JPH04286741A - Flat planar information recording carrier - Google Patents
Flat planar information recording carrierInfo
- Publication number
- JPH04286741A JPH04286741A JP5223591A JP5223591A JPH04286741A JP H04286741 A JPH04286741 A JP H04286741A JP 5223591 A JP5223591 A JP 5223591A JP 5223591 A JP5223591 A JP 5223591A JP H04286741 A JPH04286741 A JP H04286741A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- zns
- information recording
- dielectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 20
- 229910052681 coesite Inorganic materials 0.000 claims abstract description 18
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract description 18
- 229910052682 stishovite Inorganic materials 0.000 claims abstract description 18
- 229910052905 tridymite Inorganic materials 0.000 claims abstract description 18
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 8
- 239000000758 substrate Substances 0.000 claims abstract description 7
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 7
- 239000011347 resin Substances 0.000 claims abstract description 6
- 229920005989 resin Polymers 0.000 claims abstract description 6
- 239000011521 glass Substances 0.000 claims abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910052723 transition metal Inorganic materials 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 4
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- 239000011253 protective coating Substances 0.000 claims description 4
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 3
- 239000005083 Zinc sulfide Substances 0.000 claims 9
- 229910052984 zinc sulfide Inorganic materials 0.000 claims 9
- 239000011651 chromium Substances 0.000 claims 6
- 239000010936 titanium Substances 0.000 claims 5
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- 229910052692 Dysprosium Inorganic materials 0.000 claims 1
- 229910052688 Gadolinium Inorganic materials 0.000 claims 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 1
- 229910004298 SiO 2 Inorganic materials 0.000 claims 1
- 229910052771 Terbium Inorganic materials 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 claims 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 1
- 229910017052 cobalt Inorganic materials 0.000 claims 1
- 239000010941 cobalt Substances 0.000 claims 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 claims 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 150000002910 rare earth metals Chemical class 0.000 claims 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 claims 1
- 150000003624 transition metals Chemical class 0.000 claims 1
- 239000011701 zinc Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 60
- 230000001681 protective effect Effects 0.000 abstract description 10
- 229910018575 Al—Ti Inorganic materials 0.000 abstract description 8
- 230000000694 effects Effects 0.000 abstract description 8
- 239000011241 protective layer Substances 0.000 abstract description 8
- 230000007613 environmental effect Effects 0.000 abstract description 7
- QQHSIRTYSFLSRM-UHFFFAOYSA-N alumanylidynechromium Chemical compound [Al].[Cr] QQHSIRTYSFLSRM-UHFFFAOYSA-N 0.000 abstract description 3
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 238000003848 UV Light-Curing Methods 0.000 abstract 1
- 230000000593 degrading effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 66
- 230000007423 decrease Effects 0.000 description 7
- 239000012788 optical film Substances 0.000 description 7
- 239000003989 dielectric material Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 229910017109 AlON Inorganic materials 0.000 description 3
- 230000005374 Kerr effect Effects 0.000 description 3
- -1 Si3N4 and AlN Chemical class 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000001552 radio frequency sputter deposition Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910017150 AlTi Inorganic materials 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000005546 reactive sputtering Methods 0.000 description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、大容量、高密度記録が
可能で書換可能な光磁気媒体を用いた光ディスク、光カ
ードなどの平板状情報記録担持体に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat information recording carrier, such as an optical disk or an optical card, using a rewritable magneto-optical medium capable of high-capacity, high-density recording.
【0002】0002
【従来の技術】近年、高密度記録、大容量記録、高速ア
クセスが可能な記録媒体として光磁気記録媒体が注目さ
れている。2. Description of the Related Art In recent years, magneto-optical recording media have attracted attention as recording media capable of high-density recording, large-capacity recording, and high-speed access.
