JPH04279011A - Nonmagnetic substrate for magnetic head - Google Patents
Nonmagnetic substrate for magnetic headInfo
- Publication number
- JPH04279011A JPH04279011A JP3065339A JP6533991A JPH04279011A JP H04279011 A JPH04279011 A JP H04279011A JP 3065339 A JP3065339 A JP 3065339A JP 6533991 A JP6533991 A JP 6533991A JP H04279011 A JPH04279011 A JP H04279011A
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- nio
- hardness
- substrate
- nonmagnetic substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 20
- 229910052788 barium Inorganic materials 0.000 claims abstract description 5
- 229910052705 radium Inorganic materials 0.000 claims abstract description 5
- 229910052712 strontium Inorganic materials 0.000 claims abstract description 5
- 238000005336 cracking Methods 0.000 abstract description 4
- 230000032798 delamination Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 238000004904 shortening Methods 0.000 abstract 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 10
- 239000000654 additive Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 230000000704 physical effect Effects 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910002113 barium titanate Inorganic materials 0.000 description 3
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- IATRAKWUXMZMIY-UHFFFAOYSA-N strontium oxide Chemical compound [O-2].[Sr+2] IATRAKWUXMZMIY-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000000292 calcium oxide Substances 0.000 description 1
- 235000012255 calcium oxide Nutrition 0.000 description 1
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005469 granulation Methods 0.000 description 1
- 230000003179 granulation Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Hard Magnetic Materials (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、金属性磁性膜を蒸着す
るための非磁性の磁気ヘッド用非磁性基板に関するもの
である。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nonmagnetic substrate for a magnetic head on which a metallic magnetic film is deposited.
【0002】0002
【従来技術】従来この種の用途のものとしては、チタン
酸バリウム、チタン酸カルシウム、アルミナ等が使用さ
れていた。しかしながら、その熱膨張率が磁性膜構造体
と大きく異なっていたため、蒸着した磁性膜構造体が剥
離しやすく、また熱膨張率の差により応力が発生しクラ
ックが発生することがあった。BACKGROUND OF THE INVENTION Conventionally, barium titanate, calcium titanate, alumina, etc. have been used for this type of application. However, since its coefficient of thermal expansion was significantly different from that of the magnetic film structure, the deposited magnetic film structure was likely to peel off, and the difference in coefficient of thermal expansion caused stress and cracks.
【0003】さらに、従来の材料は硬さが低く、特に高
保磁力テ−プ(いわゆるメタルテ−プ)が使用された場
合には、非磁性基板が磁性膜構造体と硬度及び耐摩耗性
が異なり、磁気テ−プとの摺動により発生する摩擦のた
めに偏摩耗等を引き起こし、磁気特性に変化をきたすと
いう問題があった。特に硬度が低い場合には、磁気ヘッ
ドの寿命が短くなること、あるいは非磁性基板の変形や
割れ及び剥離を引き起こすといった欠点が顕著であった
。Furthermore, conventional materials have low hardness, and especially when a high coercive force tape (so-called metal tape) is used, the hardness and wear resistance of the nonmagnetic substrate are different from those of the magnetic film structure. There was a problem in that the friction generated by sliding with the magnetic tape caused uneven wear and the like, resulting in changes in magnetic properties. In particular, when the hardness is low, the disadvantages are that the life of the magnetic head is shortened or that the nonmagnetic substrate is deformed, cracked, or peeled off.
【0004】本発明者等は上記の欠点を解決すべく酸化
物系セラミックスについて研究を進め、CoO及びNi
OまたはNiOを基本組成とした酸化物が有効であると
して既に開示した。(特開平01−287811、特開
平02−168602、特願平01−214206)さ
らに硬度や密度の向上を図るための添加材を検討し、C
oO、NiOを基本組成として、酸化マンガン、二酸化
チタン、アルミナ、カルシアのうち1種以上を0.1〜
5wt%添加した場合、及び1〜5wt%のイットリア
、0.1〜1%の窒化チタン、0.3〜2wt%の酸化
ホウ素のうち1種以上を添加した場合、あるいは1〜5
wt%の二酸化ケイ素を添加した場合の有効性を確認し
これらを開示した。(特開平02−94408、特願平
01−159622、特願平01−214208)The present inventors have conducted research on oxide ceramics in order to solve the above-mentioned drawbacks, and have
It has already been disclosed that oxides having a basic composition of O or NiO are effective. (JP 01-287811, JP 02-168602, JP 01-214206) Furthermore, we investigated additives to improve hardness and density.
