JPH04286145A - Semiconductor integrated circuit device - Google Patents

Semiconductor integrated circuit device

Info

Publication number
JPH04286145A
JPH04286145A JP3049808A JP4980891A JPH04286145A JP H04286145 A JPH04286145 A JP H04286145A JP 3049808 A JP3049808 A JP 3049808A JP 4980891 A JP4980891 A JP 4980891A JP H04286145 A JPH04286145 A JP H04286145A
Authority
JP
Japan
Prior art keywords
cap
solder
chip
metallized layer
integrated circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3049808A
Other languages
Japanese (ja)
Inventor
Toshihiko Sato
俊彦 佐藤
Tetsuya Hayashida
哲哉 林田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP3049808A priority Critical patent/JPH04286145A/en
Priority to US07/850,738 priority patent/US5219794A/en
Publication of JPH04286145A publication Critical patent/JPH04286145A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73253Bump and layer connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/161Cap
    • H01L2924/162Disposition
    • H01L2924/16251Connecting to an item not being a semiconductor or solid-state body, e.g. cap-to-substrate

Landscapes

  • Wire Bonding (AREA)
  • Die Bonding (AREA)

Abstract

PURPOSE:To improve fluidity of solder, to improve manufacturing yield of a chip carrier and to shorten a manufacturing time by partly continuing a metallized layer provided on a lower surface of a leg of a cap to a metallized layer provided at a position opposed to a back surface of a chip on a lower surface of the cap. CONSTITUTION:A chip carrier 1 is hermetically sealed at a semiconductor chip 5 with a cap 6 through a solder bump 4 on an electrode 3 of a main surface of a package board 2, and a leg of the cap 6 is soldered to a peripheral edge of the main surface of the board 2 by sealing solder 7. A first metallized layer 8a provided on the lower surface of the leg of the cap 6 is connected to a second metallized layer 8b provided at a position opposed to the back surface of the chip 5 on the lower surface of the cap 6 through a third metallized layer 8c. Thus, part of melted heat transfer solder 9 rapidly flows to a gap between the board 2 and the leg of the cap 6.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、半導体集積回路装置に
関し、特にチップキャリヤ(Chip Carrier
)形半導体集積回路装置に適用して有効な技術に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to semiconductor integrated circuit devices, and particularly to chip carriers.
) type semiconductor integrated circuit device.

【0002】0002

【従来の技術】特開昭62−249429号公報、特開
昭63−310139号公報には、パッケージ基板に実
装した半導体チップをキャップで気密封止したチップキ
ャリヤが記載されている。
2. Description of the Related Art Japanese Patent Laid-Open Nos. 62-249429 and 63-310139 disclose a chip carrier in which a semiconductor chip mounted on a package substrate is hermetically sealed with a cap.

【0003】上記文献に記載されたチップキャリヤを図
7に示す。チップキャリヤ20は、ムライトなどのセラ
ミック材料からなるパッケージ基板21の主面に設けた
電極22上に半田バンプ23を介して半導体チップ24
をフェイスダウンボンディングし、この半導体チップ2
4をキャップ25で気密封止したパッケージ構造を有し
ている。キャップ25は、窒化アルミニウム(AlN)
などの高熱伝導性セラミックからなり、封止用半田26
によってパッケージ基板21の主面に接合されている。 パッケージ基板21の主面の周縁部およびキャップ25
の脚部の下面のそれぞれには、封止用半田26の濡れ性
を向上させるためのメタライズ層27が設けられている
。上記パッケージ基板21とキャップ25とによって囲
まれたキャビティ内に封止されているチップ24の背面
(上面)は、伝熱用半田28によってキャップ25の下
面に接合されている。これは、チップ24から発生した
熱を伝熱用半田28を通じてキャップ25に伝達するた
めの構造である。上記伝熱用半田28の濡れ性を向上さ
せるため、キャップ25の下面およびチップ24の背面
には、メタライズ層27が設けられている。
The chip carrier described in the above-mentioned document is shown in FIG. The chip carrier 20 carries a semiconductor chip 24 via solder bumps 23 on an electrode 22 provided on the main surface of a package substrate 21 made of a ceramic material such as mullite.
This semiconductor chip 2 is bonded face down.
4 is hermetically sealed with a cap 25. The cap 25 is made of aluminum nitride (AlN)
It is made of highly thermally conductive ceramic such as solder 26 for sealing.
It is bonded to the main surface of the package substrate 21 by. Periphery of main surface of package substrate 21 and cap 25
A metallized layer 27 for improving the wettability of the sealing solder 26 is provided on each of the lower surfaces of the legs. The back surface (upper surface) of the chip 24 sealed in the cavity surrounded by the package substrate 21 and the cap 25 is bonded to the lower surface of the cap 25 with heat transfer solder 28 . This is a structure for transmitting heat generated from the chip 24 to the cap 25 through the heat transfer solder 28. In order to improve the wettability of the heat transfer solder 28, a metallized layer 27 is provided on the lower surface of the cap 25 and the back surface of the chip 24.

