JPH0434918A - Illuminator - Google Patents

Illuminator

Info

Publication number
JPH0434918A
JPH0434918A JP2140915A JP14091590A JPH0434918A JP H0434918 A JPH0434918 A JP H0434918A JP 2140915 A JP2140915 A JP 2140915A JP 14091590 A JP14091590 A JP 14091590A JP H0434918 A JPH0434918 A JP H0434918A
Authority
JP
Japan
Prior art keywords
excimer laser
laser light
light
reticle
optical fiber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2140915A
Other languages
Japanese (ja)
Inventor
Yoshito Nakanishi
淑人 中西
Takeo Sato
佐藤 健夫
Yoshiyuki Sugiyama
杉山 吉幸
Toshiyuki Iwazawa
岩澤 利幸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2140915A priority Critical patent/JPH0434918A/en
Publication of JPH0434918A publication Critical patent/JPH0434918A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems

Abstract

PURPOSE:To make spatial light quantity distribution of an excimer laser light incident to an optical fiber uniform and to reduce interference by providing diffusing plates on incident and emitting surface sides of the fiber, forming the emitting surface of the fiber in a circular shape, and disposing the incident side so as to become a rectangular shape. CONSTITUTION:The light quantity distribution of a beam of an excimer laser light emitted from an excimer laser light source 1 by a diffusing plate 3 is made uniform, and the light having strong directionality is scattered to supplement the number of openings of an optical fiber 2. The fiber 2 is associated on the incident surface 2a side so as to become a slender rectangular shape similarly to the beam shape of the laser light and to efficiently guide the laser light to a condensing optical system 5. The light guided by the fiber 2 is emitted from the emitting surface 2b associated to become a circular shape, again scattered by a diffusing plate 4 to improve its uniformity, and then focused in a focusing position of an objective lens 7 through the system 5 and a half mirror 6. A light beam focused in the focusing position of the lens 7 becomes a parallel beam to uniformly throw light on a reticle 8.

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、半導体製造用縮小投影型の露光装置等におい
て、エキシマレーザ光を用い、レチクルを一様に照明さ
せるための照明装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an illumination device for uniformly illuminating a reticle using excimer laser light in a reduction projection type exposure device for semiconductor manufacturing.

従来の技術 従来の半導体製造用縮小投影型の露光装置において、レ
チクルを照明するには、例えば、特開昭62−1770
5号公報に記載されているように水銀灯と光ファイバを
用いる構成が一般的に知られている。
2. Description of the Related Art In order to illuminate a reticle in a conventional reduction projection type exposure apparatus for semiconductor manufacturing, for example, Japanese Patent Laid-Open No. 62-1770
As described in Japanese Patent No. 5, a configuration using a mercury lamp and an optical fiber is generally known.

以下、図面を参照しながら従来の照明装置について説明
する。第3図は従来の露光装置を示す構成図である。
Hereinafter, a conventional lighting device will be described with reference to the drawings. FIG. 3 is a block diagram showing a conventional exposure apparatus.

第3図において、超高圧水銀灯501から発した光は、
楕円反射鏡502によりロータリーミラーシャッター5
03の反射面上に集光され、このロータリーミラーシャ
ッタ−503に設けられた開口を通過した後、コリメタ
−レンズ504、フライアイレンズにより構成されたオ
プチカルインテグレタ−505およびコンデンサーレン
ズ506を介して投影原版のレチクル507を照明し、
その照明されたレチクル507上のパターン像を縮小投
影レンズ508によってウェハ509上に形成して焼き
付け、露光を行うように構成されている。
In FIG. 3, the light emitted from the ultra-high pressure mercury lamp 501 is
Rotary mirror shutter 5 by elliptical reflector 502
After passing through the aperture provided in the rotary mirror shutter 503, the light is focused on the reflective surface of the rotary mirror shutter 503, and then passes through a collimator lens 504, an optical integrator 505 composed of a fly's eye lens, and a condenser lens 506. Illuminating the reticle 507 of the projection original,
The pattern image on the illuminated reticle 507 is formed on a wafer 509 by a reduction projection lens 508, and is printed and exposed.