The basic composition is oO, NiO, and one or more of manganese oxide, titanium dioxide, alumina, and calcia at 0.1~
When adding 5 wt%, and when adding one or more of 1 to 5 wt% yttria, 0.1 to 1% titanium nitride, 0.3 to 2 wt% boron oxide, or 1 to 5 wt%
The effectiveness of adding wt% silicon dioxide was confirmed and these were disclosed. (JP 02-94408, JP 01-159622, JP 01-214208)
【0
005】0
005]
【問題点を解決するための手段】以上の問題点を解決す
るために、本発明者等はCoO及びNiOあるいはNi
Oを基本組成とした添加材の検討を更に続けた結果、該
組成物に対してSr、Ba、Raの酸化物のうち少なく
とも一種を0.1〜10wt%添加した場合に、上記の
特性を満たすことを見い出した。従って、本発明の目的
は、具体的には蒸着した磁性膜構造体に近い熱膨張率を
有し、ビッカ−ス硬度が高く、さらに他のヘッド構成材
料間で過度の化学的侵食反応を起こさない材料を提供す
ることである。[Means for Solving the Problems] In order to solve the above problems, the present inventors have developed a method using CoO and NiO or Ni.
As a result of further studies on additives whose basic composition is O, it was found that when 0.1 to 10 wt% of at least one of the oxides of Sr, Ba, and Ra was added to the composition, the above characteristics could be achieved. I have found something that satisfies me. Therefore, specifically, the object of the present invention is to have a thermal expansion coefficient close to that of a deposited magnetic film structure, a high Vickers hardness, and a structure that does not cause excessive chemical erosion reactions between other head constituent materials. There is no material to offer.
【0006】[0006]
【発明の構成】即ち、本発明は、CoO及びNiOある
いはNiOを基本組成として、該組成物に対してSr、
Ba、Raの酸化物のうち少なくとも一種を0.1〜1
0wt%添加したことを特徴とする磁気ヘッド用非磁性
基板を提供する。[Structure of the Invention] That is, the present invention uses CoO and NiO or NiO as the basic composition, and adds Sr,
0.1 to 1 at least one of Ba and Ra oxides
Provided is a non-magnetic substrate for a magnetic head, characterized in that 0 wt % is added.
【0007】[0007]
【発明の具体的説明】本発明の理解を容易にするため具
体的かつ詳細に説明する。基本組成は、NiO単独の酸
化物あるいはNiOとCoOの複合酸化物を意味し、例
えば、CoO/NiO(モル比)=0/100〜80/
20で、より好ましくは、CoO/NiO(モル比)=
3/97〜60/40である。DETAILED DESCRIPTION OF THE INVENTION In order to facilitate understanding of the present invention, the present invention will be explained specifically and in detail. The basic composition means an oxide of NiO alone or a composite oxide of NiO and CoO, for example, CoO/NiO (molar ratio) = 0/100 to 80/
20, more preferably CoO/NiO (molar ratio)=
3/97 to 60/40.
【0008】上記組成物に対して、本発明は、Sr、B
a、Raの酸化物のうち少なくとも一種を0.1〜10
wt%添加する。Sr、Ba、Raの酸化物は焼結性を
向上させる物質で、0.1wt%以上の添加により密度
が増加し硬度、強度が向上する。また、熱膨張率がNi
O、CoOとほぼ同等であり、熱膨張率の調整が容易で
ある。しかしながら、添加量が10wt%を超えると粒
界に析出部が生じ硬度、強度が低下する。添加は、単独
あるいは既に開示している添加材との組み合わせも有効
である。所望の硬度、熱膨張率に対応した組み合わせを
採用するのが望ましい。[0008] For the above composition, the present invention provides Sr, B
a, 0.1 to 10 at least one of the oxides of Ra
Add wt%. Oxides of Sr, Ba, and Ra are substances that improve sinterability, and addition of 0.1 wt% or more increases density and improves hardness and strength. In addition, the coefficient of thermal expansion is Ni
It is almost equivalent to O and CoO, and the coefficient of thermal expansion can be easily adjusted. However, if the amount added exceeds 10 wt%, precipitation occurs at grain boundaries, resulting in a decrease in hardness and strength. It is effective to add it alone or in combination with previously disclosed additives. It is desirable to adopt a combination that corresponds to the desired hardness and coefficient of thermal expansion.
