JPH04331742A - Glass composition for magnetic head - Google Patents
Glass composition for magnetic headInfo
- Publication number
- JPH04331742A JPH04331742A JP10071391A JP10071391A JPH04331742A JP H04331742 A JPH04331742 A JP H04331742A JP 10071391 A JP10071391 A JP 10071391A JP 10071391 A JP10071391 A JP 10071391A JP H04331742 A JPH04331742 A JP H04331742A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic head
- glass
- glass composition
- thin film
- magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 35
- 239000000203 mixture Substances 0.000 title claims abstract description 20
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 16
- KKCBUQHMOMHUOY-UHFFFAOYSA-N Na2O Inorganic materials [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 claims abstract description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 8
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 8
- FUJCRWPEOMXPAD-UHFFFAOYSA-N Li2O Inorganic materials [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 7
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 7
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 7
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 7
- XUCJHNOBJLKZNU-UHFFFAOYSA-M dilithium;hydroxide Chemical compound [Li+].[Li+].[OH-] XUCJHNOBJLKZNU-UHFFFAOYSA-M 0.000 claims abstract description 6
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims abstract description 4
- HTUMBQDCCIXGCV-UHFFFAOYSA-N lead oxide Chemical compound [O-2].[Pb+2] HTUMBQDCCIXGCV-UHFFFAOYSA-N 0.000 claims description 5
- YEXPOXQUZXUXJW-UHFFFAOYSA-N lead(II) oxide Inorganic materials [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 claims 1
- 239000010409 thin film Substances 0.000 description 12
- 229910021364 Al-Si alloy Inorganic materials 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 7
- 239000011162 core material Substances 0.000 description 6
- 229910000859 α-Fe Inorganic materials 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- GOLCXWYRSKYTSP-UHFFFAOYSA-N Arsenious Acid Chemical compound O1[As]2O[As]1O2 GOLCXWYRSKYTSP-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- NOTVAPJNGZMVSD-UHFFFAOYSA-N potassium monoxide Inorganic materials [K]O[K] NOTVAPJNGZMVSD-UHFFFAOYSA-N 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、一対のフェライトコア
の接合等に用いられる磁気ヘッド用ガラス組成物に関す
るものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a glass composition for magnetic heads used for bonding a pair of ferrite cores.
【０００２】0002
【従来の技術】近年、高抗磁力媒体に好適な磁気ヘッド
コア材としてはセンダスト又はアモルファス合金等の金
属材が検討されていたが、耐摩耗性、渦電流による高周
波特性の低下等の問題があり現在では、フェライト等の
金属酸化物磁性体基板上に、センダスト等の金属磁性体
をスパッタ等で成膜して得られるいわゆるＭＩＧ（Ｍｅ
ｔａｌ ｉｎ ｇａｐ）磁気ヘッドが検討され実用
化されている。[Prior Art] In recent years, metal materials such as sendust or amorphous alloys have been considered as magnetic head core materials suitable for high coercive force media, but they have problems such as wear resistance and deterioration of high frequency characteristics due to eddy currents. Currently, so-called MIG (Me
(tal in gap) magnetic heads have been studied and put into practical use.
【０００３】ＭＩＧ磁気ヘッドに用いられるフロントボ
ンディングガラスとして、被着材料であるフェライトや
Ｆｅ−Ａｌ−Ｓｉ系合金膜の磁気特性の劣化およびフェ
ライトとＦｅ−Ａｌ−Ｓｉ系合金薄膜の成分の相互拡散
による界面部の磁気特性の劣化を防止するため、ヘッド
製造工程での加熱温度は少なくとも７００℃以下とする
ことが要求されている。この要求に応えるため、例えば
特公昭５３−４３１６５号公報には次の組成からなるフ
ロントボンディングガラス用組成物が提案されている。[0003] As a front bonding glass used in a MIG magnetic head, deterioration of the magnetic properties of the ferrite or Fe-Al-Si alloy film that is the adherend material and mutual diffusion of the components of the ferrite and the Fe-Al-Si alloy thin film occur. In order to prevent the deterioration of the magnetic properties of the interface portion due to this, the heating temperature in the head manufacturing process is required to be at least 700° C. or lower. In order to meet this demand, for example, Japanese Patent Publication No. 53-43165 proposes a front bonding glass composition having the following composition.