一方、ロータリーミラーシャッター503で反射され、
アライメント光学系の第1の集光レンズ510に入射し
た光束は、ランダム光フアイバ5110入射端面511
a上に集光される。超高圧水銀灯特有の中心が極端に低
下した光量分布でもランダム光フアイバ5110束の射
出端面511 bにおいて平均化され、平坦な光量分布
として射出される。射出端面511bから射出された照
明光は、第2の集光レンズ512、視野絞り513、ハ
ーフミラ−514、第2のアライメント対物レンズ51
5、第1のアライメント対物レンズ516、移動ミラー
517を介してレチクル上507上のアライメントマー
クPを照明し、縮小投影レンズ508を介してウェハ5
09上のアライメントマークQを照明する。この2つの
アライメントマークP、Qが重畳され、アライメント対
物レンズ516.515によりハーフミラ−514の後
方に配置されたITV撮像管51B上に結像され、レチ
クル507上のアライメントマークPに対するウェハ5
09上のアライメントマークQの正確な位置合わせがそ
のITV撮像管518を介して確認される。
On the other hand, it is reflected by the rotary mirror shutter 503,
The light beam incident on the first condensing lens 510 of the alignment optical system is transmitted to the incident end face 511 of the random optical fiber 5110.
The light is focused on a. Even a light quantity distribution in which the center of the ultra-high pressure mercury lamp is extremely reduced is averaged at the exit end face 511b of the bundle of random optical fibers 5110, and is emitted as a flat light quantity distribution. The illumination light emitted from the exit end surface 511b passes through a second condenser lens 512, a field stop 513, a half mirror 514, and a second alignment objective lens 51.
5. The alignment mark P on the reticle 507 is illuminated through the first alignment objective lens 516 and the moving mirror 517, and the wafer 5 is illuminated through the reduction projection lens 508.
Illuminate the alignment mark Q on 09. These two alignment marks P and Q are superimposed, and an image is formed on the ITV image pickup tube 51B placed behind the half mirror 514 by the alignment objective lens 516,515, and the wafer 5 is aligned with the alignment mark P on the reticle 507.
Accurate positioning of alignment mark Q on 09 is confirmed via its ITV image pickup tube 518.

発明が解決しようとする課題 しかし、以上のような従来例の構成では、エキシマレー
ザ光を照明光源として用いる場合、このエキシマレーザ
−光は、水銀灯のg線と比べて干渉性が強いため、スペ
ックルを発生させやすく、光量分布自身にムラがある。
Problems to be Solved by the Invention However, in the conventional configuration as described above, when using excimer laser light as an illumination light source, this excimer laser light has stronger interference than the G-line of a mercury lamp, so it does not meet the specifications. The light intensity distribution itself is uneven.

また、エキシマレーザ光はビーム形状が細長いため、ビ
ーム形成を行い、なおかつ水銀灯とは違い、レーザ光で
あるため、指向性が強いので、光ファイバの開口数に合
う入射光学系を組まなければならない。また、所定の開
口数で光ファイバにエキシマレーザ光ヲ入射させても、
光ファイバの入射端面、射出端面の各光ファイバの向き
が不揃になっているため、エキシマレーザ光が入射しな
い光ファイバが発生する。このため、上記従来例の構成
でこの開口数を補うためには、更に入射光学系が複雑に
なる。
In addition, since excimer laser light has a long and narrow beam shape, it must be formed into a beam, and unlike a mercury lamp, it is a laser light and has strong directivity, so an input optical system must be set up that matches the numerical aperture of the optical fiber. . Furthermore, even if excimer laser light is incident on an optical fiber with a predetermined numerical aperture,
Since the directions of the input end face and the exit end face of each optical fiber are uneven, there are some optical fibers into which excimer laser light does not enter. Therefore, in order to compensate for this numerical aperture with the configuration of the conventional example described above, the input optical system becomes even more complicated.