【0003】図7(A),(B)に従来の光磁気ディス
クの構成を示す。図に示すように、従来より、光磁気デ
ィスクの記録媒体である光磁気膜3は希土類−遷移金属
合金薄膜により構成されている。しかし、この種の合金
薄膜は酸化され易いため、図7(A)のように両側を誘
電体で挟み込んで酸化を防止する構成のものが採用され
ている。この光磁気膜の酸化防止用誘電体8,9として
は、酸化物である、SiO,SiO2,Ta2O5など
が、窒化物としてはSi3N4,AlNなどが、さらに
、炭化物としてはTaC,TiCなどが使用されている
。
また、記録再生特性の改善策としては、光磁気膜自体の
カー効果が小さいために、見かけ上のカー回転角を増大
させる目的で、記録膜の再生面側に一層目誘電体膜8を
設けて、この記録膜の再生面側にある誘電体膜を記録媒
体層の保護機能とともにカー効果の増大機能(カーエン
ハンス効果)をももたせている。さらに、記録再生特性
の改善を図る目的で、記録膜を透過した光をも利用する
構造のものが提案されており、記録層の再生側でない側
にAlなどの反射膜10を設けて、透過光の利用を実現
している。FIGS. 7A and 7B show the structure of a conventional magneto-optical disk. As shown in the figure, conventionally, a magneto-optical film 3, which is a recording medium of a magneto-optical disk, is composed of a rare earth-transition metal alloy thin film. However, since this type of alloy thin film is easily oxidized, a structure in which oxidation is prevented by sandwiching dielectric materials on both sides as shown in FIG. 7(A) is employed. As the oxidation-preventing dielectrics 8 and 9 of this magneto-optical film, oxides such as SiO, SiO2, Ta2O5, etc. are used, nitrides such as Si3N4 and AlN, and carbides such as TaC, TiC, etc. are used. has been done. In addition, as a measure to improve the recording and reproducing characteristics, since the Kerr effect of the magneto-optical film itself is small, a first dielectric film 8 is provided on the reproducing surface side of the recording film in order to increase the apparent Kerr rotation angle. The dielectric film on the reproduction surface side of the recording film has a function of protecting the recording medium layer and also has a function of increasing the Kerr effect (Kerr enhancement effect). Furthermore, for the purpose of improving the recording and reproducing characteristics, a structure that also utilizes the light that has passed through the recording layer has been proposed. Realizes the use of light.
【0004】また、記録消去時の熱流による記録・消去
エメルギーの増大を防ぐため、記録膜と反射膜の間に三
層目誘電体9をはさむ構造がとられているものもある。[0004] Furthermore, in order to prevent an increase in recording/erasing energy due to heat flow during recording and erasing, some devices have a structure in which a third dielectric layer 9 is sandwiched between the recording film and the reflective film.
【0005】[0005]
【発明が解決しようとする課題】しかしながら上記のよ
うな従来の構成では、光記録媒体層3の耐環境特性が悪
いという課題があった。例えば、一層目の誘電体8とし
てSiOやSiO2を用いた場合は、誘電体の局所から
水分が浸入することによって光磁気膜が酸化され、ピン
ホールが発生するという課題があった。またTa2O5
,Si3N4,AlNでは、これらの誘電体膜そのもの
の内部応力が大きいために膜にクラックが生じ、そこか
ら水分が侵入して、光磁気膜が酸化劣化するという課題
があった。また、SiOやSiO2は膜の屈折率が小さ
いために適当な膜厚を選んでも充分なカー効果の増大が
図れないという課題があった。However, in the conventional structure as described above, there was a problem that the environmental resistance of the optical recording medium layer 3 was poor. For example, when SiO or SiO2 is used as the first dielectric layer 8, there is a problem in that the magneto-optical film is oxidized due to moisture penetrating locally into the dielectric, resulting in pinholes. Also, Ta2O5
, Si3N4, and AlN have a problem in that the internal stress of these dielectric films themselves is large, which causes cracks in the films, through which moisture enters, causing oxidative deterioration of the magneto-optical film. Furthermore, since SiO and SiO2 have a low refractive index, there is a problem in that even if an appropriate film thickness is selected, the Kerr effect cannot be sufficiently increased.
