JPH04322889A - Clad stock and its production - Google Patents

Clad stock and its production

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Publication number
JPH04322889A
JPH04322889A JP11950191A JP11950191A JPH04322889A JP H04322889 A JPH04322889 A JP H04322889A JP 11950191 A JP11950191 A JP 11950191A JP 11950191 A JP11950191 A JP 11950191A JP H04322889 A JPH04322889 A JP H04322889A
Authority
JP
Japan
Prior art keywords
foil
thickness
alloy
plate
clad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11950191A
Other languages
Japanese (ja)
Other versions
JP2684259B2 (en
Inventor
Makoto Kawakami
誠 川上
Toshiaki Fujita
敏明 藤田
Hitoshi Abe
安部 仁志
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP3119501A priority Critical patent/JP2684259B2/en
Publication of JPH04322889A publication Critical patent/JPH04322889A/en
Application granted granted Critical
Publication of JP2684259B2 publication Critical patent/JP2684259B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Pressure Welding/Diffusion-Bonding (AREA)
  • Laminated Bodies (AREA)

Abstract

PURPOSE:To provide the clad stock and its manufacturing method by which thickness of an adherent foil wire can be set freely, for instance, within a wide range of 0.3mum-0.1mm by handling in the atmosphere and a press-contacting rolling method, and electronic stocks for various uses can be obtained easily ad efficiently. CONSTITUTION:By rewinding a pure Ag foil 1 coil, and radiating a YAG laser to the surface of the pure Ag foil 1 in an Ar atmospheric chamber 2, a non- contact type cleaning processing is executed, and also, by rewinding a Cu plate 3 coil, cleaning the surface with a wire brush 4, and thereafter, butting the Ag foil 1 and the cleaned surface and executing cold press-contacting, and thereafter, diffusion annealing is performed, and an Ag clad Cu plate on which an adherent stock foil adheres to a base plate stock in one wire inlay wire is obtained.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】この発明は、電子材料として使用
され基板表面にストライプ状にAg等の金属または合金
条を圧接したクラッド材に係り、被着箔条の圧接予定面
に非接触式清浄方法を施すことにより、大気中の圧接圧
延後の被着箔条の厚みを例えば0.3μm〜0.1mm
の広範囲に設定でき、種々の用途の電子材料を容易に提
供できるクラッド材とその製造方法に関する。
[Industrial Application Field] This invention relates to a cladding material used as an electronic material, in which metal or alloy strips such as Ag are pressure-bonded in stripes on the surface of a substrate. By applying the method, the thickness of the adhered foil strip after pressure rolling in the atmosphere can be reduced to, for example, 0.3 μm to 0.1 mm.
The present invention relates to a cladding material that can be set in a wide range of settings and that can easily provide electronic materials for various uses, and a method for manufacturing the same.

【0002】0002

【従来の技術】貴金属をストライプ状に被履した金属ま
たは合金クラッド条は、電子材料として接点、コネクタ
ー、リードフレーム等に用いられる。また、接点、コネ
クターでは、通常基板となる金属にはばね性の高い材料
、すなわちリン青銅、ベリリウム銅、黄銅、及びステン
レス系の材料が用いられ、電気的接触が必要な部分にA
gまたはAg合金等が被着されている。
2. Description of the Related Art Metal or alloy clad strips coated with precious metals in stripes are used as electronic materials for contacts, connectors, lead frames, etc. In addition, for contacts and connectors, materials with high springiness are usually used for the metal substrate, such as phosphor bronze, beryllium copper, brass, and stainless steel materials, and A
g or Ag alloy, etc. are deposited.

【0003】一方リードフレームにおいても、リードフ
レームを接続するワイヤーとしてAuが使用される場合
、リードフレームのワイヤーボンディング部にはAuま
たはAgが被着されている。
On the other hand, in lead frames as well, when Au is used as the wire for connecting the lead frames, Au or Ag is deposited on the wire bonding portions of the lead frames.

【0004】その他、接点材料として、Fe−Cu合金
にNi−Cu合金をクラッドした構成が使用されている
。また、出願人はリードフレーム材料としてCu合金に
高純度のCuをクラッドした構成を提案(特願平2−8
6380号)した。
[0004] In addition, a structure in which a Fe--Cu alloy is clad with a Ni--Cu alloy is used as a contact material. Additionally, the applicant has proposed a structure in which a Cu alloy is clad with high-purity Cu as a lead frame material (Patent Application No. 2-8
No. 6380).

