JPH0433350A - Construction of tab tape - Google Patents

Construction of tab tape

Info

Publication number
JPH0433350A
JPH0433350A JP14030290A JP14030290A JPH0433350A JP H0433350 A JPH0433350 A JP H0433350A JP 14030290 A JP14030290 A JP 14030290A JP 14030290 A JP14030290 A JP 14030290A JP H0433350 A JPH0433350 A JP H0433350A
Authority
JP
Japan
Prior art keywords
holes
base tape
hole
sprocket
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14030290A
Other languages
Japanese (ja)
Inventor
Kazuhiro Iino
飯野 和宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP14030290A priority Critical patent/JPH0433350A/en
Publication of JPH0433350A publication Critical patent/JPH0433350A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To reduce the thickness of an insulating film by a method wherein the opening edges of sprocket holes provided along the side ends of the insulating film are reinforced with metal foils. CONSTITUTION:A polyimide base tape 1 which has a thickness of 50mum and is coated with epoxy system thermosetting adhesive is punched by a die to form a semiconductor chip mounting hole 3, outer connection holes 4 and sprocket holes 1a. The base tape 1 is cladded with a rolled copper foil having a thickness of 35mum and respectively independent conductor wirings 5, sprocket hole reinforcing belts 6 and a horizontal bar 7 which prevents a distance between the left and right sprocket hole reinforcing belts 6 from variation are formed from the copper foil. The sprocket holes 1a are provided continuously along both side edges of the base tape 1 with a certain pitch. The reinforcing belts 6 made from copper foils are bonded to both side edges of the base tape 1 except the parts of the sprocket holes 1a to reinforce the opening edges of the sprocket holes 1a. The mounting hole 3 is provided at the center part of the base tape 1. The connection holes 4 are provided before and behind and on the left and right of the mounting hole 4. The wirings 5 are provided between the hole 3 and the holes 4. Further, the horizontal bar 7 is formed between the reinforcing belts 6 and 6 of both the side edges.

Description

【発明の詳細な説明】 〔産業上の利用分野] 本発明はTABテープの構造に関し、特にTABテープ
のベースとなる絶縁性フィルムの厚さが薄く、かつTA
Bテープ上の面積を効率的に使用できるTABテープの
構造に関する。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to the structure of a TAB tape, and in particular, the insulating film that is the base of the TAB tape is thin and the TAB tape is
The present invention relates to a TAB tape structure that allows efficient use of the area on the B tape.

〔従来の技術〕[Conventional technology]

従来のTABテープの搬送は、ベースとなる絶縁性フィ
ルム(以下ベーステープと呼称する)の両側に設けられ
た送り孔を使用して行われてい乙ため、搬送時の応力に
絶縁性フィルムの送り孔部分が耐える必要があり、例え
ばポリイミド製ベーステープでフィルムの厚さを75μ
mないし12511mにする必要性があった。
Conventional transport of TAB tape is carried out using feed holes provided on both sides of the base insulating film (hereinafter referred to as base tape). For example, the thickness of the film must be 75μ with polyimide base tape.
There was a need to make it between 12,511 m and 12,511 m.

[発明が解決しようとする課題] この従来のTABテープでは、TABテープのベーステ
ープ厚を薄くすることができず、そのため、高価なポリ
イミドを多量に使う必要があった。
[Problems to be Solved by the Invention] With this conventional TAB tape, the base tape thickness of the TAB tape cannot be reduced, and therefore, it is necessary to use a large amount of expensive polyimide.

また、従来のTABテープは、送り孔部分を規定厚以上
にすると、搬送の障害となるため、TABテープ搬送搬
送用孔周囲にまで導体配線を設けられず、TABテープ
上の面積の効率的利用を阻害していた。
In addition, with conventional TAB tapes, if the thickness of the feed holes exceeds the specified thickness, it will impede transport, so conductor wiring cannot be provided around the holes for transporting the TAB tape, making efficient use of the area on the TAB tape. was inhibiting.