【０００４】
ＳｉＯ２：３０〜４０（ｗｔ％）
Ｎａ２Ｏ：５〜７（ｗｔ％）
Ｋ２Ｏ：３〜５（ｗｔ％，但し３ｗｔ％を含まない。）
ＰｂＯ：４５〜５５（ｗｔ％，但し５５ｗｔ％を含まな
い。）
ＺｎＯ：４〜６（ｗｔ％）
Ａｓ２Ｏ３：０．１〜１（ｗｔ％）[0004] SiO2: 30 to 40 (wt%) Na2O: 5 to 7 (wt%) K2O: 3 to 5 (wt%, but not including 3 wt%)
PbO: 45 to 55 (wt%, but not including 55 wt%) ZnO: 4 to 6 (wt%) As2O3: 0.1 to 1 (wt%)
【０００５】[0005]
【発明が解決しようとする課題】しかしながら上記従来
の組成からなるフロントボンディングガラスでは、Ｆｅ
−Ａｌ−Ｓｉ系合金薄膜とボンデイングガラスが反応し
、数十ミクロンの反応層が形成され、その結果ボンディ
ングガラスにクレイズやクラックが発生し製造が難しく
作業性に問題を有するとともに、これらのクラックやク
レイズがＭＩＧ磁気ヘッドの高密度記録性を阻害すると
いう問題点を有していた。[Problems to be Solved by the Invention] However, in the front bonding glass having the above-mentioned conventional composition, Fe
-The Al-Si alloy thin film reacts with the bonding glass, forming a reaction layer of several tens of microns.As a result, crazes and cracks occur in the bonding glass, making it difficult to manufacture and causing problems in workability. There was a problem in that the craze hindered the high-density recording performance of the MIG magnetic head.
【０００６】本発明は上記従来の問題点を解決するもの
で、高密度記録特性や高信頼性に優れたＭＩＧ磁気ヘッ
ドの製造に好適な磁気ヘッド用ガラス組成物を提供する
ことを目的とする。The present invention solves the above-mentioned conventional problems, and aims to provide a glass composition for a magnetic head suitable for manufacturing an MIG magnetic head having excellent high-density recording characteristics and high reliability. .
【０００７】[0007]
【課題を解決するための手段】この目的を達成するため
に本発明の磁気ヘッド用ガラス組成物は、ＳｉＯ２：３
０〜４０（ｗｔ％）
ＰｂＯ：４０〜５５（ｗｔ％）
Ｌｉ２Ｏ：１〜２（ｗｔ％）
Ｎａ２Ｏ：５〜７（ｗｔ％）
Ｋ２Ｏ：２〜４（ｗｔ％）
Ｆｅ２Ｏ３：１〜５（ｗｔ％）
から構成される。[Means for Solving the Problems] In order to achieve this object, the glass composition for a magnetic head of the present invention is made of SiO2:3
0-40 (wt%) PbO: 40-55 (wt%) Li2O: 1-2 (wt%) Na2O: 5-7 (wt%) K2O: 2-4 (wt%) Fe2O3: 1-5 (wt%) %).
【０００８】ここで、Ｆｅ２Ｏ３は５ｗｔ％より多くな
ると、着色し光が透過しなくなるため加工寸法の測長が
困難になり、且つ結晶化し易くなるので好ましくなく、
１ｗｔ％より少ないと、Ｆｅ−Ａｌ−Ｓｉ系合金膜とガ
ラス間に於けるＦｅの濃度勾配が大きくなり反応層が発
生するために好ましくない。また、ＳｉＯ２は、３０ｗ
ｔ％より少なくすると化学的耐久性が劣化するので好ま
しくなく、また４０ｗｔ％より多くするとボンディング
温度が高くなるため作業上好ましくない。[0008] Here, if Fe2O3 exceeds 5 wt%, it is undesirable because it is colored and no longer transmits light, making it difficult to measure the processing dimensions and easily crystallizing.
