JPH04321948A - Optical information recording medium - Google Patents
Optical information recording mediumInfo
- Publication number
- JPH04321948A JPH04321948A JP3116636A JP11663691A JPH04321948A JP H04321948 A JPH04321948 A JP H04321948A JP 3116636 A JP3116636 A JP 3116636A JP 11663691 A JP11663691 A JP 11663691A JP H04321948 A JPH04321948 A JP H04321948A
- Authority
- JP
- Japan
- Prior art keywords
- transparent substrate
- oxide layer
- recording medium
- optical
- information recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 43
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 150000004767 nitrides Chemical class 0.000 claims abstract description 23
- 239000004417 polycarbonate Substances 0.000 claims abstract description 9
- 229920000515 polycarbonate Polymers 0.000 claims abstract description 8
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 229910052752 metalloid Inorganic materials 0.000 claims description 5
- -1 metalloid nitride Chemical class 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 230000001105 regulatory effect Effects 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052760 oxygen Inorganic materials 0.000 abstract description 5
- 239000001301 oxygen Substances 0.000 abstract description 5
- 239000004033 plastic Substances 0.000 abstract description 2
- 229920003023 plastic Polymers 0.000 abstract description 2
- 230000003647 oxidation Effects 0.000 abstract 1
- 238000007254 oxidation reaction Methods 0.000 abstract 1
- 229910052814 silicon oxide Inorganic materials 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 39
- 229910017061 Fe Co Inorganic materials 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 150000002738 metalloids Chemical class 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- SIKJAQJRHWYJAI-UHFFFAOYSA-N Indole Chemical compound C1=CC=C2NC=CC2=C1 SIKJAQJRHWYJAI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 229910007277 Si3 N4 Inorganic materials 0.000 description 1
- 229910004446 Ta2 O5 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000013500 data storage Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- PZOUSPYUWWUPPK-UHFFFAOYSA-N indole Natural products CC1=CC=CC2=C1C=CN2 PZOUSPYUWWUPPK-UHFFFAOYSA-N 0.000 description 1
- RKJUIXBNRJVNHR-UHFFFAOYSA-N indolenine Natural products C1=CC=C2CC=NC2=C1 RKJUIXBNRJVNHR-UHFFFAOYSA-N 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910002059 quaternary alloy Inorganic materials 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、例えば光デイスクなど
の光情報記録媒体に係り、特に透明基板と光記録膜との
間に形成される下地層に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to optical information recording media such as optical disks, and more particularly to an underlayer formed between a transparent substrate and an optical recording film.
【０００２】0002
【従来の技術】光デイスクは、プリグルーブやプリピツ
トなどの信号パターンが形成された透明な基板上に直接
、または下地層を介して光記録膜が形成された構造とな
つている。そして集光されたレーザ光が透明基板を透過
して前記信号パターンに到達し、その信号パターンに対
応した反射光を光学的に読み取るようになつている。2. Description of the Related Art Optical disks have a structure in which an optical recording film is formed directly or via an underlayer on a transparent substrate on which signal patterns such as pregrooves and prepits are formed. The focused laser light passes through the transparent substrate and reaches the signal pattern, and the reflected light corresponding to the signal pattern is optically read.
【０００３】従来より透明基板と光記録膜との間に、酸
化物ならびに窒化物などの透明薄層を設けて、光学多重
干渉膜、保護膜として機能させる検討が種々行われてい
る。Conventionally, various studies have been made to provide a transparent thin layer of oxide or nitride between a transparent substrate and an optical recording film to function as an optical multiple interference film or a protective film.
【０００４】また、一方、光学的な透明度、平面の平滑
性、成形性ならびに経済性などの理由から例えばポリカ
ーボネートなどの合成樹脂製の透明基板が一般に使用さ
れている。On the other hand, a transparent substrate made of synthetic resin such as polycarbonate is generally used for reasons such as optical transparency, flat surface smoothness, moldability, and economic efficiency.
