JPH04269809A - Nonmagnetic substrate for magnetic head - Google Patents

Nonmagnetic substrate for magnetic head

Info

Publication number
JPH04269809A
JPH04269809A JP3050256A JP5025691A JPH04269809A JP H04269809 A JPH04269809 A JP H04269809A JP 3050256 A JP3050256 A JP 3050256A JP 5025691 A JP5025691 A JP 5025691A JP H04269809 A JPH04269809 A JP H04269809A
Authority
JP
Japan
Prior art keywords
nonmagnetic substrate
magnetic
nio
hardness
film structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3050256A
Other languages
Japanese (ja)
Inventor
Ryuichi Nagase
隆一 長瀬
Akira Kato
晃 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Nikko Kyodo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd, Nikko Kyodo Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP3050256A priority Critical patent/JPH04269809A/en
Publication of JPH04269809A publication Critical patent/JPH04269809A/en
Pending legal-status Critical Current

Links

Landscapes

  • Compositions Of Oxide Ceramics (AREA)
  • Magnetic Heads (AREA)
  • Hard Magnetic Materials (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To obtain a nonmagnetic substrate for magnetic heads for vapor- depositing metallic magnetic films. CONSTITUTION:This nonmagnetic substrate for magnetic heads is composed basically of CoO and NiO or NiO containing a Rhenium oxide by 0.1-5wt.%. The nonmagnetic substrate for magnetic heads of such composition has nearly the same characteristics as magnetic film structure bodies have with respect to the coefficient of thermal expansion and hardness. Therefore, the occurrence of the delamination and cracking in the magnetic film structure bodies can be remarkably prevented. In addition, when the hardness is further increased, shortening of the service life of magnetic heads, deformation and cracking of the nonmagnetic substrate, etc., can be suppressed and the wear resistance and durability of the heads can be improved.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は、金属性磁性膜を蒸着す
るための非磁性の磁気ヘッド用非磁性基板に関するもの
である。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nonmagnetic substrate for a magnetic head on which a metallic magnetic film is deposited.

【0002】0002

【従来技術】従来この種の用途のものとしては、チタン
酸バリウム、チタン酸カルシウム、アルミナ等が使用さ
れていた。しかしながら、その熱膨張率が磁性膜構造体
と大きく異なっていたため、蒸着した磁性膜構造体が剥
離しやすく、また熱膨張率の差により応力が発生しクラ
ックが発生することがあった。
BACKGROUND OF THE INVENTION Conventionally, barium titanate, calcium titanate, alumina, etc. have been used for this type of use. However, since its coefficient of thermal expansion was significantly different from that of the magnetic film structure, the deposited magnetic film structure was likely to peel off, and the difference in coefficient of thermal expansion caused stress and cracks.

【0003】さらに、従来の材料は硬さが低く、特に高
保磁力テ−プ(いわゆるメタルテ−プ)が使用された場
合には、非磁性基板が磁性膜構造体と硬度及び耐摩耗性
が異なり、磁気テ−プとの摺動により発生する摩擦のた
めに偏摩耗等を引き起こし、磁気特性に変化をきたすと
いう問題があった。特に硬度が低い場合には、磁気ヘッ
ドの寿命が短くなること、あるいは非磁性基板の変形や
割れ及び剥離を引き起こすといった欠点が顕著であった
Furthermore, conventional materials have low hardness, and especially when a high coercive force tape (so-called metal tape) is used, the hardness and wear resistance of the nonmagnetic substrate are different from those of the magnetic film structure. There was a problem in that the friction generated by sliding with the magnetic tape caused uneven wear and the like, resulting in changes in magnetic properties. In particular, when the hardness is low, the disadvantages are that the life of the magnetic head is shortened or that the nonmagnetic substrate is deformed, cracked, or peeled off.

