JPH042953A - Apparatus for pattern inspection - Google Patents

Apparatus for pattern inspection

Info

Publication number
JPH042953A
JPH042953A JP2104963A JP10496390A JPH042953A JP H042953 A JPH042953 A JP H042953A JP 2104963 A JP2104963 A JP 2104963A JP 10496390 A JP10496390 A JP 10496390A JP H042953 A JPH042953 A JP H042953A
Authority
JP
Japan
Prior art keywords
terminal part
pattern
mask
circuit
terminal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2104963A
Other languages
Japanese (ja)
Inventor
Hiroyuki Terai
弘幸 寺井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP2104963A priority Critical patent/JPH042953A/en
Publication of JPH042953A publication Critical patent/JPH042953A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To stably detect fine defects by providing a binarizing circuit, a terminal part detecting circuit, a terminal width detecting circuit and a terminal part inspecting circuit. CONSTITUTION:An input image (a) read out by scanning a photoelectric conversion scanner 1 is converted into binary images (b) of 0s and 1s in a binarizing circuit 2. A terminal part detecting circuit 3 scans a terminal part detecting mask of a specified size on the binary image (b) while synchronizing with raster- scan to output a terminal part signal (1)c. A terminal width detecting circuit 4 scans a terminal width detecting mask specified on the binary image (b) while synchronizing with raster-scan to output a terminal part signal (2)d. A terminal part inspecting circuit 5 scans a terminal part inspecting mask smaller than the terminal part detecting mask by a specified size by means of the terminal part signal (1)c and the terminal part signal (2)d to output a defect signal (e) when a point not existing on the pattern is included inside.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はパターン検査装置、特に、光電変換スキャナで
走査して読み出した検査対象パターンの終端部に欠陥が
あるかを判定するパターン検査装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a pattern inspection device, and more particularly, to a pattern inspection device that determines whether there is a defect at the end of a pattern to be inspected scanned and read by a photoelectric conversion scanner. .

〔従来の技術〕[Conventional technology]

従来の技術としては、例えば、武藤、安藤゛′プリント
基板の目視検査の自動化”9機械設計、第29巻、2号
、pp87〜96,1.985に示される様に、専用の
マスクを用いる方法がある。
As a conventional technique, for example, a special mask is used, as shown in ``Automation of Visual Inspection of Printed Circuit Boards'' by Muto and Ando, 9 Mechanical Design, Vol. 29, No. 2, pp. 87-96, 1.985. There is a way.

第5図は従来の一例を示す模式図である。FIG. 5 is a schematic diagram showing a conventional example.

中心Pから放射状に伸びた4つの測長センサA〜Dによ
りパターン終端部が途切れるまでの画素数を数えてそれ
ぞれの測長値とする互いに反対方向のAとC,BとDの
測長値の差に基づいて終端部の中心領域を求める。
Four length measurement sensors A to D extending radially from the center P count the number of pixels until the end of the pattern is interrupted, and obtain each length measurement value.Length measurement values of A and C, B and D in opposite directions. Find the center area of the end portion based on the difference between .

点Pがこの領域にあるとき、点Pがら終端部幅の1−/
4程渡離れた位置に設けた測長センサEへ・I−1の値
を求め、AとC,Bとり、FとHBと1−1、およびE
とGの測長値のそれぞれ許容値内にあるかを調へ、1つ
でも許容値外のとき欠陥として検出する。
When point P is in this area, 1-/of the end width from point P
Determine the value of I-1 for the length measurement sensor E installed at a distance of about 4 meters, take A, C, and B, F, HB, 1-1, and E.
It is checked whether each of the measured length values of and G is within the allowable value, and if even one is outside the allowable value, it is detected as a defect.

〔発明か解決しようとする課題〕[Invention or problem to be solved]

」二連した従来のパターン検査装置では、終端部に大き
な欠陥かある場合にのみ検出可能であり、終端部の形状
に応した小さい欠陥を誤検出することか不可能であっl
:。
"With conventional pattern inspection equipment that uses two series, it is possible to detect only large defects at the end, and it is impossible to erroneously detect small defects depending on the shape of the end.
:.

