JPH04321664A - Production of monomer composition - Google Patents
Production of monomer compositionInfo
- Publication number
- JPH04321664A JPH04321664A JP9087091A JP9087091A JPH04321664A JP H04321664 A JPH04321664 A JP H04321664A JP 9087091 A JP9087091 A JP 9087091A JP 9087091 A JP9087091 A JP 9087091A JP H04321664 A JPH04321664 A JP H04321664A
- Authority
- JP
- Japan
- Prior art keywords
- monomer
- acid ester
- organic solvent
- group
- thiomethacrylic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000178 monomer Substances 0.000 title claims abstract description 65
- 239000000203 mixture Substances 0.000 title claims abstract description 20
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- -1 thioacrylic acid ester Chemical class 0.000 claims abstract description 34
- 239000003960 organic solvent Substances 0.000 claims abstract description 33
- 150000002148 esters Chemical class 0.000 claims abstract description 30
- 239000002253 acid Substances 0.000 claims abstract description 22
- 238000002156 mixing Methods 0.000 claims description 5
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 abstract description 18
- 238000006116 polymerization reaction Methods 0.000 abstract description 12
- 230000003287 optical effect Effects 0.000 abstract description 10
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 abstract description 8
- 239000003112 inhibitor Substances 0.000 abstract description 8
- 239000011347 resin Substances 0.000 abstract description 8
- 229920005989 resin Polymers 0.000 abstract description 8
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 abstract description 7
- SQVGTULYLYOGPL-UHFFFAOYSA-N o-methyl prop-2-enethioate Chemical compound COC(=S)C=C SQVGTULYLYOGPL-UHFFFAOYSA-N 0.000 abstract description 6
- 229920000642 polymer Polymers 0.000 description 21
- 230000015572 biosynthetic process Effects 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 7
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 7
- 125000003710 aryl alkyl group Chemical group 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- LAQYHRQFABOIFD-UHFFFAOYSA-N 2-methoxyhydroquinone Chemical compound COC1=CC(O)=CC=C1O LAQYHRQFABOIFD-UHFFFAOYSA-N 0.000 description 4
- KUDUQBURMYMBIJ-UHFFFAOYSA-N 2-prop-2-enoyloxyethyl prop-2-enoate Chemical compound C=CC(=O)OCCOC(=O)C=C KUDUQBURMYMBIJ-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- WRIQZMMFAMFZSM-UHFFFAOYSA-N prop-2-enethioic s-acid Chemical class SC(=O)C=C WRIQZMMFAMFZSM-UHFFFAOYSA-N 0.000 description 3
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 238000005227 gel permeation chromatography Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000008282 halocarbons Chemical class 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 2
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- WSLDOOZREJYCGB-UHFFFAOYSA-N 1,2-Dichloroethane Chemical compound ClCCCl WSLDOOZREJYCGB-UHFFFAOYSA-N 0.000 description 1
- ROLAGNYPWIVYTG-UHFFFAOYSA-N 1,2-bis(4-methoxyphenyl)ethanamine;hydrochloride Chemical compound Cl.C1=CC(OC)=CC=C1CC(N)C1=CC=C(OC)C=C1 ROLAGNYPWIVYTG-UHFFFAOYSA-N 0.000 description 1
- JYUXDXWXTPSAEL-UHFFFAOYSA-N 1,4-dioxane;oxolane Chemical compound C1CCOC1.C1COCCO1 JYUXDXWXTPSAEL-UHFFFAOYSA-N 0.000 description 1
- LCJNYCWJKAWZKZ-UHFFFAOYSA-N 1-prop-1-en-2-ylnaphthalene Chemical compound C1=CC=C2C(C(=C)C)=CC=CC2=C1 LCJNYCWJKAWZKZ-UHFFFAOYSA-N 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- CYLVUSZHVURAOY-UHFFFAOYSA-N 2,2-dibromoethenylbenzene Chemical compound BrC(Br)=CC1=CC=CC=C1 CYLVUSZHVURAOY-UHFFFAOYSA-N 0.000 description 1
- VIYWVRIBDZTTMH-UHFFFAOYSA-N 2-[4-[2-[4-[2-(2-methylprop-2-enoyloxy)ethoxy]phenyl]propan-2-yl]phenoxy]ethyl 2-methylprop-2-enoate Chemical compound C1=CC(OCCOC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OCCOC(=O)C(C)=C)C=C1 VIYWVRIBDZTTMH-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- NNWNNQTUZYVQRK-UHFFFAOYSA-N 5-bromo-1h-pyrrolo[2,3-c]pyridine-2-carboxylic acid Chemical compound BrC1=NC=C2NC(C(=O)O)=CC2=C1 NNWNNQTUZYVQRK-UHFFFAOYSA-N 0.000 description 1
- KCMITHMNVLRGJU-CMDGGOBGSA-N Allyl cinnamate Chemical compound C=CCOC(=O)\C=C\C1=CC=CC=C1 KCMITHMNVLRGJU-CMDGGOBGSA-N 0.000 description 1
- 239000004322 Butylated hydroxytoluene Substances 0.000 description 1
- QXSWTQHHPGVRMT-UHFFFAOYSA-N C(C=C)(=S)OCC1=CC=CC=C1 Chemical compound C(C=C)(=S)OCC1=CC=CC=C1 QXSWTQHHPGVRMT-UHFFFAOYSA-N 0.000 description 1
- CBGSUANKNSADFQ-UHFFFAOYSA-N C1(=CC=CC=C1)OC(C=C)=S Chemical compound C1(=CC=CC=C1)OC(C=C)=S CBGSUANKNSADFQ-UHFFFAOYSA-N 0.000 description 1
