JPH04254577A - Vacuum flange - Google Patents
Vacuum flangeInfo
- Publication number
- JPH04254577A JPH04254577A JP14309991A JP14309991A JPH04254577A JP H04254577 A JPH04254577 A JP H04254577A JP 14309991 A JP14309991 A JP 14309991A JP 14309991 A JP14309991 A JP 14309991A JP H04254577 A JPH04254577 A JP H04254577A
- Authority
- JP
- Japan
- Prior art keywords
- stainless steel
- film
- weight
- flange
- alloy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000838 Al alloy Inorganic materials 0.000 claims abstract description 37
- 229910001220 stainless steel Inorganic materials 0.000 claims abstract description 21
- 239000010935 stainless steel Substances 0.000 claims abstract description 21
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 14
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 11
- 229910021332 silicide Inorganic materials 0.000 claims abstract description 9
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 7
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 6
- 238000007733 ion plating Methods 0.000 claims abstract description 5
- 239000006104 solid solution Substances 0.000 claims abstract description 5
- 229910052723 transition metal Inorganic materials 0.000 claims abstract 3
- 150000003624 transition metals Chemical class 0.000 claims abstract 3
- 238000007789 sealing Methods 0.000 claims description 32
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 21
- 239000011651 chromium Substances 0.000 claims description 17
- 150000004767 nitrides Chemical class 0.000 claims description 14
- 229910001256 stainless steel alloy Inorganic materials 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 10
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
- 239000012535 impurity Substances 0.000 claims description 10
- 239000002344 surface layer Substances 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- 229910052796 boron Inorganic materials 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010955 niobium Substances 0.000 claims description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 2
- 229910017052 cobalt Inorganic materials 0.000 claims 2
- 239000010941 cobalt Substances 0.000 claims 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 2
- VDZMENNHPJNJPP-UHFFFAOYSA-N boranylidyneniobium Chemical compound [Nb]#B VDZMENNHPJNJPP-UHFFFAOYSA-N 0.000 claims 1
- 229910021334 nickel silicide Inorganic materials 0.000 claims 1
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 claims 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 abstract description 4
- 239000000956 alloy Substances 0.000 abstract description 4
- 229910000521 B alloy Inorganic materials 0.000 abstract 2
- 229910018507 Al—Ni Inorganic materials 0.000 abstract 1
- 229910020711 Co—Si Inorganic materials 0.000 abstract 1
- 229910000756 V alloy Inorganic materials 0.000 abstract 1
- 229910021484 silicon-nickel alloy Inorganic materials 0.000 abstract 1
- 239000010408 film Substances 0.000 description 37
- 238000000576 coating method Methods 0.000 description 22
- 239000011248 coating agent Substances 0.000 description 18
- 239000000463 material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000003795 desorption Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 229910003310 Ni-Al Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- SJKRCWUQJZIWQB-UHFFFAOYSA-N azane;chromium Chemical compound N.[Cr] SJKRCWUQJZIWQB-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/03—Pressure vessels, or vacuum vessels, having closure members or seals specially adapted therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】0001
【産業上の利用分野】本発明は、真空容器に必要とする
アルミニウム合金フランジに関し、特に、そのシ−ル面
に、ステンレス鋼合金膜或いはステンレス鋼窒化膜の硬
質表面層、特に、熱膨張係数が１０×１０−６／℃以上
、好ましくは１２×１０−６／℃以上のステンレス鋼合
金膜或いはステンレス鋼窒化膜の硬質表面層を被覆した
真空用フランジに関する。[Industrial Application Field] The present invention relates to an aluminum alloy flange required for a vacuum vessel, and in particular, the sealing surface thereof is coated with a hard surface layer of a stainless steel alloy film or a stainless steel nitride film, in particular, a hard surface layer with a coefficient of thermal expansion. The present invention relates to a vacuum flange coated with a hard surface layer of a stainless steel alloy film or a stainless steel nitride film having a temperature of 10 x 10-6/°C or higher, preferably 12 x 10-6/°C or higher.
【０００２】0002
【従来の技術】従来、真空機器用の素材としては、主に
ステンレス鋼が用いられているが、近年、加速器、及び
半導体関係を中心に、装置の大型化、真空化が進んでい
る。2. Description of the Related Art Conventionally, stainless steel has been mainly used as a material for vacuum equipment, but in recent years, equipment has become larger and more vacuum-oriented, mainly in the areas of accelerators and semiconductors.
