JPH04306234A - New polyimide copolymer - Google Patents

New polyimide copolymer

Info

Publication number
JPH04306234A
JPH04306234A JP9817391A JP9817391A JPH04306234A JP H04306234 A JPH04306234 A JP H04306234A JP 9817391 A JP9817391 A JP 9817391A JP 9817391 A JP9817391 A JP 9817391A JP H04306234 A JPH04306234 A JP H04306234A
Authority
JP
Japan
Prior art keywords
formula
give
compound
bis
copolymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9817391A
Other languages
Japanese (ja)
Other versions
JP2724424B2 (en
Inventor
Yoshifumi Okada
好史 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanegafuchi Chemical Industry Co Ltd
Original Assignee
Kanegafuchi Chemical Industry Co Ltd
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Filing date
Publication date
Application filed by Kanegafuchi Chemical Industry Co Ltd filed Critical Kanegafuchi Chemical Industry Co Ltd
Priority to JP3098173A priority Critical patent/JP2724424B2/en
Publication of JPH04306234A publication Critical patent/JPH04306234A/en
Application granted granted Critical
Publication of JP2724424B2 publication Critical patent/JP2724424B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0346Organic insulating material consisting of one material containing N

Landscapes

  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Abstract

PURPOSE:To obtain a new polyimide copolymer having excellent heat resistance, high modulus of elasticity, low thermal expansion, low dielectric constant and low water vapor absorption, comprising an aromatic tetracarboxylic dianhydride having introduced furan ring in the main chain as a production raw material. CONSTITUTION:(A) 3-Bromo- or 3-iodo-o-xylene is reacted with metal magnesium or metal lithium in an ether or aprotic solvent and then with a furan compound to give a compound (e.g. bis-o-xylinofuryl) shown by formula I (m is 1-3), which is oxidized and is subjected to ring closure through dehydration to give an acid anhydride shown by formula II. (B) The acid anhydride shown by formula II is polymerized with a diamine compound (preferably long-chain aromatic diamine) shown by formula III (R is bifunctional organic group) in an equimolar ratio in an organic polar solvent (e.g. dimethyl sulfoxide) to give a solution of a polyamic acid copolymer and the solution is thermally dehydrated or dehydrated with a dehydrating agent to give a new polyimide copolymer having a structural unit shown by formula IV.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、耐熱性に優れ、低吸湿
性、低誘電率である新規なポリイミド共重合体に関する
ものである。
FIELD OF THE INVENTION The present invention relates to a novel polyimide copolymer which has excellent heat resistance, low moisture absorption, and low dielectric constant.

【0002】0002

【従来の技術】従来、ポリイミド樹脂は優れた耐熱性と
ともに電気絶縁性にも優れ、電気機器を初めとして、広
く工業材料として用いられてきた。ポリイミド樹脂は、
このように他のポリマーに比べ種々の優れた特性を持つ
が、技術の進歩とともに求められる要求特性もますます
高度なものとなり、用途に応じて種々の性能を合わせ持
つことが望まれている。例えば、フレキシブルプリント
基板用ベースフィルムやTAB(テープオートメーテッ
ドボンディング)用キャリアテープとしては、高耐熱性
、高弾性率、低熱膨張率、低誘電率、低吸湿性であるこ
とが望まれ、積層板用樹脂あるいはLSI用の層間絶縁
膜としては、誘電率、吸湿率、熱膨張率が小さいことが
望まれており、かかる特性を持つポリイミドを得るため
に、特開昭50−5383では、本発明に用いる酸無水
物に近い構造の酸無水物が合成されている。しかし、こ
れらの性能をさらに高い次元で両立するポリイミドの出
現が待たれている。
Conventionally, polyimide resins have excellent heat resistance and electrical insulation properties, and have been widely used as industrial materials including electrical equipment. Polyimide resin is
As described above, it has various superior properties compared to other polymers, but as technology advances, the required properties are becoming increasingly sophisticated, and it is desired to have a combination of various performances depending on the application. For example, base films for flexible printed circuit boards and carrier tapes for TAB (tape automated bonding) are desired to have high heat resistance, high modulus of elasticity, low coefficient of thermal expansion, low dielectric constant, and low moisture absorption. It is desired that the dielectric constant, moisture absorption rate, and coefficient of thermal expansion be small for resins for use or interlayer insulating films for LSIs, and in order to obtain polyimide with such characteristics, the present invention An acid anhydride with a structure similar to the acid anhydride used for has been synthesized. However, the emergence of polyimide that achieves both of these properties at a higher level is awaited.