【0009】次に、基板の製造方法について記す。市販
の各酸化物を原料として、所望組成になるよう秤量し、
ボ−ルミルにより混合する。混合は例えばエタノ−ル中
湿式ボ−ルミルで10〜30時間行なう。乾燥後、CI
P成形し、例えばAr中850〜1100℃で仮焼し、
次いで粗砕機を用いて粉砕し、100〜200μmの篩
で篩分けを行なう。仮焼粉はさらに例えばエタノ−ル中
湿式ボ−ルミルで20〜72時間処理し、1μm以下に
微粉砕する。これを造粒後、CIP成形し、例えば酸素
中1230〜1400℃で焼結し、その後、HIP処理
を行なう。HIP処理条件は、80〜120MPa、1
200〜1350℃、1〜2時間が望ましい。Next, a method for manufacturing the substrate will be described. Weigh commercially available oxides as raw materials to obtain the desired composition,
Mix by ball mill. Mixing is carried out, for example, in a wet ball mill in ethanol for 10 to 30 hours. After drying, CI
P-molded and calcined at 850 to 1100°C in Ar, for example,
Next, it is crushed using a coarse crusher and sieved through a 100 to 200 μm sieve. The calcined powder is further treated, for example, in a wet ball mill in ethanol for 20 to 72 hours, and pulverized to 1 μm or less. After granulation, this is subjected to CIP molding, sintered at 1230 to 1400° C. in oxygen, for example, and then subjected to HIP treatment. HIP processing conditions are 80 to 120 MPa, 1
Preferably, the temperature is 200-1350°C for 1-2 hours.
【0010】このようにして得られた焼結体は、緻密で
岩塩型構造を有し、テ−プの摺動による摩擦やエッヂ部
の欠けが少なく従来の材料よりも優れていることが確認
できた。[0010] It has been confirmed that the sintered body thus obtained has a dense, rock-salt-type structure, and is superior to conventional materials in that there is less friction caused by sliding of the tape and less chipping of edges. did it.
【0011】以下、本発明の実施例について説明する。Examples of the present invention will be described below.
【実施例1】CoO、NiOを原料にCoO/NiO(
モル比)=35/65組成となるように調整し、これに
添加材として酸化ストロンチウムを表1のように混合し
た。混合は、エタノ−ル中湿式ボ−ルミルで20時間行
なった。この混合粉をAr中1000℃で仮焼後、エタ
ノ−ルの湿式ボ−ルミルで40時間粉砕した。この粉砕
粉をCIP成形後酸素中1350℃で焼結した。これを
1250℃、100MPa、1時間のHIP処理を行な
った。焼結体の相対密度は、99%を超える値であった
。[Example 1] CoO/NiO (
The composition was adjusted to have a molar ratio of 35/65, and strontium oxide was mixed therein as an additive as shown in Table 1. Mixing was carried out in a wet ball mill in ethanol for 20 hours. This mixed powder was calcined at 1000° C. in Ar, and then ground in an ethanol wet ball mill for 40 hours. This pulverized powder was sintered at 1350° C. in oxygen after CIP molding. This was subjected to HIP treatment at 1250° C., 100 MPa, and 1 hour. The relative density of the sintered body was over 99%.
【0012】この実施例による焼結体の物性値を表1に
示す。物性値としては、熱膨張率(α:μm/m℃)と
ビッカース硬度(Hv)を選択した。Table 1 shows the physical properties of the sintered body of this example. As physical property values, thermal expansion coefficient (α: μm/m° C.) and Vickers hardness (Hv) were selected.
【0013】比較例として、従来の材料であるチタン酸
バリウムと基本組成は同じで添加材の量を変えた場合の
物性値を併記した。[0013] As a comparative example, the physical property values are also shown when the basic composition is the same as that of barium titanate, which is a conventional material, but the amount of additives is changed.
【表1】
*は比較例である。
熱膨張率は、基本組成でほぼ決定され、本実施例の範囲
では13.8±0.2μm/m℃である。この値は磁性
膜構造体とほぼ等価の値である。表1より硬度の低下が
著しいことから添加量は10wt%以内とすることが必
要である。[Table 1] * indicates a comparative example. The coefficient of thermal expansion is approximately determined by the basic composition, and is 13.8±0.2 μm/m° C. in the range of this example. This value is approximately equivalent to that of the magnetic film structure. Table 1 shows that the decrease in hardness is significant, so the amount added needs to be within 10 wt%.