【０００３】ステンレス鋼の真空容器は、耐食性や機械
的強度にすぐれている一方、重量が大きく、また真空用
素材として限界がある。また、粒子加速器に用いた場合
、かなりの残留放射能を有するという問題が見られる。
これに対して、アルミニウム合金の真空容器は、重量が
軽く、到達真空度がステンレス鋼よりも高く、真空用容
器として注目されている。しかも、加速器として用いた
場合、残留放射能の減衰率が、ステンレス鋼の場合より
１桁低いと言う長所が見られる。Although stainless steel vacuum containers have excellent corrosion resistance and mechanical strength, they are heavy and have limitations as a material for vacuum use. Furthermore, when used in a particle accelerator, there is a problem in that it has considerable residual radioactivity. On the other hand, aluminum alloy vacuum containers are attracting attention as vacuum containers because they are lighter in weight and have a higher degree of vacuum than stainless steel. Furthermore, when used as an accelerator, it has the advantage that the decay rate of residual radioactivity is one order of magnitude lower than that of stainless steel.
【０００４】然し乍ら、アルミニウム合金には、軟らか
いという大きな欠点があり、ハンドリング時に傷つきや
すく、特にフランジのシ−ル面に傷が付くと、シ−ル性
能に直接悪影響を及ぼすことになる。そこで、現在では
、窒化チタン、窒化クロム、炭化チタン等の硬質被膜を
コ−ティングすることにより、そのシ−ル面を保護して
いる。然し乍ら、アルミニウム合金は、熱膨張係数が非
常に高く、融点が低いために、良質な硬質被膜を密着性
良くコ−ティングすることが非常に困難である。更に、
これらの硬質被膜は硬度が高いが、靭性が低いために、
フランジのベ−キングや脱着を繰り返すと、硬質被膜に
クラックや剥離が生じ易くなって、ハンドリング時に傷
が付き易くなったり、シ−ル性能の信頼性、耐久性が悪
くなってしまうために、アルミニウム合金の真空機器の
市場拡大に大きな支障となっている。[0004] However, aluminum alloys have a major drawback of being soft and are easily damaged during handling. In particular, if the sealing surface of the flange is scratched, this will directly adversely affect the sealing performance. Therefore, at present, the sealing surface is protected by coating with a hard film of titanium nitride, chromium nitride, titanium carbide, or the like. However, since aluminum alloy has a very high coefficient of thermal expansion and a low melting point, it is very difficult to coat it with a high-quality hard film with good adhesion. Furthermore,
These hard coatings have high hardness but low toughness, so
Repeated baking and attachment/detachment of the flange can easily cause cracks and peeling in the hard coating, making it more likely to get scratched during handling, and reducing the reliability and durability of the sealing performance. This is a major hindrance to the expansion of the market for aluminum alloy vacuum equipment.
【０００５】[0005]
【発明が解決しようとする課題】従って、本発明者らは
、前記のように、従来不具合とされていたフランジのシ
−ル面の硬質化の実験を重ねて、鋭意検討した結果、フ
ランジの表面、特に、シ−ル面の硬質化膜として、ステ
ンレス鋼合金膜或いはステンレス鋼窒化膜の熱膨張係数
が１０×１０−６／℃以上、好ましくは１２×１０−６
／℃以上の硬質表面膜を被覆することが、非常に有効で
あることを見出し、その知見に基づいて本発明を完成す
るに到った。従って、本発明は、重量が軽く、到達真空
度が高く、且つ、従来より耐食性が高く、ハンドリング
時において、表面特にシ−ル面に傷が付き難く、繰り返
しベ−キング、繰り返し脱着使用でも劣化が少ない真空
用フランジを提供することを目的にする。[Problems to be Solved by the Invention] Therefore, as mentioned above, the inventors of the present invention have repeatedly conducted experiments on hardening the sealing surface of the flange, which has been considered a problem in the past, and as a result of intensive study, As a hardened film on the surface, especially the sealing surface, a stainless steel alloy film or a stainless steel nitride film has a coefficient of thermal expansion of 10 x 10-6/°C or more, preferably 12 x 10-6
It has been found that coating with a hard surface film having a temperature of /°C or higher is very effective, and the present invention has been completed based on this knowledge. Therefore, the present invention is light in weight, has a high ultimate vacuum, has higher corrosion resistance than conventional products, is less likely to be scratched on the surface especially the sealing surface during handling, and does not deteriorate even with repeated baking and repeated attachment/detachment. The purpose is to provide a vacuum flange with less.
