JPH0434484B2 - - Google Patents
Info
- Publication number
- JPH0434484B2 JPH0434484B2 JP8571584A JP8571584A JPH0434484B2 JP H0434484 B2 JPH0434484 B2 JP H0434484B2 JP 8571584 A JP8571584 A JP 8571584A JP 8571584 A JP8571584 A JP 8571584A JP H0434484 B2 JPH0434484 B2 JP H0434484B2
- Authority
- JP
- Japan
- Prior art keywords
- mold
- rubber
- vulcanization molding
- alloy
- sputtering
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000004544 sputter deposition Methods 0.000 claims description 13
- 229920001971 elastomer Polymers 0.000 claims description 11
- 239000005060 rubber Substances 0.000 claims description 11
- 238000004073 vulcanization Methods 0.000 claims description 11
- 238000000465 moulding Methods 0.000 claims description 10
- 229910045601 alloy Inorganic materials 0.000 claims description 9
- 239000000956 alloy Substances 0.000 claims description 9
- 239000010409 thin film Substances 0.000 claims description 7
- 229910019589 Cr—Fe Inorganic materials 0.000 claims description 6
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 238000005260 corrosion Methods 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 238000007747 plating Methods 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 238000011109 contamination Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000006082 mold release agent Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910001339 C alloy Inorganic materials 0.000 description 2
- WAIPAZQMEIHHTJ-UHFFFAOYSA-N [Cr].[Co] Chemical compound [Cr].[Co] WAIPAZQMEIHHTJ-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000013040 rubber vulcanization Methods 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920005558 epichlorohydrin rubber Polymers 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000013020 steam cleaning Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Description
【発明の詳細な説明】
本発明は、ゴムの加硫成形用金型に関する。更
に詳しくは、ハロゲン含有ゴムの加硫成形などに
好適に用いられる、耐食性および離型性にすぐれ
た加硫成形用金型に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a mold for vulcanization molding of rubber. More specifically, the present invention relates to a mold for vulcanization molding having excellent corrosion resistance and mold releasability, which is suitably used for vulcanization molding of halogen-containing rubber.
一般に、金型表面はメツキ処理されており、実
用的には工業用クロムメツキ、ニツケルメツキ、
無電解ニツケルメツキの３種が施されており、ゴ
ムの加硫成形用金型には、殆んどの場合工業用ク
ロムメツキが施されている。 Generally, the surface of the mold is plated, and in practical use industrial chrome plating, nickel plating,
Three types of electroless nickel plating are applied, and industrial chrome plating is applied to rubber vulcanization molds in most cases.
工業用クロムメツキは、耐摩耗性、耐食性、耐
熱性、離型性などの点ですぐれているので、ゴム
の加硫成形用金型に用いられているものの、その
表面酸化膜は塩化水素、フツ化水素などに侵され
易いという欠点を有している。そのため、アクリ
ルゴム、クロロプレンゴム、エピクロルヒドリン
ゴムなどのハロゲン含有ゴムの加硫成形に工業用
クロムメツキ金型を用いると、耐食性に基因する
金型の汚染と離型性の点で満足されず、これらの
点は製品の良し悪しおよび生産性に直接影響する
重要な因子であるので、その点の解決が強く望ま
れている。 Industrial chrome plating has excellent wear resistance, corrosion resistance, heat resistance, and mold release properties, so it is used in rubber vulcanization molds. It has the disadvantage of being easily attacked by hydrogen chloride, etc. Therefore, when industrial chrome plating molds are used for vulcanization molding of halogen-containing rubbers such as acrylic rubber, chloroprene rubber, and epichlorohydrin rubber, mold contamination due to corrosion resistance and mold releasability are unsatisfactory. Since this is an important factor that directly affects product quality and productivity, there is a strong desire to resolve this issue.
従来一般的に行われているこれらの解決方法
は、金型汚染性の問題の解決については、金型表
面にみられる配合薬品、重合体中の非ゴム分など
の堆積や加硫時の反応生成物の堆積、更には熱分
解によつて生成したハロゲン化水素ガスなどによ
る腐食などに原因するカス付きを一定加硫成形回
数毎にアルカリ洗浄などの手段で除去するという
煩雑な方法であり、また離型性の問題の解決につ
いては、離型剤の使用が行われているが、これに
よつて生産性が低下し、型冷えや不良品の発生な
どがみられていた。 These solutions, which have been commonly used in the past, have been used to solve the problem of mold contamination by preventing the build-up of compounded chemicals on the mold surface, non-rubber components in the polymer, and reactions during vulcanization. This is a complicated method in which residues caused by product accumulation and corrosion caused by hydrogen halide gas generated by thermal decomposition are removed by means such as alkaline cleaning after a certain number of vulcanization molding cycles. In addition, to solve the problem of mold releasability, mold release agents have been used, but this has resulted in decreased productivity, mold cooling, and the occurrence of defective products.
