JPH0428719A - Polyamide resin, its production and production of cross-linked polyamide resin - Google Patents
Polyamide resin, its production and production of cross-linked polyamide resinInfo
- Publication number
- JPH0428719A JPH0428719A JP3814590A JP3814590A JPH0428719A JP H0428719 A JPH0428719 A JP H0428719A JP 3814590 A JP3814590 A JP 3814590A JP 3814590 A JP3814590 A JP 3814590A JP H0428719 A JPH0428719 A JP H0428719A
- Authority
- JP
- Japan
- Prior art keywords
- polyamide resin
- formula
- dicarboxylic acid
- production
- bicyclo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920006122 polyamide resin Polymers 0.000 title claims abstract description 59
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims abstract description 15
- 125000003118 aryl group Chemical group 0.000 claims abstract description 12
- 239000002253 acid Substances 0.000 claims abstract description 8
- XDRAKJQFCQVBMP-UHFFFAOYSA-N 2-but-2-enyl-3-methylbutanedioic acid Chemical compound CC=CCC(C(O)=O)C(C)C(O)=O XDRAKJQFCQVBMP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 150000005690 diesters Chemical class 0.000 claims abstract description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 abstract description 18
- 239000003960 organic solvent Substances 0.000 abstract description 11
- 150000004984 aromatic diamines Chemical class 0.000 abstract description 8
- 239000011810 insulating material Substances 0.000 abstract description 4
- 239000002798 polar solvent Substances 0.000 abstract description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 39
- 238000000034 method Methods 0.000 description 15
- 238000010521 absorption reaction Methods 0.000 description 13
- 238000001816 cooling Methods 0.000 description 12
- 238000003756 stirring Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 10
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 10
- -1 4,4'-diaminodiphenyl thioether Chemical class 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 8
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 8
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 7
- 239000002244 precipitate Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 238000000862 absorption spectrum Methods 0.000 description 6
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 6
- 238000006068 polycondensation reaction Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 239000001294 propane Substances 0.000 description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 4
- HVLLSGMXQDNUAL-UHFFFAOYSA-N triphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)OC1=CC=CC=C1 HVLLSGMXQDNUAL-UHFFFAOYSA-N 0.000 description 4
- 239000004760 aramid Substances 0.000 description 3
- 229920003235 aromatic polyamide Polymers 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 150000004985 diamines Chemical class 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 235000010290 biphenyl Nutrition 0.000 description 2
- 239000004305 biphenyl Substances 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- 239000003495 polar organic solvent Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- KZEVSDGEBAJOTK-UHFFFAOYSA-N 1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-2-[5-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]ethanone Chemical compound N1N=NC=2CN(CCC=21)C(CC=1OC(=NN=1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)=O KZEVSDGEBAJOTK-UHFFFAOYSA-N 0.000 description 1
- CVIUJSXIENVAGJ-UHFFFAOYSA-N 1-methyl-2H-pyrrol-2-ide Chemical compound CN1C=CC=[C-]1 CVIUJSXIENVAGJ-UHFFFAOYSA-N 0.000 description 1
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 1
- JMTMSDXUXJISAY-UHFFFAOYSA-N 2H-benzotriazol-4-ol Chemical compound OC1=CC=CC2=C1N=NN2 JMTMSDXUXJISAY-UHFFFAOYSA-N 0.000 description 1
- YLZOPXRUQYQQID-UHFFFAOYSA-N 3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]propan-1-one Chemical compound N1N=NC=2CN(CCC=21)CCC(=O)N1CCN(CC1)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F YLZOPXRUQYQQID-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- WCXGOVYROJJXHA-UHFFFAOYSA-N 3-[4-[4-(3-aminophenoxy)phenyl]sulfonylphenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=CC(=CC=2)S(=O)(=O)C=2C=CC(OC=3C=C(N)C=CC=3)=CC=2)=C1 WCXGOVYROJJXHA-UHFFFAOYSA-N 0.000 description 1
- JFAOTQWSDABETI-UHFFFAOYSA-N 4-(2-chloro-4-propylphenoxy)aniline Chemical compound ClC1=CC(CCC)=CC=C1OC1=CC=C(N)C=C1 JFAOTQWSDABETI-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 238000005698 Diels-Alder reaction Methods 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- YNQLUTRBYVCPMQ-UHFFFAOYSA-N Ethylbenzene Chemical compound CCC1=CC=CC=C1 YNQLUTRBYVCPMQ-UHFFFAOYSA-N 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- 238000006845 Michael addition reaction Methods 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- QKIUAMUSENSFQQ-UHFFFAOYSA-N dimethylazanide Chemical compound C[N-]C QKIUAMUSENSFQQ-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- UYMKPFRHYYNDTL-UHFFFAOYSA-N ethenamine Chemical compound NC=C UYMKPFRHYYNDTL-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- NPZTUJOABDZTLV-UHFFFAOYSA-N hydroxybenzotriazole Substances O=C1C=CC=C2NNN=C12 NPZTUJOABDZTLV-UHFFFAOYSA-N 0.000 description 1
- 239000012770 industrial material Substances 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- DFFZOPXDTCDZDP-UHFFFAOYSA-N naphthalene-1,5-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1C(O)=O DFFZOPXDTCDZDP-UHFFFAOYSA-N 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 125000003518 norbornenyl group Chemical group C12(C=CC(CC1)C2)* 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- CYFLXLSBHQBMFT-UHFFFAOYSA-N sulfamoxole Chemical group O1C(C)=C(C)N=C1NS(=O)(=O)C1=CC=C(N)C=C1 CYFLXLSBHQBMFT-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000005271 tributylamino group Chemical group 0.000 description 1
- UHUUYVZLXJHWDV-UHFFFAOYSA-N trimethyl(methylsilyloxy)silane Chemical compound C[SiH2]O[Si](C)(C)C UHUUYVZLXJHWDV-UHFFFAOYSA-N 0.000 description 1
- 230000002747 voluntary effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Processes Of Treating Macromolecular Substances (AREA)
- Polyamides (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明はポリアミド樹脂及びその製造法並びに架橋ポリ
アミド樹脂の製造法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a polyamide resin, a method for producing the same, and a method for producing a crosslinked polyamide resin.
