JPH04251417A - Nonmagnetic substrate for magnetic head - Google Patents

Nonmagnetic substrate for magnetic head

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Publication number
JPH04251417A
JPH04251417A JP3050264A JP5026491A JPH04251417A JP H04251417 A JPH04251417 A JP H04251417A JP 3050264 A JP3050264 A JP 3050264A JP 5026491 A JP5026491 A JP 5026491A JP H04251417 A JPH04251417 A JP H04251417A
Authority
JP
Japan
Prior art keywords
magnetic
nonmagnetic substrate
nio
substrate
hardness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3050264A
Other languages
Japanese (ja)
Inventor
Ryuichi Nagase
隆一 長瀬
Takayuki Tsukada
高行 塚田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Nikko Kyodo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd, Nikko Kyodo Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP3050264A priority Critical patent/JPH04251417A/en
Publication of JPH04251417A publication Critical patent/JPH04251417A/en
Pending legal-status Critical Current

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  • Magnetic Heads (AREA)
  • Hard Magnetic Materials (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To provide the nonmagnetic substrate for magnetic heads for vapor deposition of metallic magnetic films. CONSTITUTION:This nonmagnetic substrate for magnetic heads is formed by using CoO and NiO or NiO as a basic compsn. and adding at least one kind among the silicides of Ti, Zr, Nb, Ta, Cr, Mo, and W at 0.1 to 1wt.% to this compsn. Characteristics nearly equal to the characteristics of the structural body of the magnetic film in both of coefft. of thermal expansion and hardness are obtd. with the nonmagnetic substrate of this compsn. The peeling of the structural body of the magnetic film and the generation of cracks are, therefore, drastically prevented. The shortened life of the magnetic head and the deformation, crack, etc., of the nonmagnetic substrate are suppressed by increasing the hardness. This substrate has the advantage that the substrate is particularly excellent in the wear resistance and durability of the heads.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、金属性磁性膜を蒸着す
るための非磁性の磁気ヘッド用非磁性基板に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nonmagnetic substrate for a magnetic head on which a metallic magnetic film is deposited.

【0002】0002

【従来技術】従来この種の用途のものとしては、チタン
酸バリウム、チタン酸カルシウム、アルミナ等が使用さ
れていた。しかしながら、その熱膨張率が磁性膜構造体
と大きく異なっていたため、蒸着した磁性膜構造体が剥
離しやすく、また熱膨張率の差により応力が発生しクラ
ックが発生することがあった。
BACKGROUND OF THE INVENTION Conventionally, barium titanate, calcium titanate, alumina, etc. have been used for this type of use. However, since its coefficient of thermal expansion was significantly different from that of the magnetic film structure, the deposited magnetic film structure was likely to peel off, and the difference in coefficient of thermal expansion caused stress and cracks.

【0003】さらに、従来の材料は硬さが低く、特に高
保磁力テ−プ(いわゆるメタルテ−プ)が使用された場
合には、非磁性基板が磁性膜構造体と硬度及び耐摩耗性
が異なり、磁気テ−プとの摺動により発生する摩擦のた
めに偏摩耗等を引き起こし、磁気特性に変化をきたすと
いう問題があった。特に硬度が低い場合には、磁気ヘッ
ドの寿命が短くなること、あるいは非磁性基板の変形や
割れ及び剥離を引き起こすといった欠点が顕著であった
Furthermore, conventional materials have low hardness, and especially when a high coercive force tape (so-called metal tape) is used, the hardness and wear resistance of the nonmagnetic substrate are different from those of the magnetic film structure. There was a problem in that the friction generated by sliding with the magnetic tape caused uneven wear and the like, resulting in changes in magnetic properties. In particular, when the hardness is low, the disadvantages are that the life of the magnetic head is shortened or that the nonmagnetic substrate is deformed, cracked, or peeled off.

【0004】本発明者等は上記の欠点を解決すべく酸化
物系セラミックスについて研究を進め、CoO及びNi
OまたはNiOを基本組成とした酸化物が有効であると
して既に開示した。(特開平01−287811、特開
平02−168602、特願平01−214206)さ
らに硬度や密度の向上を図るための添加材を検討し、C
oO、NiOを基本組成として、酸化マンガン、二酸化
チタン、アルミナ、カルシアのうち1種以上を0.1〜
5wt%添加した場合、及び1〜5wt%のイットリア
、0.1〜1%の窒化チタン、0.3〜2wt%の酸化
ホウ素のうち1種以上を添加した場合、あるいは1〜5
wt%の二酸化ケイ素を添加した場合の有効性を確認し
これらを開示した。(特開平02−94408、特願平
01−159622、特願平01−214208)
The present inventors have conducted research on oxide ceramics in order to solve the above-mentioned drawbacks, and have
It has already been disclosed that oxides having a basic composition of O or NiO are effective. (JP 01-287811, JP 02-168602, JP 01-214206) Furthermore, we investigated additives to improve hardness and density.
The basic composition is oO, NiO, and one or more of manganese oxide, titanium dioxide, alumina, and calcia at 0.1~
When adding 5 wt%, and when adding one or more of 1 to 5 wt% yttria, 0.1 to 1% titanium nitride, 0.3 to 2 wt% boron oxide, or 1 to 5 wt%
The effectiveness of adding wt% silicon dioxide was confirmed and these were disclosed. (JP 02-94408, JP 01-159622, JP 01-214208)