本発明者らは、金型汚染の原因ともなる耐食性
を高め、かつ離型性の点をも同時に満足させる金
型を求めて種々検討の結果、金型のゴム接触部分
にNi−Mo−Ｗ−Cr−Fe系合金の高周波スパツ
タリング薄膜を形成させることにより、かかる課
題が効果的に解決し得ることを見出した。従つ
て、本発明は、かかるゴムの加硫成形用金型に係
る。 The present inventors have conducted various studies in search of a mold that improves corrosion resistance, which is a cause of mold contamination, and also satisfies mold releasability. It has been found that this problem can be effectively solved by forming a high-frequency sputtering thin film of -Cr-Fe alloy. Therefore, the present invention relates to a mold for vulcanization molding of such rubber.
Ni−Mo−Ｗ−Cr−Fe系合金としては、
Ni 54.5〜59.5％
Mo 15〜19％
Ｗ ３〜5.5％
Cr 11〜16％
Fe ４〜９％
を主成分とし、これに１％以下のSi、0.2％以下
のMnまたは0.15％以下のＣの少なくとも一種を
含有する成分組成を有するものが用いられ、実際
的には市販品であるハステロイＣ合金（登録商
標）が用いられる。そして、硝酸その他の強酸や
塩素に耐える優秀な耐食合金であり、ただし加工
が困難で、一般に鋳物などに用いられているが、
本発明においては、この加工困難なNi−Mo−Ｗ
−Cr−Fe系合金をターゲツトに用い、高周波ス
パツタリング法により金型表面にそれの薄膜を形
成させている。 As a Ni-Mo-W-Cr-Fe alloy, the main components are Ni 54.5-59.5% Mo 15-19% W 3-5.5% Cr 11-16% Fe 4-9%, with 1% or less A material having a composition containing at least one of Si, 0.2% or less Mn, or 0.15% or less C is used, and in practice, a commercially available Hastelloy C alloy (registered trademark) is used. It is an excellent corrosion-resistant alloy that can withstand nitric acid and other strong acids and chlorine, but it is difficult to process and is generally used in castings.
In the present invention, this difficult-to-process Ni-Mo-W
- Using a Cr-Fe alloy as a target, a thin film of it is formed on the mold surface by high-frequency sputtering.
スパツタリング操作は、例えば第１図に示され
るような態様に従つて行われる。即ち、紙ヤスリ
でさび落しなどをした後、トリクロルエタン液中
での超音波洗浄およびトリクロルエタンの蒸気洗
浄を行なつた金型１を下部電極２上に搭載し、こ
れと相対する位置に位置させた上部電極３に円板
状ハステロイＣ合金ターゲツト（例えば直径152
mm、厚さ４mm）４を取付けたスパツタリング室５
内を、油回転ポンプによつて10-2Torrのオーダ
ー迄排気筒６から排気し、続いて油拡散ポンプで
10-6Torrのオーダー迄高真空に排気する。その
状態でアルゴンガスをライン７からスパツタリン
グ室内に10-3Torrの圧力になる迄導入し、メイ
ンバルブで５×10-5Torrにその圧力を調節しな
がら、下部電極側にRF電源８および整合器９か
らの高周波（13.56MHz）を印加してスパツタエ
ツチングを行ない、金型表面の酸化層などを除去
する。次に、上部電極側に高周波を印加して、金
型の表面にNi−Mo−Ｗ−Cr−Fe系合金の薄膜
（厚さ約1μｍ程度）を形成させるスパツタリング
を行なう。 The sputtering operation is carried out, for example, according to the embodiment shown in FIG. That is, after removing rust with sandpaper, the mold 1 has been subjected to ultrasonic cleaning in a trichloroethane solution and steam cleaning with trichloroethane, and is mounted on the lower electrode 2, and positioned opposite to this. A disk-shaped Hastelloy C alloy target (for example, a diameter of 152
sputtering chamber 5 with attached sputtering chamber 4 (mm, thickness 4 mm)
The inside was evacuated from the exhaust pipe 6 to the order of 10 -2 Torr with an oil rotary pump, and then with an oil diffusion pump.
Evacuate to high vacuum to the order of 10 -6 Torr. In this state, argon gas is introduced into the sputtering chamber from line 7 until the pressure reaches 10 -3 Torr, and while adjusting the pressure to 5 × 10 -5 Torr with the main valve, connect the RF power source 8 to the lower electrode side. Sputter etching is performed by applying high frequency (13.56 MHz) from the device 9 to remove the oxide layer on the mold surface. Next, a high frequency is applied to the upper electrode side to perform sputtering to form a thin film (about 1 μm thick) of a Ni-Mo-W-Cr-Fe alloy on the surface of the mold.