【0006】また、反射膜10としてAlは、適当な膜
厚をつけると、大きな反射率がえられるために反射膜と
しては非常に有効ではあるが、Al自体は非常に腐食さ
れ易い金属であり、高い信頼性を要求される記録媒体の
反射膜としては適していないという課題があった。[0006] Furthermore, Al is very effective as a reflective film because a large reflectance can be obtained when a suitable film thickness is applied to the reflective film 10, but Al itself is a metal that corrodes very easily. However, there was a problem in that it was not suitable as a reflective film for recording media that required high reliability.
【0007】光磁気記録膜3に直接反射膜10が付いて
いる図1(B)の構成では、熱が反射膜内で拡散しやす
くなり、大きな記録パワーが必要となる。このような比
較的大きな記録パワーで記録すると記録ピットが記録レ
ーザ・ビームの形と異なる形に変形してC/Nが低下し
、そのために記録パワーマージンが狭くなるという課題
があった。In the configuration shown in FIG. 1B in which the reflection film 10 is directly attached to the magneto-optical recording film 3, heat is easily diffused within the reflection film, and a large recording power is required. When recording with such a relatively high recording power, the recording pits are deformed into a shape different from that of the recording laser beam, resulting in a decrease in C/N, which poses a problem in that the recording power margin becomes narrow.
【0008】また、記録消去時の熱流によるパワー損失
を防ぐため、記録膜と反射膜の間に熱絶縁を目的とした
誘電体をはさむ構造のディスクでは、その誘電体の膜厚
が約100nmと厚いために長い成膜時間を要する。ま
た、一層目の誘電体8と、光磁気膜3の膜厚の組合せに
より光の干渉構造に大きな影響を与えるために高精度な
膜厚コントロールが要求され、量産時の歩留まりが悪く
なるという課題があった。[0008] Furthermore, in order to prevent power loss due to heat flow during recording and erasing, in a disc structure in which a dielectric material for thermal insulation is sandwiched between a recording film and a reflective film, the film thickness of the dielectric material is approximately 100 nm. It takes a long time to form a film because it is thick. In addition, the combination of the film thicknesses of the first layer dielectric 8 and the magneto-optical film 3 has a large effect on the optical interference structure, so highly accurate film thickness control is required, resulting in a problem of poor yield during mass production. was there.
【0009】本発明はこのような課題を解決するもので
、耐環境性に優れ、記録感度が高く、信号の記録再生特
性の優れた情報記録担持体を提供することを目的とする
ものである。[0009] The present invention solves these problems, and aims to provide an information recording carrier that has excellent environmental resistance, high recording sensitivity, and excellent signal recording and reproducing characteristics. .
【0010】0010
【課題を解決するための手段】この課題を解決するため
に本発明は、ガラスまたはプラスチックからなる透明な
基板上にZnS誘電体層、希土類遷移金属系の光磁気記
録層、非常に薄いZnSまたはZnS−SiO2からな
る誘電体層、Al−Ti,Al−CrまたはAl−Ti
−Crからなる反射膜層、AlTiONまたはZnS−
SiO2からなる誘電体層を順次積層して、最後に、紫
外線硬化樹脂の保護コート層を設けるようにしたもので
ある。[Means for Solving the Problem] In order to solve this problem, the present invention provides a ZnS dielectric layer, a rare earth transition metal based magneto-optical recording layer, a very thin ZnS or Dielectric layer consisting of ZnS-SiO2, Al-Ti, Al-Cr or Al-Ti
-Reflective film layer made of Cr, AlTiON or ZnS-
Dielectric layers made of SiO2 are sequentially laminated, and finally a protective coating layer of ultraviolet curable resin is provided.
【0011】[0011]
【作用】この構成により、耐環境特性が良好であり、優
れた記録再生特性を有する光磁気ディスク媒体を得るも
のである。すなわち、図1に示す一層目のZnS2層は
屈折率が大きいので、適切な膜厚を選ぶことによりカー
回転角を増大させる大きなカーエンハンス効果が得られ
る。[Operation] With this configuration, a magneto-optical disk medium having good environmental resistance and excellent recording and reproducing characteristics is obtained. That is, since the first ZnS2 layer shown in FIG. 1 has a large refractive index, by selecting an appropriate film thickness, a large Kerr enhancement effect that increases the Kerr rotation angle can be obtained.