第4図にエキシマレーザ光を入射させた光ファイバ51
1の束の射出端面511 bの模式図を示す。
Fig. 4 shows an optical fiber 51 into which excimer laser light is incident.
1 shows a schematic diagram of an exit end surface 511b of one bundle.

第4図から明らかなように、光ファイバ511の束のう
ち、白抜きで示した光ファイバ511が光を射出し、斜
線で示した光ファイバ511が光を射出していないか、
若しくは射出している光が弱く、塗りつぶした光ファイ
バ511が断線しており、射出端面511 b、すなわ
ち、レチクルを照明する照明光に著しい空間的ムラが生
じている。
As is clear from FIG. 4, among the bundle of optical fibers 511, the optical fibers 511 shown in white are emitting light, and the optical fibers 511 shown in diagonal lines are not emitting light.
Alternatively, the emitted light is weak, the filled optical fiber 511 is disconnected, and significant spatial unevenness occurs in the illumination light illuminating the emitting end surface 511b, that is, the reticle.

このように、レチクルを均一に照明するためには、光フ
ァイバの製作精度に負うところが大きい。
In this way, uniform illumination of the reticle depends largely on the manufacturing precision of the optical fiber.

このため、照明光源にエキシマレーザ光を用いた場合、
上記構成では、水銀灯のg線と比べ、レクチルを均一照
明することは困難であるという課題を有していた。
Therefore, when using excimer laser light as the illumination light source,
The above configuration has a problem in that it is difficult to illuminate the reticle uniformly compared to the G-line of a mercury lamp.

本発明は、上記のような従来技術の課題を解決するもの
であり、エキシマレーザ光を用いてレチクルを均一に照
明することができるようにした照明装置を提供すること
を目的とするものである。
The present invention solves the problems of the prior art as described above, and aims to provide an illumination device that can uniformly illuminate a reticle using excimer laser light. .

課題を解決するための手段 上記目的を達成するための本発明の技術的解決手段は、
エキシマレーザ光源と、入射面側がエキシマレーザ光の
ビームパターンとほぼ同じ矩形形状となるように配置さ
れ、射出面側が円形形状となるように配置され、変形し
た束状の光ファイバと、この光ファイバの入射面側に配
置され、エキシマレーザ光を散乱させる拡散板と、上記
光ファイバの射出面側に配置され、この光ファイバから
射出したエキシマレーザ光を散乱させる拡散板と、散乱
されたエキシマレーザ光をレチクル上に一様に照明させ
、このレチクルの像を観察するための光学系とを備えた
ものである。
Means for Solving the Problems The technical solution of the present invention for achieving the above object is as follows:
An excimer laser light source, a deformed bundle-shaped optical fiber arranged so that the incident surface side has a rectangular shape that is almost the same as the beam pattern of the excimer laser light, and an exit surface side that has a circular shape, and this optical fiber. a diffuser plate disposed on the incident surface side of the optical fiber to scatter the excimer laser light; a diffuser plate disposed on the exit surface side of the optical fiber to scatter the excimer laser light emitted from the optical fiber; and a diffuser plate disposed on the exit surface side of the optical fiber to scatter the excimer laser light emitted from the optical fiber. It is equipped with an optical system for uniformly illuminating a reticle with light and observing an image of the reticle.

そして、上記光学系は、上記拡散板で散乱されたエキシ
マレーザ光を集光する集光光学系と、集光されたエキシ
マレーザ光を反射するハーフミラ−と、反射されたエキ
シマレーザ光を上記レチクル上に均一に照明する対物レ
ンズと、上記レチクルからの反射光を上記対物レンズお
よびハーフミラ−を介して観察手段に結像する結像レン
ズとから構成することができ、また、上記観察手段とし
て紫外ビジコンを用いることができる。
The optical system includes a condensing optical system that condenses the excimer laser light scattered by the diffuser plate, a half mirror that reflects the condensed excimer laser light, and a condensing optical system that condenses the excimer laser light scattered by the diffuser plate, and a half mirror that reflects the condensed excimer laser light, and directs the reflected excimer laser light to the reticle. It can be composed of an objective lens that uniformly illuminates the reticle, and an imaging lens that forms an image of the reflected light from the reticle on an observation means via the objective lens and a half mirror. Vidicon can be used.

