JPH04287938A - Formation of metallic projection, supply method of metallic brazing material and jig for them - Google Patents
Formation of metallic projection, supply method of metallic brazing material and jig for themInfo
- Publication number
- JPH04287938A JPH04287938A JP13812291A JP13812291A JPH04287938A JP H04287938 A JPH04287938 A JP H04287938A JP 13812291 A JP13812291 A JP 13812291A JP 13812291 A JP13812291 A JP 13812291A JP H04287938 A JPH04287938 A JP H04287938A
- Authority
- JP
- Japan
- Prior art keywords
- metal
- tool
- brazing material
- support tool
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 63
- 239000000463 material Substances 0.000 title claims abstract description 50
- 238000005219 brazing Methods 0.000 title claims description 45
- 230000015572 biosynthetic process Effects 0.000 title description 2
- 239000004065 semiconductor Substances 0.000 claims abstract description 16
- 230000007246 mechanism Effects 0.000 claims abstract description 15
- 229910052751 metal Inorganic materials 0.000 claims description 142
- 239000002184 metal Substances 0.000 claims description 142
- 239000000758 substrate Substances 0.000 claims description 12
- 238000002788 crimping Methods 0.000 claims description 7
- 238000005520 cutting process Methods 0.000 claims description 7
- 239000000945 filler Substances 0.000 claims description 5
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 abstract 2
- 229910000679 solder Inorganic materials 0.000 description 30
- 230000008569 process Effects 0.000 description 16
- 238000007747 plating Methods 0.000 description 14
- 239000006071 cream Substances 0.000 description 10
- 239000010410 layer Substances 0.000 description 10
- 239000011295 pitch Substances 0.000 description 9
- 238000007650 screen-printing Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 5
- 239000007769 metal material Substances 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 238000007726 management method Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 238000004806 packaging method and process Methods 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 229920001875 Ebonite Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000010309 melting process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000002250 progressing effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies
- H01L24/741—Apparatus for manufacturing means for bonding, e.g. connectors
- H01L24/743—Apparatus for manufacturing layer connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/74—Apparatus for manufacturing arrangements for connecting or disconnecting semiconductor or solid-state bodies and for methods related thereto
- H01L2224/741—Apparatus for manufacturing means for bonding, e.g. connectors
- H01L2224/743—Apparatus for manufacturing layer connectors
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Wire Bonding (AREA)
- Die Bonding (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は金属突起物の形成方法,
金属ろう材の供給方法およびそれらの治具に関する。[Industrial Application Field] The present invention relates to a method for forming metal protrusions,
This invention relates to a method for supplying a metal brazing filler metal and a jig therefor.
【0002】0002
【従来の技術】近年、LSIなどの半導体製品は各種の
民生用機器、産業用機器などその応用分野はますます拡
大してきた。これらの機器は、その利用分野拡大のため
低価格化とともにポータブル化が進められている。従っ
て、半導体製品においてもこれらの要求に対応するため
、パッケージングや機器への組み込み工程の低価格化や
軽量化、薄型化、小型化といった高密度実装が要求され
ている。BACKGROUND OF THE INVENTION In recent years, the fields of application of semiconductor products such as LSIs have been increasingly expanding, including various consumer devices and industrial devices. These devices are becoming less expensive and more portable in order to expand their field of use. Therefore, in order to meet these demands, semiconductor products are also required to have high-density packaging, such as lower costs, lighter weight, thinner thickness, and smaller size in packaging and equipment integration processes.
【0003】一般に、半導体製品の高密度実装に適した
方法としはTAB方式が知られており、実用化の拡大が
はかられてきた。TAB方式の半導体素子と実装用配線
基板間の接続には、半導体素子の電極配置に合わせてパ
ターン化されたAuまたはSnメッキをしたCuからな
る金属リードと金属リード保持用ポリイミド膜とを貼り
合わせした構成のフィルムキャリヤを用いる。ここで、
半導体素子のAl電極と金属リード間の接合を行うには
接合部を凸にする必要があり、Al電極部または金属リ
ード上にバンプと呼ばれる金属突起物が設けられる。こ
の金属突起物を介したAl電極と金属リードとの接合に
は通常熱圧着法が用いられている。Generally, the TAB method is known as a method suitable for high-density packaging of semiconductor products, and efforts have been made to expand its practical use. For connection between a semiconductor element and a mounting wiring board using the TAB method, a metal lead made of Au or Sn-plated Cu that is patterned to match the electrode arrangement of the semiconductor element is bonded to a polyimide film for holding the metal lead. A film carrier with a structure similar to the above is used. here,
In order to bond between an Al electrode of a semiconductor element and a metal lead, it is necessary to make the bonding part convex, and a metal protrusion called a bump is provided on the Al electrode part or the metal lead. A thermocompression bonding method is usually used to bond the Al electrode and the metal lead via the metal protrusion.
【0004】従来の金属突起物の形成方法としては、い
わゆるメッキバンプ法が広く用いられてきた。図7(a
)〜(c)は従来の第1の例を工程順に示す断面図であ
る。まず、半導体素子20上にTi,Crなどの接着層
25、Cu,Ptなどの拡散防止層26をスパッタで積
層形成する。(図7(a))。次いで、Al電極部21
以外を被うレジスト層27をリソグラフィ形成した後、
Al電極部21にAuメッキ層28を約30μm形成す
る。(図7(b))。その後、前記レジスト層27を除
去した後、Al電極部21を覆うレジスト層の形成を行
い、Al電極部21以外の拡散防止層26,接着層25
をエッチング除去する(図7(c))。以上のように工
程を踏みAl電極上にメッキにより金属突起物が形成さ
れる。As a conventional method for forming metal protrusions, the so-called plating bump method has been widely used. Figure 7 (a
) to (c) are cross-sectional views showing the first conventional example in the order of steps. First, an adhesive layer 25 made of Ti, Cr, etc., and a diffusion prevention layer 26 made of Cu, Pt, etc. are laminated on the semiconductor element 20 by sputtering. (Figure 7(a)). Next, the Al electrode section 21
After lithographically forming a resist layer 27 covering the
An Au plating layer 28 having a thickness of about 30 μm is formed on the Al electrode portion 21 . (Figure 7(b)). After that, after removing the resist layer 27, a resist layer is formed to cover the Al electrode part 21, and the diffusion prevention layer 26 and the adhesive layer 25 other than the Al electrode part 21 are formed.
is removed by etching (FIG. 7(c)). Through the steps described above, metal protrusions are formed on the Al electrode by plating.
