JPH04301240A - Production of optical disk - Google Patents
Production of optical diskInfo
- Publication number
- JPH04301240A JPH04301240A JP3064612A JP6461291A JPH04301240A JP H04301240 A JPH04301240 A JP H04301240A JP 3064612 A JP3064612 A JP 3064612A JP 6461291 A JP6461291 A JP 6461291A JP H04301240 A JPH04301240 A JP H04301240A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photoresist
- master
- photoresist layer
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title description 21
- 230000003287 optical effect Effects 0.000 title description 20
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 43
- 229920005989 resin Polymers 0.000 claims abstract description 20
- 239000011347 resin Substances 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- 239000003504 photosensitizing agent Substances 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 2
- 238000003491 array Methods 0.000 abstract 2
- 238000003848 UV Light-Curing Methods 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 19
- 239000000126 substance Substances 0.000 description 17
- 229910052759 nickel Inorganic materials 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 238000004132 cross linking Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229920005601 base polymer Polymers 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 239000012530 fluid Substances 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000005323 electroforming Methods 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 230000001737 promoting effect Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- IYUOYLLVOZNGKW-UHFFFAOYSA-N 2-azidonaphthalene-1,4-dione Chemical compound C1=CC=C2C(=O)C(N=[N+]=[N-])=CC(=O)C2=C1 IYUOYLLVOZNGKW-UHFFFAOYSA-N 0.000 description 1
- 229920001342 Bakelite® Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000004637 bakelite Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000007730 finishing process Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【０００１】0001
【技術分野】本発明は、光ディスクを製造する方法に関
する。TECHNICAL FIELD The present invention relates to a method of manufacturing an optical disc.
【０００２】0002
【背景技術】光ディスク例えばビデオディスクの製造方
法としては、従来から図２に示す如き方法が知られてい
る。かかる製造方法によれば、まず、図２（ａ）に示す
ようにガラス盤１の主面上に一様にフォトレジスト層２
を形成したフォトレジスト原盤を用意して、所定の信号
に応じて明滅するレーザービームＬａを照射してフォト
レジスト層２上に、所定情報に対応したスポット列の潜
像を螺旋又は同心円状に形成する。次に、露光したフォ
トレジスト原盤を現像して、フォトレジスト原盤上に記
録すべき信号に対応する微小凹部（以下ピットと称する
）の列を設け、図２（ｂ）に示す如き、ピットを有する
フォトレジスト層２（情報記録層）とガラス盤１とから
なる現像原盤を得る。次に、かかる現像原盤のフォトレ
ジスト層２を乾燥させガラス盤１上に定着（ポストベー
キング）させて、図２（ｃ）に示す如き乾燥した原盤を
得る。次に、銀又はニッケル等の金属をスパッタリング
してフォトレジスト層２上に導電膜３を形成して、図２
（ｄ）に示す如き積層されたマスタリング原盤３ａを得
る。このように、ピットを有するフォトレジスト層上に
金属をスパッタリングすることによりピットを有する情
報記録面を導電化する。次に、得られたマスタリング原
盤をニッケル電鋳槽中に浸してニッケル（Ｎｉ）を導電
膜３上にメッキ（電鋳）して肉厚のニッケル層４すなわ
ちニッケルスタンパを形成して、図２（ｅ）に示す如き
円盤を得る。次に、図２（ｆ）に示す如くニッケル層４
であるスタンパをガラス盤１から分離する。次に、スタ
ンパ上に残ったフォトレジスト層２及び導電膜３を除去
して、図２（ｇ）に示すニッケルスタンパを得る。BACKGROUND OF THE INVENTION As a method for manufacturing optical discs, such as video discs, a method as shown in FIG. 2 has been known. According to this manufacturing method, first, as shown in FIG.