〔課題を解決するための手段〕[Means to solve the problem]

本発明のパターン検査装置は、検査対象パターンを光電
変換スキャナて走査して読み出した画像を0°’、”1
”の2値画像に変換する2値化回路ど、前記2値化回路
により出力された2値画像」二にあらかじめ設定された
寸法および形状の終端部検出マスクをラスタースキャン
に同期して走査しパターン終端部位置を検出する終端部
検出回路と、該2値画像にあらかじめ設定された寸法の
円形マスクをラスタースキャンに同期して走査しパター
ン終端幅に対応するパターン幅をも−)位16:を検出
する終端幅検出回111!8と、前記検出された2つの
位置の共通部分て指定された大きさの終端部検査マスク
を走査して内部にパターンI−に無い点が含まれる場合
に終端部欠陥として検出する終端部検査回路とを含んて
梧成される。
The pattern inspection apparatus of the present invention scans the pattern to be inspected with a photoelectric conversion scanner and reads out an image at 0°', 1
``The binary image outputted by the binary image outputted by the binary image'' is scanned in synchronization with the raster scan with an end detection mask of preset dimensions and shape. An end detection circuit that detects the position of a pattern end, and a circular mask having a preset dimension on the binary image is scanned in synchronization with the raster scan to detect a pattern width corresponding to the pattern end width. The end width detection circuit 111!8 detects the end width, and the common part of the two detected positions is scanned with the end end inspection mask of the specified size. and a termination inspection circuit for detecting termination defects.

〔実施例〕〔Example〕

次に、本発明の実施例について、図面を参照して詳細に
説明する。
Next, embodiments of the present invention will be described in detail with reference to the drawings.

第1図は本発明の一実施例を示すブロック図である。FIG. 1 is a block diagram showing one embodiment of the present invention.

第1図に示すパターン検査装置において、光電変換スキ
ャナ1を走査して読み出しな入力画像aは、2値化回路
2において、′0“°、“1′の2値化画像すに変換さ
れる。終端部検出回路3ては、前記2値化画像1つに、
あらかしめ設定された寸法グ)終端部検出マスクをラス
タースキャンに同期して走査し、終端部信号1cを出力
する、終端部検出回路4ては、2値化画像1〕C,−あ
らかじめ設定された終端幅検出マスクをラスタースキャ
ンに同期して走査し、終端部信号2cを出力する。終端
部検査回路5ては、終端部信号1c及び終端部信号2c
により、該終端部検出マスクより指定され人:大きさな
り小さい終端部検査マスクを走査して、内部にパターン
上に無い点か含まれる場合に欠陥信号eを出力する。
In the pattern inspection apparatus shown in FIG. 1, an input image a read out by scanning a photoelectric conversion scanner 1 is converted into a binary image of '0''° and '1' in a binarization circuit 2. . The terminal end detection circuit 3 detects one of the binarized images as follows.
The end portion detection circuit 4 scans the end portion detection mask in synchronization with the raster scan and outputs the end portion signal 1c. The terminal width detection mask is scanned in synchronization with the raster scan, and a terminal end signal 2c is output. The termination part inspection circuit 5 receives the termination part signal 1c and the termination part signal 2c.
Accordingly, a terminal inspection mask of a smaller size than that specified by the terminal detection mask is scanned, and if a point not on the pattern is included therein, a defect signal e is output.

第2図は第1図における終端部検出回路3の動作を説明
するための図である。
FIG. 2 is a diagram for explaining the operation of the termination detection circuit 3 in FIG. 1.

入力2値画像10に対し、て、あらかじめ設定されフコ
寸法および形状の終端部検出マスク11をラスタースキ
ャンに同期して走査し、終端部検出マスクをN分割しノ
S向かい合う4箇所(例えば、同時てのM3.M7.M
]、1.、M]、5)か同時にパターン終端部]3上に
ある場合、終端部検出位置12として検出する。
The input binary image 10 is scanned with a terminal end detection mask 11 having a preset size and shape in synchronization with the raster scan, and the terminal end detection mask is divided into N parts at four opposite locations (for example, at the same time). M3.M7.M
], 1. , M], 5) are simultaneously located on the pattern end point]3, it is detected as the end point detection position 12.

第3図は第1図における終端部検出回路4の動作を説明
するための図である。
FIG. 3 is a diagram for explaining the operation of the terminal end detection circuit 4 in FIG. 1.

入力2値画像10に対して、あらかしめ設定された大き
さの終端幅検出マスク20をラスタースキャンに同期し
て走査し、マスクの内部がすべてパターン終端部13内
にあるマスク中心位置を終端幅検出位置21を検出する
An end width detection mask 20 having a preset size is scanned against the input binary image 10 in synchronization with the raster scan, and the mask center position where the entire inside of the mask is within the pattern end portion 13 is determined as the end width. Detection position 21 is detected.

第4図は、第1図における終端部検査回路の動作を説明
するための図である。
FIG. 4 is a diagram for explaining the operation of the termination section inspection circuit in FIG. 1.

