JPH04338675A - Image sensor - Google Patents

Image sensor

Info

Publication number
JPH04338675A
JPH04338675A JP3111309A JP11130991A JPH04338675A JP H04338675 A JPH04338675 A JP H04338675A JP 3111309 A JP3111309 A JP 3111309A JP 11130991 A JP11130991 A JP 11130991A JP H04338675 A JPH04338675 A JP H04338675A
Authority
JP
Japan
Prior art keywords
region
circuit
image area
thickness
peripheral
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3111309A
Other languages
Japanese (ja)
Inventor
Kazuo Konuma
和夫 小沼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP3111309A priority Critical patent/JPH04338675A/en
Publication of JPH04338675A publication Critical patent/JPH04338675A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To reduce a temperature rise of an image area circuit and to improve an S/N by reducing a thickness of a board of a boundary region between an image area circuit region and a peripheral circuit region. CONSTITUTION:A substrate is reduced in thickness in a boundary region between a region of an image area circuit 2 of a semiconductor chip and a region of a peripheral circuit 4. The chip on an image area board 6, a peripheral part board 7, which are not reduced in thickness is 400-700 microns thick. The thickness of a thinned region 8 is about 50-100 microns as a value for satisfying influence to electric characteristics and conditions such as heat insulation, a mechanical strength. The wider the region 8 is, the more its heat insulating effect increases, but from the width of a connecting circuit region of a connector of the circuit 2 and the circuit 4, the width of thin film region is about 100-200 microns. Since the longer length of the thin film region increases more the heat insulating effect, it is thinned up to both ends of the semiconductor substrate.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、イメージセンサに関す
るものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an image sensor.

【0002】0002

【従来の技術】従来、CCDイメージセンサは図2に示
す構造のものが提案されてきた(たとえば、テレビジョ
ン学界誌1987年41巻11号1054頁−1060
頁)。このイメージセンサは厚さが一定の半導体基板1
の表面に、ホトダイオードと垂直CCDレジスタで構成
されるイメージエリア回路2、水平CCDレジスタと同
一基板上アンプ3とで構成される周辺回路4、垂直ダミ
ーCCDレジスタを有する接続回路5が、配されている
2. Description of the Related Art Conventionally, a CCD image sensor having the structure shown in FIG. 2 has been proposed.
page). This image sensor has a semiconductor substrate 1 with a constant thickness.
An image area circuit 2 comprising a photodiode and a vertical CCD register, a peripheral circuit 4 comprising a horizontal CCD register and an amplifier 3 on the same substrate, and a connection circuit 5 having a vertical dummy CCD register are arranged on the surface of the circuit. There is.

【0003】イメージエリア回路内のホトダイオードで
発生した信号電荷は垂直CCDレジスタ、水平CCDレ
ジスタを介して同一基板上アンプへ転送される。信号電
荷は微弱であるため、同一基板上に形成し高インピーダ
ンス入力、低インピーダンス出力を有する前記同一基板
上アンプにおいて低インピーダンス出力に変換される。
Signal charges generated by photodiodes in the image area circuit are transferred to an amplifier on the same substrate via a vertical CCD register and a horizontal CCD register. Since the signal charge is weak, it is converted into a low impedance output in the on-board amplifier formed on the same board and having a high impedance input and a low impedance output.

【0004】0004

【発明が解決しようとする課題】イメージセンサではイ
メージエリア回路、周辺回路、接続回路の各部で最適動
作温度、許容動作温度範囲、発熱量が異なる。ミメージ
エリア回路を構成しているホトダイオードは高温状態で
は暗電流が増加し、ノイズの増加やダイナミックレンジ
の減少等の特性劣化が生じる。赤外線を感知することを
目的とするショットキ型CCDイメージセンサ(例えば
、IEEEトランザクション  オブ  エレクトロン
デバイス1990年37巻3号629頁−634頁)に
おいてはホトダイオードを77ケルビン程度の低温に冷
却させないと暗電流の増加が原因で動作出来無くなる。 また、微弱光を感知することを目的とした高感度イメー
ジセンサやフレームレートの遅い天体観測用のイメージ
センサでもS/Nを向上させるためにイメージセンサ、
特にイメージエリア回路の冷却が必要とされている。以
上述べたようにイメージセンサにおいてはイメージエリ
ア回路を低温に保つ必要がある。
In an image sensor, the optimum operating temperature, allowable operating temperature range, and amount of heat generated differ among the image area circuit, peripheral circuit, and connection circuit. The dark current of the photodiode that makes up the image area circuit increases at high temperatures, resulting in characteristic deterioration such as an increase in noise and a decrease in dynamic range. In a Schottky CCD image sensor whose purpose is to detect infrared rays (e.g., IEEE Transactions on Electron Devices, 1990, Vol. 37, No. 3, pp. 629-634), dark current is generated unless the photodiode is cooled to a low temperature of about 77 Kelvin. Due to the increase, it becomes impossible to operate. In addition, image sensors are used to improve the S/N, even for high-sensitivity image sensors intended to detect weak light and image sensors for astronomical observation with slow frame rates.
In particular, cooling of the image area circuit is required. As described above, in an image sensor, it is necessary to keep the image area circuit at a low temperature.