Prepare a photoresist master disk on which has been formed, and irradiate it with a laser beam La that flickers in response to a predetermined signal to form a latent image of a spot array corresponding to predetermined information in a spiral or concentric shape on the photoresist layer 2. do. Next, the exposed photoresist master disk is developed to provide a row of minute recesses (hereinafter referred to as pits) corresponding to the signals to be recorded on the photoresist master disk, and the pits are formed as shown in FIG. 2(b). A development master disk consisting of a photoresist layer 2 (information recording layer) and a glass disk 1 is obtained. Next, the photoresist layer 2 of the development master is dried and fixed (post-baked) on the glass disc 1 to obtain a dry master as shown in FIG. 2(c). Next, a conductive film 3 is formed on the photoresist layer 2 by sputtering a metal such as silver or nickel, and as shown in FIG.
A laminated mastering master disk 3a as shown in FIG. 3(d) is obtained. In this manner, the information recording surface having pits is made conductive by sputtering metal onto the photoresist layer having pits. Next, the obtained mastering master is immersed in a nickel electroforming bath, and nickel (Ni) is plated (electroformed) on the conductive film 3 to form a thick nickel layer 4, that is, a nickel stamper, as shown in FIG. A disk as shown in (e) is obtained. Next, as shown in FIG. 2(f), the nickel layer 4
The stamper is separated from the glass plate 1. Next, the photoresist layer 2 and conductive film 3 remaining on the stamper are removed to obtain the nickel stamper shown in FIG. 2(g).
【０００３】その後は、ニッケルスタンパを射出成形装
置の所定位置に取り付け、型締め後に、溶融した流動性
ＰＭＭＡ（ポリメチルメタクリレート）、ＰＣ（ポリカ
ーボネート）等の透明樹脂材料をニッケルスタンパ上に
射出して、樹脂材料の硬化後これを取り出して、所定情
報記録面を有した光ディスクレプリカが作成される。こ
のようにして得られたレプリカは、公知の方法によって
、レプリカの情報記録面上にアルミニウム等の反射膜を
形成して、さらに反射膜上に保護膜をオーバーコートし
て、光ディスクが形成される。また、この光ディスクを
２枚貼り合わせ、仕上げ工程を経て、通常、両面光ディ
スクを得ている。[0003] After that, the nickel stamper is attached to a predetermined position in the injection molding device, and after the mold is clamped, a transparent resin material such as molten fluid PMMA (polymethyl methacrylate) or PC (polycarbonate) is injected onto the nickel stamper. After the resin material has hardened, it is taken out to create an optical disc replica having a predetermined information recording surface. The thus obtained replica is then formed into an optical disc by forming a reflective film of aluminum or the like on the information recording surface of the replica using a known method, and then overcoating the reflective film with a protective film. . Additionally, two of these optical disks are pasted together and subjected to a finishing process to obtain a double-sided optical disk.
【０００４】しかしながら、このような従来方法におい
ては、スタンパの製造までに電鋳工程の工程数が多くメ
ッキに時間が掛かり、さらに、レプリカ製造用の射出成
形装置が比較的大型の装置が必要である。スタンパ製造
に時間、コストが掛かかるので、近年の少量多品種の映
像音声ソフトに対応した数枚の光ディスクの製造には十
分適しているとはいえない。[0004] However, in such conventional methods, there are many electroforming steps before the stamper is manufactured, and plating takes time, and furthermore, a relatively large injection molding device for replica manufacturing is required. be. Since it takes time and cost to manufacture the stamper, it cannot be said to be fully suitable for manufacturing several optical discs compatible with the recent small-volume, high-variety video/audio software.
【０００５】[0005]
【発明の目的】本発明の目的は、比較的簡素な工程にて
少量多品種及び大量生産に適する光ディスク製造方法を
提供することにある。OBJECTS OF THE INVENTION An object of the present invention is to provide an optical disk manufacturing method suitable for small-lot, high-mix, and mass production using relatively simple steps.