- 229920002574 CR-39 Polymers 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- YMOONIIMQBGTDU-VOTSOKGWSA-N [(e)-2-bromoethenyl]benzene Chemical compound Br\C=C\C1=CC=CC=C1 YMOONIIMQBGTDU-VOTSOKGWSA-N 0.000 description 1
- FKRRNHGDZIXAEC-UHFFFAOYSA-N [2,6-dibromo-4-[2-[3,5-dibromo-4-(2-methylprop-2-enoyloxy)phenyl]propan-2-yl]phenyl] 2-methylprop-2-enoate Chemical compound C1=C(Br)C(OC(=O)C(=C)C)=C(Br)C=C1C(C)(C)C1=CC(Br)=C(OC(=O)C(C)=C)C(Br)=C1 FKRRNHGDZIXAEC-UHFFFAOYSA-N 0.000 description 1
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000004414 alkyl thio group Chemical group 0.000 description 1
- HXBPYFMVGFDZFT-UHFFFAOYSA-N allyl isocyanate Chemical compound C=CCN=C=O HXBPYFMVGFDZFT-UHFFFAOYSA-N 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- ZPOLOEWJWXZUSP-WAYWQWQTSA-N bis(prop-2-enyl) (z)-but-2-enedioate Chemical compound C=CCOC(=O)\C=C/C(=O)OCC=C ZPOLOEWJWXZUSP-WAYWQWQTSA-N 0.000 description 1
- CJKWEXMFQPNNTL-UHFFFAOYSA-N bis(prop-2-enyl) 1,2,3,4,7,7-hexachlorobicyclo[2.2.1]hept-2-ene-5,6-dicarboxylate Chemical compound C=CCOC(=O)C1C(C(=O)OCC=C)C2(Cl)C(Cl)=C(Cl)C1(Cl)C2(Cl)Cl CJKWEXMFQPNNTL-UHFFFAOYSA-N 0.000 description 1
- VPPSHXIFIAJKMX-UHFFFAOYSA-N bis(prop-2-enyl) 2,3-dihydroxybutanedioate Chemical compound C=CCOC(=O)C(O)C(O)C(=O)OCC=C VPPSHXIFIAJKMX-UHFFFAOYSA-N 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- ZDNFTNPFYCKVTB-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,4-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C=C1 ZDNFTNPFYCKVTB-UHFFFAOYSA-N 0.000 description 1
- JKJWYKGYGWOAHT-UHFFFAOYSA-N bis(prop-2-enyl) carbonate Chemical compound C=CCOC(=O)OCC=C JKJWYKGYGWOAHT-UHFFFAOYSA-N 0.000 description 1
- QUZSUMLPWDHKCJ-UHFFFAOYSA-N bisphenol A dimethacrylate Chemical compound C1=CC(OC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OC(=O)C(C)=C)C=C1 QUZSUMLPWDHKCJ-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000005997 bromomethyl group Chemical group 0.000 description 1
- 125000004799 bromophenyl group Chemical group 0.000 description 1
- 235000010354 butylated hydroxytoluene Nutrition 0.000 description 1
- 229940095259 butylated hydroxytoluene Drugs 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000007033 dehydrochlorination reaction Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 125000004188 dichlorophenyl group Chemical group 0.000 description 1
- IEPRKVQEAMIZSS-AATRIKPKSA-N diethyl fumarate Chemical compound CCOC(=O)\C=C\C(=O)OCC IEPRKVQEAMIZSS-AATRIKPKSA-N 0.000 description 1
- WTIFDVLCDRBEJK-VAWYXSNFSA-N diphenyl (e)-but-2-enedioate Chemical compound C=1C=CC=CC=1OC(=O)/C=C/C(=O)OC1=CC=CC=C1 WTIFDVLCDRBEJK-VAWYXSNFSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- NKHAVTQWNUWKEO-UHFFFAOYSA-N fumaric acid monomethyl ester Natural products COC(=O)C=CC(O)=O NKHAVTQWNUWKEO-UHFFFAOYSA-N 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- NKHAVTQWNUWKEO-NSCUHMNNSA-N monomethyl fumarate Chemical compound COC(=O)\C=C\C(O)=O NKHAVTQWNUWKEO-NSCUHMNNSA-N 0.000 description 1
- 229940005650 monomethyl fumarate Drugs 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- UFOIDTDZODXNSS-UHFFFAOYSA-N o-(2-benzylsulfanylethyl) 2-methylprop-2-enethioate Chemical compound CC(=C)C(=S)OCCSCC1=CC=CC=C1 UFOIDTDZODXNSS-UHFFFAOYSA-N 0.000 description 1
- AYUGZEPJBRZOHA-UHFFFAOYSA-N o-benzyl 2-methylprop-2-enethioate Chemical compound CC(=C)C(=S)OCC1=CC=CC=C1 AYUGZEPJBRZOHA-UHFFFAOYSA-N 0.000 description 1
- BKCXMAJNKHQRGE-UHFFFAOYSA-N o-ethyl 2-methylprop-2-enethioate Chemical compound CCOC(=S)C(C)=C BKCXMAJNKHQRGE-UHFFFAOYSA-N 0.000 description 1
- VHALHNJABQFTEG-UHFFFAOYSA-N o-methyl 2-methylprop-2-enethioate Chemical compound COC(=S)C(C)=C VHALHNJABQFTEG-UHFFFAOYSA-N 0.000 description 1
- JFYNBKUOAILUCA-UHFFFAOYSA-N o-phenyl 2-methylprop-2-enethioate Chemical compound CC(=C)C(=S)OC1=CC=CC=C1 JFYNBKUOAILUCA-UHFFFAOYSA-N 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052717 sulfur Chemical group 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000003866 trichloromethyl group Chemical group ClC(Cl)(Cl)* 0.000 description 1
- AFFZTFNQQHNSEG-UHFFFAOYSA-N trifluoromethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(F)(F)F AFFZTFNQQHNSEG-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、チオアクリル酸エステ
ルおよび/またはチオメタクリル酸エステルと、これと
共重合可能な他の単量体とよりなる単量体組成物の製造
方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a monomer composition comprising a thioacrylic acid ester and/or a thiomethacrylic acid ester and another monomer copolymerizable therewith.