【0012】また、三層目の誘電体層4に膜厚3nm〜
30nmの薄いZnSまたはZnS−SiO2層を形成
することにより、記録再生消去時に媒体に照射されるレ
ーザー光の熱の流れを面内方向から膜厚方向に一部逃が
すことができる。これによりディスクに照射する記録エ
ネルギーの巾を広くすることができ、記録再生消去特性
を改善することができる。また誘電体層4は3nm〜3
0nmと非常に薄いことから、成膜時間も短く、また光
の干渉構造に与える影響も非常に小さいため、膜厚ばら
つきによるディスク量産時の歩留まりに与える影響も極
めて小さい。[0012] Furthermore, the third dielectric layer 4 has a film thickness of 3 nm or more.
By forming a 30 nm thin ZnS or ZnS-SiO2 layer, the flow of heat from the laser beam irradiated onto the medium during recording, reproduction, and erasing can be partially released from the in-plane direction to the film thickness direction. This makes it possible to widen the range of recording energy irradiated onto the disk, and improve recording/reproducing/erasing characteristics. In addition, the dielectric layer 4 has a thickness of 3 nm to 3 nm.
Since it is extremely thin at 0 nm, the film formation time is short, and the effect on the optical interference structure is very small, so the effect of film thickness variations on the yield during mass production of disks is also very small.
【0013】四層目の金属反射膜5として、安価でかつ
高い反射率の得られるAlに、耐食性を向上させるため
にTiまたはCrを添加することにより、反射膜自体の
耐食性を向上させることができる。As the fourth layer of metal reflective film 5, it is possible to improve the corrosion resistance of the reflective film itself by adding Ti or Cr to Al, which is inexpensive and has a high reflectance, in order to improve corrosion resistance. can.
【0014】さらに五層目に誘電体保護層6を設け、誘
電体としてAlONまたはZnS−SiO2膜を形成す
ることにより、酸化されやすい金属層が露出しない構造
になり、ディスクの信頼性を確立できる。AlNのスパ
ッタ膜は内部応力が比較的大きな膜であるが、酸素を加
えて反応させることにより内部応力が緩和され、良好な
保護効果が実現できる。また、ZnSは金属層の上に形
成される場合は密着性に欠け、充分な保護効果が得られ
ないが、ZnSにSiO2を混在させることにより、密
着性が向上し、良好な保護効果が得られるようになる。Furthermore, by providing a dielectric protective layer 6 as the fifth layer and forming an AlON or ZnS-SiO2 film as the dielectric, a structure is created in which the metal layer that is easily oxidized is not exposed, and reliability of the disk can be established. . Although the sputtered AlN film has a relatively large internal stress, by adding oxygen and causing a reaction, the internal stress is relaxed and a good protective effect can be achieved. Furthermore, when ZnS is formed on a metal layer, it lacks adhesion and a sufficient protective effect cannot be obtained, but by mixing SiO2 with ZnS, the adhesion improves and a good protective effect can be obtained. You will be able to do it.
【0015】[0015]
【実施例】図1に本発明の一実施例である光磁気ディス
クの構成を示す。ポリカーボネートからなる基板1上に
、ZnS誘電体層をRFスパッタ法により約80nmの
厚さに形成し、つぎに、光磁気記録膜層3をGdTbF
eCo合金ターゲットを用いてDCスパッタ法により約
30nmの厚さに形成し、つぎに、ZnS誘電体層4を
RFスパッタ法により約10nmの厚さに形成し、つぎ
に、Al−Ti反射膜層5をDCスパッタ法により約5
0nmの厚さに形成し、最後にAlTiON保護層6を
AlTi合金ターゲットを用いて、窒素と酸素を導入し
ながら反応性スパッタ法により約100nmの厚さに形
成した。この上にエポキシ系の紫外線硬化樹脂で保護コ
ート層7を施した。DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 shows the structure of a magneto-optical disk which is an embodiment of the present invention. On a substrate 1 made of polycarbonate, a ZnS dielectric layer is formed to a thickness of about 80 nm by RF sputtering, and then a magneto-optical recording film layer 3 is made of GdTbF.