【０００６】[0006]
【発明の構成】本発明による光ディスク製造方法は、透
明基板と、該透明基板上に形成され樹脂、感光剤及びバ
ラスト化合物を含有するフォトレジスト層とからなる原
盤上への集光レーザー光の照射によって前記フォトレジ
ストを露光する工程と、前記原盤を現像し微小凹凸を前
記フォトレジスト層の表面に形成する現像工程と、前記
フォトレジスト層を加熱して定着させるポストベーキン
グ工程と、前記原盤の表面に紫外線を照射する紫外線照
射工程と、前記フォシレジスト層の表面上に透明な紫外
線硬化樹脂からなる転写層を形成する転写工程とを含む
ことを特徴とする。[Structure of the Invention] The method for manufacturing an optical disc according to the present invention includes irradiating a focused laser beam onto a master disc consisting of a transparent substrate and a photoresist layer formed on the transparent substrate and containing a resin, a photosensitizer, and a ballast compound. a step of exposing the photoresist to light, a developing step of developing the master to form minute irregularities on the surface of the photoresist layer, a post-baking step of heating and fixing the photoresist layer, and a surface of the master. The method is characterized in that it includes an ultraviolet irradiation step of irradiating ultraviolet rays to the photoresist layer, and a transfer step of forming a transfer layer made of a transparent ultraviolet curable resin on the surface of the photoresist layer.
【０００７】[0007]
【発明の作用】本発明によれば、スタンパ製造時間を短
縮でき、光ディスク製造方法を簡略化できる。According to the present invention, the stamper manufacturing time can be shortened and the optical disc manufacturing method can be simplified.
【０００８】[0008]
【実施例】以下に、本発明の実施例を図面を参照しつつ
説明する。本実施例の１枚〜数枚の光ディスクを作製す
るにあたり、マスタリング原盤の情報記録面である微小
凹部列のピットのパターンを金属スタンパではなく樹脂
スタンパによって転写して、樹脂スタンパからレプリカ
を製造する方法が考えられる。この方法は、情報記録面
上に紫外線硬化型樹脂であるフォトポリマー（２Ｐとい
う）の流動体を供給し塗布し、その後、紫外線を照射し
て２Ｐを情報記録面の転写層４０として硬化させるいわ
ゆる２Ｐ方法である。この２Ｐ法によって転写してレプ
リカを作製する場合、フォトレジストが２Ｐ剤によって
浸食されることを防ぐため、マスタリング原盤における
フォトレジスト層表面に金属膜などのバリア層を形成す
る必要があるので、下記（１）〜（３）の問題があった
が、これらは解決された。DESCRIPTION OF THE PREFERRED EMBODIMENTS Examples of the present invention will be described below with reference to the drawings. In producing one to several optical discs of this example, the pattern of pits in the micro-concave array, which is the information recording surface of the mastering master, is transferred using a resin stamper rather than a metal stamper, and a replica is manufactured from the resin stamper. There are possible ways. In this method, a fluid of photopolymer (referred to as 2P), which is an ultraviolet curable resin, is supplied and applied onto the information recording surface, and then ultraviolet rays are irradiated to harden the 2P as a transfer layer 40 on the information recording surface. This is a 2P method. When creating a replica by transferring using this 2P method, it is necessary to form a barrier layer such as a metal film on the surface of the photoresist layer on the mastering master in order to prevent the photoresist from being eroded by the 2P agent. There were problems (1) to (3), but these have been resolved.
【０００９】（１） 金属膜形成に手間及び時間がか
かる。
（２） フォトレジスト層で形成されたピットの上に
バリア層を設けるため、転写面におけるピットの形状が
変化して、かかる樹脂スタンパから得られたレプリカ光
ディスクからの再生信号が劣化する。
（３） マスタリング原盤をクリーンな雰囲気から出
して蒸着機に入れるためドロップアウトの元になるゴミ
が付着する可能性がある。(1) It takes time and effort to form a metal film. (2) Since the barrier layer is provided on the pits formed by the photoresist layer, the shape of the pits on the transfer surface changes, and the reproduced signal from the replica optical disk obtained from such a resin stamper deteriorates. (3) Since the mastering master is taken out of the clean atmosphere and placed in the vapor deposition machine, there is a possibility that dust, which can cause dropouts, may adhere to it.