【0005】Agをストライプ状に被履した金属または
合金クラッド条は、従来は電気めっき法により製造され
ている。一方、ロールによる圧接方法は、製造能率、コ
スト、精度の点で有利であるが、圧接前に素材の接着予
定面をワイヤーブラシ等で研摩する必要がある。しかし
、貴金属箔等は研摩時損傷するため研摩による表面清浄
化ができず、特に、Agはその表面に硫化物、酸化物を
形成しやすく、大気中で保管されていたAg箔の表面に
は通常硫化物や酸化物が形成されており、そのままの状
態では圧接を行っても、接合界面では該硫化物や酸化物
が接合を疎外して十分な接合強度が得られない従って、
Ag箔を冷間圧接で接合する場合、例えば出願人が先に
提案した特開昭62−263880号の実施例1、特開
昭63−141734号の実施例1に示す如く、Ag箔
が汚染されていないことが不可欠であり、Ag箔の作製
後直ちに圧接するか、またはAg箔の作製後、一旦Ar
雰囲気中に保管して、同雰囲気中あるいは雰囲気中から
取り出した直後に圧接する必要があった。このため従来
は、Al箔のような研摩が不要な箔条に限って冷間圧接
が行われており、それ以外では冷間圧接による方法は実
施されていなかった。
[0005] Metal or alloy clad strips coated with Ag in stripes have conventionally been produced by electroplating. On the other hand, the pressure welding method using rolls is advantageous in terms of production efficiency, cost, and accuracy, but it is necessary to polish the surface of the material to be bonded with a wire brush or the like before pressure welding. However, the surface of precious metal foil cannot be cleaned by polishing because it is damaged during polishing.In particular, Ag tends to form sulfides and oxides on its surface, and the surface of Ag foil stored in the atmosphere cannot be cleaned. Normally, sulfides and oxides are formed, and even if pressure welding is performed in that state, the sulfides and oxides will interfere with the bonding at the bonding interface, making it impossible to obtain sufficient bonding strength.
When joining Ag foils by cold pressure welding, for example, as shown in Example 1 of JP-A No. 62-263880 and Example 1 of JP-A No. 63-141734, which were previously proposed by the applicant, the Ag foil may become contaminated. It is essential that the Ag foil is not pressed against the surface immediately after it is made, or it must be pressed once after the Ag foil is made.
It was necessary to store it in an atmosphere and press it into the same atmosphere or immediately after taking it out from the atmosphere. For this reason, conventionally, cold pressure welding has been performed only for foil strips that do not require polishing, such as Al foil, and cold pressure welding has not been used for other types of foils.

【0006】[0006]

【発明が解決しようとする課題】Agをストライプ状に
被履した金属または合金クラッド条は、電気めっき法に
より製造されているが、めっき法では不要な部分をマス
キングテープで履う必要があり、また、テープは使い捨
てのため余分な副資材を必要とするばかりでなく、貼り
付け位置合わせを精度良く行なうことが難しく、従って
被着部分の位置精度が悪いという問題がある。さらに、
基板材料がめっき液と化学反応を起こすような場合、中
間層を別にめっきする必要があるため、加工コストが高
価になる。
[Problems to be Solved by the Invention] Metal or alloy clad strips coated with Ag in stripes are manufactured by electroplating, but with the plating method it is necessary to cover unnecessary parts with masking tape. Further, since the tape is disposable, not only does it require extra auxiliary materials, but it is also difficult to accurately align the attachment position, resulting in a problem of poor positional accuracy of the adhered portion. moreover,
If the substrate material causes a chemical reaction with the plating solution, the intermediate layer must be plated separately, which increases processing costs.

【0007】従来からロールによる圧接方法を採用して
安定して被着されるAg箔条の厚さは0.3mm程度が
限度であった。これ以上薄くすると清浄化のブラッシン
グ時に破れてしまい事実上圧接することはできなかった
。従来方法にて圧接した場合、最終製品のAgの厚さは
0.1mm程度であった。また、圧延を何回も繰り返す
ことが考えられるが極めて非効率的であり、工業的には
実用化され難い。
[0007] Conventionally, the thickness of Ag foil strips that can be stably deposited using a pressure welding method using rolls has been limited to about 0.3 mm. If it was made thinner than this, it would tear during brushing for cleaning, making it virtually impossible to press it. When pressure-welding was performed using the conventional method, the thickness of Ag in the final product was approximately 0.1 mm. Further, although it is conceivable to repeat rolling many times, it is extremely inefficient and difficult to put into practical use industrially.