【0004】パッケージ基板21の内層には、例えばW
(タングステン)からなる内部配線29が形成されてお
り、この内部配線29を通じてパッケージ基板21の主
面側の電極22と下面側の電極22とが電気的に接続さ
れている。下面側の電極22には、チップキャリヤ20
をモジュール基板などに実装する際の外部端子となる半
田バンプ30が接合される。
The inner layer of the package substrate 21 contains, for example, W.
An internal wiring 29 made of (tungsten) is formed, and the electrode 22 on the main surface side of the package substrate 21 and the electrode 22 on the lower surface side are electrically connected through this internal wiring 29. A chip carrier 20 is attached to the electrode 22 on the lower surface side.
Solder bumps 30 are bonded to serve as external terminals when the is mounted on a module board or the like.

【0005】上記チップキャリヤを組立てるには、まず
チップの主面に接合した半田バンプをチップマウント装
置を用いてパッケージ基板の主面の電極上に正確に位置
決めする。続いて、上記チップを搭載したパッケージ基
板を不活性ガス雰囲気のリフロー炉に移送し、この中で
半田バンプを加熱、再溶融することによって、チップを
パッケージ基板の主面にフェイスダウンボンディングす
る。
To assemble the chip carrier, first, the solder bumps bonded to the main surface of the chip are accurately positioned on the electrodes on the main surface of the package substrate using a chip mount device. Subsequently, the package substrate on which the chip is mounted is transferred to a reflow oven in an inert gas atmosphere, and the solder bumps are heated and remelted in the reflow oven, thereby face-down bonding the chip to the main surface of the package substrate.

【0006】次に、封止用半田を用いて上記パッケージ
基板の主面にキャップを接合する。
Next, a cap is bonded to the main surface of the package substrate using sealing solder.

【0007】また、伝熱用半田を用いてチップの背面を
キャップの下面に接合する。キャップをパッケージ基板
の主面に半田付けする作業と、チップの背面をキャップ
の下面に半田付けする作業とは同一工程で行われる。す
なわち、チップの背面にプリフォーム半田を載せ、さら
にその上にキャップを載せた後、キャップの上に錘りな
どを載せて適度の荷重を印加した状態でリフロー炉にて
上記プリフォーム半田を加熱、溶融する。溶融した半田
は、このとき、キャップに加わる荷重のためにその一部
がキャップの内壁を伝わり、パッケージ基板の主面の周
縁部とキャップの脚部との隙間に流れ込み、これによっ
てチップの背面がキャップの下面に接合されると同時に
パッケージ基板とキャップとの接合がなされる。
[0007] Also, the back surface of the chip is bonded to the bottom surface of the cap using heat transfer solder. The operation of soldering the cap to the main surface of the package substrate and the operation of soldering the back surface of the chip to the lower surface of the cap are performed in the same process. That is, after placing preform solder on the back of the chip and then placing a cap on top of it, the preform solder is heated in a reflow oven while a weight or the like is placed on top of the cap and an appropriate load is applied. , melt. At this time, due to the load applied to the cap, a portion of the molten solder travels along the inner wall of the cap and flows into the gap between the periphery of the main surface of the package board and the legs of the cap, causing the back surface of the chip to At the same time as being bonded to the lower surface of the cap, the package substrate and the cap are bonded.

【0008】[0008]

【発明が解決しようとする課題】しかしながら、前述し
たチップキャリヤの組立て方法は、チップとキャップと
の間に挟んだプリフォーム半田をリフロー炉で加熱、溶
融する際、キャップに加わる荷重によってチップの下面
の半田バンプが変形したり、潰れたりし易いという問題
があった。また、溶融した半田がキャップの内壁を伝わ
ってパッケージ基板とキャップとの隙間に流れ込むのに
ある程度の時間を必要とするため、組立て時間が長くな
るという問題があった。
[Problems to be Solved by the Invention] However, in the above-described chip carrier assembly method, when the preform solder sandwiched between the chip and the cap is heated and melted in a reflow oven, the lower surface of the chip is damaged due to the load applied to the cap. There was a problem in that the solder bumps were easily deformed or crushed. Furthermore, since it takes a certain amount of time for the molten solder to flow along the inner wall of the cap and into the gap between the package substrate and the cap, there is a problem in that the assembly time becomes long.