【００１０】これら問題を解決すべく発明者は以下の実
施例の如き、製造方法を開発した。まず、マスタリング
原盤用の基板としてガラスからなる洗浄された透明円盤
１０の主面上に亘って一様にフォトレジスト層２０をス
ピンコート法等により形成し、フォトレジスト原盤を用
意する。図１（ａ）に示すように、所定の記録すべき信
号に応じて明滅するレーザービームＬａを照射してフォ
トレジスト層２０上に、所定情報に対応したスポット列
の潜像を螺旋又は同心円状に形成する。フォトレジスト
層２０は樹脂、感光剤及びバラスト化合物からなり、そ
の成分は後に詳述する。[0010] In order to solve these problems, the inventor developed a manufacturing method as shown in the following example. First, a photoresist layer 20 is uniformly formed over the main surface of a cleaned transparent disk 10 made of glass as a substrate for a mastering master by spin coating or the like to prepare a photoresist master. As shown in FIG. 1(a), a laser beam La that blinks in response to a predetermined signal to be recorded is irradiated to form a latent image of a spot array corresponding to predetermined information on the photoresist layer 20 in a spiral or concentric pattern. to form. The photoresist layer 20 consists of a resin, a photosensitizer, and a ballast compound, the components of which will be explained in detail later.
【００１１】次に、露光したフォトレジスト原盤を現像
して、該原盤上に記録すべき信号に対応する微小凹部の
列を設け、図１（ｂ）に示す如き、ピットを有するフォ
トレジスト層２０（情報記録層）と透明基盤１０とから
なる現像原盤を得る。次に、かかる現像原盤のフォトレ
ジスト層２０を加熱、乾燥させ透明基板１０上に定着（
ポストベーキング）させて、図１（ｃ）に示す如き原盤
を得る。Next, the exposed photoresist master disc is developed to provide a row of minute recesses corresponding to the signals to be recorded on the master disc, and a photoresist layer 20 having pits is formed as shown in FIG. 1(b). (information recording layer) and a transparent substrate 10 is obtained. Next, the photoresist layer 20 of the development master is heated and dried to fix it on the transparent substrate 10 (
Post-baking) to obtain a master as shown in FIG. 1(c).
【００１２】次に、図１（ｄ）に示すように、紫外線を
フォトレジスト層２０上から照射してフォトレジスト層
２０における樹脂などの架橋を促進させ、情報記録面と
してフォトレジスト層を硬化さマスタリング原盤を得る
。次に、図１（ｅ）に示すように、この微小凹部列の情
報記録面上に紫外線硬化型樹脂である２Ｐの流動体を供
給し塗布し、その後、紫外線を照射して２Ｐを情報記録
面の転写層４０として硬化させる。この転写層４０は、
適当なスタンパ保持基板に担持させるように図の上部面
にスタンパ保持基板（図示せず）を配し、現像原盤とス
タンパ保持基板との間に転写層４０を形成しても良い。Next, as shown in FIG. 1(d), ultraviolet rays are irradiated from above the photoresist layer 20 to promote cross-linking of the resin, etc. in the photoresist layer 20, thereby hardening the photoresist layer as an information recording surface. Obtain the mastering master. Next, as shown in FIG. 1(e), a fluid of 2P, which is an ultraviolet curable resin, is supplied and coated on the information recording surface of this row of minute recesses, and then ultraviolet rays are irradiated to record the information on 2P. It is cured as a surface transfer layer 40. This transfer layer 40 is
A stamper holding substrate (not shown) may be disposed on the upper surface of the figure so as to be supported on a suitable stamper holding substrate, and the transfer layer 40 may be formed between the development master and the stamper holding substrate.
【００１３】次に、図１（ｆ）に示すように、転写層４
０を現像原盤から剥離する。この転写層４０は樹脂スタ
ンパとして形成される。本実施例の光ディスク製造方法
においては、ポストベーキング工程までは従来と同様で
ある。本実施例ではポストベーキング工程後にフォトレ
ジスト層２０の架橋促進工程を設けたことを特徴とする
。Next, as shown in FIG. 1(f), the transfer layer 4
0 from the development master. This transfer layer 40 is formed as a resin stamper. The optical disc manufacturing method of this embodiment is the same as the conventional method up to the post-baking step. This embodiment is characterized in that a step of promoting crosslinking of the photoresist layer 20 is provided after the post-baking step.