【0008】Ag材の場合、市販品として0.185m
mの帯材がある。この材料をブラッシングにて研摩して
圧接する際には相当の注意を払うことが必要となる。特
にねじれによる最終製品における寸法精度への影響、破
れによるAg材供給の停止等量産品を安定して提供する
ことが困難であった。特に、0.1mm以下になると殆
どブラッシングによる清浄化は不可能となる。そこで、
前述のAg箔の作製後直ちに圧接することが考えられる
が、工業的生産ではAg箔の作製と圧接を連続的に行う
ことは困難であり、またAr保管雰囲気中から取り出し
直ちに圧接するにも、保管、取扱い等が煩雑となり、生
産性のよい方法とは言い難い。しかし、電子部品用の高
品位の合金箔クラッド条を得るためには、圧接前にAg
箔などの被着材料箔の表面清浄化処理が必要となる。
[0008] In the case of Ag material, the commercially available product is 0.185m.
There are m strips. Considerable care must be taken when polishing and pressing this material by brushing. In particular, it has been difficult to stably provide mass-produced products, such as twisting affecting the dimensional accuracy of the final product and disruption of Ag material supply due to breakage. In particular, if the thickness is less than 0.1 mm, cleaning by brushing becomes almost impossible. Therefore,
It is conceivable to press the Ag foil immediately after producing it as described above, but in industrial production it is difficult to produce and press the Ag foil continuously, and it is also difficult to press the Ag foil immediately after taking it out of the Ar storage atmosphere. Storage, handling, etc. are complicated, and it is difficult to say that this is a highly productive method. However, in order to obtain high-quality alloy foil cladding strips for electronic components, it is necessary to
Surface cleaning treatment of the adherend material such as foil is required.

【0009】電気めっき法ではAgの厚さは最大5μm
程度である。従って、電気めっき法による最大厚さ5μ
mとロール圧接方法による最小厚さ0.1mmとの間の
厚さを有するAgクラッド材は得ることができなかった
[0009] In the electroplating method, the maximum thickness of Ag is 5 μm.
That's about it. Therefore, the maximum thickness by electroplating method is 5μ
It was not possible to obtain an Ag clad material having a thickness between m and the minimum thickness of 0.1 mm by the roll welding method.

【0010】一方、接点、コネクター等の用途において
は、Ag被着部に流れる電流容量に応じて、またリード
フレーム等の用途においてはAg被着部にボンディング
されるワイヤーの太さにより必然的に最も効率的なAg
厚さ(量)が選定されるが、上記の製造方法による制限
から必ずしも適正の厚さとすることができなかった。
On the other hand, in applications such as contacts and connectors, depending on the current capacity flowing through the Ag-adhered part, and in applications such as lead frames, depending on the thickness of the wire bonded to the Ag-adhered part. most efficient Ag
Although the thickness (amount) is selected, it has not always been possible to obtain an appropriate thickness due to limitations imposed by the above-mentioned manufacturing method.

【0011】Agと同様に圧接前に清浄化処理を必要と
する材料、例えば表面に酸化物を形成しやすいCu、N
i及びこれらの合金を被着材料とする用途においては、
いずれも上述の問題点を有している。
Similar to Ag, materials that require cleaning treatment before pressure bonding, such as Cu and N, which tend to form oxides on the surface.
In applications using i and these alloys as adhering materials,
Both have the above-mentioned problems.

【0012】この発明は、電子材料として使用され基板
表面にストライプ状にAg等の金属または合金条を圧接
したクラッド材の上述の問題点を解消し、大気中での取
扱い並びに圧接圧延法により、被着箔条の厚みを例えば
0.3μm〜0.1mmの広範囲に自由に設定でき、種
々の用途の電子材料を容易に効率よく得ることができる
クラッド材とその製造方法の提供を目的としている。
The present invention solves the above-mentioned problems of the clad material used as an electronic material, in which metal or alloy strips such as Ag are pressure-bonded in stripes on the substrate surface, and it can be handled in the atmosphere and by pressure-rolling. The object of the present invention is to provide a cladding material and a method for producing the same, in which the thickness of the adhered foil strip can be freely set within a wide range of, for example, 0.3 μm to 0.1 mm, and electronic materials for various uses can be easily and efficiently obtained. .

【0013】[0013]

【課題を解決するための手段】この発明は、Ag、Cu
、Niまたはこれらの合金からなる少なくとも1種の被
着材料箔の非接触式清浄化処理された面と、基板材料の
清浄化処理された面とで圧接一体化され、前記箔厚みが
0.1mm以下であることを特徴とするクラッド材であ
る。
[Means for Solving the Problems] This invention provides Ag, Cu,
The non-contact cleaning surface of at least one adherend material foil made of , Ni, or an alloy thereof and the cleaning surface of the substrate material are pressure-bonded and integrated, and the foil thickness is 0. This is a clad material characterized by having a thickness of 1 mm or less.

