JPH04331232A - Polyamic acid resin composition for flexible printed board - Google Patents
Polyamic acid resin composition for flexible printed boardInfo
- Publication number
- JPH04331232A JPH04331232A JP19131591A JP19131591A JPH04331232A JP H04331232 A JPH04331232 A JP H04331232A JP 19131591 A JP19131591 A JP 19131591A JP 19131591 A JP19131591 A JP 19131591A JP H04331232 A JPH04331232 A JP H04331232A
- Authority
- JP
- Japan
- Prior art keywords
- component
- mol
- dianhydride
- resin composition
- polyamic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011342 resin composition Substances 0.000 title claims abstract description 12
- 229920005575 poly(amic acid) Polymers 0.000 title claims abstract description 10
- 150000004984 aromatic diamines Chemical class 0.000 claims abstract description 11
- 150000004985 diamines Chemical class 0.000 claims abstract description 9
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 claims abstract description 8
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 claims abstract description 8
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 claims abstract description 5
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 claims abstract description 3
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000002253 acid Substances 0.000 claims description 8
- 239000000203 mixture Substances 0.000 abstract description 4
- 125000003118 aryl group Chemical group 0.000 abstract description 3
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 abstract description 2
- 125000003545 alkoxy group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- -1 carboxylic acid dianhydride Chemical class 0.000 abstract 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 abstract 1
- 229920001721 polyimide Polymers 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 239000000758 substrate Substances 0.000 description 11
- 239000004642 Polyimide Substances 0.000 description 10
- 239000011888 foil Substances 0.000 description 10
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000011889 copper foil Substances 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 2
- ZGDMDBHLKNQPSD-UHFFFAOYSA-N 2-amino-5-(4-amino-3-hydroxyphenyl)phenol Chemical group C1=C(O)C(N)=CC=C1C1=CC=C(N)C(O)=C1 ZGDMDBHLKNQPSD-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical group C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- NUIURNJTPRWVAP-UHFFFAOYSA-N 3,3'-Dimethylbenzidine Chemical group C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 NUIURNJTPRWVAP-UHFFFAOYSA-N 0.000 description 1
- DTHBNESGKSGIFM-UHFFFAOYSA-N 3-amino-6-(4-aminophenyl)benzene-1,2-diol Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C(O)=C1O DTHBNESGKSGIFM-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical group C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、フレキシブルプリント
基板用ポリイミドまたはポリアミック酸樹脂組成物に関
するものであり、さらに詳しくは、2種または3種の芳
香族テトラカルボン酸二無水物と3種の芳香族ジアミン
成分とからなるフレキシブルプリント基板用ポリアミッ
ク酸樹脂組成物に関するものである。[Field of Industrial Application] The present invention relates to a polyimide or polyamic acid resin composition for flexible printed circuit boards. The present invention relates to a polyamic acid resin composition for flexible printed circuit boards comprising a group diamine component.
【0002】0002
【従来の技術】ポリイミドは高耐熱性ポリマーとして広
く知られているが、その分子骨格が剛直なために成形性
に欠点があった。また、近年の電子、電気工業の発展に
伴い、通信用、民生用機器の実装方式は、軽量で立体的
に実装できるフレキシブルプリント回路基板が広く使用
されている。このフレキシブルプリント回路基板には現
在広くポリイミドフィルムが使用されている。この場合
、ポリイミドフィルムに要求される性能として耐熱性、
金属箔との接着力、金属箔との熱膨張係数の一致、電気
絶縁性などがある。これまでに種々のポリイミドが開発
されているが、耐熱性に優れるものは金属との接着力が
劣り、一方、接着力に優れるものは、熱膨張係数が金属
箔と比べると大きく、基板にカールを生じるなどの欠点
があった。BACKGROUND OF THE INVENTION Polyimide is widely known as a highly heat-resistant polymer, but has a drawback in moldability due to its rigid molecular skeleton. Furthermore, with the recent development of the electronic and electrical industries, flexible printed circuit boards, which are lightweight and can be mounted three-dimensionally, have been widely used as a mounting method for communication and consumer equipment. Polyimide films are currently widely used in flexible printed circuit boards. In this case, the performance required of the polyimide film is heat resistance,
These include adhesive strength with metal foil, matching thermal expansion coefficient with metal foil, and electrical insulation. Various polyimides have been developed so far, but those with excellent heat resistance have poor adhesion to metals, while those with excellent adhesion have a higher coefficient of thermal expansion than metal foils and tend to curl on the substrate. There were drawbacks such as the occurrence of
【0003】0003
【発明が解決しようとする課題】本発明は、耐熱性、金
属箔との接着力に優れ、さらに熱膨張係数の値が金属箔
の値に近いポリイミドまたはポリアミック酸樹脂を得よ
うとして研究した結果得られたものである。[Problems to be Solved by the Invention] The present invention is the result of research aimed at obtaining a polyimide or polyamic acid resin that has excellent heat resistance and adhesive strength with metal foil, and has a coefficient of thermal expansion close to that of metal foil. This is what was obtained.