【0005】メッキバンプ法以外では、図8(a)〜(
c)に示すAuワイヤのボールボンディングの技術を用
いるボールバンプ法が注目され、開発が進んでいる。
まず、キャピラリ30下に出たAuワイヤ31の先端を
電気トーチ32を用いて放電溶融させAuボール33を
形成する(図8(a))。次いで、Auボール33をA
l電極21にキャピラリ30で超音波接合した後(図8
(b))、キャピラリ30,Auワイヤ31を引き上げ
てAuボールのネック部からAuワイヤ31を引きちぎ
りボール部34のみをAl電極21上に残す(図8(c
))。この方法は、湿式工程がなく工程が簡略で、電極
上に1点ずつ形成するため少量多品種に適している。Other than the plating bump method, FIGS.
The ball bump method using the Au wire ball bonding technique shown in c) is attracting attention and its development is progressing. First, the tip of the Au wire 31 exposed below the capillary 30 is melted by discharge using an electric torch 32 to form an Au ball 33 (FIG. 8(a)). Next, the Au ball 33 is
After ultrasonic bonding with the capillary 30 to the l electrode 21 (Fig. 8
(b)), pull up the capillary 30 and Au wire 31 and tear off the Au wire 31 from the neck part of the Au ball, leaving only the ball part 34 on the Al electrode 21 (Fig. 8(c)
)). This method does not require a wet process and has a simple process, and is suitable for producing a wide variety of products in small quantities because it is formed one point at a time on the electrode.
【0006】他に、TABフィルム側に金属突起物を形
成できるとして転写バンプ法も有力視されている。この
方法は、Al電極に対応した導体開口部を持つメッキ用
基板に電気メッキによりAuの突起物を形成した後、T
ABの金属リードと重ね合わせて加熱加圧してAu突起
物をメッキ用基板からTABの金属リード上に転写する
ものである。[0006] In addition, the transfer bump method is considered to be a promising method as it allows metal protrusions to be formed on the TAB film side. In this method, after forming Au protrusions by electroplating on a plating substrate having conductor openings corresponding to Al electrodes, T
The Au protrusions are transferred from the plating substrate onto the TAB metal leads by overlapping them with the AB metal leads and applying heat and pressure.
【0007】近年、表面実装法は高密度化の傾向にあり
、産業用機器、民生用機器共に搭載されている電子部品
のチップ化、パッケージ部品の微小化、および回路基板
上電極の微少化、狭ピッチ化へと進んでいる。それに伴
って部品と回路基板の電気的、機械的接続を高密度かつ
高信頼に行なう方法が求められている。[0007] In recent years, there has been a trend toward higher density in surface mounting methods, and electronic components mounted on both industrial and consumer devices have been made into chips, packaged parts have become smaller, and electrodes on circuit boards have become smaller. Progress is being made towards narrower pitches. Accordingly, there is a need for a method for electrically and mechanically connecting components and circuit boards with high density and high reliability.
【0008】近年、回路基板への接続用金属ろう材供給
方法としては、適当な合金組成のハンダ粉末とフラック
スを混合したクリームハンダをスクリーン印刷により供
給する方法が広く用いられてきた。[0008] In recent years, as a method of supplying a metal brazing material for connection to a circuit board, a method of supplying cream solder, which is a mixture of solder powder and flux of an appropriate alloy composition, by screen printing has been widely used.
【0009】第9図は(a)〜(c)は一般的なスクリ
ーン印刷法の工程を示す。まず、回路基板37上にある
接続用電極36とに対応する部分をエッチングにより除
去した金属マスク41を回路基板上に数ミリの間隙をも
たせ設置する(第9図(a))。金属製マスク22上に
適当に粘度を調整したクリームハンダ42を供給、硬質
ゴム製のスキージ40を押し当てながら金属製マスク4
1上を移動させる。金属製マスク41は周辺を弾性のあ
るフィルム43により支持してあり、スキージ40を押
し当てながら移動することによりクリームハンダ42は
順次金属製マスク41に充填され金属製マスク41を支
持するフィルム43の弾性により順次マスク41より抜
け(第9図(b))、電極上にクリームハンダ42が残
り、クリームハンダの供給を完了する(第9図(c))
。FIGS. 9(a) to 9(c) show steps of a general screen printing method. First, a metal mask 41 whose portion corresponding to the connection electrode 36 on the circuit board 37 has been removed by etching is placed on the circuit board with a gap of several millimeters (FIG. 9(a)). A cream solder 42 whose viscosity has been adjusted appropriately is supplied onto the metal mask 22, and the metal mask 4 is pressed against it with a hard rubber squeegee 40.
Move 1 up. The periphery of the metal mask 41 is supported by an elastic film 43, and by moving the squeegee 40 while pressing the metal mask 41, cream solder 42 is sequentially filled into the metal mask 41, and the film 43 supporting the metal mask 41 is filled with cream solder 42. Due to its elasticity, it gradually comes out of the mask 41 (FIG. 9(b)), leaving cream solder 42 on the electrode, completing the supply of cream solder (FIG. 9(c)).
.
