JPH04272845A - Manufacture of laminated board - Google Patents
Manufacture of laminated boardInfo
- Publication number
- JPH04272845A JPH04272845A JP3034058A JP3405891A JPH04272845A JP H04272845 A JPH04272845 A JP H04272845A JP 3034058 A JP3034058 A JP 3034058A JP 3405891 A JP3405891 A JP 3405891A JP H04272845 A JPH04272845 A JP H04272845A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin composition
- laminate
- active energy
- epoxy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 239000003822 epoxy resin Substances 0.000 claims abstract description 63
- 229920000647 polyepoxide Polymers 0.000 claims abstract description 63
- 229920005989 resin Polymers 0.000 claims abstract description 38
- 239000011347 resin Substances 0.000 claims abstract description 38
- 239000000203 mixture Substances 0.000 claims abstract description 34
- 239000011521 glass Substances 0.000 claims abstract description 19
- -1 acid anhydride compound Chemical class 0.000 claims abstract description 17
- 239000000463 material Substances 0.000 claims abstract description 15
- 238000010438 heat treatment Methods 0.000 claims abstract description 14
- 239000011342 resin composition Substances 0.000 claims abstract description 12
- 229920006241 epoxy vinyl ester resin Polymers 0.000 claims abstract description 11
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 11
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 11
- 239000011888 foil Substances 0.000 claims abstract description 9
- 239000004744 fabric Substances 0.000 claims abstract description 8
- 239000004745 nonwoven fabric Substances 0.000 claims abstract description 5
- 239000003795 chemical substances by application Substances 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 13
- 229920001187 thermosetting polymer Polymers 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 238000000465 moulding Methods 0.000 abstract description 25
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 9
- 239000011889 copper foil Substances 0.000 abstract description 9
- 239000000126 substance Substances 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 229910000679 solder Inorganic materials 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 20
- 238000010521 absorption reaction Methods 0.000 description 19
- 238000001723 curing Methods 0.000 description 19
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 16
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 16
- 239000004593 Epoxy Substances 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 12
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 10
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 10
- 239000002253 acid Substances 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- 150000008065 acid anhydrides Chemical class 0.000 description 5
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000004850 liquid epoxy resins (LERs) Substances 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 229910052753 mercury Inorganic materials 0.000 description 5
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 5
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 4
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000004342 Benzoyl peroxide Substances 0.000 description 4
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- KFSLWBXXFJQRDL-UHFFFAOYSA-N Peracetic acid Chemical compound CC(=O)OO KFSLWBXXFJQRDL-UHFFFAOYSA-N 0.000 description 4
- 235000019400 benzoyl peroxide Nutrition 0.000 description 4
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 4
- ZSWFCLXCOIISFI-UHFFFAOYSA-N cyclopentadiene Chemical compound C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 229920001567 vinyl ester resin Polymers 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 230000032050 esterification Effects 0.000 description 3
- 238000005886 esterification reaction Methods 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 150000007519 polyprotic acids Polymers 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- LTVUCOSIZFEASK-MPXCPUAZSA-N (3ar,4s,7r,7as)-3a-methyl-3a,4,7,7a-tetrahydro-4,7-methano-2-benzofuran-1,3-dione Chemical compound C([C@H]1C=C2)[C@H]2[C@H]2[C@]1(C)C(=O)OC2=O LTVUCOSIZFEASK-MPXCPUAZSA-N 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- HOOIIRHGHALACD-UHFFFAOYSA-N 5-(2,5-dioxooxolan-3-yl)-3-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound C1C(C(O)=O)C(C(O)=O)C(C)=CC1C1C(=O)OC(=O)C1 HOOIIRHGHALACD-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- OSGAYBCDTDRGGQ-UHFFFAOYSA-L calcium sulfate Chemical compound [Ca+2].[O-]S([O-])(=O)=O OSGAYBCDTDRGGQ-UHFFFAOYSA-L 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 235000011187 glycerol Nutrition 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 150000003003 phosphines Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000003505 polymerization initiator Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- FVQMJJQUGGVLEP-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy 2-ethylhexaneperoxoate Chemical compound CCCCC(CC)C(=O)OOOC(C)(C)C FVQMJJQUGGVLEP-UHFFFAOYSA-N 0.000 description 1
- QEQBMZQFDDDTPN-UHFFFAOYSA-N (2-methylpropan-2-yl)oxy benzenecarboperoxoate Chemical compound CC(C)(C)OOOC(=O)C1=CC=CC=C1 QEQBMZQFDDDTPN-UHFFFAOYSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UMRXKNAASA-N (3ar,4s,7r,7as)-rel-3a,4,7,7a-tetrahydro-4,7-methanoisobenzofuran-1,3-dione Chemical compound O=C1OC(=O)[C@@H]2[C@H]1[C@]1([H])C=C[C@@]2([H])C1 KNDQHSIWLOJIGP-UMRXKNAASA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- DPZSNGJNFHWQDC-ARJAWSKDSA-N (z)-2,3-diaminobut-2-enedinitrile Chemical compound N#CC(/N)=C(/N)C#N DPZSNGJNFHWQDC-ARJAWSKDSA-N 0.000 description 1
- IQBLWPLYPNOTJC-FPLPWBNLSA-N (z)-4-(2-ethylhexoxy)-4-oxobut-2-enoic acid Chemical compound CCCCC(CC)COC(=O)\C=C/C(O)=O IQBLWPLYPNOTJC-FPLPWBNLSA-N 0.000 description 1
- AYAUWVRAUCDBFR-ARJAWSKDSA-N (z)-4-oxo-4-propoxybut-2-enoic acid Chemical compound CCCOC(=O)\C=C/C(O)=O AYAUWVRAUCDBFR-ARJAWSKDSA-N 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M .beta-Phenylacrylic acid Natural products [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- PYOLJOJPIPCRDP-UHFFFAOYSA-N 1,1,3-trimethylcyclohexane Chemical compound CC1CCCC(C)(C)C1 PYOLJOJPIPCRDP-UHFFFAOYSA-N 0.000 description 1
- CTSQZGJZQUVGBQ-UHFFFAOYSA-N 1,2,4,5-tetrachloro-3,6-dimethylbenzene Chemical group CC1=C(Cl)C(Cl)=C(C)C(Cl)=C1Cl CTSQZGJZQUVGBQ-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- IVSZLXZYQVIEFR-UHFFFAOYSA-N 1,3-Dimethylbenzene Natural products CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- UICXTANXZJJIBC-UHFFFAOYSA-N 1-(1-hydroperoxycyclohexyl)peroxycyclohexan-1-ol Chemical compound C1CCCCC1(O)OOC1(OO)CCCCC1 UICXTANXZJJIBC-UHFFFAOYSA-N 0.000 description 1
- FBHPRUXJQNWTEW-UHFFFAOYSA-N 1-benzyl-2-methylimidazole Chemical compound CC1=NC=CN1CC1=CC=CC=C1 FBHPRUXJQNWTEW-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- LCHAFMWSFCONOO-UHFFFAOYSA-N 2,4-dimethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC(C)=C3SC2=C1 LCHAFMWSFCONOO-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- VVHFXJOCUKBZFS-UHFFFAOYSA-N 2-(chloromethyl)-2-methyloxirane Chemical compound ClCC1(C)CO1 VVHFXJOCUKBZFS-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- AAXRSWGYLGOFQP-UHFFFAOYSA-N 2-butoxy-1-(2-butoxyphenyl)ethanone Chemical compound CCCCOCC(=O)C1=CC=CC=C1OCCCC AAXRSWGYLGOFQP-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- MRDMGGOYEBRLPD-UHFFFAOYSA-N 2-ethoxy-1-(2-ethoxyphenyl)ethanone Chemical compound CCOCC(=O)C1=CC=CC=C1OCC MRDMGGOYEBRLPD-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical class OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- XMLYCEVDHLAQEL-UHFFFAOYSA-N 2-hydroxy-2-methyl-1-phenylpropan-1-one Chemical compound CC(C)(O)C(=O)C1=CC=CC=C1 XMLYCEVDHLAQEL-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- MYISVPVWAQRUTL-UHFFFAOYSA-N 2-methylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3SC2=C1 MYISVPVWAQRUTL-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- ZPQUFYIADDJOEF-UHFFFAOYSA-N 2-propylanthracene-9,10-dione Chemical compound C1=CC=C2C(=O)C3=CC(CCC)=CC=C3C(=O)C2=C1 ZPQUFYIADDJOEF-UHFFFAOYSA-N 0.000 description 1
