JPH0426796A - Continuous electroplating device provided with cushion nozzle - Google Patents

Abstract

PURPOSE:To prevent the sticking of a steel strip to an electrode plate without practically deteriorating an effect in straightening the C warpage of the strip by setting a cushion nozzle at a specified position in the longitudinal direction of the electrode plate. CONSTITUTION:The cushion nozzle is set on the outlet side of the electrode plate in its longitudinal direction to prevent the sticking of a steel strip 5 to the electrode plate 2. Meanwhile, the nozzle is preferably set at the center of the electrode plate in its longitudinal direction to maximize an effect in straightening the warpage of the strip 5. The set position of the nozzle is experimentally specified to meet the requirements, and the ratio of the distance (m) between the electrode plate inlet and the nozzle to the distance (n) between the nozzle and the electrode plate outlet is controlled to (1:4) to (1:2).

Description

DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to an apparatus for continuous electroplating, for example of steel strip.

(Prior Art) A continuous electroplating apparatus for strips, for example steel strips, is disclosed in, for example, Japanese Utility Model Application Publication No. 1-65861
87595). The configuration of this conventional continuous electroplating apparatus will be explained using FIG. 4. FIG. 4 is a schematic vertical cross-sectional view showing an example of a conventional continuous electroplating apparatus. Two sets of electrode plates 2.2 are placed so as to face each other while being immersed in this plating solution. Further, a rubber roll 3 is provided inside the electrolytic cell 1, and a conductor roll 4 is provided outside. and,
These two rolls guide the steel strip 5 between the facing electrode plates 2.2 and continuously feed the steel strip 5, while the conductor crawler 4 energizes the steel strip 5. And 7, conduct crawl 4
A voltage is applied between the steel strip 5 and the electrode plates 2, so that when the steel strip 5 passes between the electrode plates 2, the surface thereof is electroplated.

At the end of the electrode plate 2, a supply nozzle II is arranged in a flow path surrounded by the electrode plate 2 and the steel strip 5 for injecting a plating liquid flow parallel to and opposite to the steel strip 5. There is.

Now, as mentioned above, the steel strip 5 is fed continuously.
A slit 6.6 is formed in the thickness direction of each of the electrode plates 2 disposed on both sides of the electrode plate 2. In this way, the plating solution is sprayed through the two facing slits 6.6. A cushion nozzle is formed for this purpose.

The slits 6.6 are formed with alternating opposite slopes. Furthermore, two slits 6 having opposite inclinations to each other are provided.
．． A header 7 surrounding the plating solution 6 is provided, and a pipe 8 for supplying a plating solution is provided within the header 7.

In the figure, piping 8 is shown for one header 7, and the others are omitted. Then, the pressure of the plating solution in the electrolytic cell 1 is increased to
A pump 9 is provided for supplying water to the air. The plating solution pressurized by the pump 9 is supplied into the hender 7 through the pipe 8 and is sprayed onto the surface of the steel strip 5 through the slit 6. On the other hand, a bypass flow path 10 is formed on the back side of the slit 6 surrounded by a spade 7 in the electrode plate 2, and the plating liquid sprayed from the slit 6 is transferred from the end of the electrode plate 2 to the rope strip. The plating liquid flow in the opposite direction to the plating liquid flow injected in the opposite direction parallel to 5 is the bypass flow path 10.
All the plating solution flows in the same direction through the plating solution. Note that 12 is a flow rate adjustment hole provided in the bypass flow path.

As described above, in the conventional continuous electroplating apparatus, the pass line of the steel strip 5 can be positioned at approximately medium heat of the electrode plate 2 due to the effect of the cushion nozzle, and
Since the distance between them can be set small, there is an advantage that the amount of power required for the continuous electroplating apparatus can be reduced.