【0009】本発明の目的は、前記の構成を備えたチッ
プキャリヤの製造歩留りを向上させることのできる技術
を提供することにある。
An object of the present invention is to provide a technique that can improve the manufacturing yield of chip carriers having the above-mentioned structure.

【0010】本発明の他の目的は、前記の構成を備えた
チップキャリヤの製造時間を短縮することのできる技術
を提供することにある。
Another object of the present invention is to provide a technique that can shorten the manufacturing time of a chip carrier having the above structure.

【0011】本発明の前記ならびにその他の目的と新規
な特徴は、本明細書の記述および添付図面から明らかに
なるであろう。
The above and other objects and novel features of the present invention will become apparent from the description of this specification and the accompanying drawings.

【0012】0012

【課題を解決するための手段】半田バンプを介してチッ
プを実装したパッケージ基板の主面に封止用半田を用い
てキャップを半田付けすることにより前記チップを気密
封止するとともに、前記キャップの下面に伝熱用半田を
用いて前記チップの背面を半田付けしてなるチップキャ
リヤにおいて、前記パッケージ基板の主面の周縁部およ
び前記キャップの脚部の下面のそれぞれに前記封止用半
田の濡れ性を向上させるための第一のメタライズ層を設
けるとともに、前記キャップの下面において前記チップ
の背面と対向する箇所に前記伝熱用半田の濡れ性を向上
させるための第二のメタライズ層を設け、前記キャップ
の脚部の下面に設けた前記第一のメタライズ層と前記第
二のメタライズ層とを一部で連続させるものである。
[Means for Solving the Problems] By soldering a cap using sealing solder to the main surface of a package substrate on which a chip is mounted via solder bumps, the chip is hermetically sealed, and the cap is sealed. In a chip carrier in which the back surface of the chip is soldered to the lower surface using heat transfer solder, the sealing solder is wetted on the peripheral edge of the main surface of the package substrate and the lower surface of the leg of the cap, respectively. a first metallized layer for improving the wettability of the heat transfer solder, and a second metallized layer for improving the wettability of the heat transfer solder on a lower surface of the cap facing the back surface of the chip; The first metallized layer and the second metallized layer provided on the lower surface of the leg portion of the cap are partially continuous.

【0013】[0013]

【作用】上記した手段によれば、キャップの脚部の下面
に設けた第一のメタライズ層と、キャップの下面におい
てチップの背面と対向する箇所に設けた第二のメタライ
ズ層とを一部で連続させることにより、チップとキャッ
プとの間に挟んだプリフォーム半田を加熱、溶融した際
、溶融半田の一部は、上記第一および第二のメタライズ
層の表面を伝ってパッケージ基板の主面の周縁部とキャ
ップの脚部との隙間に速やかに流れ込むことができる。
[Operation] According to the above-described means, the first metallized layer provided on the lower surface of the leg of the cap and the second metalized layer provided on the lower surface of the cap at a location facing the back surface of the chip are partially formed. By making the solder continuous, when the preform solder sandwiched between the chip and the cap is heated and melted, a portion of the molten solder travels along the surfaces of the first and second metallized layers and reaches the main surface of the package substrate. can quickly flow into the gap between the peripheral edge of the cap and the leg of the cap.

【0014】以下、本発明を実施例により説明する。な
お、実施例を説明するための全図において、同一機能を
有するものは同一の符号を付し、その繰り返しの説明は
省略する。
The present invention will be explained below with reference to Examples. In addition, in all the figures for explaining the embodiment, parts having the same functions are denoted by the same reference numerals, and repeated explanation thereof will be omitted.

【0015】[0015]

【実施例】図1に示すように、本実施例のチップキャリ
ヤ1は、ムライトなどのセラミック材料からなるパッケ
ージ基板2の主面の電極3上に半田バンプ4を介してフ
ェイスダウンボンディングした半導体チップ5をキャッ
プ6で気密封止したパッケージ構造を有している。上記
チップキャリヤ1は、その外形寸法が、縦×横=10〜
14mm×10〜14mm程度の微小なもので、マイク
ロ・キャリヤ・フォー・エル・エス・アイ・チップ(M
icro Carrier for LSI Chip
)とも称される。
[Embodiment] As shown in FIG. 1, the chip carrier 1 of this embodiment is a semiconductor chip face-down bonded via solder bumps 4 onto an electrode 3 on the main surface of a package substrate 2 made of a ceramic material such as mullite. 5 is hermetically sealed with a cap 6. The chip carrier 1 has external dimensions of length x width = 10~
It is a small device of about 14 mm x 10 to 14 mm, and it is a micro carrier for LSI chip (M
icro Carrier for LSI Chip
) is also called.

