JPH0428720A - Heat-resistant laminated material and its production - Google Patents
Heat-resistant laminated material and its productionInfo
- Publication number
- JPH0428720A JPH0428720A JP13432690A JP13432690A JPH0428720A JP H0428720 A JPH0428720 A JP H0428720A JP 13432690 A JP13432690 A JP 13432690A JP 13432690 A JP13432690 A JP 13432690A JP H0428720 A JPH0428720 A JP H0428720A
- Authority
- JP
- Japan
- Prior art keywords
- formulas
- tables
- mathematical
- chemical
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002648 laminated material Substances 0.000 title claims abstract description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 238000001035 drying Methods 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 9
- 239000000126 substance Substances 0.000 claims abstract 33
- 125000000962 organic group Chemical group 0.000 claims description 14
- 239000011342 resin composition Substances 0.000 claims description 11
- 125000003118 aryl group Chemical group 0.000 claims description 10
- 125000001424 substituent group Chemical group 0.000 claims description 8
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 238000007334 copolymerization reaction Methods 0.000 claims description 6
- 239000002023 wood Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 abstract description 18
- 239000011347 resin Substances 0.000 abstract description 18
- 239000011521 glass Substances 0.000 abstract description 15
- -1 diamine compound Chemical class 0.000 abstract description 13
- 239000004744 fabric Substances 0.000 abstract description 12
- 239000002904 solvent Substances 0.000 abstract description 9
- 239000003960 organic solvent Substances 0.000 abstract description 7
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 abstract description 3
- 150000003141 primary amines Chemical class 0.000 abstract description 3
- 239000012298 atmosphere Substances 0.000 abstract description 2
- 150000004985 diamines Chemical class 0.000 abstract description 2
- 239000011261 inert gas Substances 0.000 abstract description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 abstract 2
- 238000010030 laminating Methods 0.000 abstract 1
- 239000011369 resultant mixture Substances 0.000 abstract 1
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 20
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- 239000011889 copper foil Substances 0.000 description 13
- 229920001721 polyimide Polymers 0.000 description 9
- 239000013557 residual solvent Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 239000003822 epoxy resin Substances 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- 229920000647 polyepoxide Polymers 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 6
- 238000005452 bending Methods 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- 239000004642 Polyimide Substances 0.000 description 5
- 238000001723 curing Methods 0.000 description 5
- 230000009477 glass transition Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 4
- 239000000806 elastomer Substances 0.000 description 4
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 4
- 150000003949 imides Chemical class 0.000 description 4
- 239000009719 polyimide resin Substances 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 150000001991 dicarboxylic acids Chemical class 0.000 description 3
- 239000000835 fiber Substances 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 235000013824 polyphenols Nutrition 0.000 description 3
- 239000001294 propane Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- 238000013006 addition curing Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 2
- 238000005553 drilling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- YNPNZTXNASCQKK-UHFFFAOYSA-N phenanthrene Chemical compound C1=CC=C2C3=CC=CC=C3C=CC2=C1 YNPNZTXNASCQKK-UHFFFAOYSA-N 0.000 description 2
- 229920005575 poly(amic acid) Polymers 0.000 description 2
- 150000008442 polyphenolic compounds Chemical class 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000012744 reinforcing agent Substances 0.000 description 2
- 239000012779 reinforcing material Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 2
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 2
- JIHQDMXYYFUGFV-UHFFFAOYSA-N 1,3,5-triazine Chemical compound C1=NC=NC=N1 JIHQDMXYYFUGFV-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- DUJAUTCYDLIGAY-UHFFFAOYSA-N 2-(furan-2-ylamino)acetic acid Chemical compound OC(=O)CNC1=CC=CO1 DUJAUTCYDLIGAY-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical compound NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- NFVPEIKDMMISQO-UHFFFAOYSA-N 4-[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC=C(O)C=C1 NFVPEIKDMMISQO-UHFFFAOYSA-N 0.000 description 1
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- 206010010071 Coma Diseases 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- OXIKYYJDTWKERT-UHFFFAOYSA-N [4-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCC(CN)CC1 OXIKYYJDTWKERT-UHFFFAOYSA-N 0.000 description 1
- NIYNIOYNNFXGFN-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol;7-oxabicyclo[4.1.0]heptane-4-carboxylic acid Chemical compound OCC1CCC(CO)CC1.C1C(C(=O)O)CCC2OC21.C1C(C(=O)O)CCC2OC21 NIYNIOYNNFXGFN-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 229960004050 aminobenzoic acid Drugs 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 125000002529 biphenylenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3C12)* 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Substances FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000002734 clay mineral Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- WTYGAUXICFETTC-UHFFFAOYSA-N cyclobarbital Chemical compound C=1CCCCC=1C1(CC)C(=O)NC(=O)NC1=O WTYGAUXICFETTC-UHFFFAOYSA-N 0.000 description 1
- 229960004138 cyclobarbital Drugs 0.000 description 1
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- LDLDYFCCDKENPD-UHFFFAOYSA-N ethenylcyclohexane Chemical compound C=CC1CCCCC1 LDLDYFCCDKENPD-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- ZHNUHDYFZUAESO-UHFFFAOYSA-N formamide Substances NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 210000000936 intestine Anatomy 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 1
- 239000000347 magnesium hydroxide Substances 0.000 description 1
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000010755 mineral Nutrition 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- DSROZUMNVRXZNO-UHFFFAOYSA-K tris[(1-naphthalen-1-yl-3-phenylnaphthalen-2-yl)oxy]alumane Chemical compound C=1C=CC=CC=1C=1C=C2C=CC=CC2=C(C=2C3=CC=CC=C3C=CC=2)C=1O[Al](OC=1C(=C2C=CC=CC2=CC=1C=1C=CC=CC=1)C=1C2=CC=CC=C2C=CC=1)OC(C(=C1C=CC=CC1=C1)C=2C3=CC=CC=C3C=CC=2)=C1C1=CC=CC=C1 DSROZUMNVRXZNO-UHFFFAOYSA-K 0.000 description 1
- 239000010456 wollastonite Substances 0.000 description 1
- 229910052882 wollastonite Inorganic materials 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 235000014692 zinc oxide Nutrition 0.000 description 1
Landscapes
- Reinforced Plastic Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、耐熱性、耐湿性、保存安定性に優れた耐熱積
層材及びその製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a heat-resistant laminate having excellent heat resistance, moisture resistance, and storage stability, and a method for producing the same.
〔従来の技術と解決すべき課R]
近年、電子機器の発達はめざましく、配線板として使用
される銅張積層板の使用も多種多様となり、且つ優れた
特性のものが要求されている。とりわけ、電子部品の高
密度実装化による配線の高密度化にともない、配線板の
多層化、スルーホルの小径化が進みつつある。このため
、ドリル加工時のスミア発生が少ないなど、加工性の良
好な銅張積層板が求められている。一方、生産性の向上
、低コスト化の要請にともない、配線板への実装工程で
ホノトエアーレヘラーやりフローはんだ付けなど、ます
ます厳しい加工条件が求められている。これらの要求の
中で基板である銅張積層板用耐熱性、耐湿性はこれまで
以上に優れたものが求められるようになってきた。[Prior Art and Problems to be Solved] In recent years, electronic devices have developed at a remarkable pace, and the use of copper-clad laminates used as wiring boards has become diverse, and those with excellent characteristics are required. In particular, with the increasing density of wiring due to the high-density packaging of electronic components, wiring boards are becoming more multilayered and through-holes are becoming smaller in diameter. For this reason, there is a need for copper-clad laminates with good workability, such as less smear generation during drilling. On the other hand, with the demand for improved productivity and lower costs, increasingly strict processing conditions are required in the process of mounting onto wiring boards, such as using a photo air reherer or flow soldering. Among these demands, copper-clad laminates that serve as substrates are required to have better heat resistance and moisture resistance than ever before.
