JPH04288287A - Preparation of optical recording carrier - Google Patents

Preparation of optical recording carrier

Info

Publication number
JPH04288287A
JPH04288287A JP3052237A JP5223791A JPH04288287A JP H04288287 A JPH04288287 A JP H04288287A JP 3052237 A JP3052237 A JP 3052237A JP 5223791 A JP5223791 A JP 5223791A JP H04288287 A JPH04288287 A JP H04288287A
Authority
JP
Japan
Prior art keywords
substrate
film
ion bombardment
recording
optical recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3052237A
Other languages
Japanese (ja)
Inventor
Yuzo Takada
高田 有三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3052237A priority Critical patent/JPH04288287A/en
Publication of JPH04288287A publication Critical patent/JPH04288287A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To extend the environment-resistant life of an optical disk by improving the close adhesivenss of a substrate and a recording film. CONSTITUTION:After the surface 2 of a substrate 1 is modified by ion bombardment, an optical recording film 4 of a Te or TeOx type to which Pd is added in an amount of 2at%-below 5at% is formed. The gas pressure in a vacuum tank at the time of ion bombardment is held to 1X10<-2> Torr or more by the introduction of oxygen and ion bombardment is performed for 5min or more. Further, a Te-Pd metal crystal film 3 with thickness of 50-300Angstrom is provided between the optical recording layer and the substrate to improve the close adhesivenss of the optical recording layer and the substrate and an optical disk generating no sensitizing phenomenon immediately after recording and having a large C/N value can be realized.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、Te系光学記録膜を形
成した高速で回転するディスクにレーザ光のパルスを照
射することにより情報信号を記録再生する光学ディスク
メモリーに利用できる光学記録担体の製造方法に関する
[Industrial Application Field] The present invention relates to an optical record carrier that can be used in an optical disk memory that records and reproduces information signals by irradiating a high-speed rotating disk formed with a Te-based optical recording film with pulses of laser light. Regarding the manufacturing method.

【0002】0002

【従来の技術】テルル(Te)系光記録材料を用いた相
変化型の光ディスクメモリは、レーザ光などの光パルス
の照射時に発生する熱によって照射部分がアモルファス
相から結晶相に変化することを用いて信号を記録し、ま
た、結晶相の変化に伴う記録膜の反射光量の変化によっ
て記録された信号の再生を行うものである。
[Prior Art] A phase-change optical disk memory using a tellurium (Te)-based optical recording material changes the irradiated area from an amorphous phase to a crystalline phase due to the heat generated during irradiation with a light pulse such as a laser beam. The recording film is used to record signals, and the recorded signals are reproduced by changes in the amount of light reflected by the recording film due to changes in the crystal phase.

【0003】ここでアモルファス状態にある酸化テルル
(TeOxでxは2を上限とする)膜が結晶状態に達す
る迄に比較的短い時間ではあるが時間を要することがあ
る。
[0003] Here, it may take a relatively short time for the tellurium oxide (TeOx, where x has an upper limit of 2) film in an amorphous state to reach a crystalline state.

【0004】このように結晶状態に達する間に記録後の
再生信号の振幅およびC/N値が時間と共に増加する現
象を増感現象という。
The phenomenon in which the amplitude and C/N value of the reproduced signal after recording increase with time while reaching the crystalline state is called a sensitization phenomenon.

【0005】記録した信号を記録直後から高いC/N値
で再生するためには、上記の増感現象をなくすとともに
、記録直後から高いC/N値を得ることが必要となる。 このような増感現象を改善するために、TeOxに異な
った種類の材料を添加する方法が提案されている。 その方法では異種の材料がTeOx膜中において結晶核
の役割を果たし、TeOxの相変化を促進し増感現象を
改善すると考えられる。
In order to reproduce a recorded signal with a high C/N value immediately after recording, it is necessary to eliminate the above-mentioned sensitization phenomenon and to obtain a high C/N value immediately after recording. In order to improve this sensitization phenomenon, methods of adding different types of materials to TeOx have been proposed. In this method, it is believed that different materials play the role of crystal nuclei in the TeOx film, promote phase change of TeOx, and improve the sensitization phenomenon.

