JPH04323649A - Method for processing silver halide photographic sensitive material - Google Patents
Method for processing silver halide photographic sensitive materialInfo
- Publication number
- JPH04323649A JPH04323649A JP11947591A JP11947591A JPH04323649A JP H04323649 A JPH04323649 A JP H04323649A JP 11947591 A JP11947591 A JP 11947591A JP 11947591 A JP11947591 A JP 11947591A JP H04323649 A JPH04323649 A JP H04323649A
- Authority
- JP
- Japan
- Prior art keywords
- processing
- photosensitive material
- bleach
- tank
- silver halide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000012545 processing Methods 0.000 title claims abstract description 224
- 239000000463 material Substances 0.000 title claims abstract description 180
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 63
- 239000004332 silver Substances 0.000 title claims abstract description 63
- -1 silver halide Chemical class 0.000 title claims description 53
- 238000000034 method Methods 0.000 title claims description 41
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 55
- 239000003963 antioxidant agent Substances 0.000 claims abstract description 9
- 230000003078 antioxidant effect Effects 0.000 claims abstract description 8
- 238000005406 washing Methods 0.000 claims description 93
- 239000007788 liquid Substances 0.000 claims description 83
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 22
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 claims description 7
- 230000033116 oxidation-reduction process Effects 0.000 claims description 5
- 230000003750 conditioning effect Effects 0.000 claims description 2
- 239000002244 precipitate Substances 0.000 abstract description 14
- 239000002253 acid Substances 0.000 abstract description 7
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 abstract description 3
- SRPOMGSPELCIGZ-UHFFFAOYSA-N disulfino carbonate Chemical compound OS(=O)OC(=O)OS(O)=O SRPOMGSPELCIGZ-UHFFFAOYSA-N 0.000 abstract description 2
- 239000008237 rinsing water Substances 0.000 abstract description 2
- 230000000630 rising effect Effects 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 73
- 239000000203 mixture Substances 0.000 description 20
- 238000011161 development Methods 0.000 description 18
- 239000003795 chemical substances by application Substances 0.000 description 8
- 238000009472 formulation Methods 0.000 description 8
- 239000000839 emulsion Substances 0.000 description 7
- 230000001580 bacterial effect Effects 0.000 description 6
- 239000007844 bleaching agent Substances 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 6
- 238000007789 sealing Methods 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 3
- 239000004721 Polyphenylene oxide Substances 0.000 description 3
- 239000004743 Polypropylene Substances 0.000 description 3
- ZSILVJLXKHGNPL-UHFFFAOYSA-L S(=S)(=O)([O-])[O-].[Ag+2] Chemical compound S(=S)(=O)([O-])[O-].[Ag+2] ZSILVJLXKHGNPL-UHFFFAOYSA-L 0.000 description 3
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzene seleninic acid Natural products O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 3
- 238000004061 bleaching Methods 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 239000000975 dye Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229920006380 polyphenylene oxide Polymers 0.000 description 3
- 229920001155 polypropylene Polymers 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000005060 rubber Substances 0.000 description 3
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 3
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 3
- RNMCCPMYXUKHAZ-UHFFFAOYSA-N 2-[3,3-diamino-1,2,2-tris(carboxymethyl)cyclohexyl]acetic acid Chemical compound NC1(N)CCCC(CC(O)=O)(CC(O)=O)C1(CC(O)=O)CC(O)=O RNMCCPMYXUKHAZ-UHFFFAOYSA-N 0.000 description 2
- DETXZQGDWUJKMO-UHFFFAOYSA-N 2-hydroxymethanesulfonic acid Chemical compound OCS(O)(=O)=O DETXZQGDWUJKMO-UHFFFAOYSA-N 0.000 description 2
- GUUULVAMQJLDSY-UHFFFAOYSA-N 4,5-dihydro-1,2-thiazole Chemical class C1CC=NS1 GUUULVAMQJLDSY-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 2
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000003242 anti bacterial agent Substances 0.000 description 2
- 239000003429 antifungal agent Substances 0.000 description 2
- 229940121375 antifungal agent Drugs 0.000 description 2
- 239000002738 chelating agent Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- JAWGVVJVYSANRY-UHFFFAOYSA-N cobalt(3+) Chemical compound [Co+3] JAWGVVJVYSANRY-UHFFFAOYSA-N 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 239000000645 desinfectant Substances 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000009931 harmful effect Effects 0.000 description 2
- 150000004694 iodide salts Chemical class 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229960003330 pentetic acid Drugs 0.000 description 2
- JRKICGRDRMAZLK-UHFFFAOYSA-L persulfate group Chemical group S(=O)(=O)([O-])OOS(=O)(=O)[O-] JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- 150000003567 thiocyanates Chemical class 0.000 description 2
- GKSPIZSKQWTXQG-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-[1-(pyridin-2-yldisulfanyl)ethyl]benzoate Chemical compound C=1C=C(C(=O)ON2C(CCC2=O)=O)C=CC=1C(C)SSC1=CC=CC=N1 GKSPIZSKQWTXQG-UHFFFAOYSA-N 0.000 description 1
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- AOSFMYBATFLTAQ-UHFFFAOYSA-N 1-amino-3-(benzimidazol-1-yl)propan-2-ol Chemical compound C1=CC=C2N(CC(O)CN)C=NC2=C1 AOSFMYBATFLTAQ-UHFFFAOYSA-N 0.000 description 1
- VZYDKJOUEPFKMW-UHFFFAOYSA-N 2,3-dihydroxybenzenesulfonic acid Chemical class OC1=CC=CC(S(O)(=O)=O)=C1O VZYDKJOUEPFKMW-UHFFFAOYSA-N 0.000 description 1
- QTLHLXYADXCVCF-UHFFFAOYSA-N 2-(4-amino-n-ethyl-3-methylanilino)ethanol Chemical compound OCCN(CC)C1=CC=C(N)C(C)=C1 QTLHLXYADXCVCF-UHFFFAOYSA-N 0.000 description 1
- JVXHQHGWBAHSSF-UHFFFAOYSA-L 2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate;hydron;iron(2+) Chemical compound [H+].[H+].[Fe+2].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O JVXHQHGWBAHSSF-UHFFFAOYSA-L 0.000 description 1
- XWSGEVNYFYKXCP-UHFFFAOYSA-N 2-[carboxymethyl(methyl)amino]acetic acid Chemical compound OC(=O)CN(C)CC(O)=O XWSGEVNYFYKXCP-UHFFFAOYSA-N 0.000 description 1
- WWXISJJRNIVDIP-UHFFFAOYSA-N 2-[carboxymethyl-[2-[carboxymethyl(hydroxymethyl)amino]ethyl]amino]acetic acid Chemical compound OC(=O)CN(CO)CCN(CC(O)=O)CC(O)=O WWXISJJRNIVDIP-UHFFFAOYSA-N 0.000 description 1
- VLUWLNIMIAFOSY-UHFFFAOYSA-N 2-methylbenzenesulfinic acid Chemical compound CC1=CC=CC=C1S(O)=O VLUWLNIMIAFOSY-UHFFFAOYSA-N 0.000 description 1
- XBTWVJKPQPQTDW-UHFFFAOYSA-N 4-n,4-n-diethyl-2-methylbenzene-1,4-diamine Chemical group CCN(CC)C1=CC=C(N)C(C)=C1 XBTWVJKPQPQTDW-UHFFFAOYSA-N 0.000 description 1
- FFAJEKUNEVVYCW-UHFFFAOYSA-N 4-n-ethyl-4-n-(2-methoxyethyl)-2-methylbenzene-1,4-diamine Chemical compound COCCN(CC)C1=CC=C(N)C(C)=C1 FFAJEKUNEVVYCW-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- 229920001174 Diethylhydroxylamine Polymers 0.000 description 1
- 229920000181 Ethylene propylene rubber Polymers 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- PCSMJKASWLYICJ-UHFFFAOYSA-N Succinic aldehyde Chemical compound O=CCCC=O PCSMJKASWLYICJ-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920006311 Urethane elastomer Polymers 0.000 description 1
- 229910052946 acanthite Inorganic materials 0.000 description 1
- MKBUQYWFFBCMFG-UHFFFAOYSA-N acetic acid propane-1,1-diamine Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.CCC(N)N MKBUQYWFFBCMFG-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000003868 ammonium compounds Chemical class 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- XILUHZNOEFEOOU-UHFFFAOYSA-N benzene-1,2-disulfinic acid Chemical compound OS(=O)C1=CC=CC=C1S(O)=O XILUHZNOEFEOOU-UHFFFAOYSA-N 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 1
- 239000003139 biocide Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- MOOAHMCRPCTRLV-UHFFFAOYSA-N boron sodium Chemical compound [B].[Na] MOOAHMCRPCTRLV-UHFFFAOYSA-N 0.000 description 1
- 150000001642 boronic acid derivatives Chemical class 0.000 description 1
- SXDBWCPKPHAZSM-UHFFFAOYSA-M bromate Chemical class [O-]Br(=O)=O SXDBWCPKPHAZSM-UHFFFAOYSA-M 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- FVCOIAYSJZGECG-UHFFFAOYSA-N diethylhydroxylamine Chemical compound CCN(O)CC FVCOIAYSJZGECG-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 229920005558 epichlorohydrin rubber Polymers 0.000 description 1
- RQIFXTOWUNAUJC-UHFFFAOYSA-N ethanesulfinic acid Chemical compound CCS(O)=O RQIFXTOWUNAUJC-UHFFFAOYSA-N 0.000 description 1
- DEFVIWRASFVYLL-UHFFFAOYSA-N ethylene glycol bis(2-aminoethyl)tetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)CCOCCOCCN(CC(O)=O)CC(O)=O DEFVIWRASFVYLL-UHFFFAOYSA-N 0.000 description 1
- YAGKRVSRTSUGEY-UHFFFAOYSA-N ferricyanide Chemical compound [Fe+3].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-].N#[C-] YAGKRVSRTSUGEY-UHFFFAOYSA-N 0.000 description 1
- 229920001973 fluoroelastomer Polymers 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 150000004677 hydrates Chemical class 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 229920002681 hypalon Polymers 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229920000554 ionomer Polymers 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229920003049 isoprene rubber Polymers 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000002906 microbiologic effect Effects 0.000 description 1
- NPKFETRYYSUTEC-UHFFFAOYSA-N n-[2-(4-amino-n-ethyl-3-methylanilino)ethyl]methanesulfonamide Chemical compound CS(=O)(=O)NCCN(CC)C1=CC=C(N)C(C)=C1 NPKFETRYYSUTEC-UHFFFAOYSA-N 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- 150000005181 nitrobenzenes Chemical class 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000006179 pH buffering agent Substances 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- ZJAOAACCNHFJAH-UHFFFAOYSA-N phosphonoformic acid Chemical class OC(=O)P(O)(O)=O ZJAOAACCNHFJAH-UHFFFAOYSA-N 0.000 description 1
- PTMHPRAIXMAOOB-UHFFFAOYSA-N phosphoramidic acid Chemical class NP(O)(O)=O PTMHPRAIXMAOOB-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920001084 poly(chloroprene) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 239000005077 polysulfide Substances 0.000 description 1
- 229920001021 polysulfide Polymers 0.000 description 1
- 150000008117 polysulfides Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- DJEHXEMURTVAOE-UHFFFAOYSA-M potassium bisulfite Chemical compound [K+].OS([O-])=O DJEHXEMURTVAOE-UHFFFAOYSA-M 0.000 description 1
- 229940099427 potassium bisulfite Drugs 0.000 description 1
- 235000010259 potassium hydrogen sulphite Nutrition 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000003755 preservative agent Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- YGUNSCNKBIOMSG-UHFFFAOYSA-N propane-1-sulfinic acid Chemical compound CCCS(O)=O YGUNSCNKBIOMSG-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 230000009291 secondary effect Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- 229940056910 silver sulfide Drugs 0.000 description 1
- XUARKZBEFFVFRG-UHFFFAOYSA-N silver sulfide Chemical compound [S-2].[Ag+].[Ag+] XUARKZBEFFVFRG-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 238000010186 staining Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 150000003585 thioureas Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical class CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Silver Salt Photography Or Processing Solution Therefor (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、露光済のハロゲン化銀
写真感光材料を処理するハロゲン化銀写真感光材料の処
理方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for processing a silver halide photographic material that has been exposed to light.
【0002】0002
【従来の技術】露光後のハロゲン化銀写真感光材料(以
下、単に、感光材料または感材ともいう)に対しては、
その種類に応じた処理がなされる。例えば、カラー感光
材料に対しては、現像、漂白、定着(または漂白定着)
、水洗処理が順次なされる。[Prior Art] For silver halide photographic materials (hereinafter also simply referred to as photosensitive materials or photosensitive materials) after exposure,
Processing is performed depending on the type. For example, for color photosensitive materials, development, bleaching, fixing (or bleach-fixing)
, water washing treatment is performed sequentially.
