JPH04359585A - Board for flexible printed circuit and manufacture thereof - Google Patents
Board for flexible printed circuit and manufacture thereofInfo
- Publication number
- JPH04359585A JPH04359585A JP16203691A JP16203691A JPH04359585A JP H04359585 A JPH04359585 A JP H04359585A JP 16203691 A JP16203691 A JP 16203691A JP 16203691 A JP16203691 A JP 16203691A JP H04359585 A JPH04359585 A JP H04359585A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polyimide film
- printed circuit
- flexible printed
- scratches
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 229920001721 polyimide Polymers 0.000 claims abstract description 37
- 230000001681 protective effect Effects 0.000 claims abstract description 28
- 239000011888 foil Substances 0.000 claims abstract description 12
- 229910052751 metal Inorganic materials 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 11
- 239000002985 plastic film Substances 0.000 claims abstract description 11
- 229920006255 plastic film Polymers 0.000 claims abstract description 11
- 229920001187 thermosetting polymer Polymers 0.000 claims abstract description 7
- 229910001872 inorganic gas Inorganic materials 0.000 claims abstract description 6
- 239000010410 layer Substances 0.000 claims abstract description 4
- 239000012790 adhesive layer Substances 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 23
- 230000001070 adhesive effect Effects 0.000 claims description 14
- 239000000853 adhesive Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 9
- 230000003213 activating effect Effects 0.000 claims description 2
- 230000006378 damage Effects 0.000 abstract description 5
- 238000013007 heat curing Methods 0.000 abstract description 2
- 238000003825 pressing Methods 0.000 abstract description 2
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 37
- 238000007689 inspection Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 239000011889 copper foil Substances 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 239000012787 coverlay film Substances 0.000 description 3
- 238000001723 curing Methods 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 238000009832 plasma treatment Methods 0.000 description 3
- 208000017227 ADan amyloidosis Diseases 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 201000000194 ITM2B-related cerebral amyloid angiopathy 2 Diseases 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920006267 polyester film Polymers 0.000 description 2
- 229920000306 polymethylpentene Polymers 0.000 description 2
- 239000011116 polymethylpentene Substances 0.000 description 2
- -1 polypropylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920006269 PPS film Polymers 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920001646 UPILEX Polymers 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000013036 cure process Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明はフレキシブル印刷回路等
に使用されるフィルム面に傷がなく、性能良好なポリイ
ミドフィルム系の保護フィルム付きフレキシブル印刷回
路用基板及びその製造方法に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flexible printed circuit board with a protective film made of a polyimide film which has no scratches on the film surface and has good performance, and a method for producing the same.
【0002】0002
【従来の技術】近年エレクトロニクス製品の軽量化、薄
肉化、高機能化にともない、印刷基板の需要が多くなり
、中でもフレキシブル印刷回路はその使用範囲が拡大し
、益々その需要が伸びている。最近は印刷回路の高性能
化、ファインパターン化及び薄肉化がますます進む中で
、製品表面上に発生する小さな傷等の外観上の問題も発
生し、改良要求がでている。BACKGROUND OF THE INVENTION In recent years, as electronic products have become lighter, thinner, and more highly functional, demand for printed circuit boards has increased, and the range of use for flexible printed circuits has expanded, and the demand for flexible printed circuits has been increasing. Recently, as printed circuits have become more sophisticated, have finer patterns, and become thinner, appearance problems such as small scratches on the product surface have also arisen, and improvements are being demanded.
【0003】特にフレキシブル印刷回路用基板(以下、
FPC と略称する)のベースフィルムは機器のハード
面との接触、ハンドリング時の不注意等で引っ掻き傷、
摩耗傷等がつきやすく、これらはFPC の外観を損な
うだけでなく、高屈曲性の要求される分野、特に長期間
に亙って折り曲げが繰り返される FDD、 HDDあ
るいはプリンター等の用途に使用される際、ベースフィ
ルムの傷面が繰り返し折り曲げにより、クラックが拡大
し、材料破壊に結びつくこともある。[0003] In particular, flexible printed circuit boards (hereinafter referred to as
The base film of FPC (abbreviated as FPC) may be scratched or damaged due to contact with the hard surface of equipment or careless handling.
It is easy to get abrasion scratches, etc., which not only impairs the appearance of the FPC, but also used in fields that require high flexibility, especially in applications such as FDDs, HDDs, and printers where bending is repeated over a long period of time. When the scratched surface of the base film is repeatedly bent, cracks may expand and lead to material failure.