【0004】0004
【課題を解決するための手段】本発明は、3,3’,4
,4’−ビフェニルテトラカルボン酸二無水物(以下B
PDAと略す)を必須成分とし、3,3’,4,4’−
ベンゾフェノンテトラカルボン酸二無水物(以下BTD
Aと略す)および/またはビス(3,4−ジカルボキシ
フェニル)エーテル二無水物(以下ODPAと略す)を
0〜50モル%含むカルボン酸二無水物成分と、一般式
(I)[Means for Solving the Problems] The present invention provides 3, 3', 4
, 4'-biphenyltetracarboxylic dianhydride (hereinafter referred to as B
(abbreviated as PDA) is an essential component, and 3,3',4,4'-
Benzophenone tetracarboxylic dianhydride (hereinafter referred to as BTD)
A carboxylic dianhydride component containing 0 to 50 mol% of bis(3,4-dicarboxyphenyl)ether dianhydride (hereinafter abbreviated as ODPA); and general formula (I)
【0005】[0005]
【化2】[Case 2]
【0006】で表される芳香族ジアミン、p−フェニレ
ンジアミン(以下PPDと略す)および1,3−ビス(
3−アミノフェノキシ)ベンゼン(以下APBと略す)
からなる芳香族ジアミン成分とを酸成分とジアミン成分
のモル比0.9〜1.1で反応させたポリアミック酸樹
脂組成物に関するものである。Aromatic diamines represented by: p-phenylenediamine (hereinafter abbreviated as PPD) and 1,3-bis(
3-aminophenoxy)benzene (hereinafter abbreviated as APB)
The present invention relates to a polyamic acid resin composition in which an aromatic diamine component consisting of the following is reacted at a molar ratio of acid component to diamine component of 0.9 to 1.1.
【0007】[0007]
【作用】本発明において用いられるポリアミック酸溶液
は、N−メチル−2−ピロリドン、(以下NMPと略す
)、ジメチルアセトアミド、ジメチルホルムアミド、ク
レゾール等の溶媒中で、芳香族テトラカルボン酸二無水
物成分と芳香族ジアミン成分とを攪拌することにより得
ることができる。[Operation] The polyamic acid solution used in the present invention is prepared by preparing an aromatic tetracarboxylic dianhydride component in a solvent such as N-methyl-2-pyrrolidone (hereinafter abbreviated as NMP), dimethylacetamide, dimethylformamide, or cresol. and an aromatic diamine component.
【0008】芳香族テトラカルボン酸二無水物成分と芳
香族ジアミン成分のモル比は、0.90〜1.10が好
ましく、さらに好ましくは0.97〜0.99である。
酸成分とアミン成分のモル比が上述の範囲を外れると、
生成するポリイミドの分子量が小さくなり生成物の物性
が低下する。特に耐熱性を考慮する場合はジアミン成分
過剰で反応する方が望ましい。The molar ratio of the aromatic tetracarboxylic dianhydride component to the aromatic diamine component is preferably 0.90 to 1.10, more preferably 0.97 to 0.99. When the molar ratio of the acid component and the amine component is out of the above range,
The molecular weight of the polyimide produced decreases, and the physical properties of the product deteriorate. Especially when considering heat resistance, it is preferable to react with an excess of the diamine component.
【0009】本発明のポリイミド中で用いられる酸成分
としては、BPDA、BTDA、ODPAなどがある。
BPDAのモル含量は酸成分中の50モル%以上が好ま
しく、特に好ましくは70〜80モル%である。[0009] Acid components used in the polyimide of the present invention include BPDA, BTDA, and ODPA. The molar content of BPDA in the acid component is preferably 50 mol% or more, particularly preferably 70 to 80 mol%.
