JPH0432764Y2 - - Google Patents
Info
- Publication number
- JPH0432764Y2 JPH0432764Y2 JP1985058470U JP5847085U JPH0432764Y2 JP H0432764 Y2 JPH0432764 Y2 JP H0432764Y2 JP 1985058470 U JP1985058470 U JP 1985058470U JP 5847085 U JP5847085 U JP 5847085U JP H0432764 Y2 JPH0432764 Y2 JP H0432764Y2
- Authority
- JP
- Japan
- Prior art keywords
- infrared
- soft metal
- detection device
- integrated
- infrared detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001514 detection method Methods 0.000 claims description 15
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 229910052753 mercury Inorganic materials 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 11
- 229910052710 silicon Inorganic materials 0.000 description 11
- 239000010703 silicon Substances 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 6
- 239000011651 chromium Substances 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- KZUJUDQRJCCDCM-UHFFFAOYSA-N indium mercury Chemical compound [In].[Hg] KZUJUDQRJCCDCM-UHFFFAOYSA-N 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Description
【考案の詳細な説明】
本考案は赤外線検知装置とくに赤外線検知素子
と該検知素子の出力信号処理用の回路とを一体化
した赤外線検知装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an infrared detection device, and particularly to an infrared detection device that integrates an infrared detection element and a circuit for processing an output signal of the detection element.
半導体赤外線検知素子の構成材料としては通常
狭いエネルギー間隙を有する多元半導体、たとえ
ばアンチモン化インジウム(InSb)や水銀−カ
ドミウム−テルル(Hgl−xCdxTe)が用いられ
る。これらの多元半導体は一般に物理化学的性質
および電気的性質がシリコン(Si)と著しく異な
つているので、同一の多元半導体基板に赤外線検
知素子とその周辺の回路素子(たとえばトランジ
スタ、抵抗等)とを集積することは困難である。
一方1枚のシリコン基板内に光電変換素子とトラ
ンジスタ等とを集積した光電変換装置はすでに周
知であるが、シリコンはエネルギー間隙が広いた
め上記光電変換装置は中間赤外線またはそれ以上
の長波長の輻射に対しては感度がない。 Multicomponent semiconductors having a narrow energy gap, such as indium antimonide (InSb) and mercury-cadmium-tellurium (Hgl-xCdxTe), are usually used as constituent materials for semiconductor infrared sensing elements. These multi-component semiconductors generally have significantly different physicochemical and electrical properties from silicon (Si), so infrared sensing elements and peripheral circuit elements (e.g. transistors, resistors, etc.) can be placed on the same multi-component semiconductor substrate. It is difficult to accumulate.
On the other hand, a photoelectric conversion device in which a photoelectric conversion element, a transistor, etc. are integrated in a single silicon substrate is already well-known, but because silicon has a wide energy gap, the photoelectric conversion device uses mid-infrared radiation or longer wavelength radiation. There is no sensitivity to
赤外線検知素子と外部回路とをできるだけ緊密
に実装する試みとして、実公昭52−15737号によ
り、赤外線検知素子を収容する冷却器内に集積回
路素子を固着し、冷却器内部で赤外線検知素子と
結線を行なつた構造の赤外線検知装置が提案され
た。しかしながらこの検知装置は液体冷媒により
冷却する型またはジユール・トムソン効果を利用
して冷却する型の赤外線検知装置を対象としてい
て、冷媒容器を有していない赤外線検知装置には
適用困難である。 In an attempt to mount an infrared sensing element and an external circuit as closely as possible, according to Utility Model Publication No. 15737/1987, an integrated circuit element was fixed inside a cooler housing an infrared sensing element, and wired to the infrared sensing element inside the cooler. An infrared detection device with a structure that performs the following has been proposed. However, this detection device is intended for infrared detection devices of a type that is cooled with a liquid refrigerant or a type that is cooled using the Juul-Thompson effect, and is difficult to apply to an infrared detection device that does not have a refrigerant container.
本考案は前述の点に鑑みなされたもので、赤外
線検知素子と信号処理用の半導体回路基板とにそ
れぞれ軟金属層を形成したおき、両者を重ね該軟
金属層を介して両者を固着して一体化した新規な
赤外線検知装置を提供せんとするものである。 The present invention was developed in view of the above-mentioned points, and involves forming a soft metal layer on each of the infrared sensing element and the semiconductor circuit board for signal processing, and then stacking them and fixing them together via the soft metal layer. The purpose is to provide a new integrated infrared detection device.