【0002】0002
【従来の技術】チオアクリル酸エステルおよび/または
チオメタクリル酸エステルは、しばしばこれと共重合可
能な他の単量体と混合されて使用される。BACKGROUND OF THE INVENTION Thioacrylic acid esters and/or thiomethacrylic acid esters are often used in admixture with other monomers copolymerizable with them.
【0003】即ち、この単量体組成物は、光学材料とし
て有用であり、その他、塗料、インク、接着剤、ゴムの
加硫剤、感光性樹脂、架橋剤等に利用される。特に、こ
の組成物を重合して得られた樹脂は、耐衝撃性に優れ、
高屈折率を有するため、光学材料の分野において、有機
ガラス例えば、メガネレンズ、光学機器レンズ等の光学
レンズとして好適に使用される。That is, this monomer composition is useful as an optical material, and is also used in paints, inks, adhesives, rubber vulcanizing agents, photosensitive resins, crosslinking agents, and the like. In particular, the resin obtained by polymerizing this composition has excellent impact resistance,
Since it has a high refractive index, it is suitably used in the field of optical materials as an organic glass, for example, as an optical lens such as a spectacle lens or an optical equipment lens.
【0004】ところで、このチオアクリル酸エステルあ
るいはチオメタクリル酸エステルは、一般に有機溶媒溶
液中で、チオールとアクリル酸あるいはメタクリル酸を
脱水縮合させるか、チオールとアクリル酸塩化物あるい
はメタクリル酸塩化物とを塩基の存在下で脱塩化水素さ
せることにより合成される。このため、上記チオアクリ
ル酸エステルおよび/またはチオメタクリル酸エステル
は有機溶媒溶液として得られる。前記単量体組成物を製
造するには、こうして得られたチオアクリル酸エステル
および/またはチオメタクリル酸エステルの有機溶媒溶
液から溶媒を除去して上記チオアクリル酸エステルおよ
び/またはチオメタクリル酸エステルを単離した後、こ
れらと共重合可能な単量体を混合するのが常法である。By the way, this thioacrylic acid ester or thiomethacrylic acid ester is generally produced by dehydration condensation of thiol and acrylic acid or methacrylic acid in an organic solvent solution, or by combining thiol and acrylic acid chloride or methacrylic acid chloride. Synthesized by dehydrochlorination in the presence of a base. Therefore, the above-mentioned thioacrylic acid ester and/or thiomethacrylic acid ester can be obtained as an organic solvent solution. In order to produce the monomer composition, the solvent is removed from the organic solvent solution of the thioacrylic ester and/or thiomethacrylic ester obtained in this way to obtain the thioacrylic ester and/or thiomethacrylic ester. After isolation, it is a common method to mix these with a copolymerizable monomer.
【0005】[0005]
【発明が解決しようとする課題】ところが、チオアクリ
ル酸エステルおよび/またはチオメタクリル酸エステル
は、上記有機溶媒溶液から有機溶媒を除去する工程にお
いて部分的に重合し、重合体が生成してしまう。そのた
め、通常は、上記有機溶媒を除去する前に、有機溶媒溶
液中に重合禁止剤を添加しているが、重合体の生成抑制
において満足できるだけの効果は得られていない。上記
重合体を含むチオアクリル酸エステルおよび/またはチ
オメタクリル酸エステルを重合させて得た樹脂は、上記
重合体に起因して、例えば透明性、硬度等の諸物性が著
しく損なわれる。However, the thioacrylic acid ester and/or the thiomethacrylic acid ester are partially polymerized in the step of removing the organic solvent from the organic solvent solution, resulting in the formation of a polymer. Therefore, a polymerization inhibitor is usually added to the organic solvent solution before the organic solvent is removed, but a satisfactory effect in suppressing the formation of polymers has not been obtained. Resins obtained by polymerizing thioacrylic esters and/or thiomethacrylic esters containing the above polymers have various physical properties such as transparency and hardness that are significantly impaired due to the above polymers.
【0006】このような背景から、こうした重合体が生
成することなしに、簡単な操作で、前記単量体組成物を
製造する方法の開発が大きな課題となっていた。[0006] Against this background, it has been a major challenge to develop a method for producing the monomer compositions using simple operations without producing such polymers.
【0007】[0007]
【課題を解決するための手段】本発明者らは、上記の課
題を解決するために鋭意研究を重ねてきた。その結果、
チオアクリル酸エステルおよび/またはチオメタクリル
酸エステルを単量体として含む有機溶媒溶液から有機溶
媒を除去する前に、上記単量体と共重合可能な他の単量
体を混合することにより、この重合体の生成が防げるこ
とを見い出し、本発明を完成するに至った。[Means for Solving the Problems] The present inventors have made extensive research in order to solve the above problems. the result,
Before removing the organic solvent from an organic solvent solution containing thioacrylic acid ester and/or thiomethacrylic acid ester as a monomer, this monomer can be mixed with another monomer that can be copolymerized with the above monomer. They have discovered that the formation of polymers can be prevented, and have completed the present invention.
【0008】即ち、本発明は、チオアクリル酸エステル
および/またはチオメタクリル酸エステルを単量体とし
て含む有機溶媒溶液に上記単量体と共重合可能な他の単
量体を混合した後、有機溶媒を除去することを特徴とす
る上記単量体とこれと共重合可能な他の単量体とよりな
る単量体組成物の製造方法である。That is, in the present invention, after mixing other monomers copolymerizable with the above monomer into an organic solvent solution containing thioacrylic acid ester and/or thiomethacrylic acid ester as a monomer, A method for producing a monomer composition comprising the above-mentioned monomer and another monomer copolymerizable therewith, characterized in that the solvent is removed.