【0010】0010
【発明が解決しようとする課題】上述した従来の技術は
、下記のような欠点をもっている。
(1)メッキバンプ法は、工程が複雑であり厚いメッキ
膜を付けるため資材費や工数がかかること、大きい設備
投資が必要であること、素子歩留の低下の原因となるこ
となど形成コストが高いという欠点がある。ボールバン
プ法の場合は、湿式工程がないという利点があるものの
、Auボールの大きさのバラツキやワイヤを引きちぎっ
たあとの高さのバラツキがあり、また、Auボールを用
いるため電極ピッチ100μm程度が限界でありそれ以
下の微細接合は困難であるとされている。さらに、TA
Bフィルム接合時だけでなく、バンプ形成時にも電極部
に機械的ストレスをかけるの接合部の信頼性が問題とな
っている。転写バンプ法は、メッキ用基板へメッキを行
うのでメッキバンプ法に比べチップ歩留への影響がない
が、工程の複雑さは解消出来ない上に、Au突起物を不
具合なくTABフィルム上に転写するにはメッキ用基板
の形成、メッキ工程などの高度の管理とノウハウが必要
である。
(2)スクリーン印刷法による回路基板への金属ろう材
供給方法は、下記のような欠点を持っている。マスクに
よる回路基板上への塗布は、そのマスクの精度とクリー
ムハンダの特性によりハンダ供給量が決定されるが、エ
ッチングによるマスクの作成精度は低く供給量は一定と
ならず、接合部のハンダ過不足、また隣接する電極間で
の短絡、すなわちハンダブリッジ等を引き起こし製品の
歩留低下を引き起こす。特に電極ピッチが0.5mm以
下と狭くなるにつれてクリームハンダ印刷が困難になる
。また、フラックスとハンダ粉末の混合物であるクリー
ムハンダは、粉末のフラックスによる腐食によりハンダ
濡れ性低下を招くために長期保存等、管理面での欠点を
持つ。また、マスクが必要であるので納期的に不利であ
り、特に設計に変更のあった場合に迅速かつ臨機応変に
対応できない。The above-mentioned conventional techniques have the following drawbacks. (1) The plating bump method has a complicated process and requires high material costs and man-hours to apply a thick plating film, requires large capital investment, and causes a decrease in device yield. It has the disadvantage of being expensive. Although the ball bump method has the advantage of not requiring a wet process, there are variations in the size of the Au balls and variations in the height after tearing the wire, and since the Au balls are used, the electrode pitch is approximately 100 μm. This is the limit, and it is said that fine bonding below this limit is difficult. Furthermore, T.A.
The reliability of the bonded portion is a problem because mechanical stress is applied to the electrode portion not only when bonding the B film but also when forming bumps. The transfer bump method has no effect on chip yield compared to the plating bump method because the plating is performed on the plating substrate, but it does not eliminate the complexity of the process and it is difficult to transfer the Au protrusions onto the TAB film without any problems. This requires advanced management and know-how in the formation of plating substrates and the plating process. (2) The method of supplying metal brazing material to circuit boards by screen printing has the following drawbacks. When applying solder onto a circuit board using a mask, the amount of solder supplied is determined by the precision of the mask and the characteristics of the cream solder. However, the accuracy of creating a mask by etching is low, and the amount of solder supplied is not constant. Insufficiency also causes short circuits between adjacent electrodes, ie solder bridges, etc., resulting in a decrease in product yield. In particular, as the electrode pitch becomes narrower to 0.5 mm or less, cream solder printing becomes difficult. In addition, cream solder, which is a mixture of flux and solder powder, has disadvantages in terms of management, such as long-term storage, because the solder wettability deteriorates due to corrosion caused by the powdered flux. Furthermore, since a mask is required, it is disadvantageous in terms of delivery time, and it is not possible to respond quickly and flexibly especially when there is a change in the design.
【0011】[0011]
【課題を解決するための手段】本発明の金属突起物の形
成方法は、金属線材の送り穴を有する柱状の支持ツール
の送り穴を通して金属線材を一定長送り出すとともに支
持ツールを下降させて支持ツールの先端部で金属リード
または基板を押さえた後、支持ツールと互いの長手方向
の一端面で接触する柱状の加圧ツールを摺動し送り穴か
ら一定長突き出た金属製線材を切断するとともに加圧ツ
ールの摺動を続けて金属リードまたは基板に切断された
金属線材を圧着する手順を含んで構成される。[Means for Solving the Problems] The method for forming metal protrusions of the present invention involves feeding out a certain length of metal wire through the feed hole of a pillar-shaped support tool having a metal wire feed hole, and lowering the support tool. After holding down the metal lead or board with the tip of the tool, the column-shaped pressure tool that contacts the supporting tool at one end in the longitudinal direction is slid to cut and apply pressure to the metal wire protruding a certain length from the feed hole. The method includes the steps of crimping the cut metal wire onto the metal lead or substrate by continuing to slide the pressure tool.
【0012】また、本発明の金属突起物形成治具は、先
端部近傍に金属線材の送り穴を設けた柱状の支持ツール
と、支持ツールと長手方向の一端面で互いに接しながら
摺動する柱状の加圧ツールと、支持および加圧ツールの
少なくとも一方のツールの摺動案内を行う摺動ガイドと
、送り穴に金属線材を一定長送り込む機構とを含んで構
成される。The metal protrusion forming jig of the present invention also includes a columnar support tool provided with a feed hole for the metal wire near its tip, and a columnar support tool that slides in contact with the support tool at one end surface in the longitudinal direction. The pressure tool includes a pressure tool, a sliding guide for supporting and slidingly guiding at least one of the pressure tools, and a mechanism for feeding a metal wire a certain length into a feed hole.
【0013】本発明の金属ろう材供給方法は、線状の金
属ろう材の送り穴を有する柱状の支持ツールを電極上の
所定位置に位置決めし、支持ツール送り穴より金属ろう
材を電極長に応じて所定長送りだし、前記支持ツールと
互いに長手方向の一端面で接触し摺動する加圧ツールに
より所定長送り出した金属ろう材を切断、その後、加圧
ツールは摺動を続け、切断された金属ろう材を電極に圧
着する事からなる。In the metal brazing material supply method of the present invention, a columnar support tool having a feed hole for a linear metal brazing material is positioned at a predetermined position on an electrode, and the metal brazing material is fed to the length of the electrode through the support tool feed hole. Accordingly, the metal brazing material is fed out for a predetermined length, and the metal brazing material fed out for a predetermined length is cut by a pressure tool that slides in contact with the support tool at one end surface in the longitudinal direction.Then, the pressure tool continues to slide and is cut. It consists of crimping a metal brazing material to an electrode.
【0014】また本発明の金属ろう材供給治具は、先端
部近傍に金属ろう材の送り穴を設けた柱状の支持ツール
と、この支持ツールと長手方向の一端面で互いに接しな
がら摺動する柱状と加圧ツール、また前記支持ツールお
よび加圧ツールの少なくとも一方のツールの摺動案内を
行う摺動ガイド、そして前記送り穴に金属ろう材を電極
長に応じて所定長送り出す送り機構からなる。Further, the metal brazing material supply jig of the present invention slides with a columnar support tool having a feeding hole for the metal brazing material near the tip thereof while contacting each other at one end surface in the longitudinal direction. It consists of a column, a pressure tool, a sliding guide for slidingly guiding at least one of the support tool and the pressure tool, and a feeding mechanism that feeds the metal brazing material into the feed hole by a predetermined length according to the electrode length. .
