JPH04269514A - Molding die - Google Patents
Molding dieInfo
- Publication number
- JPH04269514A JPH04269514A JP3021591A JP3021591A JPH04269514A JP H04269514 A JPH04269514 A JP H04269514A JP 3021591 A JP3021591 A JP 3021591A JP 3021591 A JP3021591 A JP 3021591A JP H04269514 A JPH04269514 A JP H04269514A
- Authority
- JP
- Japan
- Prior art keywords
- molding die
- photosensitive glass
- molding
- mold
- manufacture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000465 moulding Methods 0.000 title claims abstract description 38
- 239000006089 photosensitive glass Substances 0.000 claims abstract description 18
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims abstract description 3
- 229920005989 resin Polymers 0.000 abstract description 13
- 239000011347 resin Substances 0.000 abstract description 13
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract description 9
- 229910052751 metal Inorganic materials 0.000 abstract description 8
- 239000002184 metal Substances 0.000 abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 239000013078 crystal Substances 0.000 abstract description 5
- 238000005530 etching Methods 0.000 abstract description 4
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 abstract description 2
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 abstract description 2
- 238000005520 cutting process Methods 0.000 abstract description 2
- 229910052737 gold Inorganic materials 0.000 abstract description 2
- 150000002739 metals Chemical class 0.000 abstract description 2
- 229910052709 silver Inorganic materials 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 229960002050 hydrofluoric acid Drugs 0.000 abstract 1
- 239000000758 substrate Substances 0.000 description 15
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 238000005253 cladding Methods 0.000 description 3
- 238000005323 electroforming Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- KXSKAZFMTGADIV-UHFFFAOYSA-N 2-[3-(2-hydroxyethoxy)propoxy]ethanol Chemical compound OCCOCCCOCCO KXSKAZFMTGADIV-UHFFFAOYSA-N 0.000 description 2
- 101000693243 Homo sapiens Paternally-expressed gene 3 protein Proteins 0.000 description 2
- 102100025757 Paternally-expressed gene 3 protein Human genes 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 241000511976 Hoya Species 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- PAZHGORSDKKUPI-UHFFFAOYSA-N lithium metasilicate Chemical compound [Li+].[Li+].[O-][Si]([O-])=O PAZHGORSDKKUPI-UHFFFAOYSA-N 0.000 description 1
- 229910052912 lithium silicate Inorganic materials 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Landscapes
- Laminated Bodies (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Glass Compositions (AREA)
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、例えば、紫外線硬化樹
脂等を充填,硬化させる成形機にて用いる成形用金型に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mold used in a molding machine for filling and curing ultraviolet curing resin, for example.
【0002】0002
【従来の技術】従来、紫外線硬化樹脂を用いて光導波路
アレイのクラッド基板等を成形するに必要な精密な成形
用金型は、電鋳法を用いて金属より成る。以下に、その
成形用金型の製造方法について、図5をもとに具体的に
述べる。2. Description of the Related Art Conventionally, precision molding molds necessary for molding cladding substrates of optical waveguide arrays using ultraviolet curing resins are made of metal using electroforming. Below, a method for manufacturing the molding die will be specifically described based on FIG. 5.
【0003】まず、基板50上に、フォトレジスト51
を塗布した後、フォトマスク52を介して、紫外線53
を照射して潜像を作る(図5(a))。First, a photoresist 51 is placed on the substrate 50.
After coating, ultraviolet rays 53 are applied through a photomask 52.
is irradiated to create a latent image (Figure 5(a)).
【0004】次に、現像,ベーキングを行って基板50
上にレジストパターン55(図5(b))を形成し、そ
の後、フォトレジスト表面に導電膜56をスパッター等
で形成し、(図5(c))、次に、電鋳液中にて電鋳膜
57を必要量厚付する(図5(d))。その後、電鋳膜
57を基板50より剥離し、付着したフォトレジスト5
1を有機溶剤等で除去し、必要な後加工を行ない、成形
用金型58(図5(e))とする。Next, development and baking are performed to form the substrate 50.
A resist pattern 55 (FIG. 5(b)) is formed on the photoresist surface, and then a conductive film 56 is formed on the photoresist surface by sputtering or the like (FIG. 5(c)). A required thickness of the cast film 57 is applied (FIG. 5(d)). After that, the electroformed film 57 is peeled off from the substrate 50, and the attached photoresist 5 is removed.
1 is removed using an organic solvent or the like, and necessary post-processing is performed to obtain a molding die 58 (FIG. 5(e)).
【0005】[0005]
【発明が解決しようとする課題】しかしながら、上記の
ような金属製成形用金型は、以下に述べるように、多く
の工程とそれに伴う設備を必要とする。[Problems to be Solved by the Invention] However, the metal molding die described above requires many steps and associated equipment, as described below.