これらの要求を満たすために、一般に銅張積層板用の積
層材として広く用いられているエボキノ樹脂に代わって
、近年、付加硬化型のポリイミド樹脂が利用されるよう
になってきている。このポリイミド樹脂を銅張積層板用
積層材として用いた場合、ドリル加工時のスミアの発生
がほとんど無くなり、また、加工工程や長期試験での耐
熱性が格段に改良されるという利点ををすることが知ら
れている。In order to meet these demands, in recent years, addition-curing polyimide resins have come to be used instead of evoquino resins, which are generally widely used as laminated materials for copper-clad laminates. When this polyimide resin is used as a laminate material for copper-clad laminates, it has the advantage of almost no smearing during drilling, and the heat resistance during processing and long-term tests is significantly improved. It has been known.
しかしながら、従来用いられてきた付加硬化型のポリイ
ミド樹脂は以下に述べるような種々の問題点を有してい
た。すなわち、不飽和ジカルボン酸のN、N’−ビスイ
ミドとジアミノジフェニルメタンとを反応させたものは
、積層板用として優れたものであるが、反面、ジアミノ
ジフェニルメタンは反応性が高く、フェスやプリプレグ
の可使時間が短いという問題かあった。更に、ジアミノ
ジフェニルメタンは生体への毒性が問題となることがあ
る。However, conventionally used addition-curing polyimide resins have had various problems as described below. In other words, a product made by reacting N,N'-bisimide, an unsaturated dicarboxylic acid, with diaminodiphenylmethane is excellent for use in laminates. There was a problem with the short usage time. Furthermore, diaminodiphenylmethane may pose a problem of toxicity to living organisms.
また、不飽和ジカルボン酸のN、N’−ビスイミドとア
ミノフェノールとを反応成分とするものは積層板用とし
てバランスのとれた特性を示し、加工性も優れている。Further, those containing N,N'-bisimide of unsaturated dicarboxylic acid and aminophenol as reaction components exhibit well-balanced properties for use in laminates and have excellent processability.
しかし、耐湿性が劣るという問題があり、たとえば、得
られた積層板の長期保存には、吸湿に格別の注意を払わ
なければならなかった。However, there is a problem in that the moisture resistance is poor, and for example, special attention must be paid to moisture absorption for long-term storage of the obtained laminate.
更に、不飽和ジカルボン酸のN、N’−ビスイミドとア
ミノ安息香酸とを反応させたものは積層板用として好適
であるが、低沸点溶媒に対して溶解性が悪く、プリプレ
グ作成時のガラス布などへの塗布に問題点を有していた
。更に、樹脂溶液の保存にも注意しなければならないな
どの問題点があった。Furthermore, a product obtained by reacting N,N'-bisimide of an unsaturated dicarboxylic acid with aminobenzoic acid is suitable for use in laminates, but it has poor solubility in low-boiling point solvents and cannot be used in glass cloth when making prepregs. There were problems in applying it to surfaces such as. Furthermore, there were other problems such as the need to be careful in storing the resin solution.
本発明者はかかる実状に鑑み、これらの技術的課題を解
決すべく鋭意検討を重ねた結果、本発明に到達したもの
である。In view of the above circumstances, the present inventor has made extensive studies to solve these technical problems, and as a result, has arrived at the present invention.
すなわち、本発明に係る耐熱積層材の要旨とするところ
は、−殺伐(1)
(式中、Arzは4価のを機基、Arlは2価の有機基
、^r、は1価の有機基であり、^rz+Ar++Ar
:+はそれぞれ同種であってもよく、異種であってもよ
い。また、n、mは共重合比であり、いずれも1〜30
)整数を表す。更に、Xは、CH3,CHxCl(z、
CHxO,CI、 Br、 F、 CN、 NOx、
Ch、 CF+CFz、 CF30phから選ばれる
置換基であり、同一であってもよく、異なっていてもよ
い、yは1〜4の整数である。)からなる反応性を有す
る樹脂組成物を主成分とすることにある。That is, the gist of the heat-resistant laminate material according to the present invention is as follows: is a group, ^rz+Ar++Ar
:+ may be of the same type or different types. In addition, n and m are copolymerization ratios, both of which are 1 to 30.
) represents an integer. Furthermore, X is CH3, CHxCl(z,
CHxO, CI, Br, F, CN, NOx,
A substituent selected from Ch, CF+CFz, and CF30ph, which may be the same or different, and y is an integer of 1 to 4. ) is the main component.
また、かかる本発明の耐熱積層材におけるAr14価の
芳香族基であることにある。Further, it is an Ar14-valent aromatic group in the heat-resistant laminate material of the present invention.
更に、 かかる本発明の耐熱積層材における Ar −Q−OG so g @−o 昏 (い(沢 寡 o−OQ てン 又は −oO(戸()0昏 から選ばれる2価の芳香 族基であることにある。Furthermore, In the heat-resistant laminate material of the present invention, Ar -Q-OG so g @-o coma (I(sawa) small number o-OQ or -oO(door()0k Divalent aroma selected from It is a family group.
また、 かかる本発明の耐熱積層材における Ar。Also, In the heat-resistant laminate material of the present invention, Ar.
る。Ru.
次に、
本発明に係る耐熱積層材の製造方法は一般式(1)
(式中、^「2は4価の有機基、Ar1は2価の有機基
、Ar3は1価の有機基であり、Ar2.Ar、、^r
、はそれぞれ同種であってもよく、異種であってもよい
。また、n、mは共重合比であり、いずれも1〜30の
整数を表す。更に、Xは、CH2,CH2CH2,C1
ho、 CI、 Br、 F、 CN、 NO□、 C
F3. CF3Ch、 CF30phから選ばれる置換
基であり、同一であってもよく、異なっていてもよい、
yは1〜4の整数である。)からなる反応性を存する樹
脂組成物を基材に含浸させた後、
乾燥させてプリプレグを作成し、
次いでプレス成形することにある。Next, the method for producing a heat-resistant laminate according to the present invention is based on the general formula (1) (wherein 2 is a tetravalent organic group, Ar1 is a divalent organic group, and Ar3 is a monovalent organic group. ,Ar2.Ar,,^r
, may be of the same type or different types. Moreover, n and m are copolymerization ratios, and both represent integers of 1 to 30. Furthermore, X is CH2, CH2CH2, C1
ho, CI, Br, F, CN, NO□, C
F3. A substituent selected from CF3Ch and CF30ph, which may be the same or different.
y is an integer from 1 to 4. ) After impregnating a base material with a reactive resin composition, it is dried to create a prepreg, which is then press-molded.
かかる本発明の耐熱積層材の製造方法における4価の芳
香族基であることにある。It is a tetravalent aromatic group in the method for producing a heat-resistant laminate material of the present invention.