【０００５】[0005]
【発明が解決しようとする課題】ところで前記酸化物層
を蒸着法やスパツタリング法で形成すると、化学的に不
安定となり、酸素が遊離しやすく、その遊離した酸素が
光記録膜中に徐々に拡散し、その結果、光記録膜を酸化
して、情報の記録、再生、消去特性が劣化してしまう。[Problems to be Solved by the Invention] However, when the oxide layer is formed by vapor deposition or sputtering, it becomes chemically unstable and oxygen is likely to be liberated, and the liberated oxygen gradually diffuses into the optical recording film. However, as a result, the optical recording film is oxidized and information recording, reproduction, and erasing characteristics deteriorate.
【０００６】一方、窒化物層はポリカーボネートなどの
合成樹脂製透明基板に対する密着性が弱いため、光記録
膜の下地層とした場合、長い期間のうちには透明基板と
下地層との間において剥離を生じ、データストレージと
しての機能が低下する。このようなことから、従来の光
情報記録媒体では信頼性に問題があつた。On the other hand, the nitride layer has weak adhesion to a transparent substrate made of synthetic resin such as polycarbonate, so when used as an underlayer for an optical recording film, it may peel off between the transparent substrate and the underlayer over a long period of time. This causes the data storage function to deteriorate. For this reason, conventional optical information recording media have had problems with reliability.
【０００７】本発明の目的は、このような従来技術の欠
点を解消し、信頼性の高い光情報記録媒体を提供するに
ある。[0007] An object of the present invention is to eliminate such drawbacks of the prior art and provide a highly reliable optical information recording medium.
【０００８】[0008]
【課題を解決するための手段】前記目的を達成するため
、本発明は、透明基板と、該透明基板上に形成された光
記録膜とを有し、前記透明基板側から集光したレーザ光
を該光記録膜に照射することにより、情報の記録、再生
、消去を行う光情報記録媒体において、前記透明基板と
光記録膜の間に、例えばＳｉ，Ｚｒ，Ｙ，Ｍｇ，Ｔｉ，
Ｔａ，Ｃａ，Ａｌのグループから選択された少なくとも
１種以上の金属または半金属の酸化物層と、例えばＳｉ
，Ｚｒ，Ｙ，Ｍｇ，Ｔｉ，Ｔａ，Ｃａ，Ａｌのグループ
から選択された少なくとも１種以上の金属または半金属
の窒化物層とを、順次形成したことを特徴とするもので
ある。[Means for Solving the Problems] In order to achieve the above object, the present invention includes a transparent substrate and an optical recording film formed on the transparent substrate, and a laser beam focused from the transparent substrate side. In an optical information recording medium in which information is recorded, reproduced, and erased by irradiating the optical recording film with a material such as Si, Zr, Y, Mg, Ti,
an oxide layer of at least one metal or metalloid selected from the group of Ta, Ca, and Al; and an oxide layer of, for example, Si.
, Zr, Y, Mg, Ti, Ta, Ca, and Al.
【０００９】[0009]
【作用】合成樹脂製の透明基板（特にポリカーボネート
製の透明基板）に対して酸化物層は密着力が強い。そこ
で透明基板上に直接酸化物層を形成することにより、光
記録膜の剥離を防止することができる。さらにその上に
化学的に安定な窒化物層を配置することにより、前記酸
化物層から光記録膜への酸素、水分などの侵入、拡散を
阻止して光記録膜を保護することができる。このような
ことから、信頼性ならびに耐久性に優れた光情報記録媒
体を提供することができる。[Operation] The oxide layer has strong adhesion to a transparent substrate made of synthetic resin (especially a transparent substrate made of polycarbonate). Therefore, by forming an oxide layer directly on the transparent substrate, peeling of the optical recording film can be prevented. Further, by disposing a chemically stable nitride layer thereon, the optical recording film can be protected by preventing oxygen, moisture, etc. from entering and diffusing from the oxide layer into the optical recording film. For this reason, it is possible to provide an optical information recording medium with excellent reliability and durability.