- VEBFFMASUFIZKN-UHFFFAOYSA-N 2-tert-butylperoxy-3,3,5-trimethylhexanoic acid Chemical compound CC(C)CC(C)(C)C(C(O)=O)OOC(C)(C)C VEBFFMASUFIZKN-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- WPIYAXQPRQYXCN-UHFFFAOYSA-N 3,3,5-trimethylhexanoyl 3,3,5-trimethylhexaneperoxoate Chemical compound CC(C)CC(C)(C)CC(=O)OOC(=O)CC(C)(C)CC(C)C WPIYAXQPRQYXCN-UHFFFAOYSA-N 0.000 description 1
- DXIJHCSGLOHNES-UHFFFAOYSA-N 3,3-dimethylbut-1-enylbenzene Chemical compound CC(C)(C)C=CC1=CC=CC=C1 DXIJHCSGLOHNES-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- SESYNEDUKZDRJL-UHFFFAOYSA-N 3-(2-methylimidazol-1-yl)propanenitrile Chemical compound CC1=NC=CN1CCC#N SESYNEDUKZDRJL-UHFFFAOYSA-N 0.000 description 1
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 1
- WVRNUXJQQFPNMN-VAWYXSNFSA-N 3-[(e)-dodec-1-enyl]oxolane-2,5-dione Chemical compound CCCCCCCCCC\C=C\C1CC(=O)OC1=O WVRNUXJQQFPNMN-VAWYXSNFSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- OFNISBHGPNMTMS-UHFFFAOYSA-N 3-methylideneoxolane-2,5-dione Chemical compound C=C1CC(=O)OC1=O OFNISBHGPNMTMS-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- IGSBHTZEJMPDSZ-UHFFFAOYSA-N 4-[(4-amino-3-methylcyclohexyl)methyl]-2-methylcyclohexan-1-amine Chemical compound C1CC(N)C(C)CC1CC1CC(C)C(N)CC1 IGSBHTZEJMPDSZ-UHFFFAOYSA-N 0.000 description 1
- UGVRJVHOJNYEHR-UHFFFAOYSA-N 4-chlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=CC=C1 UGVRJVHOJNYEHR-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-M 4-hydroxybenzoate Chemical compound OC1=CC=C(C([O-])=O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-M 0.000 description 1
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 description 1
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- RBHIUNHSNSQJNG-UHFFFAOYSA-N 6-methyl-3-(2-methyloxiran-2-yl)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2(C)OC2CC1C1(C)CO1 RBHIUNHSNSQJNG-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- ASZFCDOTGITCJI-UHFFFAOYSA-N 6-oxabicyclo[3.1.0]hex-2-ene Chemical compound C1C=CC2OC12 ASZFCDOTGITCJI-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- ADAHGVUHKDNLEB-UHFFFAOYSA-N Bis(2,3-epoxycyclopentyl)ether Chemical compound C1CC2OC2C1OC1CCC2OC21 ADAHGVUHKDNLEB-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- AKTKYRNOAGAQDH-UHFFFAOYSA-N C1C2OC2CC(C)C1(C(O)=O)C1CC2OC2CC1C Chemical compound C1C2OC2CC(C)C1(C(O)=O)C1CC2OC2CC1C AKTKYRNOAGAQDH-UHFFFAOYSA-N 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- WBYWAXJHAXSJNI-SREVYHEPSA-N Cinnamic acid Chemical compound OC(=O)\C=C/C1=CC=CC=C1 WBYWAXJHAXSJNI-SREVYHEPSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- YIVJZNGAASQVEM-UHFFFAOYSA-N Lauroyl peroxide Chemical compound CCCCCCCCCCCC(=O)OOC(=O)CCCCCCCCCCC YIVJZNGAASQVEM-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- BWPYBAJTDILQPY-UHFFFAOYSA-N Methoxyphenone Chemical compound C1=C(C)C(OC)=CC=C1C(=O)C1=CC=CC(C)=C1 BWPYBAJTDILQPY-UHFFFAOYSA-N 0.000 description 1
- NQSMEZJWJJVYOI-UHFFFAOYSA-N Methyl 2-benzoylbenzoate Chemical compound COC(=O)C1=CC=CC=C1C(=O)C1=CC=CC=C1 NQSMEZJWJJVYOI-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- 150000008062 acetophenones Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 description 1
- 239000004760 aramid Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 229920003235 aromatic polyamide Polymers 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 150000008366 benzophenones Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- UTOVMEACOLCUCK-PLNGDYQASA-N butyl maleate Chemical compound CCCCOC(=O)\C=C/C(O)=O UTOVMEACOLCUCK-PLNGDYQASA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229930016911 cinnamic acid Natural products 0.000 description 1
- 235000013985 cinnamic acid Nutrition 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229940120693 copper naphthenate Drugs 0.000 description 1
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- POSWICCRDBKBMH-UHFFFAOYSA-N dihydroisophorone Natural products CC1CC(=O)CC(C)(C)C1 POSWICCRDBKBMH-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- BEFDCLMNVWHSGT-UHFFFAOYSA-N ethenylcyclopentane Chemical compound C=CC1CCCC1 BEFDCLMNVWHSGT-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- NKHAVTQWNUWKEO-UHFFFAOYSA-N fumaric acid monomethyl ester Natural products COC(=O)C=CC(O)=O NKHAVTQWNUWKEO-UHFFFAOYSA-N 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- FLBJFXNAEMSXGL-UHFFFAOYSA-N het anhydride Chemical compound O=C1OC(=O)C2C1C1(Cl)C(Cl)=C(Cl)C2(Cl)C1(Cl)Cl FLBJFXNAEMSXGL-UHFFFAOYSA-N 0.000 description 1
- 229940042795 hydrazides for tuberculosis treatment Drugs 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- NKHAVTQWNUWKEO-IHWYPQMZSA-N methyl hydrogen fumarate Chemical compound COC(=O)\C=C/C(O)=O NKHAVTQWNUWKEO-IHWYPQMZSA-N 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000003094 microcapsule Substances 0.000 description 1
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 150000008442 polyphenolic compounds Chemical class 0.000 description 1
- 235000013824 polyphenols Nutrition 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000011973 solid acid Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229940075582 sorbic acid Drugs 0.000 description 1
- 235000010199 sorbic acid Nutrition 0.000 description 1
- 239000004334 sorbic acid Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- CSKKAINPUYTTRW-UHFFFAOYSA-N tetradecoxycarbonyloxy tetradecyl carbonate Chemical compound CCCCCCCCCCCCCCOC(=O)OOC(=O)OCCCCCCCCCCCCCC CSKKAINPUYTTRW-UHFFFAOYSA-N 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/022—Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、表面性に優れる積層板
の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a laminate with excellent surface properties.
【0002】0002
【従来の技術】酸無水物硬化型液状エポキシ樹脂と重合
性不飽和基を有する樹脂とからなる樹脂組成物を繊維質
基材に含浸させ、加熱による予備硬化を行ない、次いで
加熱加圧成形することにより積層板を製造する方法(特
開昭59−49240号公報)等が知られている。[Prior Art] A fibrous base material is impregnated with a resin composition consisting of an acid anhydride-curable liquid epoxy resin and a resin having a polymerizable unsaturated group, precured by heating, and then heated and pressure molded. A method of manufacturing a laminate by using the above method (Japanese Unexamined Patent Publication No. 59-49240) is known.
【0003】0003
【発明が解決しようとする課題】しかしながら、上記方
法では樹脂組成物を繊維質基材に含浸させた後、銅箔や
フィルムでその積層体の上下両面を被覆し、次いで加熱
により実質的には無圧下で予備硬化をするため、この工
程で銅箔が熱膨張し、次ぎの加熱加圧成形工程を経ても
得られる積層板の表面にしわが発生するという課題があ
る。However, in the above method, after impregnating a fibrous base material with a resin composition, the upper and lower surfaces of the laminate are covered with copper foil or a film, and then heated to substantially impregnate the fibrous base material. Since the preliminary curing is carried out under no pressure, the copper foil thermally expands in this step, and there is a problem in that wrinkles occur on the surface of the resulting laminate even after the subsequent heating and pressure forming step.
【0004】0004
【課題を解決しようとする手段】本発明者らは、この様
な状況に鑑みて鋭意研究した結果、活性エネルギ−線硬
化性樹脂成分を含有してなる熱硬化性エポキシ系樹脂組
成物を用い、積層体の予備硬化を活性エネルギ−線で行
い、次いで必要な銅箔で被覆し加熱加圧成形することに
より、低温短時間で予備硬化を行うことができて、揮発
性物質の揮発も少なく、表面性に優れる積層板が得られ
ることを見い出し、本発明を完成するに至った。[Means for Solving the Problems] As a result of intensive research in view of the above circumstances, the present inventors have developed a method using a thermosetting epoxy resin composition containing an active energy beam-curable resin component. By pre-curing the laminate with an active energy beam, then covering it with the necessary copper foil and molding it under heat and pressure, it is possible to pre-cure at a low temperature and in a short time, with less volatilization of volatile substances. They have discovered that a laminate with excellent surface properties can be obtained, and have completed the present invention.
【0005】即ち、本発明は、活性エネルギ−線硬化性
樹脂を含有する熱硬化性エポキシ系樹脂組成物を含浸し
てなる長尺繊維質基材又はその積層体に、活性エネルギ
−線を照射して予備硬化させた後、金属箔を重ね合わせ
て加熱硬化させることを特徴とする積層板の製造方法を
提供するものである。That is, the present invention involves irradiating active energy rays onto a long fibrous base material or a laminate thereof impregnated with a thermosetting epoxy resin composition containing an active energy ray curable resin. The present invention provides a method for manufacturing a laminate, which is characterized in that the metal foils are pre-cured, and then metal foils are stacked and cured by heating.
