JPH04264117A - New high-performance resin, epoxy resin composition, and its cured article - Google Patents
New high-performance resin, epoxy resin composition, and its cured articleInfo
- Publication number
- JPH04264117A JPH04264117A JP4539991A JP4539991A JPH04264117A JP H04264117 A JPH04264117 A JP H04264117A JP 4539991 A JP4539991 A JP 4539991A JP 4539991 A JP4539991 A JP 4539991A JP H04264117 A JPH04264117 A JP H04264117A
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- resin
- formula
- epoxy
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003822 epoxy resin Substances 0.000 title claims abstract description 75
- 229920000647 polyepoxide Polymers 0.000 title claims abstract description 75
- 229920005989 resin Polymers 0.000 title claims abstract description 42
- 239000011347 resin Substances 0.000 title claims abstract description 42
- 239000000203 mixture Substances 0.000 title claims description 24
- 239000003795 chemical substances by application Substances 0.000 claims description 26
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 32
- 238000010521 absorption reaction Methods 0.000 abstract description 18
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 abstract description 14
- BWVAOONFBYYRHY-UHFFFAOYSA-N [4-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=C(CO)C=C1 BWVAOONFBYYRHY-UHFFFAOYSA-N 0.000 abstract description 6
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 abstract description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 abstract description 5
- 230000001070 adhesive effect Effects 0.000 abstract description 5
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 abstract description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 abstract description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 abstract description 4
- 239000003377 acid catalyst Substances 0.000 abstract description 4
- 238000013329 compounding Methods 0.000 abstract description 4
- 229950011260 betanaphthol Drugs 0.000 abstract description 2
- 238000007789 sealing Methods 0.000 abstract description 2
- 230000001747 exhibiting effect Effects 0.000 abstract 2
- 239000000047 product Substances 0.000 description 45
- 238000006243 chemical reaction Methods 0.000 description 25
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 17
- 229920003986 novolac Polymers 0.000 description 15
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 12
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 11
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 11
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 11
- 239000004593 Epoxy Substances 0.000 description 10
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 9
- 150000001875 compounds Chemical class 0.000 description 9
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 8
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 8
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 7
- 229930003836 cresol Natural products 0.000 description 7
- 239000010410 layer Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000009477 glass transition Effects 0.000 description 6
- 230000007935 neutral effect Effects 0.000 description 5
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 4
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 4
- 229920000768 polyamine Polymers 0.000 description 4
- 235000013824 polyphenols Nutrition 0.000 description 4
- 239000011342 resin composition Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000007259 addition reaction Methods 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- -1 methanol Chemical class 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 150000003934 aromatic aldehydes Chemical class 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 150000008442 polyphenolic compounds Chemical class 0.000 description 2
- 238000011417 postcuring Methods 0.000 description 2
- 238000007142 ring opening reaction Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- AGIBHMPYXXPGAX-UHFFFAOYSA-N 2-(iodomethyl)oxirane Chemical compound ICC1CO1 AGIBHMPYXXPGAX-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 1
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical compound C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- XMUZQOKACOLCSS-UHFFFAOYSA-N [2-(hydroxymethyl)phenyl]methanol Chemical compound OCC1=CC=CC=C1CO XMUZQOKACOLCSS-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000012776 electronic material Substances 0.000 description 1
- 239000008393 encapsulating agent Substances 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000012756 surface treatment agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- ILWRPSCZWQJDMK-UHFFFAOYSA-N triethylazanium;chloride Chemical compound Cl.CCN(CC)CC ILWRPSCZWQJDMK-UHFFFAOYSA-N 0.000 description 1
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical class C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 1
Abstract
Description
【0001】0001
【産業上の利用分野】本発明は、電子部品の封止又は積
層用の材料として有用な樹脂、これを含む高耐熱、低吸
水、高接着性の硬化物を与える樹脂組成物及びその硬化
物に関する。[Industrial Application Field] The present invention relates to a resin useful as a material for sealing or laminating electronic components, a resin composition containing the resin that provides a cured product with high heat resistance, low water absorption, and high adhesiveness, and a cured product thereof. Regarding.
【0002】0002
【従来の技術】従来から電気電子部品、特にICの封止
剤の分野では、エポキシ樹脂、フェノールノボラック樹
脂、硬化促進剤を主成分とした樹脂組成物が広く用いら
れている。BACKGROUND OF THE INVENTION Conventionally, resin compositions containing epoxy resins, phenol novolac resins, and curing accelerators as main components have been widely used in the field of sealants for electrical and electronic components, particularly ICs.
【0003】近年のICにおける高密度・高集積化は、
封止剤に対して高耐熱・低吸水・高接着化を要求するよ
うになった。とりわけ、ICの高密度実装におけるハン
ダ浴浸漬という苛酷な条件は、硬化物に対する高耐熱・
低吸水・高接着化の要求をますます強めている。[0003] The recent increase in density and integration in ICs has led to
Encapsulants are now required to have high heat resistance, low water absorption, and high adhesion. In particular, the harsh conditions of immersion in a solder bath during high-density mounting of ICs require high heat resistance and
Demand for low water absorption and high adhesion is increasing.
【0004】0004
【発明が解決しようとする課題】しかし、従来の組成物
においてエポキシ樹脂として一般に用いられているクレ
ゾールノボラック型エポキシ樹脂では、ハンダ浴浸漬と
いう苛酷な条件に対して耐熱性の面で不充分である。
又、耐熱性を有するとして提案されている特開昭63−
264622号公報記載のフェノール性水酸基を有する
芳香族アルデヒドとフェノール類を縮合して得られるポ
リフェノールをエポキシ化したポリエポキシ化合物など
では吸水率、接着性の面でクレゾールノボラック型エポ
キシ樹脂には及ばない。一方、硬化剤として一般に使用
されているフェノールノボラック樹脂は耐熱性、吸水率
の面で未だ充分ではない。[Problems to be Solved by the Invention] However, the cresol novolak type epoxy resin that is generally used as the epoxy resin in conventional compositions is insufficient in terms of heat resistance against the harsh conditions of immersion in a solder bath. . In addition, JP-A-63-2003, which has been proposed as having heat resistance,
The polyepoxy compounds described in Japanese Patent No. 264622, which are obtained by epoxidizing polyphenols obtained by condensing aromatic aldehydes having phenolic hydroxyl groups with phenols, are not as good as cresol novolac type epoxy resins in terms of water absorption and adhesiveness. On the other hand, phenol novolac resins commonly used as curing agents are still insufficient in terms of heat resistance and water absorption.