【０００６】[0006]
【課題を解決するための手段】本発明は、上記の技術的
な課題の解決のために、アルミニウム合金フランジのシ
−ル面にステンレス鋼合金膜の硬質表面膜或いは熱膨張
係数が１０×１０−６／℃以上、好ましくは１２×１０
−６／℃以上の硬質表面膜を形成されたことを特徴とす
る真空用フランジを提供する。そして、前記アルミニウ
ム合金フランジのシ−ル面に、前記硬質表面膜をイオン
プレ−テイング或いはスパッタリング処理により、形成
した真空用フランジが好適である。また、Ｃｒ １０
〜３０重量％、Ｎｉ ３０重量％以下、Ｃ ５重量
％以下、Ｆｅ 残り及び不可避不純物の組成のステン
レス鋼合金組成或いは、それに窒素を３０重量％以下固
溶させたステンレス鋼窒化膜、或いは、Ｎｂ或いはＣｒ
ホウ化物、Ｎｉ或いはＣｏの珪化物或いは、Ｎｉ、Ｖ或
いはＴｉとのＡｌ合金を前記硬質表面膜とするフランジ
が好適である。[Means for Solving the Problems] In order to solve the above technical problems, the present invention provides a hard surface film of a stainless steel alloy film on the sealing surface of an aluminum alloy flange or a hard surface film with a thermal expansion coefficient of 10×10. -6/℃ or higher, preferably 12×10
A vacuum flange is provided, characterized in that a hard surface film of -6/°C or higher is formed. A vacuum flange in which the hard surface film is formed on the sealing surface of the aluminum alloy flange by ion plating or sputtering is preferable. Also, Cr 10
~30% by weight, Ni 30% by weight or less, C 5% by weight or less, Fe remaining and unavoidable impurities, or a stainless steel nitride film in which nitrogen is dissolved in a solid solution of 30% by weight or less, or Nb Or Cr
A flange in which the hard surface film is made of a boride, a silicide of Ni or Co, or an Al alloy with Ni, V or Ti is suitable.
【０００７】[0007]
【作用】本発明によると、アルミニウム合金製フランジ
のシ−ル面に、ステンレス鋼合金或いは熱膨張係数が１
０×１０−６／℃以上、好ましくは１２×１０−６／℃
以上の硬質表面膜特に、Ｎｂ或いはＣｒのホウ化物、Ｎ
ｉ或いはＣｏの珪化物、或いはＮｉ、Ｖ、或いはＴｉと
のＡｌ合金をイオンプレ−テイング或いはスパッタリン
グ処理により、形成した硬質表面膜を被覆した真空用フ
ランジは、ハンドリング時においても傷つき難く、耐食
性が高く、ベ−キング及び脱着を繰り返しても、そのシ
−ル面に剥離、クラックが生じ難いものである。[Operation] According to the present invention, the sealing surface of the aluminum alloy flange is made of stainless steel alloy or has a thermal expansion coefficient of 1.
0x10-6/°C or more, preferably 12x10-6/°C
The above hard surface films are made of borides of Nb or Cr, N
Vacuum flanges coated with a hard surface film formed by ion plating or sputtering of silicides of i or Co, or Al alloys with Ni, V, or Ti are resistant to scratches during handling and have high corrosion resistance. Even after repeated baking and desorption, peeling and cracking are unlikely to occur on the sealing surface.
【０００８】即ち、Ｃｒ １０〜３０重量％、Ｎｉ
３０重量％以下、Ｃ ５重量％以下、Ｆｅ 残り
及び不可避不純物の組成のステンレス鋼合金組成或いは
、それに窒素を最大３０重量％まで固溶させたステンレ
ス鋼窒化膜或いはＮｂ或いはＣｒのホウ化物、Ｎｉ或い
はＣｏの珪化物、或いはＮｉ、Ｖ、或いはＴｉとのＡｌ
合金を、アルミニウム合金のフランジの硬質表面膜とす
ることにより、有効な真空用フランジが提供された。That is, 10 to 30% by weight of Cr, Ni
Stainless steel alloy composition with a composition of 30% by weight or less, C 5% by weight or less, Fe remaining and unavoidable impurities, or a stainless steel nitride film with nitrogen dissolved in it as a solid solution up to 30% by weight, boride of Nb or Cr, Ni or Co silicide, or Al with Ni, V, or Ti
An effective vacuum flange was provided by using the alloy as a hard surface coating on an aluminum alloy flange.
【０００９】硬質被膜が、ステンレス鋼合金或いはステ
ンレス鋼窒化物においては、クロム含有量が１０重量％
未満では、耐酸化性が低下して、ベ−キングを繰り返す
と、粒界腐食により膜が劣化するために、好ましくなく
、また、３０重量％を超えると、熱膨張係数が低くなっ
て、母材との熱膨張係数の差から生じる内部応力を緩和
できないために、薄膜の剥離やクラックを生じ易くなる
。[0009] When the hard coating is stainless steel alloy or stainless steel nitride, the chromium content is 10% by weight.
If it is less than 30% by weight, the oxidation resistance will decrease and repeated baking will cause the film to deteriorate due to intergranular corrosion, which is undesirable. If it exceeds 30% by weight, the coefficient of thermal expansion will decrease and Since the internal stress caused by the difference in thermal expansion coefficient between the material and the material cannot be alleviated, peeling and cracking of the thin film are likely to occur.