【0003】0003

【発明が解決しようとする課題】本発明は、高弾性率、
低熱膨張性、低誘電率、低吸湿性などの優れた特性を有
するポリイミド共重合体を提供することを目的とする。
[Problems to be Solved by the Invention] The present invention has a high elastic modulus,
The purpose of the present invention is to provide a polyimide copolymer having excellent properties such as low thermal expansion, low dielectric constant, and low moisture absorption.

【0004】0004

【課題を解決するための手段】上記目的を達成するため
に、本発明者らは鋭意検討の結果、特定の下記構造単位
を有する新規ポリイミド組成物を見いだし本発明を完成
した。即ち、本発明は、下記一般式(I)
[Means for Solving the Problems] In order to achieve the above object, the inventors of the present invention have conducted intensive studies and have found a new polyimide composition having the specific structural unit shown below, and have completed the present invention. That is, the present invention provides the following general formula (I)

【0005】[0005]

【化2】[Case 2]

【0006】(ただし、m=1〜3の整数、Rは2価の
有機基を示す。)で表される構造単位を有する新規ポリ
イミド共重合体を内容とするものである。
(However, m is an integer of 1 to 3, and R represents a divalent organic group.) It contains a novel polyimide copolymer having a structural unit represented by the following formula.

【0007】以下、本発明を詳細に説明する。本発明者
らは、ポリイミドの分子構造について種々検討を行い、
ビフェニルテトラカルボン酸の主鎖にフラン環を導入し
た下記構造式(A)
The present invention will be explained in detail below. The present inventors conducted various studies on the molecular structure of polyimide, and
Structural formula (A) below in which a furan ring is introduced into the main chain of biphenyltetracarboxylic acid

【0008】[0008]

【化3】[Chemical formula 3]

【0009】(ただし、m=1〜3の整数)で表される
化合物を用いれば、酸無水物の分子量が増加するために
ポリイミドの極性部分であるイミド環の割合が小さくな
り、低誘電率、低吸湿性を実現できることを見いだし、
該化合物と種々の芳香族ジアミンを反応させることによ
り、誘電率、吸湿率とともに従来のポリイミドに比較し
て小さいポリイミド共重合体が得られることを見出した
。本発明のポリイミド共重合体は、その前駆体であるポ
リアミック酸共重合体溶液から得られるが、このポリア
ミック酸共重合体溶液は公知の方法で製造することがで
きる。即ち、酸無水物とジアミン成分を実質等モル使用
し、有機極性溶媒中で重合して得られる。
[0009] If a compound represented by (m = an integer of 1 to 3) is used, the molecular weight of the acid anhydride increases, and the proportion of imide rings, which are the polar parts of polyimide, decreases, resulting in a low dielectric constant. , found that low hygroscopicity could be achieved,
It has been found that by reacting this compound with various aromatic diamines, a polyimide copolymer having a lower dielectric constant and moisture absorption rate than conventional polyimides can be obtained. The polyimide copolymer of the present invention is obtained from a polyamic acid copolymer solution which is a precursor thereof, and this polyamic acid copolymer solution can be produced by a known method. That is, it is obtained by using substantially equimolar amounts of acid anhydride and diamine components and polymerizing them in an organic polar solvent.

【0010】ポリアミック酸を得るのに用いる芳香族テ
トラカルボン酸二無水物としては、前記構造式(A)で
示される化合物が好適である。上記構造式(A)で表さ
れるテトラカルボン酸二無水物の製造原料である下記構
造式(B)
[0010] As the aromatic tetracarboxylic dianhydride used to obtain the polyamic acid, a compound represented by the above structural formula (A) is suitable. The following structural formula (B) is a raw material for producing the tetracarboxylic dianhydride represented by the above structural formula (A).