また、
かかる本発明の耐熱積層材の製造方法おける
Ar
が
DOGSOzGOG
(剋Q
−o−oo Oo Oo−から選ばれる2価の芳香族基
であることにある。Further, in the method for producing a heat-resistant laminate of the present invention, Ar is a divalent aromatic group selected from DOGSOzGOG (剋Q -o-oo Oo Oo-).
更に、かかる本発明の耐熱積層材の製造方法にであるこ
とにある。Furthermore, the present invention provides a method for manufacturing a heat-resistant laminate material.
〔実施例1
次に、本発明に係る耐熱積層材とその製造方法の実施例
について説明する。まず、本発明の耐熱積層材に用いら
れる反応性を有する樹脂組成物の製造方法について説明
する。[Example 1] Next, an example of a heat-resistant laminate material and a manufacturing method thereof according to the present invention will be described. First, a method for producing a reactive resin composition used in the heat-resistant laminate of the present invention will be described.
アルゴン、窒素などの不活性ガス雰囲気中、殺伐(n)
で表される有機ジアミン化合物;HzN−Ar+−NH
z (II )(式中、Ar、
は2価の有機基)と、
−殺伐(III)で表される内部アセチレン置換基を有
するジアミン;
入y 1a−y 入y na−Y(式中、
Xは、C)l:I、 CLCL、 Cl130. CI
、 8r、 FCN、 No□、 CF、、 CF□C
F7. CF30. Phから選はれる置11であり、
同一であってもよく、異なっていてもよい、yは1〜4
の整数である。)の混合物を有機溶媒中で7容解させ、
その混合溶液中に、一般弐(IV)で表される有機テト
ラカルボン酸二餠水物
(式中、Arzは4価の有機基)を添加し、テトラカル
ボン酸集水物末端のテレケリツクなオリゴマーを得た。In an inert gas atmosphere such as argon or nitrogen, killing (n)
Organic diamine compound represented by; HzN-Ar+-NH
z (II) (wherein, Ar,
is a divalent organic group); and a diamine having an internal acetylene substituent represented by (III);
X is C) l:I, CLCL, Cl130. C.I.
, 8r, FCN, No□, CF,, CF□C
F7. CF30. It is position 11 selected from Ph,
May be the same or different, y is 1 to 4
is an integer. ) was dissolved in an organic solvent,
An organic tetracarboxylic acid dihydride (in the formula, Arz is a tetravalent organic group) represented by general II (IV) is added to the mixed solution, and a telechelic oligomer at the terminal of the tetracarboxylic acid collection is added. I got it.
この時の反応温度は、 ■5〜120 ’Cの範囲が好
適であり、好ましくは−15〜100“C1さらに好ま
しくは一5〜50°Cが好適でである。反応時間は、1
〜5時間程度が好ましい。The reaction temperature at this time is suitably in the range of 5 to 120'C, preferably -15 to 100'C, and more preferably -5 to 50'C.The reaction time is 1
About 5 hours is preferable.
この反応溶液に、−殺伐(V)で表される1級アミン・
Ar、、−NHz (
V)を末端を停止させるために添加し、反応性を有する
ポリイミドの全駒体であるポリアミック酸溶液を得た。In this reaction solution, a primary amine represented by -killing (V), Ar,, -NHz (
V) was added to terminate the ends to obtain a polyamic acid solution containing all reactive polyimide pieces.
この時の反応温度は、0〜120°Cが好適であり、好
ましくは、0〜100°C1さらに好ましくは、40〜
】00°Cが好適である。反応時間は、1〜5時間程度
が好ましい。The reaction temperature at this time is suitably 0 to 120°C, preferably 0 to 100°C, and more preferably 40 to 100°C.
]00°C is preferred. The reaction time is preferably about 1 to 5 hours.
その後、ポリアミック酸溶液を熱的に閉環、脱水させる
ために非溶媒を加えた後、還流、共沸下にポリイミドに
変換した。ここで、使用する非溶媒は芳香族炭化水素で
あるキルン、トルエンなどが使用できるが、好ましくは
、トルエンを使用するのがよい。反応は、共沸、留去す
る水をディーン・スターク還流器を用いて反応理論量の
水が集められるまで還流させた。反応後は、水あるいは
アルコール系の溶媒中に激しく撹拌させながらポリイミ
ド溶液をY王くことで、ポリイミドをパウダーとして沈
澱させた。パウダーは、濾過して集めた後、80’C,
に圧下に48時間乾燥させた。Thereafter, a non-solvent was added to thermally ring-close and dehydrate the polyamic acid solution, and then the solution was converted into polyimide under reflux and azeotropy. Here, the nonsolvent used may be an aromatic hydrocarbon such as kiln or toluene, but toluene is preferably used. The reaction was carried out azeotropically, and the water to be distilled off was refluxed using a Dean-Stark reflux device until the stoichiometric amount of water for the reaction was collected. After the reaction, the polyimide solution was poured into a water or alcohol solvent with vigorous stirring to precipitate the polyimide as a powder. After the powder was collected by filtration, it was heated to 80'C.
The mixture was dried under pressure for 48 hours.
本発明に用いられる有機テトラカルボン酸二無水物とし
ては、あらゆる構造の有機テトラカルボン酸二無水物が
使用可能であるが、−殺伐(rV)のAr1基は4価の
有機基であり、芳香族基であることが好ましい。この^
rzJAを具体的に例示すると、次のものを挙げること
ができる。As the organic tetracarboxylic dianhydride used in the present invention, organic tetracarboxylic dianhydride having any structure can be used, but the Ar1 group of -rV is a tetravalent organic group, and aromatic A group group is preferred. This^
Specific examples of rzJA include the following.
これらの有機テトラカルボン酸二無水物を単独又は二種
以上組み合わせて用いてもよい。より具体的には、緒特
性のバランス面から、
の少なくとも1種類以上を主成分とすることが好適であ
る。These organic tetracarboxylic dianhydrides may be used alone or in combination of two or more. More specifically, in terms of the balance of properties, it is preferable that at least one of the following is used as the main component.
また、本発明に用いられる一般式(II)で表される有
機ジアミン化合物中の2価の有機基^r+は本質的には
2価の有機基なら何でも使用可能であるが、具体的には
、
0°o0o0゜
o5″S。Further, as the divalent organic group ^r+ in the organic diamine compound represented by the general formula (II) used in the present invention, essentially any divalent organic group can be used, but specifically, , 0°o0o0°o5″S.
oSOへ)、
恒に訳)
CHZ o−CH2
GS昏
などを挙げることができるが、
芳香族基が望まし
く具体的には、
Go @−s o z @−o @−
の少なくとも1種類以上を主成分とすることが好適であ
る。(to SO), Kou (translation) CHZ o-CH2 GS, etc., but aromatic groups are preferable, and specifically, at least one type of Go @-s o z @-o @- is the main group. It is suitable to use it as a component.
末端停止用に本発明で使用される一般式(V)で表され
る1級アミンの
Ar3を例示すると、
會0”0り
一〇−CEC−CECつ
@−0−◎−0′” 、Q”Q’=”−〇−〇′o″
c°0H,′1or3−06.。□−〇−0S:5o1
、−〇−5JQLo=o。Examples of the primary amine Ar3 represented by the general formula (V) used in the present invention for terminal termination are as follows: Q”Q’=”−〇−〇′o″
c°0H,'1or3-06. . □-〇-0S:5o1
, -〇-5JQLo=o.