【0005】本発明は、このように苛酷になっていく条
件にも耐え得る、高耐熱、低吸水で、しかも接着性のよ
い硬化物を与える樹脂組成物、その成分となる樹脂及び
硬化物を提供するものである。[0005] The present invention provides a resin composition that can withstand these increasingly severe conditions, has high heat resistance, low water absorption, and provides a cured product with good adhesive properties, as well as resins and cured products that are components thereof. This is what we provide.
【0006】[0006]
【課題を解決するための手段】本発明者らは、上記の相
反する3つの特性、高耐熱性、低吸水性、高接着性を兼
ね備えた樹脂組成物の開発を目的に鋭意検討した結果、
ナフトールとキシリレングリコールを縮合することによ
り目的を達成できる樹脂が得られることを見出だし本発
明を完成するに至った。[Means for Solving the Problems] As a result of intensive studies aimed at developing a resin composition that has the above-mentioned three contradictory properties: high heat resistance, low water absorption, and high adhesiveness, the present inventors found that
The present inventors have discovered that a resin capable of achieving the objective can be obtained by condensing naphthol and xylylene glycol, and have completed the present invention.
【0007】即ち、本発明は、(1)式(1)That is, the present invention provides formula (1)
【000
8】000
8]
【0009】(但し、式中nは0〜15である。)で表
される樹脂。A resin represented by the formula (where n is 0 to 15).
【0010】(2)式(2)(2) Equation (2)
【0011】[0011]
【0012】(但し、式中nは0〜15である。)で表
されるエポキシ樹脂。An epoxy resin represented by the formula (where n is 0 to 15).
【0013】(3)(A)エポキシ樹脂と、(B)硬化
剤としての上記(1)記載の樹脂とを含んでなるエポキ
シ樹脂組成物。(3) An epoxy resin composition comprising (A) an epoxy resin and (B) the resin described in (1) above as a curing agent.
【0014】(4)(A)エポキシ樹脂としての上記(
2)記載のエポキシ樹脂と、(B)硬化剤とを含んでな
るエポキシ樹脂組成物。(4) (A) The above (
2) An epoxy resin composition comprising the epoxy resin described above and (B) a curing agent.
【0015】(5)(A)エポキシ樹脂としての上記(
2)記載のエポキシ樹脂と、(B)硬化剤としての上記
(1)記載の樹脂とを含んでなるエポキシ樹脂組成物。(5) (A) The above (as epoxy resin)
2) An epoxy resin composition comprising the epoxy resin described in (B) and the resin described in (1) above as a curing agent.
【0016】(6)硬化促進剤を含む、上記(3)、(
4)又は(5)に記載のエポキシ樹脂組成物。(6) Contains a curing accelerator, (3) above, (
4) or the epoxy resin composition described in (5).
【0017】(7)上記(3)、(4)、(5)又は(
6)に記載のエポキシ樹脂組成物の硬化物。に関するも
のである。(7) The above (3), (4), (5) or (
6) A cured product of the epoxy resin composition according to item 6). It is related to.
【0018】以下、本発明を詳細に説明する。式(1)
中のnの数は、0〜15であり、nの平均値が2〜10
のものが好ましく、より好ましくは3〜7である。nの
平均値が高すぎると粘度が増し作業性を損なう。The present invention will be explained in detail below. Formula (1)
The number of n is 0 to 15, and the average value of n is 2 to 10.
The number is preferably 3 to 7, more preferably 3 to 7. If the average value of n is too high, the viscosity will increase and workability will be impaired.
【0019】本発明の樹脂は、次のようにして製造する
ことができる。即ち、ナフトール(1−ナフトール又は
2−ナフトール)とp−キシリレングリコールとを酸触
媒の存在下に脱水縮合させることにより製造できる。な
お、nを上記好ましい範囲とするためには、1−ナフト
ールが好ましい。酸触媒としては、塩酸、硫酸、リン酸
、しゅう酸、p−トルエンスルホン酸等が使用でき、酸
触媒はp−キシリレングリコールの0.1 〜30重量
%用いるのが好ましい。また、ナフトールはp−キシリ
レングリコールに対して0.5 〜4.0 モル倍用い
るのが好ましい。The resin of the present invention can be produced as follows. That is, it can be produced by dehydrating and condensing naphthol (1-naphthol or 2-naphthol) and p-xylylene glycol in the presence of an acid catalyst. In addition, 1-naphthol is preferable in order to set n to the above-mentioned preferable range. As the acid catalyst, hydrochloric acid, sulfuric acid, phosphoric acid, oxalic acid, p-toluenesulfonic acid, etc. can be used, and it is preferable to use 0.1 to 30% by weight of p-xylylene glycol as the acid catalyst. Moreover, it is preferable to use naphthol in an amount of 0.5 to 4.0 moles relative to p-xylylene glycol.
【0020】反応は、無溶媒でも、ベンゼン、トルエン
、メチルイソブチルケトン等の溶媒中でも行うことがで
きる。反応温度は、20〜150℃の範囲が好ましい。
反応終了後、使用した触媒を水洗等により除去し、溶媒
および過剰のナフトールを減圧下に除去することにより
目的の式(1)で表される樹脂が得られる。The reaction can be carried out without a solvent or in a solvent such as benzene, toluene or methyl isobutyl ketone. The reaction temperature is preferably in the range of 20 to 150°C. After the reaction is completed, the used catalyst is removed by washing with water or the like, and the solvent and excess naphthol are removed under reduced pressure to obtain the desired resin represented by formula (1).