【0011】[0011]

【化4】[C4]

【0012】(ただし、m=1〜3の整数)で表される
ビスo−キシリノフリル、ビスo−キシリノビフリル、
ビスo−キシリノターフリルは、例えば以下の方法で合
成することができる。下記反応式(C)
[0012] Bis o-xylinofuryl, bis o-xylinobifuryl, represented by (where m = an integer of 1 to 3);
Bis-o-xylinotafuryl can be synthesized, for example, by the following method. The following reaction formula (C)

【0013】[0013]

【化5】[C5]

【0014】(ただし、XはBr又はI、mは1〜3の
整数、Mは金属マグネシウム又は金属リチウム)で示さ
れるように、エーテル中或いは非プロトン性溶媒中で3
−ブロモ−o−キシレン或いは3−ヨード−o−キシレ
ンに金属マグネシウム或いは金属リチウムを反応させ、
次にフラン化合物
(where X is Br or I, m is an integer of 1 to 3, M is metallic magnesium or metallic lithium), in ether or an aprotic solvent.
-Reacting bromo-o-xylene or 3-iodo-o-xylene with metal magnesium or metal lithium,
Next, the furan compound

【0015】[0015]

【化6】[C6]

【0016】(ただし、XはI又はBr、mは1〜3の
整数)と反応させることにより、構造式(B)で表され
る化合物を合成することができる。また、下記反応式(
D)で示されるように、水、メタノール或いは水とメタ
ノール混合液中で3−ブロモ−o−キシレン或いは3−
ヨード−o−キシレンと上記フラン化合物とを、金属パ
ラジウム、パラジウムと水銀の合金、塩化パラジウム或
いは塩化パラジウムと塩化第二水銀の混合物を触媒とし
て、過酸化水素で酸化カップリングすることにより構造
式(B)で表される化合物を合成することができる。
(where X is I or Br, and m is an integer of 1 to 3), the compound represented by the structural formula (B) can be synthesized. In addition, the following reaction formula (
As shown in D), 3-bromo-o-xylene or 3-bromo-o-xylene or 3-bromo-o-xylene in water, methanol, or a mixture of water and methanol
The structural formula ( A compound represented by B) can be synthesized.

【0017】[0017]

【化7】[C7]

【0018】(ただし、XはBr又はI、mは1〜3の
整数、触媒はパラジウム、パラジウムと水銀の合金、或
いは塩化パラジウムと塩化第二水銀の混合物)
(However, X is Br or I, m is an integer from 1 to 3, and the catalyst is palladium, an alloy of palladium and mercury, or a mixture of palladium chloride and mercuric chloride)

【001
9】次に、構造式(B)で表されるビスo−キシリノフ
リル、ビスo−キシリノビフリル、ビスo−キシリノタ
ーフリルから、構造式(A)で表されるテトラカルボン
酸二無水物への酸化、脱水反応であるが、これは通常の
酸化、脱水閉環手法によって行うことができる。例えば
、過マンガン酸カリウム法、硝酸法等によるメチル基の
酸化、および無水酢酸法、加熱脱水法等による酸無水物
化法が採用できる。また、五酸化バナジウムを触媒とし
て空気酸化により直接酸無水物化する方法も採用可能で
ある。
001
9] Next, from bis o-xylinofuryl, bis o-xylinobifuryl, and bis o-xylinotafuryl represented by structural formula (B), a tetracarboxylic dianhydride represented by structural formula (A) is obtained. The oxidation and dehydration reactions can be carried out by conventional oxidation and dehydration ring closure techniques. For example, oxidation of a methyl group by a potassium permanganate method, a nitric acid method, etc., and an acid anhydride method such as an acetic anhydride method, a heat dehydration method, etc. can be adopted. Alternatively, it is also possible to directly convert the acid anhydride by air oxidation using vanadium pentoxide as a catalyst.