【0004】本発明者等は上記の欠点を解決すべく酸化
物系セラミックスについて研究を進め、CoO及びNi
OまたはNiOを基本組成とした酸化物が有効であると
して既に開示した。(特開平01−287811、特開
平02−168602、特願平01−214206)さ
らに硬度や密度の向上を図るための添加材を検討し、C
oO、NiOを基本組成として、酸化マンガン、二酸化
チタン、アルミナ、カルシアのうち1種以上を0.1〜
5wt%添加した場合、及び1〜5wt%のイットリア
、0.1〜1%の窒化チタン、0.3〜2wt%の酸化
ホウ素のうち1種以上を添加した場合、あるいは1〜5
wt%の二酸化ケイ素を添加した場合の有効性を確認し
これらを開示した。(特開平02−94408、特願平
01−159622、特願平01−214208)
The present inventors have conducted research on oxide ceramics in order to solve the above-mentioned drawbacks, and have
It has already been disclosed that oxides having a basic composition of O or NiO are effective. (JP 01-287811, JP 02-168602, JP 01-214206) Furthermore, we investigated additives to improve hardness and density.
The basic composition is oO, NiO, and one or more of manganese oxide, titanium dioxide, alumina, and calcia at 0.1~
When adding 5 wt%, and when adding one or more of 1 to 5 wt% yttria, 0.1 to 1% titanium nitride, 0.3 to 2 wt% boron oxide, or 1 to 5 wt%
The effectiveness of adding wt% silicon dioxide was confirmed and these were disclosed. (JP 02-94408, JP 01-159622, JP 01-214208)

【0
005】
0
005]

【問題点を解決するための手段】以上の問題点を解決す
るために、本発明者等はCoO及びNiOあるいはNi
Oを基本組成とした添加材の検討を更に続けた結果、該
組成物に対して酸化レニウムを0.1〜5wt%添加し
た場合に、上記の特性を満たすことを見い出した。従っ
て、本発明の目的は、具体的には蒸着した磁性膜構造体
に近い熱膨張率を有し、ビッカ−ス硬度が高く、さらに
他のヘッド構成材料間で過度の化学的侵食反応を起こさ
ない材料を提供することである。
[Means for Solving the Problems] In order to solve the above problems, the present inventors have developed a method using CoO and NiO or Ni.
As a result of further studies on additives whose basic composition is O, it was found that the above characteristics were satisfied when 0.1 to 5 wt % of rhenium oxide was added to the composition. Therefore, specifically, the object of the present invention is to have a thermal expansion coefficient close to that of a deposited magnetic film structure, a high Vickers hardness, and a structure that does not cause excessive chemical erosion reactions between other head constituent materials. There is no material to offer.

【0006】[0006]

【発明の構成】即ち、本発明は、CoO及びNiOある
いはNiOを基本組成として、該組成物に対して酸化レ
ニウムを0.1〜5wt%添加したことを特徴とする磁
気ヘッド用非磁性基板を提供する。
[Structure of the Invention] That is, the present invention provides a nonmagnetic substrate for a magnetic head, which has a basic composition of CoO and NiO or NiO, and has 0.1 to 5 wt% of rhenium oxide added to the composition. provide.

【0007】[0007]

【発明の具体的説明】本発明の理解を容易にするため具
体的かつ詳細に説明する。基本組成は、NiO単独の酸
化物あるいはNiOとCoOの複合酸化物を意味し、例
えば、CoO/NiO(モル比)=0/100〜80/
20で、より好ましくは、CoO/NiO(モル比)=
3/97〜60/40である。
DETAILED DESCRIPTION OF THE INVENTION In order to facilitate understanding of the present invention, the present invention will be explained specifically and in detail. The basic composition means an oxide of NiO alone or a composite oxide of NiO and CoO, for example, CoO/NiO (molar ratio) = 0/100 to 80/
20, more preferably CoO/NiO (molar ratio)=
3/97 to 60/40.

【0008】上記組成物に対して、本発明では、酸化レ
ニウムを0.1〜5wt%添加する。酸化レニウムは焼
結促進効果のある物質で、0.1wt%以上の添加によ
り緻密化を進行させる。このため相対密度が高く硬度も
向上する。しかしながら熱膨張率がNiO、CoOより
低く、添加量が5wt%を超えると熱膨張率の調整が困
難となる。添加は、単独あるいは既に開示している添加
材との組み合わせも有効である。所望の硬度、熱膨張率
に対応した組み合わせを採用するのが望ましい。
In the present invention, 0.1 to 5 wt % of rhenium oxide is added to the above composition. Rhenium oxide is a substance that has the effect of promoting sintering, and when added in an amount of 0.1 wt% or more, densification progresses. Therefore, the relative density is high and the hardness is also improved. However, the coefficient of thermal expansion is lower than that of NiO and CoO, and if the amount added exceeds 5 wt%, it becomes difficult to adjust the coefficient of thermal expansion. It is effective to add it alone or in combination with previously disclosed additives. It is desirable to adopt a combination that corresponds to the desired hardness and coefficient of thermal expansion.