【0009】本発明において、チオアクリル酸エステル
およびチオメタクリル酸エステルは、公知の化合物が何
ら制限なく採用される。このうち好適に採用されるもの
としては、下記式(I)および(II)で示される化合
物が挙げられる。In the present invention, known compounds can be used as the thioacrylic ester and thiomethacrylic ester without any restriction. Among these, compounds represented by the following formulas (I) and (II) are preferably employed.
【0010】0010
【化1】[Chemical formula 1]
【0011】(但し、R1 は水素原子またはメチル基
であり、R2 およびR3 は夫々同種もしくは異種の
水素原子またはアルキル基であり、R4 は水素原子、
置換もしくは非置換のアルキル基、置換もしくは非置換
のアリール基または置換もしくは非置換のアラルキル基
であり、mは0以上の整数である。)(However, R1 is a hydrogen atom or a methyl group, R2 and R3 are the same or different hydrogen atoms or alkyl groups, respectively, and R4 is a hydrogen atom,
It is a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted aralkyl group, and m is an integer of 0 or more. )
【0012】0012
【化2】[Case 2]
【0013】〔但し、R1 およびR1 ′は水素原子
またはメチル基であり、Aは、[However, R1 and R1' are hydrogen atoms or methyl groups, and A is
【0014】[0014]
【化3】[Chemical 3]
【0015】[0015]
【化4】[C4]
【0016】または[0016] or
【0017】[0017]
【化5】[C5]
【0018】(但し、R2 及びR3 は上記式(I)
と同じであり、Xは酸素原子または硫黄原子であり、n
1,n2及びn3は0以上の整数である)である。〕上
記一般式(I)および(II)中、R2およびR3 は
、夫々同種もしくは異種の水素原子またはアルキル基で
あれば特に制限されないが、重合により得られる重合体
の光学材料への利用の観点からは、水素原子またはメチ
ル基であることが好ましい。(However, R2 and R3 are represented by the above formula (I)
is the same as , X is an oxygen atom or a sulfur atom, and n
1, n2 and n3 are integers greater than or equal to 0). ] In the above general formulas (I) and (II), R2 and R3 are not particularly limited as long as they are the same or different hydrogen atoms or alkyl groups, but from the viewpoint of the use of the polymer obtained by polymerization in optical materials. is preferably a hydrogen atom or a methyl group.
【0019】上記一般式(I)中、R4 は水素原子、
置換もしくは非置換のアルキル基、置換もしくは非置換
のアリール基、または置換もしくは非置換のアラルキル
基である。上記のアルキル基としては、その炭素数に特
に制限されるものではないが、チオアクリル酸エステル
およびチオメタクリル酸エステルの粘度および重合して
得られる重合体の屈折率の観点から、炭素数1〜5であ
ることが好ましい。例えば、メチル基,エチル基,n−
プロピル基,i−プロピル基,n−ブタル基,sec
−ブチル基,t−ブチル基,n−ペンチル基等が挙げら
れる。
また、上記のアリール基としては、その炭素数に特に制
限されるものではないが、上記と同様の理由により炭素
数6〜10であることが好ましい。例えば、フェニル基
,トリル基,キシリル基,ナフチル基等が挙げられる。
上記のアラルキル基としては、その炭素数に特に制限さ
れないが、上記と同様の理由により7〜10であること
が好ましい。例えば、ベンジル基,フェネチル基,フェ
ニルプロピル基等が挙げられる。In the above general formula (I), R4 is a hydrogen atom,
A substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted aralkyl group. The above alkyl group is not particularly limited in its carbon number, but from the viewpoint of the viscosity of the thioacrylic acid ester and thiomethacrylic acid ester and the refractive index of the polymer obtained by polymerization, the carbon number of the alkyl group is 1 to 1. It is preferable that it is 5. For example, methyl group, ethyl group, n-
Propyl group, i-propyl group, n-butal group, sec
-butyl group, t-butyl group, n-pentyl group, etc. Further, the above aryl group is not particularly limited in its carbon number, but preferably has 6 to 10 carbon atoms for the same reason as above. Examples include phenyl group, tolyl group, xylyl group, naphthyl group, and the like. The number of carbon atoms in the aralkyl group is not particularly limited, but is preferably 7 to 10 for the same reason as above. Examples include benzyl group, phenethyl group, phenylpropyl group, and the like.
【0020】上記R4 で示されるアルキル基,アリー
ル基及びアラルキル基の置換基としては、特に制限され
ず、ハロゲン原子,アルコキシ基,アルキルチオ基,フ
ェニル基,フェニルチオ基等を挙げることができる。こ
れらの置換アルキル基,置換アリール基及び置換アラル
キル基の代表的なものを例示すると、例えば、クロロフ
ェニルメチル基,ジブロモフェニルメチル基,トリブロ
モフェニルメチル基等のハロゲノアラルキル基;クロロ
メチル基,ブロモメチル基,トリクロロメチル基等のハ
ロゲノアルキル基;クロロエニル基,ブロモフェニル基
,ジクロロフェニル基,ジブロモフェニル基,トリブロ
モフェニル基等のハロゲノアリール基;メチルチオフェ
ニル基,ジ(メチルチオ)フェニル基,フェニルチオフ
ェニル基,ビフェニル基,メチルチオフェニルメチル基
,ジ(メチルチオ)フェニルメチル基等を挙げることが
できる。本発明においてこの一般式(I)中のR4 は
、得られる樹脂の用途に応じて選択すれば良いが、高屈
折率かつ低分散の樹脂を得るためには、置換もしくは非
置換のアラルキル基であることが好ましい。Substituents for the alkyl, aryl, and aralkyl groups represented by R4 are not particularly limited, and include halogen atoms, alkoxy groups, alkylthio groups, phenyl groups, phenylthio groups, and the like. Representative examples of these substituted alkyl groups, substituted aryl groups, and substituted aralkyl groups include, for example, halogenoaralkyl groups such as chlorophenylmethyl group, dibromophenylmethyl group, and tribromophenylmethyl group; chloromethyl group, bromomethyl group; , halogenoalkyl groups such as trichloromethyl group; halogenoaryl groups such as chloroenyl group, bromophenyl group, dichlorophenyl group, dibromophenyl group, tribromophenyl group; methylthiophenyl group, di(methylthio)phenyl group, phenylthiophenyl group, Examples include biphenyl group, methylthiophenylmethyl group, and di(methylthio)phenylmethyl group. In the present invention, R4 in general formula (I) may be selected depending on the use of the resulting resin, but in order to obtain a resin with a high refractive index and low dispersion, it is necessary to select a substituted or unsubstituted aralkyl group. It is preferable that there be.