−〇−0心C;C8−◎−CミCJI
などがあるが、コスト、取扱いの点で、特に好ましくは
、
が好適である。-〇-0 core C; C8-◎-CmiCJI etc., but from the point of view of cost and handling, the following is particularly preferred.
本発明のプリプレグに使用される反応性を有するポリイ
ミドが特に高い耐熱性を有することについての機構は明
確ではないが、アセチレン/アセチレンの熱硬化による
ベンゼン骨格形成、あるいはアセチレン/ビフェニレン
の熱硬化によるフェナンスレン骨格形成による芳香環の
形成の効果であると考えられる〔たとえば、J、に、ス
テイルらマクロモレキュルズ、第19巻、 第8 号、
1985ヘ一ジ、 1986年〕。The mechanism behind the particularly high heat resistance of the reactive polyimide used in the prepreg of the present invention is not clear, but it is believed that the formation of a benzene skeleton by heat curing of acetylene/acetylene or the formation of phenanthrene by heat curing of acetylene/biphenylene This is thought to be an effect of the formation of aromatic rings due to skeleton formation [for example, J. Steil et al., Macromolecules, Vol. 19, No. 8;
1985 Heidi, 1986].
また、数平均重合度[D P :P、J、フローリーP
r1nciples of Polymer Chem
istry:Cornell University
Press: l thaca、NY、 91ページ、
1953年]をコントロールするために共重合比nは
1〜30、好ましくは1〜15、さらに好ましくは1〜
10がよい。同様に共重合比mは1〜30、好ましくは
1〜25、さらに好ましくは1〜20がよい。それ以上
になると、有機溶媒に対する溶解性が落ちるという欠点
がでる。また、それ以下であると、機械的強度の点で問
題がでる。In addition, the number average degree of polymerization [D P :P, J, Flory P
r1nciples of Polymer Chem
istry:Cornell University
Press: l thaca, NY, 91 pages,
1953], the copolymerization ratio n is 1 to 30, preferably 1 to 15, more preferably 1 to 15.
10 is good. Similarly, the copolymerization ratio m is preferably 1 to 30, preferably 1 to 25, and more preferably 1 to 20. If it exceeds this range, there will be a disadvantage that the solubility in organic solvents will decrease. Moreover, if it is less than that, a problem will arise in terms of mechanical strength.
本発明の組成物は以上説明した反応性を有するポリイミ
ド樹脂を必須成分とするものであるが、必要に応して公
知のエポキシ樹脂やエポキシ樹脂硬化剤、硬化促進剤、
充填剤、難燃側、補強剤、表面処理側、顔料、各種エラ
ストマーなどを併用することができる。The composition of the present invention has the polyimide resin having the reactivity described above as an essential component, but if necessary, it may also contain a known epoxy resin, an epoxy resin curing agent, a curing accelerator,
Fillers, flame retardants, reinforcing agents, surface treatment, pigments, various elastomers, etc. can be used in combination.
公知のエポキシ樹脂とは分子中に2個以上のエボキノ(
グリシジル)基を有する化合物であり、例示するとビス
フェノールA、ビスフェノールF、ハイドロキノン、レ
ゾルシン、フリルグリシン、トリス−(4−ヒドロキノ
フェニル)メタン、1,1.22−テトラキス(4−ヒ
ドロキノフェニル)エタンなどの2価あるいは3価以上
のフェノール類又はテトラブロムビスフェノールAやブ
ロム化ポリフェノール類から誘導されるノボラックなど
のハロゲン化ポリフェノール類から誘導されるグリソジ
ルエーテル化合物、フェノール、オルトフレソールなど
のフェノール類とホルムアルデヒドの反応生成物である
ノボランク系エポキシ樹脂、アニリン、パラアミノフェ
ノール、メタアミノフェノール、4−アミノ−メタクレ
ゾール、6−アミノ−メタクレゾール、4.4′−ジア
ミノジフェニルメタン、88′= ジアミノジフェニル
メタン、4,4′−ジアミノジフェニルエーテル、3,
4′−ジアミノジフェニルエーテル、1.4−ビス(4
−アミノフェノキノ)ベンゼン、1.4−ビス(3−ア
ミノフェノキシ)ベンゼン、1.3−ビス(3−アミノ
フェノキン)ベンゼン、2.2−ビス(4−アミノフェ
ノキノフェニル)プロパン、パラフェニレンジアミン、
メタフェニレンジアミン、2.4− トルエンジアミン
、2.6− )ルエンジアミン、バラキシリレンジアミ
ン、メタキシリレンジアミン、1.4−シクロヘキサン
−ビス(メチルアミン)、l、3−シクロヘキサン ビ
ス(メチルアミン)、5−アミノ−1−(4’−アミノ
フェニル)−1,8,8−)リスチルインダン、6−ア
ミノ−1(4−アミノフェニル)−1,8,8−1−リ
スチルインダンなどから誘導されるアミン系エポキシ樹
脂、パラオキシ安息香酸、テレフタル酸、イソフタル酸
などの芳香族カルボン酸から誘導されるグリシジルエス
テル系化合物、5.5−ジメチルヒンダントインなどか
ら誘導されるヒンダントイン系エポキシ樹111.2.
2’−ビス(3,4−エポキシシクロヘキシル)プロパ
ン、2,2−ビス[4−(2,3−エポキシプロビル)
シクロヘキサル1プロパン、ビニルシクロヘキサンジオ
キサイド、3.4−エポキシシクロヘキサンカルボキシ
レートなどの脂環式エポキシ樹脂、その他、トリグリシ
ジルイソシアヌレート、2,4゜6−トリグリシドキシ
ーS−トリアジンなどの1種又は2種以上を挙げること
ができる。Known epoxy resins have two or more evoquinones (
Examples include bisphenol A, bisphenol F, hydroquinone, resorcinol, furylglycine, tris-(4-hydroquinophenyl)methane, and 1,1,22-tetrakis(4-hydroquinophenyl)ethane. Glysodylether compounds derived from divalent or trivalent or higher valent phenols such as phenols derived from halogenated polyphenols such as novolak derived from tetrabromobisphenol A and brominated polyphenols, phenols such as orthofuresol, etc. Novolanc epoxy resin, which is the reaction product of 4,4'-diaminodiphenyl ether, 3,
4'-diaminodiphenyl ether, 1,4-bis(4
-aminophenoquino)benzene, 1.4-bis(3-aminophenoxy)benzene, 1.3-bis(3-aminophenoquine)benzene, 2.2-bis(4-aminophenoquinophenyl)propane, para phenylenediamine,
metaphenylenediamine, 2.4-toluenediamine, 2.6-)luenediamine, baraxylylenediamine, metaxylylenediamine, 1,4-cyclohexane-bis(methylamine), l,3-cyclohexane-bis(methylamine) , 5-amino-1-(4'-aminophenyl)-1,8,8-)listylindane, 6-amino-1(4-aminophenyl)-1,8,8-1-listylindane, etc. amine-based epoxy resins derived from , glycidyl ester compounds derived from aromatic carboxylic acids such as paraoxybenzoic acid, terephthalic acid, and isophthalic acid, and hindantoin-based epoxy resins derived from 5,5-dimethylhindantoin, etc. 111.2.