(Problems to be Solved by the Invention) However, since the slit 6 constituting the cushion nozzle of the conventional continuous electroplating device is located approximately at the longitudinal center of the electrode plate 2, it has the following drawbacks. had. That is, when the advancing speed of the steel strip 5 located at approximately medium heat in the width direction between the electrode plates 2 increases, near the entrance of the electrode plate 2, the steel strip 5 is attracted to one of the electrode plates 2 and Since the distance between the steel strip 5 and the other electrode plate 2 increases, the flow of the plating solution on both sides of the steel strip 5 becomes unbalanced. For this reason, when the steel strip 5 that is close to one electrode plate 2 approaches to a certain distance, the steel strip 5 will suddenly become closer to the electrode plate 2.
There was a risk that the steel strip 5 and the electrode plate 2 would eventually come into contact with each other, resulting in damage to the equipment.

Therefore, in conventional continuous electroplating equipment, it is impossible to shorten the distance between electrode plates beyond a certain value, and by shortening the distance between electrode plates, the power consumption of continuous electroplating equipment can be further reduced. It was almost difficult.

Here, the purpose of the present invention is to solve the above problems,
Specifically, the purpose is to provide a continuous electroplating apparatus that can significantly reduce power consumption.

(Means for Solving the Problems) The present inventors have conducted various studies in order to solve the above problems.

First, as described above, it has been found that in a conventional continuous electroplating apparatus, the reason why the strip and the electrode plate come into contact with each other at or near the inlet is due to the direction in which the plating solution flows. That is, in the conventional continuous electroplating apparatus shown in FIG. 4, the direction of the plating liquid flow injected from the supply nozzle 11 is opposite to that of the steel strip 5 between the longitudinal center of the electrode plate 2 and the exit of the steel strip 5. The contact does not occur because the flow is uniform in the direction, but between the longitudinal center of the electrode plate 2 and the inlet of the strip 5, the plating liquid flow injected from the supply nozzle 1 is not affected by the slit 6, etc. Therefore, when the advancing speed of the strip 5 increases, the flow of the plating solution between the longitudinal center of the electrode plate 2 and the inlet of the strip 5 is disturbed.

That is, between the longitudinal center of the electrode plate 2 and the inlet of the strip 5, the influence of the plating liquid flow sprayed from the supply nozzle 11 is reduced, so when the speed of the steel ring 5 is high, Disturbances occur in the flow of the plating solution between the electrode plates 2, and as a result, the flow of the plating solution in the direction opposite to the advancing direction of the steel strip 5 is disturbed. It is considered that contact between the electrode plate 2 and the electrode plate 2 occurs.

In addition, in the conventional continuous electroplating apparatus, the cushion nozzle arranged approximately in the longitudinal center of the electrode plate corrects the C warpage (curl curl) of the steel strip 5 and
The cushion nozzle is provided to prevent contact with the conductor roll 4 and the rubber roll 3, and its correction ability is maximized when the cushion nozzle is installed approximately at the midpoint between the conductor crawler 4 and the rubber roll 3, that is, at the midpoint in the longitudinal direction of the electrode plate 2. confirmed.

Furthermore, in order to prevent the conventional sticking phenomenon of the steel strip 5 to the electrode plate 2, the flow of the plating solution at the inlet of the cushion nozzle and the electrode plate must be maintained in a direction opposite to that of the steel strip 5. For this purpose, it is necessary to increase the length in the longitudinal direction of the electrode plate 2 over which the plating liquid flow injected from the supply nozzle 11 has the effect of preventing contact between the steel strip 5 and the electrode plate 2. We also found that this is important.

Based on such findings, the present inventors conducted further studies. Figure 2 shows the C warp correction effect (line A) caused by the installation position of the cushion nozzle in the longitudinal direction of the electrode plate 2 and the effect of preventing contact between the steel strip and the electrode plate (line B) in various continuous electroplating devices. ).

In the same figure, although the optimum position for each correction effect is different, the range where practical correction effects can be obtained overlaps, so the C warp correction effect (line A) and the contact prevention effect (line B) are taken into account to provide a comprehensive result. The effect (line C) was obtained.