【0014】また、この発明は、厚さ0.2mm以下の
Ag、Cu、Niまたはこれらの合金からなる少なくと
も1種の被着材料箔の圧接予定面に非接触式清浄方法を
施し、基板材料の前記箔との圧接予定面に清浄化処理を
施した後、両者を圧接圧延して圧接された前記箔厚みを
0.1mm以下となしたことを特徴とするクラッド材の
製造方法である。
[0014] Furthermore, the present invention applies a non-contact cleaning method to the surface to be pressure-bonded of at least one adherend material foil made of Ag, Cu, Ni, or an alloy thereof having a thickness of 0.2 mm or less, and cleans the substrate material. A method for manufacturing a cladding material, characterized in that the surface of the cladding material which is to be pressed against the foil is subjected to a cleaning treatment, and then both are pressure-rolled so that the thickness of the pressed foil is 0.1 mm or less.

【0015】[0015]

【作用】この発明は、被着材料として、純AgまたはA
g合金(Ag−Cu、Ag−Cd等)の厚さ0.2mm
以下の箔の圧接予定面にYAGレーザー等を照射して、
非接触式清浄化処理した後、基板材料として、Fe−N
i合金、Fe−Ni−Co合金、Fe−Ni−Cr合金
、純Cu、Cr合金等を軟化焼鈍後ワイヤーブラシ等で
清浄化処理を施し、箔の清浄化面を圧接界面側として、
圧接することを特徴とする。
[Operation] This invention uses pure Ag or A as the adherend material.
Thickness of g alloy (Ag-Cu, Ag-Cd, etc.) 0.2mm
Irradiate the surface of the following foil to be pressure welded with a YAG laser, etc.
After non-contact cleaning treatment, Fe-N was used as the substrate material.
i alloy, Fe-Ni-Co alloy, Fe-Ni-Cr alloy, pure Cu, Cr alloy, etc. are subjected to cleaning treatment with a wire brush etc. after softening annealing, and the cleaned side of the foil is placed on the pressure welding interface side.
It is characterized by pressure contact.

【0016】大気に晒されているAg箔は表面に硫化物
を形成し易く、硫化物はポーラスなため成長が速く、ま
た水分等を吸着しているため、Al箔のように表面処理
なしで圧接することは不可能である。そこで、Ag箔側
にレーザー照射等の非接触式清浄化処理を施し、基板側
は従来のワイヤーブラシを用いた清浄化処理を行なった
後、相互の清浄化面を突き合わせて冷間圧接するもので
、被着材料箔への非接触式清浄化処理により、大気中で
の取扱い並びに圧接圧延に際して、厚さ0.2mm以下
の被着材料箔を用いることができ、圧接後のAg箔厚み
を0.3μm〜0.1mmの広範囲に自由に設定できる
冷間圧接が可能となった。また、被着材料への非接触式
清浄化処理は、AgだけでなくCu、Ni及びこれらの
合金においても同様の作用効果を奏する。
[0016] Ag foil exposed to the atmosphere tends to form sulfides on its surface, and since sulfides are porous, they grow quickly and adsorb moisture, so they can be used without surface treatment like Al foil. Pressure contact is not possible. Therefore, a non-contact cleaning process such as laser irradiation is applied to the Ag foil side, and a conventional cleaning process using a wire brush is applied to the substrate side, and then the clean surfaces are brought together and cold pressure welded. By applying a non-contact cleaning treatment to the adherend material foil, it is possible to use an adherend material foil with a thickness of 0.2 mm or less during handling and pressure rolling in the atmosphere, and the thickness of the Ag foil after pressure welding can be reduced. Cold pressure welding can now be freely set over a wide range of 0.3 μm to 0.1 mm. Further, the non-contact cleaning treatment of the adherend material has similar effects not only on Ag but also on Cu, Ni, and their alloys.

【0017】この発明は冷間圧接にて被着材料箔を直接
基板に圧接でき、材料を機械的なガイドリングにより供
給するため、被着材料箔の位置決め精度が良い。また、
被着材料箔には圧延された材料を用いるため、クラッド
厚さの幅方向、長手方向のばらつきが少ない。また、圧
接法で製造するため、めっき液の処理やテープ等の間接
資材が不要であり、工程が簡素化され、製造効率がよい
[0017] According to the present invention, the adherend material foil can be directly pressed onto the substrate by cold pressure welding, and the material is supplied by a mechanical guide ring, so that the positioning accuracy of the adherend material foil is good. Also,
Since a rolled material is used for the adherend material foil, there is little variation in the cladding thickness in the width direction and longitudinal direction. Furthermore, since it is manufactured using a pressure welding method, there is no need for plating solution treatment or indirect materials such as tape, which simplifies the process and improves manufacturing efficiency.