【0006】第1に、フォトレジストを用いるパターン
形成は、フォトレジスト,塗布,ベーキング,露光,現
像等多くの工程が必要である。First, pattern formation using a photoresist requires many steps such as photoresist application, coating, baking, exposure, and development.
【0007】第2に、導電膜を形成するに必要なスパッ
ター,蒸着法は、高価な大型装置を必要とする。更に、
良質な膜を形成するには、高真空度が必要であり、長時
間を要する。Second, the sputtering and vapor deposition methods necessary to form the conductive film require large and expensive equipment. Furthermore,
Forming a high-quality film requires a high degree of vacuum and takes a long time.
【0008】第3に、電鋳法による金属膜の厚付におい
て、良質な膜を得るには、種々の条件,例えば、金属イ
オン濃度,添加剤濃度,pH,温度,電流密度分布,通
電量等を厳密に管理する必要がある。Thirdly, in forming a thick metal film by electroforming, in order to obtain a good quality film, various conditions such as metal ion concentration, additive concentration, pH, temperature, current density distribution, and amount of current must be adjusted. It is necessary to strictly manage such matters.
【0009】以上の様に、従来の金属製成形用金型を作
成するには、多数の装置,設備が必要であり、更に良質
な金型を作成するには、多くの労力と時間が必要である
。[0009] As mentioned above, creating conventional metal molds requires a large number of devices and equipment, and creating even better quality molds requires a lot of labor and time. It is.
【0010】本発明は、上述した問題点を解決するため
になされたものであり、第1の目的は多くの装置,設備
を用いることなく、安価に、短時間に、高精度な成形用
金型を提供することであり、第2の目的は、成形用金型
の表面を保護し、高精度なレプリカをより多量に作成す
ることが出来る成形用金型を提供することである。The present invention has been made to solve the above-mentioned problems, and its first purpose is to produce a high-precision molding metal at low cost and in a short time without using many devices and facilities. The second object of the present invention is to provide a molding die that can protect the surface of the molding die and produce a large number of highly accurate replicas.
【0011】[0011]
【課題を解決するための手段】この目的を達成するため
に本発明の成形用金型の材料として感光性ガラスを用い
たものである。[Means for Solving the Problems] In order to achieve this object, photosensitive glass is used as a material for the molding die of the present invention.
【0012】尚、金型の表面に、SiC,TiN等の高
強度の膜を形成しても良い。[0012] A high-strength film of SiC, TiN, etc. may be formed on the surface of the mold.
【0013】[0013]
【作用】上記の構成を有する本発明においては、例えば
紫外線硬化樹脂の成形機の成形用金型を感光性ガラスで
形成した。[Function] In the present invention having the above-mentioned structure, for example, a mold for molding an ultraviolet curing resin molding machine is made of photosensitive glass.
【0014】[0014]
【実施例】以下、本発明を具体化した一実施例を図面を
参照して説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment embodying the present invention will be described below with reference to the drawings.
【0015】図1は、紫外線硬化樹脂の成形機の斜視図
である。FIG. 1 is a perspective view of a molding machine for ultraviolet curing resin.
【0016】感光性ガラスで形成された成形用金型10
は、固定治具台11に固定され、固定治具台11は、加
圧機12に固定されている。例えば、ポリカボネイト樹
脂等の透明基板13は、透明基板固定治具14に固定さ
れている。Molding mold 10 made of photosensitive glass
is fixed to a fixture stand 11, and the fixture stand 11 is fixed to a pressurizing machine 12. For example, a transparent substrate 13 made of polycarbonate resin or the like is fixed to a transparent substrate fixing jig 14.
【0017】次にこの成形機を用いて、導波路アレイ用
クラッド基板20の成形法について説明する。Next, a method of molding the waveguide array clad substrate 20 using this molding machine will be explained.
【0018】まず、成形用金型10の上に紫外線硬化樹
脂15、例えば東亜合成(株)製アロニックス310を
均一に滴下した後、加圧機12で、成形用金型10と固
定治具台11を上昇させ更に、透明基板13を、透明基
板固定治具14に押し付ける。ついで、均一に約1Kg
/cm2 の圧力で押圧後、透明基板固定治具14の開
口部を通して、水銀ランプ16より紫外線を照射させ、
紫外線硬化樹脂15を硬化させる。除圧すると成形用金
型10の表面の凹凸を転写して硬化した紫外線硬化樹脂
15は、透明基板13に付着し、導波路アレイ用クラッ
ド基板20が形成される。ここで用いる紫外線硬化樹脂
15は、常温で液体であるので、成形時の押圧が少なく
ても良好なレプリカ精度が得られる。First, after uniformly dropping an ultraviolet curing resin 15 such as Aronix 310 manufactured by Toagosei Co., Ltd. onto the molding die 10, the molding die 10 and the fixing jig table 11 are pressed together using a pressurizer 12. and further press the transparent substrate 13 against the transparent substrate fixing jig 14. Then, evenly weigh about 1 kg.