【0021】次にこの様にして得られた樹脂にエピハロ
ヒドリン化合物を塩基性化合物の存在下で反応させるこ
とにより、式(2)で表されるエポキシ樹脂が容易に得
られる。エピハロヒドリン化合物としては、具体的には
、エピクロルヒドリン、エピブロムヒドリン、エピヨー
ドヒドリン等が挙げられ、これらの混合物を用いること
もできるが、工業的にはエピクロルヒドリンが好適に使
用される。Next, by reacting the thus obtained resin with an epihalohydrin compound in the presence of a basic compound, the epoxy resin represented by formula (2) can be easily obtained. Specific examples of the epihalohydrin compound include epichlorohydrin, epibromohydrin, epiiodohydrin, etc., and mixtures thereof can also be used, but epichlorohydrin is preferably used industrially.
【0022】式(2)で表されるエポキシ樹脂とエピハ
ロヒドリン化合物の反応は、公知の方法により行うこと
ができる。例えば、式(1)で表される樹脂と、その水
酸基当量に対して過剰モル量のエピハロヒドリン化合物
とをテトラメチルアンモニウムクロリド、テトラメチル
アンモニウムブロミド、トリエチルアンモニウムクロリ
ドなどの第4級アンモニウム塩または水酸化ナトリウム
、水酸化カリウムなどのアルカリ金属水酸化物などの存
在下で反応させる。The reaction between the epoxy resin represented by formula (2) and the epihalohydrin compound can be carried out by a known method. For example, a resin represented by formula (1) and an epihalohydrin compound in an excess molar amount relative to its hydroxyl equivalent are combined with a quaternary ammonium salt such as tetramethylammonium chloride, tetramethylammonium bromide, triethylammonium chloride, or hydroxylated. The reaction is carried out in the presence of an alkali metal hydroxide such as sodium or potassium hydroxide.
【0023】第4級アンモニウム塩を用いた場合は開環
付加反応の段階で反応が止まるので次いで上記アルカリ
金属水酸化物を加えて閉環反応させる。また最初からア
ルカリ金属水酸化物を加えて反応させる場合は、開環付
加反応及び閉環付加反応を一気に行うことができる。When a quaternary ammonium salt is used, the reaction stops at the stage of the ring-opening addition reaction, so the alkali metal hydroxide is then added to carry out the ring-closing reaction. Further, when the alkali metal hydroxide is added from the beginning and the reaction is carried out, the ring-opening addition reaction and the ring-closing addition reaction can be carried out at once.
【0024】エピハロヒドリン化合物の使用割合は、式
(1)で表される樹脂の水酸基当量1に対して通常1〜
50モル、好ましくは、3〜15モルの範囲である。
又、この際、反応を円滑に行わせる為、メタノールな
どのアルコール類、或いはアセトン又は、ジメチルスル
ホキシド、ジメチルスルホン、ジメチルホルムアミドな
どの非プロトン性極性溶媒を用いることができ、特にジ
メチルスルホキシドを用いることが好ましい。The usage ratio of the epihalohydrin compound is usually 1 to 1 to 1 hydroxyl equivalent of the resin represented by formula (1).
50 moles, preferably in the range of 3 to 15 moles.
In addition, at this time, in order to carry out the reaction smoothly, alcohols such as methanol, or acetone, or aprotic polar solvents such as dimethyl sulfoxide, dimethyl sulfone, and dimethyl formamide can be used, and dimethyl sulfoxide is particularly preferred. is preferred.
【0025】アルカリ金属水酸化物の使用量は、式(1
)で表される樹脂の水酸基当量1に対して通常0.8〜
1.5モル、好ましくは0.9〜1.3モルの範囲であ
り、第4級アンモニウム塩を使用する場合その使用量は
、式(1)で表される樹脂の水酸基当量1に対して通常
0.001〜1.0モル、好ましくは0.005〜0.
5モルの範囲である。反応温度は通常30〜130℃、
好ましくは40〜120℃である。The amount of alkali metal hydroxide used is determined by the formula (1
) is usually 0.8 to 1 per hydroxyl equivalent of the resin.
1.5 mol, preferably in the range of 0.9 to 1.3 mol, and when using a quaternary ammonium salt, the amount used is based on 1 hydroxyl equivalent of the resin represented by formula (1). Usually 0.001 to 1.0 mol, preferably 0.005 to 0.0 mol.
It is in the range of 5 moles. The reaction temperature is usually 30-130℃,
Preferably it is 40-120°C.
【0026】また反応で生成した水を反応系外に除去し
ながら反応を進行させることもできる。反応終了後、副
生した塩を水洗、濾過等により除去することにより式(
2)で表されるエポキシ樹脂が得られる。前記(4)又
は(5)記載のエポキシ樹脂組成物において、本発明の
式(2)で表されるエポキシ樹脂は単独で又は、他のエ
ポキシ樹脂と併用して使用することができる。併用する
場合、本発明のエポキシ樹脂の全エポキシ樹脂中に占め
る割合は30重量%以上が好ましく、特に50重量%以
上が好ましい。[0026] The reaction can also be allowed to proceed while removing water produced in the reaction from the reaction system. After the reaction is complete, the by-product salt is removed by washing with water, filtration, etc. to obtain the formula (
An epoxy resin represented by 2) is obtained. In the epoxy resin composition described in (4) or (5) above, the epoxy resin represented by formula (2) of the present invention can be used alone or in combination with other epoxy resins. When used together, the proportion of the epoxy resin of the present invention in the total epoxy resin is preferably 30% by weight or more, particularly preferably 50% by weight or more.
【0027】本発明の式(2)で表されるエポキシ樹脂
と併用される他のエポキシ樹脂としては、ビスフェノー
ルA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂
、ビスフェノールS型エポキシ樹脂、脂環式エポキシ樹
脂、ビフェニル型エポキシ樹脂等も使用できるが、ノボ
ラック型エポキシ樹脂が耐熱性の点で特に有利である。Other epoxy resins used in combination with the epoxy resin represented by formula (2) of the present invention include bisphenol A epoxy resin, bisphenol F epoxy resin, bisphenol S epoxy resin, and alicyclic epoxy resin. , biphenyl type epoxy resins, etc. can also be used, but novolac type epoxy resins are particularly advantageous in terms of heat resistance.
【0028】例えば、クレゾールノボラック型エポキシ
樹脂、フェノールノボラック型エポキシ樹脂、臭素化フ
ェノールノボラック型エポキシ樹脂などが挙げられるが
これらに限定されるものではない。これらは単独で用い
てもよく、2種以上併用してもよい。Examples include, but are not limited to, cresol novolac type epoxy resins, phenol novolac type epoxy resins, and brominated phenol novolac type epoxy resins. These may be used alone or in combination of two or more.