以下図面を用いて本考案の実施例につき詳細に
説明する。 Embodiments of the present invention will be described in detail below with reference to the drawings.
第1図〜第3図は本考案の一実施例を示したも
ので、第1図は複数の赤外線検知素子が形成され
た多元半導体たとえばp型Hgl−xDdxTeから成
る基板を示し、該基板15の表面には複数の島状
n型領域16a,16b,16c,……がマトリ
クス状に配列形成されて2次元光センサDを構成
している。各個のn型領域上にはIn電極層17
a,17b,17c,……ボタン状に盛上げられ
ている。 1 to 3 show an embodiment of the present invention, and FIG. 1 shows a substrate made of a multi-component semiconductor, such as p-type Hgl-xDdxTe, on which a plurality of infrared sensing elements are formed; A plurality of island-like n-type regions 16a, 16b, 16c, . An In electrode layer 17 is formed on each n-type region.
a, 17b, 17c, . . . are raised like buttons.
第2図は上記2次元光センサDと一体化される
信号読出し用集積回路基板Sの構造を示したもの
で、シリコンからなる基板18の表面に複数個の
トランジスタ素子が形成されている。このトラン
ジスタ素子群は光センサDの信号読出し用で、そ
の配列ピツチは第1図の島状領域群と同一になつ
ている。シリコン基板18において20および2
1は各トランジスタ素子のベースおよびコレクタ
電極の共通バス配線を示しており、各個のトラン
ジスタのエミツタ電極部に、19a,19b,1
9c,……のようにInが盛り上げられている。な
おシリコン基板に第2図のようにInの盛上がつた
部分を形成するには、クロム(Cr)またはアル
ミニウム(Al)で非整流性接触を形成し、この
Cr(またはAl)層上に金(Au)を被着し、さら
にAu層上にInを被着すればInはAuとよくなじ
み、またCr(またはAl)はシリコン基板上の酸化
膜によく密着するので、In層の脱落等が起こらず
好結果が得られる。 FIG. 2 shows the structure of a signal reading integrated circuit board S integrated with the two-dimensional optical sensor D, in which a plurality of transistor elements are formed on the surface of a silicon substrate 18. This transistor element group is for reading out signals from the optical sensor D, and its arrangement pitch is the same as that of the island-like region group in FIG. 20 and 2 on the silicon substrate 18
1 indicates a common bus wiring for the base and collector electrodes of each transistor element, and 19a, 19b, 1 are connected to the emitter electrode of each transistor.
In is excited like 9c,... Note that in order to form a raised part of In on a silicon substrate as shown in Figure 2, a non-rectifying contact is formed with chromium (Cr) or aluminum (Al).
If gold (Au) is deposited on the Cr (or Al) layer and then In is deposited on the Au layer, the In will blend well with the Au, and the Cr (or Al) will blend well with the oxide film on the silicon substrate. Because of the close contact, good results can be obtained without the In layer falling off.
第3図は2次元光センサDとIC基板Sとを重
ねて一体化した状態を示し、両者はInどうしが正
しく対向するように重ねられている。上記両者を
一体化するには100℃程度に加熱して押圧すれば、
In層どうしが容易に融合するから、圧力を除いて
放冷すれば両者DおよびSは一体化される。この
一体化された複合半導体チツプを、光センサDを
上にして放熱板14に固定し、電子冷却器ととも
に気密容器内に組み込めば完成した冷却型赤外線
検知装置となる。ただし電子冷却器および外囲器
となる気密容器は図示を省略した。 FIG. 3 shows a state in which the two-dimensional optical sensor D and the IC substrate S are stacked and integrated, and the two are stacked so that the Ins are correctly opposed to each other. To integrate the above two, heat it to about 100℃ and press it.
Since the In layers are easily fused together, both D and S can be integrated by removing the pressure and allowing them to cool. This integrated composite semiconductor chip is fixed to the heat sink 14 with the optical sensor D facing upward, and is assembled in an airtight container together with an electronic cooler to form a completed cooling type infrared detection device. However, the electronic cooler and the airtight container serving as the envelope are not shown.