【0016】上記半田バンプ4は、例えば3〜4重量%
程度のSnを含有するPb/Sn合金(溶融温度=32
0〜330℃程度)からなる。上記キャップ6は、例え
ば窒化アルミニウム(AlN)などの高熱伝導性セラミ
ックからなり、その脚部は、封止用半田7によってパッ
ケージ基板2の主面の周縁部に半田付けされている。
[0016] The solder bump 4 has a content of, for example, 3 to 4% by weight.
Pb/Sn alloy containing Sn (melting temperature = 32
(about 0 to 330°C). The cap 6 is made of a highly thermally conductive ceramic such as aluminum nitride (AlN), and its legs are soldered to the peripheral edge of the main surface of the package substrate 2 with sealing solder 7.

【0017】パッケージ基板2の主面の周縁部およびキ
ャップ6の脚部の下面のそれぞれには、封止用半田7の
濡れ性を向上させるための第一のメタライズ層8aが設
けられている。上記メタライズ層8aは、例えばTi、
NiおよびAuの薄膜を蒸着法によって堆積した複合金
属膜からなる。
A first metallized layer 8a is provided on each of the peripheral edge of the main surface of the package substrate 2 and the lower surface of the legs of the cap 6 to improve the wettability of the sealing solder 7. The metallized layer 8a is made of, for example, Ti,
It consists of a composite metal film in which thin films of Ni and Au are deposited by a vapor deposition method.

【0018】上記パッケージ基板2の主面とキャップ6
の下面とによって囲まれたキャビティの中に封止されて
いるチップ5の背面(上面)は、伝熱用半田9によって
キャップ6の下面に半田付けされている。これは、チッ
プ5から発生する熱を伝熱用半田9を通じてキャップ6
に伝達するためである。上記伝熱用半田9の濡れ性を向
上させるため、キャップ6の下面においてチップ5の背
面と対向する箇所には、第二のメタライズ層8bが設け
られている。封止用半田7および伝熱用半田9は、例え
ば10重量%程度のSnを含有するPb/Sn合金(溶
融温度=275〜300℃程度)からなる。
The main surface of the package substrate 2 and the cap 6
The back surface (top surface) of the chip 5 sealed in a cavity surrounded by the bottom surface of the cap 6 is soldered to the bottom surface of the cap 6 with heat transfer solder 9. This transfers the heat generated from the chip 5 to the cap 6 through the heat transfer solder 9.
This is to convey the information to the In order to improve the wettability of the heat transfer solder 9, a second metallized layer 8b is provided on the lower surface of the cap 6 at a location facing the back surface of the chip 5. The sealing solder 7 and the heat transfer solder 9 are made of, for example, a Pb/Sn alloy (melting temperature: about 275 to 300° C.) containing about 10% by weight of Sn.

【0019】パッケージ基板2の内層には、例えばWか
らなる内部配線10が形成されており、この内部配線1
0を通じてパッケージ基板2の主面側の電極3と下面側
の電極3とが電気的に接続されている。なお、図示は省
略するが、下面側の電極3には、チップキャリヤ1をモ
ジュール基板などに実装する際の外部端子となる半田バ
ンプが接合される。上記半田バンプは、封止用半田7よ
りもさらに低融点の半田、例えば3.0重量%程度のA
gを含有するSn/Ag合金(溶融温度=221〜22
2℃程度)からなる。
An internal wiring 10 made of W, for example, is formed in the inner layer of the package substrate 2.
0, the electrode 3 on the main surface side of the package substrate 2 and the electrode 3 on the lower surface side are electrically connected. Although not shown in the drawings, solder bumps that serve as external terminals when the chip carrier 1 is mounted on a module substrate or the like are bonded to the electrode 3 on the lower surface side. The solder bumps are made of solder having a lower melting point than the sealing solder 7, for example, about 3.0% by weight of A.
Sn/Ag alloy containing g (melting temperature = 221-22
(approximately 2℃).