(従来の技術)
芳香族ジアミンと芳香族ジカルボン酸とから合成される
全芳香族ポリアミドは、耐熱性、を気的。(Prior art) Fully aromatic polyamide synthesized from aromatic diamine and aromatic dicarboxylic acid has heat resistance and gas resistance.
機械的特性にすぐn、!気絶縁材料、高温用材料あるい
はある種の保護衣料用材料など、広く工業材料として使
用されて専た。Immediately on mechanical properties! It is widely used as an industrial material, such as insulating materials, high-temperature materials, and materials for certain types of protective clothing.
(発明が解決しようとする課題)
しかし、従来の芳香族ポリアミドは通常の有機溶剤に対
する溶解性が悪く、繊維、フィルム、塗膜等全形成する
場合、極めて不都合である。また。(Problems to be Solved by the Invention) However, conventional aromatic polyamides have poor solubility in ordinary organic solvents, which is extremely inconvenient when forming fibers, films, coatings, etc. Also.
高融点および高結晶性を有するために射出成形や押出し
成形が事実上不可能である。本発明は、この問題全解決
した各種有機溶剤に可溶で耐熱性にすぐれるポリアミド
樹脂及びその製造法湛びに架橋ポリアミド樹脂の製造法
を提供するものである。Due to its high melting point and high crystallinity, injection molding or extrusion molding is virtually impossible. The present invention provides a polyamide resin that is soluble in various organic solvents and has excellent heat resistance, and a method for producing the same, as well as a method for producing a crosslinked polyamide resin, which completely solves this problem.
(課題?解決するための手段)
本発明は、−殺伐〔1〕
(ただし1式中Arは芳香環を有する2価の基を示す)
で示される繰り返し単位を含むポリアミド樹脂に関する
。(Problem? Means for solving the problem) The present invention is directed to -Sterial [1] (However, in formula 1, Ar represents a divalent group having an aromatic ring)
The present invention relates to a polyamide resin containing a repeating unit represented by:
また9本発明は、トランス−ビアクロ〔2,λ1〕ヘプ
トー5−エンー2.3−ジカルボン酸又はこのシバライ
ド若しくはジエステルと一般式〔■〕HzN Ar
NH2(Il、]
(ただし、Arは芳香環を有する2価の基を示す)で表
わされる芳香族ジアミンとを重縮合反応させることを特
徴とする一般式〔l〕
(ただし9式中Arは芳香環を有する2価の基を示す)
で示される繰り返し単位を有するポリアミド樹脂の製造
法に関する。9 The present invention also provides trans-biaclo[2,λ1]hept-5-ene-2,3-dicarboxylic acid or its cybalide or diester with the general formula [■] HzN Ar
General formula [l] characterized by polycondensation reaction with an aromatic diamine represented by NH2(Il,] (wherein Ar represents a divalent group having an aromatic ring) (however, in formula 9, Ar is (represents a divalent group having an aromatic ring)
The present invention relates to a method for producing a polyamide resin having a repeating unit represented by:
また2本発明は、前記−殺伐CI〕で示される繰り返し
単位を有してなるポリアミド樹脂を150〜300℃で
熱処理することを%徴とする架橋ポリアミド樹脂の製造
法に関する。Further, the present invention relates to a method for producing a crosslinked polyamide resin, which comprises heat-treating a polyamide resin having repeating units represented by the above-mentioned -Katsuri CI] at 150 to 300°C.
このポリアミド樹脂は、該樹脂0.29全ジメチルホル
ムアミドに溶解し、100−にした溶液の30℃におび
る還元粘度が0.2〜5. Octe7’ 9であるこ
とが好ましい。この粘度が低すき゛ると僚機的強度が低
下する傾向があり、崗す呑′ると有機溶剤@解性が劣る
傾向がある。This polyamide resin has a reduced viscosity at 30°C of 0.2-5. Octe7'9 is preferred. If the viscosity is too low, the mechanical strength tends to decrease, and if the viscosity is too low, the organic solvent dissolution properties tend to be poor.
なお、上記還元粘度(ηsp/c)とは。In addition, what is the above-mentioned reduced viscosity (ηsp/c)?
(ただし、η及びηGはそれぞれ溶液の粘度及び溶媒の
粘度を表わし、ウベローデ型希釈型毛管粘度計を用いて
測定したときの溶液及び溶媒の流下時間音それぞれt及
びtoとした場合、η/ηo==1/1゜であり、Cは
溶液の樹脂濃度(g/d!、)でめる)により求められ
る。(However, η and ηG represent the viscosity of the solution and the solvent, respectively, and when the flow time sound of the solution and solvent when measured using an Ubbelohde dilution capillary viscometer is t and to, respectively, η/ηo ==1/1°, and C is determined by the resin concentration (g/d!, ) of the solution.
本発明に係るポリアミド樹脂はN−メチル−2−ビロリ
ドン(NMP)、 ンメチルアセトアミド。The polyamide resin according to the present invention is N-methyl-2-pyrrolidone (NMP) or methylacetamide.
ジメチルホルムアミド(DMF )、ジメチルスルフオ
キシド(DMSO)等の極性溶媒に可溶である。It is soluble in polar solvents such as dimethylformamide (DMF) and dimethyl sulfoxide (DMSO).
重縮合反応には、低温重縮合法、直接軍縮合法。Polycondensation reactions include low temperature polycondensation method and direct military condensation method.
活性エステル決算全採用することができ1%に制限はな
い。All activated esters can be used and there is no limit to 1%.
低温重縮合法は、上記芳香族ジアミノ1当蓋に対して上
記ジカルボン酸のシバライド金好ましくはa 9〜1.
2当量使用し、トリエチルアミ/、トリエチルアミン、
トリブチルアミノ、トリアミルアミノ等の第3アミン、
醸化プロピレノ、スチレノオキシド、シクコヘキセンオ
キ7ド等の1.2−エボキノドなどの酸受容剤の存在下
、N−メチル−2−ピロリドン、ジメチルアでドアミド
等の非反応性極性溶媒中でマイナス十数℃から該有機溶
媒の還流@度までの範囲の温度下に反応させて行なわれ
る。In the low-temperature polycondensation method, the cibaride gold of the dicarboxylic acid is preferably a 9 to 1.