【0015】[0015]
【実施例】次に、本発明の実施例について、図面を参照
して詳細に説明する。図1は本発明の第1の実施例の金
属突起物形成治具を示す斜視図である。支持ツール1お
よび加圧ツール2は先端部を細くした柱状をしており、
これら1対のツール1,2は、摺動ガイド9により一端
面12で接触しながら互いに長手方向に摺動ができる。
支持ツール1の先端近くには金属線材3の送り穴10を
設けてあり、金属線材3は送り機構11により順次一定
長送り込まれる。ツール加圧13,14の加圧機構には
振幅拡大機構付き圧電素子などを用いる。なお、加圧ツ
ール2のみ摺動ガイド内を摺動させ、支持ツール1は摺
動ガイドと固定し、その移動は治具全体を支持する機構
の移動により行うようにしてもよい。Embodiments Next, embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is a perspective view showing a metal protrusion forming jig according to a first embodiment of the present invention. The support tool 1 and the pressure tool 2 have a columnar shape with a tapered tip.
These pair of tools 1 and 2 can be slid against each other in the longitudinal direction while being in contact with each other at one end surface 12 by a sliding guide 9. A feed hole 10 for the metal wire 3 is provided near the tip of the support tool 1, and the metal wire 3 is sequentially fed a fixed length by a feed mechanism 11. A piezoelectric element with an amplitude expansion mechanism is used as a pressure mechanism for the tool pressures 13 and 14. Alternatively, only the pressure tool 2 may be slid within the sliding guide, the support tool 1 may be fixed to the sliding guide, and the movement may be performed by moving the mechanism that supports the entire jig.
【0016】図2(a)〜(d)は本発明の第2の実施
例を工程順に示す断面図である。まず、TABフィルム
5の金属リード6を加熱ステージ4上に設置し、支持ツ
ール1の送り穴10に金属線材3を送り込むとともに加
圧ツール2を金属リード6の先端上に来るように位置合
わせする(図2(a))。次に、支持ツール1,加圧ツ
ール2とともに矢印方向18bの所定の圧力を加えて下
降させ、金属リード6を支持ツール1で押さえる(図2
(b))。次いで加圧ツール3のみに圧力を加えて下降
させ、金属材料3を切断するとともに、連続して加圧ツ
ール2を下降させ切断された金属線材の切片を金属リー
ド6上に圧着する(図2(c))。その後、支持ツール
1および加圧ツール2とともに上昇させると金属突起物
8の形成工程が完了する(図2(d))。FIGS. 2(a) to 2(d) are cross-sectional views showing the second embodiment of the present invention in the order of steps. First, the metal lead 6 of the TAB film 5 is placed on the heating stage 4, the metal wire 3 is fed into the feed hole 10 of the support tool 1, and the pressure tool 2 is positioned so that it is above the tip of the metal lead 6. (Figure 2(a)). Next, the support tool 1 and the pressure tool 2 are lowered by applying a predetermined pressure in the direction of the arrow 18b, and the metal lead 6 is held down by the support tool 1 (Fig. 2
(b)). Next, only pressure is applied to the pressure tool 3 and it is lowered to cut the metal material 3, while the pressure tool 2 is continuously lowered and the cut piece of the metal wire is crimped onto the metal lead 6 (Fig. 2 (c)). Thereafter, when it is raised together with the support tool 1 and the pressure tool 2, the process of forming the metal protrusion 8 is completed (FIG. 2(d)).
【0017】このようにして、順次TABの金属リード
上に金属線材の切片を圧着していき、半導体素子の一連
のA1電極に対応した金属突起物形成を行うことができ
る。本発明の方法では、予め支持ツールで金属突起物形
成部のすぐ横を押さえるので、金属リードに反りがあり
ステージから浮いた状態であっても金属突起物圧着時に
はステージに押さえつけられ、接合強度や位置決めの精
度が安定する。金属線材の切断においては、支持ツール
がダイス、加圧ツールがポンチの役割をする。In this manner, pieces of metal wire are successively crimped onto the metal leads of the TAB, thereby forming metal protrusions corresponding to the series of A1 electrodes of the semiconductor element. In the method of the present invention, the supporting tool is used to hold down the side of the metal protrusion forming part in advance, so even if the metal lead is warped and floating off the stage, it will be pressed against the stage when the metal protrusion is crimped, improving the bonding strength. Positioning accuracy becomes stable. When cutting metal wire, the support tool acts as a die and the pressure tool acts as a punch.
【0018】実施例の方法で、金属線材を直径50μm
のAuワイヤとし、先端が60μm径正方形のの加圧ツ
ールを用いて、リードピッチ100μm,リード幅60
μmとTABフィルムのAuメッキリードへ圧着を行っ
た。このとき、切断は70g以上の加圧で行うことがで
きた。Auは柔らかく伸び易い性質があるので、ツール
間のクリアランスが大きいとき、切断されたAu小片は
切断面上部に高いバリが立ち好ましくない。[0018] By the method of the example, a metal wire with a diameter of 50 μm was prepared.
Using a pressure tool with a square tip of 60 μm in diameter, the lead pitch was 100 μm and the lead width was 60 μm.
The .mu.m and TAB films were crimped onto the Au-plated leads. At this time, cutting could be performed with a pressure of 70 g or more. Since Au has the property of being soft and easily stretchable, when the clearance between the tools is large, the cut Au pieces will have high burrs on the upper part of the cut surface, which is undesirable.
【0019】本発明の場合、一平面の切断であるので、
クリアランスを0にできるので良好な形状のAu切片が
形成できる。ステージの加熱温度170℃のとき、リー
ドへの圧着は、ポンチ圧力40gでも可能である。切断
後の金属リードへの圧着では円筒形に切断されたAu小
片はつぶれて上面が平坦な高さ約30μmのAu突起物
となった。リードとの接合強度は、その後の半導体素子
のAl電極と熱圧着工程で強化されるので吸収中に外れ
ない程度であれば良い。In the case of the present invention, since the cutting is in one plane,
Since the clearance can be reduced to 0, an Au section with a good shape can be formed. When the heating temperature of the stage is 170° C., the lead can be crimped with a punch pressure of 40 g. After cutting, the Au small piece cut into a cylindrical shape was crushed into an Au protrusion with a height of about 30 μm and a flat top surface when it was crimped onto a metal lead. The bonding strength with the lead is strengthened in the subsequent thermocompression bonding process with the Al electrode of the semiconductor element, so it is sufficient that it does not come off during absorption.