【0010】BTDAとODPAのモル比は、100:
0〜0:100の範囲で任意に使用することができるが
、90:10〜50:50が好ましく、特に好ましくは
80:20〜70:30である。BPDAを必須成分と
して合成される樹脂組成物は、BTDA、ODPAと共
重合体にすることにより、接着性をさらに向上させるこ
とができる。[0010] The molar ratio of BTDA and ODPA is 100:
It can be used arbitrarily within the range of 0 to 0:100, but preferably 90:10 to 50:50, particularly preferably 80:20 to 70:30. A resin composition synthesized using BPDA as an essential component can further improve adhesiveness by making it a copolymer with BTDA and ODPA.
【0011】一般式(I)で表される芳香族ジアミンと
しては、4,4’−ジアミノビフェニル、3,3’−ジ
メチル−4,4’−ジアミノビフェニル、3,3’−ジ
メトキシ−4,4’−ジアミノビフェニル、3,3’−
ジヒドロキシ−4,4’−ジアミノビフェニルなどがあ
る。一般式(I)で示される成分の全芳香族ジアミン中
における割合は10〜60モル%が好ましく、特に30
〜50モル%が好ましい。一般式(I)で表される芳香
族ジアミンの割合が10モル%以下では、熱膨張係数の
値が大きくなってしまう。反対に60モル%以上では、
フィルムとした際に脆くなる。Aromatic diamines represented by general formula (I) include 4,4'-diaminobiphenyl, 3,3'-dimethyl-4,4'-diaminobiphenyl, 3,3'-dimethoxy-4, 4'-diaminobiphenyl, 3,3'-
Examples include dihydroxy-4,4'-diaminobiphenyl. The proportion of the component represented by general formula (I) in the wholly aromatic diamine is preferably 10 to 60 mol%, particularly 30 to 60 mol%.
~50 mol% is preferred. If the proportion of the aromatic diamine represented by the general formula (I) is 10 mol % or less, the value of the thermal expansion coefficient becomes large. On the other hand, at 60 mol% or more,
It becomes brittle when made into a film.
【0012】同様にPPDの割合は20〜80モル%が
好ましく、特に30〜70モル%が好ましい。20モル
%以下では熱膨張係数の値が大きくなってしまい、反対
に80モル%以上では、金属箔との接着力が低下する。Similarly, the proportion of PPD is preferably 20 to 80 mol%, particularly preferably 30 to 70 mol%. If it is less than 20 mol %, the value of the coefficient of thermal expansion will become large, and on the contrary, if it is more than 80 mol %, the adhesive force with the metal foil will decrease.
【0013】また、APBの割合は5〜30モル%が好
ましく、特に5〜20モル%が好ましい。APBを添加
することにより、金属箔との接着力を向上させることが
できる。しかし、30モル%以上添加すると熱膨張係数
の値が大きくなってしまう。[0013] The proportion of APB is preferably 5 to 30 mol%, particularly preferably 5 to 20 mol%. By adding APB, the adhesive strength with metal foil can be improved. However, if 30 mol% or more is added, the value of the thermal expansion coefficient becomes large.
【0014】本発明のポリイミドまたはポリアミック酸
樹脂組成物は、銅箔、アルミニウム箔等の金属箔へ塗布
し、これを乾燥硬化させることによりプリント回路基板
を得ることができる。また、ガラスクロス等の基板に含
浸してプリプレグとすることも可能である。[0014] The polyimide or polyamic acid resin composition of the present invention can be applied to a metal foil such as copper foil or aluminum foil, and a printed circuit board can be obtained by drying and curing it. It is also possible to impregnate a substrate such as glass cloth to prepare a prepreg.
【0015】これら基材に塗布した樹脂組成物の乾燥温
度は、通常80〜380℃であり、この温度範囲で10
〜180分間加熱することによって、プリント回路基板
を得ることが出来る。The drying temperature of the resin composition applied to these substrates is usually 80 to 380°C, and within this temperature range 10
A printed circuit board can be obtained by heating for ~180 minutes.