2'-bis(3,4-epoxycyclohexyl)propane, 2,2-bis[4-(2,3-epoxypropyl)
Alicyclic epoxy resins such as cyclohexal 1 propane, vinyl cyclohexane dioxide, 3,4-epoxycyclohexane carboxylate, and one or more of triglycidyl isocyanurate, 2,4゜6-triglycidoxy S-triazine, etc. Two or more types can be mentioned.
公知のエポキシ硬化剤としては、芳香族アミンやキシリ
レンジアミンなどの脂肪族アミンなどのアミン系硬化剤
、フェノールノボラックやクレゾールノボラックなどの
ポリフェノール化合物、ヒドラジド化合物などが例示さ
れる。Examples of known epoxy curing agents include amine curing agents such as aromatic amines and aliphatic amines such as xylylene diamine, polyphenol compounds such as phenol novolak and cresol novolac, and hydrazide compounds.
硬化促進剤としてはベンジルジメチルアミン、2.4.
6−1−リス(ジメチルアミノメチル)フェノール、1
.8−ジアザビシクロウンデセンなどのアミン類や、2
−エチル−4−メチルイミダゾールなどのイミダゾール
化合物、三フッ化ホウ素アミン錯体などが例示できる。As a curing accelerator, benzyldimethylamine, 2.4.
6-1-Lis(dimethylaminomethyl)phenol, 1
.. Amines such as 8-diazabicycloundecene, 2
Examples include imidazole compounds such as -ethyl-4-methylimidazole and boron trifluoride amine complexes.
機械的強度を改良するために公知のエラストマーの添加
も効果的である。公知のエラストマーとは、具体的には
、以下のものを例示することができる。Addition of known elastomers to improve mechanical strength is also effective. Specific examples of known elastomers include the following.
n85゜ 鴎=1゜ R; C00)I (CTBN。n85゜ Seagull = 1° R; C00)I (CTBN.
CTB)
H
上記記載のエラストマーは、5ilastic(LS−
420)Sy Igard (184)
はダウコーニング社から、
ハイ力
−・ATBN(1300X16など)、CTB(200
0X162)、CTBN(1300X13,1300
X8,1300X31)、VTBN(1300X23
)は株式会社宇部興産から、3Fはモンサンドから購入
できる。CTB) H The elastomer described above is 5ilastic (LS-
420) Sy Igard (184) is available from Dow Corning, high strength ATBN (1300X16 etc.), CTB (200
0X162), CTBN (1300X13,1300
X8, 1300X31), VTBN (1300X23
) can be purchased from Ube Industries, Ltd., and 3F can be purchased from Monsando.
また、難燃性を付与するため、難燃剤や無機充填剤を適
宜配合することができる。無機充填剤は水不溶性で、絶
縁性のものが用いられる。その例としては、シリカ、ア
ルミナ、ジルコニア、二酸化チタン、亜鉛華などの金属
酸化物、水酸化マグネシウム、水酸化アルミニウムなど
の金属水酸化物、タルク、カオリン、雲母、ワラストナ
イト、粘土鉱物などの天然鉱物、炭酸カルシウム、炭酸
マグネシウム、硫酸バリウム、燐酸カルシウムなどの不
溶性塩などがある。Further, in order to impart flame retardancy, flame retardants and inorganic fillers can be appropriately blended. The inorganic filler used is water-insoluble and insulating. Examples include metal oxides such as silica, alumina, zirconia, titanium dioxide, and zinc white, metal hydroxides such as magnesium hydroxide and aluminum hydroxide, talc, kaolin, mica, wollastonite, and clay minerals. These include natural minerals and insoluble salts such as calcium carbonate, magnesium carbonate, barium sulfate, and calcium phosphate.
補強材としては炭素繊維、ガラス繊維、アラミド繊維、
ヘクトラなどの液晶ポリエステル繊維、ポリベンゾチア
ゾール(PBT)繊維、アルミナ繊維などからなる織布
、不織布、マット、祇(ペーパー)あるいはこれらの組
合せが例示できる。これらの補強材は接着性を付与する
ため、シランカップリング割処理を併用するのが効果的
である。Carbon fiber, glass fiber, aramid fiber,
Examples include woven fabrics, nonwoven fabrics, mats, paper, and combinations thereof made of liquid crystal polyester fibers such as Hectra, polybenzothiazole (PBT) fibers, alumina fibers, and the like. Since these reinforcing materials provide adhesive properties, it is effective to use silane coupling treatment together.
次に、本発明に係る反応性を有する樹脂組成物を主成分
とする耐熱積層材の製造方法として、代表的な塗布工程
を例を挙げて説明する。Next, as a method for manufacturing a heat-resistant laminate material containing the reactive resin composition according to the present invention as a main component, a typical coating process will be described by way of example.
−殺伐(1)で表される樹脂組成物を所定の樹脂濃度に
なるように所定量の有機溶剤で溶解、攪拌させることに
より、均一なフェス状樹脂組成物を得ることができる。- A uniform face-shaped resin composition can be obtained by dissolving and stirring the resin composition represented by Sakuboku (1) in a predetermined amount of an organic solvent to a predetermined resin concentration.
このようにして製造された樹脂組成物をガラス布、ガラ
ス不織布、ガラスペーパーなどの補強剤に塗布、含浸さ
せた後、乾燥炉内で50〜250°C1好ましくは、5
0〜200°C1さらに好ましくは、100〜200′
co)温度範囲内で、所定の残溶剤濃度になるように炉
内滞留時間を設定し、乾燥させて、耐熱性積層板用プリ
プレグが製造される。After coating and impregnating a reinforcing agent such as glass cloth, glass nonwoven fabric, glass paper, etc. with the resin composition produced in this way, the resin composition is dried in a drying oven at 50 to 250°C, preferably 50°C.
0 to 200°C1, more preferably 100 to 200'
co) The residence time in the furnace is set so that a predetermined residual solvent concentration is achieved within a temperature range, and the prepreg for a heat-resistant laminate is manufactured by drying.
使用される有機溶剤としては、たとえば、ジメチルスル
ホキッド、ジエチルスルホキシドなどのスルホキシド系
ン容媒、N、N’−ジメチルホルムアミド、〜、N′−
ジエチルホルムアミドなどのホルムアミド系溶媒、N、
N ’〜ジメチルアセトアミド、N、N’−ジエチルア
セトアミドなどのアセトアミド系溶媒、ジメチルエーテ
ル、ジエチルエーテル、ジオキサンなどのエーテル系ン
容媒、アセトン、メチルエチルケトンなどのケトン系溶
媒などを挙げることができる。これらを単独又は2種あ
るいは3種以上の混合溶媒として用いることもできる。Examples of the organic solvent used include sulfoxide-based solvents such as dimethyl sulfokide and diethyl sulfoxide, N,N'-dimethylformamide, and N'-
Formamide solvents such as diethylformamide, N,
Examples include acetamide solvents such as N'-dimethylacetamide and N,N'-diethylacetamide, ether solvents such as dimethyl ether, diethyl ether, and dioxane, and ketone solvents such as acetone and methyl ethyl ketone. These solvents can be used alone or as a mixed solvent of two or more.