Use 2 equivalents, triethylamine/, triethylamine,
tertiary amines such as tributylamino and triamylamino;
In a non-reactive polar solvent such as N-methyl-2-pyrrolidone, dimethylamide, etc., in the presence of an acid acceptor such as 1,2-evoquinode, such as propylene, styrene oxide, or cyclohexene oxide. The reaction is carried out at a temperature ranging from -10-odd degrees Celsius to reflux of the organic solvent.
直接重縮合法は、上記ジカルボン酸と上記芳香族ジアミ
/を轟量又はほぼ轟量使用し、トリフェニルホスファイ
ト、三塩化リン、縮合リン酸エステル等のリン系触媒及
びビリジ/若くは上記と同様の非反厄性極性有機溶媒中
で室温から還流温度までの範囲内の温度下に反応させて
行なわれる。The direct polycondensation method uses the above-mentioned dicarboxylic acid and the above-mentioned aromatic diamide in large or nearly large amounts, and a phosphorus-based catalyst such as triphenyl phosphite, phosphorus trichloride, condensed phosphoric acid ester, etc. The reaction is carried out in a similar non-toxic polar organic solvent at a temperature ranging from room temperature to reflux temperature.
この場合リン系触媒は上記ジカルボン酸又は上記芳香族
ジアミンと当量又はほぼ当量で使用され。In this case, the phosphorus catalyst is used in an equivalent or approximately equivalent amount to the dicarboxylic acid or the aromatic diamine.
ピリジン又はその誘導体は上記ジカルボン酸又は上記芳
香族ジアミノに対して10モルチ以上使用するのが好ま
しい。It is preferable to use pyridine or a derivative thereof in an amount of 10 mol or more based on the dicarboxylic acid or aromatic diamino.
活性エステル法ぼ、上記ジカルボン酸ジノ1ライドと1
−ヒドロキシベンゾトリアゾールとの反応により、ベン
ゾトリアジルエステルを製造し、このエステルと上記芳
香族ジアミンを当量又はほぼ当量使用し、上記と同様の
非反応性極性有機溶媒中で室温又はそれ以上の温度下に
反応させて行なわれる。In the active ester method, the above dicarboxylic acid dino 1ride and 1
- producing a benzotriazyl ester by reaction with hydroxybenzotriazole, using equivalent or near equivalent amounts of this ester and the aromatic diamine described above, in a non-reactive polar organic solvent similar to that described above, at room temperature or above; This is done by reacting below.
以上のようにして得られた反応液全メタノール等の低級
アルコール、水等の上記有機溶剤と相溶性であって樹脂
に対して貧溶媒である溶剤の大過剰に注いで、沈殿物を
得る。これをろ別し、乾燥することによって本発明に係
るポリアミド樹脂金回収することができる。The entire reaction solution obtained as described above is poured into a large excess of a lower alcohol such as methanol and a solvent such as water that is compatible with the above organic solvent and is a poor solvent for the resin to obtain a precipitate. By filtering and drying this, the polyamide resin gold according to the present invention can be recovered.
トランス−ビシクロ(2411ヘプタン−z3であり、
米国特許4166824号に記載されている方法に単拠
して得ることかで1力。trans-bicyclo(2411heptane-z3,
It can be obtained solely by the method described in US Pat. No. 4,166,824.
上記−殺伐[”[l]で表わされる芳香族ジアミンとし
ては、メタトルソ/ジアミン、5−タロルーm−フェニ
レンジアミン、4.4’−ジアミノジフェニルエーテル
、λ3′−ジメチルー44′−ジアミノジフェニルエー
テル、3.3’−ジメトキシ−4,4′−ジアミノジフ
ェニルエーテル、λ3′−ジアミノジフェニルエーテル
、3.4’−ジアミノジフェニルエーテル、44’−ベ
ノジジン、4.4’−ジアミノジフェニルチオエーテル
、3.3′−ジアミノジフェニルチオエーテル 、L
4/−ジアミノベンゾフェノ/、λ3′−ジアミノジフ
ェニルメタン、4.4’−ジアミノジフェニルメタン、
2,2/−ビス(4−アミノフェニル)プロパン、Z2
’−ビス(3−アミノフェニル)プロパ7.4.4’−
ジアミノジフェニルスルホン、4.4’−ジアミノジフ
ェニルスルホキ/ドウ浅3′−ジアミノジフェニルスル
ホ/、λ3′−ジアミノビフェニル、1.3−ビス(4
−アミノフェノキシ)ベンゼン、1,3−ビス(3−ア
ミノフェノキシ)ベンゼン、1,4−ビス(4−アミノ
フェノキシ)ベンゼ/、 4.4’−C1,3−フェ
ニレンビス(l−メチルエチリデン) 〕、 4.4’
−[1,4−)二二しンビス(1−メチルエチリデン)
〕、〕λ2−ビス4−(4−アミノフェノキ/)フェニ
ル〕プロパン、2.2−ビス〔3−メチル−4−(4−
アミノフェノキン)フェニル〕プロパン、Z2−ビス〔
3−クロロ−4−(4−アミノフェノキシ)フェニル〕
プロパン、■、1−ビスC4−<4−アミノフェノキシ
)フェニルエタン。The above-mentioned aromatic diamines represented by "[l]" include metatorso/diamine, 5-talol-m-phenylenediamine, 4,4'-diaminodiphenyl ether, λ3'-dimethyl-44'-diaminodiphenyl ether, 3.3 '-Dimethoxy-4,4'-diaminodiphenyl ether, λ3'-diaminodiphenyl ether, 3,4'-diaminodiphenyl ether, 44'-benozidine, 4,4'-diaminodiphenyl thioether, 3,3'-diaminodiphenyl thioether, L
4/-diaminobenzopheno/, λ3'-diaminodiphenylmethane, 4.4'-diaminodiphenylmethane,
2,2/-bis(4-aminophenyl)propane, Z2
'-bis(3-aminophenyl)prop7.4.4'-
Diaminodiphenylsulfone, 4,4'-diaminodiphenylsulfo/3'-diaminodiphenylsulfo/, λ3'-diaminobiphenyl, 1,3-bis(4
-aminophenoxy)benzene, 1,3-bis(3-aminophenoxy)benzene, 1,4-bis(4-aminophenoxy)benzene/, 4.4'-C1,3-phenylenebis(l-methylethylidene) ], 4.4'
-[1,4-)22dinebis(1-methylethylidene)
],]λ2-bis4-(4-aminophenoxy/)phenyl]propane, 2.2-bis[3-methyl-4-(4-
aminophenoquine) phenyl] propane, Z2-bis [
3-chloro-4-(4-aminophenoxy)phenyl]
Propane, ■, 1-bisC4-<4-aminophenoxy)phenylethane.