【0006】しかしながら異なった種類の材料を添加し
て記録膜中のTeの相対量が減少すると、C/N値が低
下することがわかってきた、そこで特願昭63−133
291号明細書に示されているように、Te系光学記録
膜4にパラジウム(Pd)を2at%以上5at%未満
添加し、その図3に示すようにディスク基板1とPdが
添加されたTeOx膜4との間にTe−Pd金属膜3を
設けた2層膜の光学記録担体が提案されている。
However, it has been found that when the relative amount of Te in the recording film decreases by adding different types of materials, the C/N value decreases.
As shown in the specification of No. 291, palladium (Pd) is added from 2 at% to less than 5 at% to the Te-based optical recording film 4, and as shown in FIG. 3, the disk substrate 1 and the Pd-doped TeOx A two-layer film optical record carrier in which a Te--Pd metal film 3 is provided between a film 4 has been proposed.

【0007】[0007]

【発明が解決しようとする課題】このような従来のTe
Ox−Pd記録膜を用いて信号の記録再生を行うと、光
学記録担体を1,800rpmで回転させたときに1回
転に要する時間である記録後33msを経過した時点お
よび記録後30秒,60秒経過した時点でC/N値に差
はみられず、増感現象がないことが確認された。また、
単一周波数は5MHzの信号を記録した場合には57d
BのC/N値が得られた。
[Problem to be solved by the invention] Such conventional Te
When recording and reproducing signals using an Ox-Pd recording film, when the optical record carrier is rotated at 1,800 rpm, 33 ms, which is the time required for one rotation, has elapsed after recording, and 30 seconds and 60 seconds after recording have elapsed. No difference was observed in the C/N value after seconds had elapsed, and it was confirmed that there was no sensitization phenomenon. Also,
Single frequency is 57d when recording a 5MHz signal
The C/N value of B was obtained.

【0008】しかし、このような従来の記録膜は、ディ
スク基板1とTeOx−Pd記録膜4との界面がTe−
Pd金属膜3から成り立っているため、TeOx−Pd
に比べて、たとえばポリカーボネートより成るディスク
基板との密着力が弱いTe−Pd金属膜3が高温,高湿
雰囲気下で微小な剥離を起こす可能性があるという課題
があった。
However, in such a conventional recording film, the interface between the disk substrate 1 and the TeOx-Pd recording film 4 is Te-
Since it is composed of Pd metal film 3, TeOx-Pd
Compared to this, there is a problem in that the Te--Pd metal film 3, which has weak adhesion to the disk substrate made of polycarbonate, for example, may cause minute peeling in a high-temperature, high-humidity atmosphere.

【0009】例えば高温,高湿の雰囲気下で従来のディ
スクのディスク寿命を知るために加速テストを実施し、
テスト結果をアレニウスプロットすることにより32℃
−80%RH換算では10年以上の推定寿命が得られた
。推定寿命10年という値は実用上の問題はないが、P
dが添加されたTeOxの記録膜のみからなるTe−P
d金属膜のないディスクを用いて同様の加速テストを行
うと、上記の従来例の2倍である20年の推定寿命値が
得られた。従ってディスクの信頼性を向上させるために
は、基板とTeOx−Pd記録膜との界面の状態を改善
することによりディスクの推定寿命をさらに改善させる
可能性がある。
For example, in order to find out the disk life of a conventional disk in a high temperature and high humidity atmosphere, an accelerated test was carried out.
32℃ by Arrhenius plot of test results.
An estimated lifespan of more than 10 years was obtained when converted to -80% RH. Although the value of estimated lifespan of 10 years poses no practical problem, P
Te-P consisting only of a recording film of TeOx doped with d
When a similar accelerated test was conducted using a disk without a metal film, an estimated lifespan of 20 years was obtained, which is twice as long as the conventional example. Therefore, in order to improve the reliability of the disk, it is possible to further improve the estimated lifetime of the disk by improving the state of the interface between the substrate and the TeOx-Pd recording film.