If it is less than 1 wt%, the concentration gradient of Fe between the Fe-Al-Si alloy film and the glass becomes large and a reaction layer is generated, which is not preferable. Also, SiO2 is 30w
If it is less than t%, chemical durability deteriorates, which is not preferable, and if it exceeds 40wt%, the bonding temperature becomes high, which is not preferable in terms of work.
【０００９】ＰｂＯは、４０ｗｔ％より少なくするとボ
ンディング温度が高くなり、また５５ｗｔ％より多くす
ると化学的耐久性が劣化するため好ましくない。PbO is not preferable because if it is less than 40 wt %, the bonding temperature becomes high, and if it is more than 55 wt %, chemical durability deteriorates.
【００１０】更に、Ｌｉ２Ｏ，Ｎａ２Ｏ及びＫ２Ｏの３
成分を添加したが、これは、混合アルカリ効果により融
点を低下させると共に化学的耐久性を向上させる点から
加えたものである。また、３成分の組成範囲は、各成分
の組成範囲の最小値よりも小さくなるとボンディング温
度が高くなり、各成分の組成範囲の最大値よりも大きく
すると化学的耐久性が劣化するために好ましくない。Furthermore, 3 of Li2O, Na2O and K2O
This component was added to lower the melting point and improve chemical durability due to the mixed alkali effect. Furthermore, if the composition range of the three components is smaller than the minimum value of the composition range of each component, the bonding temperature will increase, and if it is larger than the maximum value of the composition range of each component, the chemical durability will deteriorate, which is undesirable. .
【００１１】[0011]
【作用】この構成によって、Ｆｅ−Ａｌ−Ｓｉ系合金薄
膜とボンディングガラスの反応を防止することができ、
その結果、ボンディングガラスにクレイズやクラックの
発生を抑制することができる。[Operation] With this configuration, it is possible to prevent the reaction between the Fe-Al-Si alloy thin film and the bonding glass,
As a result, the occurrence of crazes and cracks in the bonding glass can be suppressed.
【００１２】0012
【実施例】以下本発明の一実施例について、図面を参照
しながら説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.
【００１３】（実施例１〜３）二酸化珪素、酸化鉛、酸
化リチウム、酸化ナトリウム、酸化カリウム、酸化鉄を
（表１）に示す配合量で配合し、常法に従い焼成して試
験片を各１０枚作成した。この試験片を用い転移点、軟
化点、熱膨張係数をＪＩＳに準拠して測定した。その結
果を（表１）に示す。(Examples 1 to 3) Silicon dioxide, lead oxide, lithium oxide, sodium oxide, potassium oxide, and iron oxide were mixed in the amounts shown in (Table 1), and test pieces were prepared by firing according to a conventional method. I created 10 sheets. Using this test piece, the transition point, softening point, and coefficient of thermal expansion were measured in accordance with JIS. The results are shown in (Table 1).
【００１４】[0014]
【表１】[Table 1]
【００１５】次に、各実施例の磁気ヘッド用ガラス組成
物を用い、これらに酸化亜鉛、酸化ホウ素を（表２）に
示す量添加し、これを用いて図１に示すＭＩＧ磁気ヘッ
ドを作成した。Next, using the glass compositions for magnetic heads of each example, zinc oxide and boron oxide were added in the amounts shown in Table 2, and the MIG magnetic head shown in FIG. 1 was created using this. did.
【００１６】図１は本発明のＭＩＧ磁気ヘッドの外観斜
視図である。１，２はフェライトコア、３はフェライト
コア１のギャップ対向面にスパッタリング法等薄膜技術
により形成されたＦｅ−Ａｌ−Ｓｉ系合金磁性薄膜、４
はスパッタリング法等により形成されたガラス薄膜、５
はフロントボンディングガラスである。FIG. 1 is an external perspective view of the MIG magnetic head of the present invention. 1 and 2 are ferrite cores, 3 is a Fe-Al-Si alloy magnetic thin film formed on the gap-opposing surface of the ferrite core 1 by thin film technology such as sputtering, and 4
5 is a glass thin film formed by sputtering method etc.
is the front bonding glass.
【００１７】以上のように構成されたＭＩＧ磁気ヘッド
について、以下その製造方法を工程図により説明する。A method of manufacturing the MIG magnetic head constructed as described above will be explained below with reference to process diagrams.