【0006】本発明で用いる活性エネルギ−線としては
、紫外線、ガンマ線、電子線などが用いられるが、装置
の操作性、安全性、価格などの点から、紫外線が好まし
い。本発明で用いる活性エネルギ−線硬化性樹脂を含有
する熱硬化性エポキシ系樹脂組成物(以下、エポキシ系
樹脂組成物と略す。)としては、例えば活性エネルギ−
線硬化性樹脂とエポキシ樹脂とを主成分とする樹脂組成
物、エポキシ樹脂の部分ビニルエステル化物を主成分と
する樹脂組成物などが挙げられ、なかでも金属箔との密
着性に優れるという点でエポキシビニルエステル樹脂お
よび/又はエポキシ樹脂の部分ビニルエステル化物とエ
ポキシ樹脂とを主成分とする樹脂組成物、エポキシ樹脂
の部分ビニルエステル化物を主成分とする樹脂組成物が
好ましい。このなかでも更に活性エネルギー線の照射に
より樹脂含浸積層体の中心部まで容易に予備硬化できる
点で、ビニルエステル基/エポキシ基の数の比が2/9
8〜60/40、特に5/90〜40/60の範囲とな
る樹脂組成物が好ましい。[0006] As the active energy beam used in the present invention, ultraviolet rays, gamma rays, electron beams, etc. are used, but ultraviolet rays are preferable from the viewpoints of operability, safety, cost, etc. of the apparatus. As the thermosetting epoxy resin composition (hereinafter abbreviated as epoxy resin composition) containing an active energy beam-curable resin used in the present invention, for example, active energy beam-curable resin
Examples include resin compositions whose main components are a line-curable resin and an epoxy resin, and resin compositions whose main component is a partially vinyl esterified epoxy resin. A resin composition containing an epoxy vinyl ester resin and/or a partial vinyl ester of an epoxy resin as a main component, and a resin composition containing a partial vinyl ester of an epoxy resin as a main component are preferred. Among these, the ratio of the number of vinyl ester groups/epoxy groups is 2/9 because it can be easily precured to the center of the resin-impregnated laminate by irradiation with active energy rays.
A resin composition having a ratio of 8 to 60/40, particularly 5/90 to 40/60 is preferred.
【0007】ここで活性エネルギ−線硬化性樹脂と共に
用いるエポキシ樹脂としては、例えばエピクロルヒドリ
ン又はβ−メチルエピクロルヒドリンとビスフェノール
A、ビスフェノールF又はビスフェノールSとから得ら
れるエポキシ樹脂;フェノール又はアルキルフェノール
・ノボラック樹脂のポリグリシジルエーテル類;エチレ
ングリコール、プロピレングリコール、ポリエチレング
リコール、ポリプロピレングリコール、ネオペンチルグ
リコール、グリセリン、トリメチロールエタン、トリメ
チロールプロパン又はビスフェノールAのエチレンオキ
サイドもしくはプロピレンオキサイドの付加物の如き多
価アルコールのポリグリシジルエーテル類;アジピン酸
、フタル酸、テトラヒドロフタル酸、ヘキサヒドロフタ
ル酸又はダイマー酸の如きポリカルボン酸のポリグリシ
ジルエステル類;シクロヘキセン又はその誘導体を過酢
酸などでエポキシ化させることにより得られるシクロヘ
キセン系のエポキシ化合物類(3,4−エポキシ−6−
メチル−シクロヘキシル−3,4−エポキシ−6−メチ
ル−シクロヘキサンカルボキシレート、3,4−エポキ
シシクロヘキシルメチル−3,4−シクロヘキサンカル
ボキシレート、1−エポキシエチル−3,4−エポキシ
シクロヘキサンなど);シクロペンタジエンもしくはジ
シクロペンタジエン又はそれらの誘導体を過酢酸などで
エポキシ化させることにより得られるシクロペンタジエ
ン系のエポキシ化合物類(シクロペンタジエンオキサイ
ド、ジシクロペンタジエンオキサイド、2、3−エポキ
シシクロペンチルエーテルなど);リモネンジオキサイ
ド;あるいはヒドロキシ安息香酸のグリシジルエーテル
エステルなどがあり、単独あるいは二種以上を混合して
用いられる。上記エポキシ樹脂としては、なかでも常温
液状のもの、例えば平均エポキシ当量が100〜400
の液状エポキシ樹脂が好ましい。Examples of the epoxy resin used together with the active energy beam-curable resin include epoxy resins obtained from epichlorohydrin or β-methylepichlorohydrin and bisphenol A, bisphenol F, or bisphenol S; polyphenol or alkylphenol novolac resins; Glycidyl ethers; polyglycidyl ethers of polyhydric alcohols such as ethylene glycol, propylene glycol, polyethylene glycol, polypropylene glycol, neopentyl glycol, glycerin, trimethylolethane, trimethylolpropane, or adducts of bisphenol A with ethylene oxide or propylene oxide. Polyglycidyl esters of polycarboxylic acids such as adipic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid or dimer acid; Cyclohexene-based epoxy obtained by epoxidizing cyclohexene or its derivatives with peracetic acid etc. Compounds (3,4-epoxy-6-
Methyl-cyclohexyl-3,4-epoxy-6-methyl-cyclohexanecarboxylate, 3,4-epoxycyclohexylmethyl-3,4-cyclohexanecarboxylate, 1-epoxyethyl-3,4-epoxycyclohexane, etc.); cyclopentadiene or cyclopentadiene-based epoxy compounds (cyclopentadiene oxide, dicyclopentadiene oxide, 2,3-epoxycyclopentyl ether, etc.) obtained by epoxidizing dicyclopentadiene or derivatives thereof with peracetic acid, etc.; limonene dioxide and glycidyl ether ester of hydroxybenzoic acid, which can be used alone or in combination of two or more. Among the above epoxy resins, those which are liquid at room temperature, for example, those having an average epoxy equivalent of 100 to 400,
liquid epoxy resins are preferred.
【0008】また、活性エネルギ−線硬化性樹脂として
は、前記したエポキシビニルエステル樹脂およびエポキ
シ樹脂の部分ビニルエステル化物以外に、例えばポリエ
−テルアクリレ−ト樹脂、ポリエステルアクリレ−ト樹
脂、ポリウレタンアクリレ−ト樹脂などのアクリル系樹
脂、不飽和ポリエステル樹脂、スピラン樹脂、ジアリル
フタレ−ト樹脂などが挙げられる。In addition to the above-mentioned epoxy vinyl ester resins and partially vinyl esterified epoxy resins, active energy beam-curable resins include, for example, polyether acrylate resins, polyester acrylate resins, and polyurethane acrylate resins. Examples include acrylic resins such as carbonate resins, unsaturated polyester resins, spiran resins, and diallyl phthalate resins.
【0009】前記エポキシビニルエステル樹脂およびエ
ポキシ樹脂の部分ビニルエステル化物としては、例えば
前記の如きエポキシ樹脂と、下記の如き不飽和一塩基酸
とを、エステル化触媒の存在下で完全又は部分ビニルエ
ステル化反応させて得られる樹脂が挙げられる。As the epoxy vinyl ester resin and the partially vinyl esterified product of the epoxy resin, for example, the epoxy resin as described above and the unsaturated monobasic acid as shown below are combined into a complete or partial vinyl ester in the presence of an esterification catalyst. Examples include resins obtained by chemical reaction.
【0010】上記不飽和一塩基酸としては、例えばアク
リル酸、メタクリル酸、桂皮酸、クロトン酸、モノメチ
ルマレート、モノプロピルマレート、モノブチルマレー
ト、ソルビン酸又はモノ(2−エチルヘキシル)マレー
トなどが挙げられ、これらは単独でも二種以上混合して
も用いられる。なかでもアクリル酸、メタクリル酸が好
ましい。Examples of the unsaturated monobasic acids include acrylic acid, methacrylic acid, cinnamic acid, crotonic acid, monomethyl maleate, monopropyl maleate, monobutyl maleate, sorbic acid, and mono(2-ethylhexyl) maleate. These can be used alone or in combination of two or more. Among these, acrylic acid and methacrylic acid are preferred.
【0011】また、エステル化触媒としては、通常公知
のものが用いられるが、なかでもホスフィン誘導体、4
級ホスホニウム塩等のリン系化合物が好ましく、なかで
もトリフェニルホスフィン、トリ−n−ブチルホスフィ
ン等の様なホスフィン誘導体が特に好ましい。これらの
エステル化触媒は触媒量添加されればよく、例えば原料
であるエポキシ樹脂と不飽和一塩基酸の合計に対して1
00〜10000ppm程度添加されればよい。[0011] Also, as the esterification catalyst, commonly known ones are used, among which phosphine derivatives, 4
Phosphorus compounds such as phosphonium salts are preferred, and phosphine derivatives such as triphenylphosphine, tri-n-butylphosphine and the like are particularly preferred. These esterification catalysts may be added in a catalytic amount, for example, 1 to the total of the raw material epoxy resin and unsaturated monobasic acid.
It is sufficient to add about 00 to 10,000 ppm.
【0012】エポキシビニルエステル樹脂を得るには、
反応中のゲル化を防止する目的や生成物の保存安定性あ
るいは硬化性の調整の目的でそれぞれ重合禁止剤を使用
することが推奨される。[0012] To obtain the epoxy vinyl ester resin,
It is recommended to use a polymerization inhibitor for the purpose of preventing gelation during the reaction and adjusting the storage stability or curability of the product.
【0013】かかる重合禁止剤としては、例えばハイド
ロキノン、p−t−ブチルカテコール、モノ−t−ブチ
ルハイドロキノンの如きハイドロキノン類;ハイドロキ
ノンモノメチルエーテル、ジ−t−p−クレゾールの如
きフェノール類;p−ベンゾキノン、ナフトキノン、p
−トルキノンの如きキノン類;又はナフテン酸銅の如き
銅塩などがある。Examples of such polymerization inhibitors include hydroquinones such as hydroquinone, p-t-butylcatechol, and mono-t-butylhydroquinone; phenols such as hydroquinone monomethyl ether and di-tp-cresol; p-benzoquinone; , naphthoquinone, p
- quinones such as tolquinone; or copper salts such as copper naphthenate.
