JPH0437260U - - Google Patents

Info

Publication number
JPH0437260U
JPH0437260U JP7904990U JP7904990U JPH0437260U JP H0437260 U JPH0437260 U JP H0437260U JP 7904990 U JP7904990 U JP 7904990U JP 7904990 U JP7904990 U JP 7904990U JP H0437260 U JPH0437260 U JP H0437260U
Authority
JP
Japan
Prior art keywords
pressure chamber
film forming
high pressure
gas
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7904990U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7904990U priority Critical patent/JPH0437260U/ja
Publication of JPH0437260U publication Critical patent/JPH0437260U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP7904990U 1990-07-24 1990-07-24 Pending JPH0437260U (OSRAM)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7904990U JPH0437260U (OSRAM) 1990-07-24 1990-07-24

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7904990U JPH0437260U (OSRAM) 1990-07-24 1990-07-24

Publications (1)

Publication Number Publication Date
JPH0437260U true JPH0437260U (OSRAM) 1992-03-30

Family

ID=31622866

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7904990U Pending JPH0437260U (OSRAM) 1990-07-24 1990-07-24

Country Status (1)

Country Link
JP (1) JPH0437260U (OSRAM)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018141195A (ja) * 2017-02-27 2018-09-13 Tdk株式会社 積層膜の製造装置と製造方法、および薄膜インダクタの製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2018141195A (ja) * 2017-02-27 2018-09-13 Tdk株式会社 積層膜の製造装置と製造方法、および薄膜インダクタの製造方法

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