金型が複数個の分割型などから構成されている
場合には、各分割型のゴム接触部分のみに高周波
スパツタリング薄膜を設ければ十分であり、この
ような部分的な薄膜の形成は、分割型などを適当
に部分的に覆いながらスパツタリング処理するこ
とによつて行われる。 If the mold is made up of multiple split molds, it is sufficient to apply a high-frequency sputtering thin film only to the rubber contacting parts of each split mold. This is carried out by sputtering while appropriately covering a mold or the like.
このようにしてその表面にNi−Mo−Ｗ−Cr−
Fe系合金の薄膜を形成させた本発明の金型は、
クロムメツキ金型はフツ酸によつて、またニツケ
ルメツキ金型は有機カルボン酸によつて、それぞ
れメツキ面が腐食されるのとは対照的に、フツ酸
および有機カルボン酸によつても腐食されること
がない。 In this way, Ni−Mo−W−Cr−
The mold of the present invention in which a thin film of Fe-based alloy is formed is
In contrast to the chrome-plated mold being corroded by hydrofluoric acid and the nickel-plated mold being corroded by organic carboxylic acid, the plating surface is also corroded by hydrofluoric acid and organic carboxylic acid. There is no.
また、本発明に係る金型の離型性を調べるた
め、フツ素ゴムの加硫成形を行なつたところ、同
一形状のクロムメツキ金型の使用では、毎回離型
剤を塗布しないとカス付きがみられるのに対し、
加硫成形回数約20〜25回に１回の割合で離型剤を
塗布すれば十分であるという顕著な差がみられ
た。 In addition, in order to investigate the mold release properties of the mold according to the present invention, fluorocarbon rubber was vulcanized and molded, and it was found that when using a chrome-plated mold of the same shape, scum formed unless a mold release agent was applied each time. Whereas it can be seen,
A remarkable difference was observed in that it was sufficient to apply the mold release agent once every 20 to 25 vulcanization moldings.
このように、本発明に係る金型は、Ni−Mo−
Ｗ−Cr−Fe系合金の表面薄膜を高周波スパツタ
リング法によつて形成させることにより、耐食性
は勿論のこと、離型性を大幅に改善することがで
き、その結果離型剤の塗布や金型洗浄の頻度を大
幅に減らすことが可能となり、生産性の向上およ
び不良加硫成形品の低減に大きな効果をもたらし
ている。 In this way, the mold according to the present invention is made of Ni-Mo-
By forming a thin film on the surface of a W-Cr-Fe alloy using high-frequency sputtering, not only corrosion resistance but also mold releasability can be greatly improved. It has become possible to significantly reduce the frequency of cleaning, which has a significant effect on improving productivity and reducing the number of defective vulcanized molded products.
第１図は、本発明で適用される高周波スパツタ
リング装置の概略図である。
符号の説明、１……被処理金型、２……下部電
極、３……上部電極、４……Ni−Mo−Ｗ−Cr−
Fe系合金ターゲツト、５……スパツタリング室、
８……RF電源。
FIG. 1 is a schematic diagram of a high frequency sputtering apparatus applied in the present invention. Explanation of symbols, 1...Mold to be processed, 2...Lower electrode, 3...Upper electrode, 4...Ni-Mo-W-Cr-
Fe-based alloy target, 5... sputtering chamber,
8...RF power supply.
Claims (1)
のMnまたは0.15％以下のＣの少なくとも一種を
含有させたNi−Mo−Ｗ−Cr−Fe系合金の高周
波スパツタリング薄膜を、金型のゴム接触部分に
形成させた、ゴムの加硫成形用金型。 ２ ハロゲン含有ゴムの加硫成形に用いられる特
許請求の範囲第１項記載のゴムの加硫成形用金
型。[Claims] 1 Main components: Ni 54.5-59.5% Mo 15-19% W 3-5.5% Cr 11-16% Fe 4-9%, with 1% or less Si and 0.2% or less Mn Or a mold for vulcanization molding of rubber, in which a high-frequency sputtering thin film of a Ni-Mo-W-Cr-Fe alloy containing at least one type of C of 0.15% or less is formed on the rubber contacting part of the mold. 2. A mold for vulcanization molding of rubber according to claim 1, which is used for vulcanization molding of halogen-containing rubber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8571584A JPS60229718A (en) | 1984-04-27 | 1984-04-27 | Mold for vulcanization and molding of rubber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8571584A JPS60229718A (en) | 1984-04-27 | 1984-04-27 | Mold for vulcanization and molding of rubber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60229718A JPS60229718A (en) | 1985-11-15 |
| JPH0434484B2 true JPH0434484B2 (en) | 1992-06-08 |
Family
ID=13866522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8571584A Granted JPS60229718A (en) | 1984-04-27 | 1984-04-27 | Mold for vulcanization and molding of rubber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60229718A (en) |
-
1984
- 1984-04-27 JP JP8571584A patent/JPS60229718A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60229718A (en) | 1985-11-15 |
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