さらに、これらの極性溶媒とともに、メタノール、エタ
ノール、イソプロパツールなどのアルコール系溶媒、ベ
ンゼン、メチルセロソルブなどとの混合溶媒として用い
ることもできる。Furthermore, in addition to these polar solvents, it can also be used as a mixed solvent with alcoholic solvents such as methanol, ethanol, and isopropanol, benzene, methyl cellosolve, and the like.
有機溶媒に溶解希釈時の樹脂濃度は、プリプレグ時の樹
脂濃度との関係から5〜75重量%、好ましくは15〜
65重量%、さらに好ましくは35〜65重量%の範囲
内で使用するのが望ましい。プリプレグの残溶剤濃度は
、補強材/樹脂比計算で、1〜20重量%、好ましくは
1〜10重量%、さらに好ましくは1〜5重量%の範囲
で調整するのが望ましい。それ以下では、プリプレグ成
形後の積層板の機械的特性が低くなるという問題が発生
する。またそれ以上では、プリプレグ成形時に残存溶媒
が揮発するため、ボイドの発生が起こるという不都合が
ある。The resin concentration when dissolved in an organic solvent and diluted is 5 to 75% by weight, preferably 15 to 75% by weight in relation to the resin concentration during prepreg.
It is desirable to use it in an amount of 65% by weight, more preferably in a range of 35 to 65% by weight. It is desirable to adjust the residual solvent concentration of the prepreg in the range of 1 to 20% by weight, preferably 1 to 10% by weight, and more preferably 1 to 5% by weight, based on the reinforcing material/resin ratio calculation. If it is less than that, a problem arises in that the mechanical properties of the laminate after prepreg molding become poor. Moreover, if it is more than that, the residual solvent will volatilize during prepreg molding, resulting in the inconvenience that voids will occur.
次に、上記のようにして得られた耐熱性プリプレグを用
いて両面銅張積層板を作成する方法について説明する。Next, a method for producing a double-sided copper-clad laminate using the heat-resistant prepreg obtained as described above will be described.
まず、希望する厚みになるように、銅箔及びプリフ゛レ
クノ枚数が調整される。プレス乙こ取付けられた表面が
鏡面仕上げされた2枚のステンレスプレートの間に、所
定の銅箔とプリプレグを挿入した後、所定の時間、温度
、圧力下で加熱、加圧巳て、両面銅張積層板が作成され
る。First, the number of copper foils and pre-reflectors are adjusted to obtain the desired thickness. After inserting the specified copper foil and prepreg between two stainless steel plates with mirror-finished surfaces attached to the press, they are heated and pressurized for a specified time, temperature, and pressure to form double-sided copper plates. A tension laminate is created.
なお、機械的強度を向上させるためにアフタキュアを併
用することも効果的である。Note that it is also effective to use aftercure in combination to improve mechanical strength.
次に、本発明をより具体的な実施例により説明するが、
本発明はこれらの実施例に何ら限定されるものではなく
、また、本発明はその趣旨を逸脱しない範囲内で、当業
者の知識に基づき種々なる修正、改良、変更を加えた態
様で実施し得るものである。Next, the present invention will be explained using more specific examples.
The present invention is not limited to these examples in any way, and the present invention may be implemented with various modifications, improvements, and changes based on the knowledge of those skilled in the art without departing from the spirit thereof. It's something you get.
11性−土
一般式(1)の各置換基が
であるイミドオリゴマー165gを、ジメチルホルムア
ミド(以下、O肝と略す。) 200gに溶解(樹脂濃
度;45重置%/DMF )させた。この熔解液を20
cmX20CIIX180 II−のガラス布(WEA
−18に105FII7.株式会社日東紡から購入)
16枚に含浸させた。熱風循環乾燥炉内で、120°C
190分乾燥させて、樹脂濃度40.8重量%(ガラス
布1枚当り)、残溶媒濃度4.0%のプリプレグが作成
された。165 g of an imide oligomer having each substituent of general formula (1) was dissolved in 200 g of dimethylformamide (hereinafter abbreviated as O-liver) (resin concentration: 45% by weight/DMF). 20% of this melt
cmX20CIIX180 II- glass cloth (WEA
-105FII7 on 18. Purchased from Nittobo Co., Ltd.)
16 sheets were impregnated. 120°C in a hot air circulation drying oven
After drying for 190 minutes, a prepreg with a resin concentration of 40.8% by weight (per glass cloth) and a residual solvent concentration of 4.0% was produced.
このようにして作成されたプリプレグ8枚を電解銅箔(
厚さ35μ腸、3EC,株式会社三井金属工業より購入
)2枚に挟み込み、220℃、2時間、25kg/cm
”の条件で加熱、加圧し一体成形して板厚10mmの両
面銅張積層板を得た。8 sheets of prepreg created in this way were covered with electrolytic copper foil (
35μ thick intestine, 3EC, purchased from Mitsui Kinzoku Kogyo Co., Ltd.) sandwiched between two sheets, 220°C, 2 hours, 25kg/cm
A double-sided copper-clad laminate with a thickness of 10 mm was obtained by heating and pressurizing and integrally molding the product under the following conditions.
得られた両面銅張積層板について、銅箔の引剥強度、ガ
ラス転移温度、曲げ強度及びプレッシャクツカーテスト
を伴う半田耐熱性を調べた。その結果を第1表に示す。The obtained double-sided copper-clad laminate was examined for copper foil peel strength, glass transition temperature, bending strength, and solder heat resistance accompanied by a pressure tsuka test. The results are shown in Table 1.
裏施U
一般式(1)の各置換基が
CF3
^・・・ *
Ar5= 00
であるイミドオリゴマー165gを、DMF200gに
溶解(樹脂濃度;45重量%/DMF )させた、この
溶解液を20cm X 20cmのガラス布(WEA−
18に105F117;株式会社日東紡から購入)16
枚に含浸させた。熱風循環乾燥炉内で、120℃、90
分乾燥させて、樹脂濃度38.4重量%(ガラス布1枚
当り)、残溶媒濃度3゜6%のプリプレグが作成された
。Back application U 165 g of an imide oligomer in which each substituent of general formula (1) is CF3 ^... * Ar5 = 00 was dissolved in 200 g of DMF (resin concentration: 45% by weight/DMF). x 20cm glass cloth (WEA-
105F117 on 18; purchased from Nittobo Co., Ltd.) 16
The sheet was impregnated. In a hot air circulation drying oven, 120℃, 90℃
After drying for several minutes, a prepreg with a resin concentration of 38.4% by weight (per glass cloth) and a residual solvent concentration of 3.6% was produced.
このようにして作成されたプリプレグ8枚を電解銅箔(
厚さ35μm、32C;株式会社三井金属工業より購入
)2枚に挟み込み、220°C12時間、25kg/c
I12の条件で加熱、加圧し一体成形して板厚9揃蒙の
両面銅張積層板を得た。8 sheets of prepreg created in this way were covered with electrolytic copper foil (
Thickness 35μm, 32C; purchased from Mitsui Kinzoku Kogyo Co., Ltd.) sandwiched between two sheets, 220°C for 12 hours, 25kg/c
A double-sided copper-clad laminate with a uniform thickness of 9 mm was obtained by heating and pressurizing and integrally molding under the conditions of I12.