【0
005】
0
005]

【問題点を解決するための手段】以上の問題点を解決す
るために、本発明者等はCoO及びNiOあるいはNi
Oを基本組成とした添加材の検討を更に続けた結果、該
組成物に対してTi,Zr,Nb,Ta,Cr,Mo,
Wのケイ化物のうち少なくとも一種を0.1〜1wt%
添加した場合に、上記の特性を満たすことを見い出した
。従って、本発明の目的は、具体的には蒸着した磁性膜
構造体に近い熱膨張率を有し、ビッカ−ス硬度が高く、
さらに他のヘッド構成材料間で過度の化学的侵食反応を
起こさない材料を提供することである。
[Means for Solving the Problems] In order to solve the above problems, the present inventors have developed a method using CoO and NiO or Ni.
As a result of further investigation into additives with O as the basic composition, we found that the composition contained Ti, Zr, Nb, Ta, Cr, Mo,
0.1 to 1 wt% of at least one type of W silicide
It has been found that when added, the above characteristics are satisfied. Therefore, specifically, the object of the present invention is to have a thermal expansion coefficient close to that of a deposited magnetic film structure, high Vickers hardness,
Furthermore, it is an object of the present invention to provide a material that does not cause excessive chemical erosion reactions between other head constituent materials.

【0006】[0006]

【発明の構成】即ち、本発明は、CoO及びNiOある
いはNiOを基本組成として、該組成物に対してTi,
Zr,Nb,Ta,Cr,Mo,Wのケイ化物のうち少
なくとも一種を0.1〜1wt%添加したことを特徴と
する磁気ヘッド用非磁性基板を提供する。
[Structure of the Invention] That is, the present invention uses CoO and NiO or NiO as a basic composition, and Ti,
Provided is a nonmagnetic substrate for a magnetic head, characterized in that 0.1 to 1 wt% of at least one of silicides of Zr, Nb, Ta, Cr, Mo, and W is added.

【0007】[0007]

【発明の具体的説明】本発明の理解を容易にするため具
体的かつ詳細に説明する。基本組成は、NiO単独の酸
化物あるいはNiOとCoOの複合酸化物を意味し、例
えば、CoO/NiO(モル比)=0/100〜80/
20で、より好ましくは、CoO/NiO(モル比)=
3/97〜60/40である。
DETAILED DESCRIPTION OF THE INVENTION In order to facilitate understanding of the present invention, the present invention will be explained specifically and in detail. The basic composition means an oxide of NiO alone or a composite oxide of NiO and CoO, for example, CoO/NiO (molar ratio) = 0/100 to 80/
20, more preferably CoO/NiO (molar ratio)=
3/97 to 60/40.

【0008】上記組成物に対して、本発明は、Ti,Z
r,Nb,Ta,Cr,Mo,Wのケイ化物のうち少な
くとも一種を0.1〜1wt%添加する。Ti,Zr,
Nb,Ta,Cr,Mo,Wのケイ化物は粒成長抑制効
果のある物質で、0.1wt%以上の添加により粒径を
抑制し、緻密化を進行させる。このため、相対密度が高
く硬度も向上するにもかかわらず、機械加工に優れたも
のとなる。しかしながら熱膨張率がNiO、CoOより
低く、添加量が1wt%を超えると熱膨張率の調整が困
難となる。また、1wt%を超えると焼結時に粒界に液
相の生成が観察され、粒径が大きくなるとともに粒界強
度が低下し、機械的強度が劣化する。添加は、単独ある
いは既に開示している添加材との組み合わせも有効であ
る。所望の硬度、熱膨張率に対応した組み合わせを採用
するのが望ましい。
[0008] For the above composition, the present invention provides Ti, Z
At least one of silicides of r, Nb, Ta, Cr, Mo, and W is added in an amount of 0.1 to 1 wt%. Ti, Zr,
Silicides of Nb, Ta, Cr, Mo, and W are substances that have the effect of suppressing grain growth, and when added in an amount of 0.1 wt% or more, the grain size is suppressed and densification is promoted. Therefore, although the relative density is high and the hardness is improved, it is excellent in machining. However, the coefficient of thermal expansion is lower than that of NiO and CoO, and if the amount added exceeds 1 wt%, it becomes difficult to adjust the coefficient of thermal expansion. Moreover, if it exceeds 1 wt%, the formation of a liquid phase is observed at the grain boundaries during sintering, and as the grain size increases, the grain boundary strength decreases, and the mechanical strength deteriorates. It is effective to add it alone or in combination with previously disclosed additives. It is desirable to adopt a combination that corresponds to the desired hardness and coefficient of thermal expansion.