【0003】このような処理は、通常、自動現像機のよ
うな感光材料処理装置を用い、この装置が備える複数の
処理槽のそれぞれに入れられた現像液、漂白液、定着液
(または漂白定着)、水洗水等に感光材料を順次浸漬す
ることによりなされる。[0003] Such processing usually uses a photosensitive material processing device such as an automatic processor, and a developer, bleach, and fixer (or bleach-fixing solution) placed in each of a plurality of processing tanks included in this device. ), by sequentially immersing the photosensitive material in washing water, etc.
【0004】近年、ミニラボと呼ばれる小型現像機によ
る小規模用処理システムの開発が進み、大型現像機を備
える現像所のみならず、写真店の店頭等でもフィルムの
現像およびプリントがなされるようになっている。[0004] In recent years, the development of small-scale processing systems using small developing machines called minilabs has progressed, and film development and printing can now be done not only in photo labs equipped with large developing machines but also at photo shops. ing.
【0005】このような小規模用処理システムにおいて
は、簡易かつ迅速に処理が行なえること、処理効率が高
く優れた写真性が得られること、装置の小型化を図るこ
と等が課題とされており、また、環境保全等の観点から
は、処理液の補充量および排液量をより低減することが
課題とされている。[0005] In such a small-scale processing system, the challenges include being able to perform processing simply and quickly, achieving high processing efficiency and excellent photographic quality, and miniaturizing the device. Furthermore, from the viewpoint of environmental conservation, etc., it is an issue to further reduce the amount of replenishment of processing liquid and the amount of drained liquid.
【0006】このような課題を解決するものの一例とし
て、本願出願人は、複数の処理室を幅狭の通路で連結し
てなる処理槽(以下、多室処理槽という)で感光材料を
処理する感光材料処理装置を開示している(特開平02
−205846号、同02−267549号)。この装
置によれば、各処理室において、処理液の液組成勾配(
濃度勾配)が形成され、これにより、処理効率の向上、
処理液の補充量の低減および装置の小型化が図れる。As an example of a solution to such problems, the applicant of the present application has developed a method for processing photosensitive materials in a processing tank (hereinafter referred to as a multi-chamber processing tank) consisting of a plurality of processing chambers connected by narrow passages. Discloses a photosensitive material processing apparatus (Japanese Patent Application Laid-Open No.
-205846, 02-267549). According to this device, in each processing chamber, the liquid composition gradient (
concentration gradient) is formed, which improves processing efficiency,
It is possible to reduce the amount of replenishment of the processing liquid and to downsize the device.
【0007】ところで、写真性の向上を目的とした発明
として、所定の組成の感光材料を、2槽以上の漂白定着
槽を用い、向流方式(漂白定着液が、各漂白定着槽を感
光材料の進行方向と逆方向に流れる)で処理し、最終の
漂白定着槽における漂白定着液中の銀濃度を、第1槽の
漂白定着槽における漂白定着液中の銀濃度の40〜80
%以下とするハロゲン化銀カラー写真感光材料の処理方
法が開示されている(特開昭64−2047号、同64
−2048号、同64−4744号)。By the way, as an invention aimed at improving photographic properties, a photosensitive material of a predetermined composition is processed using two or more bleach-fixing tanks using a counter-current method (the bleach-fixing solution passes through each bleach-fixing tank to the photosensitive material). The silver concentration in the bleach-fix solution in the final bleach-fix tank is 40 to 80% higher than the silver concentration in the bleach-fix solution in the first bleach-fix tank.
% or less (Japanese Patent Application Laid-open No. 64-2047, No. 64-64)
-2048, 64-4744).
【0008】しかしながら、この方法では、漂白定着液
の流れが向流方式であるため、処理効率が低く、漂白定
着液の補充量も多くなる。However, in this method, the flow of the bleach-fix solution is in a countercurrent manner, so that the processing efficiency is low and the amount of bleach-fix solution to be replenished is large.
【0009】そこで、本願出願人は、多室処理槽におい
て、各通路にブレードを設け、このブレードのシール機
能により各処理室における処理液の液組成勾配(濃度勾
配)をより確実に維持するとともに、各処理室を流れる
処理液が、感光材料の進行方向と同方向に流れる(順流
方式)ように処理液を補充することにより、さらなる処
理効率の向上および処理液の補充量の低減を図ることが
できる感光材料処理装置を開示している(特願平02−
225880号)。[0009] Therefore, the applicant of the present application has provided a blade in each passage in a multi-chamber processing tank, and uses the sealing function of this blade to more reliably maintain the liquid composition gradient (concentration gradient) of the processing liquid in each processing chamber. , by replenishing the processing liquid so that the processing liquid flowing through each processing chamber flows in the same direction as the traveling direction of the photosensitive material (forward flow method), further improving processing efficiency and reducing the amount of processing liquid to be replenished. discloses a photosensitive material processing apparatus capable of
No. 225880).
【0010】この装置を漂白定着処理に適用した場合、
漂白定着液の流れが順流方式であるため、感光材料が通
過する順に処理室内の漂白定着液中の銀イオン濃度は高
くなり、感光材料が最後に通過する処理室内の漂白定着
液中の銀イオン濃度が最も高くなる。従って、次工程で
ある水洗に移行する際に感光材料が水洗槽に持ち込む銀
量も多くなり、水洗槽内にAgBrのような銀の沈殿物
が生じ、水洗槽が汚れるとう問題がある。When this device is applied to bleach-fixing processing,
Since the flow of the bleach-fix solution is in a downward flow system, the silver ion concentration in the bleach-fix solution in the processing chamber increases as the photosensitive material passes through it, and the silver ion concentration in the bleach-fix solution in the processing chamber that the photosensitive material passes through last. The concentration is highest. Therefore, when moving to the next step, rinsing, the amount of silver carried by the photosensitive material into the rinsing tank increases, and silver deposits such as AgBr are formed in the rinsing tank, causing the rinsing tank to become dirty.
【0011】特に、水洗槽の構成を前述したような各通
路にブレードを有する多室処理槽とした場合、銀の沈殿
物がブレードの表面に付着し、ブレードが汚れるととも
に、感光材料がブレード間を摺動して通過する際に、銀
の沈殿物が感材表面に移行して付着し、また、銀の沈殿
物によりブレード表面や感材の乳剤面をキズ付けるとい
う問題がある。In particular, when the washing tank is configured as a multi-chamber processing tank having a blade in each passage as described above, silver deposits adhere to the surface of the blade, staining the blade, and the photosensitive material is deposited between the blades. There is a problem in that when the blade passes through the blade, silver precipitates migrate and adhere to the surface of the photosensitive material, and the silver precipitates also scratch the surface of the blade and the emulsion surface of the photosensitive material.
【0012】0012
【発明が解決しようとする課題】本発明の目的は、水洗
槽内に銀の沈殿物が生じることによる弊害を防止するこ
とができるハロゲン化銀写真感光材料の処理方法を提供
することにある。SUMMARY OF THE INVENTION An object of the present invention is to provide a method for processing silver halide photographic materials that can prevent the harmful effects of silver precipitates in a washing tank.
【0013】[0013]
【課題を解決するための手段】このような目的は、下記
(1)〜(6)の本発明により達成される。[Means for Solving the Problems] Such objects are achieved by the present invention as described in (1) to (6) below.
【0014】(1) 露光済のハロゲン化銀写真感光
材料を、現像処理後、複数の脱銀用処理領域を順次通過
させ、少なくとも定着能を有する処理液に浸漬して脱銀
処理し、その後、複数の水洗用処理領域を順次通過させ
、水洗水に浸漬して水洗処理するハロゲン化銀写真感光
材料の処理方法であって、前記定着能を有する処理液は
、前記各脱銀用処理領域を前記ハロゲン化銀写真感光材
料の進行方向と同方向に流れており、前記脱銀処理と前
記水洗処理との間に、前記ハロゲン化銀写真感光材料を
酸化防止剤を含有する調整液に接触させることを特徴と
するハロゲン化銀写真感光材料の処理方法。(1) After the exposed silver halide photographic material is developed, it is sequentially passed through a plurality of desilvering processing areas, immersed in a processing solution having at least a fixing ability for desilvering processing, and then , a method for processing a silver halide photographic light-sensitive material in which the material is sequentially passed through a plurality of processing areas for washing, and immersed in washing water for washing, wherein the processing liquid having fixing ability is applied to each of the processing areas for desilvering. is flowing in the same direction as the traveling direction of the silver halide photographic material, and between the desilvering treatment and the water washing treatment, the silver halide photographic material is brought into contact with a conditioning liquid containing an antioxidant. 1. A method for processing a silver halide photographic material, the method comprising:
【0015】(2) 前記複数の脱銀用処理領域のう
ち、ハロゲン化銀写真感光材料が最後に通過する脱銀用
処理領域内の定着能を有する処理液中の銀イオン濃度が
、他の脱銀用処理領域に比べて最も高い上記(1)に記
載のハロゲン化銀写真感光材料の処理方法。(2) Among the plurality of desilvering processing regions, the silver ion concentration in the processing solution having fixing ability in the desilvering processing region through which the silver halide photographic light-sensitive material passes last is higher than that of the other processing regions. The method for processing a silver halide photographic material according to (1) above, which has the highest processing area compared to the processing area for desilvering.
【0016】(3) 前記調整液の酸化還元電位が−
250〜−50mVである上記1または2に記載のハロ
ゲン化銀写真感光材料の処理方法。(3) The oxidation-reduction potential of the adjustment liquid is -
2. The method for processing a silver halide photographic material as described in 1 or 2 above, wherein the voltage is 250 to -50 mV.
【0017】(4) 前記脱銀処理は、複数の処理室
を幅狭の通路で順次連結してなる処理槽で行なわれる上
記(1)ないし(3)のいずれかに記載のハロゲン化銀
写真感光材料の処理方法。(4) The silver halide photograph according to any one of (1) to (3) above, wherein the desilvering treatment is carried out in a processing tank formed by sequentially connecting a plurality of processing chambers through narrow passages. How to process photosensitive materials.
【0018】(5) 前記水洗処理は、複数の処理室
を幅狭の通路で順次連結してなる処理槽で行なわれる上
記(1)ないし(4)のいずれかに記載のハロゲン化銀
写真感光材料の処理方法。(5) The silver halide photographic sensitizer according to any one of (1) to (4) above, wherein the water washing treatment is carried out in a processing tank formed by sequentially connecting a plurality of processing chambers through narrow passages. How materials are processed.
【0019】(6) 前記通路に、この通路を実質的
に遮蔽しうるブレードが設置されている上記(4)また
は(5)に記載のハロゲン化銀写真感光材料の処理方法
。(6) The method for processing a silver halide photographic material as described in (4) or (5) above, wherein a blade capable of substantially shielding the passage is installed in the passage.
【0020】[0020]
【発明の構成】以下、本発明のハロゲン化銀写真感光材
料の処理方法を添付図面に示す好適実施例に基づいて詳
細に説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The method for processing silver halide photographic materials of the present invention will be explained in detail below with reference to preferred embodiments shown in the accompanying drawings.
【0021】図1は、本発明のハロゲン化銀写真感光材
料の処理方法を実施するための感光材料処理装置の構成
例を模式的に示す断面側面図である。同図に示すように
、感光材料処理装置1Aは、図中左側から順に、2つの
漂白定着槽(脱銀用処理領域)2A、2B、調整槽3、
3つの水洗槽(水洗用処理領域)4A、4B、4C(こ
れらを総括して、処理槽という)が並設されている。ま
た、図示されていないが、漂白定着槽2Aの左側には、
少なくとも1つの現像槽が設置されている。FIG. 1 is a cross-sectional side view schematically showing an example of the configuration of a photosensitive material processing apparatus for carrying out the method of processing silver halide photographic light-sensitive materials of the present invention. As shown in the figure, the photosensitive material processing apparatus 1A includes, in order from the left side in the figure, two bleach-fix tanks (desilvering processing area) 2A, 2B, an adjustment tank 3,
Three washing tanks (processing areas for washing) 4A, 4B, and 4C (these are collectively referred to as processing tanks) are arranged in parallel. Although not shown, on the left side of the bleach-fix tank 2A,
At least one developer tank is installed.
【0022】漂白定着槽2Aおよび2A内には、それぞ
れ、定着能を有する処理液が所定のレベルまで入れられ
ている。この定着能を有する処理液としては、漂白定着
液または定着液が好ましく、図示の例では漂白定着液2
0であり、以下これで代表する。なお、漂白定着槽2A
および2Bは、双方とも定着槽(黒白処理の場合)、漂
白槽と定着槽、漂白槽と漂白定着槽、漂白定着槽と定着
槽等であってもよい。The bleach-fix tanks 2A and 2A each contain a processing liquid having a fixing ability up to a predetermined level. As the processing liquid having this fixing ability, a bleach-fixing liquid or a fixing liquid is preferable, and in the illustrated example, a bleach-fixing liquid 2 is used.
0, and will be represented below. In addition, bleach-fix tank 2A
and 2B may both be a fixing tank (in the case of black-and-white processing), a bleaching tank and a fixing tank, a bleaching tank and a bleach-fixing tank, a bleach-fixing tank and a fixing tank, or the like.