得られた両面銅張積層板について、銅箔の引剥強度、ガ
ラス転移温度、曲げ強度及びプレンンヤクノカーテスト
を伴う半田耐熱性を調べた。その結果を第1表に示す。The resulting double-sided copper-clad laminate was examined for copper foil peel strength, glass transition temperature, bending strength, and solder heat resistance using a plain car test. The results are shown in Table 1.
ス差貫−主 一般式(1)の各置換基が CF。Susashikan - Lord Each substituent in general formula (1) C.F.
Ar、= 寡
であるイミドオリゴマー165gを、DMF 200g
に溶解(樹脂濃度;45重量%/DMF )させた、こ
の溶解液を20cm X 20c+wのガラス布(WE
A−18に105F117;株式会社日東紡から購入)
16枚に含浸させた。熱風循環乾燥炉内で、120°
C195分間乾燥させると、樹脂濃度39,2重量%(
ガラス布1枚当り)、残溶媒濃度3.8%のプリプレグ
が作成された。Ar = 165g of imide oligomer, 200g of DMF
(resin concentration: 45% by weight/DMF), this solution was placed on a 20cm x 20c+w glass cloth (WE
A-18 to 105F117; purchased from Nittobo Co., Ltd.)
16 sheets were impregnated. 120° in a hot air circulation drying oven
When dried for 195 minutes, the resin concentration was 39.2% by weight (
A prepreg with a residual solvent concentration of 3.8% (per glass cloth) was produced.
このようにして作成されたプリプレグ8枚を電解銅箔(
厚さ35μ曙、 3EC;株式会社三井金属工業より購
入)2枚に挟み込み、220°C12時間、25kg/
as”の条件で加熱、加圧し一体成形して板厚losm
の両面銅張積層板を得た。8 sheets of prepreg created in this way were covered with electrolytic copper foil (
Thickness: 35μ, 3EC; purchased from Mitsui Kinzoku Kogyo Co., Ltd.) sandwiched between two sheets, 220°C, 12 hours, 25kg/
Heating, pressurizing and integrally forming the plate under the conditions of
A double-sided copper-clad laminate was obtained.
得られた両面銅張積層板について、銅箔の引剥強度、ガ
ラス転移温度、曲げ強度及びプレッシャクツカーテスト
を伴う半田耐熱性を調べた。その結果を第1表に示す。The obtained double-sided copper-clad laminate was examined for copper foil peel strength, glass transition temperature, bending strength, and solder heat resistance accompanied by a pressure tsuka test. The results are shown in Table 1.
1隻五−土
一般式N)の各置換基が
Ar1
^r工:
恵
◎噂
であるイミドオリゴマー165gを、DMF 2−00
gに溶解(樹脂製変;45重量%/DMF )させた。Each substituent of the general formula N) is Ar1.
(resin modification; 45% by weight/DMF).
この溶解液を20cw X 20cmのガラス布四EA
−18に105F117.株式会社日東紡から購入)1
6枚に含浸させた。熱風循環乾燥炉内で、120°C1
85分間乾燥させると、樹脂濃度37.2重量%(ガラ
ス布1枚当り)、残溶媒濃度4.4%のプリプレグが作
成された。Spread this solution on four EA glass cloths of 20cw x 20cm.
-18 to 105F117. Purchased from Nittobo Co., Ltd.) 1
Six sheets were impregnated. 120°C1 in a hot air circulation drying oven
After drying for 85 minutes, a prepreg with a resin concentration of 37.2% by weight (per glass cloth) and a residual solvent concentration of 4.4% was produced.
このようにして作成されたプリプレグ8枚を電解銅箔(
厚さ35μm、3EC;株式会社三井金属工業より購入
)2枚に挟み込み、220°C12時間、25kg7c
m”の条件で加熱、加圧し一体成形して板厚1b+wの
両面銅張積層板を得た。8 sheets of prepreg created in this way were covered with electrolytic copper foil (
Thickness 35μm, 3EC; purchased from Mitsui Kinzoku Kogyo Co., Ltd.) Sandwiched between two sheets, 220°C for 12 hours, 25kg7c
A double-sided copper-clad laminate having a thickness of 1b+w was obtained by heating and pressurizing and integrally molding the product under conditions of 1b+w.
得られた両面銅張積層板について、銅箔の引剥強度、ガ
ラス転移温度、曲げ強度及びプレッシャクツカーテスト
を伴う半田耐熱性を調べた。その結果を第1表に示す。The obtained double-sided copper-clad laminate was examined for copper foil peel strength, glass transition temperature, bending strength, and solder heat resistance accompanied by a pressure tsuka test. The results are shown in Table 1.
北較■−上
イミドオリゴマー・サーミノドMC−600(株式会社
hネホ−NSCから購入) 165gを、DMF 20
0gニ溶解(#A脂濃度;45重量%/DMF )させ
た。この熔解液を20c+s X 20cmのガラス布
(WEA−18に105F117;株式会社日東紡から
購入)16枚に含浸させた。熱風循環乾燥炉内で、12
0’C185分間乾燥させると、樹脂濃度31.2重量
%(ガラス布1枚当り)、残溶媒濃度9.4%のプリプ
レグが作成された。165g of Hokukan■-Upper Imide Oligomer Therminodo MC-600 (purchased from hneho-NSC Co., Ltd.), DMF 20
0g of fat was dissolved (#A fat concentration: 45% by weight/DMF). Sixteen pieces of 20c+s x 20cm glass cloth (105F117 in WEA-18; purchased from Nittobo Co., Ltd.) were impregnated with this melt. In a hot air circulation drying oven, 12
After drying for 185 minutes at 0'C, a prepreg with a resin concentration of 31.2% by weight (per glass cloth) and a residual solvent concentration of 9.4% was produced.
このようにして作成されたプリプレグ8枚を電解銅箔(
厚さ35μ−,3EC,株式会社三井金属工業より購入
)2枚に挟み込み、220℃、2時間、25kg/c1
の条件で加熱、加圧し一体成形して板厚10m+sの両
面銅張積層板を得た。8 sheets of prepreg created in this way were covered with electrolytic copper foil (
Thickness 35μ-, 3EC, purchased from Mitsui Kinzoku Kogyo Co., Ltd.) Sandwiched between two sheets, 220℃, 2 hours, 25kg/c1
A double-sided copper-clad laminate with a thickness of 10 m+s was obtained by heating and pressurizing and integrally molding under the following conditions.
得られた両面銅張積層板について、銅箔の引剥強度、ガ
ラス転移温度、曲げ強度及びプレッシャクツカーテスト
を伴う半田耐熱性を調べた。その結果を第1表に示す。The obtained double-sided copper-clad laminate was examined for copper foil peel strength, glass transition temperature, bending strength, and solder heat resistance accompanied by a pressure tsuka test. The results are shown in Table 1.
〔発明の効果]
本発明に係る耐熱積層材によれば、プレッシャークツカ
ーテストにより充分吸湿させた後、半田浴によって加熱
しても、耐熱積層材の表面にフクレが確認されず、耐湿
性の高い積層材を得ることができた。しかも、本発明に
係る耐熱積層材は曲げ強度や銅箔の引剥強度などの特性
値も高く、また保存安定性に優れた耐熱性積層板プリプ
レグを提供することができるようになった。[Effects of the Invention] According to the heat-resistant laminated material of the present invention, no blisters are observed on the surface of the heat-resistant laminated material even when the heat-resistant laminated material is heated in a solder bath after sufficiently absorbing moisture through a pressure comb test. We were able to obtain a high quality laminated material. Moreover, the heat-resistant laminate material according to the present invention has high characteristic values such as bending strength and copper foil peeling strength, and it has become possible to provide a heat-resistant laminate prepreg with excellent storage stability.