【００１８】図２乃至図５はＭＩＧ磁気ヘッドの製造工
程図である。図２に示すように、熱膨張係数が１１５×
１０−７℃−１のＭｎ−Ｚｎフェライトコア１，２の少
なくとも一方のコア１に図３に示すようにＦｅ−Ａｌ−
Ｓｉ系合金磁性薄膜３をスパッタリングにより膜付けす
る。
次に図４に示すように磁気間隙を構成する面に、石英ガ
ラスをスパッタリングにより付着させ、その上に（表２
）で示すガラスをスパッタリングにより付着させ所定の
膜厚のガラス薄膜４を形成する。その後、図５に示すよ
うに二つのフェライトコア１，２を重ね合わせ圧力を５
０Ｋｇ／ｃｍ２ 加えた後、スパッタガラス４より低融
点のフロントボンディングガラス５を挿入して、電気炉
にて５５０℃〜６５０℃の温度で加熱した。このように
してギャップ形成せしめた後、所定のラップ加工を施し
た。FIGS. 2 to 5 are manufacturing process diagrams of the MIG magnetic head. As shown in Figure 2, the thermal expansion coefficient is 115×
As shown in FIG. 3, Fe-Al-
A Si-based alloy magnetic thin film 3 is deposited by sputtering. Next, as shown in FIG.
) is deposited by sputtering to form a glass thin film 4 having a predetermined thickness. Then, as shown in Fig. 5, two ferrite cores 1 and 2 are stacked together and a pressure of 5
After adding 0 kg/cm2, a front bonding glass 5 having a lower melting point than the sputtering glass 4 was inserted and heated in an electric furnace at a temperature of 550°C to 650°C. After forming the gap in this manner, a predetermined lapping process was performed.
【００１９】次いで、各試料を用い転移点と熱膨張係数
を測定した。その結果を（表２）に示す。Next, the transition point and thermal expansion coefficient of each sample were measured. The results are shown in (Table 2).
【００２０】[0020]
【表２】[Table 2]
【００２１】本実施例にて作製した磁気ヘッドにおいて
、ボンディング作業温度が、フロントボンディングガラ
スの粘度で１０３．５ ポイズから１０４．５ ポイズ
となる温度で処理したものについて、そのガラスとＦｅ
−Ａｌ−Ｓｉ系合金膜の反応状況を偏光顕微鏡により観
察した結果を図６に図示した。図６からわかるようにフ
ロントボンディングガラス５とＦｅ−Ａｌ−Ｓｉ系合金
薄膜３の界面には反応層はできず、ガラスにクレイズや
クラックは発生しなかった。In the magnetic head manufactured in this example, the bonding temperature was such that the viscosity of the front bonding glass ranged from 103.5 poise to 104.5 poise.
The results of observing the reaction status of the -Al-Si alloy film using a polarizing microscope are shown in FIG. As can be seen from FIG. 6, no reaction layer was formed at the interface between the front bonding glass 5 and the Fe-Al-Si alloy thin film 3, and no crazes or cracks were generated in the glass.
【００２２】（比較例４〜６）従来使用されている（表
２）に示す磁気ヘッド用ガラス組成物を用い、実施例１
と同様にしてＭＩＧ磁気ヘッドを作成し、次いで実施例
１と同様にして、転移点と熱膨張係数を測定した。その
結果を（表２）に示す。(Comparative Examples 4 to 6) Using the conventionally used glass compositions for magnetic heads shown in Table 2, Example 1
A MIG magnetic head was prepared in the same manner as in Example 1, and then the transition point and coefficient of thermal expansion were measured in the same manner as in Example 1. The results are shown in (Table 2).
【００２３】次に、実施例１と同一の条件でガラスとＦ
ｅ−Ａｌ−Ｓｉ系合金膜の反応状況を偏光顕微鏡により
観察した結果を図７に示した。Next, under the same conditions as in Example 1, glass and F
FIG. 7 shows the results of observing the reaction status of the e-Al-Si alloy film using a polarizing microscope.