ビス[4−(4−アミノフェノキシ)フェニルコメタン
、λ3′−ジメトキシー4,4′−ジアミンピフェニル
、ビスC4−(4−アミノフェノキシ)フェニル〕スル
ホノ、ビス[4−(3−アミノフェノキシ)フェニル〕
スルホン、Z2−ビスC4−(3−アミノフェノキシ)
フェニル〕プロパン。Bis[4-(4-aminophenoxy)phenylcomethane, λ3'-dimethoxy4,4'-diaminepiphenyl, bisC4-(4-aminophenoxy)phenyl]sulfono, bis[4-(3-aminophenoxy) Phenyl]
Sulfone, Z2-bisC4-(3-aminophenoxy)
phenyl]propane.
4.4′−ビス(4−アミノフェノキ7)ビフェニル。4.4'-bis(4-aminophenox7)biphenyl.
ス2−ビス[:4−(4−アミノフェノキシ)フェニル
〕ヘキサフル万ロフーロパ7,9.9−ビス(4−アミ
ノフェニル)フルオレンなどがある。Examples include 2-bis[:4-(4-aminophenoxy)phenyl]hexafluoropuropa 7,9.9-bis(4-aminophenyl)fluorene.
本発明に係るポリアミド樹脂は、カルボン酸成分として
テレフタル酸、イソフタル酸、4.4’−ンフェニルエ
ーテルジカルボン酸14.4’−ンフェニルカルホン酸
、1.5−ナフタリンジカルボン酸等の芳香族ジカルボ
ン酸等の芳香族ジカルボン酸を含んでいてもよい。これ
らを使用する場合は、全カルボッ酸成分に対して50モ
ルチ以下で使用されることが好ましい。これらが多すぎ
゛ると有機溶剤に対する溶解性が低下する傾向がある。The polyamide resin according to the present invention has an aromatic acid such as terephthalic acid, isophthalic acid, 4,4'-phenyl ether dicarboxylic acid, 14,4'-phenylcarboxylic acid, 1,5-naphthalene dicarboxylic acid, etc. as a carboxylic acid component. It may also contain aromatic dicarboxylic acids such as dicarboxylic acids. When these are used, they are preferably used in an amount of 50 molti or less based on the total carboxylic acid components. If these amounts are too large, the solubility in organic solvents tends to decrease.
−!友。-! friend.
カルボン酸成分としてアジピン酸、セパシン酸等の脂肪
族ジカルボン酸ヲ含んでいてもよい。これらを使用する
場合は、全カルボ/酸成分に対して50モルチ以下で使
用されることが好ましい。脂肪族ジカルボン酸が多すぎ
ると耐熱性が低下しやすい。The carboxylic acid component may include aliphatic dicarboxylic acids such as adipic acid and sepacic acid. When these are used, they are preferably used in an amount of 50 molti or less based on the total carboxylic acid components. Too much aliphatic dicarboxylic acid tends to reduce heat resistance.
また、ジアミン成分として、ヘキプメチレンジアミン、
エチレンンアミン等の脂肪族ジアミ/や1.3−ビス(
3−アミノブロヒ”ルンテトラメテルジシロキサン、l
、3−ビス(4−アミノフェニル)テトラメチルジシロ
キサン等の70キサンジアミンを含んでいてもよい。シ
ロキサンンアミ/ヲ使用する場合は全ジアミンに対して
30モル毛以下で使用されることが好ましい。こ几らが
多すぎると耐熱性が低下する填同がある。上記芳香族ジ
カルボン酸及び脂肪族ジカルボン酸は2重合法に対応し
て、そのまま父はンハライド若くaジエステルとして使
用される。In addition, as a diamine component, hecypmethylenediamine,
Aliphatic diamines such as ethyleneamine/1,3-bis(
3-Aminobrohyalonetetramethedisiloxane, l
, 70xanediamine such as 3-bis(4-aminophenyl)tetramethyldisiloxane. When using a siloxane, it is preferably used in an amount of 30 moles or less based on the total diamine. If there are too many components, the heat resistance will decrease. The above-mentioned aromatic dicarboxylic acids and aliphatic dicarboxylic acids are used as they are in the form of diesters of halides and diesters, corresponding to the two-polymerization method.
本発明に係るポリアミド樹脂は主鎖にビシクロ環を有し
ており、そのかさ高さのために従来の芳香族ポリアミド
樹脂に比較して極めてすぐれた有機溶剤溶解性を示す。The polyamide resin according to the present invention has a bicyclo ring in its main chain, and due to its bulk, exhibits extremely superior solubility in organic solvents compared to conventional aromatic polyamide resins.
不発明に係るポリアミド樹脂は、成膜性に優れキャスト
法により(キャスト後1例えば、100℃で1時間乾燥
)フィルムとすることかでさ、これらのフィルムは、す
ぐれた耐熱性を有し9機械的性質にもすぐれ、電子絶縁
材料、耐熱性接着剤。The polyamide resin according to the invention has excellent film formability and can be made into a film by a casting method (for example, drying at 100°C for 1 hour after casting), and these films have excellent heat resistance and 9 Excellent mechanical properties, electronic insulating material, heat-resistant adhesive.
高温用材料として使用するのに適している。Suitable for use as a high temperature material.
また1本発明に係るポリアミド樹脂を150〜300℃
、好ましくは195 ’C〜275℃の熱処理すること
により、(処理時間は例えば、10分間〜3時間)ビシ
クロ環部分が逆ディールス・アルダ−反応により分解し
、さらにマイケル付加による架橋を起こした溶媒に不溶
な架橋ポリアミド樹脂とすることができる。In addition, the polyamide resin according to the present invention was heated to 150 to 300°C.