【0020】図2は、前記キャップ6の内側を示す斜視
図である。同図に示すように、キャップ6の脚部の下面
(図では上面)に設けられた第一のメタライズ層8aと
、キャップ6の下面においてチップ5の背面と対向する
箇所に設けられた第二のメタライズ層8bとは、例えば
キャップ6の内壁に4箇所設けられた第三のメタライズ
層8cを介して接続されている。すなわち、第一のメタ
ライズ層8aと第二のメタライズ層8bとは、それらの
一部が上記メタライズ層8cを通じて連続した状態にな
っている。上記メタライズ層8a,8b,8cは、例え
ば同一の工程で形成した同一の複合金属膜からなる。
FIG. 2 is a perspective view showing the inside of the cap 6. As shown in FIG. As shown in the figure, a first metallized layer 8a is provided on the lower surface (upper surface in the figure) of the legs of the cap 6, and a second metallized layer 8a is provided on the lower surface of the cap 6 at a location facing the back surface of the chip 5. The third metallized layer 8b is connected to the third metallized layer 8c provided at four locations on the inner wall of the cap 6, for example. That is, the first metallized layer 8a and the second metallized layer 8b are partially continuous through the metallized layer 8c. The metallized layers 8a, 8b, and 8c are made of, for example, the same composite metal film formed in the same process.

【0021】次に、上記の構成からなるチップキャリヤ
1の組立方法を図3〜図5を用いて説明する。
Next, a method of assembling the chip carrier 1 having the above structure will be explained with reference to FIGS. 3 to 5.

【0022】まず図3に示すように、チップ5の主面に
形成した半田バンプ4をパッケージ基板2の主面の電極
3上に正確に位置決めする。この位置決めはチップマウ
ント装置などの機械を用いて行う。次に、上記パッケー
ジ基板2をリフロー炉に搬送する。上記リフロー炉の内
部は、半田バンプ4の表面の酸化を防止するために、窒
素、アルゴンなどの不活性ガス、または上記不活性ガス
に水素を混合した還元性ガスを充填した雰囲気になって
いる。そして、炉内の温度を半田バンプ4の溶融温度よ
りも幾分高め(340〜350℃程度)に設定して半田
バンプ4を加熱、溶融することにより、チップ5をパッ
ケージ基板2の主面にフェイスダウンボンディングする
(図4)。
First, as shown in FIG. 3, the solder bumps 4 formed on the main surface of the chip 5 are accurately positioned on the electrodes 3 on the main surface of the package substrate 2. As shown in FIG. This positioning is performed using a machine such as a chip mount device. Next, the package substrate 2 is transported to a reflow oven. The inside of the reflow oven is filled with an atmosphere filled with an inert gas such as nitrogen or argon, or a reducing gas made by mixing the inert gas with hydrogen, in order to prevent the surface of the solder bumps 4 from oxidizing. . Then, by setting the temperature in the furnace to be somewhat higher than the melting temperature of the solder bumps 4 (approximately 340 to 350°C) and heating and melting the solder bumps 4, the chip 5 is attached to the main surface of the package substrate 2. Perform face-down bonding (Figure 4).

【0023】次に、図5に示すように、チップ5の背面
上に所定の体積を有する伝熱用半田9(プリフォーム半
田)を載せ、さらにその上にキャップ6を載せる。続い
て、この状態でパッケージ基板2を水平に保ったままリ
フロー炉に搬送する。上記リフロー炉の内部は、伝熱用
半田9の表面の酸化を防止するために、前記不活性ガス
または還元性ガスを充填した雰囲気になっている。そし
て、炉内の温度を伝熱用半田9の溶融温度よりも幾分高
め(310℃程度)に設定して伝熱用半田9を加熱、溶
融する。これにより、溶融した半田は、第二のメタライ
ズ層8cの表面に沿って濡れ広がり、その一部が第三の
メタライズ層8cの表面を伝ってパッケージ基板2の主
面の周縁部とキャップ6の脚部との隙間に速やかに流れ
込んで封止用半田7となり、前記図1に示したチップキ
ャリヤ1の組立てが略完了する。
Next, as shown in FIG. 5, a heat transfer solder 9 (preform solder) having a predetermined volume is placed on the back surface of the chip 5, and a cap 6 is placed on top of it. Subsequently, in this state, the package substrate 2 is transported to a reflow oven while being held horizontally. The inside of the reflow oven is filled with an atmosphere filled with the inert gas or reducing gas in order to prevent the surface of the heat transfer solder 9 from being oxidized. Then, the temperature in the furnace is set to be somewhat higher (approximately 310° C.) than the melting temperature of the heat transfer solder 9, and the heat transfer solder 9 is heated and melted. As a result, the molten solder wets and spreads along the surface of the second metallized layer 8c, and a portion of it spreads along the surface of the third metallized layer 8c to the periphery of the main surface of the package substrate 2 and the cap 6. The solder quickly flows into the gap between the legs and becomes the sealing solder 7, and the assembly of the chip carrier 1 shown in FIG. 1 is almost completed.