【0004】また、傷の発生原因として最近はFPC
の性能向上、多層化、複合化、小型化等により益々その
製造工程が複雑化していることも挙げられ、具体的に傷
の発生する工程としては以下のものがある。
1)基板の製造工程:(1) ラミネーターにより基板
を製造する工程:各種ロールと接触するのでスリ傷が発
生しやすい。(2) キュアー工程、スリット工程、包
装工程:ハンドリング時にロールとの接触が多い。
2)回路作成工程:(1) 基板表面の整面、洗浄工程
:研磨、ハンドリングによりスリ傷発生。(2) 回路
印刷工程:スクリーン印刷、ドライフィルム(感光性フ
ィルム)ラミネート、露光、現象等の各工程の各種ロー
ル類と接触しかつハンドリングが多い。(3) エッチ
ング工程:エッチング、洗浄、乾燥等各工程で各種ロー
ル類と接触しかつハンドリングが多い。
3)カバーレイフィルム又はカバーコート材による回路
の保護工程:カバーレイフィルムと基板との仮止めプレ
ス、接着剤の硬化、洗浄乾燥等の工程で各種ロールと接
触し、かつハンドリングが多い。
4)FPC 外型加工、検査工程:金型による打ち抜き
、裏打ち材の接着及び寸法検査、性能検査等の工程で各
種ロールと接触し、かつハンドリングが多い。[0004]Furthermore, FPC has recently become a cause of scratches.
The manufacturing process is becoming more and more complicated due to performance improvement, multilayering, compounding, miniaturization, etc., and the following are specific processes where scratches occur. 1) Substrate manufacturing process: (1) Process of manufacturing a substrate using a laminator: Scratches are likely to occur due to contact with various rolls. (2) Cure process, slitting process, packaging process: There is a lot of contact with rolls during handling. 2) Circuit creation process: (1) Surface preparation and cleaning process: Scratches occur due to polishing and handling. (2) Circuit printing process: There is a lot of handling and contact with various rolls in each process such as screen printing, dry film (photosensitive film) lamination, exposure, and development. (3) Etching process: In each process such as etching, cleaning, drying, etc., there is contact with various rolls and there is a lot of handling. 3) Circuit protection process using a coverlay film or cover coat material: Contact with various rolls and a lot of handling during processes such as temporarily pressing the coverlay film and the substrate, curing the adhesive, washing and drying, etc. 4) FPC outer mold processing and inspection process: There is contact with various rolls and a lot of handling during processes such as punching with a mold, adhesion of backing material, dimensional inspection, and performance inspection.
【0005】[0005]
【発明が解決しようとする課題】以上述べたようにFP
C のベースフィルムは機器のハード面との接触、ハン
ドリング時の不注意等で引っ掻き傷、摩耗傷等がつきや
すく、FDD 、 HDDあるいはプリンター等の用途
に使用される際、ベースフィルムの傷面が繰り返し折り
曲げにより、クラックが拡大し、材料破壊に結びつくこ
ともある。更にFPC 製造1)〜4)の全工程を通じ
て、各種装置におけるロール類との接触が多く、かつハ
ンドリングが著しく多くなっている。このためFPC
のフィルム面が摩耗、スリ傷、異物等による打痕、押し
傷等が発生し、このまま放置すれば機器に実装された後
に、材料破壊を招きかねない。本発明は、このような欠
点を解消し、無傷の、本来の性能を保持したFPC を
提供しようとするものである。[Problem to be solved by the invention] As mentioned above, FP
The base film of C is prone to scratches and abrasion marks due to contact with the hard surfaces of devices and carelessness during handling.When used for applications such as FDDs, HDDs, or printers, the scratched surface of the base film may Repeated bending may cause cracks to expand, leading to material failure. Furthermore, throughout the entire process of FPC manufacturing 1) to 4), there is a lot of contact with rolls in various devices, and there is a significant amount of handling. For this reason, FPC
The surface of the film may be abraded, scratched, dented or pressed by foreign objects, etc., and if left as is, it may lead to material destruction after it is mounted on a device. The present invention aims to eliminate these drawbacks and provide an intact FPC that retains its original performance.