【００１０】ニッケル含有量は、３０重量％未満であり
、３０重量％を超えると、熱膨張係数が低くなるため、
好ましくない。また、炭素含有量は、５重量％以下であ
り、５重量％を超えると、靭性に乏しくなるため好まし
くない。[0010] The nickel content is less than 30% by weight, and if it exceeds 30% by weight, the coefficient of thermal expansion becomes low.
Undesirable. Further, the carbon content is 5% by weight or less, and if it exceeds 5% by weight, the toughness becomes poor, which is not preferable.
【００１１】硬質被膜が、Ｎｂのホウ化物においては、
Ｎｂ含有量は８７重量％以上であり、Ｎｂ含有量が８７
重量％未満になると、熱膨張係数が低くなり、好ましく
なく、また、Ｃｒのホウ化物においても、Ｃｒ含有量は
７８重量％以上であり、Ｃｒ含有量が７８重量％未満に
なると、同様に、熱膨張係数が低くなって好ましくない
。[0011] When the hard coating is a boride of Nb,
The Nb content is 87% by weight or more, and the Nb content is 87% by weight or more.
If it is less than 78% by weight, the thermal expansion coefficient becomes low, which is not preferable. Also, in the case of Cr boride, the Cr content is 78% by weight or more, and if the Cr content is less than 78% by weight, similarly, The coefficient of thermal expansion becomes low, which is undesirable.
【００１２】硬質被膜が、Ｎｉの珪化物においては、Ｎ
ｉ含有量は７０重量％以上、９０重量％以下であり、Ｎ
ｉ含有量が７０重量％未満、或いは９０重量％を超える
と、熱膨張係数が低くなり、好ましくなく、また、Ｃｒ
の珪化物においては、Ｃｒ含有量は７０重量％以上、９
５重量％以下であり、Ｃｒ含有量が７０重量％未満或い
は９５重量％より高くなると、同様に熱膨張係数が低く
なって、好ましくない。[0012] When the hard coating is made of Ni silicide, N
The i content is 70% by weight or more and 90% by weight or less, and N
If the i content is less than 70% by weight or more than 90% by weight, the coefficient of thermal expansion will be low, which is undesirable.
In the silicide, the Cr content is 70% by weight or more, 9
If the Cr content is less than 70% by weight or higher than 95% by weight, the coefficient of thermal expansion similarly becomes low, which is not preferable.
【００１３】硬質被膜が、Ｎｉ−Ａｌ合金においては、
Ｎｉ含有量は６０重量％以上であり、Ｎｉ含有量が６０
重量％未満になると、熱膨張係数が低くなり、好ましく
なく、また、Ｖ−Ａｌ合金のおいても、Ｖ含有量は５８
重量％以下であり、Ｖ含有量が５８重量％を超えると、
同様に熱膨張係数が低くなってしまって、好ましくない
。[0013] In the Ni-Al alloy, the hard coating is
The Ni content is 60% by weight or more, and the Ni content is 60% by weight or more.
If it is less than 5% by weight, the coefficient of thermal expansion will be low, which is not preferable.
% by weight or less, and when the V content exceeds 58% by weight,
Similarly, the coefficient of thermal expansion becomes low, which is not preferable.
【００１４】本発明の真空用アルミニウム合金フランジ
は、上記の組成の硬質被膜をアルミニウム合金フランジ
のシ−ル面に被覆して、シ−ル性能テスト（リ−ク試験
）を行なった結果、良好なシ−ル性能が分かり、且つ、
熱膨張係数が１０×１０−６／℃以上になった硬質表面
膜では、２０回以上の脱着及びベ−キングを繰り返して
も、被膜に剥離やクラックが生じなかった。即ち、熱膨
張係数が１２×１０−６／℃以上になると、３０回以上
のベ−キング及び脱着の繰り返しでもシ−ル性能が保持
された。従って、本発明の高真空用アルミニウム合金フ
ランジでは、アルミニウム合金フランジのシ−ル表面の
強度が改良されたものが得られ、更に、シ−ル面の損傷
を防止でき、ひいては、シ−ル性能の信頼性及び耐久性
が問題となっている一般のアルミニウム機器に適用でき
る。The aluminum alloy flange for vacuum use of the present invention was tested for sealing performance (leakage test) by coating the sealing surface of the aluminum alloy flange with a hard coating having the above-mentioned composition. You can understand the sealing performance, and
With a hard surface film having a thermal expansion coefficient of 10 x 10-6/°C or more, no peeling or cracking occurred in the film even after repeated desorption and baking 20 times or more. That is, when the coefficient of thermal expansion was 12 x 10-6/°C or more, the sealing performance was maintained even after baking and desorption were repeated 30 times or more. Therefore, in the aluminum alloy flange for high vacuum use of the present invention, the strength of the sealing surface of the aluminum alloy flange is improved, and damage to the sealing surface can be prevented, and the sealing performance is improved. It can be applied to general aluminum equipment where reliability and durability are issues.