【0029】上記(3)及び(5)のエポキシ樹脂組成
物において、本発明の式(1)で表される樹脂は単独で
又は、他の硬化剤と併用して使用することができる。併
用する場合、本発明の樹脂の全硬化剤中に占める割合は
、30重量%以上が好ましく、特に50重量%以上が好
ましい。In the epoxy resin compositions (3) and (5) above, the resin represented by formula (1) of the present invention can be used alone or in combination with other curing agents. When used together, the proportion of the resin of the present invention in the total curing agent is preferably 30% by weight or more, particularly preferably 50% by weight or more.
【0030】本発明の式(1)で表される樹脂と併用さ
れる他の硬化剤としては、例えば、脂肪族ポリアミン、
芳香族ポリアミン、ポリアミドポリアミン等のポリアミ
ン系硬化剤、無水ヘキサヒドロフタル酸、無水メチルテ
トラヒドロフタル酸等の酸無水物系硬化剤、フェノール
ノボラック、クレゾールノボラック等のフェノール系硬
化剤、三フッ化ホウ素等のルイス酸又はそれらの塩類、
ジシアンドアミド類等の硬化剤等が挙げられるが、これ
らに限定されるものではない。これらは単独で用いても
よく、2種以上併用してもよい。Other curing agents used in combination with the resin represented by formula (1) of the present invention include, for example, aliphatic polyamines,
Polyamine curing agents such as aromatic polyamines and polyamide polyamines, acid anhydride curing agents such as hexahydrophthalic anhydride and methyltetrahydrophthalic anhydride, phenolic curing agents such as phenol novolak and cresol novolak, boron trifluoride, etc. Lewis acids or their salts,
Examples include curing agents such as dicyanamides, but are not limited thereto. These may be used alone or in combination of two or more.
【0031】前記(3)のエポキシ樹脂組成物において
、(A)エポキシ樹脂としては、本発明の式(2)で表
されるエポキシ樹脂の他に前記他のエポキシ樹脂等が挙
げられる。In the epoxy resin composition (3) above, the epoxy resin (A) includes, in addition to the epoxy resin represented by formula (2) of the present invention, the other epoxy resins mentioned above.
【0032】 前記(4)のエポキシ樹脂組成物にお
いて、(B)硬化剤としては、本発明の式(1)で表さ
れる樹脂の他に前記他の硬化剤等が挙げられる。In the epoxy resin composition (4), examples of the curing agent (B) include the resin represented by formula (1) of the present invention as well as the other curing agents mentioned above.
【0033】本発明のエポキシ樹脂組成物において、(
B)硬化剤の使用量は、(A)エポキシ樹脂のエポキシ
基1当量に対して0.5〜1.5当量が好ましく特に0
.6〜1.2当量が好ましい。In the epoxy resin composition of the present invention, (
B) The amount of the curing agent used is preferably 0.5 to 1.5 equivalents per equivalent of the epoxy group of the epoxy resin (A), particularly 0.
.. 6 to 1.2 equivalents are preferred.
【0034】硬化促進剤としては、2−メチルイミダゾ
ール、2−エチルイミダゾール等のイミダゾール系化合
物、2−(ジメチルアミノメチル)フェノール等の第3
アミン系化合物、トリフェニルホスフィン化合物等が挙
げられ、公知の種々の硬化促進剤が使用でき、特に限定
されるものではない。硬化促進剤の使用量はエポキシ樹
脂(A)100重量部に対して0.01〜15重量部の
範囲が好ましく、特に、0.1〜10重量部の範囲が好
ましい。As curing accelerators, imidazole compounds such as 2-methylimidazole and 2-ethylimidazole, and tertiary compounds such as 2-(dimethylaminomethyl)phenol are used.
Various known curing accelerators can be used, including amine compounds, triphenylphosphine compounds, etc., and are not particularly limited. The amount of the curing accelerator used is preferably in the range of 0.01 to 15 parts by weight, particularly preferably in the range of 0.1 to 10 parts by weight, based on 100 parts by weight of the epoxy resin (A).
【0035】本発明のエポキシ樹脂組成物には、さらに
必要に応じて公知の添加剤を配合することができ、添加
剤としては、例えば、シリカ、アルミナ、タルク、ガラ
ス繊維等の無機充填剤、シランカップリング剤のような
充填剤の表面処理剤、離型剤、顔料等が挙げられる。[0035] The epoxy resin composition of the present invention may further contain known additives as required. Examples of additives include inorganic fillers such as silica, alumina, talc, and glass fiber; Examples include surface treatment agents for fillers such as silane coupling agents, mold release agents, and pigments.
【0036】本発明のエポキシ樹脂組成物は、各成分を
均一に混合することにより得られる。 又、本発明の
エポキシ樹脂組成物は、通常130〜170℃の温度で
30〜300秒の範囲で予備硬化し、さらに150〜2
00℃の温度で2〜8時間、後硬化することにより充分
な硬化反応が進行し、本発明の硬化物が得られる。
こうして得られる硬化物は、耐熱性を保持しながら、低
吸水性、さらに高接着性の3つの特性を兼ね備えた優れ
た性能を有する。The epoxy resin composition of the present invention can be obtained by uniformly mixing each component. Further, the epoxy resin composition of the present invention is usually precured at a temperature of 130 to 170°C for 30 to 300 seconds, and further cured for 150 to 200 seconds.
By post-curing at a temperature of 00°C for 2 to 8 hours, a sufficient curing reaction proceeds and the cured product of the present invention is obtained.
The cured product thus obtained has excellent performance, having three properties: low water absorption, and high adhesiveness while maintaining heat resistance.
【0037】従って、本発明の樹脂は、耐熱性、低吸水
性、さらに高接着性の要求される広範な分野で、エポキ
シ樹脂として、あるいは、硬化剤として用いることがで
きる。具体的には、絶縁材料、積層板、封止材料等あら
ゆる電気電子材料の配合成分として有用である。又、成
形材料、複合材料等の分野に用いることができる。Therefore, the resin of the present invention can be used as an epoxy resin or as a curing agent in a wide range of fields where heat resistance, low water absorption, and high adhesiveness are required. Specifically, it is useful as a compounding component of all electrical and electronic materials such as insulating materials, laminates, and sealing materials. Moreover, it can be used in fields such as molding materials and composite materials.