【0006】[0006]
【課題を解決するための手段】本発明者等は上記課題を
解決するために鋭意研究を行ってきた結果、本発明に到
達したもので、その要旨とするところは、保護プラスチ
ックフィルム−ポリイミドフィルム−熱硬化性接着剤層
−金属箔の4層からなるなることを特徴とするフレキシ
ブル印刷回路用基板。および該フレキシブル印刷回路用
基板を製造するに際し、予めポリイミドフィルムの両面
及び保護プラスチックフィルムの片面を無機ガスの低温
プラズマにより活性化処理した後、該ポリイミドフィル
ムと該保護プラスチックフィルムの各活性化処理面を熱
圧着し、次いで該ポリイミドフィルムの他の活性化処理
面に熱硬化性接着剤を塗布した後、金属箔と圧着積層す
ることを特徴とするフレキシブル印刷回路用基板の製造
方法にある。本発明による保護フィルム付きポリイミド
フィルムから製造したフレキシブル印刷回路用基板を使
用することにより、後の回路作製工程等におけるロール
類との接触、ハンドリング時における摩耗、引っ掻き、
押し傷等の発生が著しく減少し、ひいてはフレキシブル
印刷回路を機器に実装した後の材料破壊を防止し、機器
の長期安定運転に繋がる。[Means for Solving the Problems] The present inventors have conducted intensive research to solve the above problems, and as a result, they have arrived at the present invention. A flexible printed circuit board comprising four layers: - thermosetting adhesive layer - metal foil. When manufacturing the flexible printed circuit board, both sides of the polyimide film and one side of the protective plastic film are activated in advance with low-temperature plasma of inorganic gas, and then each activation-treated side of the polyimide film and the protective plastic film is activated. A method for producing a flexible printed circuit board, which comprises heat-compression bonding the polyimide film, then applying a thermosetting adhesive to the other activated surface of the polyimide film, and then pressure-bonding and laminating the polyimide film with a metal foil. By using the flexible printed circuit board manufactured from the polyimide film with a protective film according to the present invention, it is possible to avoid contact with rolls during the subsequent circuit manufacturing process, wear and scratches during handling, etc.
The occurrence of press scratches, etc. is significantly reduced, which in turn prevents material destruction after the flexible printed circuit is mounted on equipment, leading to long-term stable operation of the equipment.
【0007】以下本発明を詳細に説明する。まず本発明
で使用するポリイミドフィルムは市販のもので良く、厚
さ12.5μm〜 125μm幅 500〜1016m
mが一般的である。
ポリイミドフィルム保護用のプラスチックフィルムとし
ては基板製造工程、回路作製工程における熱、薬品等に
耐えるものが好ましく、具体的にはポリエステルフィル
ム、ポリプロピレンフィルム、 TPXフィルム(ポリ
メチルペンテン)、PPS フィルム、 EVAフィル
ム等が挙げられる。この保護フィルムは基板作製、印刷
回路作製、実寸加工を経て、最終的には機器への実装完
了直前もしくは直後に除去されるものであるから、この
段階まで接着性を保持し、目的達成後は容易に剥離し得
ることが必要である。従って、接着剤を介して圧着する
程の接着性は不要で、熱圧着による程度の接着性が好ま
しい。しかし、長い工程中に部分的にでも剥離しては困
るので、本発明ではポリイミドフィルムと保護フィルム
の表面を低温プラズマで活性化処理を施こして熱圧着す
ることで接着性と剥離性のバランスを解決した。The present invention will be explained in detail below. First, the polyimide film used in the present invention may be a commercially available one, and has a thickness of 12.5 μm to 125 μm and a width of 500 to 1016 m.
m is common. The plastic film for protecting the polyimide film is preferably one that can withstand heat, chemicals, etc. in the board manufacturing process and circuit manufacturing process, and specific examples include polyester film, polypropylene film, TPX film (polymethylpentene), PPS film, and EVA film. etc. This protective film goes through board production, printed circuit production, actual size processing, and is finally removed just before or after mounting on the device is completed, so it maintains its adhesive properties until this stage, and after the purpose is achieved. It is necessary that it can be easily peeled off. Therefore, it is not necessary to have the adhesiveness to the extent that it is press-bonded through an adhesive, and it is preferable that the adhesiveness is such that it can be bonded by thermocompression bonding. However, it would be a problem if even some parts of the film peeled off during the long process, so in the present invention, the surfaces of the polyimide film and the protective film are activated with low-temperature plasma and then bonded by thermocompression, thereby achieving a balance between adhesiveness and peelability. solved.