【００１５】次に、本発明の真空用アルミニウム合金フ
ランジを具体的に実施例により説明するが、本発明はそ
れらによって限定されるものではない。Next, the vacuum aluminum alloy flange of the present invention will be specifically explained using examples, but the present invention is not limited thereto.
【００１６】[0016]
【実施例１】表面膜の成膜法としては、反応性スパッタ
リング処理法を用いて、対陰極材（タ−ゲット）として
、組成を変えながら、Ｃｒ １０〜３０重量％、Ｎｉ
３０重量％以下、Ｃ ５重量％以下、残部Ｆｅ及
び不可避不純物の組成のステンレス鋼合金組成或いは、
それに窒素を最大３０重量％まで固溶させたステンレス
鋼窒化膜を用い、アルゴン雰囲気ガス或いはアルゴンと
窒素の混合雰囲気ガスのもとで、スパッタリング処理に
より、様々な組成のステンレス鋼合金膜或いはその窒化
被膜を、２枚の直径７０ｍｍのアルミニウム合金フラン
ジのシ−ル面に、膜厚を約２ミクロンに制御して、被覆
し、リ−ク試験を行なった。[Example 1] As a surface film formation method, a reactive sputtering treatment method was used, and as an anticathode material (target), Cr 10 to 30% by weight, Ni
Stainless steel alloy composition of 30% by weight or less, C 5% by weight or less, balance Fe and unavoidable impurities, or
Using a stainless steel nitride film containing up to 30% by weight of nitrogen as a solid solution, stainless steel alloy films of various compositions or their nitrides are formed by sputtering in an argon atmosphere gas or a mixed atmosphere gas of argon and nitrogen. A film was applied to the sealing surfaces of two aluminum alloy flanges having a diameter of 70 mm with a film thickness controlled to approximately 2 microns, and a leak test was conducted.
【００１７】その結果を表１に示す。但し、ガスケット
は純アルミニウムメタル（Ａｌ０５０−Ｈ２４）を使用
した。The results are shown in Table 1. However, pure aluminum metal (Al050-H24) was used for the gasket.
【００１８】[0018]
【表１】[Table 1]
【００１９】表１において、○は、３０回のフランジの
ベ−キングと脱着を繰り返した後でのシ−ル性能が保持
されたものを示す。リ−ク試験で示す回数は、フランジ
脱着した後のリ−ク試験でリ−クが見られたときのリ−
ク試験回数を示す。尚、硬質被膜の熱膨張係数の測定は
、フランジとともにコ−ティングした基板から、被膜を
剥離して測定した。以上の表１に示される結果から、本
発明の真空用アルミニウム合金フランジは、耐久性及び
信頼性に優れていることが判明した。In Table 1, ◯ indicates that the sealing performance was maintained after flange baking and attachment/detachment were repeated 30 times. The number of times shown in the leak test is the number of times when a leak is observed in the leak test after the flange has been installed and removed.
Indicates the number of tests. The coefficient of thermal expansion of the hard coating was measured by peeling off the coating from the substrate coated with the flange. From the results shown in Table 1 above, it was found that the vacuum aluminum alloy flange of the present invention has excellent durability and reliability.
【００２０】[0020]
【実施例２】表面膜の成膜法としては、イオン・プレ−
ティング処理法を用いて、蒸発源として、金属ＮｂとＢ
、或いは金属ＣｒとＢを用いて、蒸気圧を各々制御して
、組成を変化させ、様々な組成の硬質被膜を、２枚の直
径７０ｍｍのアルミニウム合金フランジ（Ａ２２１９）
のシ−ル面に、膜厚を約２ミクロンに制御して、被覆し
、リ−ク試験を行なった。[Example 2] Ion plate was used as a method for forming the surface film.
Metallic Nb and B are used as evaporation sources using
Alternatively, by controlling the vapor pressure and varying the composition using metals Cr and B, hard coatings of various compositions are coated on two 70 mm diameter aluminum alloy flanges (A2219).
The film thickness was controlled to about 2 microns and a leak test was conducted on the sealing surface of the film.
【００２１】その結果を表２に示す。但し、ガスケット
は純アルミニウムメタル（Ａｌ０５０−Ｈ２４）を使用
した。The results are shown in Table 2. However, pure aluminum metal (Al050-H24) was used for the gasket.