【0018】この発明において、基板の圧接予定面もし
くは必要に応じて設けられる基板の溝部に施す清浄化処
理には、ワイヤーブラシによる研摩、バフ研摩のほか、
レーザー照射、電子ビーム照射、イオンスパッタリング
などを採用することができる。ワイヤーブラシの好まし
い適用条件は、0.1〜0.5mm径の炭素鋼線の回転
ブラシを用い、材料表面を研磨して所謂梨地状に仕上げ
、仕上がり表面粗度が1.5〜10μmの場合である。
In the present invention, the cleaning treatment performed on the surface of the substrate to be pressed or the groove portion of the substrate provided as necessary includes polishing with a wire brush, buff polishing,
Laser irradiation, electron beam irradiation, ion sputtering, etc. can be employed. The preferred application conditions for the wire brush are when a rotating brush made of carbon steel wire with a diameter of 0.1 to 0.5 mm is used to polish the material surface to a so-called matte finish, and the finished surface roughness is 1.5 to 10 μm. It is.

【0019】この発明において、被着材料箔の非接触式
清浄化処理には、実施例に示すレーザー照射のほか、電
子ビーム照射、イオンスパッタリングなどを採用するこ
とができる。レーザー照射の雰囲気は、レーザースクラ
イバーのように温度上昇を伴わない場合は大気中でもよ
く、温度上昇を伴う場合は不活性ガス雰囲気、還元性雰
囲気などの非酸化性雰囲気が望ましい。YAGレーザー
の好ましい適用条件は、出力100W、Q−SW発振周
波数10kHzを用いて、Ar雰囲気中で照射する。な
お、レーザービームは材料を長手方向に移動させながら
、ガルバニックミラーを用いて板幅方向に走査し、被着
材料の圧接予定面に未走査部分が残らないように全面に
照射する。ガルバニックミラーの走査周波数および材料
の移動速度は材料幅、レーザービーム径等に応じて適宜
選定するとよい。
In the present invention, in addition to the laser irradiation shown in the embodiment, electron beam irradiation, ion sputtering, etc. can be employed for the non-contact cleaning treatment of the adherend material foil. The atmosphere for laser irradiation may be air if it does not involve a temperature rise, such as in a laser scriber, but if it does involve a temperature rise, a non-oxidizing atmosphere such as an inert gas atmosphere or a reducing atmosphere is desirable. Preferred application conditions for the YAG laser are irradiation in an Ar atmosphere using an output of 100 W and a Q-SW oscillation frequency of 10 kHz. Note that the laser beam is scanned in the width direction of the plate using a galvanic mirror while moving the material in the longitudinal direction, and irradiates the entire surface of the adherend material so that no unscanned portion remains on the surface to be pressed. The scanning frequency of the galvanic mirror and the moving speed of the material may be appropriately selected depending on the material width, laser beam diameter, etc.

【0020】この発明において、被着材料箔にはAg、
Cu、Niまたはこれらの合金を用途等に応じて適宜選
定されるが、基板に圧接するパターン等に応じて、同種
あるいは異材質の複数箔条を用いることができる。圧接
前の被着材料箔の厚みは、0.2mm以下が好ましく、
厚みの下限については通常工業的に製造できる基板側の
溝深さが10μm(0.01mm)程度であり、薄すぎ
ると取扱いが困難になるため厚みの下限は0.01mm
程度である。これより薄い材料が得られればそれを使用
してもよい。
In this invention, the adherend material foil contains Ag,
Cu, Ni, or an alloy thereof is appropriately selected depending on the application, etc., but a plurality of foil strips made of the same type or different materials can be used depending on the pattern to be pressed against the substrate. The thickness of the adherend material foil before pressure bonding is preferably 0.2 mm or less,
Regarding the lower limit of the thickness, the groove depth on the substrate side that can be manufactured industrially is usually about 10 μm (0.01 mm), and if it is too thin, it will be difficult to handle, so the lower limit of the thickness is 0.01 mm.
That's about it. If a material thinner than this is available, it may be used.

【0021】基板材料は電子材料としての用途に応じて
適宜選定されるが、リードフレーム用としては、Fe−
Ni合金、Fe−Ni−Co合金、Fe−Cr合金、及
びFeさらに銅系リードフレーム材料として、Cu−F
e合金、Cu−Fe−Sn−P合金を用い、接点、コネ
クター用としては、Cu、Cu合金、Fe−Ni−Cr
合金、ステンレス鋼、黄銅、洋白を用いる。さらに装飾
品用として用いる場合は、Cu、洋白、Ni、Ni−C
u合金、黄銅、青銅等を用いることができる。
[0021] The substrate material is appropriately selected depending on the use as an electronic material, but for lead frames, Fe-
Ni alloy, Fe-Ni-Co alloy, Fe-Cr alloy, and Fe, as well as copper-based lead frame materials, Cu-F
e alloy, Cu-Fe-Sn-P alloy, and for contacts and connectors, Cu, Cu alloy, Fe-Ni-Cr
Uses alloy, stainless steel, brass, and nickel silver. Furthermore, when used for decorative items, Cu, nickel silver, Ni, Ni-C
U alloy, brass, bronze, etc. can be used.