更に、本発明に係る耐熱積層材の製造方法によれば、樹
脂組成物を基材に含浸させた後、その樹脂組成物を乾燥
させてプリプレグを作成し、次いでプレス成形すること
によって耐熱積層材を製造しているため、容易に且つ安
価に工業的価値の高い耐湿性、耐熱性に優れた両面銅張
積層板などの積層板を生産することができるようになり
、極めて有用である。Furthermore, according to the method for producing a heat-resistant laminate according to the present invention, the heat-resistant laminate is produced by impregnating a base material with a resin composition, drying the resin composition to create a prepreg, and then press-molding the prepreg. This makes it possible to easily and inexpensively produce industrially valuable laminates such as double-sided copper-clad laminates with excellent moisture resistance and heat resistance, making them extremely useful.
Claims (8)
機基、Ar_3は1価の有機基であり、Ar_2、Ar
_1、Ar_3はそれぞれ同種であってもよく、異種で
あってもよい。また、n、mは共重合比であり、いずれ
も1〜30の整数を表す。更に、Xは、CH_3、CH
_3CH_2、CH_3O、Cl、Br、F、CN、N
O_2、CF_3、CF_3CF_2、CF_3O、P
hから選ばれる置換基であり、同一であってもよく、異
なっていてもよい。yは1〜4の整数である。)からな
る反応性を有する樹脂組成物を主成分とすることを特徴
とする耐熱積層材。(1) General formula (I) ▲Mathematical formulas, chemical formulas, tables, etc.▼(I) (In the formula, Ar_2 is a tetravalent organic group, Ar_1 is a divalent organic group, Ar_3 is a monovalent organic group. , Ar_2, Ar
_1 and Ar_3 may be of the same type or different types. Moreover, n and m are copolymerization ratios, and both represent integers of 1 to 30. Furthermore, X is CH_3, CH
_3CH_2, CH_3O, Cl, Br, F, CN, N
O_2, CF_3, CF_3CF_2, CF_3O, P
A substituent selected from h, which may be the same or different. y is an integer from 1 to 4. ) A heat-resistant laminate material characterized in that the main component is a reactive resin composition consisting of:
▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼
又は▲数式、化学式、表等があります▼から選ばれる 4価の芳香族基であることを特徴とする請求項第1項に
記載する耐熱積層材。(2) Ar_2 has ▲mathematical formulas, chemical formulas, tables, etc.▼,
▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲Mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
The heat-resistant laminate material according to claim 1, wherein the heat-resistant laminate is a tetravalent aromatic group selected from ▲ or ▼ having a mathematical formula, chemical formula, table, etc.
表等があります▼、 ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼
又は ▲数式、化学式、表等があります▼から選ばれる2価の
芳香 族基であることを特徴とする請求項第1項又は第2項に
記載する耐熱積層材。(3) Ar_1 is ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲Mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ Mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
The heat-resistant laminate material according to claim 1 or 2, wherein the heat-resistant laminate material is a divalent aromatic group selected from ▲ or ▼ having a mathematical formula, chemical formula, table, etc.
は▲数式、化学式、表等があります▼であることを特徴
とする請求項第1項乃至第3項のいずれかに記載する耐
熱積層材。(4) The heat-resistant laminate according to any one of claims 1 to 3, wherein Ar_3 is ▲There are mathematical formulas, chemical formulas, tables, etc.▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼ Material.
機基、Ar_3は1価の有機基であり、Ar_2、Ar
_1、Ar_3はそれぞれ同種であってもよく、異種で
あってもよい。また、n、mは共重合比であり、いずれ
も1〜30の整数を表す。更に、Xは、CH_3、CH
_3CH_2、CH_3O、Cl、Br、F、CN、N
O_2、CF_3、CF_3CF_2、CF_3O、P
hから選ばれる置換基であり、同一であってもよく、異
なっていてもよい。yは1〜4の整数である。)からな
る反応性を有する樹脂組成物を基材に含浸させた後、乾
燥させてプリプレグを作成し、次いでプレス成形するこ
とを特徴とする耐熱積層材の製造方法。(5) General formula (I) ▲Mathematical formula, chemical formula, table, etc.▼(I) (In the formula, Ar_2 is a tetravalent organic group, Ar_1 is a divalent organic group, and Ar_3 is a monovalent organic group. , Ar_2, Ar
_1 and Ar_3 may be of the same type or different types. Moreover, n and m are copolymerization ratios, and both represent integers of 1 to 30. Furthermore, X is CH_3, CH
_3CH_2, CH_3O, Cl, Br, F, CN, N
O_2, CF_3, CF_3CF_2, CF_3O, P
A substituent selected from h, which may be the same or different. y is an integer from 1 to 4. 1. A method for producing a heat-resistant laminate material, which comprises impregnating a base material with a reactive resin composition consisting of (a) and drying the prepreg to produce a prepreg, which is then press-molded.
▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼
又は▲数式、化学式、表等があります▼から選ばれる 4価の芳香族基であることを特徴とする請求項第5項に
記載する耐熱積層材の製造方法。(6) Ar_2 has ▲mathematical formulas, chemical formulas, tables, etc.▼,
▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲Mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
6. The method for producing a heat-resistant laminate according to claim 5, wherein the group is a tetravalent aromatic group selected from ▲ or ▼ which has a mathematical formula, chemical formula, table, etc.
表等があります▼、 ▲数式、化学式、表等があります▼、▲数式、化学式、
表等があります▼、▲数式、化学式、表等があります▼
又は ▲数式、化学式、表等があります▼から選ばれる2価の
芳香 族基であることを特徴とする請求項第5項又は第6項に
記載する耐熱積層材の製造方法。(7) Ar_1 is ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲There are mathematical formulas, chemical formulas, tables, etc.▼, ▲Mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼, ▲ Mathematical formulas, chemical formulas,
There are tables, etc. ▼, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼
The method for producing a heat-resistant laminate according to claim 5 or 6, wherein the divalent aromatic group is selected from ▲ or ▼ which has a mathematical formula, chemical formula, table, etc.
は▲数式、化学式、表等があります▼である ことを特徴とする請求項第5項乃至第7項のいずれかに
記載する耐熱積層材の製造方法。(8) The heat-resistant laminate according to any one of claims 5 to 7, wherein Ar_3 is ▲There are mathematical formulas, chemical formulas, tables, etc.▼ or ▲There are mathematical formulas, chemical formulas, tables, etc.▼ Method of manufacturing wood.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13432690A JPH0428720A (en) | 1990-05-23 | 1990-05-23 | Heat-resistant laminated material and its production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13432690A JPH0428720A (en) | 1990-05-23 | 1990-05-23 | Heat-resistant laminated material and its production |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0428720A true JPH0428720A (en) | 1992-01-31 |
Family
ID=15125711
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13432690A Pending JPH0428720A (en) | 1990-05-23 | 1990-05-23 | Heat-resistant laminated material and its production |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0428720A (en) |
-
1990
- 1990-05-23 JP JP13432690A patent/JPH0428720A/en active Pending
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