【００２２】[0022]
【表２】[Table 2]
【００２３】表２において、○は、３０回のフランジの
ベ−キングと脱着を繰り返した後でのシ−ル性能が保持
されたものを示す。リ−ク試験で示す回数は、フランジ
脱着した後のリ−ク試験でリ−クが見られたときのリ−
ク試験回数を示す。尚、硬質被膜の熱膨張係数の測定は
、フランジとともにコ−ティングした基板から、被膜を
剥離して測定した。以上の表２に示される結果から、本
発明の真空用アルミニウム合金フランジは、耐久性及び
信頼性に優れていることが判明した。[0023] In Table 2, ◯ indicates that the sealing performance was maintained after flange baking and attachment/detachment were repeated 30 times. The number of times shown in the leak test is the number of times when a leak is observed in the leak test after the flange has been installed and removed.
Indicates the number of tests. The coefficient of thermal expansion of the hard coating was measured by peeling off the coating from the substrate coated with the flange. From the results shown in Table 2 above, it was found that the vacuum aluminum alloy flange of the present invention has excellent durability and reliability.
【００２４】[0024]
【実施例３】表面膜の成膜法としては、イオン・プレ−
ティング処理法を用いて、蒸発源として、金属ＮｉとＳ
ｉ、或いは金属ＣｏとＳｉを用いて、蒸気圧を各々制御
して、組成を変化させ、様々な組成の硬質被膜を、２枚
の直径７０ｍｍのアルミニウム合金フランジ（Ａ２２１
９）のシ−ル面に、膜厚を約２ミクロンに制御して、被
覆し、リ−ク試験を行なった。[Example 3] Ion plate was used as a method for forming the surface film.
Metallic Ni and S are used as evaporation sources using
Alternatively, by controlling the vapor pressure and changing the composition using metals Co and Si, hard coatings of various compositions were coated on two 70 mm diameter aluminum alloy flanges (A221
9) was coated with a controlled film thickness of approximately 2 microns, and a leak test was conducted.
【００２５】その結果を表３に示す。但し、ガスケット
は純アルミニウムメタル（Ａｌ０５０−Ｈ２４）を使用
した。The results are shown in Table 3. However, pure aluminum metal (Al050-H24) was used for the gasket.
【００２６】[0026]
【表３】[Table 3]
【００２７】表３において、○は、３０回のフランジの
ベ−キングと脱着を繰り返した後でのシ−ル性能が保持
されたものを示す。リ−ク試験で示す回数は、フランジ
脱着した後のリ−ク試験でリ−クが見られたリ−ク試験
回数を示す。尚、硬質被膜の熱膨張係数の測定は、フラ
ンジとともにコ−ティングした基板から、被膜を剥離し
て測定した。以上の表３に示される結果から、本発明の
真空用アルミニウム合金フランジは、耐久性及び信頼性
に優れていることが判明した。[0027] In Table 3, ◯ indicates that the sealing performance was maintained after flange baking and attachment/detachment were repeated 30 times. The number of times shown in the leak test indicates the number of times a leak was observed in the leak test after the flange was attached and detached. The coefficient of thermal expansion of the hard coating was measured by peeling off the coating from the substrate coated with the flange. From the results shown in Table 3 above, it was found that the vacuum aluminum alloy flange of the present invention has excellent durability and reliability.
【００２８】[0028]
【実施例４】表面膜の成膜法としては、イオン・プレ−
ティング処理法を用いて、蒸発源として、金属ＮｂとＢ
、或いは金属ＣｒとＢを用いて、蒸気圧を各々制御して
、組成を変化させ、様々な組成の硬質被膜を、２枚の直
径７０ｍｍのアルミニウム合金フランジ（Ａ２２１９）
のシ−ル面に、膜厚を約２ミクロンに制御して、被覆し
、リ−ク試験を行なった。[Example 4] The method for forming the surface film is ion plate.
Metallic Nb and B are used as evaporation sources using
Alternatively, by controlling the vapor pressure and varying the composition using metals Cr and B, hard coatings of various compositions are coated on two 70 mm diameter aluminum alloy flanges (A2219).
The film thickness was controlled to about 2 microns and a leak test was conducted on the sealing surface of the film.
【００２９】その結果を表４に示す。但し、ガスケット
は純アルミニウムメタル（Ａｌ０５０−Ｈ２４）を使用
した。The results are shown in Table 4. However, pure aluminum metal (Al050-H24) was used for the gasket.