【0009】次に、基板の製造方法について記す。市販
の酸化物、ケイ化物を原料として、所望組成になるよう
秤量し、ボ−ルミルにより混合する。混合は例えばエタ
ノ−ル中湿式ボ−ルミルで10〜30時間行なう。乾燥
後、CIP成形し、例えばAr中850〜1100℃で
仮焼し、次いで粗砕機を用いて粉砕し、100〜200
μmの篩で篩分けを行なう。仮焼粉はさらに例えばエタ
ノ−ル中湿式ボ−ルミルで20〜72時間処理し、1μ
m以下に微粉砕する。これを造粒後、CIP成形し、例
えば酸素中1230〜1400℃で焼結し、その後、H
IP処理を行なう。HIP処理条件は、80〜120M
Pa、1200〜1350℃、1〜2時間が望ましい。
Next, a method for manufacturing the substrate will be described. Commercially available oxides and silicides are used as raw materials, weighed to give the desired composition, and mixed in a ball mill. Mixing is carried out, for example, in a wet ball mill in ethanol for 10 to 30 hours. After drying, CIP molding is performed, calcined at 850 to 1100°C in Ar, for example, and then pulverized using a coarse crusher to obtain 100 to 200
Sieve with a μm sieve. The calcined powder is further treated in a wet ball mill in ethanol for 20 to 72 hours to reduce the
Finely pulverize to less than m. After granulating this, it is subjected to CIP molding, sintered at 1230 to 1400°C in oxygen, for example, and then H
Performs IP processing. HIP processing conditions are 80-120M
Pa, 1200-1350°C, 1-2 hours is desirable.

【0010】このようにして得られた焼結体は、緻密で
岩塩型構造を有し、テ−プの摺動による摩擦やエッヂ部
の欠けが少なく従来の材料よりも優れていることが確認
できた。
[0010] It has been confirmed that the sintered body thus obtained has a dense, rock-salt-type structure, and is superior to conventional materials in that there is less friction caused by sliding of the tape and less chipping of edges. did it.

【0011】以下、本発明の実施例について説明する。Examples of the present invention will be described below.

【実施例1】CoO、NiOを原料にCoO/NiO(
モル比)=35/65組成となるように調整し、これに
添加材として二ケイ化モリブデン(Moケイ化物)を表
1のように混合した。混合は、エタノ−ル中湿式ボ−ル
ミルで20時間行なった。この混合粉をAr中1000
℃で仮焼後、エタノ−ルの湿式ボ−ルミルで40時間粉
砕した。この粉砕粉をCIP成形後酸素中1350℃で
焼結した。これを1250℃、100MPa、1時間の
HIP処理を行なった。焼結体の相対密度は、99%を
超える値であった。
[Example 1] CoO/NiO (
Molybdenum disilicide (Mo silicide) was mixed therein as an additive as shown in Table 1. Mixing was carried out in a wet ball mill in ethanol for 20 hours. Add this mixed powder to 1000 ml of Ar
After calcining at ℃, the mixture was pulverized in an ethanol wet ball mill for 40 hours. This pulverized powder was sintered at 1350° C. in oxygen after CIP molding. This was subjected to HIP treatment at 1250° C., 100 MPa, and 1 hour. The relative density of the sintered body was over 99%.

【0012】この実施例による焼結体の物性値を表1に
示す。物性値としては、熱膨張率(α:μm/m℃)と
ビッカース硬度(Hv)を選択した。
Table 1 shows the physical properties of the sintered body of this example. As physical property values, thermal expansion coefficient (α: μm/m° C.) and Vickers hardness (Hv) were selected.

【0013】比較例として、従来の材料であるチタン酸
バリウムと基本組成は同じで添加材の量を変えた場合の
物性値を併記した。
[0013] As a comparative example, the physical property values are also shown when the basic composition is the same as that of barium titanate, which is a conventional material, but the amount of additives is changed.

【表1】 *は比較例である。 熱膨張率は、基本組成でほぼ決定され、本実施例の範囲
では13.8±0.2μm/m℃である。この値は磁性
膜構造体とほぼ等価の値である。従って、表1よりケイ
化物の添加量は1wt%以内とすることが必要である。
[Table 1] * indicates a comparative example. The coefficient of thermal expansion is approximately determined by the basic composition, and is 13.8±0.2 μm/m° C. in the range of this example. This value is approximately equivalent to that of the magnetic film structure. Therefore, from Table 1, the amount of silicide added must be within 1 wt%.