【0008】この低温プラズマによるフィルム表面の活
性化処理方法は、減圧可能な低温プラズマ処理装置内に
ポリイミドフィルム及び保護プラスチックフィルムを通
し、装置内を無機ガスの雰囲気として圧力を 0.00
1〜10トル、好ましくは0.01〜1トルに保持した
状態で、電極間に 0.1〜10KV前後の直流あるい
は交流を印加して、グロー放電させることにより、無機
ガスの低温プラズマを発生させ、ポリイミドフィルムを
移動させながら表面を連続的にプラズマ処理する。該処
理時間は概ね0.1〜10秒とするのが好ましい。無機
ガスとしてはヘリウム、ネオン、アルゴン等の不活性ガ
ス、酸素、窒素、一酸化炭素、空気等が使用される。This method of activating the film surface using low-temperature plasma involves passing the polyimide film and protective plastic film through a low-temperature plasma processing device that can reduce the pressure, creating an inorganic gas atmosphere inside the device, and increasing the pressure to 0.00.
A low-temperature plasma of inorganic gas is generated by applying direct current or alternating current of about 0.1 to 10 KV between the electrodes while maintaining the voltage at 1 to 10 Torr, preferably 0.01 to 1 Torr, and causing a glow discharge. The surface of the polyimide film is continuously plasma-treated while moving the polyimide film. The treatment time is preferably approximately 0.1 to 10 seconds. Inorganic gases used include inert gases such as helium, neon, and argon, oxygen, nitrogen, carbon monoxide, and air.
【0009】低温プラズマ処理したポリイミドフィルム
と保護フィルムの熱圧着方法としては、加熱した熱ロー
ルにより連続的に圧着すればよく、加熱ロール温度は使
用する保護フィルムにより異なるが、80〜 200℃
位が好ましく、圧力は線圧で5〜30Kg/cm、ライ
ン速度は1〜10m/minとされる。[0009] As a thermocompression bonding method for a low-temperature plasma-treated polyimide film and a protective film, it is sufficient to continuously press them using a heated thermal roll, and the temperature of the heating roll varies depending on the protective film used, but is 80 to 200°C.
The line pressure is preferably 5 to 30 kg/cm, and the line speed is 1 to 10 m/min.
【0010】次に、フレキシブル印刷回路用基板の製造
方法について述べる。前記のようにして作製した保護フ
ィルム付きポリイミドフィルムに接着剤を介して金属箔
を張りつける。ここに使用される熱硬化型の耐熱性接着
剤としては、耐熱性ポリイミドフィルムと金属箔を張り
合せるもので、接着性が高く、かつ半田等の使用に耐え
る耐熱性が必要とされ、これにはエポキシ系樹脂、 N
BR−フェノール系樹脂、フェノール−ブチラール系樹
脂、エポキシ− NBR系樹脂、エポキシ−フェノール
系樹脂、エポキシ−ナイロン系樹脂、エポキシ−ポリエ
ステル系樹脂、エポキシ−アクリル系樹脂、ポリアミド
−エポキシフェノール系樹脂、ポリイミド系樹脂、アク
リル系樹脂およびシリコーン系樹脂などが例示され、積
層時の接着剤の厚さは樹脂固形分で5〜30μmが好ま
しい。Next, a method for manufacturing a flexible printed circuit board will be described. A metal foil is attached to the polyimide film with a protective film produced as described above via an adhesive. The thermosetting heat-resistant adhesive used here is one that laminates a heat-resistant polyimide film and metal foil, and requires high adhesiveness and heat resistance to withstand use with soldering, etc. is epoxy resin, N
BR-phenol resin, phenol-butyral resin, epoxy-NBR resin, epoxy-phenol resin, epoxy-nylon resin, epoxy-polyester resin, epoxy-acrylic resin, polyamide-epoxyphenol resin, polyimide Examples include resins such as acrylic resins, acrylic resins, and silicone resins, and the thickness of the adhesive during lamination is preferably 5 to 30 μm based on resin solid content.
【0011】また、金属箔としては、銅箔、アルミニウ
ム箔、鉄箔、ニッケル箔などが挙げられるが、印刷回路
用としては、銅箔が良く、厚さ18〜70μmの圧延お
よび電解銅箔が使用される。[0011] Metal foils include copper foil, aluminum foil, iron foil, nickel foil, etc., but copper foil is good for printed circuits, and rolled and electrolytic copper foils with a thickness of 18 to 70 μm are preferred. used.