A ZnS dielectric layer 4 is formed to a thickness of about 30 nm by DC sputtering using an eCo alloy target, then a ZnS dielectric layer 4 is formed to a thickness of about 10 nm by RF sputtering, and then an Al-Ti reflective film layer is formed. 5 by DC sputtering method.
Finally, an AlTiON protective layer 6 was formed to a thickness of about 100 nm by reactive sputtering using an AlTi alloy target while introducing nitrogen and oxygen. A protective coating layer 7 was applied thereon using an epoxy-based ultraviolet curing resin.
【0016】なお、光磁気記録層、Al−Ti反射層、
AlTiON誘電体層の成膜にはDCスパッタ法ではな
く、RFスパッタ法を用いてもかまわない。また、反射
膜としてAl−Crを用いた場合、五層目の誘電体保護
膜は同一のターゲットを用いて酸素と窒素を導入する反
応性スパッタ法によりAlCrON層を形成してもよい
。[0016] Note that the magneto-optical recording layer, the Al-Ti reflective layer,
Instead of DC sputtering, RF sputtering may be used to form the AlTiON dielectric layer. Further, when Al-Cr is used as the reflective film, the fifth dielectric protective film may be an AlCrON layer formed by a reactive sputtering method that introduces oxygen and nitrogen using the same target.
【0017】図2に本実施例の光磁気ディスクの記録再
生特性Aを、記録膜3と反射膜5の間に非常に薄い誘電
体層4が無いディスクの記録再生特性Bとを比較して示
す。図に示すように、記録パワーを増していった場合、
7mW以上の領域でのC/Nの低下に顕著な差が現れる
。すなわち、記録層3と反射層5の間に薄い誘電体層4
がある場合は高パワーで記録した場合でもC/Nの低下
が少なく広い記録パワーマージンが得られることが解る
。FIG. 2 compares the recording/reproducing characteristics A of the magneto-optical disk of this embodiment with the recording/reproducing characteristics B of a disk without the very thin dielectric layer 4 between the recording film 3 and the reflective film 5. show. As shown in the figure, when increasing the recording power,
A remarkable difference appears in the decrease in C/N in the region of 7 mW or more. That is, a thin dielectric layer 4 is placed between the recording layer 3 and the reflective layer 5.
It can be seen that when there is a high power, the C/N decreases little and a wide recording power margin can be obtained even when recording is performed at high power.
【0018】図3に、一層目のZnS層2の膜厚とディ
スクの反射率の関係を示す。反射率は光磁気記録膜厚と
三層目のZnS4の膜厚にも依存するが、光磁気膜厚は
30nm、三層目ZnS膜厚は10nmとした場合、一
層目のZnS層2は厚さ30nm〜100nmの範囲内
で、ディスクとして適切な反射率が得られることがわか
る。FIG. 3 shows the relationship between the thickness of the first ZnS layer 2 and the reflectance of the disk. The reflectance also depends on the magneto-optical recording film thickness and the thickness of the third ZnS4 layer, but when the magneto-optical film thickness is 30 nm and the third ZnS film thickness is 10 nm, the thickness of the first ZnS layer 2 is It can be seen that an appropriate reflectance for the disk can be obtained within the range of 30 nm to 100 nm.
【0019】図4に三層目のZnS層4またはZnS−
SiO2の膜厚とディスクの反射率の関係を示す。一層
目ZnS膜厚を80nm、光磁気記録膜厚を30nmの
ディスクでは膜厚が厚くなると、ZnS−SiO2の方
が緩やかではあるが、ディスクの反射率が低くなること
より、3nm〜30nmが適当である。FIG. 4 shows the third ZnS layer 4 or ZnS-
The relationship between the SiO2 film thickness and the reflectance of the disk is shown. For a disk with a first layer ZnS film thickness of 80 nm and a magneto-optical recording film thickness of 30 nm, ZnS-SiO2 is more gradual when the film thickness becomes thicker, but since the reflectance of the disk becomes lower, a thickness of 3 nm to 30 nm is appropriate. It is.