A solvent in which the bicyclo ring moiety is decomposed by a reverse Diels-Alder reaction by heat treatment, preferably at 195'C to 275C (treatment time is, for example, 10 minutes to 3 hours), and further crosslinking by Michael addition occurs. It can be a crosslinked polyamide resin that is insoluble in.
(実施例) 以下実施例により本発明を説明する。(Example) The present invention will be explained below with reference to Examples.
実施例1
リービッヒ冷却管、気体導入管及び攪拌装置を付けた2
00mgセパラブル40フラスコにトランス−ビシクロ
[:2.2.1〕ヘプト−5−エン−2,3−ジカルボ
ン酸(慣用名トランスーナデイツク酸)3.559 (
19,5mmolり、 2.2−ビスC4−(4−ア
ミノフェノキシ)フェニル〕プロパ/&OOg(19,
5mm07)、 トリフェニルホスファイト1119
(39,0mm0/l、 ビリジy 6.0 g
(75,9mmoz)及び塩化リテウA0.6 a (
14,1mmolりを入れ、窒素下N−メチルー2−ピ
ロリド/(NMP )40艷を加え、10分間室温で攪
拌した後、昇温し、110℃で4,5時間反応させた。Example 1 2 with Liebig cooling tube, gas introduction tube and stirring device
Trans-bicyclo[:2.2.1]hept-5-ene-2,3-dicarboxylic acid (common name transnadic acid) 3.559 (
19.5 mmol, 2.2-bisC4-(4-aminophenoxy)phenyl]propa/&OOg(19,
5mm07), triphenylphosphite 1119
(39.0mm0/l, Virigiy 6.0g
(75,9 mmoz) and Liteu chloride A0.6 a (
14.1 mmol of N-methyl-2-pyrrolid/(NMP) was added under nitrogen, and after stirring at room temperature for 10 minutes, the temperature was raised and the reaction was carried out at 110°C for 4.5 hours.
室温まで冷却した後、メタノール400献中にあffた
。生じた沈殿をろ別し、メタノールで洗浄し。After cooling to room temperature, it was poured into 400 g of methanol. The resulting precipitate was filtered off and washed with methanol.
100℃で一晩乾燥した。It was dried at 100°C overnight.
このようにして得られたボリアごド樹脂の還元粘度、収
率及び有機溶剤溶解性を表1に示した。Table 1 shows the reduced viscosity, yield, and organic solvent solubility of the thus obtained boriagodo resin.
また得られたポリアミド樹脂のNMP溶液をキャストし
、150℃XIO分間+200℃×10分間+250℃
10分間と加熱処理し乾燥して作成し之フィルムの耐熱
性の指標であるカラス転移温度を表1に示す。また、上
記ポリアミド樹脂の赤外線吸収スペクトル(フィルム法
)全第1図に示した。第1図において、1655cm’
にアミド結合のカルボニルの吸収及び3305cm
にN −H伸縮振動に基づく吸収が認められ、アミド結
合が形成が確認され友。In addition, the NMP solution of the obtained polyamide resin was cast, 150°C for XIO minutes + 200°C for 10 minutes + 250°C.
Table 1 shows the glass transition temperature, which is an index of the heat resistance of the film prepared by heat treatment for 10 minutes and drying. The infrared absorption spectrum (film method) of the polyamide resin is shown in FIG. In Figure 1, 1655 cm'
absorption of carbonyl of amide bond and 3305 cm
Absorption based on N-H stretching vibration was observed, confirming the formation of an amide bond.
上記ポリアミド樹脂の1)(核磁気共鳴スペクトル(溶
媒: D M S O−(is lを第2図に示す。第
2図において131〜3.50. 6.02〜6.34
ppmにノルボルネン環、1.59ppmにメチル基
、6.83〜7.66ppmにベンゼン環10.01〜
10.20ppmにアミド基のプロトンに基づくピーク
が認められた。1) (Nuclear Magnetic Resonance Spectrum (Solvent: DMSO-(isl) of the above polyamide resin is shown in FIG. 2. In FIG. 2, 131-3.50. 6.02-6.34
Norbornene ring in ppm, methyl group in 1.59ppm, benzene ring 10.01 to 6.83-7.66ppm
A peak based on the proton of the amide group was observed at 10.20 ppm.
以上から得られたポリアミド樹脂が所望の構造であにと
が確認された。It was confirmed that the polyamide resin obtained above had the desired structure.
実施例2
リービッヒ冷却管、気体導入管及び攪拌装置を付nた2
00−セパラブル40フラスコに、トランス−ビシクロ
C2111ヘプト−5−二ンーλ3−ジカルボン酸4.
00 g (2ZOmmoIり 。Example 2 2 with Liebig cooling tube, gas introduction tube and stirring device
00-separable 40 flasks, trans-bicycloC2111hept-5-dyne-λ3-dicarboxylic acid 4.
00 g (2ZOmmol).
4.47−ジアミツジフエニルエーテル4.40 g
(zz。4.47-diamitudiphenyl ether 4.40 g
(zz.
mmo()、)リフェニルホスファイト117g(44
2mmoj)、ピリジ77.09 (8&6mmolり
及び塩化リチウム0.7 g (16,5mmoz)1
人れ。mmo(),) Riphenyl phosphite 117g (44
2 mmoj), pyridine 77.09 (8 & 6 mmol) and lithium chloride 0.7 g (16,5 mmol) 1
There are people.
窒素下N−メチルー2−ビ01/ド/40mlを力Uえ
。Add 40 ml of N-methyl-2-bi-01/d under nitrogen.
10分間室温で攪拌した後、昇温し、110℃で3、.
5時間反応させた。室温まで冷却した後メタノール40
0献中にあけた。生じた沈殿をろ別し。After stirring at room temperature for 10 minutes, the temperature was raised to 110°C for 3.
The reaction was allowed to proceed for 5 hours. After cooling to room temperature methanol 40
I opened it during the offering. Filter out the formed precipitate.
メタノールで洗浄し、100℃で一晩乾燥した。It was washed with methanol and dried at 100°C overnight.
このようにして得られたポリアミド樹脂の攬々の特性を
実施例1と同様に表1に示した。また。As in Example 1, various properties of the polyamide resin thus obtained are shown in Table 1. Also.