【0023】調整槽3内には、後述する調整液30が所
定のレベルまで入れられている。A regulating liquid 30, which will be described later, is placed in the regulating tank 3 to a predetermined level.
【0024】水洗槽4A、4Bおよび4C内には、それ
ぞれ、水洗槽粋40が所定のレベルまで入れられている
。[0024] In each of the washing tanks 4A, 4B and 4C, a washing tank 40 is filled up to a predetermined level.
【0025】また、図中では省略されているが、各処理
槽2A、2B、3、4A、4B、4C内や隣接する処理
槽間の上部には、感光材料Sを搬送するためのローラや
ガイドが所定の配置で設置されている。このようなロー
ラやガイドにより、感光材料Sは、図1中矢印で示すよ
うに、漂白定着槽2A、2B、調整槽3、水洗槽4A、
4B、4Cの順にそれぞれU字状の経路で搬送され、各
処理液に浸漬されて処理される。Although omitted in the figure, there are rollers and rollers for conveying the photosensitive material S in each of the processing tanks 2A, 2B, 3, 4A, 4B, and 4C and in the upper part between adjacent processing tanks. Guides are installed in predetermined locations. With such rollers and guides, the photosensitive material S is transferred to the bleach-fix tanks 2A, 2B, the adjustment tank 3, the washing tank 4A, as shown by the arrows in FIG.
4B and 4C are conveyed in the order of U-shaped paths, and are immersed in each processing liquid to be processed.
【0026】漂白定着槽2A内には、新たな漂白定着液
20を供給するための供液口21が設置され、漂白定着
槽2B内には、疲労・劣化した漂白定着液20を排出す
るための排液口23が設置されている。また、漂白定着
槽2Aおよび2Bの境界の槽壁には、開口22が形成さ
れている。A solution supply port 21 is installed in the bleach-fix tank 2A for supplying a new bleach-fix solution 20, and a solution supply port 21 is installed in the bleach-fix tank 2B for discharging the worn-out and deteriorated bleach-fix solution 20. A drain port 23 is installed. Further, an opening 22 is formed in the tank wall at the boundary between the bleach-fix tanks 2A and 2B.
【0027】供液口21から新たな漂白定着液が補充さ
れると、その補充量とほぼ同量の漂白定着槽2A内の漂
白定着液20が開口22を経て漂白定着槽2B内に流れ
込み、さらに、ほぼ同量の漂白定着槽2B内の漂白定着
液20が排液口23からオーバーフローにより排出され
る。すなわち、漂白定着液20は、感光材料Sの進行方
向と同方向に流れる(順流方式)こととなる。When new bleach-fix solution is replenished from the solution supply port 21, approximately the same amount of bleach-fix solution 20 in the bleach-fix tank 2A as the refilled amount flows into the bleach-fix tank 2B through the opening 22. Furthermore, approximately the same amount of the bleach-fix solution 20 in the bleach-fix tank 2B is discharged from the drain port 23 by overflow. That is, the bleach-fixing solution 20 flows in the same direction as the traveling direction of the photosensitive material S (downward flow system).
【0028】これにより、感光材料Sの脱銀効率が向上
し、それに伴い、給液口21からの漂白定着液20の補
充量を低減することができる。なお、このような順流方
式は、特に漂白定着液の他、定着液においても有効であ
る。As a result, the desilvering efficiency of the photosensitive material S is improved, and accordingly, the amount of bleach-fix solution 20 to be replenished from the solution supply port 21 can be reduced. Note that such a forward flow method is particularly effective for fixing solutions as well as bleach-fixing solutions.
【0029】この場合、漂白定着液20の好適な補充量
は、処理する感光材料Sの種類(例えばフィルムとペー
パー)、特に乳剤層中の含有銀量により異なる。例えば
、カラーまたは黒色ネガフィルムのようなフィルムの場
合には、感光材料1m2当り600〜1300ml程度
が好ましく、これを感光材料1m2中の銀量1g相当と
して換算すると、20〜260ml/(Ag1g/m2
) 程度となる。
また、カラーまたは黒色ペーパーのような印画紙の場合
には、感光材料1m2当り15〜120ml程度が好ま
しく、これを同様に換算すると、15〜172ml/(
Ag1g/m2) 程度となる。In this case, the suitable amount of replenishment of the bleach-fixing solution 20 varies depending on the type of photosensitive material S to be processed (for example, film or paper), especially the amount of silver contained in the emulsion layer. For example, in the case of a film such as a color or black negative film, it is preferably about 600 to 1300 ml per 1 m2 of photosensitive material, and when converted to the equivalent of 1 g of silver in 1 m2 of photosensitive material, it is 20 to 260 ml/(Ag1g/m2
). In addition, in the case of photographic paper such as color or black paper, it is preferably about 15 to 120 ml per 1 m2 of photosensitive material, and when converted similarly, it is 15 to 172 ml/(
Ag1g/m2).
【0030】なお、本発明では、上記順流方式を採用し
たことにより、漂白定着槽2A内の漂白定着液20に比
べ、漂白定着槽2B内の漂白定着液20の方が、液中の
銀イオン濃度が高くなっている。この場合、漂白定着層
2B内の漂白定着液20中の銀イオン濃度は、8〜20
g/l 程度である。[0030] In the present invention, by adopting the above-mentioned downflow method, the bleach-fix solution 20 in the bleach-fix tank 2B contains more silver ions than the bleach-fix solution 20 in the bleach-fix tank 2A. The concentration is high. In this case, the silver ion concentration in the bleach-fixing solution 20 in the bleach-fixing layer 2B is 8 to 20
It is about g/l.
【0031】調整槽3内には、新たな調整液30を供給
するための供液口31と、疲労・劣化した調整液30を
排出するための排液口32とが設置されている。[0031] Inside the adjustment tank 3, a liquid supply port 31 for supplying new adjustment liquid 30 and a liquid drain port 32 for discharging tired and deteriorated adjustment liquid 30 are installed.
【0032】供液口31から新たな調整液30が調整槽
3内に補充されると、その補充量とほぼ同量の疲労・劣
化した調整液30が排液口32からオーバーフローによ
り排出される。When new adjustment liquid 30 is replenished into the adjustment tank 3 from the liquid supply port 31, almost the same amount of tired and deteriorated adjustment liquid 30 as the replenishment amount is discharged from the drain port 32 by overflow. .
【0033】なお、調整液30の好適な補充量は、諸条
件により変動するが、通常、処理する感光材料1m2当
り、15〜120ml程度、特に、20〜60ml程度
が好ましい。The preferred amount of replenishment of the adjustment liquid 30 varies depending on various conditions, but is usually about 15 to 120 ml, particularly about 20 to 60 ml, per 1 m 2 of the photosensitive material to be processed.
【0034】水洗槽4C内には、新たな水洗水40を供
給するための供液口41が設置され、水洗槽4A内には
、汚れた水洗水40を排出するための排液口44が設置
されている。また、水洗槽4Bおよび4Cの境界の槽壁
ならびに水洗槽4Aおよび4Bの境界の槽壁には、それ
ぞれ開口42および43が形成されている。A liquid supply port 41 for supplying new washing water 40 is installed in the washing tank 4C, and a liquid drain port 44 for discharging dirty washing water 40 is installed in the washing tank 4A. is set up. Furthermore, openings 42 and 43 are formed in the tank wall at the boundary between the washing tanks 4B and 4C and the tank wall at the border between the washing tanks 4A and 4B, respectively.
【0035】供液口41から新たな水洗水が補充される
と、その補充量とほぼ同量の水洗槽4C内の水洗水40
が開口42を経て水洗槽4B内に流れ込み、さらに、ほ
ぼ同量の水洗槽4B内の水洗水40が開口43を経て水
洗槽4A内に流れ込み、さらに、ほぼ同量の水洗槽4A
内の水洗水が排液口44からオーバーフローにより排出
される。すなわち、水洗水40は、感光材料Sの進行方
向と逆方向に流れる(向流方式)こととなる。When new washing water is replenished from the liquid supply port 41, approximately the same amount of washing water 40 in the washing tank 4C as the replenishment amount is added.
flows into the rinsing tank 4B through the opening 42, and approximately the same amount of rinsing water 40 in the rinsing tank 4B flows into the rinsing tank 4A through the opening 43;
The washing water inside is discharged from the drain port 44 by overflow. That is, the washing water 40 flows in a direction opposite to the traveling direction of the photosensitive material S (countercurrent method).
【0036】これにより、感光材料Sの水洗効率が向上
し、それに伴い、給液口41からの水洗水40の補充量
を低減することができる。[0036] As a result, the efficiency of washing the photosensitive material S with water is improved, and accordingly, the amount of replenishment of the washing water 40 from the liquid supply port 41 can be reduced.
【0037】この場合、水洗水40の補充量は、諸条件
により変動するが、通常、処理する感光材料1m2当り
、好ましくは15〜600ml程度、より好ましくは、
60〜240ml程度とすることができる。In this case, the amount of replenishment of the washing water 40 varies depending on various conditions, but is usually about 15 to 600 ml, more preferably about 15 to 600 ml per m2 of photosensitive material to be processed.
It can be about 60 to 240 ml.
【0038】なお、漂白定着槽および水洗槽の設置数は
、図示の例に限定されず、また、調整槽も2槽以上設置
してもよい。The number of bleach-fix tanks and washing tanks to be installed is not limited to the illustrated example, and two or more adjustment tanks may also be installed.
【0039】次に、各処理液について説明する。Next, each processing liquid will be explained.
【0040】漂白定着液20は、漂白剤および定着剤を
含んでいる。The bleach-fix solution 20 contains a bleaching agent and a fixing agent.
【0041】漂白剤としては、例えば鉄(III) 、
コバルト(III) 、クロム(VI)、銅(II)な
どの多価金属の化合物や錯塩、過酸類、キノン類、ニト
ロ化合物等が用いられる。代表的漂白剤としては、フェ
リシアン化物;重クロム酸塩;鉄(III) もしくは
コバルト(III) の有機錯塩、例えばエチレンジア
ミン四酢酸、ジエチレントリアミン五酢酸、シクロヘキ
サンジアミン四酢酸、メチルイミノ二酢酸、1,3−ジ
アミノプロパン四酢酸、グリコールエーテルジアミン四
酢酸などのアミノポリカルボン酸類もしくはクエン酸、
酒石酸、リンゴ酸などの錯塩;過硫酸塩;臭素酸塩;過
マンガン酸塩;ニトロベンゼン類などを用いることがで
きる。これらのうち、エチレンジアミン四酢酸鉄(II
I) 錯塩を始めとするアミノポリカルボン酸鉄(II
I) 錯塩および過硫酸塩は、迅速処理および環境汚染
防止の観点から好ましい。さらに、アミノポリカルボン
酸鉄(III) 錯塩は、漂白液においても、漂白定着
液においても特に有用である。Examples of bleaching agents include iron (III),
Compounds and complex salts of polyvalent metals such as cobalt (III), chromium (VI), and copper (II), peracids, quinones, nitro compounds, and the like are used. Typical bleaching agents include ferricyanide; dichromate; organic complex salts of iron (III) or cobalt (III), such as ethylenediaminetetraacetic acid, diethylenetriaminepentaacetic acid, cyclohexanediaminetetraacetic acid, methyliminodiacetic acid, 1,3 -Aminopolycarboxylic acids such as diaminopropanetetraacetic acid and glycol ether diaminetetraacetic acid, or citric acid,
Complex salts such as tartaric acid and malic acid; persulfates; bromates; permanganates; nitrobenzenes and the like can be used. Among these, iron(II) ethylenediaminetetraacetate
I) Aminopolycarboxylic acid iron (II) including complex salts
I) Complex salts and persulfates are preferred from the viewpoint of rapid processing and prevention of environmental pollution. Additionally, aminopolycarboxylic acid iron(III) complexes are particularly useful in both bleach and bleach-fix solutions.
【0042】漂白定着液20中の漂白剤の含有量は特に
限定されないが、0.05〜1モル/l程度、特に0.
1〜0.5モル/l程度とするのが好ましい。The content of bleach in the bleach-fix solution 20 is not particularly limited, but is about 0.05 to 1 mol/l, particularly 0.05 to 1 mol/l.
It is preferably about 1 to 0.5 mol/l.
【0043】定着剤としては、チオ硫酸塩、チオシアン
酸塩、チオエーテル系化合物、チオ尿素類、多量の沃化
物塩等を挙げることができるが、チオ硫酸塩が一般的で
あり、特に、チオ硫酸ナトリウムやチオ硫酸アンモニウ
ムが最も典型的である。Examples of the fixing agent include thiosulfates, thiocyanates, thioether compounds, thioureas, large amounts of iodide salts, etc., but thiosulfates are common, and thiosulfates are particularly Sodium and ammonium thiosulfate are the most typical.
【0044】漂白定着液20中の定着剤の含有量は特に
限定されないが、0.1〜4モル/l程度、特に0.2
〜2モル/l程度とするのが好ましい。The content of the fixing agent in the bleach-fixing solution 20 is not particularly limited, but is approximately 0.1 to 4 mol/l, particularly 0.2
It is preferable to set it to about 2 mol/l.
