JPH043495Y2 - - Google Patents

Info

Publication number
JPH043495Y2
JPH043495Y2 JP14302483U JP14302483U JPH043495Y2 JP H043495 Y2 JPH043495 Y2 JP H043495Y2 JP 14302483 U JP14302483 U JP 14302483U JP 14302483 U JP14302483 U JP 14302483U JP H043495 Y2 JPH043495 Y2 JP H043495Y2
Authority
JP
Japan
Prior art keywords
heating
furnace
infrared
annealing
opening
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14302483U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6049627U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14302483U priority Critical patent/JPS6049627U/ja
Publication of JPS6049627U publication Critical patent/JPS6049627U/ja
Application granted granted Critical
Publication of JPH043495Y2 publication Critical patent/JPH043495Y2/ja
Granted legal-status Critical Current

Links

JP14302483U 1983-09-13 1983-09-13 赤外線加熱装置 Granted JPS6049627U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14302483U JPS6049627U (ja) 1983-09-13 1983-09-13 赤外線加熱装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14302483U JPS6049627U (ja) 1983-09-13 1983-09-13 赤外線加熱装置

Publications (2)

Publication Number Publication Date
JPS6049627U JPS6049627U (ja) 1985-04-08
JPH043495Y2 true JPH043495Y2 (enrdf_load_html_response) 1992-02-04

Family

ID=30319381

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14302483U Granted JPS6049627U (ja) 1983-09-13 1983-09-13 赤外線加熱装置

Country Status (1)

Country Link
JP (1) JPS6049627U (enrdf_load_html_response)

Also Published As

Publication number Publication date
JPS6049627U (ja) 1985-04-08

Similar Documents

Publication Publication Date Title
US4698486A (en) Method of heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation layers, etc.
US4097226A (en) Furnace for practising temperature gradient zone melting
US4649261A (en) Apparatus for heating semiconductor wafers in order to achieve annealing, silicide formation, reflow of glass passivation layers, etc.
US4567352A (en) Flashlight-radiant apparatus
US20130259457A1 (en) Heat treatment apparatus for heating substrate by irradiating substrate with flash of light
JPS5965426A (ja) 半導体ウエハ用熱処理装置
JPH043495Y2 (enrdf_load_html_response)
CN113134669A (zh) 一种等离子焊箱内的加热装置
JP2004503459A5 (enrdf_load_html_response)
JPS5917253A (ja) 半導体ウエハの熱処理方法
JPS6130154Y2 (enrdf_load_html_response)
KR100204525B1 (ko) 캐리어 본체를 가열하는 방법 및 그 장치
JP3382064B2 (ja) 熱処理装置
JP3240180B2 (ja) 熱処理装置
JP2879571B2 (ja) 赤外線加熱炉
JPS6115511Y2 (enrdf_load_html_response)
JP2508687Y2 (ja) 熱処理炉
JPH0517143Y2 (enrdf_load_html_response)
JPH03207861A (ja) 加熱装置
JPS6130153Y2 (enrdf_load_html_response)
JP3007507U (ja) 基板加熱機構
GB1585458A (en) Furnace muffles and furnaces comprising such muffles
JPS60193343A (ja) 熱処理装置
KR100191346B1 (ko) 반도체 제조용 습식 산화공정 설비의 공정가스연소장치
JPH0240476Y2 (enrdf_load_html_response)