【0014】[0014]
【実施例2】CoO、NiOを原料にCoO/NiO(
モル比)=35/65組成となるように調整し、これに
添加材として酸化バリウムを表2のように混合した。
混合は、エタノ−ル中湿式ボ−ルミルで20時間行なっ
た。この混合粉をAr中1000℃で仮焼後、エタノ−
ルの湿式ボ−ルミルで40時間粉砕した。この粉砕粉を
CIP成形後酸素中1350℃で焼結した。これを12
50℃、100MPa、1時間のHIP処理を行なった
。焼結体の相対密度は、99%を超える値であった。[Example 2] CoO/NiO (
The composition was adjusted to have a molar ratio of 35/65, and barium oxide was mixed therein as an additive as shown in Table 2. Mixing was carried out in a wet ball mill in ethanol for 20 hours. After calcining this mixed powder at 1000℃ in Ar,
The mixture was ground in a wet ball mill for 40 hours. This pulverized powder was sintered at 1350° C. in oxygen after CIP molding. This is 12
HIP treatment was performed at 50° C., 100 MPa, and 1 hour. The relative density of the sintered body was over 99%.
【0015】この実施例による焼結体の物性値を表2に
示す。物性値としては、表1と同様に熱膨張率とビッカ
ース硬度を選択した。Table 2 shows the physical properties of the sintered body of this example. As the physical property values, the coefficient of thermal expansion and Vickers hardness were selected as in Table 1.
【0016】比較例として、従来の材料であるチタン酸
バリウムと基本組成は同じで添加材の量を変えた場合の
物性値を併記した。[0016] As a comparative example, the physical property values are also shown when the basic composition is the same as that of barium titanate, which is a conventional material, but the amount of additives is changed.
【表2】
*は比較例である。
熱膨張率は、基本組成でほぼ決定され、本実施例の範囲
では13.8±0.2μm/m℃である。この値は磁性
膜構造体とほぼ等価の値である。従って、表2より添加
量は10wt%以内とすることが必要である。[Table 2] * indicates a comparative example. The coefficient of thermal expansion is approximately determined by the basic composition, and is 13.8±0.2 μm/m° C. in the range of this example. This value is approximately equivalent to that of the magnetic film structure. Therefore, from Table 2, it is necessary that the amount added be within 10 wt%.
【0017】[0017]
【発明の効果】以上説明したように、(1)本組成の非
磁性基板は、熱膨張率、硬度とも磁性膜構造体とほぼ同
等の特性を得ることができる。このため、磁性膜構造体
の剥離やクラックの発生を著しく防止できる。As explained above, (1) the non-magnetic substrate of the present composition can obtain properties almost equivalent to those of the magnetic film structure in terms of coefficient of thermal expansion and hardness. Therefore, peeling and cracking of the magnetic film structure can be significantly prevented.
【0018】(2)さらに、硬度を高めることにより磁
気ヘッドの短寿命化や非磁性基板の変形、割れ等を抑え
ることができ、ヘッドの耐摩耗性、耐久性に特にすぐれ
ている利点がある。(2) Furthermore, by increasing the hardness, it is possible to shorten the life of the magnetic head and suppress deformation and cracking of the non-magnetic substrate, which has the advantage that the head has particularly excellent wear resistance and durability. .
Claims (1)
本組成として、該組成物に対してSr、Ba、Raの酸
化物のうち少なくとも一種を0.1〜10wt%添加し
たことを特徴とする磁気ヘッド用非磁性基板。1. For a magnetic head, characterized in that the basic composition is CoO and NiO or NiO, and 0.1 to 10 wt% of at least one of oxides of Sr, Ba, and Ra is added to the composition. Non-magnetic substrate.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3065339A JPH04279011A (en) | 1991-03-07 | 1991-03-07 | Nonmagnetic substrate for magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3065339A JPH04279011A (en) | 1991-03-07 | 1991-03-07 | Nonmagnetic substrate for magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04279011A true JPH04279011A (en) | 1992-10-05 |
Family
ID=13284089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3065339A Pending JPH04279011A (en) | 1991-03-07 | 1991-03-07 | Nonmagnetic substrate for magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04279011A (en) |
-
1991
- 1991-03-07 JP JP3065339A patent/JPH04279011A/en active Pending
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