【0045】このような漂白定着液20のpHは、3.
5〜8.5程度、特に、4.5〜8.0程度が好ましい
。The pH of the bleach-fixing solution 20 is 3.
It is preferably about 5 to 8.5, particularly about 4.5 to 8.0.
【0046】調整液30は、酸化防止剤(還元剤)を含
有している。漂白定着槽2Bから引き上げられた感光材
料Sには、比較的高濃度の銀イオンを含む漂白定着液2
0が付着しているが、水洗槽4Aへ進入する前に調整液
30に浸漬され、酸化防止剤の作用により、チオ硫酸銀
が水で希釈されても銀が容易に遊離しないため、水洗槽
4A〜4C内の水洗水40中に銀の沈殿物が生じるのが
防止される。The adjustment liquid 30 contains an antioxidant (reducing agent). The photosensitive material S pulled up from the bleach-fix tank 2B is filled with a bleach-fix solution 2 containing a relatively high concentration of silver ions.
However, before entering the washing tank 4A, it is immersed in the adjustment solution 30, and due to the action of the antioxidant, even if silver thiosulfate is diluted with water, silver is not easily liberated. Precipitation of silver in the wash water 40 in 4A to 4C is prevented.
【0047】また、水洗水40中に銀の沈殿物が生じな
いため、水洗後の感光材料Sにおいては、残色が少なく
なり、また、水洗水の補充量もより低減することができ
るという副次的効果もある。Further, since no silver precipitates are formed in the washing water 40, there is less residual color in the photosensitive material S after washing, and the amount of washing water to be replenished can be further reduced. There are also secondary effects.
【0048】調整液30中の酸化防止剤としては、亜硫
酸ナトリウム、亜硫酸アンモニウム、亜硫酸カリウムの
ような亜硫酸塩、重亜硫酸アンモニウム、重亜硫酸カリ
ウムのような重亜硫酸塩、ホルムアルデヒドバイサルフ
ァイト、サクシンアルデヒドバイサファイトのようなカ
ルボニルバイサルファイト、エチルスルフィン酸、プロ
ピルフルフィン酸のようなアルキルスルフィル酸、ベン
ゼンスルフィン酸、トルエンスルフィン酸、ベンゼンジ
スルフィン酸のようなアルキルベンゼンスルフィン酸、
トリエタノールアミン、ジエタノールアミンのようなア
ミン類等が挙げられ、これらのうちの1種または2種以
上を任意に組み合わせて用いることができる。Antioxidants in the adjustment solution 30 include sulfites such as sodium sulfite, ammonium sulfite, and potassium sulfite, bisulfites such as ammonium bisulfite and potassium bisulfite, formaldehyde bisulfite, and succinic aldehyde bisulfite. carbonyl bisulfite, such as ethyl sulfinic acid, alkyl sulfuric acid, such as propyl sulfinic acid, alkyl benzene sulfinic acid, such as benzene sulfinic acid, toluene sulfinic acid, benzenedisulfinic acid,
Examples include amines such as triethanolamine and diethanolamine, and one or more of these may be used in any combination.
【0049】調整槽3内の調整液30中の酸化防止剤の
含有量は諸条件により変動するが、通常、0.001〜
1モル/1程度、特に0.01〜0.1モル/1程度と
するのが好ましい。The content of the antioxidant in the adjustment liquid 30 in the adjustment tank 3 varies depending on various conditions, but is usually between 0.001 and 30%.
It is preferably about 1 mol/1, particularly about 0.01 to 0.1 mol/1.
【0050】なお、漂白定着液20中にも、前記酸化防
止剤と同様の成分が含まれており、感光材料Sにより漂
白定着液20が調整槽3へ持ち込まれるが、この持ち込
みによる量ではとうてい十分ではなく、よって、調整槽
3へ積極的に酸化防止剤を添加して前記含有量を維持す
る必要がある。Note that the bleach-fix solution 20 also contains the same components as the antioxidant, and the bleach-fix solution 20 is brought into the adjustment tank 3 by the photosensitive material S, but the amount brought in is very small. Therefore, it is necessary to actively add antioxidant to the adjustment tank 3 to maintain the above content.
【0051】また、調整液30の酸化還元電位は、−2
50〜−50mV程度、特に−200〜−100mV程
度であるのが好ましい。酸化還元電位が−250mV未
満であると、チオ硫酸銀の銀イオンが還元されて沈殿物
が生じ、また、−50mVを越えると、チオ硫酸銀が遊
離して銀や硫化銀として沈殿してくるからである。Further, the oxidation-reduction potential of the adjustment liquid 30 is -2
It is preferably about 50 to -50 mV, particularly about -200 to -100 mV. If the redox potential is less than -250 mV, silver ions in silver thiosulfate are reduced and a precipitate is formed, and if it exceeds -50 mV, silver thiosulfate is liberated and precipitates as silver or silver sulfide. It is from.
【0052】なお、この酸化還元電位の測定方法として
は、例えば、PHメーター(堀場製作所社製のカスタニ
ーLAB、MシリーズM−13)に白金電極を差し込ん
でORP(酸化還元電位)測定をする方法が挙げられる
。[0052] As a method for measuring this oxidation-reduction potential, for example, a method of inserting a platinum electrode into a PH meter (Castany LAB, M series M-13 manufactured by Horiba, Ltd.) and measuring ORP (oxidation-reduction potential). can be mentioned.
【0053】水洗水40としては、水道水、イオン交換
水、蒸留水等が用いられる。[0053] As the washing water 40, tap water, ion exchange water, distilled water, etc. are used.
【0054】なお、本発明における水洗水は、狭義の水
洗水のみではなく、安定化剤を添加した安定液も含む概
念である。Note that the washing water in the present invention is a concept that includes not only washing water in a narrow sense but also a stabilizing liquid to which a stabilizer has been added.
【0055】この安定剤としては、ホルマリンに代表さ
れるアルデヒド化合物、色素安定化に適した膜pHに調
整するための緩衝剤、アンモニウム化合物等が挙げられ
る。Examples of the stabilizer include aldehyde compounds typified by formalin, buffers for adjusting the pH of the membrane suitable for dye stabilization, and ammonium compounds.
【0056】水洗水40には、例えば、各種殺菌剤、防
菌剤、防カビ剤、界面活性剤、蛍光増白剤、硬膜剤、キ
レート剤、マグネシウムやビスマスの化合物、脱色剤の
ような各種添加剤が添加されていてもよい。The washing water 40 contains, for example, various disinfectants, antibacterial agents, antifungal agents, surfactants, optical brighteners, hardeners, chelating agents, compounds of magnesium and bismuth, and decolorizing agents. Various additives may be added.
【0057】このうち、殺菌剤、防菌剤、防カビ剤とし
ては、文献「L.F.West. ”Water Qu
ality Criteria” Photo.
Sci. & Eng. Vol.9 No.6(19
65)、 M.W.Beach, ”Microbio
logical Growths in Motion
−picture Processing” SMPT
E Journal Vol.85, (1976)、
R.O.Deegan, ”Photo Proce
ssing Wash Water Biocides
”J. Imaging Tech10, No.6
(1984) 」、特開昭57−8542号、同57−
58143号、同58−105145号、同57−13
2146号、同58−18631号、同57−9753
0号、同57−157244号などに記載されているも
の、文献「R.T.Kreiman 著、J.Imag
e.Tech 10,(6)242頁(1984)」に
記載されたイソチアゾリン系化合物、文献「Resea
rch Disclosure 第205巻、No.
20526 (1981年、5月号)」および「同第2
28巻、No. 22845 (1983年、4月号)
」に記載されたイソチアゾリン系化合物、特開昭62
−209532号に記載された化合物、「防菌防ばいの
化学」堀口博著、三共出版(昭和57)、「防菌防ばい
技術ハンドブック」日本防菌防ばい学会・博報堂(昭和
61)に記載されているような化合物等が挙げられる。[0057] Among these, disinfectants, antibacterial agents, and antifungal agents are described in the literature "L.F. West." Water Qu.
ality Criteria” Photo.
Sci. & Eng. Vol. 9 No. 6 (19
65), M. W. Beach, “Microbio
Logical Growth in Motion
-picture Processing” SMPT
E Journal Vol. 85, (1976),
R. O. Deegan, “Photo Proce
ssing Wash Water Biocides
"J. Imaging Tech10, No.6
(1984)”, Japanese Patent Publication No. 57-8542, 57-
No. 58143, No. 58-105145, No. 57-13
No. 2146, No. 58-18631, No. 57-9753
No. 0, No. 57-157244, etc., the literature "Author: R.T. Kreiman, J.Imag
e. Tech 10, (6) p. 242 (1984), isothiazoline compounds described in the literature “Resea
rch Disclosure Volume 205, No.
20526 (May 1981 issue)” and “Issue No. 2
Volume 28, No. 22845 (April 1983)
Isothiazoline compounds described in ”, JP-A-62
- Compounds described in No. 209532, "Chemistry of Bacterial and Bacterial Prevention" by Hiroshi Horiguchi, Sankyo Publishing (1982), "Handbook of Bacterial and Bacterial Technology", Japanese Society of Bacterial and Bacterial Prevention, Hakuhodo (1988) Examples include compounds such as those described above.
【0058】このような水洗水40のpHは、5〜9.
5程度、特に、6〜8.5程度が好ましい。The pH of such washing water 40 is 5 to 9.
It is preferably about 5, particularly about 6 to 8.5.
【0059】図中示されていない現像液(特に、発色現
像液)の組成は特に限定されないが、好ましくは芳香族
第一級アミン系現像主薬を主成分とするアルカリ性水溶
液である。The composition of the developer (particularly the color developer) not shown in the figure is not particularly limited, but is preferably an alkaline aqueous solution containing an aromatic primary amine developing agent as a main component.
【0060】この現像主薬としては、パラフェニレンジ
アミン系化合物が好ましく、代表例として3−メチル−
4−アミノ−N,N−ジエチルアニリン、3−メチル−
4−アミノ−N−エチル−N−(β−ヒドロキシエチル
)アニリン、3−メチル−4−アミノ−N−エチル−N
−(β−メタンスルホンアミドエチル)アニリン、3−
メチル−4−アミノ−N−エチル−N−(β−メトキシ
エチル)アニリンおよびこれらの硫酸塩、塩酸塩、リン
酸塩もしくはp−トルエンスルホン酸塩、さらにはこれ
らの塩の水和物等が挙げられる。The developing agent is preferably a p-phenylenediamine compound, and a typical example is 3-methyl-
4-amino-N,N-diethylaniline, 3-methyl-
4-amino-N-ethyl-N-(β-hydroxyethyl)aniline, 3-methyl-4-amino-N-ethyl-N
-(β-methanesulfonamidoethyl)aniline, 3-
Methyl-4-amino-N-ethyl-N-(β-methoxyethyl)aniline and their sulfates, hydrochlorides, phosphates or p-toluenesulfonates, as well as hydrates of these salts, etc. Can be mentioned.
【0061】また、現像液は、アルカリ金属の炭酸塩、
ホウ酸塩もしくはリン酸塩のようなpH緩衝剤;臭化物
、沃化物、ベンズイミダゾール類、ベンゾチアゾール類
もしくはメルカプト化合物のような現像抑制剤またはカ
ブリ防止剤;ヒドロキシルアミン、トリエタノールアミ
ン、ジエチルヒドロキシルアミン、カテコールスルホン
酸類、トリエチレンジアミン(1,4−ジアザビシクロ
[2,2,2]オクタン)類、亜硫酸塩または重亜硫酸
塩のような保恒剤;ジエチレングリコールのような有機
溶剤;ベンジルアルコール、ポリエチレングリコール、
四級アンモニウム塩、アミン類、チオシアン酸塩、3,
6−チアオクタン−1,8−ジオールのような現像促進
剤;色素形成カプラー;競争カプラー;ナトリウムボロ
ンハイドライドのような造核剤;1−フェニル−3−ピ
ラゾリドンのような補助現像薬;粘性付与剤;エチレン
ジアミン四酢酸、ニトリロ三酢酸、シクロヘキサンジア
ミン四酢酸、イミノ二酢酸、N−ヒドロキシメチルエチ
レンジアミン三酢酸、ジエチレントリアミン五酢酸、ト
リエチレンテトラミン六酢酸および特開昭58−195
845号記載の化合物などに代表されるアミノポリカル
ボン酸、1−ヒドロキシエチリデン−1,1’−ジホス
ホン酸、リサーチ・ディスクロージャー18170(1
979年5月)記載の有機ホスホン酸、アミノトリス(
メチレンホスホン酸)、エチレンジアミン−N,N,N
’,N’−テトラメチレンホスホン酸などのアミノホス
ホン酸、特開昭52−102726号、同53−427
30号、同54−121127号、同55−4024号
、同55−4025号、同55−126241号、同5
5−65955号、同55−65956号およびリサー
チ・ディスクロージャー18170(1979年5月)
記載のホスホノカルボン酸などのキレート剤を含有して
いてもよい。[0061] The developer may also contain alkali metal carbonate,
pH buffering agents such as borates or phosphates; development inhibitors or antifoggants such as bromides, iodides, benzimidazoles, benzothiazoles or mercapto compounds; hydroxylamine, triethanolamine, diethylhydroxylamine , catechol sulfonic acids, triethylenediamine (1,4-diazabicyclo[2,2,2]octane), preservatives such as sulfites or bisulfites; organic solvents such as diethylene glycol; benzyl alcohol, polyethylene glycol,
Quaternary ammonium salts, amines, thiocyanates, 3,
Development accelerators such as 6-thiaoctane-1,8-diol; dye-forming couplers; competitive couplers; nucleating agents such as sodium boron hydride; auxiliary developers such as 1-phenyl-3-pyrazolidone; viscosity-imparting agents. ; ethylenediaminetetraacetic acid, nitrilotriacetic acid, cyclohexanediaminetetraacetic acid, iminodiacetic acid, N-hydroxymethylethylenediaminetriacetic acid, diethylenetriaminepentaacetic acid, triethylenetetraminehexaacetic acid, and JP-A-1987-195
Aminopolycarboxylic acid represented by the compound described in No. 845, 1-hydroxyethylidene-1,1'-diphosphonic acid, Research Disclosure No. 18170 (1
Aminotris (May 979), an organic phosphonic acid described in
methylenephosphonic acid), ethylenediamine-N,N,N
Aminophosphonic acids such as ',N'-tetramethylenephosphonic acid, JP-A-52-102726, JP-A-53-427
No. 30, No. 54-121127, No. 55-4024, No. 55-4025, No. 55-126241, No. 5
No. 5-65955, No. 55-65956 and Research Disclosure 18170 (May 1979)
It may also contain a chelating agent such as the phosphonocarboxylic acids described.