【0010】本発明は、このような従来のディスクの課
題を解決するもので、基板と記録膜との密着性を改良し
て、ディスクの寿命をさらに永くすることを目的とする
ものである。
The present invention is intended to solve these problems with conventional disks, and aims to further extend the life of the disk by improving the adhesion between the substrate and the recording film.

【0011】[0011]

【課題を解決するための手段】この課題を解決するため
に本発明は基板上にPdを2原子%以上5原子%未満添
加されたTeまたはTeOx系光学記録膜を形成する前
に、イオン衝撃による基板の前処理を行うものである。
[Means for Solving the Problems] In order to solve this problem, the present invention provides an ion bombardment method that uses ion bombardment before forming a Te or TeOx optical recording film doped with Pd of 2 at.% or more and less than 5 at.% on a substrate. This pre-processes the substrate.

【0012】また、基板へのイオン衝撃の前に酸素を導
入し、イオン衝撃時の真空槽内ガス圧が1×10−2T
orr以上で、イオン衝撃を5分間以内行うものである
[0012] Furthermore, oxygen is introduced before ion bombardment to the substrate, and the gas pressure in the vacuum chamber at the time of ion bombardment is 1×10-2T.
orr or higher, and ion bombardment is performed for less than 5 minutes.

【0013】また、Pdが添加された光学記録膜層と基
板の間に、50〜300Åの厚さのTe−Pd金属結晶
膜を設けたものである。
Further, a Te--Pd metal crystal film with a thickness of 50 to 300 Å is provided between the Pd-doped optical recording film layer and the substrate.

【0014】[0014]

【作用】本発明の光学記録担体はTe−Pd膜の酸化を
防ぐために基板に対してO2ガスのイオン衝撃による前
処理を行った後に50〜300Åの厚さのTe−Pd金
属結晶膜を形成し、その上部にTeOx−Pd記録層を
設けたものである。
[Operation] In the optical record carrier of the present invention, a Te-Pd metal crystal film with a thickness of 50 to 300 Å is formed after the substrate is pretreated by ion bombardment with O2 gas to prevent oxidation of the Te-Pd film. However, a TeOx-Pd recording layer is provided on top of this.

【0015】本発明の記録膜は記録膜を形成する前に、
酸素を導入し、真空槽内ガス圧が1×10−2Torr
以上で5分以上イオン衝撃を基板に対して行うので基板
表面の清浄化ならびに粗面化によりTe−Pd膜と基板
の密着力が改善され高温高湿下での膜剥離がなくなりデ
ィスクの耐候性が向上する。テスト結果によれば、Pd
が添加されたTeOx記録膜のみからなるディスクと同
程度の推定寿命値(32℃−80%RH換算で20年)
が得られた。
[0015] Before forming the recording film of the present invention,
Oxygen is introduced and the gas pressure inside the vacuum chamber is 1 x 10-2 Torr.
Since ion bombardment is applied to the substrate for more than 5 minutes, the adhesion between the Te-Pd film and the substrate is improved by cleaning and roughening the substrate surface, eliminating the possibility of film peeling under high temperature and high humidity conditions, and improving the weather resistance of the disk. will improve. According to the test results, Pd
Estimated lifespan equivalent to that of a disk consisting only of a TeOx recording film doped with (20 years at 32°C - 80% RH)
was gotten.