【0022】基板材料に施す軟化焼鈍は、基板材料が予
め軟化状態にあるものについて施こす必要はなく、また
基板材料によって焼鈍条件が異なるので、材料用途に応
じて温度や時間を選定する。
[0022] The softening annealing applied to the substrate material does not need to be performed on a substrate material that is already in a softened state, and since the annealing conditions differ depending on the substrate material, the temperature and time are selected depending on the material application.

【0023】この発明により得られるクラッド材は、圧
接後の被着材料箔厚みを0.3μm〜0.1mmの広範
囲に自由に設定でき、ストライプの場合、被着材料箔が
基板材料にインレイ状に被着しその厚さが0.1mm以
下である。例えば、圧接前の被着材料箔厚さが0.1m
mであった場合でも圧接されれば0.1mm未満となる
[0023] In the cladding material obtained by the present invention, the thickness of the adherend material foil after pressure bonding can be freely set within a wide range of 0.3 μm to 0.1 mm. The thickness is 0.1 mm or less. For example, the thickness of the adherend material foil before pressure welding is 0.1 m.
Even if it is 0.1 mm, it will be less than 0.1 mm if it is pressed.

【0024】[0024]

【実施例】実施例1 図1に示す如く、板厚0.01mm、板幅10mmの純
Ag箔1コイルを巻戻し、Ar雰囲気室2内で純Ag箔
1表面にYAGレーザーを照射して非接触式清浄化処理
し、また板厚0.7mm、板幅30mmのCu板3コイ
ルを巻戻し、ワイヤーブラシ4で表面を清浄化した後、
前記Ag箔1を清浄化面を突き合わせて冷間圧接し、ク
ラッド板厚みを0.3mmとした後、500℃×3分の
拡散焼鈍を施し、図2のAに示す如き被着材料箔が基板
材料に1条インレイ状に被着しその厚さが3μmのAg
クラッドCu板を得た。
[Example] Example 1 As shown in Fig. 1, one coil of pure Ag foil with a plate thickness of 0.01 mm and a plate width of 10 mm was unwound, and the surface of the pure Ag foil 1 was irradiated with a YAG laser in an Ar atmosphere chamber 2. After performing non-contact cleaning treatment, unwinding three coils of Cu plate with a thickness of 0.7 mm and a width of 30 mm, and cleaning the surface with a wire brush 4,
The Ag foils 1 were cold-pressed with their clean surfaces pressed against each other to make the clad plate thickness 0.3 mm, and then diffusion annealed at 500°C for 3 minutes to form an adherend material foil as shown in A in FIG. Ag coated on the substrate material in the form of a single inlay with a thickness of 3 μm
A clad Cu plate was obtained.

【0025】実施例2 図1に示す如く、板厚0.01mm、板幅10mmの純
Ag箔1コイルを2条巻戻し、Ar雰囲気室2内で純A
g箔1表面にYAGレーザーを照射して非接触式清浄化
処理し、また板厚0.7mm、板幅60mmのCu板3
コイルを巻戻し、ワイヤーブラシ4で表面を清浄化した
後、前記2条のAg箔1を清浄化面を突き合わせて冷間
圧接し、クラッド板厚みを0.3mmとした後、、50
0℃×3分の拡散焼鈍を施し、図2のBに示す如き被着
材料箔が基板材料に2条インレイ状に被着しその厚さが
3μmのAgクラッドCu板を得た。
Example 2 As shown in FIG. 1, one coil of pure Ag foil with a plate thickness of 0.01 mm and a plate width of 10 mm was unwound in two strips, and pure A was heated in an Ar atmosphere chamber 2.
G foil 1 surface was irradiated with YAG laser for non-contact cleaning treatment, and Cu plate 3 with a plate thickness of 0.7 mm and a plate width of 60 mm was
After unwinding the coil and cleaning the surface with a wire brush 4, the two strips of Ag foil 1 were cold pressure welded with the cleaned surfaces brought together to make the clad plate thickness 0.3 mm.
Diffusion annealing was carried out at 0° C. for 3 minutes to obtain an Ag-clad Cu plate having a thickness of 3 μm in which a two-strip inlay of the adherend material foil as shown in FIG. 2B was adhered to the substrate material.