As a result, as mentioned above, the cushion nozzle has C
In order to increase the effect of preventing contact as described above without reducing the Fi correction effect as much as possible, the cushion nozzle should be placed on the inlet side in the longitudinal direction of the electrode plate from the center in the longitudinal direction of the electrode plate, that is, on the (electrode Distance between plate inlet and cushion nozzle N): (Distance between cushion nozzle and electrode plate outlet) is 1
The present invention was completed by discovering that it is sufficient to arrange the position from 4 to 1.2.

Here, the gist of the present invention is to provide electrode plates that face each other in an electrolytic cell and between which a strip is supplied;
A continuous electroplating apparatus comprising: a supply nozzle installed at the outlet side end of the electrode plate to supply a plating solution between the electrode plates; and a cushion nozzle installed midway in the longitudinal direction of the electrode plate, The cushion nozzle is characterized in that the cushion nozzle is provided at a position where the ratio of the distance between the strip inlet section and the cushion nozzle installation section and the distance between the cushion nozzle installation section and the strip exit section is 1:4 to 1:2. This is a continuous electroplating device.

In the present invention, the "distance between the strip inlet part and the cushion nozzle installation part" means the distance between the electrode plate inlet part and the center position of the cushion nozzle in the feeding direction of the steel strip, and is m or m in FIG. In addition, in the present invention, the "distance between the cushion nozzle installation part and the strip exit part" means the distance between the center position of the cushion nozzle and the electrode plate exit part in the feeding direction of the steel strip. , corresponds to n or n'' in FIG.

(effect) Hereinafter, the effects of the present invention will be explained.

According to the present invention, instead of installing the cushion nozzle at approximately medium heat in the longitudinal direction of the electrode plate as in conventional continuous electroplating equipment, the distance between the strip entrance part and the cushion nozzle installation part in the electrode plate and the cushion nozzle are Nozzle installation part ~
The ratio of the distance between the strip outlet parts on the electrode plate is 1=4
Since it is installed at a position where the ratio is ˜I:2, it is possible to completely prevent the strip from sticking to or coming into contact with the electrode plate, without substantially impairing the effect of straightening the C warp on the strip.

Therefore, changes in the operating speed of continuous electroplating equipment ("
It is possible to prevent contact between the strip and the electrode due to the above-mentioned conditions, thereby preventing damage to the electrode plate and deterioration of the quality of the strip.

Therefore, in the conventional continuous electroplating apparatus, it is possible to reduce the distance between the electrode plates compared to the conventional one for the purpose of reducing power cost.

Furthermore, the continuous electroplating apparatus according to the present invention will be explained in more detail with reference to the accompanying drawings.

(Example) FIG. 1 is a schematic sectional view showing the configuration of one example of a continuous electroplating apparatus according to the present invention. In the figure, 1 is an electrolytic bath, and inside the electrolytic bath Two sets of electrode plates 2 are placed so that they are immersed in the plating liquid and face each other. Further, a rubber roll 3 is provided inside the electrolytic cell 1, and a conductor roll 4 is provided outside. Then, by one of these rolls, the steel strip 5 faces the electrode plate 2.
The steel strip 5 is energized by the conductor crawler 4 while being guided and continuously supplied between the steel strips. A voltage is applied between the conductor crawler 4 and the electrode plate 2, and when the steel strip 5 passes between the electrode plates 2, the surface thereof is electroplated. ing.

A supply nozzle 11 is arranged at the end of the electrode plate 2 to inject a plating liquid flow in a direction parallel to and opposite to the steel strip 5 in a flow path surrounded by the electrode plate 2 and the steel strip 5. There is.

Furthermore, slits 6 are formed in the thickness direction of each of the electrode plates 2 disposed on both sides of the steel strip 5 that is continuously supplied as described above, and the slits 6 that face each other A cushion nozzle is formed. The slits 6 are formed with alternately opposite slopes. In addition, two sulin l-
A header 7 surrounding the plating solution 6 is provided, and a pipe 8 for supplying a plating solution is provided within the header 7. A pump 9 is provided that increases the pressure of the plating solution in the electrolytic cell 1 and supplies it to the piping 8. The plating solution pressurized by the pump 9 is supplied into the header 7 through the pipe 8 and is sprayed onto the surface of the steel strip 5 through the slit 6.