以上説明した本考案の赤外線検知装置は、赤外
線を電気信号に変換する多元半導体と、シリコン
から成る集積回路とが一体にまとめられているた
め、増幅、波形整形、波等の処理を受けた信号
を赤外線検知器の外囲器に取付けられたリード線
から直ちに取出すことができる。したがつて従来
赤外線検知装置の外部に配置されていた前置増幅
器、波回路等を省くことができるので赤外線を
用いた温度測定装置、マツピング装置等が小型軽
量化され、とくに自動車、航空機等に搭載する機
器に適用してきわめて有利である。 The infrared detection device of the present invention described above integrates a multi-component semiconductor that converts infrared rays into an electrical signal and an integrated circuit made of silicon. can be immediately taken out from the lead wire attached to the infrared detector envelope. Therefore, it is possible to omit the preamplifier, wave circuit, etc. that were conventionally placed outside the infrared detection device, so temperature measurement devices, mapping devices, etc. that use infrared rays can be made smaller and lighter, making them particularly useful for automobiles, aircraft, etc. This is extremely advantageous when applied to on-board equipment.
また、本願考案では赤外線検知素子を構成する
多元半導体基板と回路素子基板との電極間の接続
に軟金属であるInを用いているので、室温と動作
温度である低温との熱サイクルによる基板間の歪
をIn金属が吸収する。従つて、電極間が断線する
という不都合はなく、高品質の赤外線検知装置を
提供することができる。 In addition, in the present invention, the soft metal In is used for the connection between the electrodes of the multi-component semiconductor substrate and the circuit element substrate that constitute the infrared sensing element, so the thermal cycle between the room temperature and the low temperature that is the operating temperature causes the connection between the substrates. In metal absorbs the strain. Therefore, there is no problem of disconnection between the electrodes, and a high-quality infrared detection device can be provided.
第1図〜第3図は本考案の一実施例を示したも
ので、第1図は2次元光センサの平面図、第2図
は信号処理用シリコン回路基板の平面図、第3図
は両者を一体化した状態を示す断面図である。
14……放熱板、15……2次元光センサ基
板、16a,16b,16c,……島状n型領
域、17a,17b,17c,……In電極、18
……シリコン基板、19a,19b,19c,…
…エミツタのIn電極、D……赤外線検知素子、S
……集積回路素子。
Figures 1 to 3 show an embodiment of the present invention, in which Figure 1 is a plan view of a two-dimensional optical sensor, Figure 2 is a plan view of a silicon circuit board for signal processing, and Figure 3 is a plan view of a silicon circuit board for signal processing. FIG. 3 is a cross-sectional view showing a state in which the two are integrated. 14... Heat sink, 15... Two-dimensional optical sensor substrate, 16a, 16b, 16c,... Island-shaped n-type region, 17a, 17b, 17c,... In electrode, 18
...Silicon substrate, 19a, 19b, 19c,...
...Emitsuta's In electrode, D...Infrared detection element, S
...Integrated circuit element.
Claims (1)
Inからなる軟金属によつて分厚く形成し、該赤外
線検知素子を、軟金属であるInからなる凸状接続
部を有するSi回路基板に対し、前記電極と上記凸
状接続部とが当接するごとく対向せしめた状態で
上記両者の軟金属層どうしを熱圧着せしめること
により上記両者を一体化したことを特徴とする赤
外線検知装置。 The electrode of an infrared sensing element consisting of Hg 1-x Cd x Te is
The infrared sensing element is formed thickly from a soft metal made of In, and the infrared detecting element is placed in such a manner that the electrode and the convex connection are in contact with a Si circuit board having a convex connection made of In, a soft metal. An infrared detection device characterized in that the two soft metal layers are integrated by thermocompression bonding the two soft metal layers while facing each other.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5847085U JPS60181060U (en) | 1985-04-18 | 1985-04-18 | infrared detection device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5847085U JPS60181060U (en) | 1985-04-18 | 1985-04-18 | infrared detection device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60181060U JPS60181060U (en) | 1985-12-02 |
JPH0432764Y2 true JPH0432764Y2 (en) | 1992-08-06 |
Family
ID=30583996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5847085U Granted JPS60181060U (en) | 1985-04-18 | 1985-04-18 | infrared detection device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60181060U (en) |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4936789A (en) * | 1972-08-11 | 1974-04-05 | ||
JPS5178176A (en) * | 1974-12-20 | 1976-07-07 | Ibm | |
JPS51102566A (en) * | 1975-03-07 | 1976-09-10 | Suwa Seikosha Kk | Shusekikairo |
-
1985
- 1985-04-18 JP JP5847085U patent/JPS60181060U/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4936789A (en) * | 1972-08-11 | 1974-04-05 | ||
JPS5178176A (en) * | 1974-12-20 | 1976-07-07 | Ibm | |
JPS51102566A (en) * | 1975-03-07 | 1976-09-10 | Suwa Seikosha Kk | Shusekikairo |
Also Published As
Publication number | Publication date |
---|---|
JPS60181060U (en) | 1985-12-02 |
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