【0062】現像液中の現像主薬の含有量は特に限定さ
れないが、0.1〜100モル/l程度、特に0.5〜
30ミリモル/l程度とするのが好ましい。The content of the developing agent in the developer is not particularly limited, but is approximately 0.1 to 100 mol/l, particularly 0.5 to 100 mol/l.
It is preferably about 30 mmol/l.
【0063】このような現像液のpHは、通常7以上で
あり、最も一般的には、pHが9〜13程度である。[0063] The pH of such a developer is usually 7 or more, most commonly about 9 to 13.
【0064】図2は、本発明のハロゲン化銀写真感光材
料の処理方法を実施するための感光材料処理装置の他の
構成例を模式的に示す断面側面図である。以下、前記感
光材料処理装置1Aと同様の構成については、その説明
を省略し、相違点について説明する。FIG. 2 is a cross-sectional side view schematically showing another example of the configuration of a photosensitive material processing apparatus for carrying out the method of processing silver halide photographic light-sensitive materials of the present invention. Hereinafter, descriptions of the same configurations as the photosensitive material processing apparatus 1A will be omitted, and differences will be described.
【0065】図2に示す感光材料処理装置1Bは、前記
漂白定着槽2Aおよび2Bに代え、複数の処理室を幅狭
の通路で順次連結してなる漂白定着槽5を設置したもの
である。The photosensitive material processing apparatus 1B shown in FIG. 2 is equipped with a bleach-fix tank 5 in which a plurality of processing chambers are successively connected through narrow passages in place of the bleach-fix tanks 2A and 2B.
【0066】漂白定着槽5は、槽本体51を有し、この
槽本体51内には、所望の形状のブロック状の部材(以
下、ブロック体という)52がラック(図示せず)に取
り付けられた状態で挿入されている。The bleach-fixing tank 5 has a tank main body 51, and inside the tank main body 51, a block-shaped member (hereinafter referred to as a block member) 52 having a desired shape is attached to a rack (not shown). It is inserted in the same state.
【0067】これにより、感光材料Sを脱銀処理するた
めの空間である5つの処理室5a、5b、5c、5dお
よび5eと、それらのうちの上下に隣接する処理室同士
を連結する幅狭の通路53、54、55および56とが
形成される。Thereby, the five processing chambers 5a, 5b, 5c, 5d, and 5e, which are spaces for desilvering the photosensitive material S, and the narrow width space connecting the processing chambers that are vertically adjacent to each other. Passages 53, 54, 55 and 56 are formed.
【0068】また、処理室5aおよび5eの上部には、
それぞれ感光材料Sを搬入および搬出するための同様の
通路57および58が形成される。[0068] Furthermore, in the upper part of the processing chambers 5a and 5e,
Similar passages 57 and 58 are formed for loading and unloading the photosensitive material S, respectively.
【0069】これらの通路53〜58の幅(有効スリッ
ト巾)は、感光材料Sの厚さの5〜40倍程度すなわち
、0.5〜5mm程度とするのが好ましい。このような
幅とすることによって、感光材料Sは支障なく搬送され
る。The width (effective slit width) of these passages 53 to 58 is preferably about 5 to 40 times the thickness of the photosensitive material S, that is, about 0.5 to 5 mm. With such a width, the photosensitive material S can be transported without any trouble.
【0070】通路53〜58の長さは10〜200mm
、好ましくは20〜60mm程度とするのがよい。[0070] The length of the passages 53 to 58 is 10 to 200 mm.
, preferably about 20 to 60 mm.
【0071】図示の構成において、処理室一室当たりの
容積は20〜3000ml程度、特に、100〜800
ml程度とするのが好ましい。In the illustrated configuration, the volume per processing chamber is approximately 20 to 3000 ml, particularly 100 to 800 ml.
It is preferable to set it to about ml.
【0072】なお、処理室の形状や数は特に限定されな
いが、処理室数は、3〜20個程度、特に5〜10個程
度が好ましい。The shape and number of processing chambers are not particularly limited, but the number of processing chambers is preferably about 3 to 20, particularly about 5 to 10.
【0073】この漂白定着槽5では、感光材料Sは、各
処理室内に設置されるローラやガイド等で構成される搬
送手段(図示せず)により搬送され、通路57、処理室
5a、通路53、処理室5b、通路54、処理室5c、
通路55、処理室5d、通路56、処理室5eおよび通
路58を順次通過する。In the bleach-fix tank 5, the photosensitive material S is transported by a transport means (not shown) consisting of rollers, guides, etc. installed in each processing chamber, and passes through a passage 57, a processing chamber 5a, and a passage 53. , processing chamber 5b, passage 54, processing chamber 5c,
The passage 55, the processing chamber 5d, the passage 56, the processing chamber 5e, and the passage 58 are sequentially passed through.
【0074】また、この漂白定着槽5では、図2中矢印
で示すように、新たな漂白定着液20は、感光材料Sが
最初に通過する処理室5aに供給され、疲労・劣化した
漂白定着液20は、感光材料Sが最後に通過する処理室
5eから排出される。従って漂白定着液20は、感光材
料Sの進行方向と同方向、すなわち、処理室5a、通路
53、処理室5b、通路54、処理室5c、通路55、
処理室5d、通路56および処理室5eの順に流れる。Further, in this bleach-fixing tank 5, as shown by the arrow in FIG. The liquid 20 is discharged from the processing chamber 5e through which the photosensitive material S passes last. Therefore, the bleach-fix solution 20 flows in the same direction as the traveling direction of the photosensitive material S, that is, the processing chamber 5a, passage 53, processing chamber 5b, passage 54, processing chamber 5c, passage 55,
It flows in the order of processing chamber 5d, passage 56 and processing chamber 5e.
【0075】この場合、各通路53〜56を流れる漂白
定着液20の量は、漂白定着液20の補充にほぼ等しく
、また、各通路53〜56が幅狭であることから、漂白
定着液の逆流や隣接処理室間での成分の拡散はほとんど
生じず、よって、各処理室5a、5b、5c、5dおよ
び5eにおいては、この順に漂白定着液の疲労、劣化の
度合が大きくなる(銀イオン濃度が大きくなる)という
液組成勾配(濃度勾配)が形成され、維持される。この
場合、最終の処理室5e内の漂白定着液20中の銀イオ
ン濃度は、10〜40g/l 程度である。In this case, the amount of bleach-fix solution 20 flowing through each passage 53-56 is approximately equal to the replenishment of bleach-fix solution 20, and since each passage 53-56 is narrow, the amount of bleach-fix solution 20 is There is almost no backflow or diffusion of components between adjacent processing chambers, and therefore, in each processing chamber 5a, 5b, 5c, 5d, and 5e, the degree of fatigue and deterioration of the bleach-fix solution increases in this order (silver ion A liquid composition gradient (concentration gradient) is formed and maintained. In this case, the silver ion concentration in the bleach-fix solution 20 in the final processing chamber 5e is about 10 to 40 g/l.
【0076】このような液組成勾配が形成された漂白定
着槽5で感光材料Sを処理することにより、脱銀効率が
より向上し、これに伴い、漂白定着液20の補充量をよ
り低減することができる。また、漂白定着槽5を図示の
ような多室処理槽とすることにより、装置1Bの小型化
が図れる。By processing the photosensitive material S in the bleach-fix tank 5 in which such a solution composition gradient is formed, the desilvering efficiency is further improved, and accordingly, the amount of replenishment of the bleach-fix solution 20 is further reduced. be able to. Further, by making the bleach-fixing tank 5 a multi-chamber processing tank as shown in the figure, the apparatus 1B can be downsized.
【0077】なお、ブロック体52の構成材料としては
、例えば、ポリエチレン、ポリプロピレン、ポリフェニ
レンオキサイド(PPO)、ABS樹脂、フェノール樹
脂、ポリエステル樹脂、ポリウレタン樹脂等のプラスチ
ック、アルミナ等のセラミックスまたはステンレス、チ
タニウム等の各種金属等の硬質材料が挙げられる。特に
、成形性に優れ、軽量で、十分な強度を有するという点
から、ポリプロピレン、PPO、ABS樹脂等のプラス
チックスが好ましい。The constituent materials of the block body 52 include, for example, plastics such as polyethylene, polypropylene, polyphenylene oxide (PPO), ABS resin, phenol resin, polyester resin, and polyurethane resin, ceramics such as alumina, stainless steel, titanium, etc. Examples include hard materials such as various metals. In particular, plastics such as polypropylene, PPO, and ABS resin are preferred because they have excellent moldability, are lightweight, and have sufficient strength.
【0078】各通路53〜56には、この通路を実質的
に遮蔽しうるブレードが設置されているのが好ましい。[0078] Preferably, each passage 53-56 is provided with a blade capable of substantially shielding this passage.
【0079】このブレードは、その基部がブロック体5
2に固定された薄肉部材、特に先端に向ってその厚さが
漸減する形状の薄肉部材で構成されており、感光材料S
の非通過時には、両ブレードの先端部同士が密着して、
液体の流通を実質的に遮断する(シール機能)。また、
感光材料Sの通過時には、感光材料Sの先端により、密
着していた両ブレードの先端部が押し広げられ、この間
を感光材料Sが通過する。このとき、感光材料Sの表面
に付着した液は、ブレードの先端部との摺動により拭い
取られ(スクイズ機能)、次の処理室や次の処理槽への
持込みが防止される。This blade has a block body 5 at its base.
It consists of a thin-walled member fixed to the photosensitive material S, especially a thin-walled member whose thickness gradually decreases toward the tip.
When the blade does not pass, the tips of both blades are in close contact with each other,
Virtually blocks the flow of liquid (sealing function). Also,
When the photosensitive material S passes, the tips of the two blades that are in close contact with each other are pushed apart by the tip of the photosensitive material S, and the photosensitive material S passes between them. At this time, the liquid adhering to the surface of the photosensitive material S is wiped off by sliding with the tip of the blade (squeeze function), and is prevented from being brought into the next processing chamber or the next processing tank.
【0080】ブレードの構成材料としては、例えば、天
然ゴム、イソプレンゴム、クロロプレンゴム、ブチルゴ
ム、フッ素ゴム、ブタジエンゴム、スチレンブタジエン
ゴム、エチレンプロピレンゴム、シリコーンゴム、クロ
ロスルホン化ポリエチレン、ウレタンゴム、多硫化ゴム
、アクリルゴム、エピクロルヒドリンゴム等の各種ゴム
、シリコーン樹脂、軟質ポリ塩化ビニル、ポリエチレン
(特に、中密度または低密度PE)、ポリプロピレン、
フッ素樹脂、アイオノマー樹脂、サーモラン、サンプレ
ーン、ミラストマー、ハイトレルのようなエラストマー
等の軟質樹脂が挙げられる。Examples of the constituent materials of the blade include natural rubber, isoprene rubber, chloroprene rubber, butyl rubber, fluororubber, butadiene rubber, styrene butadiene rubber, ethylene propylene rubber, silicone rubber, chlorosulfonated polyethylene, urethane rubber, and polysulfide rubber. Rubber, various rubbers such as acrylic rubber and epichlorohydrin rubber, silicone resin, soft polyvinyl chloride, polyethylene (especially medium density or low density PE), polypropylene,
Examples include soft resins such as fluororesins, ionomer resins, and elastomers such as Thermolan, Sunplane, Milastomer, and Hytrel.