【0020】本発明のポリイミドの前駆体であるポリア
ミック酸を合成するためには、上記構造式(A)の酸無
水物と、一般式 H2 N−R−NH2  (式中、Rは2価の有機基)で表されるジアミン化合物
を用いる。特に、低誘電率、低吸湿率のポリイミドを得
るためには、構造式群(E)
In order to synthesize polyamic acid, which is a precursor of the polyimide of the present invention, the acid anhydride of the above structural formula (A) and the general formula H2 N-R-NH2 (wherein R is a divalent A diamine compound represented by an organic group) is used. In particular, in order to obtain polyimide with a low dielectric constant and low moisture absorption rate, structural formula group (E)

【0021】[0021]

【化8】[Chemical formula 8]

【0022】で示した如き長鎖の芳香族ジアミンの少な
くとも1種を用いることが望ましい。また、さらに高弾
性率、低熱膨張性等の特性を付与したい場合には、構造
式群(F)
It is desirable to use at least one type of long-chain aromatic diamine as shown in the following. In addition, if you want to further provide properties such as high elastic modulus and low thermal expansion, structural formula group (F)

【0023】[0023]

【化9】[Chemical formula 9]

【0024】(ただし、XはF,Cl,CH3 −又は
CH3 O−を示す。)で示した如き直線性の高い芳香
族ジアミンの少なくとも1種を用いることができる。こ
れら構造式群(E)、(F)で示した如き芳香族ジアミ
ンを共重合させたり、これらのジアミンを用いて合成さ
れたポリアミック酸をブレンドすることにより、低吸水
率、低誘電率と高弾性率、低熱膨張性を高い次元で両立
させることが可能である。
At least one highly linear aromatic diamine as shown in (X represents F, Cl, CH3 -- or CH3 O-) can be used. By copolymerizing aromatic diamines such as those shown in structural formula groups (E) and (F) or blending polyamic acids synthesized using these diamines, low water absorption, low dielectric constant, and high It is possible to achieve both high elastic modulus and low thermal expansion.

【0025】例えば、4,4′−ジアミノジフェニルス
ルホン、3,3′−ジアミノジフェニルスルホン、4,
4′−ジアミノジフェニルメタン、ビス(3−エチル−
4−アミノフェニル)メタン、ビス(3−メチル−4−
アミノフェニル)メタン、ビス(3−クロロ−4−アミ
ノフェニル)メタン、2,2′,5,5′−テトラクロ
ロ−4,4′−ジアミノビフェニル、4,4′−ジアミ
ノジフェニルスルフィド、3,3′−ジアミノジフェニ
ルエーテル、3,4′−ジアミノジフェニルエーテル、
4,4′−ジアミノオクタフルオロビフェニル、2,4
′−ジアミノトルエン、メタフェニレンジアミン、2,
2−ビス〔4−(4−アミノフェノキシ)フェニル〕プ
ロパン、2,2−ビス〔4−(4−アミノフェノキシ)
フェニル〕ヘキサフルオロプロパン、2,2−ビス(4
−アミノフェニル)プロパン、2,2−ビス(4−アミ
ノフェニル)ヘキサフルオロプロパン、2,2−ビス(
3−ヒドロキシ−4−アミノフェニル)プロパン、2,
2−ビス(3−ヒドロキシ−4−アミノフェニル)ヘキ
サフルオロプロパン、9,9−ビス(4−アミノフェニ
ル)−10−ヒドロ−アントラセン、オルトトリジンス
ルホン等のジアミンを等が挙げられる。また、3,3′
,4,4′−ビフェニルテトラアミン、3,3′,4,
4′−テトラアミノジフェニルエーテル等の多価アミン
化合物の一部使用も可能である。
For example, 4,4'-diaminodiphenylsulfone, 3,3'-diaminodiphenylsulfone, 4,
4'-diaminodiphenylmethane, bis(3-ethyl-
4-aminophenyl)methane, bis(3-methyl-4-
aminophenyl)methane, bis(3-chloro-4-aminophenyl)methane, 2,2',5,5'-tetrachloro-4,4'-diaminobiphenyl, 4,4'-diaminodiphenyl sulfide, 3, 3'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether,
4,4'-diaminooctafluorobiphenyl, 2,4
'-Diaminotoluene, metaphenylenediamine, 2,
2-bis[4-(4-aminophenoxy)phenyl]propane, 2,2-bis[4-(4-aminophenoxy)
phenyl]hexafluoropropane, 2,2-bis(4
-aminophenyl)propane, 2,2-bis(4-aminophenyl)hexafluoropropane, 2,2-bis(
3-hydroxy-4-aminophenyl)propane, 2,
Examples include diamines such as 2-bis(3-hydroxy-4-aminophenyl)hexafluoropropane, 9,9-bis(4-aminophenyl)-10-hydro-anthracene, and orthotolidine sulfone. Also, 3,3'
,4,4'-biphenyltetraamine, 3,3',4,
It is also possible to use some polyvalent amine compounds such as 4'-tetraaminodiphenyl ether.