【0026】実施例3 板厚0.03mm、板幅10mmの純Ag箔表面にYA
GレーザーをAr雰囲気中で照射し、板厚1.0mm、
板幅35mmのFe−42%Ni合金板を焼鈍後ワイヤ
ーブラッシングし、前記Ag箔のレーザー処理面を基板
側にして冷間圧接し、板厚0.25mmとした後拡散焼
鈍を施し、図2のAに示す如きAgクラッドFe−42
%Ni合金板を得た。得られたAg厚みが7μmである
AgクラッドFe−42%Ni合金板を用いて、図3に
示すごとく、突き合わせ先端部表面または裏面側にAg
箔1が被着されたリードフレームに打ち抜き成型した。 また、比較のためAgをめっきによりストライプ状に5
μm厚み被着したFe−42%Ni合金板をリードフレ
ームに打ち抜き、Ag面のはんだ濡れ性を調べたところ
、この発明によるクラッド材のAgは従来のめっきによ
るものと同等以上のはんだ濡れ性を示した。
Example 3 YA was applied to the surface of a pure Ag foil with a thickness of 0.03 mm and a width of 10 mm.
G laser irradiation in Ar atmosphere, plate thickness 1.0 mm,
An Fe-42%Ni alloy plate with a width of 35 mm was annealed, then wire brushed, and cold pressure welded with the laser-treated surface of the Ag foil facing the substrate to a plate thickness of 0.25 mm, followed by diffusion annealing. Ag clad Fe-42 as shown in A of
%Ni alloy plate was obtained. Using the obtained Ag-clad Fe-42%Ni alloy plate with an Ag thickness of 7 μm, as shown in FIG.
The lead frame covered with foil 1 was punched and molded. For comparison, Ag was plated into 5 stripes.
When a lead frame was punched out from a μm-thick Fe-42%Ni alloy plate and the solder wettability of the Ag surface was examined, it was found that the Ag of the cladding material of this invention had a solder wettability equal to or higher than that of conventional plating. Indicated.

【0027】実施例4 板厚0.04mm、板幅10mmの純Ag箔表面にYA
GレーザーをAr雰囲気中で照射し、板厚1.0mm、
板幅35mmのFe−42%Ni合金板を焼鈍後ワイヤ
ーブラッシングし、前記Ag箔のレーザー処理面を基板
側にして冷間圧接し、板厚0.25mmとした後拡散焼
鈍を施し、Ag厚さが10μmのAgクラッドFe−4
2%Ni合金板を得た。
Example 4 YA was applied to the surface of a pure Ag foil with a thickness of 0.04 mm and a width of 10 mm.
G laser irradiation in Ar atmosphere, plate thickness 1.0 mm,
An Fe-42%Ni alloy plate with a plate width of 35 mm was annealed, then wire brushed, and cold pressure welded with the laser treated surface of the Ag foil facing the substrate to a plate thickness of 0.25 mm. After that, diffusion annealing was performed to adjust the Ag thickness. Ag-clad Fe-4 with a diameter of 10 μm
A 2% Ni alloy plate was obtained.

【0028】実施例5 板厚0.03mm、板幅10mmのNi−70%Cu合
金箔表面にYAGレーザーをAr雰囲気中で照射し、板
厚1.0mm、板幅35mmのFe−42%Ni合金板
を焼鈍後ワイヤーブラッシングし、前記箔のレーザー処
理面を基板側にして冷間圧接し、板厚を0.3mmとし
た後拡散焼鈍を施し、Ni−Cu合金厚さが7μmのN
i−Cu合金クラッドFe−42%Ni合金板を得た。
Example 5 A YAG laser was irradiated on the surface of a Ni-70% Cu alloy foil with a thickness of 0.03 mm and a width of 10 mm in an Ar atmosphere. After annealing the alloy plate, the foil was wire brushed, the laser-treated surface of the foil was placed on the substrate side, and cold pressure welded to a plate thickness of 0.3 mm. After that, diffusion annealing was performed to form a Ni-Cu alloy with a thickness of 7 μm.
An i-Cu alloy clad Fe-42%Ni alloy plate was obtained.

【0029】実施例6 板厚0.02mm、板幅10mmの純Cu箔表面にYA
GレーザーをAr雰囲気中で照射し、板厚1.0mm、
板幅35mmのCu−2%Fe合金板をワイヤーブラッ
シングし、前記箔のレーザー処理面を基板側にして冷間
圧接し、板厚を0.25mmとした後拡散焼鈍を施し、
純Cu厚さが5μmの純CuクラッドCu−2%Fe合
金板を得た。
Example 6 YA was applied to the surface of a pure Cu foil with a thickness of 0.02 mm and a width of 10 mm.
G laser irradiation in Ar atmosphere, plate thickness 1.0 mm,
Wire brushing a Cu-2% Fe alloy plate with a plate width of 35 mm, cold pressure welding the foil with the laser treated side facing the substrate, and after making the plate thickness 0.25 mm, diffusion annealing was performed,
A pure Cu clad Cu-2% Fe alloy plate having a pure Cu thickness of 5 μm was obtained.