【0014】[0014]

【実施例2】CoO、NiOを原料にCoO/NiO(
モル比)=35/65組成となるように調整し、これに
添加材として二ケイ化タングステン(Wケイ化物)を表
2のように混合した。混合は、エタノ−ル中湿式ボ−ル
ミルで20時間行なった。この混合粉をAr中1000
℃で仮焼後、エタノ−ルの湿式ボ−ルミルで40時間粉
砕した。この粉砕粉をCIP成形後酸素中1350℃で
焼結した。これを1250℃、100MPa、1時間の
HIP処理を行なった。焼結体の相対密度は、99%を
超える値であった。
[Example 2] CoO/NiO (
The composition was adjusted to have a molar ratio of 35/65, and tungsten disilicide (W silicide) was mixed therein as an additive as shown in Table 2. Mixing was carried out in a wet ball mill in ethanol for 20 hours. Add this mixed powder to 1000 ml of Ar
After calcining at °C, the mixture was pulverized in an ethanol wet ball mill for 40 hours. This pulverized powder was sintered at 1350° C. in oxygen after CIP molding. This was subjected to HIP treatment at 1250° C., 100 MPa, and 1 hour. The relative density of the sintered body was over 99%.

【0015】この実施例による焼結体の物性値を表2に
示す。物性値としては、表1と同様に熱膨張率とビッカ
ース硬度を選択した。
Table 2 shows the physical properties of the sintered body of this example. As the physical property values, the coefficient of thermal expansion and Vickers hardness were selected as in Table 1.

【0016】比較例として、従来の材料であるチタン酸
バリウムと基本組成は同じで添加材の量を変えた場合の
物性値を併記した。
[0016] As a comparative example, the physical property values are also shown when the basic composition is the same as that of barium titanate, which is a conventional material, but the amount of additives is changed.

【表2】 *は比較例である。 熱膨張率は、基本組成でほぼ決定され、本実施例の範囲
では13.8±0.2μm/m℃である。この値は磁性
膜構造体とほぼ等価の値である。従って、表2よりケイ
化物の添加量は1wt%以内とすることが必要である。
[Table 2] * indicates a comparative example. The coefficient of thermal expansion is approximately determined by the basic composition, and is 13.8±0.2 μm/m° C. in the range of this example. This value is approximately equivalent to that of the magnetic film structure. Therefore, from Table 2, the amount of silicide added must be within 1 wt%.

【0017】[0017]

【発明の効果】以上説明したように、(1)本組成の非
磁性基板は、熱膨張率、硬度とも磁性膜構造体とほぼ同
等の特性を得ることができる。このため、磁性膜構造体
の剥離やクラックの発生を著しく防止できる。
As explained above, (1) the non-magnetic substrate of the present composition can obtain properties almost equivalent to those of the magnetic film structure in terms of coefficient of thermal expansion and hardness. Therefore, peeling and cracking of the magnetic film structure can be significantly prevented.

【0018】(2)さらに、硬度を高めることにより磁
気ヘッドの短寿命化や非磁性基板の変形、割れ等を抑え
ることができ、ヘッドの耐摩耗性、耐久性に特にすぐれ
ている利点がある。
(2) Furthermore, by increasing the hardness, it is possible to shorten the life of the magnetic head and suppress deformation and cracking of the non-magnetic substrate, which has the advantage that the head has particularly excellent wear resistance and durability. .

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  CoO及びNiOあるいはNiOを基
本組成として、該組成物に対してTi,Zr,Nb,T
a,Cr,Mo,Wのケイ化物のうち少なくとも一種を
0.1〜1wt%添加したことを特徴とする磁気ヘッド
用非磁性基板。
Claim 1: CoO and NiO or NiO are the basic compositions, and Ti, Zr, Nb, T
1. A nonmagnetic substrate for a magnetic head, characterized in that 0.1 to 1 wt% of at least one of silicides of a, Cr, Mo, and W is added.
JP3050264A 1990-12-21 1991-02-25 Nonmagnetic substrate for magnetic head Pending JPH04251417A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3050264A JPH04251417A (en) 1990-12-21 1991-02-25 Nonmagnetic substrate for magnetic head

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2-412715 1990-12-21
JP41271590 1990-12-21
JP3050264A JPH04251417A (en) 1990-12-21 1991-02-25 Nonmagnetic substrate for magnetic head

Publications (1)

Publication Number Publication Date
JPH04251417A true JPH04251417A (en) 1992-09-07

Family

ID=26390719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3050264A Pending JPH04251417A (en) 1990-12-21 1991-02-25 Nonmagnetic substrate for magnetic head

Country Status (1)

Country Link
JP (1) JPH04251417A (en)

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