【００３０】[0030]
【表４】[Table 4]
【００３１】表４において、○は、３０回のフランジの
ベ−キングと脱着を繰り返した後でのシ−ル性能が保持
されたものを示す。リ−ク試験で示す回数は、フランジ
脱着した後のリ−ク試験でリ−クが見られたリ−ク試験
回数を示す。尚、硬質被膜の熱膨張係数の測定は、フラ
ンジとともにコ−ティングした基板から、被膜を剥離し
て測定した。以上の表４に示される結果から、本発明の
真空用アルミニウム合金フランジは、耐久性及び信頼性
に優れていることが判明した。In Table 4, ◯ indicates that the sealing performance was maintained after flange baking and attachment/detachment were repeated 30 times. The number of times shown in the leak test indicates the number of times a leak was observed in the leak test after the flange was attached and detached. The coefficient of thermal expansion of the hard coating was measured by peeling off the coating from the substrate coated with the flange. From the results shown in Table 4 above, it was found that the vacuum aluminum alloy flange of the present invention has excellent durability and reliability.
【００３２】[0032]
【発明の効果】以上説明したように、本発明の真空用ア
ルミニウム合金フランジにより、次のような顕著な技術
的効果が得られた。第１に、ハンドリング時に傷付き難
く、シ−ル性能の劣化が少なく、ベ−キング及び脱着を
繰り返しても、シ−ルの硬質化表面膜に剥離、クラック
が生じ難いアルミニウム合金フランジを提供する。第２
に、従って、最近の加速器や半導体関係の真空機器の大
型化や真空化に対応できる真空用アルミニウム合金フラ
ンジを提供する。第３に、同時に、アルミニウム合金の
真空機器に対する需要が大幅に伸びるとともに、本発明
の真空用アルミニウム合金フランジは、それに対する加
速器及び半導体関係の産業の発展に大きく寄与する。第
４に、アルミニウム合金フランジのシ−ル表面の強度が
改良されたものが得られ、更に、シ−ル面の損傷を防止
でき、ひいては、シ−ル性能の信頼性及び耐久性が問題
となっているアルミニウム機器に適用できる。とができ
る。[Effects of the Invention] As explained above, the vacuum aluminum alloy flange of the present invention has achieved the following remarkable technical effects. First, to provide an aluminum alloy flange that is less likely to be damaged during handling, has less deterioration in sealing performance, and is less likely to cause peeling or cracking in the hardened surface film of the seal even after repeated baking and removal. . Second
Therefore, the present invention provides an aluminum alloy flange for vacuum use that can cope with the recent increase in size and vacuum of vacuum equipment related to accelerators and semiconductors. Thirdly, at the same time, the demand for aluminum alloy vacuum equipment is increasing significantly, and the aluminum alloy flange for vacuum use of the present invention will greatly contribute to the development of industries related to accelerators and semiconductors. Fourthly, the strength of the sealing surface of the aluminum alloy flange is improved, and damage to the sealing surface can be prevented, which in turn reduces the reliability and durability of the sealing performance. Applicable to aluminum equipment. I can do that.
Claims (9)
にステンレス鋼合金膜或いはステンレス鋼窒化膜の硬質
表面層を形成したことを特徴とする真空用フランジ。1. A vacuum flange characterized in that a hard surface layer of a stainless steel alloy film or a stainless steel nitride film is formed on the sealing surface of an aluminum alloy flange part.
ル面に、ステンレス鋼合金をイオンプレ−テイング処理
或いはスパッタリング処理することにより、ステンレス
鋼合金膜或いはステンレス鋼窒化膜の硬質表面層を形成
したことを特徴とする請求項１に記載の真空用フランジ
。2. A seal of the aluminum alloy flange part.
2. The vacuum flange according to claim 1, wherein a hard surface layer of a stainless steel alloy film or a stainless steel nitride film is formed on the surface of the flange by ion plating or sputtering a stainless steel alloy.
において、前記のステンレス鋼合金膜或いはステンレス
鋼窒化膜の硬質表面層は、 Ｃｒ １０〜３０重量％、 Ｎｉ ３０重量％以下、 Ｃ ５重量％以下、 Ｆｅ 残り及び不可避不純物の組成のステンレス
鋼合金組成に対して、窒素を３０重量％以下固溶させた
ステンレス鋼窒化膜を、ステンレス鋼窒化膜の硬質表面
層とすることを特徴とする前記真空用フランジ。3. The vacuum flange according to claim 1, wherein the hard surface layer of the stainless steel alloy film or the stainless steel nitride film contains 10 to 30% by weight of Cr, 30% by weight or less of Ni, and C5. The hard surface layer of the stainless steel nitride film is a stainless steel nitride film in which nitrogen is dissolved in a solid solution of 30 wt % or less with respect to a stainless steel alloy composition with a composition of 30 wt % or less of Fe and unavoidable impurities. The vacuum flange.
１０−６／℃以上、好ましくは１２×１０−６／℃以上
であることを特徴とする請求項１〜３のいずれかに記載
の真空用フランジ。4. The hard surface layer has a thermal expansion coefficient of 10×
The flange for vacuum according to any one of claims 1 to 3, characterized in that the temperature is 10-6/C or higher, preferably 12x10-6/C or higher.