【0012】この保護フィルム付きポリイミドフィルム
と金属箔の張り合わせ方法は、常法に従い、ポリイミド
フィルムに熱硬化型接着剤をロールコーターなどにより
塗布し、インラインのドライヤーで溶剤を蒸発除去して
半硬化の状態とし、加熱した熱ロールにより連続的に金
属箔と熱圧着する。温度は60〜150 ℃、線圧5〜
30Kg/cm、ライン速度1〜10m/minが標準
的である。このようにして積層したフレキシブル印刷回
路用基板はさらに接着剤の熱硬化を完結させ、基板物性
を向上させるために、80〜 200℃で1〜数10時
間キュアーオーブン中で加熱硬化させる。[0012] The method of laminating the polyimide film with a protective film and the metal foil is carried out in accordance with a conventional method, in which a thermosetting adhesive is applied to the polyimide film using a roll coater or the like, and the solvent is evaporated and removed using an in-line dryer to form a semi-cured adhesive. condition, and is continuously thermocompressed with metal foil using a heated thermo roll. Temperature is 60~150℃, linear pressure 5~
30 Kg/cm and line speed of 1 to 10 m/min are standard. The thus laminated flexible printed circuit board is further heated and cured in a curing oven at 80 to 200° C. for one to several tens of hours in order to complete the heat curing of the adhesive and improve the physical properties of the substrate.
【0013】[0013]
【実施例】以下本発明の実施態様を実施例を挙げて具体
的に説明するが、本発明はこれらに限定されるものでは
ない。
(フレキシブル印刷回路用基板の評価方法)1)FPC
表面の傷検査:測定サンプル 240× 240mm
を20倍の拡大鏡で検査し幅0.05mm以上の筋状す
り傷、径0.10mm以上の押し傷、引っ掻き傷等を検
査し、その数を求める。
(評価記号)◎:0〜2個(傷はほんとんどない)。
○:2〜5個。
△:6〜10個。
×:10個以上。
2)保護フィルムの離型性:保護フィルム付きポリイミ
ドフィルムを幅20mmにカットし 180°方向に5
0mm/minの速度で保護フィルムを引き剥す。[Examples] Hereinafter, embodiments of the present invention will be specifically explained with reference to Examples, but the present invention is not limited thereto. (Evaluation method of flexible printed circuit board) 1) FPC
Surface flaw inspection: Measurement sample 240 x 240 mm
is inspected with a 20x magnifying glass to check for streaky scratches with a width of 0.05 mm or more, press scratches with a diameter of 0.10 mm or more, scratches, etc., and calculate the number of scratches. (Evaluation symbol) ◎: 0 to 2 pieces (there are almost no scratches). ○: 2 to 5 pieces. △: 6 to 10 pieces.
×: 10 or more pieces. 2) Mold releasability of the protective film: Cut the polyimide film with the protective film to a width of 20 mm, and
Peel off the protective film at a speed of 0 mm/min.