On the other hand, the electrode plate 2 has a sulin l-
A bypass flow path 10 is formed on the back side of the steel strip 6, and the flow of the plating solution sprayed from the Surin l-6 is opposite to the flow of the plating solution sprayed from the end of the electrode plate 2 parallel to and opposite to the steel strip 5. The plating solution flows in the same direction through the bypass channel 10 so that all the plating solution flows in the same direction. 12 is a flow rate adjustment hole provided in the bypass channel.

The above configuration is exactly the same as the configuration of a conventional continuous electroplating apparatus, but in this embodiment, the cushion nozzle has a distance between the strip inlet section and the cushion nozzle installation section, and a distance between the cushion nozzle installation section and the strip. It is provided at a position where the ratio to the distance between the exit parts is 1:3.

In the present invention, the cushion nozzle is installed at a position where the ratio of the distance between the strip inlet section and the cushion nozzle installation section and the distance between the cushion nozzle installation section and the strip exit section is 1 = 4 to 1:2. By installing the steel strip 5 in this range, even if the feeding speed of the steel strip 5 is increased, the adhesion of the strip to the electrode plate is suppressed and the distance to the closest approach to the electrode plate is not reached. This is because the flow balance of the plating solution on both sides of the strip between the electrode plates is not disturbed.

Figure 3 is a graph showing the relationship between the feeding speed (line speed) of the steel strip and the amount of movement of the strip when the distance between the electrode plates is constant. 2 is a graph showing the results when using the conventional device shown in FIG. 1, and the b line is a graph showing the results when using the device according to the present invention shown in FIG. As is clear from the results shown in FIG. 3, the device according to the present invention can completely prevent contact between the steel strip and the electrode plate.

(Effects of the Invention) As detailed above, according to the present invention, (1) In a continuous electroplating apparatus, even when the feeding speed of a strip, for example, a steel strip, is changed (increased), the C warp correction effect can be practically achieved. It is possible to prevent contact between the strip and the electrode plate while keeping it within a safe range.
It is possible to prevent scratches on the electrode plates and deterioration of the quality of the strip, so stable electroplating can be performed continuously. The effect of significantly reducing the power cost required for the plating equipment was achieved.

The practical significance of the present invention having such effects is extremely significant.

[Brief explanation of drawings]

FIG. 1 is a schematic explanatory diagram showing the configuration of a continuous electroplating apparatus according to the present invention; FIG. 2 is a schematic diagram showing the configuration of a continuous electroplating apparatus according to the present invention; FIG. A schematic explanatory diagram showing the effect of correcting C warpage of the net strip and the effect of preventing contact between the steel strip and the electrode plate; FIG. 3 shows the relationship between the steel strip feeding speed and the strip movement amount according to the present invention. equipment W (b line), conventional equipment (
Graphs shown for line a) and FIG. 4 are schematic explanatory diagrams showing the configuration of a conventional continuous electroplating apparatus. 1: Electrolytic tank 3 Nirubber roll 5 strip 7: Header 9: Pump 11: Supply nozzle 2: Electrode 4: Conductor crawl 6: Slit 8: Piping 10 + bypass channel 12: Flow rate adjustment hole

Claims (1)

[Claims] electrode plates that face each other in an electrolytic bath and between which a strip is supplied; a supply nozzle that is installed at the outlet end of the electrode plate and supplies a plating solution between the electrode plates; A continuous electroplating apparatus having a cushion nozzle provided midway in the longitudinal direction, wherein the cushion nozzle has a distance between the strip inlet section and the cushion nozzle installation section and a distance between the cushion nozzle installation section and the strip exit section. A continuous electroplating apparatus characterized in that it is installed at a position where the ratio is 1:4 to 1:2.