【００１４】すなわち、本実施例の１枚〜数枚の光ディ
スクを作製するにあたり、フォトレジスト層の架橋を進
行させることにより２Ｐ剤に対する耐性を向上させ、フ
ォトレジスト面にからバリア層なしに２Ｐ転写すること
を実現した。フォトレジスト層は以下の（１）〜（３）
の成分を有するものが好ましい。
（１） 樹脂成分（ベースポリマー）：樹脂は下記化
学式１に示す主としてクレゾールノボラックが好ましい
。That is, in producing one to several optical disks of this example, the resistance to the 2P agent is improved by promoting crosslinking of the photoresist layer, and 2P transfer from the photoresist surface without a barrier layer is possible. I realized that. The photoresist layer has the following (1) to (3)
It is preferable to have the following components. (1) Resin component (base polymer): The resin is preferably cresol novolak, as shown in Chemical Formula 1 below.
【００１５】[0015]
【化１】[Chemical formula 1]
【００１６】（２）感光剤：感光剤は下記化学式２に示
す主として１，２ナフトキノンジアジド−５−スルホニ
ッククロライドと下記化学式３〜１５で示すバラスト化
合物とエステルが好ましい。(2) Photosensitizer: The photosensitizer is preferably 1,2-naphthoquinonediazide-5-sulfonic chloride shown in the following chemical formula 2, and ballast compounds and esters shown in the following chemical formulas 3 to 15.
【００１７】[0017]
【化２】[Case 2]
【００１８】（３） バラスト化合物：バラスト化合
物は下記化学式３〜１５で示されるものが好ましく、配
合量はフォトレジスト全体の３〜９ｗｔ．％が好ましい
。(3) Ballast compound: The ballast compound is preferably one represented by the following chemical formulas 3 to 15, and the blending amount is 3 to 9 wt. % is preferred.
【００１９】[0019]
【化３】[Chemical formula 3]
【００２０】[0020]
【化４】[C4]
【００２１】[0021]
【化５】[C5]
【００２２】[0022]
【化６】[C6]
【００２３】[0023]
【化７】[C7]
【００２４】[0024]
【化８】[Chemical formula 8]
【００２５】[0025]
【化９】[Chemical formula 9]
【００２６】[0026]
【化１０】[Chemical formula 10]
【００２７】[0027]
【化１１】[Chemical formula 11]
【００２８】[0028]
【化１２】[Chemical formula 12]
【００２９】[0029]
【化１３】[Chemical formula 13]
【００３０】[0030]
【化１４】[Chemical formula 14]
【００３１】[0031]
【化１５】[Chemical formula 15]
【００３２】上記化学式２に示されるようなナフトキノ
ンアジド等のフォトレジストの感光剤の紫外線ｈνによ
る光反応は下記の化学式１６に示されるように進む。The photoreaction of a photosensitizer of a photoresist such as naphthoquinone azide as shown in the above chemical formula 2 by ultraviolet ray hv proceeds as shown in the following chemical formula 16.
【００３３】[0033]
【化１６】[Chemical formula 16]
【００３４】ここで、架橋の進行という点から考えると
、架橋しやすいインデンケテンのまま、水のない状態で
、熱（ベーキング）又は光（紫外線）を与えると、イン
デンケテンによりベースポリマーが架橋され効率的であ
る。特に現在のポジ型フォトレジストのベースポリマー
主成分であるクレゾールノボラックの場合は架橋を進行
させることによって最終的には安定な熱硬化性のベーク
ライト（クレゾールホルマリン樹脂）になる。バラスト
化合物は、その−ＯＨ基に感光剤を付加してレジスト中
に大量の感光剤を導入出来できベースポリマーとの架橋
度を上げることが出来る。Considering the progress of crosslinking, if heat (baking) or light (ultraviolet light) is applied to indenketene, which is easy to crosslink, in the absence of water, the base polymer will be effectively crosslinked by indenketene. It is. In particular, in the case of cresol novolak, which is the main component of the base polymer of current positive photoresists, by proceeding with crosslinking, it eventually becomes stable thermosetting Bakelite (cresol formalin resin). By adding a photosensitizer to the -OH group of the ballast compound, a large amount of photosensitizer can be introduced into the resist, and the degree of crosslinking with the base polymer can be increased.