【0020】ポンチ加圧力は、打ち抜き後小さくし低加
圧でリードに押し付けるのが望ましく、このような加圧
力を与える手段として圧電素子が適している。本実施例
によるAu突起物を形成したリードと半導体素子のAl
電極とを熱圧着接合したところ良好な接合性を確認でき
た。なお、予めAu突起物の接合力を十分に強くしたい
ときは、一定圧力で打ち抜き、リードへの接合を行えば
よい。ただしこの場合、圧着時にはAu切片のつぶれ方
が激しくなる。It is desirable to reduce the punch force after punching and press the lead against the lead with a low pressure, and a piezoelectric element is suitable as a means for applying such pressure. Al of lead and semiconductor element with Au protrusions formed in this example
When the electrodes were bonded by thermocompression, good bonding properties were confirmed. Note that if you want to make the bonding force of the Au protrusion sufficiently strong in advance, it is sufficient to punch it out with a constant pressure and then bond it to the lead. However, in this case, the Au section is severely crushed during crimping.
【0021】図3は本発明の第3の実施例を示し、加圧
ツール先端面を凹状にしたときの金属突起物形状を示す
断面図である。金属突起物8の上面16の形状は、加圧
ツール2の先端面15の形状に対応した凸状になるので
、高さや形状の精度のよい金属突起物を得ることができ
る。FIG. 3 shows a third embodiment of the present invention, and is a sectional view showing the shape of a metal protrusion when the tip end surface of the pressure tool is made concave. Since the shape of the upper surface 16 of the metal projection 8 is a convex shape corresponding to the shape of the tip end surface 15 of the pressure tool 2, a metal projection with high precision in height and shape can be obtained.
【0022】以上の様に、本発明の場合、順次送り込ま
れる金属線材を順次切断、圧着していくだけであるので
、その装置は簡単であり、かつ処理能力も高くできる。
形成した金属突起物の形状、高さは加圧ツールの圧力と
その先端形状で制御できるので精度が良好であり、その
後の半導体素子電極との接合の信頼性も高い。本発明は
、Auボール作るボールバンプ法と異なり、ツール径を
容易に小さくすることができるので100μm以下の狭
ピッチリードを持つTABにも対応できる。また、本発
明の場合、金属突起物を金属リード上に形成できるので
、ボールバンプ法のように半導体素子の電極に機械的ス
トレスをかけず、接合部の信頼性も高くすることができ
る。As described above, in the case of the present invention, since the metal wires fed in one after another are simply cut and crimped one after another, the apparatus is simple and the processing capacity can be increased. Since the shape and height of the formed metal protrusion can be controlled by the pressure of the pressure tool and the shape of its tip, the precision is good, and the reliability of subsequent bonding with the semiconductor element electrode is also high. Unlike the ball bump method for making Au balls, the present invention can easily reduce the tool diameter, so it can also be used for TABs with narrow pitch leads of 100 μm or less. Furthermore, in the case of the present invention, since the metal protrusions can be formed on the metal leads, mechanical stress is not applied to the electrodes of the semiconductor element unlike the ball bump method, and the reliability of the joint can be increased.
【0023】実施例では、金属材料にはワイヤを用いた
がリボンなどの金属線材を用いてもよい。又、TABフ
ィルムの金属リード上に形成する場合だけでなく、他の
金属リードへの金属突起物の形成にも適用できる。本発
明の金属突起物の材料としては、機械加工法を用いるの
で種々の材料選択が可能である。半導体素子の電極と金
属リードとの接続に適用するときは、主成分がAu,A
g,Al,Cu,In,各種ハンダ合金などを用いるこ
とができる。安価な材料を使うことにより低コスト化を
はかることができる。In the embodiment, a wire is used as the metal material, but a metal wire such as a ribbon may also be used. Moreover, it can be applied not only to forming metal protrusions on the metal leads of the TAB film, but also to forming metal protrusions on other metal leads. Since a machining method is used as the material for the metal protrusion of the present invention, various materials can be selected. When applied to connection between electrodes of semiconductor elements and metal leads, the main components are Au and A.
G, Al, Cu, In, various solder alloys, etc. can be used. Cost reduction can be achieved by using inexpensive materials.
【0024】第4図は本発明の第4の実施例の金属ろう
材供給治具を示す斜視図である。支持ツール1および加
圧ツール2は先端を細くした柱状であり、これら一対の
ツールは摺動ガイド9により一端面で接触しながら互い
に長手方向に摺動ができる。支持ツール1の先端近くに
は金属ろう材35の送り穴10を設けてあり、金属ろう
材35は送り機構11により順次所定長送り込まれる。
ツール加圧13,14の加圧機構には振幅拡大機構付き
圧電素子を用いる。なお、加圧ツールのみ摺動ガイド9
内を摺動させ、支持ツール1は摺動ガイド9と一体であ
り、その移動は治具全体を支持する機構の移動により行
う。FIG. 4 is a perspective view showing a metal brazing material supply jig according to a fourth embodiment of the present invention. The support tool 1 and the pressure tool 2 have a columnar shape with a tapered tip, and these pair of tools can slide against each other in the longitudinal direction while being in contact with each other at one end surface by a sliding guide 9. A feed hole 10 for a metal brazing material 35 is provided near the tip of the support tool 1, and the metal brazing material 35 is sequentially fed by a predetermined length by a feeding mechanism 11. A piezoelectric element with an amplitude expansion mechanism is used as a pressure mechanism for the tool pressures 13 and 14. In addition, only the pressure tool has sliding guide 9.
The supporting tool 1 is integrated with a sliding guide 9, and its movement is performed by moving the mechanism that supports the entire jig.