【0014】上記エポキシビニルエステル樹脂およびエ
ポキシ樹脂の部分ビニルエステル化物は、ケトン類、エ
ステル類等の溶剤に溶解して用いても良いし、エポキシ
樹脂等の他の原料と同時に溶解させて用いても良いが、
重合性ビニルモノマーのみを用いることが好ましい。The above-mentioned epoxy vinyl ester resin and partially vinyl esterified epoxy resin may be used by being dissolved in a solvent such as ketones or esters, or may be used by being dissolved at the same time as other raw materials such as epoxy resin. is also good, but
Preferably, only polymerizable vinyl monomers are used.
【0015】この場合の重合性ビニルモノマーとしては
、例えばスチレン、ビニルトルエン、t−ブチルスチレ
ン、クロルスチレンもしくはジビニルベンゼンの如きス
チレン及びその誘導体;エチル(メタ)アクリレート、
プロピル(メタ)アクリレート、イソプロピル(メタ)
アクリレート、n−ブチル(メタ)アクリレート、イソ
ブチル(メタ)アクリレート、2−エチルヘキシル(メ
タ)アクリレート、ラウリル(メタ)アクリレート、2
−ヒドロキシエチル(メタ)アクリレートもしくは2−
ヒドロキシプロピル(メタ)アクリレートの如き(メタ
)アクリル酸の低沸点エステルモノマー類;又はトリメ
チロールプロパントリ(メタ)アクリレート、ジエチレ
ングリコールジ(メタ)アクリレート、1,4−ブタン
ジオールジ(メタ)アクリレートもしくは 1,6−ヘ
キサンジオールジ(メタ)アクリレートの如き多価アル
コールの(メタ)アクリレート類などが挙げられ、なか
でも粘度が低い点でスチレン、ビニルトルエン、(メタ
)アクリル酸の低沸点エステルモノマー類が好ましい。Examples of the polymerizable vinyl monomer in this case include styrene and its derivatives such as styrene, vinyltoluene, t-butylstyrene, chlorostyrene or divinylbenzene; ethyl (meth)acrylate;
Propyl (meth)acrylate, isopropyl (meth)
Acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, lauryl (meth)acrylate, 2
-Hydroxyethyl (meth)acrylate or 2-
Low boiling ester monomers of (meth)acrylic acid such as hydroxypropyl (meth)acrylate; or trimethylolpropane tri(meth)acrylate, diethylene glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate or 1 (meth)acrylates of polyhydric alcohols such as , 6-hexanediol di(meth)acrylate, etc. Among them, low-boiling ester monomers of styrene, vinyltoluene, and (meth)acrylic acid are particularly preferred because of their low viscosity. preferable.
【0016】本発明で用いるエポキシ樹脂組成物には、
必要に応じて更に光重合開始剤、光増感剤、反応性モノ
マ−、熱硬化性エポキシ樹脂用硬化剤、熱硬化性エポキ
シ樹脂用硬化促進剤、その他充填剤などを添加すること
ができる。また熱重合開始剤を光重合開始剤と併用し、
活性エネルギ−線照射時未硬化の部分を次の加熱工程で
熱硬化させることも可能である。[0016] The epoxy resin composition used in the present invention includes:
If necessary, a photopolymerization initiator, a photosensitizer, a reactive monomer, a curing agent for thermosetting epoxy resin, a curing accelerator for thermosetting epoxy resin, and other fillers can be added. In addition, a thermal polymerization initiator is used in combination with a photopolymerization initiator,
It is also possible to thermally harden the unhardened portions during the active energy ray irradiation in the next heating step.
【0017】この際用いられる光重合開始剤としては、
例えばベンジル、ベンゾイン、ベンゾインメチルエ−テ
ル、ベンゾインエチルエ−テル、ベンゾインイソプロピ
ルエ−テル、1−ヒドロキシシクロヘキシルフェニルケ
トン等のベンゾインエ−テル系化合物、ベンゾフェノン
、4−クロルベンゾフェノン、オルソベンゾイル安息香
酸メチル、3,3′−ジメチル−4−メトキシベンゾフ
ェノン、4−ベンゾイル−4′−メチルジフェニルスル
フィドジベンジル等のベンゾフェノン系化合物、ベンジ
ルジメチルケタ−ル、ベンジルジエチルケタ−ル等のケ
タ−ル系化合物、2,2′−ジエトキシアセトフェノン
、2,2′−ジブトキシアセトフェノン、2−ヒドロキ
シ−2−メチルプロピオフェノン、p−t−ブチルトリ
クロロアセトフェノン p−t−ブチルトリクロロア
セトフェノン等のアセトフェノン系化合物、チオキサン
トン2−クロルチオキサントン、2−メチルチオキサン
トン、2,4−ジメチルチオキサントン、2−エチルア
ントラキノン、2−プロピルアントラキノン等のチオキ
サントン系化合物等が挙げられる。[0017] The photopolymerization initiator used at this time is as follows:
For example, benzoin ether compounds such as benzyl, benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, 1-hydroxycyclohexylphenyl ketone, benzophenone, 4-chlorobenzophenone, methyl orthobenzoylbenzoate, Benzophenone compounds such as 3,3'-dimethyl-4-methoxybenzophenone and 4-benzoyl-4'-methyldiphenylsulfide dibenzyl; ketal compounds such as benzyl dimethyl ketal and benzyl diethyl ketal; 2 , 2'-diethoxyacetophenone, 2,2'-dibutoxyacetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloroacetophenone, acetophenone compounds such as pt-butyltrichloroacetophenone, thioxanthone 2 Examples include thioxanthone compounds such as -chlorothioxanthone, 2-methylthioxanthone, 2,4-dimethylthioxanthone, 2-ethylanthraquinone, and 2-propylanthraquinone.
【0018】光重合開始剤と併用される熱重合開始剤と
しては、例えばシクロヘキサノンパーオキサイド、3,
3,5−トリメチルシクロヘキサノンパーオキサイド、
メチロネキサノンパーオキサイド、1,1−ビス(t−
ブチルパーオキシ)3,3,5−トリメチルシクロヘキ
サン、クメンハイドロパーオキサイド、ジクミルパーオ
キサイド、ラウロイルパーオキサイド、3,3,5−ト
リメチルヘキサノイルパーオキサイド、ベンゾイルパー
オキサイド、ジ−ミリスチルパーオキシジカーボネート
、t−ブチルパーオキシ(2−エチルヘキサノエート)
、t−ブチルパーオキシ−3,3,5−トリメチルヘキ
サノエート、t−ブチルパーオキシベンゾエート、クミ
ルパーオキシオクトエートなどの有機過酸化物が挙げら
れる。Examples of the thermal polymerization initiator used in combination with the photopolymerization initiator include cyclohexanone peroxide, 3,
3,5-trimethylcyclohexanone peroxide,
Methylonexanone peroxide, 1,1-bis(t-
butyl peroxide) 3,3,5-trimethylcyclohexane, cumene hydroperoxide, dicumyl peroxide, lauroyl peroxide, 3,3,5-trimethylhexanoyl peroxide, benzoyl peroxide, di-myristyl peroxydicarbonate , t-butylperoxy (2-ethylhexanoate)
, t-butylperoxy-3,3,5-trimethylhexanoate, t-butylperoxybenzoate, cumylperoxyoctoate, and other organic peroxides.
【0019】反応性モノマーとしては、例えば上記した
重合性ビニルモノマ−が使用できる。 充填剤として
は、例えば水酸化アルミニウム、ケイ酸アルミニウム、
コロイダルシリカ、炭酸カルシウム、硫酸カルシウム、
マイカ、タルク、二酸化チタン、石英粉末、ケイ酸ジル
コニウム、ガラス粉末、アスベスト粉末、ケイ藻土、三
酸化アンチモンなどが挙げられる。As the reactive monomer, for example, the above-mentioned polymerizable vinyl monomer can be used. Examples of fillers include aluminum hydroxide, aluminum silicate,
Colloidal silica, calcium carbonate, calcium sulfate,
Examples include mica, talc, titanium dioxide, quartz powder, zirconium silicate, glass powder, asbestos powder, diatomaceous earth, and antimony trioxide.
【0020】また、熱硬化性エポキシ樹脂用硬化剤とし
ては、例えば芳香族ポリアミンおよびその塩、多塩基酸
無水物、三 フッ化ホウ素−アミン錯体、ジシアンジア
ミド、二塩基酸ヒドラジド、ジアミノマレオニトリル、
メラミン、イミド等が挙げられるが、なかでも常温液状
の多塩基酸無水物が好ましい。 多塩基酸無水物として
代表的なものを挙げれば、無水フタル酸、ヘキサヒドロ
無水フタル酸、テトラヒドロ無水フタル酸、メチルヘキ
サヒドロ無水フタル酸、メチルテトラヒドロ無水フタル
酸、無水ナジック酸、無水メチルナジック酸、無水トリ
メリット酸、無水ピロメリット酸、無水マレイン酸、無
水コハク酸、無水イタコン酸、無水シトラコン酸、ドデ
セニル無水コハク酸、無水クロレンディック酸、無水ベ
ンゾフェノンテトラカルボン酸、無水シクロペンタテト
ラカルボン酸、5−(2,5−ジオキソテトラヒドロフ
リル)−3−メチル−3−シクロヘキセン−1,2−ジ
カルボン酸、エチレングリコールビストリメリテート無
水物又はグリセリントリメリテート無水物などがあり、
これらは単独あるいは二種以上混合して用いる。なかで
も好ましいものとしては、液状の例えばメチルヘキサヒ
ドロ無水フタル酸、無水メチルナジック酸等が挙げられ
る。また、5−(2,5−ジオキソテトラヒドロフリル
)−3−メチル−3−シクロヘキセン−1,2−ジカル
ボン酸等の固形の酸無水物を液状の酸無水物で溶解した
ものも好ましく用いられる。[0020] Examples of curing agents for thermosetting epoxy resins include aromatic polyamines and their salts, polybasic acid anhydrides, boron trifluoride-amine complexes, dicyandiamide, dibasic acid hydrazides, diaminomaleonitrile,
Examples include melamine, imide, etc., but polybasic acid anhydrides which are liquid at room temperature are particularly preferred. Typical polybasic acid anhydrides include phthalic anhydride, hexahydrophthalic anhydride, tetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, nadic anhydride, methylnadic anhydride, Trimellitic anhydride, pyromellitic anhydride, maleic anhydride, succinic anhydride, itaconic anhydride, citraconic anhydride, dodecenylsuccinic anhydride, chlorendic anhydride, benzophenonetetracarboxylic anhydride, cyclopentatetracarboxylic anhydride, 5-(2,5-dioxotetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic acid, ethylene glycol bistrimelitate anhydride, glycerin trimellitate anhydride, etc.