【0016】本発明の樹脂組成物は、金属とポリイミド
等のプラスチックの接着に用いることもでき、また、金
属同志、プラスチック同志の接着性にも優れている。ま
た、耐熱性に優れていることから、接着層を持たないポ
リイミドと金属箔とから構成される2層のフレキシブル
プリント回路基板のポリイミド側同志を貼り合わせるこ
とにより、その両面板を得ることも出来る。さらに銅箔
同志を貼合わせることによっても両面フレキシブルプリ
ント回路基板を得ることが出来る。また、高耐熱性のフ
ィルムカバーコート用の接着剤としても用いることが出
来る。The resin composition of the present invention can also be used for adhering metals to plastics such as polyimide, and also has excellent adhesion between metals and between plastics. In addition, due to its excellent heat resistance, a double-sided board can be obtained by bonding the polyimide sides of two-layer flexible printed circuit boards made of polyimide and metal foil without an adhesive layer. . Furthermore, a double-sided flexible printed circuit board can also be obtained by bonding copper foils together. It can also be used as an adhesive for highly heat-resistant film cover coats.
【0017】[0017]
(実施例1)攪拌機、温度計、窒素導入管、還流冷却管
を備えた4ツ口フラスコヘジアミン成分として、3,3
’−ジヒドロキシ−4,4’−ジアミノビフェニル8.
65g(0.04モル)、PPD4.33g(0.04
モル)、APB5.88g(0.02モル)を加え、N
MPを100g添加し、窒素気流下、室温で充分に攪拌
し、ジアミン成分を溶解した。(Example 1) A 4-necked flask equipped with a stirrer, a thermometer, a nitrogen inlet tube, and a reflux condenser.As a hediamine component, 3,3
'-dihydroxy-4,4'-diaminobiphenyl8.
65g (0.04mol), PPD4.33g (0.04mol)
mol), add 5.88 g (0.02 mol) of APB, and add N
100 g of MP was added and thoroughly stirred at room temperature under a nitrogen stream to dissolve the diamine component.
【0018】次いで、BPDA20.18g(0.07
モル)、BTDA9.47g(0.03モル)を徐々に
添加し、NMPを75g加え、室温で4時間撹拌した。
ここへエタノール75gを加え、さらに1時間攪拌した
。得られた溶液の還元粘度(樹脂0.5gを100ml
のNMPへ溶解し、30℃の恒温槽中で測定)は0.5
であった。Next, BPDA20.18g (0.07
9.47 g (0.03 mol) of BTDA were gradually added thereto, 75 g of NMP was added, and the mixture was stirred at room temperature for 4 hours. 75 g of ethanol was added thereto, and the mixture was further stirred for 1 hour. Reduced viscosity of the obtained solution (0.5 g of resin in 100 ml
(dissolved in NMP and measured in a constant temperature bath at 30°C) is 0.5
Met.
【0019】この樹脂溶液を乾燥後の厚みが25μmに
なる様に厚さ35μmの銅箔上へ塗布し、100℃/1
時間、350℃/1時間乾燥し、フレキシブル基板を得
た。This resin solution was applied onto a 35 μm thick copper foil so that the thickness after drying would be 25 μm, and heated at 100° C./1.
The substrate was dried at 350° C. for 1 hour to obtain a flexible substrate.
【0020】(実施例2)ジアミン成分として、3,3
’−ジメトキシ−4,4’−ジアミノビフェニル9.7
7g(0.04モル)、PPD4.33g(0.04モ
ル)、APB5.88g(0.02モル)、酸成分とし
て、BPDA20.18g(0.07モル)、ODPA
9.12g(0.03モル)を用い、実施例1と同様の
装置および方法でフレキシブル基板を得た。(Example 2) As the diamine component, 3,3
'-Dimethoxy-4,4'-diaminobiphenyl9.7
7g (0.04 mol), PPD 4.33 g (0.04 mol), APB 5.88 g (0.02 mol), BPDA 20.18 g (0.07 mol), ODPA as acid components
A flexible substrate was obtained using the same apparatus and method as in Example 1 using 9.12 g (0.03 mol).
【0021】(比較例1)ジアミン成分として、3,3
’−ジヒドロキシ−4,4’−ジアミノビフェニル10
.81g(0.05モル)、APB14.62g(0.
05モル)、酸成分として、BPDA20.18g(0
.07モル)、BTDA9.47g(0.03モル)を
用い、実施例1と同様の装置および方法でフレキシブル
基板を得た。(Comparative Example 1) As the diamine component, 3,3
'-dihydroxy-4,4'-diaminobiphenyl 10
.. 81g (0.05 mol), APB14.62g (0.05 mol).
05 mol), 20.18 g of BPDA (0.05 mol) as an acid component.
.. A flexible substrate was obtained using the same apparatus and method as in Example 1 using 9.47 g (0.03 mol) of BTDA.