【0020】一層目と三層目の誘電体層の膜厚の組合せ
を選ぶことにより、ディスクの反射率を広い範囲でコン
トロールすることが可能である。しかし、生産性、膜厚
制御、歩留まりなどを考えると、記録膜3と反射膜5の
間の誘電体層4を30nmより薄くすることにより、良
好な記録再生特性が得られる。By selecting the combination of the film thicknesses of the first and third dielectric layers, it is possible to control the reflectance of the disk over a wide range. However, considering productivity, film thickness control, yield, etc., good recording and reproducing characteristics can be obtained by making the dielectric layer 4 between the recording film 3 and the reflective film 5 thinner than 30 nm.
【0021】図5に反射膜5膜中のAlに対するTi含
有量と反射膜5の反射率の関係を示す。図5では反射率
は規格値に対する割合で示してあり、反射膜5の厚さは
50nmである。TiまたはCrの含有量が増加すると
、反射率が低下する。反射膜層5での反射率の低下は、
カーエンハンスメント効果の低下につながり、またC/
Nが小さくなって記録信号の再生を困難にするため好ま
しくない。これらの記録再生特性と、反射膜自体の耐環
境特性の両者を満たすためには、Alに対するTiまた
はCrの含有量が1at.%以上20at%以下が適当
である。FIG. 5 shows the relationship between the Ti content relative to Al in the reflective film 5 and the reflectance of the reflective film 5. In FIG. 5, the reflectance is shown as a percentage of the standard value, and the thickness of the reflective film 5 is 50 nm. When the content of Ti or Cr increases, the reflectance decreases. The decrease in reflectance in the reflective film layer 5 is as follows:
This leads to a decrease in the car enhancement effect, and also
This is not preferable because N becomes small and it becomes difficult to reproduce the recorded signal. In order to satisfy both these recording/reproducing characteristics and the environmental resistance characteristics of the reflective film itself, the content of Ti or Cr relative to Al must be 1 at. % or more and 20at% or less is appropriate.
【0022】五層目の保護層6は金属反射膜層5が酸化
劣化するのを保護するために設けるものであり、充分な
保護効果を得るためには膜厚が50nm以上必要である
。しかし、記録再生特性は保護層6が厚いと、記録感度
が低下するので、保護層6の厚さは180nm以下がよ
い。また保護層6の屈折率は本実施例のようにAlTi
ONを用いる場合、2.5より高くなると、保護膜6の
性質が金属的になり腐食されやすくなる。The fifth protective layer 6 is provided to protect the metal reflective film layer 5 from deterioration due to oxidation, and in order to obtain a sufficient protective effect, the film needs to have a thickness of 50 nm or more. However, when the protective layer 6 is thick, the recording sensitivity decreases in recording/reproducing characteristics, so the thickness of the protective layer 6 is preferably 180 nm or less. Further, the refractive index of the protective layer 6 is AlTi as in this embodiment.
When ON is used, if the value is higher than 2.5, the protective film 6 becomes metallic in nature and becomes susceptible to corrosion.
【0023】図6に高温高湿での耐環境テストの結果を
示す。図からわかるように上記の構造のディスクは高い
信頼性を有することがわかる。FIG. 6 shows the results of an environmental resistance test at high temperature and high humidity. As can be seen from the figure, the disk with the above structure has high reliability.
【0024】なお、五層目の保護層6を形成するには、
ZnSとSiO2の二つのターゲットを用いて、二元同
時スパッタ法でZnS−SiO2薄膜を形成してもよい
。ZnSは一層目のターゲットと同一の物を使用するこ
とが可能である。また、ZnSとSiO2の混合ターゲ
ットを用いてもよい。Note that in order to form the fifth protective layer 6,
A ZnS-SiO2 thin film may be formed by a binary simultaneous sputtering method using two targets of ZnS and SiO2. It is possible to use the same ZnS as the target for the first layer. Alternatively, a mixed target of ZnS and SiO2 may be used.
【0025】また、本実施例では光磁気ディスクを例に
説明したが、光磁気カードや光磁気テープなどの記録媒
体への応用も可能である。Furthermore, although this embodiment has been explained using a magneto-optical disk as an example, it is also possible to apply the present invention to recording media such as a magneto-optical card or a magneto-optical tape.