【0009】次に、基板の製造方法について記す。市販
の各酸化物を原料として、所望組成になるよう秤量し、
ボ−ルミルにより混合する。混合は例えばエタノ−ル中
湿式ボ−ルミルで10〜30時間行なう。乾燥後、CI
P成形し、例えばAr中850〜1100℃で仮焼し、
次いで粗砕機を用いて粉砕し、100〜200μmの篩
で篩分けを行なう。仮焼粉はさらに例えばエタノ−ル中
湿式ボ−ルミルで20〜72時間処理し、1μm以下に
微粉砕する。これを造粒後、CIP成形し、例えば酸素
中1230〜1400℃で焼結し、その後、HIP処理
を行なう。HIP処理条件は、80〜120MPa、1
200〜1350℃、1〜2時間が望ましい。
Next, a method for manufacturing the substrate will be described. Weigh commercially available oxides as raw materials to obtain the desired composition,
Mix by ball mill. Mixing is carried out, for example, in a wet ball mill in ethanol for 10 to 30 hours. After drying, CI
P-molded and calcined at 850 to 1100°C in Ar, for example,
Next, it is crushed using a coarse crusher and sieved through a 100 to 200 μm sieve. The calcined powder is further treated, for example, in a wet ball mill in ethanol for 20 to 72 hours, and pulverized to 1 μm or less. After granulation, this is subjected to CIP molding, sintered at 1230 to 1400° C. in oxygen, for example, and then subjected to HIP treatment. HIP processing conditions are 80 to 120 MPa, 1
Preferably, the temperature is 200-1350°C for 1-2 hours.

【0010】このようにして得られた焼結体は、緻密で
岩塩型構造を有し、テ−プの摺動による摩擦やエッヂ部
の欠けが少なく従来の材料よりも優れていることが確認
できた。
[0010] It has been confirmed that the sintered body thus obtained has a dense, rock-salt-type structure, and is superior to conventional materials in that there is less friction caused by sliding of the tape and less chipping of edges. did it.

【0011】以下、本発明の実施例について説明する。Examples of the present invention will be described below.

【実施例1】CoO、NiOを原料にCoO/NiO(
モル比)=35/65組成となるように調整し、これに
添加材として酸化レニウムを表1のように混合した。 混合は、エタノ−ル中湿式ボ−ルミルで20時間行なっ
た。この混合粉をAr中1000℃で仮焼後、エタノ−
ルの湿式ボ−ルミルで40時間粉砕した。この粉砕粉を
CIP成形後酸素中1350℃で焼結した。これを12
50℃、100MPa、1時間のHIP処理を行なった
。焼結体の相対密度は、99%を超える値であった。
[Example 1] CoO/NiO (
The composition was adjusted to have a molar ratio of 35/65, and rhenium oxide was mixed therein as an additive as shown in Table 1. Mixing was carried out in a wet ball mill in ethanol for 20 hours. After calcining this mixed powder at 1000℃ in Ar,
The mixture was ground in a wet ball mill for 40 hours. This pulverized powder was sintered at 1350° C. in oxygen after CIP molding. This is 12
HIP treatment was performed at 50° C., 100 MPa, and 1 hour. The relative density of the sintered body was over 99%.

【0012】この実施例による焼結体の物性値を表1に
示す。物性値としては、熱膨張率(α:μm/m℃)と
ビッカース硬度(Hv)を選択した。
Table 1 shows the physical properties of the sintered body of this example. As physical property values, thermal expansion coefficient (α: μm/m° C.) and Vickers hardness (Hv) were selected.

【0013】比較例として、従来の材料であるチタン酸
バリウムと基本組成は同じで添加材の量を変えた場合の
物性値を併記した。
[0013] As a comparative example, the physical property values are also shown when the basic composition is the same as that of barium titanate, which is a conventional material, but the amount of additives is changed.

【表1】   熱膨張率は、基本組成でほぼ決定され、本実施例の
範囲では13.8±0.2μm/m℃である。この値は
磁性膜構造体とほぼ等価の値である。従って、表1より
添加量は5wt%以内とすることが必要である。
[Table 1] The coefficient of thermal expansion is almost determined by the basic composition, and is 13.8±0.2 μm/m° C. in the range of this example. This value is approximately equivalent to that of the magnetic film structure. Therefore, from Table 1, it is necessary that the amount added be within 5 wt%.