【００１０】0010
【実施例】本発明において前記酸化物層を形成する材料
として、例えばＳｉ，Ｚｒ，Ｙ，Ｍｇ，Ｔｉ，Ｔａ，Ｃ
ａ，Ａｌのグループから選択された少なくとも１種以上
の金属または半金属の酸化物が使用される。この酸化物
層の膜厚は、３０〜８００Åの範囲に規制されている。
この酸化物層の膜厚が３０Å未満であると、膜はその初
期成長過程たる島状状態にあるため、充分な密着力を得
ることができない。また酸化物層の膜厚が８００Åを超
えると、膜の粒界サイズが数百Åに至り、信号を再生す
る際のノイズの上昇として影響を現す。このような理由
から、酸化物層の膜厚は前述の範囲に規制する方が望ま
しい。[Example] In the present invention, materials for forming the oxide layer include, for example, Si, Zr, Y, Mg, Ti, Ta, and C.
An oxide of at least one metal or metalloid selected from the group consisting of a and Al is used. The thickness of this oxide layer is limited to a range of 30 to 800 Å. If the thickness of this oxide layer is less than 30 Å, the film will be in an island-like state during its initial growth stage, making it impossible to obtain sufficient adhesion. Furthermore, when the thickness of the oxide layer exceeds 800 Å, the grain boundary size of the film reaches several hundred Å, which causes an effect as an increase in noise when reproducing signals. For these reasons, it is preferable to limit the thickness of the oxide layer within the above-mentioned range.
【００１１】また前記窒化物層を形成する材料として、
例えばＳｉ，Ｚｒ，Ｙ，Ｍｇ，Ｔｉ，Ｔａ，Ｃａ，Ａｌ
のグループから選択された少なくとも１種以上の金属ま
たは半金属の窒化物が使用される。この窒化物層の膜厚
は、５００〜２０００Åの範囲に規制されている。この
窒化物層の膜厚が５００Å未満であると、透明基板や下
地層から拡散してくる水分や酸素などを効果的に遮蔽す
ることがてきない。また窒化物層の膜厚が２０００Åを
超えると、膜の圧縮応力が強くなり、前記酸化物層によ
る接着力の増加および付加的に効力をもたらしている応
力緩和効果もおよばなくなる。またこの領域を外れると
、窒化物層のもう１つの働きである光学多重干渉の機能
も失つてしまう。このような理由から、窒化物層の膜厚
は前述の範囲に規制する方が望ましい。[0011] Furthermore, as a material for forming the nitride layer,
For example, Si, Zr, Y, Mg, Ti, Ta, Ca, Al
A nitride of at least one metal or metalloid selected from the group of is used. The thickness of this nitride layer is limited to a range of 500 to 2000 Å. If the thickness of the nitride layer is less than 500 Å, it will not be possible to effectively block moisture, oxygen, etc. that diffuse from the transparent substrate or underlying layer. Furthermore, if the thickness of the nitride layer exceeds 2000 Å, the compressive stress of the film becomes strong, and the increased adhesion and additional stress relaxation effect provided by the oxide layer are no longer comparable. Further, outside this range, the nitride layer also loses its optical multiple interference function, which is another function. For these reasons, it is desirable to limit the thickness of the nitride layer within the above-mentioned range.
【００１２】次に本発明の実施例を図とともに説明する
。図１は、実施例に係る密着貼り合わせタイプの光デイ
スクの要部拡大断面図である。Next, an embodiment of the present invention will be explained with reference to the drawings. FIG. 1 is an enlarged sectional view of a main part of a closely bonded type optical disk according to an embodiment.
【００１３】図１において、図中の７はトラツキング用
の案内溝ならびにプリピツトパターンが上面に形成され
た円板状の透明基板、１は透明基板７の上に直接形成さ
れた酸化物層、２はその酸化物層１の上に形成された窒
化物層、３は光磁気記録膜、４は例えばＳｉＮなどの窒
化物からなる保護層、５は反射層である。In FIG. 1, reference numeral 7 denotes a disk-shaped transparent substrate on which a tracking guide groove and a prepit pattern are formed, and 1 denotes an oxide layer formed directly on the transparent substrate 7. , 2 is a nitride layer formed on the oxide layer 1, 3 is a magneto-optical recording film, 4 is a protective layer made of nitride such as SiN, and 5 is a reflective layer.