【0030】[0030]

【発明の効果】この発明は、Ag箔などの被着材料箔側
をレーザー照射等の非接触式清浄化処理を施し、基板側
はワイヤーブラシ等の清浄化処理を行なった後、清浄化
面を突き合わせて冷間圧接するもので、被着材料への非
接触式清浄化処理により、大気中での取扱い並びに圧接
圧延が可能で、かつ厚さ0.2mm以下の被着材料箔を
用いることができ、実施例に示す如く、圧接後のAg箔
厚みを0.3μm〜0.1mmの広範囲に自由に設定で
きる冷間圧接が可能となった。
Effects of the Invention This invention performs a non-contact cleaning treatment such as laser irradiation on the foil side of the adherend material such as Ag foil, and performs cleaning treatment with a wire brush etc. on the substrate side, and then The method involves cold pressure welding by butting together the adherend materials, which can be handled and pressure rolled in the atmosphere through a non-contact cleaning treatment of the adherend materials, and which uses adherend material foils with a thickness of 0.2 mm or less. As shown in the examples, cold pressure welding became possible in which the thickness of the Ag foil after pressure welding could be freely set within a wide range of 0.3 μm to 0.1 mm.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】この発明の製造方法を示す説明図である。FIG. 1 is an explanatory diagram showing the manufacturing method of the present invention.

【図2】この発明によるクラッド板の斜視説明図である
FIG. 2 is a perspective explanatory view of a clad plate according to the present invention.

【図3】リードフレームの一例を示す斜視説明図である
FIG. 3 is a perspective explanatory view showing an example of a lead frame.

【符号の説明】[Explanation of symbols]

1  Ag箔 2  Ar雰囲気室 3  Cu板 4  ワイヤーブラシ 1 Ag foil 2 Ar atmosphere chamber 3 Cu board 4 Wire brush

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】  Ag、Cu、Niまたはこれらの合金
からなる少なくとも1種の被着材料箔の非接触式清浄化
処理された面と、基板材料の清浄化処理された面とで圧
接一体化され、前記箔厚みが0.1mm以下であること
を特徴とするクラッド材。
[Claim 1] A non-contact cleaning surface of at least one adherend material foil made of Ag, Cu, Ni, or an alloy thereof and a surface of the substrate material that has been cleaned are pressure-bonded and integrated. A cladding material characterized in that the foil thickness is 0.1 mm or less.
【請求項2】  厚さ0.2mm以下のAg、Cu、N
iまたはこれらの合金からなる少なくとも1種の被着材
料箔の圧接予定面に非接触式清浄方法を施し、基板材料
の前記箔との圧接予定面に清浄化処理を施した後、両者
を圧接圧延して圧接された前記箔厚みを0.1mm以下
となしたことを特徴とするクラッド材の製造方法。
[Claim 2] Ag, Cu, N with a thickness of 0.2 mm or less
A non-contact cleaning method is applied to the surface of the foil of at least one adherend material made of i or an alloy thereof, and the surface of the substrate material that is to be pressed to the foil is subjected to a cleaning treatment, and then the two are pressure-bonded. A method for producing a cladding material, characterized in that the thickness of the rolled and pressure-welded foil is 0.1 mm or less.
JP3119501A 1991-04-22 1991-04-22 Clad material and manufacturing method thereof Expired - Fee Related JP2684259B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3119501A JP2684259B2 (en) 1991-04-22 1991-04-22 Clad material and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3119501A JP2684259B2 (en) 1991-04-22 1991-04-22 Clad material and manufacturing method thereof

Publications (2)

Publication Number Publication Date
JPH04322889A true JPH04322889A (en) 1992-11-12
JP2684259B2 JP2684259B2 (en) 1997-12-03

Family

ID=14762830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3119501A Expired - Fee Related JP2684259B2 (en) 1991-04-22 1991-04-22 Clad material and manufacturing method thereof

Country Status (1)

Country Link
JP (1) JP2684259B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6663980B1 (en) * 1998-09-30 2003-12-16 Toyo Kohan Co., Ltd. Clad plate for lead frames, lead frame using the same, and method of manufacturing the lead frame
JPWO2005097396A1 (en) * 2004-04-08 2007-08-16 松下電器産業株式会社 Joining method and apparatus
CN100389005C (en) * 2005-09-21 2008-05-21 浙江大学 Bimetallic compound Cu/Ag plate making process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6663980B1 (en) * 1998-09-30 2003-12-16 Toyo Kohan Co., Ltd. Clad plate for lead frames, lead frame using the same, and method of manufacturing the lead frame
JPWO2005097396A1 (en) * 2004-04-08 2007-08-16 松下電器産業株式会社 Joining method and apparatus
CN100389005C (en) * 2005-09-21 2008-05-21 浙江大学 Bimetallic compound Cu/Ag plate making process

Also Published As

Publication number Publication date
JP2684259B2 (en) 1997-12-03

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