化物膜或いは遷移金属ホウ化物或いは炭化物或いは珪化
物の硬質表面膜である請求項４に記載の真空用フランジ
。5. The vacuum flange according to claim 4, wherein the hard surface film is a stainless steel nitride film, a transition metal boride, carbide, or silicide hard surface film.
に、前記硬質表面膜をイオンプレ−テイング或いはスパ
ッタリング処理により、形成したことを特徴とする請求
項５に記載の真空用フランジ。6. The vacuum flange according to claim 5, wherein the hard surface film is formed on the sealing surface of the aluminum alloy flange by ion plating or sputtering.
、ニオブは、８７重量％以上であり、残部はホウ素であ
り、不可避不純物を含有する）或いは、ホウ化クロム（
但し、クロムは、７８重量％以上で、残部はホウ素であ
り、不可避不純物を含有する）であることを特徴とする
請求項５〜６のいずれかに記載の真空用フランジ。7. The hard surface film is made of niobium boride (however, niobium is 87% by weight or more, the remainder is boron, and contains unavoidable impurities) or chromium boride (
7. The vacuum flange according to claim 5, wherein chromium is 78% by weight or more, the remainder being boron and containing unavoidable impurities.
し、ニッケルが、７０〜９０重量％の範囲であり、残部
は、ケイ素であり、不可避不純物を含有する）或いは、
ケイ化コバルト（コバルトは、７０重量％以上であり、
残部はケイ素であり、不可避不純物を含有する）である
ことを特徴とする請求項５〜６のいずれかに記載の真空
用フランジ。8. The hard surface film is made of nickel silicide (however, nickel is in the range of 70 to 90% by weight, the remainder is silicon, and contains unavoidable impurities), or
Cobalt silicide (cobalt is 70% by weight or more,
7. The vacuum flange according to claim 5, wherein the remainder is silicon and contains unavoidable impurities.
ケル（但し、ニッケルは、６０重量％以上であり、残部
は、アルミニウムであり、不可避不純物を含有する）で
あり、或いはアルミニウム・バナジウム（バナジウムは
、５８重量％以下であり、残部は、アルミニウムであり
、不可避不純物を含有する）であることを特徴とする請
求項５〜６いずれかに記載の真空用フランジ。9. The hard surface film is made of aluminum/nickel (however, nickel accounts for 60% by weight or more, and the remainder is aluminum, containing unavoidable impurities), or aluminum/vanadium (vanadium). is 58% by weight or less, and the remainder is aluminum containing unavoidable impurities).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14309991A JP3183904B2 (en) | 1990-09-28 | 1991-06-14 | Vacuum flange |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25746890 | 1990-09-28 | ||
| JP2-257468 | 1990-09-28 | ||
| JP14309991A JP3183904B2 (en) | 1990-09-28 | 1991-06-14 | Vacuum flange |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04254577A true JPH04254577A (en) | 1992-09-09 |
| JP3183904B2 JP3183904B2 (en) | 2001-07-09 |
Family
ID=26474902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14309991A Expired - Fee Related JP3183904B2 (en) | 1990-09-28 | 1991-06-14 | Vacuum flange |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3183904B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2004022809A1 (en) * | 2002-07-31 | 2005-12-22 | 独立行政法人産業技術総合研究所 | Ultra low carbon stainless steel |
| EP3240371A1 (en) * | 2016-04-28 | 2017-11-01 | Commissariat à l'Energie Atomique et aux Energies Alternatives | Component for assembling a vacuum chamber and method for forming the assembly component |
-
1991
- 1991-06-14 JP JP14309991A patent/JP3183904B2/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPWO2004022809A1 (en) * | 2002-07-31 | 2005-12-22 | 独立行政法人産業技術総合研究所 | Ultra low carbon stainless steel |
| US7648586B2 (en) * | 2002-07-31 | 2010-01-19 | National Institute Of Advanced Industrial & Technology | Ultra-low carbon stainless steel |
| JP4691651B2 (en) * | 2002-07-31 | 2011-06-01 | 独立行政法人産業技術総合研究所 | Seal member |
| EP3240371A1 (en) * | 2016-04-28 | 2017-11-01 | Commissariat à l'Energie Atomique et aux Energies Alternatives | Component for assembling a vacuum chamber and method for forming the assembly component |
| FR3050657A1 (en) * | 2016-04-28 | 2017-11-03 | Commissariat Energie Atomique | COMPONENT FOR ASSEMBLING A VACUUM ENCLOSURE AND METHOD FOR MAKING THE ASSEMBLY COMPONENT |
| US10718451B2 (en) | 2016-04-28 | 2020-07-21 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Assembly component for a vacuum chamber and method for producing the assembly component |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3183904B2 (en) | 2001-07-09 |
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