【0081】感光材料Sがブレードと摺動しても、乳剤
面のキズ付等の悪影響はほとんど生じないが、これが無
視できない場合、または摺動抵抗のさらなる減少を図る
場合には、ブレードの内側表面に平滑化処理を施し、ま
たはフッ素樹脂、ポリテトラフルオロエチレン(テフロ
ン)等の潤滑剤をコーティングする等の表面処理を施す
こともできる。Even if the photosensitive material S slides on the blade, there will hardly be any adverse effects such as scratches on the emulsion surface, but if this cannot be ignored or if the sliding resistance is to be further reduced, the inside of the blade may be It is also possible to perform a surface treatment such as smoothing the surface or coating it with a lubricant such as fluororesin or polytetrafluoroethylene (Teflon).
【0082】ブレードの設置角度(感光材料Sとのなす
角)は、平均10〜80°程度、特に、平均30〜60
°程度とするのが好ましい。The installation angle of the blade (the angle formed with the photosensitive material S) is about 10 to 80 degrees on average, especially about 30 to 60 degrees on average.
It is preferable to set it to about .
【0083】ブレード同士の接触面圧は、10〜200
0g/cm2 程度、特に、100〜1000g/cm
2 程度に設定するのが好ましい。このような接触面圧
とすることにより、一層良好なスクイズ機能およびシー
ル機能が得られる。[0083] The contact pressure between the blades is 10 to 200
About 0g/cm2, especially 100 to 1000g/cm
It is preferable to set it to about 2. With such a contact surface pressure, even better squeezing and sealing functions can be obtained.
【0084】このようなブレードを各通路53〜56に
設置することにより、ブレードの前記シール機能および
スクイズ機能が発揮され、前述した各処理室5a〜5e
における液組成勾配がより一層良好に維持される。特に
、感光材料Sの処理を長時間休止し、その後処理を再開
した場合でも、前記組成勾配が維持されているため、良
好な写真性が得られる。[0084] By installing such blades in each of the passages 53 to 56, the sealing function and squeezing function of the blades are exhibited, and the above-mentioned processing chambers 5a to 5e are
The liquid composition gradient in is maintained even better. In particular, even when the processing of the photosensitive material S is stopped for a long time and then restarted, the composition gradient is maintained, so that good photographic properties can be obtained.
【0085】感光材料処理装置1Bにおいては、調整槽
3および水洗槽4Aの境界の槽壁に、開口45が形成さ
れており、水洗槽4A内の水洗水40が開口45を経て
調整槽3内に流れ込むようになっている。In the photosensitive material processing apparatus 1B, an opening 45 is formed in the tank wall at the boundary between the adjustment tank 3 and the washing tank 4A, and the washing water 40 in the washing tank 4A flows into the adjustment tank 3 through the opening 45. It is designed to flow into the
【0086】この水洗水40の流入により、調整槽3内
の調整液30は、希釈される。従って、給液口31から
補充される調整液30は、この希釈を考慮して調整液の
濃縮液とするのが好ましい。[0086] Due to the inflow of the washing water 40, the adjustment liquid 30 in the adjustment tank 3 is diluted. Therefore, it is preferable that the adjustment liquid 30 replenished from the liquid supply port 31 be a concentrated adjustment liquid in consideration of this dilution.
【0087】なお、感光材料処理装置1Bにおいて、調
整槽3の構造を多室処理槽とすることもでき、この場合
には、調整の効果がより向上する。Note that in the photosensitive material processing apparatus 1B, the structure of the adjustment tank 3 can be made into a multi-chamber processing tank, and in this case, the adjustment effect is further improved.
【0088】図3は、本発明のハロゲン化銀写真感光材
料の処理方法を実施するための感光材料処理装置の他の
構成例を模式的に示す断面側面図である。以下、前記感
光材料処理装置1Aまたは1Bと同様の構成については
、その説明を省略し、相違点について説明する。FIG. 3 is a cross-sectional side view schematically showing another example of the configuration of a photosensitive material processing apparatus for carrying out the method of processing silver halide photographic light-sensitive materials of the present invention. Hereinafter, descriptions of the same configurations as those of the photosensitive material processing apparatus 1A or 1B will be omitted, and differences will be described.
【0089】図3に示す感光材料処理装置1Cは、前記
漂白定着槽5を用いるとともに、前記水洗槽4A〜4C
に代え、複数の処理室を幅狭の通路で順次連結してなる
水洗槽6を設置したものである。The photosensitive material processing apparatus 1C shown in FIG. 3 uses the bleach-fix tank 5 and the washing tanks 4A to 4C.
Instead, a washing tank 6 is installed in which a plurality of processing chambers are sequentially connected through narrow passages.
【0090】水洗槽6は、槽本体61を有し、この槽本
体61内には、所望の形状の前記と同様の材料よりなる
ブロック体62がラック(図示せず)に取り付けられた
状態で挿入されている。The washing tank 6 has a tank main body 61, and inside the tank main body 61, a block body 62 made of the same material as described above and having a desired shape is attached to a rack (not shown). It has been inserted.
【0091】これにより、感光材料Sを水洗処理するた
めの空間である5つの処理室6a、6b、6c、6dお
よび6eと、それらのうちの上下に隣接する処理室同士
を連結する幅狭の通路63、64、65および66とが
形成される。Thereby, five processing chambers 6a, 6b, 6c, 6d and 6e, which are spaces for washing the photosensitive material S, and a narrow narrow space connecting the vertically adjacent processing chambers are formed. Passages 63, 64, 65 and 66 are formed.
【0092】また、処理室6aおよび6eの上部には、
それぞれ感光材料Sを搬入および搬出するための同様の
通路67および68が形成される。[0092] Moreover, in the upper part of the processing chambers 6a and 6e,
Similar passages 67 and 68 are formed for loading and unloading the photosensitive material S, respectively.
【0093】これらの通路63〜68の幅(有効スリッ
ト巾)や長さは前記通路53〜58と同様とするのが好
ましい。It is preferable that the widths (effective slit widths) and lengths of these passages 63 to 68 are the same as those of the passages 53 to 58.
【0094】図示の水洗槽6において、処理室一室当た
りの容積は20〜3000ml程度、特に、80〜80
0ml程度とするのが好ましい。In the illustrated washing tank 6, the volume per processing chamber is approximately 20 to 3000 ml, particularly 80 to 80 ml.
It is preferable to set it to about 0 ml.
【0095】この水洗槽6では、感光材料Sは、各処理
室内に設置されるローラやガイド等で構成される搬送手
段(図示せず)により搬送され、通路67、処理室6a
、通路63、処理室6b、通路64、処理室6c、通路
65、処理室6d、通路66、処理室6eおよび通路6
8を順次通過する。In this washing tank 6, the photosensitive material S is transported by a transport means (not shown) comprising rollers, guides, etc. installed in each processing chamber, and is transported through a passage 67 and a processing chamber 6a.
, passage 63, processing chamber 6b, passage 64, processing chamber 6c, passage 65, processing chamber 6d, passage 66, processing chamber 6e, and passage 6
8 in sequence.
【0096】また、この水洗槽6では、図3中矢印で示
すように、新たな水洗水40は、感光材料Sが最後に通
過する処理室6eに供給され、汚れた水洗水40は、感
光材料Sが最初に通過する処理室6aから排出される。
従って、水洗水40は、感光材料Sの進行方向と逆方向
、すなわち、処理室6e、通路66、処理室6d、通路
65、処理室6c、通路64、処理室6b、通路63お
よび処理室6aの順に流れる。Further, in this washing tank 6, as shown by the arrow in FIG. 3, new washing water 40 is supplied to the processing chamber 6e through which the photosensitive material S passes last, and the dirty washing water 40 is transferred The material S is discharged from the processing chamber 6a through which it passes first. Therefore, the washing water 40 flows in the direction opposite to the traveling direction of the photosensitive material S, that is, the processing chamber 6e, the passage 66, the processing chamber 6d, the passage 65, the processing chamber 6c, the passage 64, the processing chamber 6b, the passage 63, and the processing chamber 6a. flows in this order.
【0097】この場合、各通路53〜56を流れる水洗
水40の量は、水洗水40の補充量にほぼ等しく、また
、各通路63〜66が幅狭であることから、水洗水の逆
流や隣接処理室間での成分の拡散はほとんど生じず、よ
って、各処理室6a、6b、6c、6dおよび6eにお
いては、この順に水洗水の汚れの度合が大きくなるとい
う液組成勾配(濃度勾配)が形成され、維持される。In this case, the amount of washing water 40 flowing through each passage 53 to 56 is approximately equal to the amount of replenishment of washing water 40, and since each passage 63 to 66 is narrow, backflow of washing water and There is almost no diffusion of components between adjacent processing chambers, and therefore, in each processing chamber 6a, 6b, 6c, 6d, and 6e, a liquid composition gradient (concentration gradient) in which the degree of contamination of the washing water increases in this order. is formed and maintained.
【0098】このような液組成勾配が形成された水洗槽
6で感光材料Sを処理することにより、水洗効率がより
向上し、これに伴い、水洗水40の補充量をより低減す
ることができる。By processing the photosensitive material S in the washing tank 6 in which such a liquid composition gradient is formed, the washing efficiency is further improved, and accordingly, the amount of replenishment of the washing water 40 can be further reduced. .
【0099】また、漂白定着槽5および水洗槽6を図示
のような多室処理槽とすることにより、装置1Cのより
一層の小型化が図れる。Furthermore, by making the bleach-fixing tank 5 and the washing tank 6 into multi-chamber processing tanks as shown in the figure, the apparatus 1C can be further downsized.
【0100】なお、水洗槽6においても、各通路63〜
66に、前記と同様のブレードを設置するのが好ましい
。これにより、ブレードの前記シール機能およびスクイ
ズ機能が発揮され、各処理室6a〜6eにおける液組成
勾配がより一層良好に維持される。特に、感光材料Sの
処理を長時間休止し、その後処理を再開した場合でも、
前記液組成勾配が維持されているため良好な写真性が得
られる。[0100] Also in the washing tank 6, each passage 63 to
66 is preferably provided with a blade similar to that described above. Thereby, the sealing function and squeezing function of the blade are exhibited, and the liquid composition gradient in each of the processing chambers 6a to 6e is maintained even better. In particular, even if the processing of the photosensitive material S is stopped for a long time and then restarted,
Since the liquid composition gradient is maintained, good photographic properties can be obtained.
【0101】また、前述したような調整液30の作用に
より、水洗槽6内に銀の沈殿物が生じないため、写真性
に悪影響を与えず、特に、ブレードに銀の沈殿物が付着
することによる弊害(例えば、感光材料乳剤面やブレー
ド表面のキズ付き)が防止される。Furthermore, due to the effect of the adjustment liquid 30 as described above, no silver precipitate is generated in the washing tank 6, so that the photographic properties are not adversely affected, and in particular, the silver precipitate does not adhere to the blade. This prevents harmful effects (for example, scratches on the surface of the emulsion of the photosensitive material or the surface of the blade).
【0102】なお、感光材料処理装置1Cにおいても、
処理室6a内の水洗水40が調整槽3内に流れ込むよう
な構成としてもよい。[0102] Also in the photosensitive material processing apparatus 1C,
A configuration may be adopted in which the flushing water 40 in the processing chamber 6a flows into the adjustment tank 3.
【0103】図4は、本発明のハロゲン化銀写真感光材
料の処理方法を実施するための感光材料処理装置の他の
構成例を模式的に示す断面側面図である。同図に示す感
光材料処理装置1Dは、調整槽1Cにおいて、調整槽3
を省略し、漂白定着槽5と水洗槽6とを隣接して設置し
たものである。これにより、装置1Dのより一層の小型
化が図れる。FIG. 4 is a cross-sectional side view schematically showing another configuration example of a photosensitive material processing apparatus for carrying out the method of processing silver halide photographic light-sensitive materials of the present invention. The photosensitive material processing apparatus 1D shown in the same figure includes an adjustment tank 3 in an adjustment tank 1C.
is omitted, and a bleach-fix tank 5 and a washing tank 6 are installed adjacent to each other. This allows for further miniaturization of the device 1D.
【0104】この感光材料処理装置1Dにおいては、調
整液30は、水洗槽6の処理室6bに供給される。そし
て、調整液30および水洗水40の混合液が処理室6c
から排出される。従って、処理室6a内に調整液30が
満たされ、この処理室6aが主に前記調整槽としての機
能を果すこととなる。In this photosensitive material processing apparatus 1D, the adjustment liquid 30 is supplied to the processing chamber 6b of the washing tank 6. Then, the mixed liquid of the adjustment liquid 30 and the washing water 40 is supplied to the processing chamber 6c.
is discharged from. Therefore, the processing chamber 6a is filled with the adjustment liquid 30, and this processing chamber 6a mainly functions as the adjustment tank.