【0014】(実施例1〜5)厚さ25μm 、幅 5
08mmのポリイミドフィルムの両面及び保護フィルム
として厚さ50μm、幅 510mmのポリプロピレン
フィルム、 TPXフィルム(ポリメチルペンテン)、
ポリエステルフィルムの各片面を連続低温プラズマ処理
装置により毎分30mの速度でプラズマ処理を行った。
処理条件は真空度 0.1トルにて酸素 1.0 L/
minで供給し、印加電圧2KV、110KHzで入力
30KWとし、装置は電極数4本を円筒状に配置し電極
の外側40mmの距離でフィルムを電極外周にそって移
動させ処理を行った。次にポリイミドフィルムと保護フ
ィルムの熱圧着は 250mmφ、長さ600mの加熱
ロールとシリコーンゴムロールで加熱圧着した。条件は
表1に示す温度において、線圧 20kg/cm、3m
/minのラインスピードで低温プラズマ処理した面同
士を加熱圧着し、ロール状に巻きとった。次いでこの保
護フィルム付きポリイミドフィルムの低温プラズマ処理
面にエポキシ/ NBR系接着剤を乾燥後の厚さが18
μm になるようにロールコーターにて塗布し、インラ
インドライヤーを通して溶剤を除去し接着剤を半硬化状
態にした後、35μm の電解銅箔と加熱ロール温度
120℃、線圧 20kg/cm、3m/minのライ
ンスピードで加熱圧着しロール状に巻き取った。これを
さらにキュアー用オーブン中で80℃×5時間、 12
0℃×5時間加熱硬化し、フレキシブル印刷回路用基板
を作製した。(Examples 1 to 5) Thickness: 25 μm, Width: 5
Both sides of a 08 mm polyimide film and a polypropylene film with a thickness of 50 μm and a width of 510 mm as a protective film, TPX film (polymethylpentene),
Each side of the polyester film was subjected to plasma treatment at a speed of 30 m/min using a continuous low temperature plasma treatment apparatus. Processing conditions are vacuum level 0.1 torr and oxygen 1.0 L/
The device was supplied with an applied voltage of 2 KV, 110 KHz, and an input of 30 KW. Four electrodes were arranged in a cylindrical shape, and the film was moved along the outer periphery of the electrodes at a distance of 40 mm outside the electrodes for processing. Next, the polyimide film and the protective film were thermocompression bonded using a heating roll with a diameter of 250 mm and a length of 600 m and a silicone rubber roll. The conditions were as follows: temperature shown in Table 1, linear pressure 20 kg/cm, 3 m
The low-temperature plasma-treated surfaces were heat-pressed together at a line speed of /min and wound into a roll. Next, an epoxy/NBR adhesive was applied to the low-temperature plasma-treated surface of the polyimide film with a protective film to a thickness of 18 mm after drying.
After coating with a roll coater to a thickness of 35 μm and removing the solvent through an in-line dryer to make the adhesive semi-hardened, apply a layer of electrolytic copper foil of 35 μm and heated roll temperature.
It was heat-pressed at 120° C., a line pressure of 20 kg/cm, and a line speed of 3 m/min, and wound up into a roll. This was further cured in a curing oven at 80°C for 5 hours. 12
The material was cured by heating at 0° C. for 5 hours to produce a flexible printed circuit board.
【0015】次にまず(基板面の傷)を測定した。
1)基板のままで前述の検査方法で表面傷検査及び保護
フィルムの離型性を測定しその結果を表1に示した。
2)以下の方法でテスト用 FPC回路を作製し、その
後保護フィルムを除去してポリイミドフィルム面の表面
傷検査を実施した。
( FPCの製造工程での傷)
1)上記のように製造した FPC基板をスリッターに
より幅 240mmでロール状に50mスリットする。
2)研磨機で1m/minのスピードで銅箔面を湿式整
面し、水洗乾燥する。
3)ドライフィルムを 120℃で1m/minのスピ
ードで基板に接着する。
4)線幅 0.2mm、線間 0.2mmの平行パター
ンを写真法で露出する。
5)現象、レジスト除去、エッチング及び水洗をロール
ツウロールで0.5 m/minの速度で実施した。
6)次に 240× 240mmにカットする。
7)カバーレイフィルムCA335 (信越化学工業
(株) 製商品名)を 240× 240mmとし、6
)の基板を以下の条件でプレス成型する。温度 160
℃、圧力 50kg/cm2時間30分間。このように
して作製した FPCサンプルの保護フィルムを除去し
てポリイミドフィルム表面傷の検査を実施し、その結果
を表1に示した。Next, first (flaws on the substrate surface) were measured. 1) The surface scratches were inspected and the mold releasability of the protective film was measured using the above-mentioned inspection method using the substrate as it was, and the results are shown in Table 1. 2) A test FPC circuit was produced using the following method, and then the protective film was removed and a surface scratch inspection on the polyimide film surface was performed. (Flaws in the FPC manufacturing process) 1) The FPC board manufactured as described above was slit into rolls of 50 m with a width of 240 mm using a slitter. 2) Wet-level the copper foil surface with a polisher at a speed of 1 m/min, wash with water, and dry. 3) Adhere the dry film to the substrate at 120° C. and at a speed of 1 m/min. 4) A parallel pattern with a line width of 0.2 mm and a line spacing of 0.2 mm is exposed using a photographic method. 5) Processing, resist removal, etching and water washing were carried out roll-to-roll at a speed of 0.5 m/min. 6) Next, cut it to 240 x 240 mm. 7) Coverlay film CA335 (Shin-Etsu Chemical Co., Ltd.