After pressing with a pressure of /cm2, ultraviolet rays are irradiated from the mercury lamp 16 through the opening of the transparent substrate fixing jig 14,
The ultraviolet curing resin 15 is cured. When the pressure is removed, the ultraviolet curing resin 15, which has been cured by transferring the unevenness on the surface of the molding die 10, adheres to the transparent substrate 13, thereby forming the waveguide array cladding substrate 20. Since the ultraviolet curable resin 15 used here is liquid at room temperature, good replica accuracy can be obtained even with less pressure during molding.
【0019】図2は成形用金型で成形された前記導波路
アレイ用クラッド基板20を用いた導波路アレイの斜視
図である。FIG. 2 is a perspective view of a waveguide array using the waveguide array clad substrate 20 molded with a mold.
【0020】クラッド基板20の凹部に、高屈折率紫外
線硬化樹脂、例えば東亜合成(株)製アロニックス21
0を充填して、紫外線にて硬化させてコア部21を形成
する。次に、クラッド基板20と同じ紫外線硬化樹脂を
均一に塗布して紫外線にて硬化させてクラッド22を形
成する。この様に形成された導波路アレイにおいて、光
は導波路アレイの入射端から出射端までコア部21に閉
じ込められた状態で伝送される。A high refractive index ultraviolet curing resin, such as Aronix 21 manufactured by Toagosei Co., Ltd., is placed in the concave portion of the cladding substrate 20.
0 is filled and cured with ultraviolet rays to form the core portion 21. Next, the same ultraviolet curable resin as the clad substrate 20 is uniformly applied and cured with ultraviolet light to form the clad 22. In the waveguide array formed in this manner, light is transmitted while being confined in the core portion 21 from the input end to the output end of the waveguide array.
【0021】次に、本発明の感光性ガラスを用いた成形
用金型10の製法を図3を参照して具体的に説明する。Next, a method for manufacturing the molding die 10 using the photosensitive glass of the present invention will be specifically explained with reference to FIG.
【0022】ここでは、感光性ガラスとして、例えば、
HOYA(株)製化学切削用感光性ガラスPEG3を用
いる。PEG3は、少量の金属、例えばAu,Ag,C
uと増感剤、例えばCeO2 を含むケイ酸塩ガラス系
である。[0022] Here, as the photosensitive glass, for example,
Photosensitive glass PEG3 for chemical cutting manufactured by HOYA Corporation is used. PEG3 contains small amounts of metals such as Au, Ag, C
A silicate glass system containing u and a sensitizer, such as CeO2.
【0023】まず、必要な寸法精度,面荒度を満たした
感光性ガラス31に、導波路アレイのパターンを描いた
フォトマスク32を密着させ、水銀−キセノンランプ3
3より紫外線を照射し露光する(図3(a))。この水
銀−キセノンランプ33は、感光性ガラスの最大露光感
度320nm付近に発光スペクトルを有する。First, a photomask 32 with a pattern of a waveguide array is brought into close contact with a photosensitive glass 31 that satisfies the required dimensional accuracy and surface roughness, and a mercury-xenon lamp 3 is attached.
3, irradiate and expose with ultraviolet light (FIG. 3(a)). This mercury-xenon lamp 33 has an emission spectrum near the maximum exposure sensitivity of photosensitive glass of 320 nm.
【0024】次に、この露光した感光性ガラス31を4
50〜600℃で熱処理すると、ガラス31中の露光部
分で金属コロイドが生成し、これを結晶核として、メタ
ケイ酸リチウム結晶が折出する(図3(b))。この結
晶のフッ酸に対する溶解度は、結晶化前と比べ約50倍
である。Next, this exposed photosensitive glass 31 is
When heat treated at 50 to 600° C., metal colloid is generated in the exposed portion of the glass 31, and lithium metasilicate crystals are precipitated using this as a crystal nucleus (FIG. 3(b)). The solubility of this crystal in hydrofluoric acid is approximately 50 times higher than that before crystallization.
【0025】続いて、熱処理したガラス31を4〜5%
のフッ酸に浸漬し、露光部分の結晶性ガラスを溶解エッ
チングして成形用金型10が形成される(図3(c))
。エッチング深さは、導波路アレイのコア部の高さに相
当するが、浸漬時間,フッ酸濃度にて制御する。また、
ここで、十分な攪拌を行なった方がエッチング速度,加
工精度の再現性が良い。[0025] Subsequently, 4 to 5% of the heat-treated glass 31
The mold 10 is formed by immersing it in hydrofluoric acid and dissolving and etching the exposed portion of the crystalline glass (FIG. 3(c)).