【0016】また、従来のディスクの基板は成形条件に
よっては記録用の溝部のエッジにバリ状の樹脂が残る場
合があり、このような基板に成膜を行うとバリ状の樹脂
に沿って記録膜の破壊が発生する可能性があり、この破
壊によりC/N値の低下が起こる。しかし、本発明によ
ればイオン衝撃によりこのようなバリ状の樹脂を予め除
去できるので、記録膜の破壊によるC/Nの低下を解決
することができる。
Furthermore, depending on the molding conditions of conventional disk substrates, burr-shaped resin may remain on the edges of recording grooves, and when a film is formed on such a substrate, recording may occur along the burr-shaped resin. Destruction of the membrane may occur, and this destruction results in a decrease in the C/N value. However, according to the present invention, such burr-like resin can be removed in advance by ion bombardment, so that it is possible to solve the problem of a decrease in C/N due to destruction of the recording film.

【0017】さらにTeOx−Pd記録膜4と基板1と
の間にTe−Pd金属膜3が形成されているため、Te
Ox−Pd記録膜4に比べて結晶性の進んだTeの結晶
粒子が生成されるので、高いC/N値が得られる。従っ
て本発明により記録後の増感現象のない高C/N、高信
頼性のディスクを実現することが可能となる。
Furthermore, since the TeOx-Pd metal film 3 is formed between the TeOx-Pd recording film 4 and the substrate 1, the TeOx-Pd recording film 4 is
Since Te crystal grains with more advanced crystallinity than in the Ox--Pd recording film 4 are produced, a high C/N value can be obtained. Therefore, according to the present invention, it is possible to realize a high C/N and highly reliable disk without post-recording sensitization phenomenon.

【0018】[0018]

【実施例】図1に本発明の一実施例の製造方法により製
造された光学記録担体の構成を示す。図に示すようにデ
ィスク基板1の表面層にイオン衝撃を受けた層2を形成
後、厚さ50〜300ÅのTe−Pd金属結晶膜3とT
eOx−Pd記録膜4を形成する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows the structure of an optical record carrier manufactured by a manufacturing method according to an embodiment of the present invention. As shown in the figure, after forming a layer 2 subjected to ion bombardment on the surface layer of a disk substrate 1, a Te-Pd metal crystal film 3 with a thickness of 50 to 300 Å and a T
An eOx-Pd recording film 4 is formed.

【0019】本発明の光学記録担体は、例えば図2に示
すように、スパッタ蒸発法を用いて形成することができ
る。図に示すように、真空槽10内のディスクホルダ1
1にディスク基板1を保持し、真空槽内を例えば10−
6Torr台まで真空排気する。真空排気後、真空槽1
0内に02ガスを例えば10SCCMで導入し、真空槽
10内のガス圧を1×10−2Torrに調圧する。ス
イッチ12を接点A13側に投入した状態で高圧電源1
4を通じて高電圧、例えば500Vをディスクホルダ1
1に印加すると真空槽10内にグロー放電が発生しO2
イオンがディスク基板1に激しく衝突しイオン衝撃より
ディスク基板の表面層が清浄化されるとともに粗面化さ
れる。ここでイオン衝撃時の真空槽10内のガス圧の下
限は1×10−2Torrイオン衝撃時間の下限は5分
でることが必要である。この条件をはずれると基板表面
層の清浄化および粗面化されないことが基板表面の電子
顕微鏡観察にて確認された。
The optical record carrier of the present invention can be formed using a sputter evaporation method, for example, as shown in FIG. As shown in the figure, a disk holder 1 inside a vacuum chamber 10
The disk substrate 1 is held at 1, and the inside of the vacuum chamber is set at 10-
Evacuate to 6 Torr. After vacuum evacuation, vacuum chamber 1
02 gas is introduced into the vacuum chamber 10 at a rate of, for example, 10 SCCM, and the gas pressure within the vacuum chamber 10 is adjusted to 1×10 −2 Torr. High voltage power supply 1 with switch 12 turned on to contact A13 side.
4 to the disk holder 1 through high voltage, e.g. 500V.
1, a glow discharge occurs in the vacuum chamber 10 and O2
The ions violently collide with the disk substrate 1, and the surface layer of the disk substrate is cleaned and roughened by the ion bombardment. Here, the lower limit of the gas pressure in the vacuum chamber 10 during ion bombardment must be 1.times.10@-2 Torr, and the lower limit of ion bombardment time must be 5 minutes. It was confirmed by electron microscopy observation of the substrate surface that the substrate surface layer was not cleaned or roughened if these conditions were not met.