本発明は、絶縁性フィルムの側縁に設けた送り孔の開口
縁を金属箔にて補強することにより、絶縁性フィルムの
厚味を薄くするようにしたTABテープの構造を提供す
ることを目的とする。
An object of the present invention is to provide a TAB tape structure in which the thickness of the insulating film is reduced by reinforcing the opening edges of the feed holes provided on the side edges of the insulating film with metal foil. shall be.

〔課題を解決するための手段〕[Means to solve the problem]

前記目的を達成するため、本発明に係るTABテープの
構造においては、絶縁性フィルムと、金属箔とを有する
TABテープの構造であって、絶縁性フィルムは、その
側縁に送り孔が一部ピッチで連続的に設けられたもので
あり、金属箔は、絶縁性フィルムの側縁に送り孔の部分
を除いて連続的に付着され、送り孔の開口縁を補強する
ものである。
In order to achieve the above object, the TAB tape structure according to the present invention includes an insulating film and a metal foil, and the insulating film has some perforations on its side edges. The metal foil is continuously provided at a pitch, and the metal foil is continuously attached to the side edge of the insulating film except for the part of the perforation to reinforce the opening edge of the perforation.

[作用] 本発明によれば、絶縁性フィルム1に設けた送り孔1a
の開口縁が金属箔6にて補強されるため、絶縁性フィル
ムlの厚味を必要以上に厚くする必要がなくなり、金属
箔6を導電配線の一部として用いることにより、TAB
テープ上の面積の効率的利用を図ることが可能となる。
[Function] According to the present invention, the feed hole 1a provided in the insulating film 1
Since the opening edge of the TAB is reinforced with the metal foil 6, there is no need to make the insulating film l thicker than necessary, and by using the metal foil 6 as a part of the conductive wiring, the TAB
This makes it possible to efficiently utilize the area on the tape.

〔実施例] 次に本発明について図面を参照して説明する。〔Example] Next, the present invention will be explained with reference to the drawings.

(実施例1) 第1図(a)は本発明の実施例1を示す正面図、(b)
は同断面図である。
(Example 1) Figure 1 (a) is a front view showing Example 1 of the present invention, (b)
is the same sectional view.

図において、本発明に係るTA、Bテープは、厚さ50
pmのポリイミド製ベーステープ(絶縁性フィルム)1
上にエポキシ系熱硬化型接着剤2を塗布したものに金型
で半導体素子搭載用孔3と外部接続用孔4と送り孔1a
とを打抜き加工し、ベーステープ1上に35pm厚の圧
延銅箔を張り付け、この銅箔で、各々独立した導通配線
5と、搬送用送り孔補強用帯6と、左右の搬送用送り孔
補強用帯6の間隔変化防止用横桟7とを形成している。
In the figure, the TA and B tapes according to the present invention have a thickness of 50 mm.
pm polyimide base tape (insulating film) 1
An epoxy thermosetting adhesive 2 is applied on top, and a mold is used to form a hole 3 for mounting a semiconductor element, a hole 4 for external connection, and a feed hole 1a.
A rolled copper foil with a thickness of 35 pm is pasted on the base tape 1, and this copper foil is used to form the individual conductive wiring 5, the belt 6 for reinforcing the conveying holes, and the reinforcement for the left and right conveying holes. It also forms a horizontal bar 7 for preventing changes in the interval of the belt 6.

送り孔1aは、ベーステープ1の両側縁に一部ピッチで
連続的に設けられており、銅箔からなる補強用帯6は、
ベーステープlの両側縁に送り孔1aの部分を除いて連
続的に付着され、送り孔1aの開口縁を補強する。搭載
用孔3は、ベーステープlの中央部に設けられ、その前
後左右に接続用孔4が設けられ、両孔3.4間に配線5
が設けられている。また、横桟7は側縁の補強用帯6,
6間に渡って形成されている。
The feed holes 1a are continuously provided on both sides of the base tape 1 at a partial pitch, and the reinforcing band 6 made of copper foil is
It is continuously attached to both side edges of the base tape l except for the portion of the feed hole 1a, and reinforces the opening edge of the feed hole 1a. The mounting hole 3 is provided in the center of the base tape l, and connection holes 4 are provided on the front, rear, left and right sides of the mounting hole 3, and the wiring 5 is provided between both holes 3.4.
is provided. In addition, the horizontal crosspiece 7 has side edge reinforcing bands 6,
It is formed over 6 hours.