【0038】エポキシ樹脂成分、硬化剤成分の両方に本
発明の式(2)で表されるエポキシ樹脂及び式(1)で
表される樹脂を用いることによりその効果はより顕著と
なる。さらに、本発明の樹脂は、ナフトール環を有する
にも拘らず軟化点が低く抑えられているためトランスフ
ァー成型等、従来通りの手法を用いることができ作業性
も良好である。By using the epoxy resin represented by formula (2) and the resin represented by formula (1) of the present invention as both the epoxy resin component and the curing agent component, the effect becomes more pronounced. Furthermore, the resin of the present invention has a low softening point despite having a naphthol ring, so conventional techniques such as transfer molding can be used, and workability is good.
【0039】[0039]
【実施例】以下に実施例を挙げて本発明を説明する。
実施例1
p−キシリレングリコール138g(1.0モル)、1
−ナフトール288g(2.0モル)及びメチルイソブ
チルケトン500mトンを温度計、冷却管、滴下ロート
及び攪拌機を付けたフラスコに仕込み、室温下、窒素を
吹き込みながら攪拌した。p−トルエンスルホン酸2.
8gを発熱に注意しながら液温が50℃を越えないよう
にゆっくり滴下した。[Examples] The present invention will be explained below with reference to Examples. Example 1 p-xylylene glycol 138g (1.0 mol), 1
- 288 g (2.0 moles) of naphthol and 500 m tons of methyl isobutyl ketone were charged into a flask equipped with a thermometer, a condenser, a dropping funnel, and a stirrer, and stirred at room temperature while blowing nitrogen. p-Toluenesulfonic acid 2.
8 g was slowly added dropwise while paying attention to heat generation so that the liquid temperature did not exceed 50°C.
【0040】その後、油浴中で110℃まで加熱し、8
時間反応させた。反応終了後、さらにメチルイソブチル
ケトン500mlを加え、分液ロートに移し水洗した。
洗浄水が中性を示すまで水洗後、有機層から溶媒及び未
反応物を減圧下に除去し、本発明の式(1)で表される
樹脂(A−1)260gを得た。生成物(A−1)の軟
化温度(JIS K2425 環球法)は、99.
5℃で水酸基当量(g/eq)は215であった。又、
GPC分析より式(1)におけるnの平均値は4であっ
た。[0040] Thereafter, it was heated to 110°C in an oil bath and heated to 8°C.
Allowed time to react. After the reaction was completed, 500 ml of methyl isobutyl ketone was further added, and the mixture was transferred to a separating funnel and washed with water. After washing with water until the washing water became neutral, the solvent and unreacted substances were removed from the organic layer under reduced pressure to obtain 260 g of resin (A-1) represented by formula (1) of the present invention. The softening temperature (JIS K2425 ring and ball method) of the product (A-1) is 99.
The hydroxyl equivalent (g/eq) was 215 at 5°C. or,
According to GPC analysis, the average value of n in formula (1) was 4.
【0041】実施例2
実施例1において1−ナフトールの使用量を173g(
1.2モル)に代えた以外は実施例1と同様の操作によ
り生成物(A−2)230gを得た。生成物(A−2)
の軟化温度は110.5℃で水酸基当量(g/eq)は
235であった。又、GPC分析より式(1)における
nの平均値は5であった。Example 2 In Example 1, the amount of 1-naphthol used was changed to 173 g (
230 g of product (A-2) was obtained in the same manner as in Example 1, except that 1.2 mol) was used. Product (A-2)
The softening temperature was 110.5°C, and the hydroxyl equivalent (g/eq) was 235. Furthermore, GPC analysis revealed that the average value of n in formula (1) was 5.
【0042】実施例3
温度計、攪拌装置、滴下ロート及び生成水分離装置のつ
いた反応器に実施例1で得た生成物(A−1)(水酸基
当量(g/eq)215)215g及びエピクロルヒド
リン460gを仕込み窒素置換を行った後、48%水酸
化ナトリウム水溶液85gを5時間かけて滴下した。滴
下中は反応温度60℃、圧力100〜150mmHgの
条件下で生成水及び水酸化ナトリウム水溶液の水をエピ
クロルヒドリンとの共沸により連続的に反応系外に除去
し、エピクロルヒドリンは系内に戻した。Example 3 215 g of the product (A-1) obtained in Example 1 (hydroxyl equivalent (g/eq) 215) and After charging 460 g of epichlorohydrin and purging with nitrogen, 85 g of a 48% aqueous sodium hydroxide solution was added dropwise over 5 hours. During the dropwise addition, the produced water and the water in the aqueous sodium hydroxide solution were continuously removed from the reaction system by azeotropy with epichlorohydrin under conditions of a reaction temperature of 60° C. and a pressure of 100 to 150 mmHg, and epichlorohydrin was returned to the system.
【0043】ついで過剰の未反応エピクロルヒドリンを
減圧下に回収した後、メチルイソブチルケトン500m
lを加え100mlの水で水層が中性を示すまで洗浄し
た。有機層からメチルイソブチルケトンを減圧下に除去
し、その後再びメチルイソブチルケトンを400g加え
再溶解した。得られたメチルイソブチルケトン溶液に2
0%水酸化ナトリウム水溶液20g加え反応温度70℃
で2時間反応した。Then, after recovering excess unreacted epichlorohydrin under reduced pressure, 500 m of methyl isobutyl ketone was added.
1 was added and washed with 100 ml of water until the aqueous layer became neutral. Methyl isobutyl ketone was removed from the organic layer under reduced pressure, and then 400 g of methyl isobutyl ketone was added again to dissolve it again. Add 2 to the obtained methyl isobutyl ketone solution.
Add 20g of 0% sodium hydroxide aqueous solution and reaction temperature: 70℃
It reacted for 2 hours.