作用 したがって、本発明によれば、光ファイバの入射面側と
射出面側に拡散板を設け、光ファイバの射出面を円形形
状となるように配置し、入射面側を矩形形状となるよう
に配置してエキシマレーザ光のビーム形状に合わせるこ
とにより、照明光源に干渉性、指向性が強いエキシマレ
ーザ光を用いても、光ファイバの入射面側で複雑な光学
系を組むことなく、光ファイバに入射するエキシマレー
ザ光の空間的光量分布を均一化し、干渉性を減少させ、
更に開口数を拡げ、向きが不揃の光ファイバ束のすべて
にエキシマレーザ光を入射させることができる。
Therefore, according to the present invention, diffusers are provided on the entrance surface side and the exit surface side of the optical fiber, and the exit surface of the optical fiber is arranged in a circular shape, and the entrance surface side is arranged in a rectangular shape. By arranging and matching the beam shape of the excimer laser beam, even if the illumination light source is an excimer laser beam with strong coherence and directivity, the optical fiber can be easily uniformizes the spatial light intensity distribution of excimer laser light incident on the laser beam, reduces coherence,
Furthermore, by widening the numerical aperture, it is possible to make the excimer laser beam enter all of the optical fiber bundles with irregular directions.

実施例 以下、本発明の実施例について図面を参照しながら説明
する。
EXAMPLES Hereinafter, examples of the present invention will be described with reference to the drawings.

第1図および第2図は本発明の一実施例における落射型
の照明装置を示し、第1図は全体構成図、第2図は光フ
ァイバの斜視図である。
1 and 2 show an epi-illumination type illumination device according to an embodiment of the present invention, in which FIG. 1 is an overall configuration diagram and FIG. 2 is a perspective view of an optical fiber.

第1図において、1は照明光源であるパルス発光のエキ
シマレーザ光源、2はエキシマレーザ光源から射出され
るエキシマレーザ光を導く束状の光ファイバであり、第
2図に示すように、各光ファイバ2が入射面2a側にお
いて、エキシマレーザ光源1から射出するエキシマレー
ザ光のビーム形状に合わせて細長い矩形形状となるよう
に組み合わされて配置され、射出面2b側において、円
形形状となるように組み合わされて配置された変形形状
となっている。第1図において、3と4はそれぞれ光フ
ァイバ2の入射面2a側と射出面2b側に設けられた拡
散板であり、エキシマレーザ光3を散乱させ、光量分布
を均一化させる。5は拡散板4で均一化されたエキシマ
レーザ光を集光する集光光学系、6は集光されたエキシ
マレーザ光を反射させるハーフミラ−57は集光された
エキシマレーザ光を平行光としてレチクル8を一様に照
明する倍率結像系の対物レンズ、9はレチクル8からの
反射光を対物レンズ7、ハーフミラ−6を介して結像す
る倍率結像系の結像レンズ、10は対物レンズ9で結像
された像を観察する紫外ビジコンである。
In FIG. 1, 1 is a pulsed excimer laser light source that is an illumination light source, and 2 is a bundle-shaped optical fiber that guides the excimer laser light emitted from the excimer laser light source. The fibers 2 are arranged so as to have an elongated rectangular shape in accordance with the beam shape of the excimer laser light emitted from the excimer laser light source 1 on the side of the entrance surface 2a, and are arranged so as to have a circular shape on the side of the exit surface 2b. It has a deformed shape that is arranged in combination. In FIG. 1, reference numerals 3 and 4 are diffuser plates provided on the entrance surface 2a side and the exit surface 2b side of the optical fiber 2, respectively, which scatter the excimer laser beam 3 and make the light quantity distribution uniform. 5 is a condensing optical system that condenses the excimer laser beam that has been made uniform by the diffuser plate 4; 6 is a half mirror that reflects the condensed excimer laser beam; and 57 is a reticle that converts the condensed excimer laser beam into parallel light. 9 is an objective lens of a magnification imaging system that uniformly illuminates the reticle 8; 9 is an imaging lens of a magnification imaging system that images the reflected light from the reticle 8 via an objective lens 7 and a half mirror 6; 10 is an objective lens This is an ultraviolet vidicon that observes the image formed at 9.