【0026】ポリアミック酸共重合体の生成反応に使用
される有機極性溶媒としては、例えば、ジメチルスルホ
キシド、ジエチルスルホキシド等のスルホキシド系溶媒
、N,N−ジメチルホルムアミド、N,N−ジエチルホ
ルムアミド等のホルムアミド系溶媒、N,N−ジメチル
アセトアミド、N,N−ジエチルアセトアミド等のアセ
トアミド系溶媒、N−メチル−2−ピロリドン、N−ビ
ニル−2−ピロリドン等のピロリドン系溶媒、フェノー
ル、o−、m−、又はp−クレゾール、キシレノール、
ハロゲン化フェノール、カテコール等のフェノール系溶
媒、或いはヘキサメチルホスホルアミド、γ−ブチロラ
クトン等をあげることができ、これらを単独又は2種以
上の混合物として用いるのが望ましいが、更にはキシレ
ン、トルエンのような芳香族炭化水素の一部使用も可能
である。また、このポリアミック酸共重合体は、有機極
性溶媒中に好ましくは5〜40重量%、より好ましくは
10〜30重量%溶解されているのが取扱いの面からも
望ましい。
Examples of the organic polar solvent used in the reaction for producing the polyamic acid copolymer include sulfoxide solvents such as dimethyl sulfoxide and diethyl sulfoxide, and formamides such as N,N-dimethylformamide and N,N-diethylformamide. -based solvents, acetamide-based solvents such as N,N-dimethylacetamide and N,N-diethylacetamide, pyrrolidone-based solvents such as N-methyl-2-pyrrolidone and N-vinyl-2-pyrrolidone, phenol, o-, m- , or p-cresol, xylenol,
Examples include phenolic solvents such as halogenated phenol and catechol, hexamethylphosphoramide and γ-butyrolactone, and it is preferable to use these alone or as a mixture of two or more, but furthermore, xylene, toluene, etc. It is also possible to use some aromatic hydrocarbons such as Further, it is desirable from the viewpoint of handling that the polyamic acid copolymer is preferably dissolved in an organic polar solvent in an amount of 5 to 40% by weight, more preferably 10 to 30% by weight.

【0027】この芳香族ポリアミック酸共重合体溶液か
ら本発明のポリイミド共重合体を得るためには、熱的に
脱水する熱的方法、脱水剤を用いる化学的方法のいずれ
を用いてもよいが、化学的方法によると生成するポリイ
ミド共重合体の伸びや引張強度等の機械特性がすぐれた
ものになるので好ましい。以下にイミド化法を例示する
In order to obtain the polyimide copolymer of the present invention from this aromatic polyamic acid copolymer solution, either a thermal method of thermal dehydration or a chemical method using a dehydrating agent may be used. A chemical method is preferable because the resulting polyimide copolymer has excellent mechanical properties such as elongation and tensile strength. The imidization method is illustrated below.

【0028】上記ポリアミック酸共重合体溶液又はその
溶液に化学量論以上の脱水剤と触媒量の第3級アミンを
加えた溶液をドラム或いはエンドレスベルト上に流延ま
たは塗布して膜状とし、該膜を150℃以下の温度で約
5〜90分間乾燥し、自己支持性のポリアミック酸の膜
を得る。ついで、これを支持体より引き剥し端部を固定
する。その後約100〜500℃まで徐々に加熱するこ
とによりイミド化し、冷却後ドラム又はエンドレスベル
トより取り外し、本発明の芳香族ポリイミド重合体フィ
ルムを得る。ここで言う脱水剤としては、例えば無水酢
酸等の脂肪族酸無水物、芳香族酸無水物などが挙げられ
る。また触媒としては、例えばトリエチルアミン等の脂
肪族第3級アミン類、ジメチルアニリン等の芳香族第3
級アミン類、ピリジン、ピコリン、イソキノリン等の複
素環式第3級アミン類等が挙げられ、これらは単独又は
2種以上組み合わせて用いられる。
[0028] The above polyamic acid copolymer solution or a solution prepared by adding a dehydrating agent in a stoichiometric amount or more and a catalytic amount of tertiary amine to the solution is cast or coated on a drum or an endless belt to form a film, The membrane is dried at a temperature below 150° C. for about 5 to 90 minutes to obtain a self-supporting polyamic acid membrane. Then, it is peeled off from the support and the ends are fixed. Thereafter, it is imidized by gradually heating to about 100 to 500°C, and after cooling, it is removed from the drum or endless belt to obtain the aromatic polyimide polymer film of the present invention. Examples of the dehydrating agent mentioned here include aliphatic acid anhydrides such as acetic anhydride, aromatic acid anhydrides, and the like. Examples of catalysts include aliphatic tertiary amines such as triethylamine, and aromatic tertiary amines such as dimethylaniline.
Examples include heterocyclic tertiary amines such as pyridine, picoline, and isoquinoline, which may be used alone or in combination of two or more.