These may be used alone or in combination of two or more. Among these, preferred are liquid forms such as methylhexahydrophthalic anhydride and methylnadic anhydride. Also preferably used is a solid acid anhydride such as 5-(2,5-dioxotetrahydrofuryl)-3-methyl-3-cyclohexene-1,2-dicarboxylic acid dissolved in a liquid acid anhydride. .
【0021】熱硬化性エポキシ樹脂用硬化促進剤として
は、例えばエチレンジアミン、ジエチレントリアミン、
トリエチレンテトラミン、テトラエチレンペンタミン、
ジプロピレンジアミン、ジエチルアミノプロピルアミン
等の脂肪族アミン、メンセンジアミン、イソフォロンジ
アミン、ビス(4−アミノ−3−メチルシクロヘキシル
)メタン、N−アミノエチルピペラジン等の脂環式アミ
ン、メタキシレンジアミン、テトラクロロ−p−キシレ
ンジアミン等の芳香環を含む脂肪族アミン、メタフェニ
レンジアミン、ジアミノジフェニルメタン、ジアミノジ
フェニルスルフォン、ビスアミノメチルジフェニルメタ
ン等の芳香族アミン、2−メチルイミダゾール、2−エ
チル−4−メチルイミダゾール、2−ウンデシルイミダ
ゾール、2−ヘプタデシルイミダゾール、2−フェニル
イミダゾール、1−ベンジル−2−メチルイミダゾール
、1−シアノエチル−2−メチルイミダゾール、1−シ
アノエチル−2−エチル−4−メチルイミダゾール等の
イミダゾール化合物、更には潜在性硬化促進剤等を挙げ
ることができ、なかでも本発明で用いるエポキシ系樹脂
組成物の貯蔵安定性を低下させない点で潜在性硬化促進
剤を用いることが特に望ましい。Examples of curing accelerators for thermosetting epoxy resins include ethylenediamine, diethylenetriamine,
triethylenetetramine, tetraethylenepentamine,
Aliphatic amines such as dipropylene diamine and diethylaminopropylamine, alicyclic amines such as menzendiamine, isophorone diamine, bis(4-amino-3-methylcyclohexyl)methane, N-aminoethylpiperazine, metaxylene diamine, Aliphatic amines containing aromatic rings such as tetrachloro-p-xylene diamine, aromatic amines such as metaphenylene diamine, diaminodiphenylmethane, diaminodiphenylsulfone, bisaminomethyldiphenylmethane, 2-methylimidazole, 2-ethyl-4-methyl Imidazole, 2-undecylimidazole, 2-heptadecyl imidazole, 2-phenylimidazole, 1-benzyl-2-methylimidazole, 1-cyanoethyl-2-methylimidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, etc. imidazole compounds, as well as latent curing accelerators, among others, it is particularly desirable to use latent curing accelerators in terms of not reducing the storage stability of the epoxy resin composition used in the present invention.
【0022】上記潜在性硬化促進剤としては、例えば■
エポキシ樹脂とアミン系化合物を混合し、直ちに冷凍し
て反応を停止させた冷凍型潜在性硬化促進剤、■アミン
系化合物をマイクロカプセル化したマイクロカプセル型
潜在性硬化促進剤、■モノキュラーシーブに化合物を吸
着させたモノキュラーシーブ型潜在性硬化促進剤、■ア
ミン系化合物とエポキシ基を有する化合物との付加物を
イソシアネート基を有する化合物で表面処理してなる潜
在性硬化促進剤等が挙げられ、なかでも取扱いが容易で
作業性が高く、加熱時の硬化促進効果が適当で、物性の
低下がない点で上記■の潜在性硬化促進剤が特に好まし
い。[0022] Examples of the latent curing accelerator include (i)
A frozen type latent curing accelerator made by mixing an epoxy resin and an amine compound and immediately freezing it to stop the reaction. ■ A microcapsule type latent curing accelerator made by microcapsulating an amine compound. ■ A compound in a monocular sieve. monocular sieve-type latent curing accelerators adsorbed with However, the latent curing accelerator mentioned above is particularly preferable because it is easy to handle, has high workability, has an appropriate curing accelerating effect during heating, and does not deteriorate physical properties.
【0023】エポキシ系樹脂組成物を得るに際しての各
成分の配合方法および配合順序は特に限定されるもので
はないが、液状成分を混合した後、固型の成分を粉末状
で添加して、分解又は溶解させる方法が好ましい。[0023] The method and order of blending each component to obtain an epoxy resin composition are not particularly limited, but after mixing the liquid components, solid components are added in powder form and decomposed. Alternatively, a method of dissolving is preferred.
【0024】他方、本発明で用いる繊維質基材として代
表的なものを挙げれば、ガラス繊維、炭素繊維または芳
香族ポリアミド系繊維などであり、なかでもガラス繊維
が好ましい。これらのうちガラス繊維としては、その原
料面から、E−グラス、C−グラス、A−グラスおよび
S−グラスなどが存在しているが、本発明においてはい
ずれの種類のものも適用できる。On the other hand, typical fibrous base materials used in the present invention include glass fibers, carbon fibers, and aromatic polyamide fibers, with glass fibers being preferred. Among these, glass fibers include E-glass, C-glass, A-glass, and S-glass from the viewpoint of their raw materials, but any of these types can be used in the present invention.
【0025】これらの繊維質基材は、その形状によりロ
ービング、チョップドストランドマット、コンティニア
スマット、クロス、不織布、ロービングクロス、サーフ
ェシングマットおよびチョップドストランドがあるが、
上掲した如き種類や形状は、目的とする成形物の用途お
よび性能により適宜選択されるものであって、必要によ
っては二以上の種類または形状からの混合使用であって
もよい。なかでもガラスクロス、ガラス不織布が好まし
い。These fibrous base materials are classified into rovings, chopped strand mats, continuous mats, cloths, nonwoven fabrics, roving cloths, surfacing mats, and chopped strands depending on their shape.
The above-mentioned types and shapes are appropriately selected depending on the intended use and performance of the molded product, and two or more types or shapes may be used in combination if necessary. Among them, glass cloth and glass nonwoven fabric are preferred.
【0026】本発明のエポキシ系樹脂組成物を用いて、
積層板を得る方法としては、例えば、(1)繊維質基材
にエポキシ系樹脂組成物を含浸させ、所定枚数重ね合せ
、空気中または窒素等の不活性ガス中で紫外線等の活性
エネルギー線を照射して予備硬化し、更に金属箔で被覆
し、次いで加熱硬化させる方法、(2)繊維質基材にエ
ポキシ樹脂組成物を含浸させ、一枚づつに空気中または
窒素等の不活性ガス中で紫外線等の活性エネルギー線を
照射して予備硬化させた後、所定枚数重ね合せ、更に金
属箔で被覆し、次いで加熱硬化させる方法、(3)上記
(1)の方法で、繊維質基材にエポキシ系樹脂組成物を
含浸させ、所定枚数重ね合せた後、活性エネルギー線透
過性のフィルムで被覆し、次いで紫外線等の活性エネル
ギー線を照射して予備硬化し、更に金属箔の必要な面の
フィルムを剥し、その面に金属箔を貼合わせ、次いで加
熱硬化させる方法、などが挙げられる。[0026] Using the epoxy resin composition of the present invention,
As a method for obtaining a laminate, for example, (1) a fibrous base material is impregnated with an epoxy resin composition, a predetermined number of sheets are stacked, and active energy rays such as ultraviolet rays are irradiated in air or an inert gas such as nitrogen. A method of pre-curing by irradiation, further covering with metal foil, and then heating and curing; (2) impregnating a fibrous base material with an epoxy resin composition and applying it one by one in air or in an inert gas such as nitrogen; (3) A method of pre-curing by irradiating active energy rays such as ultraviolet rays with active energy rays such as ultraviolet rays, stacking a predetermined number of sheets, further covering with metal foil, and then curing by heating. is impregnated with an epoxy resin composition, and after stacking a predetermined number of sheets, they are covered with an active energy ray-transparent film, and then precured by irradiation with active energy rays such as ultraviolet rays, and then the required surfaces of the metal foil are coated with an epoxy resin composition. Examples include a method in which the film is peeled off, a metal foil is pasted on the surface, and then the film is heated and cured.
