) * | 1995-12-14 | 1998-06-02 | Wako Pure Chemical Industries, Ltd. | Silicon-containing block copolymer |
JP2004359858A (en) * | 2003-06-05 | 2004-12-24 | Nippon Paint Co Ltd | Michael curing type water repellent coating material composition |
WO2007007443A1 (en) | 2005-07-11 | 2007-01-18 | Wako Pure Chemical Industries, Ltd. | Novel polymer and method of measuring cholesterol therewith |
Also Published As
Publication number | Publication date |
---|---|
JP2673227B2 (en) | 1997-11-05 |
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