前述j〜ノ、=終端部検出位置12と終端幅検出位置2
1の共通部分である終端位置30を中心として、あらか
じめ設定された大きさの終端部検査マスク31を走査し
て、内部にパターン上に無い点32か含まれる場合、終
端部欠陥32として検出する。
As mentioned above, = end portion detection position 12 and end width detection position 2
A termination inspection mask 31 of a preset size is scanned around the termination position 30, which is a common part of the pattern 1, and if a point 32 that is not on the pattern is included therein, it is detected as a termination defect 32. .

〔発明の効果〕〔Effect of the invention〕

本発明のパターン検査装置は、パター〉・終端部形状に
応じた終端部検出マスクおよび大きさに応した終端幅検
出マスクを用いて終端(17置を検出し、その点におい
て欠陥検出マスクを用いて欠陥検出を行っている)ごめ
、微小な欠陥を安定に検出することか可能であるという
効果かある。
The pattern inspection device of the present invention detects the termination (17 positions) using a termination detection mask according to the shape of the putter and termination and a termination width detection mask corresponding to the size, and uses a defect detection mask at that point. However, it has the advantage that it is possible to stably detect minute defects.

【図面の簡単な説明】[Brief explanation of drawings]

第1図(1本発明の一実施例を示すフロック図、第2図
は第1図に示す終端部検出回路の動作説明図、第3図は
終端幅検出回路の動作説明図、第4図は終端部検査回路
の動作説明図、第5図は従来の一例を示す模式図である
。 1・・・光電変換スキャナー、2・・2値化回路、3・
・・終端部検出回路、4・・終端幅検出回路、5・・・
終端部検査回路、10・・・入力2値画像、11・・・
終端部検出マスク、12・・終端部検出位置、13・・
・パターン終端部、20・・終端幅検出マスク、21・
・・終端幅検出位置、30・終端位置、31・・・終端
部検査マスク。
FIG. 1 (1) is a block diagram showing an embodiment of the present invention; FIG. 2 is an explanatory diagram of the operation of the termination portion detection circuit shown in FIG. 1; FIG. 3 is an explanatory diagram of the operation of the termination width detection circuit; 5 is an explanatory diagram of the operation of the termination inspection circuit, and FIG. 5 is a schematic diagram showing a conventional example. 1... Photoelectric conversion scanner, 2... Binarization circuit, 3...
... Termination part detection circuit, 4... Termination width detection circuit, 5...
Termination inspection circuit, 10... Input binary image, 11...
Termination part detection mask, 12... Termination part detection position, 13...
・Pattern end portion, 20... Termination width detection mask, 21.
... End width detection position, 30. End position, 31... End end inspection mask.

Claims (1)

【特許請求の範囲】[Claims]  検査対象パターンを光電変換スキャナで走査して読み
出した画像を“0”、“1”の2値画像に変換する2値
化回路と、前記2値化回路により出力された2値画像上
にあらかじめ設定された寸法および形状の終端部検出マ
スクをラスタースキャンに同期して走査しパターン終端
部位置を検出する終端部検出回路と、該2値画像にあら
かじめ設定された寸法の円形マスクをラスタースキャン
に同期して走査しパターン終端幅に対応するパターン幅
をもつ位置を検出する終端幅検出回路と、前記検出され
た2つの位置の共通部分で指定された大きさの終端部検
査マスクを走査して内部にパターン上に無い点が含まれ
る場合に終端部欠陥として検出する終端部検査回路とを
含むことを特徴とするパターン検査装置。
A binarization circuit converts the image read out by scanning the pattern to be inspected with a photoelectric conversion scanner into a binary image of "0" and "1"; An end detection circuit scans an end detection mask with preset dimensions and shape in synchronization with raster scanning to detect the pattern end position, and a circular mask with preset dimensions on the binary image is scanned in synchronization with raster scanning. A terminal width detection circuit scans synchronously to detect a position having a pattern width corresponding to the pattern terminal width, and a terminal inspection mask having a size specified by the common portion of the two detected positions is scanned. A pattern inspection device comprising: a termination inspection circuit that detects a termination defect when a point that is not on the pattern is included therein.
JP2104963A 1990-04-20 1990-04-20 Apparatus for pattern inspection Pending JPH042953A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2104963A JPH042953A (en) 1990-04-20 1990-04-20 Apparatus for pattern inspection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2104963A JPH042953A (en) 1990-04-20 1990-04-20 Apparatus for pattern inspection

Publications (1)

Publication Number Publication Date
JPH042953A true JPH042953A (en) 1992-01-07

Family

ID=14394758

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2104963A Pending JPH042953A (en) 1990-04-20 1990-04-20 Apparatus for pattern inspection

Country Status (1)

Country Link
JP (1) JPH042953A (en)

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