【0105】図5は、本発明のハロゲン化銀写真感光材
料の処理方法を実施するための感光材料処理装置の他の
構成例を模式的に示す断面側面図である。同図に示す感
光材料処理装置1Eは、前記感光材料処理装置1Dにお
いて、調整液30の供給箇所を変えたものである。FIG. 5 is a cross-sectional side view schematically showing another example of the configuration of a photosensitive material processing apparatus for carrying out the method of processing silver halide photographic light-sensitive materials of the present invention. A photosensitive material processing apparatus 1E shown in the figure is the same as the photosensitive material processing apparatus 1D, except that the supply location of the adjustment liquid 30 is changed.
【0106】すなわち、調整液30は、漂白定着槽5の
処理室5eに供給される。そして、調整液30および漂
白定着液20の混合液が処理室5dから排出される。従
って、処理室5e内に調整液30が満たされ、この処理
室5eが主に前記調整槽としての機能を果すこととなる
。That is, the adjustment liquid 30 is supplied to the processing chamber 5e of the bleach-fix tank 5. Then, the mixed liquid of the adjustment liquid 30 and the bleach-fix liquid 20 is discharged from the processing chamber 5d. Therefore, the processing chamber 5e is filled with the adjustment liquid 30, and this processing chamber 5e mainly functions as the adjustment tank.
【0107】なお、上記感光材料処理装置1Dおよび1
Eのように、多室処理槽の処理室へ調整液30を補充す
る場合、その補充量は、好ましくは前記補充量の100
〜30%程度、より好ましくは100〜60%程度とす
ることができる。[0107] Note that the photosensitive material processing apparatuses 1D and 1
When replenishing the processing chamber of the multi-chamber processing tank with the adjustment liquid 30 as in E, the replenishment amount is preferably 100% of the replenishment amount.
It can be about 30%, more preferably about 100 to 60%.
【0108】図6は、本発明のハロゲン化銀写真感光材
料の処理方法を実施するための感光材料処理装置の他の
構成例を模式的に示す断面側面図である。同図に示す感
光材料処理装置1Fは、前記感光材料処理装置1Cにお
いて、調整槽3の構成を変えたものである。FIG. 6 is a cross-sectional side view schematically showing another example of the configuration of a photosensitive material processing apparatus for carrying out the method of processing silver halide photographic light-sensitive materials of the present invention. The photosensitive material processing apparatus 1F shown in the figure is the same as the photosensitive material processing apparatus 1C, except that the configuration of the adjustment tank 3 is changed.
【0109】すなわち、感光材料処理装置1Fにおける
調整槽3’は、感光材料Sを調整液に浸漬するのではな
く、調整液30を、感光材料Sに吹きかけるタイプのも
のである。That is, the adjustment tank 3' in the photosensitive material processing apparatus 1F is of a type in which the photosensitive material S is not immersed in the adjustment liquid, but the adjustment liquid 30 is sprayed onto the photosensitive material S.
【0110】図6に示すように、調整槽3’の底部はテ
ーパ状をなし、その最下端部には、排液管34が接続さ
れている。As shown in FIG. 6, the bottom of the adjustment tank 3' has a tapered shape, and a drain pipe 34 is connected to the lowest end thereof.
【0111】また、調整槽3’の上部には、調整液30
を例えばシャワー状に噴出するノズル33が設置されて
いる。[0111] Further, the adjustment liquid 30 is placed in the upper part of the adjustment tank 3'.
For example, a nozzle 33 is installed to eject water in the form of a shower.
【0112】ノズル33より噴出した調整液30は、感
光材料Sの好ましくは乳剤面に吹きかけられる。その後
、調整液30は、調整槽底部のテーパに沿って流下し、
排液管34を経て排出される。The adjustment liquid 30 ejected from the nozzle 33 is preferably sprayed onto the emulsion surface of the photosensitive material S. After that, the adjustment liquid 30 flows down along the taper at the bottom of the adjustment tank,
The liquid is discharged through the drain pipe 34.
【0113】この場合、ノズル33からの調整液30の
噴出量は10〜20000ml/ 分程度、特に、10
0〜2000ml/ 分程度とするのが好ましい。In this case, the amount of the adjustment liquid 30 spouted from the nozzle 33 is about 10 to 20,000 ml/min, particularly about 10,000 ml/min.
It is preferable to set the flow rate to about 0 to 2000 ml/min.
【0114】このような調整槽3’では、排液管34へ
流入した調整液30を、ノズル33へ再び戻して再使用
するような循環系を構成してもよい。この場合には、調
整液30の使用量がより低減するので好ましい。[0114] In such a regulating tank 3', a circulation system may be constructed in which the regulating liquid 30 that has flowed into the drain pipe 34 is returned to the nozzle 33 for reuse. In this case, the amount of adjustment liquid 30 used is further reduced, which is preferable.
【0115】なお、上記感光材料処理装置1D、1Eお
よび1Fにおいても、漂白定着槽5および水洗槽6の各
通路53〜56および63〜66に、前記と同様のブレ
ード7を設置するのが好ましい。[0115] Also in the photosensitive material processing apparatuses 1D, 1E and 1F, it is preferable to install blades 7 similar to those described above in each of the passages 53-56 and 63-66 of the bleach-fixing tank 5 and the washing tank 6. .
【0116】なお、本発明では、感光材料Sと調整液と
を接触させる方法としては、前記調整液への浸漬や吹き
かけに限らず、その他、塗布、スプレー等いかなる方法
でもよい。In the present invention, the method of bringing the photosensitive material S into contact with the adjustment liquid is not limited to dipping or spraying into the adjustment liquid, but any other method such as coating or spraying may be used.
【0117】本発明において、処理対象とされる感光材
料Sの種類は特に限定されず、カラーおよび黒白感光材
料のいずれであってもよい。例えば、カラーネガフィル
ム、カラー反転フィルム、カラーポジフィルム、カラー
印画紙、カラー反転印画紙、製版用写真感光材料、X線
写真感光材料、黒白ネガフィルム、黒白印画紙、黒白反
転印画紙、マイクロ用感光材料等が挙げられる。In the present invention, the type of photosensitive material S to be processed is not particularly limited, and may be either a color photosensitive material or a black and white photosensitive material. For example, color negative film, color reversal film, color positive film, color photographic paper, color reversal photographic paper, photographic material for plate making, X-ray photographic material, black and white negative film, black and white photographic paper, black and white reversal photographic paper, photosensitive material for micro etc.
【0118】また、本発明は、例えば、自動現像機、湿
式の複写機、プリンタープロセッサー、ビデオプリンタ
ープロセッサー、写真プリント作成コインマシーン、検
版用カラーペーパー処理機等の各種感光材料処理装置に
適用することができる。The present invention is also applicable to various photosensitive material processing apparatuses, such as automatic developing machines, wet copying machines, printer processors, video printer processors, coin machines for making photo prints, and color paper processing machines for plate inspection. be able to.
【0119】以上、本発明の構成例を例示して説明した
が、本発明は、これらに限定されるものではない。[0119] Although the present invention has been described above by illustrating configuration examples, the present invention is not limited to these.
【0120】[0120]
【実施例】以下、本発明の具体的実施例について説明す
る。[Examples] Specific examples of the present invention will be described below.
【0121】(実施例1)図1に示す構造の感光材料処
理装置を作製し、これを用いて、露光後の感光材料に対
し現像処理を行なった。(Example 1) A photosensitive material processing apparatus having the structure shown in FIG. 1 was manufactured, and using this, a photosensitive material after exposure was subjected to development processing.
【0122】なお、感光材料の種類および各処理液の処
方は、下記表1に示す通りである。The types of photosensitive materials and the formulations of each processing solution are shown in Table 1 below.
【0123】また、現像時間、漂白定着時間、調整時間
および水洗時間は、それぞれ195秒、240秒、10
秒および120秒であった。[0123] The development time, bleach-fixing time, adjustment time and washing time were 195 seconds, 240 seconds, and 10 seconds, respectively.
seconds and 120 seconds.
【0124】また、現像液、調整液および水洗水の補充
量はそれぞれ、感光材料の巾35mm×24枚当たり、
45ml、30mlおよび50mlであり、漂白定着液
の補充量は、52ml/(Ag1g/m2)であった。[0124] The replenishment amounts of the developing solution, adjustment solution, and washing water are respectively per 35 mm wide x 24 sheets of photosensitive material.
The volumes were 45 ml, 30 ml, and 50 ml, and the replenishment amount of the bleach-fix solution was 52 ml/(Ag1 g/m2).
【0125】(実施例2)図2に示す構造の感光材料処
理装置を作製し、これを用いて、露光後の感光材料に対
し現像処理を行なった。(Example 2) A photosensitive material processing apparatus having the structure shown in FIG. 2 was manufactured, and using this, a photosensitive material after exposure was subjected to development processing.
【0126】なお、感光材料の種類および各処理液の処
方は、下記表1に示す通りである。The types of photosensitive materials and the formulations of each processing solution are shown in Table 1 below.
【0127】また、現像時間、定着時間、調整時間およ
び水洗時間は、それぞれ60秒、120秒、10秒およ
び90秒であった。Further, the development time, fixing time, adjustment time and water washing time were 60 seconds, 120 seconds, 10 seconds and 90 seconds, respectively.
【0128】また、現像液、調整液および水洗水の補充
量はそれぞれ、感光材料の巾35mm×24枚当たり、
15ml、20mlおよび100mlであり、定着液の
補充量は、35ml/(Ag1g/m2)であった。[0128] The replenishment amounts of the developing solution, adjusting solution, and washing water are respectively per 35 mm wide x 24 sheets of photosensitive material.
They were 15 ml, 20 ml, and 100 ml, and the replenishment amount of the fixer was 35 ml/(Ag1 g/m2).
【0129】(実施例3)図2に示す構造の感光材料処
理装置を作製し、これを用いて、露光後の感光材料に対
し現像処理を行なった。(Example 3) A photosensitive material processing apparatus having the structure shown in FIG. 2 was fabricated, and the photosensitive material after exposure was developed using the apparatus.
【0130】なお、感光材料の種類および各処理液の処
方は、下記表1に示す通りである。The types of photosensitive materials and the formulations of each processing solution are shown in Table 1 below.
【0131】また、現像時間、漂白定着時間、調整時間
および水洗時間は、それぞれ100秒、60秒、10秒
および60秒であった。The development time, bleach-fixing time, adjustment time and washing time were 100 seconds, 60 seconds, 10 seconds and 60 seconds, respectively.
【0132】また、現像液、調整液および水洗水の補充
量はそれぞれ、感光材料1m2当たり、290ml、3
0mlおよび364mlであり、漂白定着液の補充量は
、100ml/(Ag1g/m2)であった。[0132] The replenishment amounts of the developing solution, adjustment solution, and washing water are 290 ml and 3 ml, respectively, per 1 m2 of photosensitive material.
0 ml and 364 ml, and the replenishment amount of the bleach-fixing solution was 100 ml/(Ag1 g/m2).
【0133】(実施例4)図3に示す構造の感光材料処
理装置を作製し、これを用いて、露光後の感光材料に対
し現像処理を行なった。(Example 4) A photosensitive material processing apparatus having the structure shown in FIG. 3 was manufactured, and using this, a photosensitive material after exposure was subjected to development processing.
【0134】なお、感光材料の種類および各処理液の処
方は、下記表1に示す通りである。The types of photosensitive materials and the formulations of each processing solution are shown in Table 1 below.
【0135】また、現像時間、漂白定着時間、調整時間
および水洗時間は、それぞれ45秒、45秒、10秒お
よび90秒であった。The development time, bleach-fixing time, adjustment time and washing time were 45 seconds, 45 seconds, 10 seconds and 90 seconds, respectively.
【0136】また、現像液、調整液および水洗水の補充
量はそれぞれ、感光材料1m2当たり、109ml、3
0mlおよび363mlであり、漂白定着液の補充量は
、60ml/(Ag1g/m2)であった。[0136] The replenishment amounts of the developing solution, adjustment solution, and washing water are 109 ml and 3 ml per 1 m2 of photosensitive material, respectively.
0 ml and 363 ml, and the replenishment amount of the bleach-fixing solution was 60 ml/(Ag1 g/m2).
【0137】(実施例5)図4に示す構造の感光材料処
理装置を作製し、これを用いて、露光後の感光材料に対
し現像処理を行なった。(Example 5) A photosensitive material processing apparatus having the structure shown in FIG. 4 was manufactured, and using this, a photosensitive material after exposure was subjected to development processing.
【0138】なお、感光材料の種類および各処理液の処
方は、下記表1に示す通りである。The types of photosensitive materials and the formulations of each processing solution are shown in Table 1 below.
【0139】また、現像時間、漂白定着時間、調整時間
および水洗時間は、それぞれ45秒、45秒、10秒お
よび80秒であった。The development time, bleach-fixing time, adjustment time and washing time were 45 seconds, 45 seconds, 10 seconds and 80 seconds, respectively.
【0140】また、現像液、漂白定着液、調整液および
水洗水の補充量は実施例4と同様であった。The replenishment amounts of the developer, bleach-fix solution, adjustment solution and washing water were the same as in Example 4.
