JPH0427540B2 - - Google Patents
Info
- Publication number
- JPH0427540B2 JPH0427540B2 JP63244067A JP24406788A JPH0427540B2 JP H0427540 B2 JPH0427540 B2 JP H0427540B2 JP 63244067 A JP63244067 A JP 63244067A JP 24406788 A JP24406788 A JP 24406788A JP H0427540 B2 JPH0427540 B2 JP H0427540B2
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- sample
- mask
- aperture
- spot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63244067A JPH01124856A (ja) | 1988-09-30 | 1988-09-30 | マスクの欠陥修正方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63244067A JPH01124856A (ja) | 1988-09-30 | 1988-09-30 | マスクの欠陥修正方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56153806A Division JPS5856332A (ja) | 1981-09-30 | 1981-09-30 | マスクの欠陥修正方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01124856A JPH01124856A (ja) | 1989-05-17 |
| JPH0427540B2 true JPH0427540B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1992-05-12 |
Family
ID=17113243
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63244067A Granted JPH01124856A (ja) | 1988-09-30 | 1988-09-30 | マスクの欠陥修正方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01124856A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8409672B2 (en) * | 2008-04-24 | 2013-04-02 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing evaporation donor substrate and method of manufacturing light-emitting device |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5487479A (en) * | 1977-12-23 | 1979-07-11 | Nec Corp | Photo mask blank substrate |
| JPS55150225A (en) * | 1979-05-11 | 1980-11-22 | Hitachi Ltd | Method of correcting white spot fault of photomask |
-
1988
- 1988-09-30 JP JP63244067A patent/JPH01124856A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01124856A (ja) | 1989-05-17 |