【0029】[0029]

【実施例】以下、実施例により本発明を具体的に説明す
るが、本発明はこれら実施例のみに限定されるものでは
ない。実施例中、BAPPはビス(アミノフェノキシフ
ェニル)プロパン、ODAは4,4′−ジアミノジフェ
ニルエーテル、PMDAは無水ピロメリット酸、DMF
はジメチルホルムアミドを表す。
[Examples] The present invention will be specifically explained below with reference to Examples, but the present invention is not limited to these Examples. In the examples, BAPP is bis(aminophenoxyphenyl)propane, ODA is 4,4'-diaminodiphenyl ether, PMDA is pyromellitic anhydride, DMF
represents dimethylformamide.

【0030】実施例1 2リットルのセパラブルフラスコにDMFとBAPPを
とり、ジアミノ化合物が完全に溶解するまで室温でよく
混合した。次に前記混合溶液を氷で冷却しながらビス(
3−フタリックアンヒドリド)−2,5−フリルをBA
PPと実質上等モルになるように加えた後1時間攪拌し
、ポリアミック酸のDMF溶液を得た。なおDMFの使
用量は、ジアミノ化合物および芳香族テトラカルボン酸
化合物のモノマー仕込濃度が18重量%となる量を用い
た。ポリアミック酸溶液をガラス板上に流延塗布し、約
100℃に約60分間乾燥後、ポリアミック酸塗膜をガ
ラス板より剥し、その塗膜を支持枠に固定し、その後約
100℃で約30分間、約200℃で約60分間、約3
00℃で約60分間加熱し脱水閉環乾燥し、厚さ25μ
mのポリイミドフィルムを得た。得られたポリイミドフ
ィルムの物性を表1に示した。
Example 1 DMF and BAPP were placed in a 2-liter separable flask and mixed well at room temperature until the diamino compound was completely dissolved. Next, while cooling the mixed solution with ice, bis(
BA (3-phthalic anhydride)-2,5-furyl
It was added in a substantially equimolar amount with PP and stirred for 1 hour to obtain a DMF solution of polyamic acid. The amount of DMF used was such that the monomer concentration of the diamino compound and aromatic tetracarboxylic acid compound was 18% by weight. A polyamic acid solution was cast onto a glass plate, and after drying at about 100°C for about 60 minutes, the polyamic acid coating was peeled off from the glass plate, the coating was fixed on a support frame, and then heated at about 100°C for about 30 minutes. for about 60 minutes at about 200°C, about 3
Heated at 00℃ for about 60 minutes, dehydrated and ring-closed to a thickness of 25μ.
A polyimide film of m was obtained. Table 1 shows the physical properties of the obtained polyimide film.

【0031】実施例2〜5 実施例1と同様の方法を用いて、異なる組成のポリイミ
ドフィルムを得た。これらの物性を表1に示した。
Examples 2 to 5 Using the same method as in Example 1, polyimide films of different compositions were obtained. These physical properties are shown in Table 1.