次に実施例1のTABテープの製造方法を説明する。Next, a method for manufacturing the TAB tape of Example 1 will be explained.

まず50μm厚のポリイミド製ベーステープ1を35岨
幅に裁断し、しかる後エポキシ系熱硬化型接着剤2を片
側IMの未塗布部を残して33nun幅に塗布した。続
いて第1の金型で半導体搭載用孔3と外部接続用孔4を
打ち抜き形成した。その後、抗張力35.15Kg/ 
mm 2を有する354m厚の圧延銅箔を33mm幅に
裁断し、エポキシ系熱硬化型接着剤2の塗布位置に合わ
せて圧延ローラを通して貼付し、150℃で1時間加熱
することにより積層させた。
First, a polyimide base tape 1 having a thickness of 50 μm was cut to a width of 35 nm, and then an epoxy thermosetting adhesive 2 was applied to a width of 33 nm, leaving an uncoated portion of IM on one side. Subsequently, a semiconductor mounting hole 3 and an external connection hole 4 were punched out using the first mold. After that, tensile strength 35.15Kg/
A rolled copper foil having a thickness of 354 m and having a width of 354 mm was cut into a width of 33 mm, pasted through a rolling roller in accordance with the application position of the epoxy thermosetting adhesive 2, and laminated by heating at 150° C. for 1 hour.

次に第2の金型で搬送用送り孔1aを半導体搭載部毎に
順次7づつ打ち抜き、搬送用送り孔1aを用いてTAB
テープの搬送ができるようにした。次に圧延銅箔上に感
光剤を塗り、搬送用送り孔1aを基準にして露光を行う
ことにより、各々独立した導通配線5及び搬送用送り孔
補強用帯6並びに搬送用送り孔補強用帯間隔変化防止横
桟7を形成した。
Next, using the second mold, seven transport holes 1a are sequentially punched out for each semiconductor mounting area, and TAB is performed using the transport holes 1a.
Made it possible to transport the tape. Next, by applying a photosensitive agent on the rolled copper foil and performing exposure with reference to the conveying spout hole 1a, the conductive wiring 5, the conveying spout hole reinforcing band 6, and the conveying spout hole reinforcing band are formed. Horizontal bars 7 for preventing interval changes are formed.

最後にTABテープを無電解錫メツキ浴に浸漬して、圧
延鋼箔上に0.5p m厚の錫メツキを被覆させた。
Finally, the TAB tape was immersed in an electroless tinning bath to coat the rolled steel foil with 0.5 pm thick tin plating.

(実施例2) 第2図(a)は本発明の実施例2を示す正面図、(b)
は同断面図である。
(Example 2) Figure 2 (a) is a front view showing Example 2 of the present invention, (b)
is the same sectional view.

本TABテープは、厚さ50μmのポリエステル製ベー
ステープ(絶縁性フィルム)8上にエポキシ系熱硬化型
接着剤2を塗布し、金型で半導体素子搭載用孔3と外部
接続用孔4を抜いたものに、35pm厚の圧延銅箔を張
り付け、この銅箔で、各々独立した導通配線5と、搬送
用送り孔補強並びにメツキ電流供給用帯9と、左右の搬
送用送り孔補強兼メツキ電流供給用帯9の間隔変化防止
兼メツキ電流供給用横桟10を形成している。また、本
実施例では、メツキ切断用孔11をも有している。
This TAB tape is made by applying an epoxy thermosetting adhesive 2 onto a polyester base tape (insulating film) 8 with a thickness of 50 μm, and punching holes 3 for mounting semiconductor elements and holes 4 for external connections using a mold. A rolled copper foil with a thickness of 35 pm is attached to the top, and this copper foil is used to connect the independent conductive wiring 5, the belt 9 for reinforcing the conveying perforation and plating current, and the reinforcing and plating current for the left and right conveying perforations. A horizontal bar 10 is formed for preventing changes in the interval of the supply band 9 and for supplying plating current. Further, in this embodiment, a plating cutting hole 11 is also provided.