【0026】[0026]
【発明の効果】以上の実施例の説明からも明らかなよう
に本発明によれば、基板上に誘電体ZnS、希土類遷移
金属系の光磁気記録媒体、非常に薄い誘電体ZnSまた
はZnS−SiO2、反射膜Al−TiまたはAl−C
r、誘電体保護膜AlON,ZnS−SiO2またはT
i,Crを含有するAlON膜を形成し、さらに紫外線
硬化型の樹脂で保護コートを施すことにより、記録再生
消去特性、耐環境特性に優れた光磁気ディスクを得るこ
とができ、その効果は大なるものがある。As is clear from the above description of the embodiments, according to the present invention, a dielectric material ZnS, a rare earth transition metal based magneto-optical recording medium, and a very thin dielectric material ZnS or ZnS-SiO2 are formed on a substrate. , reflective film Al-Ti or Al-C
r, dielectric protective film AlON, ZnS-SiO2 or T
By forming an AlON film containing i,Cr and further applying a protective coating with an ultraviolet curable resin, a magneto-optical disk with excellent recording/reproducing/erasing characteristics and environmental resistance characteristics can be obtained, and the effect is significant. There is something.
【図1】本発明の一実施例の光磁気ディスクの構成を示
す断面図FIG. 1 is a sectional view showing the configuration of a magneto-optical disk according to an embodiment of the present invention.
【図2】三層目(記録膜と反射膜の間)のZnS誘電体
層と記録パワーの関係を示すグラフ[Figure 2] Graph showing the relationship between the third layer (between the recording film and the reflective film) ZnS dielectric layer and recording power
【図3】一層目のZnS誘電体層の膜厚とディスクの反
射率の関係を示すグラフ[Figure 3] Graph showing the relationship between the film thickness of the first ZnS dielectric layer and the reflectance of the disk
【図4】三層目のZnS誘電体層の膜厚とディスク反射
率の関係を示すグラフ[Figure 4] Graph showing the relationship between the thickness of the third ZnS dielectric layer and the disk reflectance
【図5】Al−Ti反射膜のTi含有量と反射率の関係
を示すグラフ[Figure 5] Graph showing the relationship between Ti content and reflectance of Al-Ti reflective film
【図6】高温高湿耐環境試験の経過時間とディスクのB
ER(bit error rate)の関係を示
すグラフ[Figure 6] Elapsed time of high temperature, high humidity environment resistance test and disc B
Graph showing the relationship between ER (bit error rate)
【図7】(A)は従来の光磁気ディスクの構成を示す断
面図
(B)は同反射膜を直接光磁気記録膜層上に設けた光磁
気ディスクの構成を示す断面図FIG. 7 (A) is a cross-sectional view showing the structure of a conventional magneto-optical disk; (B) is a cross-sectional view showing the structure of a magneto-optical disk in which the same reflective film is provided directly on the magneto-optical recording layer;
1 基板 2 ZnS誘電体層 3 光磁気記録膜層 5 Al−Ti反射膜層 6 AlTiON保護膜層 7 保護コート層 1 Substrate 2 ZnS dielectric layer 3 Magneto-optical recording layer 5 Al-Ti reflective film layer 6 AlTiON protective film layer 7 Protective coat layer
Claims (9)
、誘電体膜からなる第1層と、光磁気媒体膜からなる第
2層と、誘電体膜からなる第3層と、金属膜からなる第
4層と、誘電体膜からなる第5層とを順次積層して形成
した平板状情報記録担持体。Claim 1: A first layer consisting of a dielectric film, a second layer consisting of a magneto-optical medium film, a third layer consisting of a dielectric film, and a metal film, on a transparent resin substrate or glass substrate. A flat information recording carrier formed by sequentially laminating a fourth layer and a fifth layer made of a dielectric film.
であり、屈折率が1.9以上、2.5以下であり、膜厚
が30nm以上、100nm以下である請求項1記載の
平板状情報記録担持体。Claim 2: The first layer dielectric is zinc sulfide (ZnS).