上記ポリアミド樹脂の赤外線吸収スペクトル(フィルム
法)を第3図に示した。第3図において1659cm’
にアミド結合のカルボニルの吸収及び3304cm’に
NH伸縮振動に基づく吸収が認められ、アミド結合が形
成さnていることが確認された。The infrared absorption spectrum (film method) of the above polyamide resin is shown in FIG. 1659cm' in Figure 3
An absorption of the carbonyl of the amide bond was observed at 3304 cm', and an absorption based on the NH stretching vibration was observed at 3304 cm', confirming that an amide bond was formed.
実施例3
リービッヒ冷却管、気体導入管及び攪拌装置を付けた2
00−セパラブル40フラスコにトランス−ビシクロ(
Z2.11ヘプト−5−二/−Z3−ジカルボン酸&5
6 g(19,6mmoIり、 ビス(4−(4−ア
ミノフェノキシ)フェニル〕スル*y8.46 g (
19,6mmoI)、 )リフェニルホスファイト12
..2 B (39,4mmoz)、ピリジン6.0g
(75,9mmoj)及び塩化リチウム0.69 (1
4,1mmo/)を入れ、2素下N−メチル−2−ピロ
リドン40dを加え、10分間室温で攪拌した後昇温し
、110℃で4.5時間反応させた。室温まで冷却した
後、メタノール40〇−中にあけた。生じた沈殿をろ別
し、メタノールで洗浄し、100℃で一晩乾燥した。Example 3 2 with Liebig cooling tube, gas introduction tube and stirring device
00-separable 40 flasks with trans-bicyclo(
Z2.11 hept-5-2/-Z3-dicarboxylic acid &5
6 g (19,6 mmol, bis(4-(4-aminophenoxy)phenyl)sul*y8.46 g (
19,6mmol), ) Riphenyl phosphite 12
.. .. 2 B (39.4 mmoz), 6.0 g of pyridine
(75,9 mmoj) and lithium chloride 0.69 (1
4.1 mmo/) and 40 d of N-methyl-2-pyrrolidone were added thereto, and after stirring at room temperature for 10 minutes, the temperature was raised and the reaction was carried out at 110° C. for 4.5 hours. After cooling to room temperature, it was poured into 400 ml of methanol. The resulting precipitate was filtered off, washed with methanol, and dried at 100°C overnight.
このようにして得られたポリアミド樹脂の種々の特性を
実施例1と同様に表1に示した。また。As in Example 1, various properties of the polyamide resin thus obtained are shown in Table 1. Also.
上記ポリアミド樹脂の赤外線吸収スペクトル(フィルム
法)を第4図に示した。第4図において1662ao’
にアミド結合のカルボニルの吸収及び3325 am−
’にN−H伸縮振動に基づく吸収が認められ、アミド結
合が形成されていることが確認された。The infrared absorption spectrum (film method) of the above polyamide resin is shown in FIG. 1662ao' in Figure 4
absorption of carbonyl of amide bond and 3325 am-
Absorption based on N--H stretching vibration was observed in ', and it was confirmed that an amide bond was formed.
実施例4
リービッヒ冷却管、気体導入管及び攪拌装置を付ケた2
00−セパラブル40フラスコにトランス−ビシクロ[
2,Zl)ヘプト−5−工/−23−ジカルホya!
3..95 s (21,7m”01 )s 1,4−
ビス(4−アミノフェノキシ)ベンゼン6.359(2
1,7mm0/)、)リフェニルホスファイト13.5
g (43,5mmoI)、 ピリジy 6.9 g
(87,3mmoJ)及び塩化リチウム0.79 (1
6,5mmof)を入れ、窒素下N−メチルー2−ピロ
リドン4〇−を加え、10分間室温で攪拌した後昇温し
。Example 4 Liebig cooling tube, gas introduction tube and stirring device 2
00-separable 40 flasks with trans-bicyclo[
2,Zl) Hepto-5-en/-23-dicarphoya!
3. .. 95s (21,7m"01)s 1,4-
Bis(4-aminophenoxy)benzene 6.359(2
1,7mm0/),)riphenyl phosphite 13.5
g (43,5 mmol), Pyridy 6.9 g
(87,3 mmoJ) and lithium chloride 0.79 (1
6.5 mmof) was added thereto, 40-N-methyl-2-pyrrolidone was added under nitrogen, and after stirring at room temperature for 10 minutes, the temperature was raised.
110℃で4時間反応させた。室温まで冷却した後、メ
タノール400艷中にあけた。生じた沈殿をろ別し、メ
タノールで洗浄し、100℃で一晩乾燥した。The reaction was carried out at 110°C for 4 hours. After cooling to room temperature, it was poured into 400 methanol. The resulting precipitate was filtered off, washed with methanol, and dried at 100°C overnight.
このようにして得られ九ポリアミド樹脂り撞々の特性を
実施例1と同様にして表1に示した。また、上記ポリア
ミド樹脂の赤外線吸収スペクトル(フィルム法)をa5
図に示し友。第5図にi・いて1659an−’にアミ
ド結合のカルボニルの吸収及び3305 all−’K
N−H伸縮振動に基つぐ吸収が認められ、アミド結合が
形成されていることが確認された。The properties of the nine polyamide resin samples thus obtained are shown in Table 1 in the same manner as in Example 1. In addition, the infrared absorption spectrum (film method) of the above polyamide resin was
The figure shows friend. Figure 5 shows the absorption of the carbonyl of the amide bond at 1659an-' and 3305 all-'K
Absorption based on N--H stretching vibration was observed, and it was confirmed that an amide bond was formed.
実施例5
リービッヒ冷却管、気体導入管及び攪拌装置?付けた2
00献セパラブル40フラスコにトランス−ビシクロ1
12.1)ヘプト−5−エン−43−ジカルボン酸3.
95 g (21,7mmo/)、1.3−ビス(4−
アミノフェノキシ)ベンゼン6.35g(21,7mm
oIり、 )リフェニルホスファイト13.5 g’
(43,5mmo/l、ビリジ;y 6.9 g(8
7,3mmo/)及び塩化リチウム0.7 g(16,
5mmo/)を入れ、呈素下N−メチルー2−ピロリド
ン40−を加え、10分間室温で攪拌した後昇温し。Example 5 Liebig cooling tube, gas introduction tube and stirring device? Added 2
Trans-bicyclo 1 in 00 separate separable 40 flasks
12.1) Hept-5-ene-43-dicarboxylic acid3.