【0024】このように、キャップ6の内壁に設けた第
三のメタライズ層8cを介して第一のメタライズ層8a
と第二のメタライズ層8bとを一部連続させた本実施例
のチップキャリヤ1によれば、溶融した伝熱用半田9の
一部が上記第三のメタライズ層8cの表面を伝ってパッ
ケージ基板2の主面の周縁部とキャップ6の脚部との隙
間に速やかに流れ込むため、チップ5の封止を短時間で
行うことができる。
In this way, the first metallized layer 8a is passed through the third metallized layer 8c provided on the inner wall of the cap 6.
According to the chip carrier 1 of this embodiment in which the and second metallized layer 8b are partially continuous, a part of the melted heat transfer solder 9 flows along the surface of the third metallized layer 8c to the package substrate. Since it quickly flows into the gap between the peripheral edge of the main surface of the cap 2 and the leg of the cap 6, the chip 5 can be sealed in a short time.

【0025】また、キャップに加える荷重を不要、もし
くは著しく軽減することができるので、伝熱用半田9を
溶融する際のチップ5の変形や潰れを防止することがで
き、チップキャリヤ1の組立て歩留りが向上する。
Furthermore, since the load applied to the cap is unnecessary or can be significantly reduced, deformation or crushing of the chip 5 when melting the heat transfer solder 9 can be prevented, and the assembly yield of the chip carrier 1 can be improved. will improve.

【0026】以上、本発明者によってなされた発明を実
施例に基づき具体的に説明したが、本発明は前記実施例
に限定されるものではなく、その要旨を逸脱しない範囲
で種々変更可能であることはいうまでもない。
[0026] Above, the invention made by the present inventor has been specifically explained based on examples, but the present invention is not limited to the above-mentioned examples, and can be modified in various ways without departing from the gist thereof. Needless to say.

【0027】例えば図6に示すように、第三のメタライ
ズ層8cをキャップ6の内壁の四隅に設けるなど、第三
のメタライズ層の配置や形状は適宜変更することができ
る。
For example, as shown in FIG. 6, the arrangement and shape of the third metallized layer can be changed as appropriate, such as by providing the third metallized layer 8c at the four corners of the inner wall of the cap 6.

【0028】なお、いずれの場合も第三のメタライズ層
の面積が大き過ぎると、パッケージ基板の主面の周縁部
とキャップの脚部との隙間に過剰の半田が流れ込み、チ
ップの背面に残る伝熱用半田の量が不足するため、チッ
プの背面とキャップの下面との隙間にボイドなどが発生
し、チップの放熱性が低下する。他方、第三のメタライ
ズ層の面積が小さ過ぎると、パッケージ基板の主面の周
縁部とキャップの脚部との隙間に半田が流れ込むのに長
時間を要してしまう。従って、第三のメタライズ層の面
積は、半田キャップの面積や形状などに応じて最適とな
るように設計する必要がある。
In either case, if the area of the third metallized layer is too large, excess solder will flow into the gap between the periphery of the main surface of the package substrate and the legs of the cap, resulting in the solder remaining on the back side of the chip. Due to the insufficient amount of heat solder, voids occur in the gap between the back of the chip and the bottom of the cap, reducing the heat dissipation of the chip. On the other hand, if the area of the third metallized layer is too small, it will take a long time for the solder to flow into the gap between the peripheral edge of the main surface of the package substrate and the leg of the cap. Therefore, the area of the third metallized layer needs to be optimally designed depending on the area and shape of the solder cap.

【0029】[0029]

【発明の効果】本願によって開示される発明のうち、代
表的なものによって得られる効果を簡単に説明すれば、
以下の通りである。
[Effects of the Invention] Among the inventions disclosed in this application, the effects obtained by the typical inventions will be briefly explained as follows.
It is as follows.