【００１４】このように透明基板７、酸化物層１、窒化
物層２、光磁気記録膜３、保護層４ならびに反射層５の
積層体からなるデイスク単板が製作される。そしてこの
２枚のデイスク単板を反射層５が互いに内側を向くよう
にして、接着剤層６を介して貼り合わせることによつて
密着貼り合わせタイプの光デイスクが製作される。[0014] In this way, a disk single plate is manufactured which is made up of a laminate of the transparent substrate 7, the oxide layer 1, the nitride layer 2, the magneto-optical recording film 3, the protective layer 4 and the reflective layer 5. Then, by bonding these two disk single plates together via an adhesive layer 6 with the reflective layers 5 facing inward, a close bonding type optical disk is manufactured.
【００１５】前記透明基板７としては、光学的に透明度
が高く、耐熱性に優れ、しかも成形性が良いなどの理由
からポリカーボネートが使用される。また、ポリカーボ
ネートの他に例えばポリメチルメタクリレート、、エポ
キシ樹脂などのプラスチツクを用いることもできる。Polycarbonate is used as the transparent substrate 7 because it has high optical transparency, excellent heat resistance, and good moldability. In addition to polycarbonate, plastics such as polymethyl methacrylate and epoxy resin can also be used.
【００１６】前記酸化物層１として、例えばＳｉＯ２
，ＺｒＯ２ ，Ｔａ２ Ｏ５ ，ＭｇＯ，Ｙ２ Ｏ３
，Ａｌ２ Ｏ３ ，ＣａＯなどの金属あるいは半金属の
酸化物が使用される。この酸化物層１の膜厚は、前述の
ような理由から３０〜８００Åの範囲に規制されている
。As the oxide layer 1, for example, SiO2
, ZrO2 , Ta2 O5 , MgO, Y2 O3
, Al2O3, CaO, or other metal or metalloid oxides are used. The thickness of this oxide layer 1 is limited to a range of 30 to 800 Å for the reasons mentioned above.
【００１７】前記窒化物層２として、例えばＡｌＮ，Ｂ
Ｎ，Ｓｉ３ Ｎ４ ，ＴａＮ，ＴｉＮなどの金属あるい
は半金属の窒化物が使用される。この窒化物層２の膜厚
は、前述のような理由から５００〜２０００Åの範囲に
規制されている。As the nitride layer 2, for example, AlN, B
Nitrides of metals or semimetals such as N, Si3 N4, TaN, and TiN are used. The thickness of this nitride layer 2 is limited to a range of 500 to 2000 Å for the reasons mentioned above.
【００１８】前記光磁気記録膜３として、例えばＧｄ−
Ｆｅ、Ｔｂ−Ｆｅ、Ｄｙ−Ｆｅ、Ｇｄ−Ｃｏ、Ｔｂ−Ｃ
ｏ、Ｄｙ−Ｃｏなどの２元合金、Ｇｅ−Ｔｂ−Ｆｅ、Ｇ
ｅ−Ｔｂ−Ｃｏ、Ｔｂ−Ｄｙ−Ｆｅ、Ｇｄ−Ｆｅ−Ｃｏ
、Ｔｂ−Ｆｅ−Ｃｏ、Ｄｙ−Ｆｅ−Ｃｏなどの３元合金
、Ｇｄ−Ｔｂ−Ｆｅ−Ｃｏ、Ｔｂ−Ｄｙ−Ｆｅ−Ｃｏ、
Ｇｄ−Ｔｂ−Ｆｅ−Ｇｅなどの４元合金などが使用され
る。また、メチン鎖を有するインドール系シアニン色素
などからなる有機化合物を使用することもできる。The magneto-optical recording film 3 may be made of, for example, Gd-
Fe, Tb-Fe, Dy-Fe, Gd-Co, Tb-C
o, binary alloys such as Dy-Co, Ge-Tb-Fe, G
e-Tb-Co, Tb-Dy-Fe, Gd-Fe-Co
, Tb-Fe-Co, ternary alloys such as Dy-Fe-Co, Gd-Tb-Fe-Co, Tb-Dy-Fe-Co,
Quaternary alloys such as Gd-Tb-Fe-Ge are used. Furthermore, an organic compound such as an indole cyanine dye having a methine chain can also be used.