【００３５】[0035]
【発明の効果】以上のように、本発明の光ディスク製造
方法によれば、光ディスク製造工程において正確な情報
記録面の転写を達成しつつ製造工程を簡略化出来、少量
多品種の映像音声ソフトに対応した少量の光ディスクの
製造に適する。As described above, according to the optical disc manufacturing method of the present invention, the manufacturing process can be simplified while achieving accurate transfer of the information recording surface in the optical disc manufacturing process, and can be used for small-lot production of a wide variety of video and audio software. Suitable for manufacturing small quantities of optical discs.
【図１】本発明による光ディスクの製造方法の各工程に
おける部材の概略断面図である。FIG. 1 is a schematic cross-sectional view of members in each step of the optical disc manufacturing method according to the present invention.
【図２】従来の光ディスクの製造方法の各工程における
部材の概略断面図である。FIG. 2 is a schematic cross-sectional view of members in each step of a conventional optical disc manufacturing method.
１０……透明基盤 ２０……フォトレジスト層 ４０……転写層 10...Transparent base 20...Photoresist layer 40...Transfer layer
Claims (1)
樹脂、感光剤及びバラスト化合物を含有するフォトレジ
スト層とからなる原盤上への集光レーザー光の照射によ
って前記フォトレジストを露光する工程と、前記原盤を
現像し微小凹凸を前記フォトレジスト層の表面に形成す
る現像工程と、前記フォトレジスト層を加熱して定着さ
せるポストベーキング工程と、前記原盤の表面に紫外線
を照射する紫外線照射工程と、前記フォシレジスト層の
表面上に透明な紫外線硬化樹脂からなる転写層を形成す
る転写工程とを含むことを特徴とする光ディスク製造方
法。1. A step of exposing the photoresist by irradiating the master with a focused laser beam, which consists of a transparent substrate and a photoresist layer formed on the transparent substrate and containing a resin, a photosensitizer, and a ballast compound. a developing step of developing the master to form minute irregularities on the surface of the photoresist layer; a post-baking step of heating and fixing the photoresist layer; and an ultraviolet irradiation step of irradiating the surface of the master with ultraviolet rays. and a transfer step of forming a transfer layer made of a transparent ultraviolet curable resin on the surface of the photoresist layer.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06461291A JP3187067B2 (en) | 1991-03-28 | 1991-03-28 | Optical disc manufacturing method |
| DE19914140712 DE4140712A1 (en) | 1991-03-28 | 1991-12-10 | Optical disc and prodn. esp. small scale prodn. of audio-visual disc - by laser exposure of photoresist contg. resin, light-sensitive cpd. and ballast cpd. |
| NL9102062A NL9102062A (en) | 1991-03-28 | 1991-12-10 | OPTICAL DISC AND METHOD FOR MAKING THEREOF |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP06461291A JP3187067B2 (en) | 1991-03-28 | 1991-03-28 | Optical disc manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04301240A true JPH04301240A (en) | 1992-10-23 |
| JP3187067B2 JP3187067B2 (en) | 2001-07-11 |
Family
ID=13263262
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP06461291A Expired - Fee Related JP3187067B2 (en) | 1991-03-28 | 1991-03-28 | Optical disc manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3187067B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005088628A1 (en) * | 2004-03-12 | 2005-09-22 | Matsushita Electric Industrial Co., Ltd. | Process for producing stamper for direct mastering, and stamper produced by such process and optical disc |
| CN111054918A (en) * | 2019-12-26 | 2020-04-24 | 武汉大学 | Method for accurately preparing superfine metal micro-pillar array suitable for controllable biosensor spacing |
-
1991
- 1991-03-28 JP JP06461291A patent/JP3187067B2/en not_active Expired - Fee Related
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2005088628A1 (en) * | 2004-03-12 | 2005-09-22 | Matsushita Electric Industrial Co., Ltd. | Process for producing stamper for direct mastering, and stamper produced by such process and optical disc |
| CN111054918A (en) * | 2019-12-26 | 2020-04-24 | 武汉大学 | Method for accurately preparing superfine metal micro-pillar array suitable for controllable biosensor spacing |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3187067B2 (en) | 2001-07-11 |
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