次に実施例2のTABテープの製造方法を説明する。Next, a method for manufacturing the TAB tape of Example 2 will be explained.

まず50pm厚のポリエステル製ベーステープ8にエポ
キシ系熱硬化型接着剤2を全面塗布し、しかる後35m
m幅に裁断した。続いて第3の金型で半導体搭載用孔3
と外部接続用孔4を打ち抜き形成した。その後、抗張力
35.15Kg/ mm 2を有する35 pm厚の圧
延銅箔を35mm幅に裁断し、ベーステープと位置合わ
せして圧延ローラを通して貼付し、120℃で4時間加
熱することにより積層させた。
First, epoxy thermosetting adhesive 2 was applied to the entire surface of a 50 pm thick polyester base tape 8, and then 35 m
It was cut into m width. Next, use the third mold to make semiconductor mounting hole 3.
A hole 4 for external connection was punched out. Thereafter, a 35 pm thick rolled copper foil with a tensile strength of 35.15 Kg/mm2 was cut into a 35 mm width, aligned with the base tape, pasted through a rolling roller, and laminated by heating at 120 °C for 4 hours. .

次に第4の金型でベーステープ8に搬送用送り孔8aを
半導体搭載部毎に順次7づつ打ち抜き、搬送用送り孔8
aを用いてTABテープの搬送ができるようにした。次
に圧延銅箔上に感光剤を塗り、搬送用送り孔8aを基準
にして露光を行うことにより、各々接続した導通配線及
び搬送用送り孔補強兼メツキ電流供給用帯9並びに搬送
用送り孔補強用帯間隔変化防止兼メツキ電流供給用横桟
10を形成した。
Next, using a fourth mold, seven transport holes 8a are punched out in the base tape 8 for each semiconductor mounting area, and the transport holes 8a
TAB tape can be transported using a. Next, a photosensitive agent is applied onto the rolled copper foil, and exposure is performed using the conveyance feed hole 8a as a reference, thereby forming the connected conductive wiring, the conveyance feed hole reinforcing and plating current supply band 9, and the conveyance feed hole. A horizontal bar 10 for preventing changes in reinforcing band spacing and for supplying plating current was formed.

しかる後、TABテープを電解ニッケルメッキ浴及び金
メツキ浴に浸漬して、テープの端からメツキ電流供給用
帯9並びにメツキ電流供給用横桟IOに電流を流して、
圧延銅箔上に1.0μm厚のニッケルメッキ並びに0.
511℃厚の金メツキを被覆させた。
After that, the TAB tape is immersed in an electrolytic nickel plating bath and a gold plating bath, and a current is passed from the end of the tape to the plating current supply band 9 and the plating current supply horizontal bar IO,
1.0 μm thick nickel plating and 0.0 μm thick nickel plating on rolled copper foil.
It was coated with 511°C thick gold plating.

最後に第5の金型を用いて搬送用送り孔補強兼メツキ電
流供給用帯9並びに搬送用送り孔補強用帯間隔変化防止
兼メツキ電流供給用横桟10と導通配線間を切り放して
、各々独立した導通配線5を形成した。
Finally, using the fifth mold, the belt 9 for reinforcing the transporting sprocket and plating current supply, the horizontal bar 10 for preventing change in the belt interval for reinforcing the transporting sprocket and supplying plating current, and the conductive wiring are cut out, respectively. An independent conductive wiring 5 was formed.