【００１９】前記反射層５としては、例えばＡｌ、Ｔｉ
、Ｃｒあるいはこれらの合金などが使用される。The reflective layer 5 may be made of, for example, Al or Ti.
, Cr or alloys thereof are used.
【００２０】前記接着剤層６としては、例えばアクリル
系樹脂、エポキシ系樹脂あるいはホツトメルト系樹脂な
どが使用される。As the adhesive layer 6, for example, acrylic resin, epoxy resin, or hot melt resin is used.
【００２１】次に本発明の具体例と比較例について説明
する。なお、例示中のＰＣはポリカーボネート製の透明
基板を、カツコ書きの数字は膜厚を、それぞれ示してい
る。Next, specific examples of the present invention and comparative examples will be explained. Note that the PC in the example indicates a transparent substrate made of polycarbonate, and the numbers in brackets indicate the film thickness.
【００２２】（具体例１）(Specific example 1)
【００２３】（具体例２）(Specific example 2)
【００２４】（具体例３）(Specific example 3)
【００２５】（具体例４）(Specific example 4)
【００２６】（具体例５）(Specific example 5)
【００２７】（具体例６）(Specific example 6)
【００２８】（具体例７）(Specific example 7)
【００２９】（具体例８）(Specific example 8)
【００３０】（具体例９）(Specific example 9)
【００３１】（具体例１０）(Specific example 10)
【００３２】（比較例１）(Comparative Example 1)
【００３３】（比較例２）(Comparative Example 2)
【００３４】[0034]
【発明の効果】この本発明の具体例１〜１０の光デイス
ク単板と、従来例に係る比較例１、２の光デイスク単板
とを８０℃、９０％ＲＨの環境下において加速試験を行
つた結果を図２に示す。Effects of the Invention: The optical disc veneers of Specific Examples 1 to 10 of the present invention and the optical disc veneers of Comparative Examples 1 and 2 according to the conventional example were subjected to an accelerated test in an environment of 80° C. and 90% RH. The results are shown in Figure 2.
【００３５】この図から明らかなように、従来のもの、
特に透明基板上にＳｉＯのみの下地層を形成し、その上
に直接光記録膜を形成した比較例２のものは、ビツトエ
ラーレートが非常に高い。これに比較して本発明のもの
は、いずれのものにおいてもビツトエラーレートが非常
に低く、長期間経過しても性能的に安定していること、
即ち、信頼性の高い光情報記録媒体であることが立証で
きる。As is clear from this figure, the conventional
In particular, Comparative Example 2, in which a base layer made of SiO was formed on a transparent substrate and an optical recording film was directly formed thereon, had a very high bit error rate. In comparison, the devices of the present invention have extremely low bit error rates and are stable in performance even after a long period of time.
That is, it can be verified that the optical information recording medium is highly reliable.
【図１】本発明の実施例に係る密着貼り合わせ型光デイ
スクの要部拡大断面図である。FIG. 1 is an enlarged cross-sectional view of essential parts of a closely bonded optical disk according to an embodiment of the present invention.
【図２】本発明ならびに従来例に係る光デイスク単板の
ビツトエラー特性図である。FIG. 2 is a diagram showing bit error characteristics of a single optical disk according to the present invention and a conventional example.