【0020】イオン衝撃終了後、スイッチ12を接点B
15側に切り替え、O2ガスの導入を停止してArガス
に置換し、例えば50SCCM導入後真空槽10内を5
×10−3Torrに調圧しする。この状態で高圧電源
14を通じて高電圧例えば500VをTeとPdを含有
するターゲット16に印加すると、真空槽10内にグロ
ー放電が発生しターゲット16の物質Te−Pdがター
ゲット16の表面からスパッタ蒸発し、ディスク基板1
上にTe−Pd金属膜3が形成されていく。本実施例で
は、100Å厚のTe−Pd金属膜3は約20秒の成膜
時間で形成することができた。
After the ion bombardment is completed, switch 12 is closed to contact B.
15 side, stop the introduction of O2 gas and replace it with Ar gas, for example, after introducing 50SCCM, the inside of the vacuum chamber 10 is
The pressure is adjusted to x10-3 Torr. In this state, when a high voltage, for example 500 V, is applied to the target 16 containing Te and Pd through the high voltage power supply 14, a glow discharge occurs in the vacuum chamber 10, and the material Te-Pd of the target 16 is sputtered and evaporated from the surface of the target 16. , disk substrate 1
A Te--Pd metal film 3 is then formed thereon. In this example, the Te-Pd metal film 3 with a thickness of 100 Å could be formed in about 20 seconds.

【0021】ここでTe−Pd金属膜3の膜厚は50Å
未満では島状構造の膜が形成され、基板上に一様に分布
しないため効果がなく、300Åを越えると2層膜形成
時の膜応力により膜の境界で剥離が発生しやすなる。そ
の結果剥離部に水などが侵入し、膜が酸化されて正常な
記録再生ができなくなる。従ってこのTe−Pd金属結
晶膜3の膜厚は50〜300Åの範囲内とすることが望
ましい。
Here, the thickness of the Te--Pd metal film 3 is 50 Å.
If it is less than 300 Å, a film with an island-like structure will be formed and will not be distributed uniformly on the substrate, so it will not be effective. If it exceeds 300 Å, peeling will easily occur at the boundary of the film due to film stress during the formation of the two-layer film. As a result, water or the like enters the peeled portion, oxidizes the film, and prevents normal recording and reproduction. Therefore, the thickness of the Te-Pd metal crystal film 3 is preferably within the range of 50 to 300 Å.

【0022】Te−Pd金属結晶膜3の成膜を終了した
後、再びO2ガスを例えば10SCCM導入し、高圧電
源14を通じて高電圧例えば500VをTeとPdを含
有するターゲット16に印加する。この操作によりディ
スク基板1のTe−Pd金属膜3上にTeOx−Pd記
録膜4が形成される。約5分の成膜時間が約1,000
ÅのTeOx−Pd膜の成膜が可能であった。
After the formation of the Te--Pd metal crystal film 3 is completed, O2 gas is introduced again at a rate of, for example, 10 SCCM, and a high voltage, for example, 500 V, is applied to the target 16 containing Te and Pd through the high-voltage power supply 14. By this operation, a TeOx-Pd recording film 4 is formed on the Te-Pd metal film 3 of the disk substrate 1. Approximately 5 minutes of film formation time is approximately 1,000
It was possible to form a TeOx-Pd film with a thickness of .