. The etching depth corresponds to the height of the core portion of the waveguide array, and is controlled by the immersion time and the hydrofluoric acid concentration. Also,
Here, the etching speed and processing accuracy are better reproducible if sufficient stirring is performed.
【0026】更に、全体を紫外線照射,800〜900
℃で熱処理すると、より大きな機械的強度を持つ、成形
用金型10が完成する。[0026] Furthermore, the entire body is irradiated with ultraviolet light, 800 to 900
When heat-treated at ℃, a molding die 10 having greater mechanical strength is completed.
【0027】以上の様に、感光性ガラスを用いると、露
光後に熱処理とフッ酸浸漬のみで簡便に成形用金型が出
来る。As described above, when photosensitive glass is used, a mold for molding can be easily made by only heat treatment and hydrofluoric acid immersion after exposure.
【0028】図4に、この成形用金型34の表面に、S
iC,TiN等の高強度膜40をスパッター,蒸着等で
形成した成形用金型を示す。高強度膜を形成することで
、成形時における金型表面の損傷を無くすことが出来、
高精度なレプリカをより多量に作製することが可能とな
る。FIG. 4 shows that S is formed on the surface of the molding die 34.
A molding die in which a high-strength film 40 of iC, TiN, etc. is formed by sputtering, vapor deposition, etc. is shown. By forming a high-strength film, it is possible to eliminate damage to the mold surface during molding.
It becomes possible to produce a larger quantity of highly accurate replicas.
【0029】[0029]
【発明の効果】以上詳述したことから明らかなように、
本発明によれば、感光性ガラスを用いて、紫外線硬化樹
脂の成形用金型を形成することで、フォトレジストによ
るフォトリソグラフィー工程及び電鋳工程等が不要とな
るので装置,設備の大幅な簡略化が出来、品質向上,コ
ストダウンが可能となる。[Effect of the invention] As is clear from the detailed description above,
According to the present invention, by forming a mold for molding an ultraviolet curing resin using photosensitive glass, a photolithography process using a photoresist, an electroforming process, etc. are no longer necessary, which greatly simplifies equipment and equipment. This makes it possible to improve quality and reduce costs.
【図1】紫外線硬化樹脂の成形機の斜視図である。FIG. 1 is a perspective view of a molding machine for ultraviolet curable resin.
【図2】導波路アレイの斜視図である。FIG. 2 is a perspective view of a waveguide array.
【図3】感光性ガラスによる成形用金型の製法を説明す
る図である。FIG. 3 is a diagram illustrating a method of manufacturing a molding die using photosensitive glass.
【図4】表面に高強度膜を形成した成形用金型の断面図
である。FIG. 4 is a cross-sectional view of a molding die with a high-strength film formed on its surface.
【図5】従来例を説明する図である。FIG. 5 is a diagram illustrating a conventional example.
10 成形用金型 31 感光性ガラス 40 高強度膜 10 Molding mold 31 Photosensitive glass 40 High strength membrane
Claims (2)
を特徴とする成形用金型。1. A molding die characterized in that photosensitive glass is used as a material.
、金型の表面に、SiC,TiN等の高強度膜を形成し
たことを特徴とする成形用金型。2. The molding mold according to claim 1, wherein a high-strength film of SiC, TiN, or the like is formed on the surface of the mold.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3021591A JPH04269514A (en) | 1991-02-25 | 1991-02-25 | Molding die |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3021591A JPH04269514A (en) | 1991-02-25 | 1991-02-25 | Molding die |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04269514A true JPH04269514A (en) | 1992-09-25 |
Family
ID=12297504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3021591A Pending JPH04269514A (en) | 1991-02-25 | 1991-02-25 | Molding die |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04269514A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002243916A (en) * | 2001-02-06 | 2002-08-28 | Ctx Opto Electronics Corp | Method for manufacturing panel type optical device |
JP2019070193A (en) * | 2017-10-06 | 2019-05-09 | ニヴァロックス−ファー ソシエテ アノニム | Die for electric plating and production process of the same |
-
1991
- 1991-02-25 JP JP3021591A patent/JPH04269514A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002243916A (en) * | 2001-02-06 | 2002-08-28 | Ctx Opto Electronics Corp | Method for manufacturing panel type optical device |
JP2019070193A (en) * | 2017-10-06 | 2019-05-09 | ニヴァロックス−ファー ソシエテ アノニム | Die for electric plating and production process of the same |
JP2021181628A (en) * | 2017-10-06 | 2021-11-25 | ニヴァロックス−ファー ソシエテ アノニム | Metal mold for electroplating and process for producing the same |
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