【0027】上記(1)、(2)、(3)での加熱硬化
は連続加熱炉内で無圧下で行なわれても良いし、連続ダ
ブルベルトプレス等で連続的に加熱加圧成形されても良
いが、積層板の表面平滑性の点から加熱加圧成形の方が
好ましい。また、予備加熱後の積層体を裁断し、バッチ
ワイズで加熱加圧成形されても良い。加熱硬化は通常、
130〜190℃で行なわれる。加熱加圧成形の場合は
、通常5〜40kg/cm2 の圧力下で行なわれる。The heat curing in (1), (2), and (3) above may be carried out under no pressure in a continuous heating furnace, or may be carried out continuously under heat and pressure using a continuous double belt press or the like. However, from the viewpoint of surface smoothness of the laminate, heat-pressing molding is preferable. Alternatively, the preheated laminate may be cut and subjected to batchwise heating and pressure molding. Heat curing is usually
It is carried out at 130-190°C. In the case of hot pressure molding, it is usually carried out under a pressure of 5 to 40 kg/cm2.
【0028】[0028]
【実施例】次に本発明を製造例、実施例および比較例を
挙げ、本発明を更に具体的に説明する。尚、例中の部お
よび%は特に断りのない限りはすべて重量基準である。[Example] Next, the present invention will be explained in more detail with reference to production examples, working examples, and comparative examples. In addition, all parts and percentages in the examples are based on weight unless otherwise specified.
【0029】実施例1
ビスフェノールAとエピクロルヒドリンとの反応により
得られたエポキシ当量190なるエポキシ樹脂18.2
部、テトラブロモビスフェノールAとエピクロルヒドリ
ンとの反応により得られたエポキシ当量370のエポキ
シ樹脂22.8部、メチルヘキサヒドロ無水フタル酸2
5.2部、テトラブロモビスフェノールAとエピクロル
ヒドリンとの反応により得られたエポキシ当量370の
エポキシ樹脂のメタアクリレ−ト(60%)とスチレン
(40%)とよりなるエポキシビニルエステル樹脂溶液
28.0部、1−ヒドロキシシクロヘキシルフェニルケ
トン0.3部、ベンゾイルパーオキシド0.56部、ス
チレン4.8部および2−エチル−4−メチルイミダゾ
−ル0.28部を混合して液状エポキシ系樹脂組成物(
I−1)を調製した。Example 1 Epoxy resin 18.2 with an epoxy equivalent of 190 obtained by the reaction of bisphenol A and epichlorohydrin
1 part, 22.8 parts of an epoxy resin with an epoxy equivalent of 370 obtained by the reaction of tetrabromobisphenol A and epichlorohydrin, 2 parts of methylhexahydrophthalic anhydride
5.2 parts, 28.0 parts of an epoxy vinyl ester resin solution consisting of methacrylate (60%) of an epoxy resin with an epoxy equivalent of 370 obtained by the reaction of tetrabromobisphenol A and epichlorohydrin and styrene (40%). , 0.3 parts of 1-hydroxycyclohexyl phenyl ketone, 0.56 parts of benzoyl peroxide, 4.8 parts of styrene and 0.28 parts of 2-ethyl-4-methylimidazole were mixed to prepare a liquid epoxy resin composition. (
I-1) was prepared.
【0030】次いで、直ちにこのエポキシ系樹脂組成物
(I−1)を、厚さ0.18mm、幅1050mmの長
尺のガラスクロスに該エポキシ系樹脂組成物の含有率が
43%になる様に含浸せしめ、これを4枚重ね合せ、空
気雰囲気下で水銀ランプにより上下からそれぞれ500
0ミリジュール/cm2(以下、mJ/cm2と記す)
の紫外線を照射しながら搬送して積層体を予備硬化させ
た。更に厚さ35μm銅箔をその上下に重ね合せ、次い
で170℃に加熱されたダブルベルトプレス機で20k
g/cm2 の圧力で10分間加熱加圧成形した後、1
000mm×1000mmに裁断し、次いで170℃で
50分間後硬化して、厚さ0.8mmの積層板(II−
1)を20枚得た。Next, this epoxy resin composition (I-1) was immediately applied to a long glass cloth with a thickness of 0.18 mm and a width of 1050 mm so that the content of the epoxy resin composition was 43%. 4 sheets were stacked and exposed to 500 ml of heat from the top and bottom using a mercury lamp in an air atmosphere.
0 millijoule/cm2 (hereinafter referred to as mJ/cm2)
The laminate was pre-cured by being transported while being irradiated with ultraviolet rays. Furthermore, 35μm thick copper foil was layered on top and bottom of the copper foil, and then 20K was applied using a double belt press heated to 170℃.
After heating and pressure molding for 10 minutes at a pressure of g/cm2, 1
A laminate (II-
20 pieces of 1) were obtained.
【0031】得られた20枚の積層板(II−1)を用
い、以下の様にして積層板の表面平滑性、成形時の樹脂
流出量、吸水率およびハンダ耐熱性について測定したと
ころ、表面平滑性:良好、成形時の樹脂流出量:2.8
%、吸水率:0.14%、ハンダ耐熱性:○という良好
な結果が得られた。また、結果のバラツキも少なかった
。Using the obtained 20 laminates (II-1), the surface smoothness of the laminate, the amount of resin flowing out during molding, the water absorption rate, and the solder heat resistance were measured as follows. Smoothness: Good, resin flow rate during molding: 2.8
%, water absorption rate: 0.14%, and solder heat resistance: Good results were obtained. In addition, there was little variation in the results.
【0032】・表面平滑性:目視で積層板表面上の微細
波打ち発生状況を判定した。・樹脂流出量(%)=(W
0 −W1)/W0 ×100 にて算出し、平均値で
示した(ただし、W0 はエポキシ系樹脂組成物含有率
43%、寸法1000mm×1000mmの樹脂含浸基
材の重量、W1 は加熱加圧成形して得た寸法1000
mm×1000mmの積層板から銅箔重量を差し引いた
重量である。)。-Surface smoothness: The occurrence of fine waviness on the surface of the laminate was visually determined.・Resin flow rate (%) = (W
0 - W1)/W0 x 100 and shown as an average value (where W0 is the weight of a resin-impregnated base material with an epoxy resin composition content of 43% and dimensions of 1000 mm x 1000 mm, and W1 is the weight of a resin-impregnated base material with a size of 1000 mm x 1000 mm. Dimensions obtained by molding: 1000
This is the weight obtained by subtracting the copper foil weight from the mm x 1000 mm laminate. ).
【0033】・吸水率(%):25mm×25mmに切
断した積層板の片面の銅箔をエッチングで除去した後、
120℃、2気圧の条件で4時間プレッシャークッカー
テストを行い、(W′−W)/W×100にて吸水率を
算出し、平均値で示した(ただし、Wはテスト前の積層
板重量、W′はテスト後の積層板重量である。)。・Water absorption rate (%): After removing the copper foil on one side of the laminated board cut into 25 mm x 25 mm by etching,
A pressure cooker test was conducted for 4 hours at 120°C and 2 atm, and the water absorption rate was calculated using (W'-W)/W x 100, and the average value is shown (where W is the weight of the laminate before the test). , W' is the laminate weight after the test).
【0034】・ハンダ耐熱性:上記プレッシャークッカ
ーテスト後の積層板の表面の水分をよく拭き取った後、
JIS C−6481に準じて測定し、以下の基準で
評価した。
○:ハンダ耐熱性不良の試料全くなし。
△:ハンダ耐熱性不良の試料1/4未満あり。
×:ハンダ耐熱性不良の試料1/4以上あり。Soldering heat resistance: After thoroughly wiping off moisture on the surface of the laminate after the pressure cooker test,
It was measured according to JIS C-6481 and evaluated based on the following criteria. ○: No samples with poor solder heat resistance. △: Less than 1/4 of the samples had poor solder heat resistance. ×: More than 1/4 of the samples had poor solder heat resistance.
【0035】実施例2
実施例1と同様にして得たエポキシ系樹脂組成物(I−
1)を、厚さ0.18mm、幅1050mmの長尺のガ
ラスクロスに該エポキシ系樹脂組成物の含有率が43%
になる様に含浸せしめ、これを4枚重ね合せた後、厚さ
25μmのポリエチレンテレフタレートフィルムで上下
を被覆し、次いで水銀ランプにより上下からそれぞれ5
000mJ/cm2 の紫外線を照射して予備硬化した
後、フィルムを剥し、その上下両面に銅箔を被覆した以
外は実施例1と同様にして、厚さ0.8mmの積層板(
II−2)を20枚得た。Example 2 An epoxy resin composition (I-
1) was applied to a long glass cloth with a thickness of 0.18 mm and a width of 1050 mm, and the content of the epoxy resin composition was 43%.
After stacking 4 sheets, the upper and lower sides were covered with a 25 μm thick polyethylene terephthalate film, and then the top and bottom were soaked with a mercury lamp for 5
After pre-curing by irradiating ultraviolet rays of 000 mJ/cm2, the film was peeled off and a 0.8 mm thick laminate (
20 pieces of II-2) were obtained.
【0036】得られた20枚の積層板(II−2)を用
い、実施例1と同様にして積層板の表面平滑性、成形時
の樹脂流出量、吸水率およびハンダ耐熱性について測定
したところ、表面平滑性:良好、成形時の樹脂流出量:
2.8%、吸水率:0.12%、ハンダ耐熱性:○とい
う良好な結果が得られた。また、結果のバラツキも少な
かった。Using the obtained 20 laminates (II-2), the surface smoothness of the laminate, amount of resin flowing out during molding, water absorption, and solder heat resistance were measured in the same manner as in Example 1. , Surface smoothness: Good, Resin flow rate during molding:
Good results were obtained: 2.8%, water absorption rate: 0.12%, and solder heat resistance: ○. In addition, there was little variation in the results.