〔発明の効果1 以上説明したように本発明は、TABテープの搬送用送
り孔周囲を銅箔で補強することにより、ベーステープの
厚さを薄くできるという効果がある。
[Advantageous Effects of the Invention 1] As explained above, the present invention has the effect that the thickness of the base tape can be reduced by reinforcing the periphery of the conveying feed hole of the TAB tape with copper foil.

しかも、搬送用送り孔周囲でのTABテープの総厚は、
従来のものと変わりがないという特徴がある。
Moreover, the total thickness of the TAB tape around the conveyance hole is
It has the characteristic that it is no different from the conventional one.

また、補強用鋼箔をメツキ電流供給配線としても使える
ので、特別にメツキ用配線を設ける必要もなく、TAB
テープの導体配線可能面積の有効活用が図れるという効
果がある。
In addition, since the reinforcing steel foil can also be used as plating current supply wiring, there is no need to provide special plating wiring, and TAB
This has the effect that the conductor wiring area of the tape can be effectively utilized.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)は本発明の実施例1を示す正面図、(b)
は第1図(a)のA−A ’線断面図、第2図(a)は
本発明の実施例2を示す正面図、(b)は第2図(a)
のB−B ’線断面図である。 1・・・ポリイミド製ベーステープ 2・・・エポキシ系熱硬化型接着剤 3・・・半導体搭載用孔   4・・・外部接続用孔5
・・・導通配線    6・・・搬送用送り孔補強用帯
7・・・帯間隔変化防止用横桟 8・・・ポリエステル製ベーステープ 9・・・搬送用送り孔補強兼メツキ電流供給用帯10・
・・帯間隔変化防止兼メツキ電流供給用横桟11・・・
メツキ切断用孔
FIG. 1(a) is a front view showing Embodiment 1 of the present invention, FIG. 1(b)
is a sectional view taken along the line A-A' in Fig. 1(a), Fig. 2(a) is a front view showing Embodiment 2 of the present invention, and Fig. 2(b) is a sectional view taken along line A-A' in Fig. 2(a).
It is a BB' line sectional view of. 1... Polyimide base tape 2... Epoxy thermosetting adhesive 3... Hole for semiconductor mounting 4... Hole for external connection 5
...Conductivity wiring 6...Band for reinforcing the feed hole for conveyance 7...Horizontal bar for preventing change in band interval 8...Polyester base tape 9...Band for reinforcing feed hole for conveyance and plating current supply 10・
・Horizontal bar 11 for preventing change in band spacing and supplying plating current...
Hole for plating cutting

Claims (1)

【特許請求の範囲】[Claims] (1)絶縁性フィルムと、金属箔とを有するTABテー
プの構造であって、 絶縁性フィルムは、その側縁に送り孔が一定ピッチで連
続的に設けられたものであり、 金属箔は、絶縁性フィルムの側縁に送り孔の部分を除い
て連続的に付着され、送り孔の開口縁を補強するもので
あることを特徴とするTABテープの構造。
(1) A TAB tape structure comprising an insulating film and a metal foil, where the insulating film has perforations continuously provided at a constant pitch on its side edges, and the metal foil is A structure of a TAB tape characterized in that it is continuously attached to the side edge of an insulating film except for the part of the perforation hole, and reinforces the opening edge of the perforation hole.
JP14030290A 1990-05-30 1990-05-30 Construction of tab tape Pending JPH0433350A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14030290A JPH0433350A (en) 1990-05-30 1990-05-30 Construction of tab tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14030290A JPH0433350A (en) 1990-05-30 1990-05-30 Construction of tab tape

Publications (1)

Publication Number Publication Date
JPH0433350A true JPH0433350A (en) 1992-02-04

Family

ID=15265627

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14030290A Pending JPH0433350A (en) 1990-05-30 1990-05-30 Construction of tab tape

Country Status (1)

Country Link
JP (1) JPH0433350A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010105732A (en) * 2000-05-17 2001-11-29 이중구 Metal Frame Assembly for IC card and method for manufacturing the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010105732A (en) * 2000-05-17 2001-11-29 이중구 Metal Frame Assembly for IC card and method for manufacturing the same

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