【0023】ここでTe−Pd金属結晶膜3,TeOx
−Pd記録膜4のPd含有量は2原子%(at%)以下
であれば増感現象が確認され、例えばPdを1.5at
%添加すると記録後33m秒から60秒の間にC/N値
が約1dB増感する。また、Pdの含有量が5at%以
上となればC/N値が低下することとなる。従ってPd
の含有量は2at%以上5at%未満であることが望ま
しい。
Here, the Te--Pd metal crystal film 3, TeOx
- If the Pd content of the Pd recording film 4 is 2 atomic percent (at%) or less, a sensitization phenomenon is confirmed.
%, the C/N value increases by about 1 dB between 33 ms and 60 seconds after recording. Furthermore, if the Pd content is 5 at% or more, the C/N value will decrease. Therefore, Pd
The content of is desirably 2 at% or more and less than 5 at%.

【0024】なお、本実施営で使用するターゲット16
はTeおよびPdを含有するものを用いてもよく、また
、TeのターゲットとPdのターゲットを用いて、これ
ら2種類のターゲットを同時にスパッタリング蒸発する
ようにしても同様の効果が得られる。
[0024] Target 16 used in this implementation
A material containing Te and Pd may be used, or a similar effect can be obtained by using a Te target and a Pd target and sputtering and evaporating these two types of targets at the same time.

【0025】上記の本実施例により作成した光学記録担
体を例えば1,800rpmで回転させ単一の周波数、
例えば5MHzの信号を記録した後33ミリ秒経過した
後および60秒経過後にC/N値を測定した。いずれの
場合も57dBの良好なC/N値が得られた。また、3
2℃,80%RH換算で従来の2倍の20年の寿命推定
値が得られた。
[0025] The optical record carrier prepared according to the present example described above is rotated at, for example, 1,800 rpm to generate a single frequency,
For example, the C/N value was measured 33 milliseconds and 60 seconds after recording a 5 MHz signal. In both cases, a good C/N value of 57 dB was obtained. Also, 3
At 2°C and 80% RH, an estimated lifespan of 20 years was obtained, which is twice the conventional value.

【0026】[0026]

【発明の効果】以上の実施例の説明から明らかなように
、本発明の光学記録担体は基板に対してO2ガスのイオ
ン衝撃による前処理を行った後50〜300Åの厚さの
Te−Pd金属結晶膜を形成し、その上部にTeOx−
Pd記録層を設けている。この処理により基板表面がイ
オン衝撃により清浄化されるとともに粗面化されるため
、Te−Pd金属膜が高温高湿下で基板から剥離し難し
く、良好なC/N値を得ることができる。また、ディス
クの寿命推定値として従来の2倍の寿命を得ることがで
きるという効果が得られる。
Effects of the Invention As is clear from the description of the embodiments above, the optical record carrier of the present invention has a Te--Pd film with a thickness of 50 to 300 Å after pretreatment of the substrate by ion bombardment with O2 gas. A metal crystal film is formed, and TeOx-
A Pd recording layer is provided. By this treatment, the substrate surface is cleaned and roughened by ion bombardment, so that the Te--Pd metal film is difficult to peel off from the substrate under high temperature and high humidity, and a good C/N value can be obtained. Furthermore, an effect can be obtained in that the estimated life of the disk can be twice as long as the conventional one.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の一実施例の光ディスクの構成を示す断
面図
FIG. 1 is a sectional view showing the configuration of an optical disc according to an embodiment of the present invention.