95 g (21.7 mmo/), 1.3-bis(4-
aminophenoxy)benzene 6.35g (21.7mm
oI, ) Riphenyl phosphite 13.5 g'
(43,5 mmo/l, viridi; y 6.9 g (8
7,3 mmo/) and lithium chloride 0.7 g (16,
5 mmo/) of N-methyl-2-pyrrolidone was added thereto, and after stirring at room temperature for 10 minutes, the temperature was raised.
110℃で4時間反応させた。室温まで冷却した後、メ
タノール400i中にあけた。生じた沈殿をろ別し、メ
タノールで洗浄し、100℃で一晩乾燥した。The reaction was carried out at 110°C for 4 hours. After cooling to room temperature, it was poured into methanol 400i. The resulting precipitate was filtered off, washed with methanol, and dried at 100°C overnight.
このようにして得られたポリアミド樹脂の種々の特性を
実施例1と同様にして表1に示した。また、上記ポリア
ミド樹脂の赤外線吸収スペクトル(フィルム法)を第6
図に示した。第6図において1659an’にアミド結
合のカルボニルの吸収及び3305cm’にN−H伸縮
振動に基づく吸収。Various properties of the polyamide resin thus obtained are shown in Table 1 in the same manner as in Example 1. In addition, the infrared absorption spectrum (film method) of the above polyamide resin was
Shown in the figure. In FIG. 6, there is an absorption of the carbonyl of the amide bond at 1659an' and an absorption based on the N-H stretching vibration at 3305cm'.
が認められ、アミド結合が形成されていることが確認さ
れた。was observed, confirming that an amide bond was formed.
実施例6
リービツヒ冷却管、気体導入管及び攪拌装置を付nた2
00mgセパラブル40フラスコにトランス−ビシクロ
〔ス2,1〕ヘプトー5−工7−2.3−ジカルポン酸
3.95 (2L7 mmof)、4.4’ −ヒス(
4−アミノフェノキシ)、ビフェニル8.009(21
,7mmoI)、 )リフェニルホスファイト13.5
g (43,5mmo / )、 ピリジン6、9
g (87,3mmol)及び塩化リチウム0.7 g
(16,5mm01りk入れ。Example 6 2 with Liebig cooling tube, gas introduction tube and stirring device
00 mg separable 40 flasks were charged with 3.95 (2L7 mmof), 4.4'-his(
4-aminophenoxy), biphenyl 8.009 (21
, 7mmol), ) Riphenyl Phosphite 13.5
g (43,5 mmo / ), pyridine 6,9
g (87.3 mmol) and 0.7 g of lithium chloride
(Insert 16.5mm01.
窒素下N−メチルー2−ピロリドン40艷を加え。Add 40 g of N-methyl-2-pyrrolidone under nitrogen.
10分間室温で攪拌した後、昇温し、110℃で25時
間反応させた。室温まで冷却した後、メタノール40O
rrkl中にめげ、生じた沈殿をろ別し。After stirring at room temperature for 10 minutes, the temperature was raised and the reaction was carried out at 110° C. for 25 hours. After cooling to room temperature, methanol 40O
The mixture was poured into rrkl and the resulting precipitate was filtered off.
メタノールで洗浄し、100℃で一晩乾燥した。It was washed with methanol and dried at 100°C overnight.
このようにして得られたポリアミド樹脂の攬々の特性を
実施例1と同様にして表1に示した。また、上記ポリア
ミド樹脂の赤外線吸収スペクトル(フィルム法)金第7
図に示した。第7図において1659CI+ にア(
ド結合のカルボニルの吸収及び3305an−1にN
−H伸縮振動知基づく吸収が認められ、アミド結合が形
成されていることが(発明の効果)
不発明に係るポリアミド樹脂は、極めて優れた有機溶剤
溶解性を有する。また、耐熱性、可とう性等の機m特性
、成膜性なども良好である。該ポリアミド樹脂金熱処理
して得られる本発明に係る架橋ポリアミド樹脂は、可と
う性等の機械特性を保持し、耐熱性も良好で、耐有溶剤
性の優れたものである。Various properties of the polyamide resin thus obtained are shown in Table 1 in the same manner as in Example 1. In addition, the infrared absorption spectrum (film method) of the above polyamide resin
Shown in the figure. In Figure 7, 1659CI+ is a (
Absorption of carbonyl of bond and N in 3305an-1
-H stretching vibration-based absorption was observed, and an amide bond was formed (effects of the invention) The polyamide resin according to the invention has extremely excellent solubility in organic solvents. Further, mechanical properties such as heat resistance and flexibility, and film formability are also good. The crosslinked polyamide resin according to the present invention obtained by heat treating the polyamide resin with gold retains mechanical properties such as flexibility, has good heat resistance, and has excellent solvent resistance.
これらのポリアミド樹脂及び架橋ポリアミド樹脂は、電
子絶縁材料耐熱性接着剤、高温用材料等に好ましく適用
できる。These polyamide resins and crosslinked polyamide resins can be preferably applied to electronic insulating materials, heat-resistant adhesives, high-temperature materials, and the like.