【0044】反応終了後、水層が中性を示すまで水で洗
浄し、油層からメチルイソブチルケトンを減圧下に除去
し、淡黄色の固体(B−1)268gを得た。本発明の
式(2)で表されるエポキシ樹脂である生成物(B−1
)の軟化温度(JIS K2425)は86℃でエポ
キシ当量(g/eq)は295であった。又、GPC分
析より、式(2)におけるnの平均値は4であった。After the reaction was completed, the aqueous layer was washed with water until it became neutral, and methyl isobutyl ketone was removed from the oil layer under reduced pressure to obtain 268 g of a pale yellow solid (B-1). Product (B-1) which is an epoxy resin represented by formula (2) of the present invention
) had a softening temperature (JIS K2425) of 86°C and an epoxy equivalent (g/eq) of 295. Furthermore, GPC analysis revealed that the average value of n in formula (2) was 4.
【0045】実施例4
生成物(A−1)の代わりに実施例2で得た生成物(A
−2)(水酸基当量(g/eq)235)235gを用
いた以外は実施例3と同様にして反応を行い生成物(B
−2)を得た。本発明の式(2)で表されるエポキシ樹
脂である生成物(B−2)の軟化温度は95℃でエポキ
シ当量(g/eq)は309であった。又、GPC分析
より、式(2)におけるnの平均値は5であった。Example 4 The product (A-1) obtained in Example 2 was replaced with the product (A-1).
-2) (hydroxyl group equivalent (g/eq) 235) The reaction was carried out in the same manner as in Example 3 except that 235 g of the product (B
-2) was obtained. Product (B-2), which is an epoxy resin represented by formula (2) of the present invention, had a softening temperature of 95°C and an epoxy equivalent (g/eq) of 309. Furthermore, GPC analysis revealed that the average value of n in formula (2) was 5.
【0046】実施例5
温度計、攪拌装置及び滴下ロートの付いた反応器に実施
例1で得た生成物(A−1)(水酸基当量(g/eq)
215)215g、エピクロルヒドリン460g及びジ
メチルスルホキシド239gを仕込み窒素置換を行った
後、30℃の水浴中にて水酸化ナトリウム40gを徐々
に加えた。発熱に注意しながら30℃にて5時間、50
℃にて2時間、さらに70℃にて1時間反応を行った。
ついで水を加えて水層が中性を示すまで洗浄した。その
後油層からエピクロルヒドリン及びジメチルスルホキシ
ドを減圧下に除去した。次にメチルイソブチルケトンを
400g加え再溶解した。Example 5 The product (A-1) obtained in Example 1 (hydroxyl equivalent (g/eq)
215), 460 g of epichlorohydrin, and 239 g of dimethyl sulfoxide were charged and purged with nitrogen, and then 40 g of sodium hydroxide was gradually added in a water bath at 30°C. 5 hours at 30°C, paying attention to heat generation.
The reaction was carried out at 70°C for 2 hours and then at 70°C for 1 hour. Then, water was added to wash the mixture until the aqueous layer became neutral. Thereafter, epichlorohydrin and dimethyl sulfoxide were removed from the oil layer under reduced pressure. Next, 400 g of methyl isobutyl ketone was added and redissolved.
【0047】得られたメチルイソブチルケトン溶液に2
0%水酸化ナトリウム水溶液20gを加えて反応温度7
0℃で2時間反応した。反応終了後、水層が中性を示す
まで水で洗浄し、油層からメチルイソブチルケトンを減
圧下に除去し、淡黄色の固体(B−3)263gを得た
。本発明の式(2)で表されるエポキシ樹脂である生成
物(B−3)の軟化温度は85℃でエポキシ当量(g/
eq)は294であった。又、GPC分析より、式(2
)におけるnの値は4であった。2 to the obtained methyl isobutyl ketone solution.
Add 20g of 0% sodium hydroxide aqueous solution and raise the reaction temperature to 7.
The reaction was carried out at 0°C for 2 hours. After the reaction was completed, the aqueous layer was washed with water until it became neutral, and methyl isobutyl ketone was removed from the oil layer under reduced pressure to obtain 263 g of a pale yellow solid (B-3). The softening temperature of the product (B-3), which is an epoxy resin represented by formula (2) of the present invention, is 85°C and the epoxy equivalent (g/
eq) was 294. Furthermore, from GPC analysis, the formula (2
) was 4.
【0048】実施例6
生成物(A−1)の代わりに実施例2で得た生成物(A
−2)(水酸基当量(g/eq)235)235gを用
いた以外は実施例5と同様にして反応を行い生成物(B
−4)を得た。本発明の式(2)で表されるエポキシ樹
脂である生成物(B−4)の軟化温度は94℃でエポキ
シ当量(g/eq)は307であった。又、GPC分析
より、式(2)におけるnの値は5であった。Example 6 The product (A-1) obtained in Example 2 was replaced with the product (A-1).
-2) (hydroxyl group equivalent (g/eq) 235) The reaction was carried out in the same manner as in Example 5 except that 235 g of the product (B
-4) was obtained. Product (B-4), which is an epoxy resin represented by formula (2) of the present invention, had a softening temperature of 94°C and an epoxy equivalent (g/eq) of 307. Further, from GPC analysis, the value of n in formula (2) was 5.
【0049】応用実施例1〜2.
硬化剤として実施例1〜2で得られた生成物(A−1)
〜(A−2)を、エポキシ樹脂としてクレゾールノボラ
ック型エポキシ樹脂を用い、2−メチルイミダゾールを
硬化促進剤とし、これらを第1表に示す割合で配合した
組成物を70〜80℃で15分間ロール混練した。これ
を冷却後、粉砕、タブレット化し、更にトランスファー
成型機により成型後、160℃で2時間予備硬化して、
180℃で8時間、後硬化を行って硬化物(試験片)を
得た。この硬化物のガラス転移温度(Tg)、熱変形温
度(HDT)及び吸水率をつぎの条件で測定した。Application Examples 1-2. Products obtained in Examples 1-2 as curing agents (A-1)
~ (A-2), using a cresol novolac type epoxy resin as the epoxy resin, and using 2-methylimidazole as a curing accelerator, and blending these in the proportions shown in Table 1, a composition was prepared at 70 to 80°C for 15 minutes. Roll kneaded. After cooling it, it was crushed, made into tablets, molded using a transfer molding machine, and precured at 160°C for 2 hours.