【0021】また、上記一般式(I)並びに(II)中
のm、および一般式(II)中のn1,n2並びにn3
は0以上の整数であればよい。一般にはこれらの値を大
きくしすぎると一般式(I)及び(II)で示される化
合物の粘度が急激に増加し、その取扱いが困難になると
ともに、重合して得られる樹脂の耐熱性がそこなわれる
といった問題が生じてくる。このため、得られる樹脂の
屈折率,耐衝撃性及び耐熱性を勘案すると、m,n1,
n2及びn3は夫々0〜5の範囲で、特にmは1〜3の
範囲で、n1,n2及びn3は0〜2の範囲で選択する
ことが好ましい。In addition, m in the above general formulas (I) and (II), and n1, n2 and n3 in the general formula (II)
may be an integer greater than or equal to 0. Generally, if these values are made too large, the viscosity of the compounds represented by general formulas (I) and (II) will increase rapidly, making handling difficult, and the heat resistance of the resin obtained by polymerization will decrease. Problems arise, such as being left behind. Therefore, considering the refractive index, impact resistance, and heat resistance of the resulting resin, m, n1,
It is preferable that n2 and n3 are each selected in the range of 0 to 5, particularly m is selected in the range of 1 to 3, and n1, n2 and n3 are selected in the range of 0 to 2.
【0022】本発明において好適に採用されるチオアク
リル酸エステルおよび/またはチオメタクリル酸エステ
ルを例示すると、チオメタクリル酸メチル,チオメタク
リル酸エチル,チオメタクリル酸フェニル,チオメタク
リル酸ビフェニル,チオメタクリル酸ナフチル,チオメ
タクリル酸ベンジル,チオメタクリル酸クロロフェニル
,チオメタクリル酸トリブロモフェニル,チオアクリル
酸メチル,チオアクリル酸フェニル,チオアクリル酸ナ
フチル,チオアクリル酸ベンジル,ベンジルチオエチル
チオメタクリレート,ベンジルチオイソプロピルチオメ
タクリレート,エタンジチオールジチオメタクリレート
,イソプロピルジチオールジチオメタクリレートおよび
フェニルジチオールジチオメタクリレート等が挙げられ
る。Examples of thioacrylic acid esters and/or thiomethacrylic acid esters preferably employed in the present invention include methyl thiomethacrylate, ethyl thiomethacrylate, phenyl thiomethacrylate, biphenyl thiomethacrylate, and naphthyl thiomethacrylate. , benzyl thiomethacrylate, chlorophenyl thiomethacrylate, tribromophenyl thiomethacrylate, methyl thioacrylate, phenyl thioacrylate, naphthyl thioacrylate, benzyl thioacrylate, benzylthioethylthiomethacrylate, benzylthioisopropylthiomethacrylate, Examples include ethanedithioldithiomethacrylate, isopropyldithioldithiomethacrylate, and phenyldithioldithiomethacrylate.
【0023】本発明の製造方法では、まず、上記のチオ
アクリル酸エステルおよび/またはチオメタクリル酸エ
ステルを単量体として含む有機溶媒溶液に、この単量体
と共重合可能な他の単量体が混合される。この有機溶媒
としては、特に制限されることなく公知のものが使用で
きるが、好適に使用されるものを例示すれば、ベンゼン
,トルエン,キシレン,ヘキサン,ヘプタン,石油エー
テル等の脂肪族又は芳香族炭化水素類あるいはクロロホ
ルム,塩化メチレン,塩化エチレン等のハロゲン化炭素
水素類;ジエチルエーテル,ジオキサンテトラヒドロフ
ラン等のエーテル類;N,N−ジメチルホルムアミド等
のN,N−ジアルキルアミド類;ジメチルスルホキシド
類等が挙げられる。より好適には、重合禁止能をもつハ
ロゲン基を有し、且つ低沸点で除去が容易な前記ハロゲ
ン化炭化水素類を用いるのがよい。In the production method of the present invention, first, other monomers copolymerizable with this monomer are added to an organic solvent solution containing the above-mentioned thioacrylic acid ester and/or thiomethacrylic acid ester as a monomer. are mixed. As this organic solvent, known ones can be used without particular limitation, but examples of those that are preferably used include aliphatic or aromatic solvents such as benzene, toluene, xylene, hexane, heptane, and petroleum ether. Hydrocarbons or halogenated hydrocarbons such as chloroform, methylene chloride, and ethylene chloride; ethers such as diethyl ether and dioxane tetrahydrofuran; N,N-dialkylamides such as N,N-dimethylformamide; dimethyl sulfoxide, etc. Can be mentioned. More preferably, the above-mentioned halogenated hydrocarbons are used, which have a halogen group capable of inhibiting polymerization, have a low boiling point, and are easily removed.