【0025】図5(a)〜(d)は、本発明の第4の実
施例の工程を示す断面図である。まず回路基板37上の
電極36を加熱ステージ38上に設置し、支持ツール1
の送り穴10に金属ろう材35を送り込むと共に加圧ツ
ール2を電極36の上にくるように位置合わせをする(
図5(a))。次に支持ツール1、加圧ツール2ともに
矢印方向18bに所定の圧力を加えて下降させ、回路基
板37を支持ツール1で押さえる(図5(b))。つい
で加圧ツール2のみに圧力を加えて下降させ、金属ろう
材35を切断すると共に連続して加圧ツール2を下降さ
せ切断された金属ろう材35の切片を回路基板37上の
電極36に圧着する(図5(c))。その後、支持ツー
ル1および加圧ツール2ともに上昇させると金属ろう材
供給工程が完了する(図5(d))。なお、支持ツール
1による回路基板押さえの機構はなくても良く電極の種
類により支持ツール1先端の下降位置は自由に設定する
ことができる。FIGS. 5A to 5D are cross-sectional views showing the steps of the fourth embodiment of the present invention. First, the electrode 36 on the circuit board 37 is placed on the heating stage 38, and the support tool 1
Feed the metal brazing material 35 into the feed hole 10 and position the pressure tool 2 so that it is above the electrode 36 (
Figure 5(a)). Next, both the support tool 1 and the pressure tool 2 are lowered by applying a predetermined pressure in the direction of the arrow 18b, and the circuit board 37 is held down by the support tool 1 (FIG. 5(b)). Then, pressure is applied only to the pressure tool 2 and lowered to cut the metal brazing material 35, and the pressure tool 2 is continuously lowered to attach the cut piece of the metal brazing material 35 to the electrode 36 on the circuit board 37. Crimp it (Fig. 5(c)). Thereafter, when both the support tool 1 and the pressure tool 2 are raised, the metal brazing material supply process is completed (FIG. 5(d)). Note that the mechanism for holding down the circuit board by the support tool 1 may be omitted, and the lowering position of the tip of the support tool 1 can be freely set depending on the type of electrode.
【0026】この治具による金属ろう材35の切断にお
いては支持ツール1がダイス、加圧ツール2がポンチの
役割をする。実施例の方法によりピッチ0.5mm、形
状0.2mm×1.0mmである電極に、金属ろう材が
直径0.1mmのハンダワイヤを用い、先端が0.1m
m×1.5mmの長方形である加圧ツールを使用し、ハ
ンダ材を供給した。この時、ステージの加熱温度100
℃であり、ワイヤの切断は30g以上の加圧で行うこと
ができ、圧着も良好に行えた。ハンダは軟らかく伸び易
い性質を持つので、ツール間のクリアランスが大きいと
、切断されたハンダワイヤは切断面上部に高いバリがた
ち好ましくない。本発明の場合、一平面での切断である
ので、クリアランスをゼロにでき、良好な形状のハンダ
供給ができる。圧着後のハンダ小片の形状は加圧ツール
により潰されて、上面が平坦であり、高さ0.06mm
の形状を呈した。電極とハンダ小片の接合強度は、電子
部品を乗せてのハンダ溶融工程によりハンダ接合を完全
なものとするので、取り扱い中にはずれない程度で良い
。本実施例によるハンダ供給を施した回路基板で電子部
品を接合したところ良好な接合性を確認した。In cutting the metal brazing material 35 with this jig, the support tool 1 functions as a die and the pressure tool 2 functions as a punch. By the method of the example, a solder wire with a diameter of 0.1 mm was used as a metal brazing material for electrodes with a pitch of 0.5 mm and a shape of 0.2 mm x 1.0 mm, and the tip was 0.1 m.
A pressure tool having a rectangular shape of m x 1.5 mm was used to supply the solder material. At this time, the heating temperature of the stage is 100
℃, the wire could be cut with a pressure of 30 g or more, and crimping could be performed well. Since solder is soft and easily stretchable, if the clearance between the tools is large, the cut solder wire will undesirably have high burrs on the upper part of the cut surface. In the case of the present invention, since cutting is performed in one plane, the clearance can be reduced to zero, and solder can be supplied in a good shape. The shape of the small solder piece after crimping is crushed by a pressure tool so that the top surface is flat and the height is 0.06 mm.
It took on the shape of The bonding strength between the electrode and the solder piece needs to be such that it does not come off during handling, since the solder bond is perfected by the solder melting process with the electronic component placed thereon. When electronic components were bonded using a circuit board supplied with solder according to this example, good bonding performance was confirmed.
【0027】図6は、加圧ツール先端面15を凹状にし
たときのハンダ供給形状39を示す構造図である。図の
ように金属ろう材35の上面形状は、加圧ツール15の
先端面の形状に対応した凸状になるので、高さや形状の
精度が良く隣接する電極との接触を防ぐことができる。FIG. 6 is a structural diagram showing the solder supply shape 39 when the pressure tool tip surface 15 is made concave. As shown in the figure, the top surface of the metal brazing material 35 has a convex shape corresponding to the shape of the tip end surface of the pressure tool 15, so that the height and shape are accurate and contact with adjacent electrodes can be prevented.
【0028】以上のように本発明の場合、順次送り込ま
れる金属ろう材を順次切断、圧着していくだけであるの
で、その装置は簡単であり、かつ処理能力も高くできる
。金属製マスクを用いたスクリーン印刷法とことなり、
ツールの形状を容易に変化させることが可能で狭ピッチ
に配列した電極、大小取り混ぜた複雑な電極配列にもあ
らかじめ設定した必要量のろう材を精密に供給できる。As described above, in the case of the present invention, since the metal brazing filler metals that are successively fed are simply cut and crimped one after another, the apparatus is simple and the processing capacity can be increased. Unlike the screen printing method using a metal mask,
It is possible to easily change the shape of the tool, and it is possible to precisely supply the required amount of brazing filler metal set in advance to electrodes arranged at a narrow pitch or complex electrode arrangements of mixed sizes.
【0029】実施例では金属材料にはワイヤを用いたが
リボン状のなどの金属材料を用いても良い。また、回路
基板上の電極だけでなく、電子部品の金属リードに金属
ろう材を供給し接合する場合にも適用できる。In the embodiment, a wire is used as the metal material, but a ribbon-shaped metal material may also be used. Furthermore, it can be applied not only to electrodes on circuit boards, but also to the case where a metal brazing material is supplied and bonded to metal leads of electronic components.