The flat information recording carrier according to claim 1, which has a refractive index of 1.9 or more and 2.5 or less, and a film thickness of 30 nm or more and 100 nm or less.
属合金であり、希土類金属としてはテルビウム(Tb)
,ガドリニウム(Gd)またはジスプロシウム(Dy)
のうち、少なくとも一種を含有し、遷移金属は鉄(Fe
),コバルト(Co)またはニッケル(Ni)のうち、
少なくとも一種を含有し、膜厚が10nm以上、50n
m以下である請求項1記載の平板状情報記録担持体。3. The magneto-optical medium of the second layer is a rare earth-transition metal alloy, and the rare earth metal is terbium (Tb).
, gadolinium (Gd) or dysprosium (Dy)
Contains at least one of these, and the transition metal is iron (Fe
), cobalt (Co) or nickel (Ni),
Contains at least one type, has a film thickness of 10 nm or more, 50 nm
2. The flat information recording carrier according to claim 1, which has a diameter of less than m.
)または硫化亜鉛(ZnS)と二酸化ケイ素(SiO2
)を含有しており、屈折率が1.8以上、2.5以下で
あり、膜厚が3nm以上、30nm以下である請求項1
記載の平板状情報記録担持体。4. The third dielectric layer is made of zinc sulfide (ZnS).
) or zinc sulfide (ZnS) and silicon dioxide (SiO2
), the refractive index is 1.8 or more and 2.5 or less, and the film thickness is 3 nm or more and 30 nm or less.
The flat information recording carrier described above.
)を主成分とし、チタン(Ti)またはクロム(Cr)
の少なくとも一種を含有し、Alに対するTi,Crま
たはTi−Crの含有量が1at.%以上、20at.
%以下、膜厚が10nm以上、180nm以下である請
求項1記載の平板状情報記録担持体。5. The fourth metal layer is made of aluminum (Al
), titanium (Ti) or chromium (Cr)
The content of Ti, Cr or Ti-Cr relative to Al is 1 at. % or more, 20at.
% or less, and the film thickness is 10 nm or more and 180 nm or less.
窒化アルミニウムを主成分とし、屈折率の上限が2.4
であり、膜厚が50nm以上180nm以下である請求
項1記載の平板状情報記録担持体。6. The fifth dielectric layer is mainly composed of aluminum nitride containing oxygen, and has an upper limit of refractive index of 2.4.
The flat information recording carrier according to claim 1, which has a film thickness of 50 nm or more and 180 nm or less.
S)または硫化亜鉛(ZnS)と二酸化ケイ素(SiO
2)を含有しており、屈折率の上限が2.4であり、膜
厚が50nm以上180nm以下である請求項1記載の
平板状情報記録担持体。7. The fifth dielectric layer is made of zinc sulfide (Zn
S) or zinc sulfide (ZnS) and silicon dioxide (SiO
2), the flat information recording carrier according to claim 1, wherein the upper limit of the refractive index is 2.4, and the film thickness is 50 nm or more and 180 nm or less.
(Ti)またはクロム(Cr)のうち少なくとも一種を
含有する請求項1または6のいずれかに記載の平板状情
報記録担持体。8. The flat information recording carrier according to claim 1, wherein the fifth dielectric layer contains at least one of titanium (Ti) and chromium (Cr).
形成した後、紫外線硬化型の樹脂で保護コート膜を形成
した請求項1記載の平板状情報記録単体。9. The flat information recording unit according to claim 1, wherein after the first layer to the fifth layer are sequentially formed on the substrate, a protective coating film is formed using an ultraviolet curable resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5223591A JPH04286741A (en) | 1991-03-18 | 1991-03-18 | Flat planar information recording carrier |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5223591A JPH04286741A (en) | 1991-03-18 | 1991-03-18 | Flat planar information recording carrier |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04286741A true JPH04286741A (en) | 1992-10-12 |
Family
ID=12909066
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5223591A Pending JPH04286741A (en) | 1991-03-18 | 1991-03-18 | Flat planar information recording carrier |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04286741A (en) |
-
1991
- 1991-03-18 JP JP5223591A patent/JPH04286741A/en active Pending
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