【0024】本発明において、チオアクリル酸エステル
および/またはチオメタクリル酸エステルを単量体とし
て含む有機溶媒溶液は、該単量体が上記の有機溶媒に溶
解しているものであれば何ら制限されることなく採用で
きる。チオアクリル酸エステルおよび/またはチオメタ
クリル酸エステルの合成は、通常、前記したように有機
溶媒中で行なわれるため、これら単量体の合成工程で得
られる該単量体の有機溶媒溶液をそのまま用いることが
できる。また、上記有機溶媒溶液中の上記単量体の濃度
は、通常1〜50重量%の範囲で行うのが好ましい。In the present invention, the organic solvent solution containing thioacrylic acid ester and/or thiomethacrylic acid ester as a monomer is not subject to any restrictions as long as the monomer is dissolved in the above-mentioned organic solvent. You can hire them without any hassle. Since the synthesis of thioacrylic acid ester and/or thiomethacrylic acid ester is usually carried out in an organic solvent as described above, the organic solvent solution of the monomer obtained in the synthesis process of these monomers can be used as is. be able to. Moreover, it is preferable that the concentration of the monomer in the organic solvent solution is usually in the range of 1 to 50% by weight.
【0025】本発明において、チオアクリル酸エステル
および/またはチオメタクリル酸エステルと共重合可能
な他の単量体は、特に制限されるものではなく、得よう
とする単量体組成物の用途に応じて適宜選択すればよい
。In the present invention, other monomers that can be copolymerized with thioacrylic acid ester and/or thiomethacrylic acid ester are not particularly limited, and may be used depending on the use of the monomer composition to be obtained. It may be selected as appropriate.
【0026】例示すれば、アクリル酸,メタクリル酸,
無水マレイン酸,フマル酸などの不飽和カルボン酸;ア
クリル酸メチル,メタクリル酸メチル,メタクリル酸ベ
ンジル,メタクリル酸フェニル,メタクリル酸2−ヒド
ロキシエチル,エチレングリコールジアクリレート,ジ
エチレングリコールジメタクリレート,ビスフェノール
Aジメタクリレート,2,2−ビス(4−メタクリロキ
シエトキシフェニル)プロパン,2,2−ビス(3,5
−ジブロモ−4−メタクリロキシフェニル)プロパン,
トリフルオロメチルメタクリレート,ウレタンアクリレ
ート,エポキシアクリレート等のアクリル酸及びメタク
リル酸エステル化合物;フマル酸モノメチル,フマル酸
ジエチル,フマル酸ジフェニル等のフマル酸エステル化
合物;ジアリルフタレート,ジアリルテレフタレート,
ジアリルイソフタレート,酒石酸ジアリル,エポキシコ
ハク酸ジアリル,ジアリルマレート,アリルシンナメー
ト,アリルイソシアネート,クロレンド酸ジアリル,ヘ
キサフタル酸ジアリル,ジアリルカーボネート,アリル
ジグリコールカーボネート等のアリル化合物;スチレン
,クロロスチレン,メチルスチレン,ビニルナフタレン
,イソプロペニルナフタレン,ブロモスチレン,ジブロ
モスチレン等の芳香族ビニル化合物等である。Examples include acrylic acid, methacrylic acid,
Unsaturated carboxylic acids such as maleic anhydride and fumaric acid; methyl acrylate, methyl methacrylate, benzyl methacrylate, phenyl methacrylate, 2-hydroxyethyl methacrylate, ethylene glycol diacrylate, diethylene glycol dimethacrylate, bisphenol A dimethacrylate, 2,2-bis(4-methacryloxyethoxyphenyl)propane, 2,2-bis(3,5
-dibromo-4-methacryloxyphenyl)propane,
Acrylic acid and methacrylic acid ester compounds such as trifluoromethyl methacrylate, urethane acrylate, and epoxy acrylate; Fumaric acid ester compounds such as monomethyl fumarate, diethyl fumarate, and diphenyl fumarate; diallyl phthalate, diallyl terephthalate,
Allyl compounds such as diallyl isophthalate, diallyl tartrate, diallyl epoxysuccinate, diallyl maleate, allyl cinnamate, allyl isocyanate, diallyl chlorendate, diallyl hexaphthalate, diallyl carbonate, allyl diglycol carbonate; styrene, chlorostyrene, methylstyrene , vinylnaphthalene, isopropenylnaphthalene, bromostyrene, dibromostyrene, and other aromatic vinyl compounds.
【0027】これらの単量体の中でも特に、1官能性の
単量体は後述する有機溶媒の除去工程で重合体の生成の
抑制効果が良好であるため好ましい。これらの単量体は
一種又は二種以上を混合して使用できる。また、前記有
機溶媒溶液とこの共重合可能な他の単量体との混合量は
、特に制限されるものではないが、一般的には該他の単
量体の混合量が多いほど重合体の生成を抑制する効果は
高くなる。他の単量体の混合量は、通常は、チオアクリ
ル酸エステルおよび/またはチオメタクリル酸エステル
の100重量部に対して、混合する他の単量体が1官能
性のものの場合、5〜1000重量部好ましくは10〜
100重量部、この他の単量体が2官能性以上のものの
場合、10〜1000重量部好ましくは50〜1000
重量部であるのが好適である。Among these monomers, monofunctional monomers are particularly preferred because they have a good effect of suppressing the formation of polymers in the organic solvent removal step described below. These monomers can be used alone or in combination of two or more. Further, the amount of the organic solvent solution mixed with this copolymerizable other monomer is not particularly limited, but generally speaking, the larger the amount of the other monomer mixed, the more the polymer becomes The effect of suppressing the formation of is increased. The amount of other monomers to be mixed is usually 5 to 1000 parts by weight when the other monomers to be mixed are monofunctional, based on 100 parts by weight of thioacrylic acid ester and/or thiomethacrylic acid ester. Part by weight preferably 10~
100 parts by weight, if the other monomer is difunctional or higher, 10 to 1000 parts by weight, preferably 50 to 1000 parts by weight
Parts by weight are preferred.