【００２４】図７からわかるようにフロントボンディン
グガラス５とＦｅ−Ａｌ−Ｓｉ系合金膜３の界面に反応
層が数十μｍでき、ガラスにクラック等が発生していた
。As can be seen from FIG. 7, a reaction layer of several tens of micrometers was formed at the interface between the front bonding glass 5 and the Fe--Al--Si alloy film 3, and cracks and the like were generated in the glass.
【００２５】[0025]
【発明の効果】以上のように本発明は、ＳｉＯ２，Ｐｂ
Ｏ，Ｌｉ２Ｏ，Ｎａ２Ｏ，Ｋ２Ｏを主成分とし、Ｆｅ２
Ｏ３を所定量を配合した組成物からなるので、Ｆｅ−Ａ
ｌ−Ｓｉ系合金薄膜とガラスの間に反応層が出来ず、高
記録密度、高信頼性に優れ、かつ、量産性に適した磁気
ヘッド用ガラス組成物を実現できるものである。Effects of the Invention As described above, the present invention provides SiO2, Pb
The main components are O, Li2O, Na2O, K2O, and Fe2
Since it is composed of a composition containing a predetermined amount of O3, Fe-A
It is possible to realize a glass composition for a magnetic head that does not form a reaction layer between the l-Si alloy thin film and the glass, has high recording density, excellent reliability, and is suitable for mass production.
【図１】本発明の磁気ヘッド用ガラス組成物を用いたＭ
ＩＧ磁気ヘッドの外観斜視図FIG. 1: M using the glass composition for a magnetic head of the present invention
External perspective view of IG magnetic head
【図２】本発明の磁気ヘッドの製造工程図[Fig. 2] Manufacturing process diagram of the magnetic head of the present invention
【図３】本発
明の磁気ヘッドの製造工程図[Fig. 3] Manufacturing process diagram of the magnetic head of the present invention
【図４】本発明の磁気ヘッ
ドの製造工程図[Fig. 4] Manufacturing process diagram of the magnetic head of the present invention
【図５】本発明の磁気ヘッドの製造工程
図[Fig. 5] Manufacturing process diagram of the magnetic head of the present invention
【図６】本発明の一実施例の磁気ヘッドのギャップ部
の偏光顕微鏡観察図[Fig. 6] Polarizing microscope observation diagram of a gap portion of a magnetic head according to an embodiment of the present invention.
【図７】比較例のガラスでボンディングを行った磁気ヘ
ッドのギャップ部の偏光顕微鏡観察図[Figure 7] Polarizing microscope observation of the gap part of a magnetic head bonded with glass in a comparative example
１，２ コア ３ Ｆｅ−Ａｌ−Ｓｉ系合金薄膜 ４ ガラス薄膜 ５ フロントボンディングガラス ６ 反応層 1, 2 core 3 Fe-Al-Si alloy thin film 4 Glass thin film 5 Front bonding glass 6 Reaction layer
Claims (2)
Ｋ２Ｏを主成分とする磁気ヘッド用ガラス組成物であっ
て、Ｆｅ２Ｏ３が前記組成物中に１〜５重量％添加され
ていることを特徴とする磁気ヘッド用ガラス組成物。Claim 1: SiO2, PbO, Li2O, Na2O,
1. A glass composition for a magnetic head containing K2O as a main component, characterized in that 1 to 5% by weight of Fe2O3 is added to the composition.
が４０〜５５、Ｌｉ２Ｏが１〜２、Ｎａ２Ｏが５〜７、
Ｋ２Ｏが２〜４からなることを特徴とする請求項１記載
の磁気ヘッド用ガラス組成物。Claim 2: SiO2 is 30-40% by weight, PbO
is 40-55, Li2O is 1-2, Na2O is 5-7,
The glass composition for a magnetic head according to claim 1, characterized in that K2O consists of 2 to 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10071391A JPH04331742A (en) | 1991-05-02 | 1991-05-02 | Glass composition for magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10071391A JPH04331742A (en) | 1991-05-02 | 1991-05-02 | Glass composition for magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04331742A true JPH04331742A (en) | 1992-11-19 |
Family
ID=14281302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10071391A Pending JPH04331742A (en) | 1991-05-02 | 1991-05-02 | Glass composition for magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04331742A (en) |
-
1991
- 1991-05-02 JP JP10071391A patent/JPH04331742A/en active Pending
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