【0141】(実施例6)図4に示す構造の感光材料処
理装置を作製し、これを用いて、露光後の感光材料に対
し現像処理を行なった。(Example 6) A photosensitive material processing apparatus having the structure shown in FIG. 4 was manufactured, and using this, a photosensitive material after exposure was subjected to development processing.
【0142】なお、感光材料の種類および各処理液の処
方は、下記表1に示す通りである。The types of photosensitive materials and the formulations of each processing solution are shown in Table 1 below.
【0143】また、現像時間、定着時間、調整時間およ
び水洗時間は、それぞれ60秒、120秒、11秒およ
び90秒であった。The development time, fixing time, adjustment time and water washing time were 60 seconds, 120 seconds, 11 seconds and 90 seconds, respectively.
【0144】また、現像液、調整液および水洗水の補充
量は、それぞれ、感光材料の巾35mm×24枚当たり
、15ml、20mlおよび100mlであり、定着液
の補充量は、28ml/(Ag1g/m2)であった。[0144] The replenishment amounts of the developer, adjustment liquid, and washing water are 15 ml, 20 ml, and 100 ml, respectively, per 24 sheets of 35 mm wide photosensitive material, and the replenishment amount of the fixer is 28 ml/(Ag1g/ m2).
【0145】(実施例7)図5に示す構造の感光材料処
理装置を作製し、これを用いて、露光後の感光材料に対
し現像処理を行なった。(Example 7) A photosensitive material processing apparatus having the structure shown in FIG. 5 was manufactured, and the photosensitive material after exposure was developed using the apparatus.
【0146】なお、感光材料の種類および各処理液の処
方は、下記表1に示す通りである。The types of photosensitive materials and the formulations of each processing solution are shown in Table 1 below.
【0147】また、現像時間、漂白定着時間、調整時間
および水洗時間は、それぞれ45秒、40秒、5秒およ
び90秒であった。The development time, bleach-fixing time, adjustment time and washing time were 45 seconds, 40 seconds, 5 seconds and 90 seconds, respectively.
【0148】また、現像液、調整液および水洗水の補充
量は、それぞれ、感光材料の巾35mm×24枚当たり
、15ml、20mlおよび100mlであり、漂白定
着液の補充量は、40ml/(Ag1g/m2)であっ
た。[0148] The replenishment amounts of the developer, adjustment solution, and washing water are 15 ml, 20 ml, and 100 ml, respectively, per 24 sheets of 35 mm wide photosensitive material, and the replenishment amount of the bleach-fix solution is 40 ml/(1 g of Ag). /m2).
【0149】(実施例8)図6に示す構造の感光材料処
理装置を作製し、これを用いて、露光後の感光材料に対
し現像処理を行なった。(Example 8) A photosensitive material processing apparatus having the structure shown in FIG. 6 was fabricated, and the photosensitive material after exposure was developed using the apparatus.
【0150】なお、感光材料の種類および各処理液の処
方は、下記表1に示す通りである。The types of photosensitive materials and the formulations of each processing solution are shown in Table 1 below.
【0151】また、現像時間、漂白定着時間、調整時間
および水洗時間は、それぞれ195秒、650秒、20
秒および180秒であった。[0151] The development time, bleach-fixing time, adjustment time, and washing time were 195 seconds, 650 seconds, and 20 seconds, respectively.
seconds and 180 seconds.
【0152】また、現像液および水洗水の補充量は、そ
れぞれ、感光材料の巾35mm×24枚当たり、36m
lおよび72mlであり、漂白定着液の補充量は60m
l/(Ag1g/m2)であり、調整液の噴出量は、2
0ml/ 分とした。[0152] The replenishment amount of developer solution and washing water is 36 m per 35 mm wide x 24 sheets of photosensitive material, respectively.
1 and 72 ml, and the replenishment amount of bleach-fix solution is 60 ml.
l/(Ag1g/m2), and the ejection amount of the adjustment liquid is 2
It was set to 0 ml/min.
【0153】(比較例)調整槽内の調整液を空にした状
態で処理した以外は実施例4と同様とした。(Comparative Example) The same procedure as in Example 4 was carried out except that the treatment was carried out with the adjustment liquid in the adjustment tank empty.
【0154】[0154]
【表1】[Table 1]
【0155】上記実施例1〜8および比較例について、
感光材料の処理を1日当たり10時間行い、これを約1
カ月間継続した後、装置を停止し、水洗槽内、特に水洗
槽4Aまたは処理室6a内における銀の沈殿物の発生状
況を調べたところ、実施例1〜8では、いずれも沈殿物
の発生はなっかた。特に、多室水洗槽に設けたブレード
に沈殿物の付着はなく、よって、感光材料乳剤面にキズ
付は生じなかった。Regarding Examples 1 to 8 and Comparative Examples above,
Processing of photosensitive materials is carried out for 10 hours per day.
After the operation continued for a month, the apparatus was stopped and the occurrence of silver precipitates in the washing tank, particularly in the washing tank 4A or the processing chamber 6a, was investigated. Hanakata. In particular, there was no deposit attached to the blade provided in the multi-chamber water washing tank, and therefore no scratches occurred on the emulsion surface of the light-sensitive material.
【0156】これに対し、比較例では、多量の沈殿物が
生じ、特に処理室6b、6c内にも沈殿物があった。ま
た、沈殿物がブレードに付着していたため、感光材料乳
剤面にキズ付が生じた。On the other hand, in the comparative example, a large amount of precipitate was formed, especially in the processing chambers 6b and 6c. In addition, since the precipitate was attached to the blade, the surface of the emulsion of the light-sensitive material was scratched.
【0157】[0157]
【発明の効果】以上述べたように、本発明のハロゲン化
銀写真感光材料の処理方法によれば、水洗槽内に銀の沈
殿物が生じるのを防止することができる。その結果、良
好な写真性が得られるとともに、銀の沈殿物の付着によ
る感光材料やブレード表面等のキズ付きが防止される。
さらに、銀の沈殿物が生じないため、水洗槽のメインテ
ナンスが容易で、水洗水の補充量を低減することができ
、しかも、感光材料においては、増感色素、染料等が洗
い出されるため、残色が少なくなる。本発明は、特に、
処理工程の複雑なカラー感光材料の処理に有効である。As described above, according to the method for processing silver halide photographic materials of the present invention, it is possible to prevent the formation of silver precipitates in the washing tank. As a result, good photographic properties are obtained, and scratches on the photosensitive material, blade surface, etc. due to adhesion of silver precipitates are prevented. Furthermore, since no silver deposits are formed, maintenance of the washing tank is easy and the amount of washing water to be refilled can be reduced.Moreover, in light-sensitive materials, sensitizing dyes, dyes, etc. are washed out. There will be less residual color. The present invention particularly includes:
Effective for processing color photosensitive materials with complicated processing steps.
【図1】本発明のハロゲン化銀写真感光材料の処理方法
を実施するための感光材料処理装置の構成例を模式的に
示す断面側面図である。FIG. 1 is a cross-sectional side view schematically showing a configuration example of a photosensitive material processing apparatus for implementing the method of processing silver halide photographic light-sensitive materials of the present invention.
【図2】本発明のハロゲン化銀写真感光材料の処理方法
を実施するための感光材料処理装置の他の構成例を模式
的に示す断面側面図である。FIG. 2 is a cross-sectional side view schematically showing another configuration example of a photosensitive material processing apparatus for carrying out the method of processing silver halide photographic light-sensitive materials of the present invention.
【図3】本発明のハロゲン化銀写真感光材料の処理方法
を実施するための感光材料処理装置の他の構成例を模式
的に示す断面側面図である。FIG. 3 is a cross-sectional side view schematically showing another configuration example of a photosensitive material processing apparatus for carrying out the method of processing silver halide photographic light-sensitive materials of the present invention.
【図4】本発明のハロゲン化銀写真感光材料の処理方法
を実施するための感光材料処理装置の他の構成例を模式
的に示す断面側面図である。FIG. 4 is a cross-sectional side view schematically showing another configuration example of a photosensitive material processing apparatus for carrying out the method for processing silver halide photographic light-sensitive materials of the present invention.
【図5】本発明のハロゲン化銀写真感光材料の処理方法
を実施するための感光材料処理装置の他の構成例を模式
的に示す断面側面図である。FIG. 5 is a cross-sectional side view schematically showing another configuration example of a photosensitive material processing apparatus for carrying out the method for processing silver halide photographic light-sensitive materials of the present invention.
【図6】本発明のハロゲン化銀写真感光材料の処理方法
を実施するための感光材料処理装置の他の構成例を模式
的に示す断面側面図である。FIG. 6 is a cross-sectional side view schematically showing another configuration example of a photosensitive material processing apparatus for carrying out the method of processing silver halide photographic light-sensitive materials of the present invention.
1A、1B、1C、1D、1E、1F 感光材料
処理装置
2A、2B 漂白定着槽
20 漂白定着液
21 給液口
22 開口
23 排液口
3、3’ 調整槽
30 調整液
31 給液口
32 排液口
33 ノズル
34 排液管
4A、4B、4C 水洗槽
40 水洗水
41 給液口
42、43 開口
44 排液口
45 開口
5 漂白定着槽5a、5b、5
c、5d、5e 処理室51
槽本体
52 ブロック体
53、54、55、56、57、58 通路6
水洗槽
6a、6b、6c、6d、6e 処理室61
槽本体
62 ブロック体
63、64、65、66、67、68 通路S
感光材料1A, 1B, 1C, 1D, 1E, 1F Photosensitive material processing equipment 2A, 2B Bleach-fix tank 20 Bleach-fix solution 21 Liquid supply port 22 Opening 23 Drain port 3, 3' Adjustment tank 30 Adjustment liquid 31 Liquid supply port 32 Drain Liquid port 33 Nozzle 34 Drain pipes 4A, 4B, 4C Wash tank 40 Wash water 41 Liquid supply ports 42, 43 Opening 44 Drain port 45 Opening 5 Bleach-fix tank 5a, 5b, 5
c, 5d, 5e processing chamber 51
Tank body 52 Block bodies 53, 54, 55, 56, 57, 58 Passage 6
Washing tanks 6a, 6b, 6c, 6d, 6e Processing chamber 61
Tank body 62 Block bodies 63, 64, 65, 66, 67, 68 Passage S
photosensitive material
Claims (3)
、現像処理後、複数の脱銀用処理領域を順次通過させ、
少なくとも定着能を有する処理液に浸漬して脱銀処理し
、その後、複数の水洗用処理領域を順次通過させ、水洗
水に浸漬して水洗処理するハロゲン化銀写真感光材料の
処理方法であって、前記定着能を有する処理液は、前記
各脱銀用処理領域を前記ハロゲン化銀写真感光材料の進
行方向と同方向に流れており、前記脱銀処理と前記水洗
処理との間に、前記ハロゲン化銀写真感光材料を酸化防
止剤を含有する調整液に接触させることを特徴とするハ
ロゲン化銀写真感光材料の処理方法。Claim 1: After the exposed silver halide photographic material is developed, it is sequentially passed through a plurality of desilvering processing areas,
A method for processing a silver halide photographic material, which comprises immersing it in a processing solution having at least a fixing ability to perform desilvering treatment, and then sequentially passing through a plurality of washing treatment areas, and immersing it in washing water to perform washing treatment, the method comprising: , the processing liquid having fixing ability flows through each of the desilvering processing areas in the same direction as the traveling direction of the silver halide photographic light-sensitive material, and between the desilvering processing and the water washing processing, the processing liquid has the fixing ability. 1. A method for processing a silver halide photographic material, which comprises bringing the silver halide photographic material into contact with a conditioning solution containing an antioxidant.
ロゲン化銀写真感光材料が最後に通過する脱銀用処理領
域内の定着能を有する処理液中の銀イオン濃度が、他の
脱銀用処理領域に比べて最も高い請求項1に記載のハロ
ゲン化銀写真感光材料の処理方法。2. Among the plurality of desilvering processing regions, the silver ion concentration in the processing solution having fixing ability in the desilvering processing region through which the silver halide photographic light-sensitive material passes last is lower than that of other desilvering processing regions. 2. The method for processing a silver halide photographic material according to claim 1, wherein the processing area for silver is highest compared to the processing area for silver.
〜−50mVである請求項1または2に記載のハロゲン
化銀写真感光材料の処理方法。3. The adjustment liquid has an oxidation-reduction potential of -250.
The method for processing a silver halide photographic material according to claim 1 or 2, wherein the voltage is -50 mV.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11947591A JPH04323649A (en) | 1991-04-23 | 1991-04-23 | Method for processing silver halide photographic sensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11947591A JPH04323649A (en) | 1991-04-23 | 1991-04-23 | Method for processing silver halide photographic sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04323649A true JPH04323649A (en) | 1992-11-12 |
Family
ID=14762228
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11947591A Pending JPH04323649A (en) | 1991-04-23 | 1991-04-23 | Method for processing silver halide photographic sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04323649A (en) |
-
1991
- 1991-04-23 JP JP11947591A patent/JPH04323649A/en active Pending
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