【0005】周辺回路、特に、高速転送動作を行う水平
CCDにおいては低温で転送損失が生じる問題を抱えて
いるため(参向文献として、例えば、電子通信学会技術
研究報告1984年7月17日発行84巻82号29頁
−35頁)、極端な低温での動作は避けなければならな
い。動作温度としては、80ケルビン以上が好ましい。 ところで、発熱に関しては、電力供給が多くなされる周
辺回路がもっとも高い。これは、水平CCDの駆動周波
数が高いこと、および低インピーダンス出力の同一基板
上アンプに供給される電力が多いことが主な原因である
。従来のイメージセンサでは周辺回路での発熱により前
記ホトダイオードを有するイメージエリア回路が温度上
昇してしまう問題を抱えていた。
[0005] Peripheral circuits, especially horizontal CCDs that perform high-speed transfer operations, have the problem of transfer loss at low temperatures (for example, refer to IEICE technical research report published July 17, 1984). (Vol. 84, No. 82, pp. 29-35), operation at extremely low temperatures must be avoided. The operating temperature is preferably 80 Kelvin or higher. By the way, regarding heat generation, peripheral circuits to which a large amount of power is supplied have the highest heat generation. This is mainly due to the high driving frequency of the horizontal CCD and the large amount of power supplied to the low impedance output amplifier on the same board. Conventional image sensors have had a problem in that the temperature of the image area circuit including the photodiode increases due to heat generation in the peripheral circuits.

【0006】[0006]

【課題を解決するための手段】本発明は同一基板上に形
成したイメージエリア回路と周辺回路および接続回路を
有するイメージセンサにおいて、前記イメージエリア回
路領域と前記周辺回路領域の境界領域の前記基板厚が薄
膜化しているというものである。
Means for Solving the Problems The present invention provides an image sensor having an image area circuit, a peripheral circuit, and a connection circuit formed on the same substrate, in which the substrate thickness of the boundary area between the image area circuit area and the peripheral circuit area is is becoming thinner.

【0007】[0007]

【作用】受光領域と周辺増幅器部の境界領域の薄膜化し
た基板部分がその断面積が小さいために熱伝導が低く、
このため、周辺回路からイメージエリア回路への熱流入
を低く抑えている。
[Function] The thinned substrate part in the boundary area between the light receiving area and the peripheral amplifier part has a small cross-sectional area, so heat conduction is low.
Therefore, heat flow from the peripheral circuits to the image area circuit is suppressed.

【0008】[0008]

【実施例】次に、本発明の実施例について図面を参照し
て説明する。
Embodiments Next, embodiments of the present invention will be described with reference to the drawings.

【0009】図1は本発明の第1の実施例のCCDイメ
ージセンサを示す半導体チップの断面図である。図2の
従来例との相違は、半導体チップのイメージエリア回路
領域と周辺回路領域との境界領域で半導体基板が薄膜化
していることである。半導体基板として主に用いられて
いるシリコン基板は400〜700ミクロン程度の膜厚
を有している。薄膜化していないイメージエリア部基板
6、および、周辺部基板7での半導体チップはこの膜厚
を有している。薄膜化領域8の膜厚は電気的特性に与え
る影響と断熱性と機械的強度の条件を満たす値として典
型的には50〜100ミクロン程度である。薄膜化して
いる領域8は幅広いほど断熱効果は増すが、半導体基板
上でのイメージエリア回路2と周辺回路4の接続部であ
る接続回路領域の幅から薄膜領域の幅は100〜200
ミクロン程度である。薄膜領域の長さは長いほど断熱効
果が増すため半導体基板の両端まで薄膜化してある。
FIG. 1 is a sectional view of a semiconductor chip showing a CCD image sensor according to a first embodiment of the present invention. The difference from the conventional example shown in FIG. 2 is that the semiconductor substrate is thinned in the boundary area between the image area circuit area and the peripheral circuit area of the semiconductor chip. A silicon substrate mainly used as a semiconductor substrate has a film thickness of about 400 to 700 microns. The semiconductor chips in the image area substrate 6 and the peripheral substrate 7, which have not been thinned, have this thickness. The thickness of the thinned region 8 is typically about 50 to 100 microns, which satisfies the conditions for influence on electrical properties, heat insulation, and mechanical strength. The wider the thin film region 8 is, the better the insulation effect will be, but the width of the thin film region is 100 to 200 mm, based on the width of the connection circuit region where the image area circuit 2 and the peripheral circuit 4 are connected on the semiconductor substrate.
It is on the order of microns. The longer the length of the thin film region, the greater the heat insulating effect, so the film is made thinner to both ends of the semiconductor substrate.