【0030】[0030]
【発明の効果】本発明の金属突起物の形成方法は、湿式
工程がなく工程が簡略であり、簡単な構造かつ処理能力
のある装置で済むので、資材費や設備投資が少なくて済
むなどの低コストの金属突起物の形成ができる効果があ
る。金属リード上に金属突起物が形成できるので機械的
ストレスによる接合部の信頼性低下の心配がないという
効果がある。[Effects of the Invention] The method for forming metal protrusions of the present invention has a simple process without a wet process, and requires only equipment with a simple structure and processing capacity, resulting in low material costs and equipment investment. This has the effect of forming metal protrusions at low cost. Since metal protrusions can be formed on the metal leads, there is no concern that the reliability of the joint will deteriorate due to mechanical stress.
【0031】また、金属突起物の形状や高さは加圧ツー
ルの先端形状で制御できるので、精度の高い金属突起物
の形成ができ、接合を高信頼化できるとともに狭ピッチ
接合にも対応できる利点がある。更に、実装の構成に応
じて金属突起物材料を選択でき、低コスト化、高信頼化
構造を実現できるという効果もある。[0031] Furthermore, since the shape and height of the metal protrusion can be controlled by the tip shape of the pressure tool, the metal protrusion can be formed with high precision, making it possible to make the welding highly reliable and also support narrow pitch welding. There are advantages. Furthermore, the material for the metal protrusions can be selected depending on the mounting configuration, which has the effect of realizing a low-cost, high-reliability structure.
【0032】本発明の金属ろう材供給方法はコンピュー
タなどで設計したデータをもとにマスクを必要とせず金
属ろう材を供給することが可能で設計の変更や、少量多
品種の生産に対応でき、スクリーン印刷法のように湿式
工程がなく工程が簡略であり、簡単な構造かつ処理能力
のある装置なので、資材費や設備投資が少なくて済む等
の低コストのろう材供給ができる利点がある。また、金
属ろう材の供給量をワイヤ径で制御するため高精度の供
給管理ができ、ハンダ過不足などの問題を解消するため
接合を高信頼化できると共に、加圧ツールの先端形状に
より供給時のろう材形状が制御され、溶融、凝固時に隣
接する電極との短絡が発生せず、狭ピッチ接合にも対応
できる利点がある。[0032] The metal brazing material supply method of the present invention is capable of supplying metal brazing material without the need for a mask based on data designed using a computer, etc., and is compatible with changes in design and production of a wide variety of products in small quantities. , the process is simple as there is no wet process like the screen printing method, and the equipment has a simple structure and processing capacity, so it has the advantage of being able to supply brazing material at a low cost, such as requiring less material and equipment investment. . In addition, since the amount of metal brazing filler metal supplied is controlled by the wire diameter, highly accurate supply management is possible, and high reliability can be achieved by solving problems such as excess or shortage of solder. It has the advantage that the shape of the brazing material is controlled, no short circuit occurs with adjacent electrodes during melting and solidification, and it can also be used for narrow pitch bonding.
【図1】本発明の第1の実施例を示すブロック図である
。FIG. 1 is a block diagram showing a first embodiment of the present invention.
【図2】(a)〜(d)は本発明の第2の実施例を示す
工程断面図である。FIGS. 2(a) to 2(d) are process cross-sectional views showing a second embodiment of the present invention.
【図3】図1に示す加圧ツールが凹状のときの形成され
た金属突起物形状を示す断面図である。FIG. 3 is a sectional view showing the shape of a metal protrusion formed when the pressure tool shown in FIG. 1 is concave;
【図4】本発明の第4の実施例を示す斜視図である。FIG. 4 is a perspective view showing a fourth embodiment of the present invention.
【図5】(a)〜(d)は第4の実施例の工程断面図で
ある。FIGS. 5(a) to 5(d) are process cross-sectional views of the fourth embodiment.
【図6】図4に示す加圧ツールが凹状の時の形成された
金属ろう材形状を示す斜視図である。6 is a perspective view showing the shape of a metal brazing material formed when the pressure tool shown in FIG. 4 is concave; FIG.
【図7】(a)〜(c)は従来の第1の例を工程順に示
す断面図である。FIGS. 7(a) to 7(c) are cross-sectional views showing a first conventional example in the order of steps.
【図8】(a)〜(c)は従来の第2の例を工程順に示
す断面図である。FIGS. 8A to 8C are cross-sectional views showing a second conventional example in the order of steps.
【図9】(a)〜(c)は従来の金属ろう材供給方法で
あるスクリーン印刷法を工程順に示す断面図である。FIGS. 9(a) to 9(c) are cross-sectional views showing the screen printing method, which is a conventional metal brazing material supply method, in order of steps.
1 支持ツール
2 加圧ツール
3 金属材料
4 ステージ
5 TABフィルム
6 金属リード
7 ポリイミド膜
8 金属突起物
9 摺動ガイド
10 送り穴
11 送り機構
13,14 ツール加圧
15 加圧ツール先端面
16 金属突起物上面
17,17c,18b,18d ツールの移動方
向20 半導体素子
21 Al電極部
22 Al層
23 保護層
24 シリコン基板
25 接着層
26 拡散防止層
27 レジスト層
28 Auメッキ層
30 キャピラリ
31 Auワイヤ
32 電気トーチ
33 Auボール
34 Auボール部
35 金属ろう材
36 電極
37 回路基板
38 加熱ステージ
39 ろう材供給形状
40 スキージ
41 金属製マスク
42 クリームハンダ
43 支持フィルム1 Support tool 2 Pressure tool 3 Metal material 4 Stage 5 TAB film 6 Metal lead 7 Polyimide film 8 Metal protrusion 9 Sliding guide 10 Feed hole 11 Feed mechanism 13, 14 Tool pressure 15 Pressure tool tip surface 16 Metal protrusion Object top surface 17, 17c, 18b, 18d Tool movement direction 20 Semiconductor element 21 Al electrode section 22 Al layer 23 Protective layer 24 Silicon substrate 25 Adhesive layer 26 Diffusion prevention layer 27 Resist layer 28 Au plating layer 30 Capillary 31 Au wire 32 Electricity Torch 33 Au ball 34 Au ball part 35 Metal brazing material 36 Electrode 37 Circuit board 38 Heating stage 39 Brazing material supply shape 40 Squeegee 41 Metal mask 42 Cream solder 43 Support film
Claims (10)
ツールの前記送り穴を通して前記金属線材を一定長送り
出すとともに前記支持ツールを下降させて前記支持ツー
ルの先端部で金属リードまたは基板を押さえた後、前記
支持ツールと互いの長手方向の一端面で接触する柱状の
加圧ツールを摺動し前記送り穴から一定長付き出た金属
製線材を切断するとともに前記加圧ツールの摺動を続け
て前記金属リードまたは基板に前記切断された金属線材
を圧着することを特徴とする金属突起物の形成方法。Claim 1: A fixed length of the metal wire is fed through the feed hole of a columnar support tool having a feed hole for the metal wire, and the support tool is lowered to hold down a metal lead or a substrate with the tip of the support tool. After that, a column-shaped pressure tool that contacts the supporting tool at one end surface in the longitudinal direction is slid to cut the metal wire extending a certain length from the feed hole, and the pressure tool continues to slide. A method for forming a metal protrusion, characterized in that the cut metal wire is crimped onto the metal lead or the substrate using a metal protrusion.