以上の構成において、以下、その動作について説明する
The operation of the above configuration will be described below.

第1図において、エキシマレーザ光源lから射出したエ
キシマレーザ光は拡散板3によりビームの光量分布の均
一化が行われ、指向性の強いエキシマレーザ光が散乱さ
れて拡がり、光ファイバ2の開口数を補う、光ファイバ
2は上記のように入射面2a側において、エキシマレー
ザ光のビーム形状と同様、細長い矩形形状となるように
組み合わされているので(第2図参照)、エキシマレー
ザ光を効率よく集光光学系5に導くことができる。
In FIG. 1, the excimer laser light emitted from the excimer laser light source 1 is uniformized in the light intensity distribution by the diffuser plate 3, and the highly directional excimer laser light is scattered and spread, and the numerical aperture of the optical fiber 2 is As mentioned above, the optical fibers 2 are combined to form an elongated rectangular shape on the incident surface 2a side, similar to the beam shape of the excimer laser light (see Figure 2), so that the excimer laser light can be efficiently transmitted. The light can be well guided to the condensing optical system 5.

光ファイバ2に導かれたエキシマレーザ光は円形形状と
なるように組み合わされた射出面2b側から射出し、こ
のエキシマレーザ光を再び拡散板4で散乱させて一様性
を向上させ、続いて集光光学系5とハーフミラ−6によ
り対物レンズ7の結像位置に結像させる。対物レンズ7
の結像位置に結像した光線は平行光となり、レチクル8
上を一様に照明する。レチクル8からの反射光を対物レ
ンズ7、ハーフミラ−6、結像レンズ9に導き、紫外ビ
ジコンlOに結像させ、拡大観察を行う。
The excimer laser light guided to the optical fiber 2 is emitted from the exit surface 2b side which is combined to form a circular shape, and this excimer laser light is again scattered by the diffuser plate 4 to improve uniformity. An image is formed at the imaging position of the objective lens 7 by the condensing optical system 5 and the half mirror 6. Objective lens 7
The light beam formed at the imaging position becomes parallel light, and the reticle 8
Evenly illuminate the top. The reflected light from the reticle 8 is guided to the objective lens 7, the half mirror 6, and the imaging lens 9, and is imaged on the ultraviolet vidicon 10 for magnified observation.

次に、本発明の具体例について説明する。Next, specific examples of the present invention will be described.

エキシマレーザ光源1から波長248n−のエキシマレ
ーザ光(KrF)を射出し、厚さ2閣の石英のすりガラ
スで作られた拡散板3で散乱させて光量分布の均一化を
行い、拡散板3に対し、入射面2a側に密着させ、若し
くはわずかに離して配置した束状の紫外光用の光ファイ
バ2に入射させる。
Excimer laser light (KrF) with a wavelength of 248n- is emitted from an excimer laser light source 1, and is scattered by a diffuser plate 3 made of frosted quartz glass with a thickness of 2 cm to equalize the light intensity distribution. On the other hand, the light is made to enter a bundle of ultraviolet light optical fibers 2 that are placed in close contact with the incident surface 2a side or are placed slightly apart from each other.