【0032】実施例6 2リットルのセパラブルフラスコに1,4−ビス(4−
アミノフェニル)ベンゼン200mmolとDMFをと
り、ジアミノ化合物が完全に溶解するまで室温でよく混
合した。次に前記混合液を氷で冷却しながらビス(3−
フタリックアンヒドリド)−2,5−フリル400mm
olを一気に加えた後30分攪拌し、次にBAPP20
0mmolのDMF溶液を加えることにより、ポリアミ
ック酸のDMF溶液を得た。なおDMFの使用量は、ジ
アミノ化合物および芳香族テトラカルボン酸化合物のモ
ノマー仕込濃度が18重量%となる量を用いた。ポリイ
ミドフィルム作製条件は、実施例1と同様にして行い、
厚さ25μmのポリイミドフィルムを得た。得られたポ
リイミドフィルムの物性を表1に示した。
Example 6 1,4-bis(4-
200 mmol of (aminophenyl)benzene and DMF were taken and mixed well at room temperature until the diamino compound was completely dissolved. Next, while cooling the mixture with ice, bis(3-
Phthalic anhydride)-2,5-frill 400mm
After adding ol at once, stir for 30 minutes, then add BAPP20
A DMF solution of polyamic acid was obtained by adding 0 mmol of DMF solution. The amount of DMF used was such that the monomer concentration of the diamino compound and aromatic tetracarboxylic acid compound was 18% by weight. The polyimide film production conditions were the same as in Example 1,
A polyimide film with a thickness of 25 μm was obtained. Table 1 shows the physical properties of the obtained polyimide film.

【0033】比較例1 実施例1と同様の方法により、PMDAとODAを等モ
ルずつ用いて、厚さ25μmのポリイミドフィルムを得
た。得られたポリイミドフィルムの物性を表1に示した
Comparative Example 1 A polyimide film having a thickness of 25 μm was obtained in the same manner as in Example 1 using equal moles of PMDA and ODA. Table 1 shows the physical properties of the obtained polyimide film.

【0034】[0034]

【表1】[Table 1]

【0035】[0035]

【発明の効果】叙上の通り、本発明によれば耐熱性に優
れ、且つ低吸湿性、低誘電率を示すポリイミド共重合体
が得られる。
As described above, according to the present invention, a polyimide copolymer having excellent heat resistance, low hygroscopicity, and low dielectric constant can be obtained.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  下記一般式(I) 【化1】 (ただし、m=1〜3の整数、Rは2価の有機基を示す
。)で表される構造単位を有する新規ポリイミド共重合
体。
[Claim 1] A novel polyimide copolymer having a structural unit represented by the following general formula (I) [Formula 1] (where m = an integer of 1 to 3, and R represents a divalent organic group) .
JP3098173A 1991-04-02 1991-04-02 New polyimide polymer film Expired - Fee Related JP2724424B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3098173A JP2724424B2 (en) 1991-04-02 1991-04-02 New polyimide polymer film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3098173A JP2724424B2 (en) 1991-04-02 1991-04-02 New polyimide polymer film

Publications (2)

Publication Number Publication Date
JPH04306234A true JPH04306234A (en) 1992-10-29
JP2724424B2 JP2724424B2 (en) 1998-03-09

Family

ID=14212657

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2724424B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8026338B2 (en) 2005-02-28 2011-09-27 Kaneka Corporation Method for producing polyimide film
EP2680336A1 (en) * 2012-06-25 2014-01-01 Tata Steel Nederland Technology B.V. Photoactive material having an imide based conjugated backbone
CN114736372A (en) * 2022-04-19 2022-07-12 深圳市华科创智技术有限公司 Polyimide film and preparation method thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8026338B2 (en) 2005-02-28 2011-09-27 Kaneka Corporation Method for producing polyimide film
US8273851B2 (en) 2005-02-28 2012-09-25 Kaneka Corporation Method for producing polyimide film
EP2680336A1 (en) * 2012-06-25 2014-01-01 Tata Steel Nederland Technology B.V. Photoactive material having an imide based conjugated backbone
WO2014000850A1 (en) 2012-06-25 2014-01-03 Tata Steel Nederland Technology B.V. Organic solar cell of the bulk heterojunction type comprising an imide based conjugated backbone compound as photoactive material
CN114736372A (en) * 2022-04-19 2022-07-12 深圳市华科创智技术有限公司 Polyimide film and preparation method thereof
CN114736372B (en) * 2022-04-19 2023-08-01 深圳市华科创智技术有限公司 Polyimide film and preparation method thereof

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Publication number Publication date
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