【0037】実施例3
テトラブロモビスフェノールAとエピクロルヒドリンと
の反応により得られたエポキシ当量370のエポキシ樹
脂のメタアクリレ−ト(60%)とスチレン(40%)
とよりなるエポキシビニルエステル樹脂溶液28.0部
とスチレン4.8部の代わりに、テトラブロモビスフェ
ノールAとエピクロルヒドリンとの反応により得られた
エポキシ当量370のエポキシ樹脂のメタアクリレ−ト
(70%)とメチルメタアクリレート(30%)とより
なるエポキシビニルエステル樹脂溶液28.0部とメチ
ルメタアクリレ−ト4.8部を用い、窒素雰囲気下で水
銀ランプにより上下からそれぞれ1500mJ/cm2
の紫外線を照射した以外は実施例1と同様にして、厚
さ0.8mmの積層板(II−3)を20枚得た。Example 3 Methacrylate (60%) and styrene (40%) of an epoxy resin with an epoxy equivalent of 370 obtained by the reaction of tetrabromobisphenol A and epichlorohydrin
Instead of 28.0 parts of an epoxy vinyl ester resin solution consisting of Using 28.0 parts of an epoxy vinyl ester resin solution consisting of methyl methacrylate (30%) and 4.8 parts of methyl methacrylate, 1500 mJ/cm2 was applied from the top and bottom using a mercury lamp under a nitrogen atmosphere.
Twenty laminate plates (II-3) having a thickness of 0.8 mm were obtained in the same manner as in Example 1 except that the ultraviolet rays were irradiated.
【0038】得られた20枚の積層板(II−3)を用
い、実施例1と同様にして積層板の表面平滑性、成形時
の樹脂流出量、吸水率およびハンダ耐熱性について測定
したところ、表面平滑性:良好、成形時の樹脂流出量:
2.9%、吸水率:0.13%、ハンダ耐熱性:○とい
う良好な結果が得られた。また、結果のバラツキも少な
かった。Using the obtained 20 laminates (II-3), the surface smoothness of the laminate, amount of resin flowing out during molding, water absorption, and solder heat resistance were measured in the same manner as in Example 1. , Surface smoothness: Good, Resin flow rate during molding:
Good results were obtained: 2.9%, water absorption rate: 0.13%, and solder heat resistance: ○. In addition, there was little variation in the results.
【0039】実施例4
1−ヒドロキシシクロヘキシルフェニルケトン0.3部
の代わりにベンゾフェノン0.3部を用いた以外は実施
例1と同様にして、厚さ0.8mmの積層板(II−4
)を20枚得た。Example 4 A 0.8 mm thick laminate (II-4
) was obtained.
【0040】得られた20枚の積層板(II−4)を用
い、実施例1と同様にして積層板の表面平滑性、成形時
の樹脂流出量、吸水率およびハンダ耐熱性について測定
したところ、表面平滑性:良好、成形時の樹脂流出量:
3.1%、吸水率:0.15%、ハンダ耐熱性:○とい
う良好な結果が得られた。また、結果のバラツキも少な
かった。Using the obtained 20 laminates (II-4), the surface smoothness of the laminate, the amount of resin flowing out during molding, the water absorption rate, and the solder heat resistance were measured in the same manner as in Example 1. , Surface smoothness: Good, Resin flow rate during molding:
Good results were obtained: 3.1%, water absorption rate: 0.15%, and solder heat resistance: ○. In addition, there was little variation in the results.
【0041】実施例5
ガラスクロス4枚を8枚に代えた以外は実施例1と同様
にして、厚さ0.8mmの積層板(II−5)を20枚
得た。Example 5 Twenty laminates (II-5) having a thickness of 0.8 mm were obtained in the same manner as in Example 1 except that 8 glass cloths were used instead of 4 glass cloths.
【0042】得られた20枚の積層板(II−5)を用
い、実施例1と同様にして積層板の表面平滑性、成形時
の樹脂流出量、吸水率およびハンダ耐熱性について測定
したところ、表面平滑性:良好、成形時の樹脂流出量:
3.0%、吸水率:0.14%、ハンダ耐熱性:○とい
う良好な結果が得られた。また、結果のバラツキも少な
かった。Using the obtained 20 laminates (II-5), the surface smoothness of the laminate, amount of resin flowing out during molding, water absorption, and solder heat resistance were measured in the same manner as in Example 1. , Surface smoothness: Good, Resin flow rate during molding:
Good results were obtained: 3.0%, water absorption rate: 0.14%, and solder heat resistance: ○. In addition, there was little variation in the results.
【0043】実施例6
2枚の幅1050mm、重量50g/m2 のガラス不
織布それぞれに、実施例1と同様にして得たエポキシ系
樹脂組成物(I−1)100部と平均粒子径8μmの水
酸化アルミニウム70部とを混合したエポキシ系樹脂組
成物(I−6)を含浸付着させ、重ね合わせた後、その
上下両面に厚さ0.18mm、重量210g/m2 の
ガラスクロスにエポキシ系樹脂組成物(I−1)を含浸
させた含浸ガラスクロス基材を1枚づつ貼合わせ、エポ
キシ系樹脂組成物(I−1)と(I−6)の全含浸基材
積層体中の含有率が72%になるように対ロ−ルで含浸
量を調整し、次いで該積層体の上下両面を25μm厚の
ポリエステルフィルムで被覆し、水銀ランプにより上下
からそれぞれ4000mJ/cm2 の紫外線を照射し
て予備硬化した以外は実施例1と同様にして、厚さ1.
6mmの積層板(II−6)を20枚得た。Example 6 100 parts of the epoxy resin composition (I-1) obtained in the same manner as in Example 1 and water with an average particle size of 8 μm were placed on two glass nonwoven fabrics each having a width of 1050 mm and a weight of 50 g/m2. The epoxy resin composition (I-6) mixed with 70 parts of aluminum oxide is impregnated and adhered, and after stacking, the epoxy resin composition is applied to glass cloth with a thickness of 0.18 mm and a weight of 210 g/m2 on both upper and lower surfaces. The impregnated glass cloth substrates impregnated with the substance (I-1) were laminated one by one, and the content of the epoxy resin compositions (I-1) and (I-6) in the entire impregnated substrate laminate was determined. The impregnation amount was adjusted to 72% using the rolls, and then both the upper and lower surfaces of the laminate were covered with 25 μm thick polyester films, and pre-cured by irradiating ultraviolet rays of 4000 mJ/cm2 from the top and bottom with a mercury lamp. The thickness was 1.
Twenty 6 mm laminates (II-6) were obtained.
【0044】得られた20枚の積層板(II−6)を用
い、実施例1と同様にして積層板の表面平滑性、成形時
の樹脂流出量、吸水率およびハンダ耐熱性について測定
したところ、表面平滑性:良好、成形時の樹脂流出量:
2.9%、吸水率:0.13%、ハンダ耐熱性:○とい
う良好な結果が得られた。また、結果のバラツキも少な
かった。Using the obtained 20 laminates (II-6), the surface smoothness of the laminate, amount of resin flowing out during molding, water absorption, and solder heat resistance were measured in the same manner as in Example 1. , Surface smoothness: Good, Resin flow rate during molding:
Good results were obtained: 2.9%, water absorption rate: 0.13%, and solder heat resistance: ○. In addition, there was little variation in the results.
【0045】実施例7
ビスフェノールAとエピクロルヒドリンとの反応により
得られたエポキシ当量190なるエポキシ樹脂18.2
部、テトラブロモビスフェノールAとエピクロルヒドリ
ンとの反応により得られたエポキシ当量370のエポキ
シ樹脂22.8部、メチルヘキサヒドロ無水フタル酸2
5.2部、テトラブロモビスフェノールAとエピクロル
ヒドリンとの反応により得られたエポキシ当量370の
エポキシ樹脂のメタアクリレ−ト(60%)とスチレン
(40%)とよりなるエポキシビニルエステル樹脂溶液
16.6部、1−ヒドロキシシクロヘキシルフェニルケ
トン0.18部、ベンゾイルパーオキシド0.33部、
スチレン2.8部および2−エチル−4−メチルイミダ
ゾ−ル0.28部を混合して液状エポキシ系樹脂組成物
(I−7)を調製し、このエポキシ系樹脂組成物(I−
7)を用いた以外は実施例1と同様にして、厚さ0.8
mmの積層板(II−7)を20枚得た。Example 7 Epoxy resin 18.2 with an epoxy equivalent of 190 obtained by the reaction of bisphenol A and epichlorohydrin
1 part, 22.8 parts of an epoxy resin with an epoxy equivalent of 370 obtained by the reaction of tetrabromobisphenol A and epichlorohydrin, 2 parts of methylhexahydrophthalic anhydride
5.2 parts, 16.6 parts of an epoxy vinyl ester resin solution consisting of methacrylate (60%) of an epoxy resin with an epoxy equivalent of 370 obtained by the reaction of tetrabromobisphenol A and epichlorohydrin and styrene (40%). , 0.18 parts of 1-hydroxycyclohexyl phenyl ketone, 0.33 parts of benzoyl peroxide,
A liquid epoxy resin composition (I-7) was prepared by mixing 2.8 parts of styrene and 0.28 parts of 2-ethyl-4-methylimidazole.
7) in the same manner as in Example 1 except that the thickness was 0.8
Twenty mm laminate plates (II-7) were obtained.