この光ファイバ2は入射面2a側において、各光ファイ
バ2をエキシマレーザ光のビーム形状に合わせて細長い
矩形形状となるように組み合わせることにより、エキシ
マレーザ光を効率よく束状の光フアイバ2内に導(こと
ができる、各光ファイバ2の円形形状に組み合わされた
射出面2b側から射出したエキシマレーザ光を再び上記
と同様の拡散板4で散乱させ、複数の組みレンズからな
る集光光学系5と、反射率と透過率がほぼ等しいハーフ
ミラ−6とにより複数の組レンズからなる紫外対物レン
ズ7内にある結像位置に焦点を合わせる。焦点位置で焦
点を結ぶ入射光は平行光として射出するため、紫外対物
レンズ7の焦点距離に配置されたレチクル8上の所望の
領域を一様に照明することができる。レチクル8で反射
した光は、このレチクル8が紫外対物レンズ7の焦点距
離にあるため、紫外対物レンズ7、ハーフミラ−6、結
像レンズ9をそれぞれ透過し、紫外ビジコン10の受光
面を結像され、レチクル8の10倍の一様な像を観察す
ることができる。
This optical fiber 2 is constructed by combining each optical fiber 2 on the incident surface 2a side so as to form an elongated rectangular shape that matches the beam shape of the excimer laser light, thereby efficiently transmitting the excimer laser light into the bundle-shaped optical fiber 2. The excimer laser light emitted from the exit surface 2b side of each optical fiber 2 combined into a circular shape is scattered again by the same diffuser plate 4 as described above, and a condensing optical system consisting of a plurality of assembled lenses is formed. 5 and a half mirror 6 whose reflectance and transmittance are approximately equal, the image is focused at an imaging position within an ultraviolet objective lens 7 made up of a plurality of lens sets.The incident light that is focused at the focal position is emitted as parallel light. Therefore, a desired area on the reticle 8 placed at the focal length of the ultraviolet objective lens 7 can be uniformly illuminated. Therefore, the light passes through the ultraviolet objective lens 7, the half mirror 6, and the imaging lens 9, and is imaged on the light-receiving surface of the ultraviolet vidicon 10, so that a uniform image 10 times larger than that of the reticle 8 can be observed.

発明の効果 以上述べたように、本発明によれば、光ファイバの入射
面側と射出面側に拡散板を設け、光ファイバの射出面側
を円形形状に組み合わせ、入射面側をエキシマレーザ光
のビーム形状に合わせた矩形形状に組み合わせることに
より、干渉性、指向性が強いエキシマレーザ光を照明光
に用いても、光ファイバの入射面側で複雑な入射光学系
を組むことなく、光ファイバに入射するエキシマレーザ
光の空間的光量分布を均一化し、干渉性を減少させ、更
に開口数を拡げ、向きが不揃の光ファイバ束のすべてに
エキシマレーザ光を入射させることができる。したがっ
て、エキシマレーザ光を照明光源として用いても、レチ
クルを一様に照明することができ、これにより、画像処
理などによるレチクルアライメントが可能となる。
Effects of the Invention As described above, according to the present invention, a diffusion plate is provided on the entrance surface side and the exit surface side of the optical fiber, the exit surface side of the optical fiber is combined into a circular shape, and the entrance surface side is used for excimer laser light. By combining a rectangular shape that matches the beam shape of the optical fiber, even if an excimer laser beam with strong coherence and directivity is used as illumination light, the optical fiber can be easily It is possible to make the spatial light intensity distribution of the excimer laser light incident on the laser beam uniform, reduce coherence, and widen the numerical aperture, thereby making it possible to make the excimer laser light incident on all the optical fiber bundles having irregular directions. Therefore, even if excimer laser light is used as an illumination light source, the reticle can be uniformly illuminated, thereby enabling reticle alignment by image processing or the like.