Post-curing was performed at 180° C. for 8 hours to obtain a cured product (test piece). The glass transition temperature (Tg), heat distortion temperature (HDT), and water absorption rate of this cured product were measured under the following conditions.
【0050】ガラス転移温度
熱機械測定装置(TMA):真空理工(株)TM−70
00
昇温速度:2℃/min
熱変形温度
JIS K7207に規定された条件Glass transition temperature thermomechanical measuring device (TMA): Shinku Riko Co., Ltd. TM-70
00 Heating rate: 2℃/min Heat distortion temperature Conditions specified in JIS K7207
【0051】吸
水率
試 験 片 直径 50mm(硬
化物) 厚さ 3mm円板条
件 100℃の水中で20時間煮沸
した後の重量増加量
(重量%)Water absorption test piece Diameter 50mm (cured product) Thickness 3mm disk strip
Weight increase after boiling in water at 100℃ for 20 hours (weight%)
【0052】接着性
ASTM D1002に準拠して引張り剪断により接
着強度を評価した。下記のような基準により接着性の目
安とした。Adhesion Adhesive strength was evaluated by tensile shear according to ASTM D1002. The following criteria were used as a guideline for adhesion.
【0053】応用実施例3〜4.
硬化剤として実施例1〜2で得られた生成物(A−1)
〜(A−2)を、エポキシ樹脂として実施例3〜4で得
られた生成物(B−1)〜(B−2)を用い、2−メチ
ルイミダゾールを硬化促進剤とし、これらを第1表に示
す割合で配合し、以下応用実施例1〜2と同様にして試
験を行った。硬化物の評価結果を第1表に示した。Application Examples 3-4. Products obtained in Examples 1-2 as curing agents (A-1)
- (A-2), using the products (B-1) - (B-2) obtained in Examples 3-4 as epoxy resins, using 2-methylimidazole as a curing accelerator, and using these as the first They were blended in the proportions shown in the table and tested in the same manner as in Application Examples 1 and 2. The evaluation results of the cured products are shown in Table 1.
【0054】応用実施例5〜6.
硬化剤としてフェノールノボラック樹脂を、エポキシ樹
脂として実施例3〜4で得られた生成物(B−1)〜(
B−2)を用い、2−メチルイミダゾールを硬化促進剤
とし、これらを第1表に示す割合で配合し、以下応用実
施例1〜2と同様にして試験を行った。 硬化物の評
価結果を第1表に示した。Application Examples 5-6. Products (B-1)-(
B-2), 2-methylimidazole was used as a curing accelerator, these were blended in the proportions shown in Table 1, and the following tests were conducted in the same manner as in Application Examples 1 and 2. The evaluation results of the cured products are shown in Table 1.
【0055】応用比較例1〜3.
第1表に示す割合で市販の硬化剤としてフェノールノボ
ラック樹脂(PN(H−1))をエポキシ樹脂としてク
レゾールノボラック型エポキシ樹脂(EOCN1020
)、芳香族アルデヒドとフェノールを縮合して得られる
ポリフェノールのポリエポキシ化合物(EPPN502
)又は、ビスフェノール型エポキシ樹脂(エポミックR
301)と、硬化促進剤を配合し、応用実施例1〜2と
同様の操作により硬化物の評価を行った。その評価結果
を第1表に示した。Application comparative examples 1 to 3. Phenol novolac resin (PN(H-1)) was used as a commercially available curing agent in the proportions shown in Table 1, and cresol novolac type epoxy resin (EOCN1020) was used as epoxy resin.
), polyepoxy compound of polyphenol obtained by condensing aromatic aldehyde and phenol (EPPN502
) or bisphenol type epoxy resin (Epomic R
301) and a curing accelerator were blended, and the cured product was evaluated in the same manner as in Application Examples 1 and 2. The evaluation results are shown in Table 1.
【0056】尚、配合した市販の硬化剤及びエポキシ樹
脂は次のとおり。
PN(H−1): (日本化薬(株)製)フェノール
ノボラック樹脂
水酸基当量(g/eq)106
軟化温度 85℃EO
CN1020: (日本化薬(株)製)クレゾールノ
ボラック型エポキシ樹
脂エポキシ当量(g/eq)200
軟化温度 65℃The commercially available curing agent and epoxy resin blended are as follows. PN (H-1): (manufactured by Nippon Kayaku Co., Ltd.) Phenol novolak resin hydroxyl equivalent (g/eq) 106 Softening temperature 85°C EO
CN1020: (manufactured by Nippon Kayaku Co., Ltd.) Cresol novolac type epoxy resin Epoxy equivalent (g/eq) 200 Softening temperature 65°C
【0
057】エポミックR−301:(三井石油化学エポキ
シ(株)製)
ビスフェノールA型エポキシ樹脂
エポキシ当量(g/eq)470
軟化温度 68℃EP
PN502: (日本化薬(株)製) ポリエポキ
シ化合物
エポキシ当量(g/eq)168
軟化温度 70℃0
[057] Epomic R-301: (manufactured by Mitsui Petrochemical Epoxy Co., Ltd.) Bisphenol A type epoxy resin Epoxy equivalent (g/eq) 470 Softening temperature 68°C EP
PN502: (manufactured by Nippon Kayaku Co., Ltd.) Polyepoxy compound Epoxy equivalent weight (g/eq) 168 Softening temperature 70°C
【0
058】
第1表(1)
応用実
施例
1 2
3 硬化剤 生成物(A−1
) 215
215 生成物(A−2)
235
PN (H−1) エポキシ 生
成物(B−1)
294 樹脂 生成
物(B−2) EOCN−10
20 200 200
エポミックR−301
EPPN−502 硬化促進剤(2−メチルイミ
ダ 2.0 2.0 2.9
ゾー
ル) ガラス転移温度(℃)
176 180 178 熱変形
温度(℃) 18
2 188 189 吸水率 (
%) 0.89 0
.91 0.82 接着性
○
○ ◎0
058]
Table 1 (1)
Application examples
1 2
3 Curing agent product (A-1
) 215
215 Product (A-2)
235
PN (H-1) Epoxy product (B-1)
294 Resin Product (B-2) EOCN-10
20 200 200
Epomic R-301
EPPN-502 Curing accelerator (2-methylimida 2.0 2.0 2.9
sol) Glass transition temperature (℃)
176 180 178 Heat distortion temperature (℃) 18
2 188 189 Water absorption rate (
%) 0.89 0
.. 91 0.82 Adhesiveness
○
○ ◎
【0059】
第1表(2)
応用実
施例
4 5
6 硬化剤 生成物(A−1
)
生成物(A−2)
235 PN (H−
1) 106
106 エポキシ 生成物(B−1)
294 樹脂
生成物(B−2) 307
307
EOCN−1020 エポミッ
クR−301 EPPN−50
2 硬化促進剤(2−メチルイミダ 3.