【0046】得られた20枚の積層板(II−7)を用
い、実施例1と同様にして積層板の表面平滑性、成形時
の樹脂流出量、吸水率およびハンダ耐熱性について測定
したところ、表面平滑性:良好、成形時の樹脂流出量:
3.2%、吸水率:0.12%、ハンダ耐熱性:○とい
う良好な結果が得られた。また、結果のバラツキも少な
かった。Using the obtained 20 laminates (II-7), the surface smoothness of the laminate, amount of resin flowing out during molding, water absorption, and solder heat resistance were measured in the same manner as in Example 1. , Surface smoothness: Good, Resin flow rate during molding:
Good results were obtained: 3.2%, water absorption rate: 0.12%, and solder heat resistance: ○. In addition, there was little variation in the results.
【0047】実施例8
ビスフェノールAとエピクロルヒドリンとの反応により
得られたエポキシ当量190なるエポキシ樹脂289.
1部と、テトラブロモビスフェノールAとエピクロルヒ
ドリンとの反応により得られたエポキシ当量370のエ
ポキシ樹脂596.9部とメチルメタアクリレート37
.2部と、ハイドロキノン0.32部と、トリフェニル
フォスフィン0.18部とを混合し、100℃で5時間
反応させた後、メチルメタアクリレート120部を加え
て反応物を溶解して、エポキシ樹脂の部分ビニルエステ
ル化物を得た。Example 8 An epoxy resin with an epoxy equivalent of 190 was obtained by the reaction of bisphenol A and epichlorohydrin.
1 part, 596.9 parts of an epoxy resin with an epoxy equivalent of 370 obtained by the reaction of tetrabromobisphenol A and epichlorohydrin, and 37 parts of methyl methacrylate.
.. 2 parts of epoxy A partially vinyl esterified resin was obtained.
【0048】このエポキシ樹脂の部分ビニルエステル化
物68.5部、メチルヘキサヒドロ無水フタル酸27.
3部、1−ヒドロキシシクロヘキシルフェニルケトン0
.1部、ベンゾイルパーオキシド0.3部、メチルメタ
アクリレート2.0部および2−エチル−4−メチルイ
ミダゾ−ル0.6部を混合して液状エポキシ系樹脂組成
物(I−7)を調製した。このエポキシ系樹脂組成物(
I−8)を用い、水銀ランプにより上下からそれぞれ1
500mJ/cm2 の紫外線を照射した以外は実施例
1と同様にして、厚さ0.8mmの積層板(II−8)
を20枚得た。68.5 parts of a partially vinyl esterified product of this epoxy resin, 27 parts of methylhexahydrophthalic anhydride.
3 parts, 1-hydroxycyclohexyl phenyl ketone 0
.. 1 part of benzoyl peroxide, 2.0 parts of methyl methacrylate, and 0.6 parts of 2-ethyl-4-methylimidazole to prepare a liquid epoxy resin composition (I-7). did. This epoxy resin composition (
1-8) from the top and bottom using a mercury lamp.
A laminate (II-8) with a thickness of 0.8 mm was prepared in the same manner as in Example 1 except that 500 mJ/cm2 of ultraviolet rays were irradiated.
I got 20 pieces.
【0049】得られた20枚の積層板(II−8)を用
い、実施例1と同様にして積層板の表面平滑性、成形時
の樹脂流出量、吸水率およびハンダ耐熱性について測定
したところ、表面平滑性:良好、成形時の樹脂流出量:
3.2%、吸水率:0.14%、ハンダ耐熱性:○とい
う良好な結果が得られた。また、結果のバラツキも少な
かった。Using the obtained 20 laminates (II-8), the surface smoothness of the laminate, resin flow rate during molding, water absorption, and solder heat resistance were measured in the same manner as in Example 1. , Surface smoothness: Good, Resin flow rate during molding:
Good results were obtained: 3.2%, water absorption rate: 0.14%, and solder heat resistance: ○. In addition, there was little variation in the results.
【0050】比較例1
実施例1と同様にして得たエポキシ系樹脂組成物(I−
1)を、厚さ0.18mm、幅1050mmの長尺のガ
ラスクロスに該エポキシ系樹脂組成物の含有率が43%
になる様に含浸せしめ、これを4枚重ね合せ、更に厚さ
35μm銅箔をその上下に重ね合せ、110℃の加熱炉
で4分間加熱しながら搬送し、次いで170℃に加熱さ
れたダブルベルトプレス機で20kg/cm2 の圧力
で10分間加熱加圧成形した後、1000mm×100
0mmに裁断し、次いで170℃で50分間後硬化して
、厚さ0.8mmの積層板(II′−1)を20枚得た
。Comparative Example 1 An epoxy resin composition (I-
1) was applied to a long glass cloth with a thickness of 0.18 mm and a width of 1050 mm, and the content of the epoxy resin composition was 43%.
This was impregnated so that 4 sheets were layered, and further, 35 μm thick copper foil was layered on top and bottom of it, and the double belt was heated in a heating furnace at 110℃ for 4 minutes while being conveyed, and then heated to 170℃. After heating and pressure molding for 10 minutes with a press machine at a pressure of 20 kg/cm2,
It was cut to 0 mm and then post-cured at 170°C for 50 minutes to obtain 20 laminates (II'-1) with a thickness of 0.8 mm.
【0051】得られた20枚の積層板(II′−1)を
用い、実施例1と同様にして積層板の表面平滑性、成形
時の樹脂流出量、吸水率およびハンダ耐熱性について測
定したところ、(II′−1)の表面には微細な波打ち
が生じていた。[0051] Using the obtained 20 laminates (II'-1), the surface smoothness of the laminate, the amount of resin flowing out during molding, the water absorption rate, and the solder heat resistance were measured in the same manner as in Example 1. However, fine undulations were observed on the surface of (II'-1).
【0052】[0052]
【発明の効果】低温短時間で予備硬化を行うことができ
て、揮発性物質の揮発も少なく、表面性に優れる積層板
が得られる。Effects of the Invention: A laminate can be obtained which can be precured at a low temperature and in a short time, has less volatilization of volatile substances, and has excellent surface properties.
Claims (1)
る熱硬化性エポキシ系樹脂組成物を含浸してなる長尺繊
維質基材又はその積層体に、活性エネルギ−線を照射し
て予備硬化させた後、金属箔を重ね合わせて加熱硬化さ
せることを特徴とする積層板の製造方法。 【請求項2】 エポキシ系樹脂組成物が、重合性不飽
和基を有する樹脂成分を含有してなる樹脂組成物である
請求項1記載の製造方法。 【請求項3】 エポキシ系樹脂組成物が、エポキシビ
ニルエステル樹脂と熱硬化性エポキシ樹脂とを含有して
なる樹脂組成物である請求項1記載の製造方法。 【
請求項4】 エポキシ系樹脂組成物が、エポキシ樹脂
の部分ビニルエステル化物を含有してなる樹脂組成物で
ある請求項1記載の製造方法。 【請求項5】 エポキシ系樹脂組成物が、硬化剤とし
て酸無水物系化合物を含有するで樹脂組成物である請求
項3又は4記載の製造方法。 【請求項6】 繊維質基材が、長尺のガラスクロスお
よび/又はガラス不織布である請求項1〜5のいずれか
1つに記載の製造方法。 【請求項7】 活性エネルギ−線が、紫外線である請
求項1〜6のいずれか1つに記載の製造方法。[Scope of Claims] [Claim 1] A long fibrous base material or a laminate thereof impregnated with a thermosetting epoxy resin composition containing an active energy beam-curable resin. A method for manufacturing a laminate, which comprises pre-curing by irradiating with metal foil, and then superimposing metal foils and curing by heating. 2. The method according to claim 1, wherein the epoxy resin composition is a resin composition containing a resin component having a polymerizable unsaturated group. 3. The manufacturing method according to claim 1, wherein the epoxy resin composition is a resin composition containing an epoxy vinyl ester resin and a thermosetting epoxy resin. [
4. The method according to claim 1, wherein the epoxy resin composition is a resin composition containing a partially vinyl esterified epoxy resin. 5. The manufacturing method according to claim 3, wherein the epoxy resin composition is a resin composition containing an acid anhydride compound as a curing agent. 6. The manufacturing method according to claim 1, wherein the fibrous base material is a long glass cloth and/or a glass nonwoven fabric. 7. The manufacturing method according to claim 1, wherein the active energy rays are ultraviolet rays.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3034058A JPH04272845A (en) | 1991-02-28 | 1991-02-28 | Manufacture of laminated board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3034058A JPH04272845A (en) | 1991-02-28 | 1991-02-28 | Manufacture of laminated board |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04272845A true JPH04272845A (en) | 1992-09-29 |
Family
ID=12403680
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3034058A Pending JPH04272845A (en) | 1991-02-28 | 1991-02-28 | Manufacture of laminated board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04272845A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08118543A (en) * | 1994-10-28 | 1996-05-14 | Matsushita Electric Works Ltd | Production of copper clad laminated sheet |
JPH08290527A (en) * | 1995-04-25 | 1996-11-05 | Matsushita Electric Works Ltd | Continuous manufacture of laminated sheet |
-
1991
- 1991-02-28 JP JP3034058A patent/JPH04272845A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08118543A (en) * | 1994-10-28 | 1996-05-14 | Matsushita Electric Works Ltd | Production of copper clad laminated sheet |
JPH08290527A (en) * | 1995-04-25 | 1996-11-05 | Matsushita Electric Works Ltd | Continuous manufacture of laminated sheet |
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