フィルムキャリヤの金属リードまたは半導体素子である
請求項1記載の金属突起物形成方法。2. The method for forming metal projections according to claim 1, wherein the metal lead or the substrate is a metal lead of a TAB type film carrier or a semiconductor element.
た柱状の支持ツールと、前記支持ツールと長手方向の一
端面で互いに接しながら摺動する柱状の加圧ツールと、
前記支持および加圧ツールの少なくとも一方のツールの
摺動案内を行う摺動ガイドと、前記送り穴に金属線材を
一定長送り込む機構とを有することを特徴とする金属突
起物形成治具。3. A columnar support tool having a feed hole for a metal wire near its tip; a columnar pressure tool that slides while touching the support tool at one end surface in the longitudinal direction;
A metal protrusion forming jig comprising: a sliding guide for slidingly guiding at least one of the support and pressure tools; and a mechanism for feeding a metal wire a certain length into the feed hole.
求項3記載の金属突起物形成治具。4. The metal protrusion forming jig according to claim 3, wherein a recess is provided in the tip end surface of the pressure tool.
状の支持ツールを電極上の所定位置に位置決めするとと
もに、前記支持ツール送り穴より金属ろう材を電極長に
応じて所定長送りだし、前記支持ツールと互いに長手方
向の一端面で接触し摺動する加圧ツールにより前記送り
出された金属ろう材を切断した後、加圧ツールの摺動を
続け切断された金属ろう材を前記電極に圧着することを
特徴とする金属ろう材の供給方法。5. Positioning a columnar support tool having a feed hole for a linear metal brazing material at a predetermined position on the electrode, and feeding the metal brazing material a predetermined length according to the electrode length from the support tool feed hole, After cutting the fed-out metal brazing material by a pressure tool that slides in contact with the support tool at one end surface in the longitudinal direction, the pressure tool continues to slide and the cut metal brazing material is attached to the electrode. A method for supplying a metal brazing filler metal, which is characterized by crimping.
ることを特徴とする請求項5記載の金属ろう材供給方法
。6. The method for supplying a metal brazing material according to claim 5, wherein the electrode is an electrode on a printed circuit board.
とを特徴とする請求項5記載の金属ろう材供給方法。7. The method for supplying a metal brazing material according to claim 5, wherein the electrodes are an electronic component and a metal lead.
けた柱状の支持ツールと、この支持ツールと長手方向の
一端面で互いに接しながら摺動する柱状の加圧ツールと
、前記支持ツールおよび加圧ツールの少なくとも一方の
ツールの摺動案内を行う摺動ガイドと、前記送り穴より
金属ろう材を電極長に応じて所定長送り出す送り機構と
を有することを特徴とする金属ろう材供給治具。8. A column-shaped support tool having a feeding hole for a metal brazing material near its tip, a column-shaped pressure tool that slides while touching the support tool at one end surface in the longitudinal direction, and the support tool. and a sliding guide for slidingly guiding at least one of the pressurizing tools, and a feeding mechanism that feeds the metal brazing material a predetermined length according to the electrode length from the feed hole. jig.
とを特徴とする請求項8記載の金属ろう材供給治具。9. The metal brazing material supply jig according to claim 8, wherein a recess is provided in the tip end surface of the pressure tool.
持ツールまたは基板ステージを駆動させ前記支持ツール
の先端面と前記基板面とが所定距離になるように位置決
めした後、前記支持ツールと互いの長手方向の一端面で
接触する柱状の加圧ツールを摺動し前記送り穴から一定
長送り出された金属線材を切断するとともに前記加圧ツ
ールの摺動を続けて前記切断された金属線材を前記基板
に圧着することを特徴とする金属突起物の形成方法。10. After driving a columnar support tool or a substrate stage having a metal wire feed hole and positioning the support tool so that the tip end surface of the support tool and the substrate surface are at a predetermined distance, A column-shaped pressure tool that is in contact with one end surface in the longitudinal direction is slid to cut the metal wire fed out to a certain length from the feed hole, and the pressure tool continues to slide to cut the cut metal wire. A method for forming metal protrusions, characterized by crimping them onto a substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13812291A JP2555915B2 (en) | 1991-01-21 | 1991-06-11 | Method of forming metal protrusion, method of supplying metal brazing material, and jigs therefor |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP492991 | 1991-01-21 | ||
JP3-4929 | 1991-01-21 | ||
JP13812291A JP2555915B2 (en) | 1991-01-21 | 1991-06-11 | Method of forming metal protrusion, method of supplying metal brazing material, and jigs therefor |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH04287938A true JPH04287938A (en) | 1992-10-13 |
JP2555915B2 JP2555915B2 (en) | 1996-11-20 |
Family
ID=26338788
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13812291A Expired - Lifetime JP2555915B2 (en) | 1991-01-21 | 1991-06-11 | Method of forming metal protrusion, method of supplying metal brazing material, and jigs therefor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2555915B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010239110A (en) * | 2009-03-11 | 2010-10-21 | Denso Corp | Method of mounting components on semiconductor device, and mounting components of semiconductor device |
-
1991
- 1991-06-11 JP JP13812291A patent/JP2555915B2/en not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010239110A (en) * | 2009-03-11 | 2010-10-21 | Denso Corp | Method of mounting components on semiconductor device, and mounting components of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JP2555915B2 (en) | 1996-11-20 |
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