第1図、第3図、第4図、第5図、第6図及び第7図は
、それぞれ実施例1,2,3,4.5゜及び6で得られ
たポリアミド樹脂の赤外吸収スペクトル並びに第2図は
実施例1で得られたポリアミド樹脂のIH−核磁気共鳴
スペクトルである。
代理人 弁理士 若 林 邦 彦
密 噌 P4+e
塑 リ &! 被
密 嘴 繕 献
帽 噌 繍 絨
恒 啼 掃 昭
手
続
補
正
書(自発)
事
件
の
表
不
発
補
明の名称
ポリアミド樹脂及びその製造法並びに架橋ポリアミド樹
脂の製造法
正をする者
事件との関係 特許出願人
名 称 +445)日豆化成工業株式会社代
理 人
〒163
居所 東京都新宿区西新宿二丁目Il1号
5、補正の対象
明細書の特許請求の範囲の欄
\ご二
別紙
特許請求の範囲
1、−殺伐(1)
(念だし1式中Arは芳香環を有する2価の基を示す)
で示される繰シ返し単位を含むポリアミド樹脂。
2 ポリアミド樹脂0.2番をジメチルホルムアミドに
溶解し、100−にした溶液の30℃にお叶る還元粘度
が0.2〜5.Od(/Iである請求項1記載のポリア
ミド樹脂。
λ トランス−ビシクロ〔2にλ1〕ヘプ)−5−エン
ーλ3−ジカルボン識又はこのシバライド若くはジエス
テルと一般式[1)
%式%)
(ただし1式中ArFi芳香環を有する2価の基を示す
)で示される芳香族ジアミンとを重縮合反応させること
を特徴とする一般式CI)
(ただし1式中Arti芳香環を有する2価の基を示す
)で示される繰り返し単位を含むポリアミド樹脂の製造
法。
4 請求項1記載のポリアミド樹脂を150〜300℃
で熱処理することを特徴とする架橋ポリアミド樹脂の製
造法。
手
続
補
正
書(方
式)
%式%
2、発明の名称
ポリアミド樹脂及びその製造法並びに架橋ポリアミド樹
脂の製造法
4、代
理
人
居
所
〒163
東京都新宿区西新宿二丁目1番1号
日立化成工業株式会社内
6、補正の対称
明細書の発明の詳細な説明の欄
7、補正の内容
明細書第2頁の第14行「アミド樹脂の製造法。
「3、発明の詳細な説明Jの一行を加入します。
」の次の行にFigures 1, 3, 4, 5, 6 and 7 show the infrared absorption of the polyamide resins obtained in Examples 1, 2, 3, 4.5° and 6, respectively. The spectrum and FIG. 2 are IH-nuclear magnetic resonance spectra of the polyamide resin obtained in Example 1. Agent Patent Attorney Kuni Wakabayashi Hikomitsu P4+e Sori &! Procedural amendment (voluntary) Name of the amendment for non-disclosure of the case Polyamide resin and its manufacturing method, and its relationship to the case of the person correcting the manufacturing method of crosslinked polyamide resin Patent application Name +445) Agent for Nichizu Kasei Kogyo Co., Ltd. 163 Address No. 5, Nishi-Shinjuku 2-chome Il1, Shinjuku-ku, Tokyo, Claims column of the specification to be amended\Second appendix Claims 1, - Killing (1) (Just in case, Ar in formula 1 represents a divalent group having an aromatic ring)
A polyamide resin containing a repeating unit represented by 2 Polyamide resin No. 0.2 is dissolved in dimethylformamide and the reduced viscosity at 30°C of a 100-100% solution is 0.2 to 5. The polyamide resin according to claim 1, which is Od(/I. General formula CI) (In formula 1, ArFi represents a divalent group having an aromatic ring) is subjected to a polycondensation reaction with an aromatic diamine represented by A method for producing a polyamide resin containing a repeating unit represented by (indicating a group). 4. The polyamide resin according to claim 1 at 150 to 300°C.
A method for producing a cross-linked polyamide resin, which is characterized by heat treatment. Procedural amendment (method) % formula % 2. Name of the invention Polyamide resin and its manufacturing method and manufacturing method of crosslinked polyamide resin 4. Agent address: Hitachi Chemical Co., Ltd. 2-1-1 Nishi-Shinjuku, Shinjuku-ku, Tokyo 163 Within the company 6, Detailed explanation of the invention column 7 of the reference specification of the amendment, Line 14 of page 2 of the statement of contents of the amendment: ``Method for producing amide resin.'' 3. Line J of the detailed explanation of the invention. The next line after "I'm joining."
Claims (1)
で示される繰り返し単位を含むポリアミド樹脂。 2、ポリアミド樹脂0.2gをジメチルホルムアミドに
溶解し、100mlにした溶液の30℃における還元粘
度が0.2〜5.0dl/gである請求項1記載のポリ
アミド樹脂。 3、トランス−ビシクロ〔2,2,1〕ヘプト−5−エ
ン−2,3−ジカルボン酸又はこのジハライド若くはジ
エステルと一般式〔II〕 H_2N−Ar−NH_2〔II〕 (ただし、式中Arは芳香環を有する2価の基を示す)
で示される芳香族ジアミンとを重縮合反応させることを
特徴とする一般式〔 I 〕 ▲数式、化学式、表等があります▼〔 I 〕 (ただし、式中Arは芳香環を有する2価の基を示す)
で示される繰り返し単位を含むポリアミド樹脂の製造法
。 4、請求項1記載のポリアミド樹脂を150〜300℃
で熱処理することを特徴とする架橋ポリアミド樹脂の製
造法。[Claims] 1. General formula [I] ▲ Includes mathematical formulas, chemical formulas, tables, etc. ▼ [I] (However, in the formula, Ar represents a divalent group having an aromatic ring)
A polyamide resin containing repeating units represented by 2. The polyamide resin according to claim 1, wherein 0.2 g of the polyamide resin is dissolved in dimethylformamide to make 100 ml, and the reduced viscosity at 30° C. is 0.2 to 5.0 dl/g. 3. Trans-bicyclo[2,2,1]hept-5-ene-2,3-dicarboxylic acid or its dihalide or diester and general formula [II] H_2N-Ar-NH_2[II] (However, in the formula Ar indicates a divalent group having an aromatic ring)
[I] ▲ Numerical formulas, chemical formulas, tables, etc. are available▼ [I] (However, in the formula, Ar is a divalent group having an aromatic ring. )
A method for producing a polyamide resin containing a repeating unit represented by 4. The polyamide resin according to claim 1 at 150 to 300°C.
A method for producing a cross-linked polyamide resin, which is characterized by heat treatment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3814590A JPH0428719A (en) | 1990-02-19 | 1990-02-19 | Polyamide resin, its production and production of cross-linked polyamide resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3814590A JPH0428719A (en) | 1990-02-19 | 1990-02-19 | Polyamide resin, its production and production of cross-linked polyamide resin |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0428719A true JPH0428719A (en) | 1992-01-31 |
Family
ID=12517253
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3814590A Pending JPH0428719A (en) | 1990-02-19 | 1990-02-19 | Polyamide resin, its production and production of cross-linked polyamide resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0428719A (en) |
-
1990
- 1990-02-19 JP JP3814590A patent/JPH0428719A/en active Pending
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