【0014】[0014]

【発明の効果】以上説明したように、(1)本組成の非
磁性基板は、熱膨張率、硬度とも磁性膜構造体とほぼ同
等の特性を得ることができる。このため、磁性膜構造体
の剥離やクラックの発生を著しく防止できる。
As explained above, (1) the non-magnetic substrate of the present composition can obtain properties almost equivalent to those of the magnetic film structure in terms of coefficient of thermal expansion and hardness. Therefore, peeling and cracking of the magnetic film structure can be significantly prevented.

【0015】(2)さらに、硬度を高めることにより磁
気ヘッドの短寿命化や非磁性基板の変形、割れ等を抑え
ることができ、ヘッドの耐摩耗性、耐久性に特にすぐれ
ている利点がある。
(2) Furthermore, by increasing the hardness, it is possible to shorten the life of the magnetic head and suppress deformation and cracking of the non-magnetic substrate, which has the advantage that the head has particularly excellent wear resistance and durability. .

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】  CoO及びNiOあるいはNiOを基
本組成として、該組成物に対して酸化レニウムを0.1
〜5wt%添加したことを特徴とする磁気ヘッド用非磁
性基板。
Claim 1: CoO and NiO or NiO are used as the basic composition, and rhenium oxide is added to the composition by 0.1.
A non-magnetic substrate for a magnetic head, characterized in that ~5 wt% is added.
JP3050256A 1991-02-25 1991-02-25 Nonmagnetic substrate for magnetic head Pending JPH04269809A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3050256A JPH04269809A (en) 1991-02-25 1991-02-25 Nonmagnetic substrate for magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3050256A JPH04269809A (en) 1991-02-25 1991-02-25 Nonmagnetic substrate for magnetic head

Publications (1)

Publication Number Publication Date
JPH04269809A true JPH04269809A (en) 1992-09-25

Family

ID=12853900

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3050256A Pending JPH04269809A (en) 1991-02-25 1991-02-25 Nonmagnetic substrate for magnetic head

Country Status (1)

Country Link
JP (1) JPH04269809A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006024925A (en) * 2004-06-29 2006-01-26 Sony Corp Magnetic material and micro electro-mechanical system device using the magnetic material

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006024925A (en) * 2004-06-29 2006-01-26 Sony Corp Magnetic material and micro electro-mechanical system device using the magnetic material
JP4581871B2 (en) * 2004-06-29 2010-11-17 ソニー株式会社 Magnetic material and micro electro mechanical system apparatus using magnetic material

Similar Documents

Publication Publication Date Title
JPH062615B2 (en) Magnetic head slider material
KR100321293B1 (en) Tetragonal zirconia-alumina ceramic powders
JPH04269809A (en) Nonmagnetic substrate for magnetic head
JPH04269810A (en) Nonmagnetic substrate for magnetic head
JPH04279012A (en) Nonmagnetic substrate for magnetic head
JPH04279011A (en) Nonmagnetic substrate for magnetic head
JPH04279010A (en) Nonmagnetic substrate for magnetic head
JPH04279009A (en) Nonmagnetic substrate for magnetic head
JPH04269811A (en) Nonmagnetic substrate for magnet head
JPH04273406A (en) Nonmagnetic substrate for magnetic head use
JPH04269813A (en) Nonmagnetic substrate for magnetic head
JPH04273405A (en) Nonmagnetic substrate for magnet head use
JPH04273407A (en) Nonmagnetic substrate for magnetic head use
JPH04269812A (en) Nonmagnetic substrate for magnetic head
JPH04251417A (en) Nonmagnetic substrate for magnetic head
JPH05283230A (en) Nonmagnetic board for magnetic head
JPH04251416A (en) Nonmagnetic substrate for magnetic head
JPH04214603A (en) Non-magnetic substrate for magnetic head
JPH0491402A (en) Magnetic substrate for magnetic head use
JPH04251412A (en) Nonmagnetic substrate for magnetic head
JPH0380411A (en) Nonmagnetic substrate for magnetic head
JPH02168602A (en) Non-magnetic substrate for magnetic head
JPH0380412A (en) Nonmagnetic substrate for magnetic head
JPH04269808A (en) Manufacture of nonmagnetic substrate for magnetic head
JPH0294408A (en) Nonmagnetic substrate for magnetic head