【0028】本発明において、チオアクリル酸エステル
および/またはチオメタクリル酸エステルの有機溶媒溶
液には、上記共重合可能な他の単量体の外に、重合禁止
剤やその他の各種安定剤を混合してもよい。特に重合禁
止剤の混合は、重合体の生成の抑制効果を高める上で好
ましい。こうした重合禁止剤を例示すれば、ハイドロキ
ノン,メトキシハイドロキノン,p−メトキシフェノー
ル,ter−ブチルカテコール,ブチルヒドロキシトル
エン等が挙げられ、これらは一種又は二種以上を混合し
て使用できる。また、その混合量は、特に制限されるも
のではないが、一般にはチオアクリル酸エステルおよび
/またはチオメタクリル酸エステル100重量部に対し
て0.0001〜1重量部好ましくは0.001〜0.
1重量部であるのが好ましい。In the present invention, a polymerization inhibitor and other various stabilizers are mixed in the organic solvent solution of thioacrylic acid ester and/or thiomethacrylic acid ester in addition to the above-mentioned other copolymerizable monomers. You may. In particular, it is preferable to mix a polymerization inhibitor in order to enhance the effect of suppressing the formation of a polymer. Examples of such polymerization inhibitors include hydroquinone, methoxyhydroquinone, p-methoxyphenol, ter-butylcatechol, butylated hydroxytoluene, and these can be used alone or in combination of two or more. The mixing amount is not particularly limited, but is generally 0.0001-1 part by weight, preferably 0.001-0.
Preferably it is 1 part by weight.
【0029】本発明において、上記共重合可能な他の単
量体が混合された、チオアクリル酸エステルおよび/ま
たはチオメタクリル酸エステルを単量体として含む有機
溶媒溶液からの有機溶媒の除去は、特に制限されるもの
ではない。例示すれば、エバポレーターを用いて該有機
溶媒量を数%程度にした後、真空ポンプを用いてさらに
残存する有機溶媒を除去する方法が簡便さの面から好適
である。有機溶媒溶液の溶媒除去時の温度は溶媒除去が
可能な温度であれば特に制限されるものではなく一般に
−10℃〜50℃、好ましくは0〜30℃の範囲から採
用される。本発明では、チオアクリル酸エステルおよび
/またはチオメタクリレート酸エステルが、これと共重
合可能な他の単量体により希釈されているため、こうし
て有機溶媒を除去しても重合体が生成することが防止さ
れる。In the present invention, the removal of the organic solvent from the organic solvent solution containing the thioacrylic acid ester and/or thiomethacrylic acid ester as a monomer with which the other copolymerizable monomers are mixed is carried out by: There are no particular restrictions. For example, a method is preferred from the viewpoint of simplicity, in which the amount of the organic solvent is reduced to about several percent using an evaporator, and then the remaining organic solvent is further removed using a vacuum pump. The temperature at which the solvent is removed from the organic solvent solution is not particularly limited as long as the solvent can be removed, and is generally from -10°C to 50°C, preferably from 0 to 30°C. In the present invention, the thioacrylate and/or thiomethacrylate are diluted with other monomers that can be copolymerized with the thioacrylate and/or thiomethacrylate, so even if the organic solvent is removed, a polymer cannot be produced. Prevented.
【0030】[0030]
【発明の効果】本発明の製造方法によれば、有機溶媒の
除去時に重合体を生成させることなく、チオアクリル酸
エステルおよび/またはチオメタクリル酸エステルと、
これと共重合可能な他の単量体とよりなる単量体組成物
を製造することができる。この単量体組成物は、例えば
公知のラジカル重合方法等により重合した場合、得られ
た共重合体は高屈折率の外、透明性、硬度等の諸物性に
優れたものとなる。従って、単量体組成物は、有機ガラ
ス、例えばメガネレンズ、光学機器レンズ等の光学レン
ズ、あるいはプリズム、光ディスク基板、光ファイバー
等の原料として好適に使用することができ、本発明の製
造方法は、極めて有用である。Effects of the Invention According to the production method of the present invention, thioacrylic acid ester and/or thiomethacrylic acid ester, without forming a polymer during removal of the organic solvent,
A monomer composition comprising this and other copolymerizable monomers can be produced. When this monomer composition is polymerized, for example, by a known radical polymerization method, the resulting copolymer has a high refractive index, as well as excellent physical properties such as transparency and hardness. Therefore, the monomer composition can be suitably used as a raw material for organic glasses, such as optical lenses such as eyeglass lenses and optical equipment lenses, or prisms, optical disc substrates, and optical fibers, and the production method of the present invention Extremely useful.
【0031】[0031]
【実施例】以下、本発明を具体的に説明するために、実
施例を挙げて説明するが、本発明はこれらの実施例に限
定されるものではない。[Examples] The present invention will be described below with reference to Examples in order to specifically explain the present invention, but the present invention is not limited to these Examples.
【0032】実施例1
チオアクリル酸メチルを10gを含む塩化メチレン溶液
100gにメタクリル酸2−ヒドロキシエチルを1g混
合した後、エバポレーターで25℃で減圧下に塩化メチ
レンの除去操作を行った後、さらに真空ポンプで常温で
1時間塩化メチレンを除去した。得られた単量体組成物
中の重合体の生成量をGPC(ゲルパーミエーションク
ロマトグラフィー)を用い測定した。カラムは日立化成
(株)A−110を使用し、検出器はエルマ光学(株)
製示差屈折計(ERC−7510型)を用いた。その結
果、重合体の生成量は検出限界である0.01重量%以
下であった。Example 1 After mixing 1 g of 2-hydroxyethyl methacrylate with 100 g of a methylene chloride solution containing 10 g of methyl thioacrylate, the methylene chloride was removed using an evaporator at 25° C. under reduced pressure. Methylene chloride was removed using a vacuum pump at room temperature for 1 hour. The amount of polymer produced in the obtained monomer composition was measured using GPC (gel permeation chromatography). The column used was Hitachi Chemical Co., Ltd. A-110, and the detector was Elma Optical Co., Ltd.