１ 酸化物層 ２ 窒化物層 ３ 光記録膜 ４ 保護層 ５ 反射層 ６ 接着剤層 ７ 透明基板 1 Oxide layer 2 Nitride layer 3 Optical recording film 4 Protective layer 5 Reflective layer 6 Adhesive layer 7 Transparent substrate
Claims (4)
た光記録膜とを有し、前記透明基板側から集光したレー
ザ光を該光記録膜に照射することにより、情報の記録、
再生、消去を行う光情報記録媒体において、前記透明基
板と光記録膜の間に、金属または半金属の酸化物層と、
金属または半金属の窒化物層とを順次形成したことを特
徴とする光情報記録媒体。1. A transparent substrate and an optical recording film formed on the transparent substrate, and recording of information by irradiating the optical recording film with a laser beam focused from the transparent substrate side.
In an optical information recording medium for reproducing and erasing, a metal or semimetal oxide layer is provided between the transparent substrate and the optical recording film;
1. An optical information recording medium characterized in that metal or metalloid nitride layers are sequentially formed.
ならびに窒化物層が、Ｓｉ，Ｚｒ，Ｙ，Ｍｇ，Ｔｉ，Ｔ
ａ，Ｃａ，Ａｌのグループから選択された少なくとも１
種以上の酸化物ならびに窒化物であることを特徴とする
光情報記録媒体。2. The oxide layer and the nitride layer include Si, Zr, Y, Mg, Ti, and T.
At least one selected from the group of a, Ca, Al
An optical information recording medium characterized by being made of oxides and nitrides of at least one species.
の膜厚が３０〜８００Å、前記窒化物層の膜厚が５００
〜２０００Åの範囲に規制されていることを特徴とする
光情報記録媒体。3. The method according to claim 1, wherein the oxide layer has a thickness of 30 to 800 Å, and the nitride layer has a thickness of 500 Å.
An optical information recording medium characterized in that the optical information recording medium is regulated within a range of ~2000 Å.
がポリカーボネートであることを特徴とする光情報記録
媒体。4. The optical information recording medium according to claim 1, wherein the transparent substrate is made of polycarbonate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3116636A JPH04321948A (en) | 1991-04-22 | 1991-04-22 | Optical information recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3116636A JPH04321948A (en) | 1991-04-22 | 1991-04-22 | Optical information recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH04321948A true JPH04321948A (en) | 1992-11-11 |
Family
ID=14692110
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3116636A Pending JPH04321948A (en) | 1991-04-22 | 1991-04-22 | Optical information recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH04321948A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6153063A (en) * | 1996-03-11 | 2000-11-28 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information |
| US6268034B1 (en) | 1998-08-05 | 2001-07-31 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and method for producing the same, method for recording and reproducing information thereon and recording/reproducing apparatus |
| US6343062B1 (en) | 1997-09-26 | 2002-01-29 | Matsushita Electric Industrial Co., Ltd | Optical disk device and optical disk for recording and reproducing high-density signals |
| US6388984B2 (en) | 1997-08-28 | 2002-05-14 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and its recording and reproducing method |
| US6821707B2 (en) | 1996-03-11 | 2004-11-23 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information |
-
1991
- 1991-04-22 JP JP3116636A patent/JPH04321948A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6153063A (en) * | 1996-03-11 | 2000-11-28 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information |
| US6821707B2 (en) | 1996-03-11 | 2004-11-23 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information |
| US7037413B1 (en) | 1996-03-11 | 2006-05-02 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium, producing method thereof and method of recording/erasing/reproducing information |
| US6388984B2 (en) | 1997-08-28 | 2002-05-14 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and its recording and reproducing method |
| US6343062B1 (en) | 1997-09-26 | 2002-01-29 | Matsushita Electric Industrial Co., Ltd | Optical disk device and optical disk for recording and reproducing high-density signals |
| US6268034B1 (en) | 1998-08-05 | 2001-07-31 | Matsushita Electric Industrial Co., Ltd. | Optical information recording medium and method for producing the same, method for recording and reproducing information thereon and recording/reproducing apparatus |
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