【0010】図3および図4はそれぞれ、本発明の第2
の実施例のCCDイメージセンサを示す半導体チップの
直交する面で切った模式的断面図である。図2の従来例
との相違は、半導体チップのイメージエリア回路2と周
辺回路4を構成している水平CCDレジスタとの境界領
域および水平CCDレジスタと同一基板上アンプ3との
境界領域の2箇所で基板が薄膜化していることと、図4
で示してあるように、半導体基板1の両端付近まで薄膜
化しており、両端付近では半導体基板の機械的強度を保
つことを目的として薄膜化しない領域として厚膜周辺部
9を1mm程度残してある点である。薄膜化している領
域8及び薄膜化していない領域のそれぞれの膜厚は第1
の実施例の場合と同様である。本実施例では水平CCD
レジスタと周辺回路4との境界領域の幅は1mm程度で
ある。
FIGS. 3 and 4 respectively show the second embodiment of the present invention.
FIG. 2 is a schematic cross-sectional view taken along orthogonal planes of a semiconductor chip showing a CCD image sensor according to an embodiment of the present invention. There are two differences from the conventional example shown in FIG. 2: the boundary area between the image area circuit 2 of the semiconductor chip and the horizontal CCD register constituting the peripheral circuit 4, and the boundary area between the horizontal CCD register and the amplifier 3 on the same substrate. The fact that the substrate is thinner and that Figure 4
As shown in , the film is thinned to the vicinity of both ends of the semiconductor substrate 1, and a thick film peripheral portion 9 of approximately 1 mm is left as an area where the film is not thinned near both ends in order to maintain the mechanical strength of the semiconductor substrate. It is a point. The thickness of each of the thinned region 8 and the non-thinned region is the first
This is the same as in the embodiment. In this example, horizontal CCD
The width of the boundary area between the register and the peripheral circuit 4 is approximately 1 mm.

【0011】[0011]

【発明の効果】以上説明したように本発明は、イメージ
エリア回路と周辺回路との境界部分に薄膜領域を設けて
熱伝導を抑制することで、イメージエリア回路の温度上
昇を低減し、イメージセンサのS/N、ダイナミックレ
ンジ、面内の特性の均一性を改善することができる。
As explained above, the present invention suppresses heat conduction by providing a thin film region at the boundary between the image area circuit and the peripheral circuit, thereby reducing the temperature rise of the image area circuit and improving the image sensor. The S/N, dynamic range, and uniformity of in-plane characteristics can be improved.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明のイメージセンサに関する一実施例の模
式的断面図である。
FIG. 1 is a schematic cross-sectional view of an embodiment of an image sensor of the present invention.

【図2】従来のイメージセンサの模式的断面図である。FIG. 2 is a schematic cross-sectional view of a conventional image sensor.

【図3】本発明のイメージセンサに関する第2の実施例
の模式的断面図である。
FIG. 3 is a schematic cross-sectional view of a second embodiment of the image sensor of the present invention.

【図4】第2の実施例の図3に直交する方向に切断した
半導体基板の断面図である。
FIG. 4 is a cross-sectional view of a semiconductor substrate of a second embodiment taken in a direction perpendicular to FIG. 3;

【符号の説明】[Explanation of symbols]

1    半導体基板 2    イメージエリア回路 3    同一基板上アンプ 4    周辺回路 5    接続回路 6    イメージエリア部基板 7    周辺部基板 8    薄膜化領域 1 Semiconductor substrate 2 Image area circuit 3 Amplifier on the same board 4 Peripheral circuit 5 Connection circuit 6 Image area board 7 Peripheral board 8 Thin film area

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  同一基板上に、イメージエリア回路と
周辺回路と接続回路とを形成したイメージセンサにおい
て、前記イメージエリア回路領域と前記周辺回路領域の
境界領域の前記基板厚が薄膜化していることを特徴とす
るイメージセンサ。
1. In an image sensor in which an image area circuit, a peripheral circuit, and a connection circuit are formed on the same substrate, the substrate thickness in a boundary region between the image area circuit region and the peripheral circuit region is thinned. An image sensor featuring:
JP3111309A 1991-05-16 1991-05-16 Image sensor Pending JPH04338675A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3111309A JPH04338675A (en) 1991-05-16 1991-05-16 Image sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3111309A JPH04338675A (en) 1991-05-16 1991-05-16 Image sensor

Publications (1)

Publication Number Publication Date
JPH04338675A true JPH04338675A (en) 1992-11-25

Family

ID=14557963

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3111309A Pending JPH04338675A (en) 1991-05-16 1991-05-16 Image sensor

Country Status (1)

Country Link
JP (1) JPH04338675A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010230430A (en) * 2009-03-26 2010-10-14 Fujifilm Corp Radiation detecting device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010230430A (en) * 2009-03-26 2010-10-14 Fujifilm Corp Radiation detecting device

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