【0030】半田バンプを介してチップを実装したパッ
ケージ基板の主面に封止用半田を用いてキャップを半田
付けすることにより前記チップを気密封止するとともに
、前記キャップの下面に伝熱用半田を用いて前記チップ
の背面を半田付けしてなるチップキャリヤにおいて、前
記パッケージ基板の主面の周縁部および前記キャップの
脚部の下面のそれぞれに前記封止用半田の濡れ性を向上
させるための第一のメタライズ層を設けるとともに、前
記キャップの下面において前記チップの背面と対向する
箇所に前記伝熱用半田の濡れ性を向上させるための第二
のメタライズ層を設け、前記キャップの脚部の下面に設
けた前記第一のメタライズ層と前記第二のメタライズ層
とを一部で連続させることにより、前記チップキャリヤ
の製造歩留りを向上させることができる。また、前記チ
ップキャリヤの製造時間を短縮することができる。
A cap is soldered to the main surface of the package substrate on which the chip is mounted via solder bumps using sealing solder to hermetically seal the chip, and heat transfer solder is applied to the bottom surface of the cap. In the chip carrier in which the back surface of the chip is soldered using a method of soldering, a method for improving the wettability of the sealing solder is applied to each of the peripheral edge of the main surface of the package substrate and the lower surface of the leg of the cap. In addition to providing a first metallized layer, a second metallized layer for improving the wettability of the heat transfer solder is provided on the lower surface of the cap opposite to the back surface of the chip, and By making the first metallized layer and the second metallized layer provided on the lower surface partially continuous, it is possible to improve the manufacturing yield of the chip carrier. Moreover, the manufacturing time of the chip carrier can be shortened.

【図面の簡単な説明】[Brief explanation of the drawing]

【図1】本発明の一実施例であるチップキャリヤ形半導
体集積回路装置を示す断面図である。
FIG. 1 is a sectional view showing a chip carrier type semiconductor integrated circuit device which is an embodiment of the present invention.

【図2】このチップキャリヤ形半導体集積回路装置のキ
ャップを示す斜視図である。
FIG. 2 is a perspective view showing a cap of this chip carrier type semiconductor integrated circuit device.

【図3】このチップキャリヤ形半導体集積回路装置の製
造方法を示す断面図である。
FIG. 3 is a cross-sectional view showing a method of manufacturing this chip carrier type semiconductor integrated circuit device.

【図4】このチップキャリヤ形半導体集積回路装置の製
造方法を示す断面図である。
FIG. 4 is a cross-sectional view showing a method of manufacturing this chip carrier type semiconductor integrated circuit device.

【図5】このチップキャリヤ形半導体集積回路装置の製
造方法を示す断面図である。
FIG. 5 is a cross-sectional view showing a method of manufacturing this chip carrier type semiconductor integrated circuit device.

【図6】本発明の他の実施例であるチップキャリヤ形半
導体集積回路装置のキャップを示す斜視図である。
FIG. 6 is a perspective view showing a cap of a chip carrier type semiconductor integrated circuit device according to another embodiment of the present invention.

【図7】従来のチップキャリヤ形半導体集積回路装置を
示す要部断面図である。
FIG. 7 is a sectional view of a main part of a conventional chip carrier type semiconductor integrated circuit device.

【符号の説明】[Explanation of symbols]

1  チップキャリヤ 2  パッケージ基板 3  電極 4  半田バンプ 5  半導体チップ 6  キャップ 7  封止用半田 8a  メタライズ層 8b  メタライズ層 8c  メタライズ層 9  伝熱用半田 10  内部配線 20  チップキャリヤ 21  パッケージ基板 22  電極 23  半田バンプ 24  半導体チップ 25  キャップ 26  封止用半田 27  メタライズ層 28  伝熱用半田 29  内部配線 30  半田バンプ 1 Chip carrier 2 Package board 3 Electrode 4 Solder bump 5 Semiconductor chip 6 Cap 7 Solder for sealing 8a Metallized layer 8b Metallized layer 8c Metallized layer 9 Solder for heat transfer 10 Internal wiring 20 Chip carrier 21 Package board 22 Electrode 23 Solder bump 24 Semiconductor chip 25 Cap 26 Solder for sealing 27 Metallized layer 28 Solder for heat transfer 29 Internal wiring 30 Solder bump