1 2.9 3.1
ゾール) ガラス転移
温度(℃) 181
170 172 熱変形温度(℃)
192 176
178 吸水率 (%)
0.84 0.86 0.88
接着性
◎ ○
○[0059]
Table 1 (2)
Application examples
4 5
6 Curing agent product (A-1
) Product (A-2)
235 PN (H-
1) 106
106 Epoxy product (B-1)
294 Resin Product (B-2) 307
307
EOCN-1020 Epomic R-301 EPPN-50
2 Curing accelerator (2-methylimida 3.
1 2.9 3.1
Glass transition temperature (℃) 181
170 172 Heat distortion temperature (℃)
192 176
178 Water absorption rate (%)
0.84 0.86 0.88
Adhesiveness
◎ ○
○
【0060】
第1表(3)
応用比
較例
1 2
3 硬化剤 生成物(A−1
)
生成物(A−2)
PN (H−1) 1
06 106 106 エポキシ 生
成物(B−1)
樹脂 生成物(B−2)
EOCN−1020 200
エポミックR−301
470 E
PPN−502
168 硬化促進剤(2−メチ
ルイミダ 2.0 4.7 1
.7
ゾール) ガラス転移温度(℃)
162 125 177
熱変形温度(℃)
178 130 213 吸水率
(%) 1.40
1.20 2.00 接着性
○
◎ △[0060]
Table 1 (3)
Application comparison example
1 2
3 Curing agent product (A-1
) Product (A-2)
PN (H-1) 1
06 106 106 Epoxy product (B-1) Resin product (B-2)
EOCN-1020 200
Epomic R-301
470E
PPN-502
168 Curing accelerator (2-methylimida 2.0 4.7 1
.. 7
sol) Glass transition temperature (℃)
162 125 177
Heat distortion temperature (℃)
178 130 213 Water absorption rate
(%) 1.40
1.20 2.00 Adhesiveness
○
◎ △
【0061】[0061]
【発明の効果】本発明の樹脂は、軟化温度が低く抑えら
れ、作業性に優れている。また、これを用いて得られる
硬化物は、耐熱性の指標であるガラス転移温度、熱変形
温度が高くしかも吸水率が従来の樹脂に比べて低くする
ことができ、更に接着性も良好である。[Effects of the Invention] The resin of the present invention has a low softening temperature and is excellent in workability. In addition, the cured product obtained using this resin has a high glass transition temperature and heat distortion temperature, which are indicators of heat resistance, and has a lower water absorption rate than conventional resins, and also has good adhesive properties. .
【0062】従って、本発明の樹脂は、近年の高耐熱、
低吸水、高接着性の要求に充分応えることができ、この
性能を利用して広範な分野、具体的には、電子部品の封
止材料、成形材料または積層用の材料として極めて有用
である。Therefore, the resin of the present invention has high heat resistance and
It can fully meet the requirements for low water absorption and high adhesion, and by utilizing this performance, it is extremely useful in a wide range of fields, specifically as a sealing material for electronic components, a molding material, or a material for lamination.
Claims (7)
シ樹脂。2. An epoxy resin represented by formula (2) (wherein n is 0 to 15).
としての請求項1記載の樹脂とを含んでなるエポキシ樹
脂組成物。3. An epoxy resin composition comprising (A) an epoxy resin and (B) the resin according to claim 1 as a curing agent.
記載のエポキシ樹脂と、(B)硬化剤とを含んでなるエ
ポキシ樹脂組成物。Claim 4: (A) Claim 2 as an epoxy resin
An epoxy resin composition comprising the epoxy resin described above and (B) a curing agent.
記載のエポキシ樹脂と、(B)硬化剤としての請求項1
記載の樹脂とを含んでなるエポキシ樹脂組成物。Claim 5: (A) Claim 2 as an epoxy resin
Claim 1 comprising the epoxy resin described above and (B) a curing agent.
An epoxy resin composition comprising the resin described above.
5に記載のエポキシ樹脂組成物。6. The epoxy resin composition according to claim 3, comprising a curing accelerator.
シ樹脂組成物の硬化物。7. A cured product of the epoxy resin composition according to claim 3, 4, 5, or 6.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4539991A JPH04264117A (en) | 1991-02-19 | 1991-02-19 | New high-performance resin, epoxy resin composition, and its cured article |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4539991A JPH04264117A (en) | 1991-02-19 | 1991-02-19 | New high-performance resin, epoxy resin composition, and its cured article |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH04264117A true JPH04264117A (en) | 1992-09-18 |
Family
ID=12718182
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4539991A Pending JPH04264117A (en) | 1991-02-19 | 1991-02-19 | New high-performance resin, epoxy resin composition, and its cured article |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH04264117A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006056969A (en) * | 2004-08-19 | 2006-03-02 | Nippon Steel Chem Co Ltd | Epoxy resin composition and cured product thereof |
JP2010155796A (en) * | 2008-12-26 | 2010-07-15 | Nippon Steel Chem Co Ltd | Naphthol resin, epoxy resin, epoxy resin composition and cured product thereof |
-
1991
- 1991-02-19 JP JP4539991A patent/JPH04264117A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006056969A (en) * | 2004-08-19 | 2006-03-02 | Nippon Steel Chem Co Ltd | Epoxy resin composition and cured product thereof |
TWI399403B (en) * | 2004-08-19 | 2013-06-21 | Nippon Steel & Sumikin Chem Co | Epoxy resin composition and hardened product thereof |
JP2010155796A (en) * | 2008-12-26 | 2010-07-15 | Nippon Steel Chem Co Ltd | Naphthol resin, epoxy resin, epoxy resin composition and cured product thereof |
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