A differential refractometer (Model ERC-7510) manufactured by Komatsu, Ltd. was used. As a result, the amount of polymer produced was below 0.01% by weight, which is the detection limit.
【0033】比較例1
実施例1においてメタクリル酸2−ヒドロキシエチルを
混合しないこと以外は、すべて実施例1と同様の操作を
実施した。得られたチオアクリル酸メチル中には2.0
1重量%の重合体が生成していた。Comparative Example 1 The same operations as in Example 1 were carried out except that 2-hydroxyethyl methacrylate was not mixed. The obtained methyl thioacrylate contained 2.0
1% by weight of polymer was produced.
【0034】比較例2
実施例1においてメタクリル酸2−ヒドロキシエチルを
混合する代わりに、重合禁止剤としてハイドロキノン0
.01gを混合した以外は、すべて実施例1と同様の操
作を実施した。得られたチオアクリル酸メチル中には0
.50重量%の重合体が生成していた。Comparative Example 2 Instead of mixing 2-hydroxyethyl methacrylate in Example 1, hydroquinone 0 was used as a polymerization inhibitor.
.. The same operations as in Example 1 were carried out except that 01g was mixed. The obtained methyl thioacrylate contains 0
.. 50% by weight of polymer was produced.
【0035】実施例2
実施例1においてチオアクリル酸メチルの代わりに表1
に示す各種のチオアクリル酸エステルまたはチオメタク
リル酸エステルをそれぞれ用いる以外はすべて実施例1
と同様の操作を実施した。得られた単量体組成物はいず
れも重合体の生成量が0.01重量%以下であった。Example 2 Table 1 was used instead of methyl thioacrylate in Example 1.
Example 1 except that various thioacrylic acid esters or thiomethacrylic acid esters shown in were used, respectively.
The same operation was performed. In all of the obtained monomer compositions, the amount of produced polymer was 0.01% by weight or less.
【0036】[0036]
【表1】[Table 1]
【0037】実施例3
実施例1において塩化メチレン100gの代わりに表2
に示す各種、各量の有機溶媒をそれぞれ用いた以外はす
べて実施例1と同様の操作を実施した。得られた単量体
組成物中の重合体の量を表2に示す。Example 3 Table 2 was used instead of 100 g of methylene chloride in Example 1.
The same operations as in Example 1 were carried out except that the various types and amounts of organic solvents shown in were used. Table 2 shows the amount of polymer in the obtained monomer composition.
【0038】[0038]
【表2】[Table 2]
【0039】実施例4
実施例1においてメタクリル酸2−ヒドロキシエチル1
gの代わりに表3に示す各種各量の単量体をそれぞれ用
いた以外はすべて実施例1と同様の操作を実施した。得
られた単量体組成物中の重合体の量を表3に示す。Example 4 In Example 1, 2-hydroxyethyl methacrylate 1
The same operations as in Example 1 were carried out except that the various amounts of monomers shown in Table 3 were used instead of g. Table 3 shows the amount of polymer in the obtained monomer composition.
【0040】[0040]
【表3】[Table 3]
【0041】実施例5
実施例1においてメタクリル酸2−ヒドロキシエチルの
代わりにエチレングリコールジアクリレート1gを用い
、さらに重合禁止剤としてハイドロキノン、メトキシハ
イドロキノン、p−メトキシフェノール、ter−ブチ
ルカテコールまたはブチルヒドロキシトルエンをそれぞ
れ0.01g添加する以外は、すべて実施例1と同様の
操作を実施した。得られた単量体組成物は、いずれの重
合禁止剤を添加した場合も重合体の生成量が0.01重
量%以下であった。Example 5 In Example 1, 1 g of ethylene glycol diacrylate was used instead of 2-hydroxyethyl methacrylate, and hydroquinone, methoxyhydroquinone, p-methoxyphenol, ter-butylcatechol or butylhydroxytoluene was used as a polymerization inhibitor. The same operations as in Example 1 were carried out except that 0.01 g of each was added. In the obtained monomer composition, the amount of polymer produced was 0.01% by weight or less regardless of which polymerization inhibitor was added.
Claims (1)
はチオメタクリル酸エステルを単量体として含む有機溶
媒溶液に上記単量体と共重合可能な他の単量体を混合し
た後、有機溶媒を除去することを特徴とする上記単量体
とこれと共重合可能な他の単量体とよりなる単量体組成
物の製造方法。[Claim 1] After mixing another monomer copolymerizable with the above monomer into an organic solvent solution containing a thioacrylic acid ester and/or a thiomethacrylic acid ester as a monomer, the organic solvent is removed. A method for producing a monomer composition comprising the above monomer and another monomer copolymerizable therewith.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9087091A JPH04321664A (en) | 1991-04-22 | 1991-04-22 | Production of monomer composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9087091A JPH04321664A (en) | 1991-04-22 | 1991-04-22 | Production of monomer composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04321664A true JPH04321664A (en) | 1992-11-11 |
Family
ID=14010554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9087091A Pending JPH04321664A (en) | 1991-04-22 | 1991-04-22 | Production of monomer composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04321664A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0551419A (en) * | 1991-08-23 | 1993-03-02 | Kureha Chem Ind Co Ltd | High refractive index synthetic resin optical material |
CN110804129A (en) * | 2019-11-15 | 2020-02-18 | 江南大学 | Preparation method of high-refractive-index optical material with ultraviolet shielding effect |
-
1991
- 1991-04-22 JP JP9087091A patent/JPH04321664A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0551419A (en) * | 1991-08-23 | 1993-03-02 | Kureha Chem Ind Co Ltd | High refractive index synthetic resin optical material |
CN110804129A (en) * | 2019-11-15 | 2020-02-18 | 江南大学 | Preparation method of high-refractive-index optical material with ultraviolet shielding effect |
CN110804129B (en) * | 2019-11-15 | 2021-04-02 | 江南大学 | Preparation method of high-refractive-index optical material with ultraviolet shielding effect |
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