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】  半田バンプを介して半導体チップを実
装したパッケージ基板の主面に封止用半田を用いてキャ
ップを半田付けすることにより前記半導体チップを気密
封止するとともに、前記キャップの下面に伝熱用半田を
用いて前記半導体チップの背面を半田付けしてなるチッ
プキャリヤを有する半導体集積回路装置であって、前記
パッケージ基板の主面の周縁部および前記キャップの脚
部の下面のそれぞれに前記封止用半田の濡れ性を向上さ
せるための第一のメタライズ層を設けるとともに、前記
キャップの下面において前記半導体チップの背面と対向
する箇所に前記伝熱用半田の濡れ性を向上させるための
第二のメタライズ層を設け、前記キャップの脚部の下面
に設けた前記第一のメタライズ層と前記第二のメタライ
ズ層とを一部で連続させたことを特徴とする半導体集積
回路装置。
1. The semiconductor chip is hermetically sealed by soldering a cap to the main surface of the package substrate on which the semiconductor chip is mounted via solder bumps using sealing solder, and the semiconductor chip is hermetically sealed to the bottom surface of the cap. A semiconductor integrated circuit device having a chip carrier formed by soldering the back side of the semiconductor chip using heat transfer solder, the semiconductor integrated circuit device having a chip carrier formed by soldering the back side of the semiconductor chip using heat transfer solder, wherein A first metallized layer for improving the wettability of the sealing solder is provided, and a first metallized layer for improving the wettability of the heat transfer solder is provided on a lower surface of the cap facing the back surface of the semiconductor chip. A semiconductor integrated circuit device, characterized in that a second metallized layer is provided, and a portion of the first metallized layer and the second metallized layer provided on the lower surface of the leg of the cap are continuous.
【請求項2】  前記キャップの脚部の下面に設けた前
記第一のメタライズ層と前記第二のメタライズ層とは、
同一の工程で形成された同一の導電膜からなることを特
徴とする請求項1記載の半導体集積回路装置。
2. The first metallized layer and the second metallized layer provided on the lower surface of the leg portion of the cap include:
2. The semiconductor integrated circuit device according to claim 1, wherein the semiconductor integrated circuit device is made of the same conductive film formed in the same process.
【請求項3】  半田バンプを介して半導体チップを実
装したパッケージ基板の主面に封止用半田を用いてキャ
ップを半田付けすることにより前記半導体チップを気密
封止するとともに、前記キャップの下面に伝熱用半田を
用いて前記半導体チップの背面を半田付けしてなるチッ
プキャリヤを有する半導体集積回路装置であって、前記
パッケージ基板の主面の周縁部および前記キャップの脚
部の下面のそれぞれに前記封止用半田の濡れ性を向上さ
せるための第一のメタライズ層を設けるとともに、前記
半導体チップの背面に前記伝熱用半田の濡れ性を向上さ
せるための第二のメタライズ層を設け、前記キャップの
脚部の下面に設けた前記第一のメタライズ層の一部を前
記半導体チップの背面まで延在させたことを特徴とする
半導体集積回路装置。
3. The semiconductor chip is hermetically sealed by soldering a cap using sealing solder to the main surface of the package substrate on which the semiconductor chip is mounted via solder bumps, and the semiconductor chip is hermetically sealed on the bottom surface of the cap. A semiconductor integrated circuit device having a chip carrier formed by soldering the back side of the semiconductor chip using heat transfer solder, the semiconductor integrated circuit device having a chip carrier formed by soldering the back side of the semiconductor chip using a heat transfer solder, the semiconductor integrated circuit device comprising: A first metallized layer is provided for improving the wettability of the sealing solder, and a second metallized layer is provided on the back surface of the semiconductor chip for improving the wettability of the heat transfer solder, and the A semiconductor integrated circuit device, characterized in that a portion of the first metallized layer provided on the lower surface of the leg portion of the cap extends to the back surface of the semiconductor chip.
JP3049808A 1991-03-14 1991-03-14 Semiconductor integrated circuit device Pending JPH04286145A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP3049808A JPH04286145A (en) 1991-03-14 1991-03-14 Semiconductor integrated circuit device
US07/850,738 US5219794A (en) 1991-03-14 1992-03-13 Semiconductor integrated circuit device and method of fabricating same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3049808A JPH04286145A (en) 1991-03-14 1991-03-14 Semiconductor integrated circuit device

Publications (1)

Publication Number Publication Date
JPH04286145A true JPH04286145A (en) 1992-10-12

Family

ID=12841435

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3049808A Pending JPH04286145A (en) 1991-03-14 1991-03-14 Semiconductor integrated circuit device

Country Status (1)

Country Link
JP (1) JPH04286145A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6075289A (en) * 1996-10-24 2000-06-13 Tessera, Inc. Thermally enhanced packaged semiconductor assemblies

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6075289A (en) * 1996-10-24 2000-06-13 Tessera, Inc. Thermally enhanced packaged semiconductor assemblies
US6354485B1 (en) 1996-10-24 2002-03-12 Tessera, Inc. Thermally enhanced packaged semiconductor assemblies

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