Co., Ltd. product name) is 240 x 240 mm, and 6
) is press-molded under the following conditions. Temperature 160
°C, pressure 50 kg/cm for 2 hours and 30 minutes. The protective film of the FPC sample prepared in this way was removed and an inspection for scratches on the surface of the polyimide film was conducted, and the results are shown in Table 1.
【0016】[0016]
【表1】[Table 1]
【0017】(比較例1)実施例1において保護フィル
ムを使用しないでポリイミドフィルムとエポキシ/ N
BR系接着剤を用い以下同様に電解銅箔と積層しフレキ
シブル印刷回路用基板を作製した。(Comparative Example 1) Polyimide film and epoxy/N were used without using the protective film in Example 1.
A flexible printed circuit board was produced by laminating electrolytic copper foil in the same manner using a BR adhesive.
【0018】(比較例2〜5)プラズマ処理を施さない
保護フィルムを使用した以外は実施例1と同様にフレキ
シブル印刷回路用基板を作成した。比較例1〜5につい
ても実施例1と同様に基板面の傷、 FPCの製造工程
での傷を検査し、その結果を表1に示した。(Comparative Examples 2 to 5) Flexible printed circuit boards were prepared in the same manner as in Example 1, except that a protective film that was not subjected to plasma treatment was used. Comparative Examples 1 to 5 were also inspected for scratches on the substrate surface and scratches in the FPC manufacturing process in the same manner as in Example 1, and the results are shown in Table 1.
【0019】[0019]
【発明の効果】本発明によれば、ベースフィルムである
ポリイミドフィルムに保護プラスチックフィルムを熱圧
着法により張り付けた後、フレキシブル印刷回路用基板
に加工するため、基板製造工程、その後の回路作製工程
におけるポリイミドフィルム面に対する傷の発生を防止
でき、フレキシブル印刷回路の機器への実装後の該回路
の耐屈曲性向上に寄与することになり、産業上その利用
価値は極めて高い。According to the present invention, a protective plastic film is attached to a polyimide film as a base film by thermocompression bonding and then processed into a flexible printed circuit board. It is possible to prevent the occurrence of scratches on the surface of the polyimide film, contributing to improving the bending resistance of the flexible printed circuit after it is mounted on equipment, and has extremely high industrial value.
Claims (2)
ィルム−熱硬化性接着剤層−金属箔の4層からなること
を特徴とするフレキシブル印刷回路用基板。1. A flexible printed circuit board comprising four layers: a protective plastic film, a polyimide film, a thermosetting adhesive layer, and a metal foil.
基板を製造するに際し、予めポリイミドフィルムの両面
及び保護プラスチックフィルムの片面を無機ガスの低温
プラズマにより活性化処理した後、該ポリイミドフィル
ムと該保護プラスチックフィルムの各活性化処理面を熱
圧着し、次いで該ポリイミドフィルムの他の活性化処理
面に熱硬化性接着剤を塗布した後、金属箔と圧着積層す
ることを特徴とするフレキシブル印刷回路用基板の製造
方法。2. When manufacturing the flexible printed circuit board according to claim 1, after activating both sides of the polyimide film and one side of the protective plastic film with low-temperature plasma of an inorganic gas, the polyimide film and the A flexible printed circuit characterized in that each activated surface of a protective plastic film is bonded by thermocompression, then a thermosetting adhesive is applied to the other activated surface of the polyimide film, and then laminated with metal foil by pressure bonding. method for manufacturing substrates for
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16203691A JPH04359585A (en) | 1991-06-06 | 1991-06-06 | Board for flexible printed circuit and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16203691A JPH04359585A (en) | 1991-06-06 | 1991-06-06 | Board for flexible printed circuit and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04359585A true JPH04359585A (en) | 1992-12-11 |
Family
ID=15746864
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16203691A Pending JPH04359585A (en) | 1991-06-06 | 1991-06-06 | Board for flexible printed circuit and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04359585A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6537411B1 (en) | 1999-06-29 | 2003-03-25 | The National University Of Singapore | Method for low temperature lamination of metals to polyimides |
-
1991
- 1991-06-06 JP JP16203691A patent/JPH04359585A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6537411B1 (en) | 1999-06-29 | 2003-03-25 | The National University Of Singapore | Method for low temperature lamination of metals to polyimides |
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