【0022】(比較例2)ジアミン成分として、3,3
’−ジヒドロキシ−4,4’−ジアミノビフェニル8.
65g(0.04モル)、PPD4.33g(0.04
モル)、APB5.88g(0.02モル)、酸成分と
して、BTDA22.56g(0.07モル)、ODP
A9.12g(0.03モル)を用い、実施例1と同様
の装置および方法でフレキシブル基板を得た。(Comparative Example 2) As the diamine component, 3,3
'-dihydroxy-4,4'-diaminobiphenyl8.
65g (0.04mol), PPD4.33g (0.04mol)
mol), APB 5.88 g (0.02 mol), acid component: BTDA 22.56 g (0.07 mol), ODP
A flexible substrate was obtained using the same apparatus and method as in Example 1 using 9.12 g (0.03 mol) of A.
【0023】以上、実施例1、2及び比較例1、2で得
られたフレキシブル基板及びそのフィルムを評価した結
果を表1に示す。Table 1 shows the results of evaluating the flexible substrates and films thereof obtained in Examples 1 and 2 and Comparative Examples 1 and 2.
【0024】[0024]
【表1】[Table 1]
【0025】実施例の樹脂組成物を用いたフレキシブル
基板は比較例と比べ、ピール強度、熱膨張係数にバラン
スのとれた優れた値を示した。[0025] The flexible substrate using the resin composition of the example exhibited excellent, well-balanced peel strength and coefficient of thermal expansion compared to the comparative example.
【0026】[0026]
【発明の効果】本発明により得られたポリアミック酸樹
脂組成物を用いて作成したフレキシブル基板は、従来の
ポリイミド樹脂を用いたものに比べ、接着性、寸法安定
性、耐熱性のすべてにおいて優れた特性を有していた。[Effects of the Invention] Flexible substrates made using the polyamic acid resin composition obtained by the present invention have superior adhesiveness, dimensional stability, and heat resistance compared to those using conventional polyimide resins. It had characteristics.
Claims (1)
ラカルボン酸二無水物を必須成分とし、3,3’,4,
4’−ベンゾフェノンテトラカルボン酸二無水物および
/またはビス(3,4−ジカルボキシフェニル)エーテ
ル二無水物を0〜50モル%含むカルボン酸二無水物成
分と、一般式(I) 【化1】 で表される芳香族ジアミン、p−フェニレンジアミンお
よび1,3−ビス(3−アミノフェノキシ)ベンゼンか
らなる芳香族ジアミン成分とを酸成分とジアミン成分の
モル比0.9〜1.1で反応させたポリアミック酸樹脂
組成物。Claim 1: 3,3',4,4'-biphenyltetracarboxylic dianhydride as an essential component;
A carboxylic dianhydride component containing 0 to 50 mol% of 4'-benzophenonetetracarboxylic dianhydride and/or bis(3,4-dicarboxyphenyl)ether dianhydride, and general formula (I) ] An aromatic diamine component consisting of an aromatic diamine represented by p-phenylenediamine and 1,3-bis(3-aminophenoxy)benzene at a molar ratio of acid component to diamine component of 0.9 to 1.1. A reacted polyamic acid resin composition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3191315A JP2977958B2 (en) | 1991-04-30 | 1991-04-30 | Polyamic acid resin for flexible printed circuit boards |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3191315A JP2977958B2 (en) | 1991-04-30 | 1991-04-30 | Polyamic acid resin for flexible printed circuit boards |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04331232A true JPH04331232A (en) | 1992-11-19 |
JP2977958B2 JP2977958B2 (en) | 1999-11-15 |
Family
ID=16272517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3191315A Expired - Fee Related JP2977958B2 (en) | 1991-04-30 | 1991-04-30 | Polyamic acid resin for flexible printed circuit boards |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2977958B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006272626A (en) * | 2005-03-28 | 2006-10-12 | Nippon Steel Chem Co Ltd | Method for manufacturing flexible laminated substrate |
-
1991
- 1991-04-30 JP JP3191315A patent/JP2977958B2/en not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006272626A (en) * | 2005-03-28 | 2006-10-12 | Nippon Steel Chem Co Ltd | Method for manufacturing flexible laminated substrate |
JP4577833B2 (en) * | 2005-03-28 | 2010-11-10 | 新日鐵化学株式会社 | Method for manufacturing flexible laminated substrate |
Also Published As
Publication number | Publication date |
---|---|
JP2977958B2 (en) | 1999-11-15 |
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