【図2】同製造工程を示す構成図[Figure 2] Configuration diagram showing the same manufacturing process

【図3】従来の光学記録担体の断面図[Figure 3] Cross-sectional view of a conventional optical record carrier

【符号の説明】[Explanation of symbols]

1    ディスク基板 2    イオン衝撃をうけた層 3    Te−Pd金属膜 4    TeOx−Pd記録膜 10  真空槽 11  ディスクホルダ 12  スイッチ 13  接点A 14  高圧電源 15  接点B 16  ターゲット 1 Disk board 2 Layer subjected to ion bombardment 3 Te-Pd metal film 4 TeOx-Pd recording film 10 Vacuum chamber 11 Disc holder 12 Switch 13 Contact A 14 High voltage power supply 15 Contact B 16 Target

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】  基板上にテルル(Te)または酸化テ
ルル(TeOxでxは2を上限とする)を主成分とし、
Pdが2原子%以上5原子%未満添加された光学記録膜
を形成する前に、前記基板にイオン衝撃による前処理を
行う光学記録担体の製造方法。
[Claim 1] The main component is tellurium (Te) or tellurium oxide (TeOx, where x has an upper limit of 2) on the substrate,
A method for producing an optical recording carrier, in which the substrate is pretreated by ion bombardment before forming an optical recording film doped with 2 at.% or more and less than 5 at.% of Pd.
【請求項2】  イオン衝撃前に酸素を導入し、イオン
衝撃時の真空槽内ガス圧が1×10−2Torr以上、
イオン衝撃時間が5分以上である請求項1記載の光学記
録担体の製造方法。
2. Oxygen is introduced before ion bombardment, and the gas pressure in the vacuum chamber at the time of ion bombardment is 1 x 10-2 Torr or more,
2. The method for producing an optical record carrier according to claim 1, wherein the ion bombardment time is 5 minutes or more.
【請求項3】  光学記録膜と基板との間に、50〜3
00Åの厚さのテルル−パラジウム(Te−Pd)金属
結晶膜を設けた請求項1記載の光学記録担体の製造方法
3. Between the optical recording film and the substrate, 50 to 3
2. The method of manufacturing an optical record carrier according to claim 1, wherein a tellurium-palladium (Te-Pd) metal crystal film having a thickness of 00 Å is provided.
JP3052237A 1991-03-18 1991-03-18 Preparation of optical recording carrier Pending JPH04288287A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3052237A JPH04288287A (en) 1991-03-18 1991-03-18 Preparation of optical recording carrier

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3052237A JPH04288287A (en) 1991-03-18 1991-03-18 Preparation of optical recording carrier

Publications (1)

Publication Number Publication Date
JPH04288287A true JPH04288287A (en) 1992-10-13

Family

ID=12909115

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3052237A Pending JPH04288287A (en) 1991-03-18 1991-03-18 Preparation of optical recording carrier

Country Status (1)

Country Link
JP (1) JPH04288287A (en)

Similar Documents

Publication Publication Date Title
JPH04288287A (en) Preparation of optical recording carrier
JPH0421938A (en) Optical recording carrier and production thereof
JPH06150366A (en) Optical recording carrier and its production
JPS61210521A (en) Production of magnetic disk
JP2629717B2 (en) Information recording medium
JPH01303645A (en) Optical recording carrier and its production
JPS5938653B2 (en) How to make needles with electrodes
JP2825059B2 (en) Optical disc and method of manufacturing the same
JP3255682B2 (en) Aluminum film adherend
JP2001126308A (en) Optical recording medium and its manufacturing method
JP3878337B2 (en) Method for producing non-initialization type phase change optical recording medium
JP3102431B1 (en) Optical recording medium
KR0121185B1 (en) Optical recording medium of phase changing type
JPH02171289A (en) Information recording medium
JP2731196B2 (en) Information recording medium
JP2667155B2 (en) Information recording medium
JPH0447382B2 (en)
JPS62154247A (en) Production of recording material
JP2731202B2 (en) Information recording medium
JPH04362542A (en) Recording and erasing method for phase transition type optical disk
JPS63217546A (en) Production of optical disk
JPH038141A (en) Optical recording carrier and production thereof
JP2002157786A (en) Optical recording medium
JPH0630178B2 (en) Optical disk manufacturing method
JPS61272190A (en) Optical recording medium