【図面の簡単な説明】[Brief explanation of drawings]

第1図および第2図は本発明の一実施例における照明装
置を示し、第1図は全体構成図、第2図は光ファイバの
斜視図、第3図および第4図は従来の照明装置を示し、
第3図は全体構成図、第4図は光ファイバの射出端面の
模式図である。 l・・・・・・エキシマレーザ光源、2・・・・・・光
ファイバ、2a・・・・・・入射面、2b・・・・・・
射出面、3.4・・・・・・拡散板、5・・・・・・集
光光学系、6・・・・・・ハーフミラ−7・・・・・・
対物レンズ、8・・・・・・レチクル、9・・・・・・
結像レンズ、IO・・・・・・紫外ビジコン。 代理人の氏名 弁理士 粟野重孝 はか1名第1図 第 図 a 入射面 第 図
1 and 2 show a lighting device according to an embodiment of the present invention, FIG. 1 is an overall configuration diagram, FIG. 2 is a perspective view of an optical fiber, and FIGS. 3 and 4 are conventional lighting devices. shows,
FIG. 3 is an overall configuration diagram, and FIG. 4 is a schematic diagram of the exit end face of the optical fiber. l...Excimer laser light source, 2...Optical fiber, 2a...Incidence surface, 2b...
Output surface, 3.4...Diffusion plate, 5...Condensing optical system, 6...Half mirror 7...
Objective lens, 8... Reticle, 9...
Imaging lens, IO...UV vidicon. Name of agent: Patent attorney Shigetaka Awano (1 person) Figure 1 Figure a Figure of plane of incidence

Claims (3)

【特許請求の範囲】[Claims] (1)エキシマレーザ光源と、入射面側がエキシマレー
ザ光のビームパターンとほぼ同じ矩形形状となるように
配置され、射出面側が円形形状となるように配置され、
変形した束状の光ファイバと、この光ファイバの入射面
側に配置され、エキシマレーザ光を散乱させる拡散板と
、上記光ファイバの射出面側に配置され、この光ファイ
バから射出したエキシマレーザ光を散乱させる拡散板と
、散乱されたエキシマレーザ光をレチクル上に一様に照
明させ、このレチクルの像を観察するための光学系とを
備えた照明装置。
(1) The excimer laser light source is arranged so that the incident surface side has a rectangular shape that is almost the same as the beam pattern of the excimer laser light, and the exit surface side is arranged so that it has a circular shape,
A deformed bundle of optical fibers, a diffuser plate disposed on the incident surface side of the optical fiber to scatter the excimer laser beam, and an excimer laser beam emitted from the optical fiber disposed on the exit surface side of the optical fiber. An illumination device includes a diffuser plate that scatters excimer laser light, and an optical system that uniformly illuminates a reticle with the scattered excimer laser light and observes an image of the reticle.
(2)光学系が拡散板で散乱されたエキシマレーザ光を
集光する集光光学系と、集光されたエキシマレーザ光を
反射するハーフミラーと、反射されたエキシマレーザ光
をレチクル上に均一に照明する対物レンズと、上記レチ
クルからの反射光を上記対物レンズおよびハーフミラー
を介して観察手段に結像する結像レンズとを備えた請求
項1記載の照明装置。
(2) The optical system includes a condensing optical system that condenses the excimer laser light scattered by the diffuser, a half mirror that reflects the condensed excimer laser light, and a uniform distribution of the reflected excimer laser light onto the reticle. 2. The illumination device according to claim 1, further comprising: an objective lens for illuminating the reticle; and an imaging lens for forming an image of the reflected light from the reticle onto observation means via the objective lens and a half mirror.
(3)観察手段が紫外ビジコンである請求項2記載の照
明装置。
(3) The illumination device according to claim 2, wherein the observation means is an ultraviolet vidicon.
JP2140915A 1990-05-30 1990-05-30 Illuminator Pending JPH0434918A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2140915A JPH0434918A (en) 1990-05-30 1990-05-30 Illuminator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2140915A JPH0434918A (en) 1990-05-30 1990-05-30 Illuminator

Publications (1)

Publication Number Publication Date
JPH0434918A true JPH0434918A (en) 1992-02-05

Family

ID=15279778

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2140915A Pending JPH0434918A (en) 1990-05-30 1990-05-30 Illuminator

Country Status (1)

Country Link
JP (1) JPH0434918A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005338852A (en) * 2004-05-26 2005-12-08 Asml Holding Nv Lithography system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005338852A (en) * 2004-05-26 2005-12-08 Asml Holding Nv Lithography system

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